U.S. patent application number 12/887197 was filed with the patent office on 2011-02-03 for multi-layer printed circuit board and method of manufacturing multi-layer printed circuit board.
This patent application is currently assigned to IBIDEN CO., LTD.. Invention is credited to Motoo ASAI, Takahiro MORI, Dongdong WANG.
Application Number | 20110024164 12/887197 |
Document ID | / |
Family ID | 27528057 |
Filed Date | 2011-02-03 |
United States Patent
Application |
20110024164 |
Kind Code |
A1 |
ASAI; Motoo ; et
al. |
February 3, 2011 |
MULTI-LAYER PRINTED CIRCUIT BOARD AND METHOD OF MANUFACTURING
MULTI-LAYER PRINTED CIRCUIT BOARD
Abstract
A multi-layer printed circuit board including a core structure
comprising resin layers and conductor circuits sandwiched by the
resin layers, the core structure having a first surface and a
second surface on an opposite side of the first surface, a first
conductor layer including conductor circuits formed on the first
surface of the core structure, and a second conductor layer
including conductor circuits formed on the second surface of the
core structure. The core structure includes a first via hole and a
second via hole, and the first via hole and the second via hole
include a metal filling up to the respective top of openings formed
in the resin layers, respectively, sandwich one or more conductor
circuits in the core structure and are positioned vertically to
form a through hole electrically connecting respective ones of the
conductor circuits of the first and the second conductor
layers.
Inventors: |
ASAI; Motoo; (Ibi-gun,
JP) ; WANG; Dongdong; (Ibi-gun, JP) ; MORI;
Takahiro; (Ibi-gun, JP) |
Correspondence
Address: |
OBLON, SPIVAK, MCCLELLAND MAIER & NEUSTADT, L.L.P.
1940 DUKE STREET
ALEXANDRIA
VA
22314
US
|
Assignee: |
IBIDEN CO., LTD.
Ogaki-shi
JP
|
Family ID: |
27528057 |
Appl. No.: |
12/887197 |
Filed: |
September 21, 2010 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
10921525 |
Aug 19, 2004 |
|
|
|
12887197 |
|
|
|
|
09979388 |
Dec 28, 2001 |
6828510 |
|
|
PCT/JP00/03377 |
May 25, 2000 |
|
|
|
10921525 |
|
|
|
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Current U.S.
Class: |
174/255 |
Current CPC
Class: |
H01L 2924/01078
20130101; H01L 2924/15312 20130101; H05K 3/181 20130101; H05K 3/385
20130101; H05K 3/387 20130101; Y10T 29/49126 20150115; H05K
2203/0733 20130101; H01L 2924/01019 20130101; H05K 3/0035 20130101;
H05K 1/036 20130101; H05K 2203/0773 20130101; H05K 2203/1476
20130101; Y10T 29/49144 20150115; H05K 3/423 20130101; H01L 2224/16
20130101; H05K 3/108 20130101; H01L 21/486 20130101; H05K
2201/09563 20130101; H05K 3/381 20130101; H05K 2201/0959 20130101;
H01L 2224/16225 20130101; H05K 3/0038 20130101; H05K 3/427
20130101; H01L 2924/15174 20130101; H01L 2924/01046 20130101; H05K
3/426 20130101; Y10T 29/49155 20150115; H01L 2224/16235 20130101;
H01L 2224/05568 20130101; H05K 3/0032 20130101; H01L 2924/00014
20130101; H05K 2201/09536 20130101; H01L 2924/00014 20130101; H05K
2201/0195 20130101; H05K 2201/0352 20130101; H05K 2201/09736
20130101; H05K 2203/0315 20130101; H05K 3/388 20130101; H01L
2924/0102 20130101; H05K 2201/09881 20130101; H01L 2924/01079
20130101; H01L 2924/01087 20130101; H01L 23/49827 20130101; H05K
3/4602 20130101; H05K 2201/096 20130101; H05K 2201/0355 20130101;
H05K 2201/0394 20130101; Y10T 29/49165 20150115; H01L 2224/05573
20130101; H01L 23/49822 20130101; H01L 2224/05599 20130101; H01L
2924/15311 20130101 |
Class at
Publication: |
174/255 |
International
Class: |
H05K 1/03 20060101
H05K001/03 |
Foreign Application Data
Date |
Code |
Application Number |
Jun 2, 1999 |
JP |
11-154497 |
Nov 17, 1999 |
JP |
11-326797 |
Dec 13, 1999 |
JP |
11-352659 |
Dec 14, 1999 |
JP |
11-353868 |
Feb 10, 2000 |
JP |
2000-033170 |
Claims
1. A multi-layer printed circuit board comprising: a core structure
comprising a plurality of resin layers and a plurality of conductor
circuits sandwiched by the resin layers, the core structure having
a first surface and a second surface on an opposite side of the
first surface; a first conductor layer comprising a plurality of
conductor circuits formed on the first surface of the core
structure; and a second conductor layer comprising a plurality of
conductor circuits formed on the second surface of the core
structure, wherein the core structure includes a first via hole and
a second via hole, and the first via hole and the second via hole
comprise a metal filling up to the respective top of a plurality of
openings formed in the plurality of resin layers, respectively,
sandwich at least one of the conductor circuits in the core
structure and are positioned vertically to form a through hole
electrically connecting respective ones of the conductor circuits
of the first and the second conductor layers.
2. The multi-layer printed circuit board according to claim 1,
wherein the metal comprises a plating layer.
3. The multi-layer printed circuit board according to claim 1,
further comprising: a first interlayer resin insulating layer
formed on the first surface of the core structure and the first
conductor layer; and a second interlayer resin insulating layer
formed on the second surface of the core structure and the second
conductor layer.
4. The multi-layer printed circuit board according to claim 1,
wherein the resin layers have a core member.
5. The multi-layer printed circuit board according to claim 4,
wherein the core member includes one of a glass cloth and an aramid
cloth.
6. The multi-layer printed circuit board according to claim 3,
wherein the first and second interlayer resin insulating layers
have a core member.
7. The multi-layer printed circuit board according to claim 6,
wherein the core member includes one of a glass cloth and an aramid
cloth.
8. The multi-layer printed circuit board according to claim 1,
wherein each of the resin layers has a thickness which is from 30
.mu.m to 200 .mu.m.
9. A multi-layer printed circuit board comprising: a core structure
comprising a plurality of resin layers and a plurality of conductor
circuits sandwiched by the resin layers, the core structure having
a first surface and a second surface on an opposite side of the
first surface; a first conductor layer comprising a plurality of
conductor circuits formed on the first surface of the core
structure; and a second conductor layer comprising a plurality of
conductor circuits formed on the second surface of the core
structure, wherein the core structure includes a first via hole and
a second via hole, the first via hole and the second via hole
comprise a metal filling up to the respective top of a plurality of
openings formed in the plurality of resin layers, respectively,
sandwich at least one of the conductor circuits in the core
structure and are positioned vertically to form a through hole
electrically connecting respective ones of the conductor circuits
of the first and the second conductor layers, and the first via
hole and the second via hole are deviated from each other in a
vertical direction.
10. The multi-layer printed circuit board according to claim 9,
wherein the metal comprises a plating layer.
11. The multi-layer printed circuit board according to claim 9,
further comprising: a first interlayer resin insulating layer
formed on the first surface of the core structure and the first
conductor layer; and a second interlayer resin insulating layer
formed on the second surface of the core structure and the second
conductor layer.
12. The multi-layer printed circuit board according to claim 9,
wherein the resin layers have a core member.
13. The multi-layer printed circuit board according to claim 12,
wherein the core member includes one of a glass cloth and an aramid
cloth.
14. The multi-layer printed circuit board according to claim 11,
wherein the first and second interlayer resin insulating layers
have a core member.
15. The multi-layer printed circuit board according to claim 14,
wherein the core member includes one of a glass cloth and an aramid
cloth.
16. The multi-layer printed circuit board according to claim 9,
wherein each of the resin layers has a thickness which is from 30
.mu.m to 200 .mu.m.
Description
CROSS REFERENCE TO RELATED APPLICATION
[0001] This application is a Continuation of and claims benefit of
priority from U.S. application Ser. No. 10/921,525, filed Aug. 19,
2004, the entire contents of which are hereby incorporated by
reference. U.S. application Ser. No. 10/921,525 is a Divisional of
U.S. patent application Ser. No. 09/979,388, filed Dec. 28, 2001,
now U.S. Pat. No. 6,828,510, issued Dec. 7, 2004, which is a
National Phase under 35 U.S.C. 371 of PCT/JP00/03377 filed May 25,
2000. This application further is based upon and claims the benefit
of priority from the Japanese Patent Application Nos. 2000-033170,
filed Feb. 10, 2000, 11-353868, filed Dec. 14, 1999, 11-352659,
filed Dec. 13, 1999, 11-326797, filed Nov. 17, 1999, and 11-154497,
filed Jun. 2, 1999.
TECHNICAL FIELD
[0002] The present invention relates to a multilayer printed
circuit board which can be employed as a package substrate on which
electronic elements, such as IC, are mounted. More particularly,
the present invention relates to a multi-layer printed circuit
board constituted by building interlayer resin insulating layers up
on a core substrate and a method of manufacturing a multi-layer
printed circuit board.
BACKGROUND ART
[0003] Hitherto, a buildup multi-layer printed circuit board has
been manufactured by a method disclosed in Japanese Patent
Laid-Open No. 9-130050.
[0004] That is, an interlayer resin insulating layer is built on a
core substrate having through holes formed therein. Then, a circuit
pattern is formed on the interlayer resin insulating layer. The
foregoing process is repeated so that the buildup multilayer
printed circuit board is obtained.
[0005] At present, the through holes are formed in the core
substrate by forming penetrating openings by using a drill.
Therefore, the smallest limit of the diameter of the penetrating
opening is 300 .mu.m. The density of the through holes cannot be
raised to a value larger than a value which is defined by the
diameter of the drill. Hence it follows that a method using a laser
beam to form the core substrate has been investigated. Since the
core substrate has a thickness of about 1 mm, fine through holes
cannot, however, easily be formed.
[0006] On the other hand, the multi-layer printed circuit board,
which is employed as the package substrate, must efficiently
diverge heat generated in the IC chip. The multi-layer printed
circuit board incorporates a core substrate which is constituted by
a laminated resin board having a thickness of about 1 mm and on
which an interlayer resin insulating layer having a thickness of
several tens of .mu.m and a circuit layer are laminated. Therefore,
the thickness of the multi-layer printed circuit board is mainly
made up by the core substrate. That is, the core substrate causes
the thickness of the multi-layer printed circuit board to be
enlarged and the thermal conductivity to be decreased.
[0007] To solve the above-mentioned problems, an object of the
present invention is to provide a multi-layer printed circuit board
and a method of manufacturing a multi-layer printed circuit board
capable of raising the density at which the through holes are
formed and reducing the thickness thereof.
[0008] To prevent the occurrence of the warpage and the crack of
the upper interlayer resin insulating layer and conductor
circuits.
[0009] When through holes are formed by laser beams, disconnection
sometimes occurs in a heat cycle or the like. Thus, satisfactory
reliability cannot be obtained. The cause of the disconnection has
been investigated, resulting in detection of mixture of air bubbles
in the resin with which the through hole is filled.
[0010] The cause of mixture of the air bubbles has furthermore been
investigated by the inventor of the present invention. As a result,
the mixture is caused by residual burrs of copper foil inwards
extending from the opened portion of the through hole when the
through holes are formed in a copper-clad laminated board which
constitutes the core substrate. That is, as shown in FIG. 70 (A),
when a through hole 633 is, by a laser beam, formed in a core
substrate 630 constituted by laminating copper foil 632, a burr
632b of the copper foil 632 undesirably left at the edge of the
opening of the through hole 633. A tapered through hole 633 is
sometimes formed. When a plated film 635 is formed to form the
through hole 636 as shown in FIG. 70 (B), air bubble E is sometimes
left between the burr 632b and the plated film 635. When the
through hole 636 is filled with a resin filler 640 as shown in FIG.
70 (C), air bubble E is sometimes left between the reverse side of
the portion including the burr 632b and the resin filler 640. As
shown in 70 (D), the portion including the burr 632b of the copper
foil extending inwards sometimes prevents smooth injection. In the
foregoing case, a portion which is not filled with the resin filler
640 is detected in the through hole 636. Thus, a fact has been
detected that the reliability in the connection of the printed
circuit board deteriorates owing to the air bubble and the
non-filled portion.
[0011] Since the hole forming operation using the laser beam is
performed, an oxidation-reduction layer is formed as a process
which is performed before the laser beam is applied and the number
of laser shots is increased. Thus, the process takes a long time
and the cost is enlarged.
[0012] To overcome the above-mentioned problems, the inventor of
the present invention has attempted to employ a BT
(Bismaleimide-Triazine) resin board as the core substrate. A fact
has, however, been detected that the BT resin board having a flat
surface encounters deterioration in the adhesiveness with a metal
film formed on the right side of the core substrate. Therefore, the
inventors or the present invention have attempted to improve the
adhesiveness with the metal film formed on the right side of the
core substrate by employing a resin film constituted by dispersing
soluble particles in refractory resin. Thus, there arises problems
in that the resin film, however, encounters decrease in the
strength required for the core substrate and the interlayer resin
insulating layer cannot be formed in the upper layer.
[0013] To overcome the foregoing problems, another object of the
present invention is to provide a printed circuit board and a
method of manufacturing a printed circuit board capable of forming
adequately forming through holes by using laser beams.
[0014] Since the core substrate is filled with core materials, such
as glass cloths, the laser beam must be applied to each hole for a
long time to form the through holes in the core substrate having a
thickness of about 1 mm by using laser beams. To form hundreds of
through holes, an excessively long machining time is required and
the manufacturing cost cannot be reduced. On the other hand, the
through holes each having a small diameter sometimes encounters
disconnection during the heat cycle. Therefore, satisfactory
reliability cannot be realized as compared with conventional
through holes formed by drilling and each having a large
diameter.
[0015] To achieve the foregoing objects, a still further object of
the present invention is to provide a multi-layer printed circuit
board and a method of manufacturing a multi-layer printed circuit
board capable of improving high-frequency characteristics of a
ground line and a power supply line and preventing a malfunction of
an IC chip caused from insufficient quantity of electric power to
be supplied.
[0016] On the other hand, the diameter of each penetrating opening
can be reduced as compared with an opening which is formed by
drilling when the penetrating openings are formed in the core
substrate by using laser beams. When the penetrating openings are
formed in a copper-clad laminated board employed to serve as the
core substrate, the number of laser shots are increased excessively
and an excessively long time is required. When the openings are
formed by the laser beams, a portion of copper for forming copper
foil on the surface of the inner wall of the through hole is
undesirably left. It leads to a fact that undesirable separation of
the plated film formed in the through hole takes place.
[0017] To overcome the foregoing problems, its still further object
of the present invention is to provide a printed circuit board
excellent in connection characteristics and reliability and
permitting a high-density structure which is manufactured by
forming openings in a resin plate which serves as a core substrate
by using laser beams and by performing sputtering to for a
sputtered layer to form penetrating opening each having a small
diameter and which is free from any separation of the plated films
in the through holes and a method of manufacturing a printed
circuit board.
DISCLOSURE OF THE INVENTION
[0018] To solve the above-mentioned problems, a multi-layer printed
circuit board recited in claim 1 is characterized by comprising: a
core substrate incorporating a metal layer sandwiched by resins;
and an interlayer resin insulating layer built upon said core
substrate.
[0019] A multi-layer printed circuit board recited in claim 2 is
characterized by comprising: an interlayer resin insulating layer
built up on a core substrate thereof, wherein
[0020] said core layer is constituted by sandwiching a metal layer
between two resin layers, and a conductor is provided for each of
non-penetrating openings which are formed in said resin and which
reach said metal layer so that through holes are formed.
[0021] A method of manufacturing a multi-layer printed circuit
board recited in claim 3 comprises at least the following steps (A)
to (C):
[0022] (A) forming a resin insulating layer on an upper layer of a
resin insulating layer having an upper surface on which a metal
layer is formed so that a core substrate is formed;
[0023] (B) forming non-penetrating openings in said resin
insulating layer of said core substrate by applying laser beams
such that said non-penetrating openings reach said metal layer;
and
[0024] (C) providing a conductor for each non-penetrating opening
formed in said resin insulating layer so that through holes are
formed.
[0025] Multi-layer printed circuit boards claimed in claims 1 and 2
and a method of manufacturing a multi-layer printed circuit board
claimed in claim 3 are arranged to maintain required strength of a
core substrate thereof by sandwiching a metal layer by resin. Thus,
the thickness of the core substrate can be reduced. Hence it
follows that the thickness of the multi-layer printed circuit board
can be reduced. Since non-penetrating openings which reach the
metal layer are simply required to be formed in the resin layer,
the depth of each of penetrating openings which are formed by laser
beams can be reduced to half or smaller as compared with the
conventional core substrate. Therefore, fine non-penetrating
openings can easily be formed by laser beams and, therefore,
through holes each having a small diameter can be formed. As a
result, a degree of integration of the multi-layer printed circuit
board can be raised. Moreover, the core substrate is formed into
the multilayer structure and, therefore, the metal layer between
resin portions which constitute the core substrate permits wiring
to be arranged. As a result, the number of layers of the
multi-layer printed circuit board can be reduced. Since the
non-penetrating openings are filled with plating, the intensity
increases and the warpage does not easily occur.
[0026] A method of manufacturing a multi-layer printed circuit
board recited in claim 4 comprises at least the following steps (A)
to (D):
[0027] (A) etching a metal layer of a one-side metal-clad resin
plate to form a circuit pattern;
[0028] (B) laminating a resin film to the surface of said circuit
pattern to constitute a core substrate;
[0029] (C) forming non-penetrating openings in a resin insulating
layer of said core substrate by applying laser beams such that said
non-penetrating openings reach said circuit pattern; and
[0030] (D) providing a conductor for each non-penetrating opening
of said resin insulating layer to form through holes.
[0031] A method of manufacturing a multi-layer printed circuit
board recited in claim 5 comprises at least the following steps (A)
to (E):
[0032] (A) etching a metal layer of a one-side metal-clad resin
plate to form a circuit pattern;
[0033] (B) coating the surface of said circuit pattern with resin
and polishing said circuit pattern so that said circuit pattern is
flattened;
[0034] (C) laminating a resin film to the surface of said circuit
pattern to constitute a core substrate;
[0035] (D) forming non-penetrating openings in a resin insulating
layer of said core substrate by applying laser beams such that said
non-penetrating openings reach said circuit pattern; and
[0036] (E) providing a conductor for each non-penetrating opening
of said resin insulating layer to form through holes.
[0037] Methods of manufacturing a multi-layer printed circuit board
claimed in claims 4 and 5 are arranged to maintain required
strength of a core substrate thereof by sandwiching a circuit
pattern by resin. Thus, the thickness of the core substrate can be
reduced. Hence it follows that the thickness of the multi-layer
printed circuit board can be reduced. Since non-penetrating
openings which reach the circuit pattern are simply required to be
formed in the resin layer, the depth of each of penetrating
openings which are formed by laser beams can be reduced to half or
smaller as compared with the conventional core substrate.
Therefore, fine non-penetrating openings can easily be formed by
laser beams and, therefore, through holes each having a small
diameter can be formed. As a result, a degree of integration of the
multi-layer printed circuit board can be raised. Moreover, the core
substrate is formed into the multilayer structure and, therefore,
the circuit pattern between resin portions which constitute the
core substrate permits wiring to be arranged. As a result, the
number of layers of the multi-layer printed circuit board can be
reduced.
[0038] To solve the above-mentioned problems, a multi-layer printed
circuit board recited in claim 6 is characterized by comprising: a
core substrate having through holes; and an interlayer resin
insulating layer built up on said core substrate, wherein
[0039] said through holes are constituted by filling a first metal
layer formed by electroplating, a metal film formed by electroless
plating, sputtering or evaporation and a second metal layer formed
by electroplating.
[0040] Since claim 6 is arranged such that through holes are formed
by enclosing plating material, via holes for establishing the
connection can be formed on the through holes. Therefore, the
wiring density of the via holes can be raised. Since through holes
are filled with electroplating, electroless plating and
electroplating, insufficient enclosure in each through hole can be
prevented. The reliability in the heat-cycle can be improved. Since
through holes are filled with electroplating, electroless plating
and electroplating, the intensity increases and the warpage does
not easily occur.
[0041] A method of manufacturing a multi-layer printed circuit
board recited in claim 7 comprises at least the following steps (A)
to (E):
[0042] (A) forming non-penetrating openings in a resin insulating
layer incorporating a metal layer formed on either side thereof by
applying laser beams such that said non-penetrating openings reach
said metal layer;
[0043] (B) passing an electric current to each non-penetrating
opening formed in said resin insulating layer through said metal
layer to fill a first metal layer with electroplating;
[0044] (C) forming a metal film on the opposite surface of said
resin insulating layer on which said metal layer is formed;
[0045] (D) passing an electric current to each non-penetrating
opening formed in said resin insulating layer through said metal
layer to fill a second metal layer with electroplating; and
[0046] (E) etching said metal layer and said metal film of said
resin insulating layer to form lands of through holes.
[0047] Since claim 7 is arranged such that through holes formed by
laser beams, the diameter of each through hole can be reduced to 50
.mu.m to 250 .mu.m. Therefore, the wiring density of the through
holes can be raised. Since the throughholes are formedby enclosing
plating, the strength of the core substrate can be increased. Thus,
warpage does not easily occur. Hence it follows that the thickness
of the core substrate can be reduced and, therefore, the heat
radiation characteristic of the multi-layer printed circuit board
can be improved. Since the through holes are filled with
electroplating, insufficient filling in each through hole can be
prevented. Since a second metal layer is formed in each through
hole after metal films serving as lands of the through holes,
separation of the lands can be prevented. It leads to a fact that
the reliability of the through holes can be improved. Since
satisfactory reliability in the connection can be improved, the
thickness of each land can be reduced. Therefore, the smoothness
and flatness of the interlayer resin insulating layer which is an
upper layer can be improved. As a result, separation and formation
of a crack in the interlayer resin insulating layer can be
prevented.
[0048] A method of manufacturing a multi-layer printed circuit
board recited in claim 8 further comprises a step for forming a
metal layer by electroless plating, sputtering or evaporation
according to claim 7.
[0049] In claim 8, electroless plating is employed so that the
metal layer can be formed with a low cost. When sputtering is
employed as a forming method, a metal layer exhibiting excellent
adhesiveness and a small thickness can be formed. When an
evaporation forming method is employed, a more thin metal layer can
be formed.
[0050] A method of manufacturing a multi-layer printed circuit
board recited in claim 9 is characterized in that said step for
forming said metal film on the opposite surface of said resin
insulating layer on which said metal layer is formed is arranged to
perform electroless plating, sputtering or evaporation, according
to claim 7 or 8.
[0051] In claim 9, electroless plating is employed so that the
metal film can be formed with a low cost. When sputtering is
employed as a forming method, a metal layer exhibiting excellent
adhesiveness and a small thickness can be formed. When an
evaporation forming method is employed, a thin metal layer can be
formed.
[0052] To solve the above-mentioned problems, a printed circuit
board recited in claim 10 is characterized by comprising: a core
substrate; and through holes formed in said core substrate,
wherein
[0053] said core substrate incorporates a core member and a resin
insulating layer formed on each of two sides of said core member
and having a roughened surface, and
[0054] each of said through holes is constituted by providing a
metal film for a penetrating opening formed by a laser beam.
[0055] In claim 10, laser beams are used to form penetrating in a
core substrate constituted by a core member and resin insulating
layer formed on each of the two sides of the core member. Since the
penetrating openings are, by laser beams, formed in the core
substrate which is in a state where the metal film is formed, any
retention of an air bubble can be prevented when the metal films
are deposited in the penetrating openings to form the through
holes. Thus, any corner crack starting with a burr does not occur
and, therefore, the reliability in the connection of the through
holes can be improved. Since a rough surface is formed on the
surface of the core substrate, the adhesiveness with the metal film
constituting the through hole can be improved.
[0056] In claim 11, the core member is formed by causing the core
member to be impregnated with resin. Thus, the strength required
for the core substrate can be maintained.
[0057] In claim 12, the resin insulating layer is constituted by
dispersing soluble particles in refractory resin. Since soluble
particles are dissolved, a rough surface can be formed on the
surface of the core substrate. Therefore, the adhesiveness of the
metal film which is formed on the surface of the core substrate and
which constitutes the through hole can be improved.
[0058] In claim 13, the resin insulating layer is composed of
soluble resin and refractory resin. Since the soluble resin is
dissolved, a rough surface can be formed on the surface of the core
substrate. Thus, the adhesiveness of the metal film which is formed
on the surface of the core substrate can be improved.
[0059] According to the invention recited in claim 14, a method of
manufacturing a printed circuit board comprises at least the
following steps (A) to (D):
[0060] (A) laminating a resin insulating layer on each of two sides
of a core member to form a core substrate;
[0061] (B) forming penetrating openings in said core substrate by
applying laser beams;
[0062] (C) forming a rough surface on said core substrate; and
[0063] (D) providing a metal film for each penetrating opening to
form through holes.
[0064] In claim 14, penetrating openings are, by laser beams,
formed in a core substrate composed of a core member and a resin
insulating layer formed on each of the two sides of the core
member. Then, a rough surface is formed on the surface of the core
substrate, and then a metal film is formed in the penetrating
opening. Thus, through holes are formed. The laser beams are used
to form the penetrating openings in the core substrate which is in
a state before the metal film is formed. Therefore, when the metal
film is deposited in each penetrating opening to form the through
holes or when the through hole is filled with a filler, retention
of any air bubble can be prevented. Thus, any corner crack starting
with a burr does not formed and, therefore, reliability in the
connection of the through holes can be improved. Since the rough
surface is formed on the surface of the core substrate, the
adhesiveness with the metal film constituting the through hole can
be improved.
[0065] In claim 15, the core member is formed by causing the core
member to be impregnated with resin. Thus, the strength required
for the core substrate can be maintained.
[0066] A method of manufacturing a printed circuit board recited in
claim 16 comprises said resin insulating layer formed by dispersing
soluble particles in refractory resin. Soluble particles are
dissolved so that a rough surface is formed on the surface of the
core substrate. Thus, the adhesiveness of the metal film which is
formed on the surface of the core substrate can be improved.
[0067] To solve the above-mentioned problems, a multi-layer printed
circuit board resided in claim 17 comprises a core substrate having
through holes for connecting the upper and lower surfaces to each
other and having a structure that interlayer resin insulating
layers and conductor circuits are alternately laminated on said
core substrate, wherein
[0068] through holes having different diameters are formed in said
core substrate.
[0069] In an aspect claimed in claim 17, through holes having
different diameters are formed in the core substrate. Therefore,
the degree of freedom of the wiring density of the through holes
can be improved. Since through holes having small diameters serve
as power supply lines and ground lines, a multiplicity of power
supply lines and ground lines can be provided. Thus, an influence
of the inductance of the power supply lines and the ground lines
which is exerted on the IC chip can be reduced. As a result,
malfunction of the IC chip can prevented.
[0070] A multi-layer printed circuit board recited in claim 18
comprises a core substrate having through holes for connecting the
upper and lower surfaces to each other and having a structure that
interlayer resin insulating layers and conductor circuits are
alternately laminated on said core substrate, wherein
[0071] through holes each having a small diameter are mainly formed
in the central portion of said core substrate, and through holes
each having a large diameter are mainly formed in the outer
periphery.
[0072] A multi-layer painted circuit board recited in claim 19 is
characterized by said through holes each having the small diameter
are mainly provided with power supply lines and ground lines, and
said through holes each having the large diameter are mainly
provided with signal lines, according to claim 18.
[0073] In claims 18 and 19, through holes each having a small
diameter are formed in the central portion of the core substrate
and through holes each having a large diameter are formed in the
outer periphery. Therefore, the wiring density in the central
portion can be raised. Since the through holes formed in the
central portion and each having the small diameter serve as the
power supply line and the ground lines, a multiplicity of power
supply lines and ground lines can be provided. Moreover, the length
opening electric wires from the IC chip to an external substrate
can be shortened. Therefore, an influence of the inductance of the
power supply lines and the ground lines which is exerted on the IC
chip can be reduced. As a result, malfunction of the IC chip can be
prevented. Note that substitution of expression "immediately below"
for the "central portion" is permitted.
[0074] A method of manufacturing a multi-layer printed circuit
board recited in claim 20 comprises at least the following steps
(A) and (B);
[0075] (A) providing penetrating openings which are formed into
through holes and each of which has a small diameter for a core
substrate; and
[0076] (B) providing penetrating openings which are formed into
through holes each having a large diameter for said core
substrate.
[0077] In claim 20, penetrating openings serving as the through
holes and each having a small diameter and penetrating openings
each having a large diameter and serving as through holes are
formed in the core substrate. Therefore, a core substrate
exhibiting a high degree of freedom of the wiring density can be
manufactured with a low cost. Each through hole may be formed by
either of a laser beam or drilling. It is preferable that the
through hole having the small direction is formed by a laser beam.
The laser beam may be a carbon dioxide gas laser beam, excimer
laser beam, a YAG laser beam or an UV layer. As an alternative to
this, an area process using a mask having penetrating opening
formed therein or combination of two or more types of laser beams
may be employed.
[0078] A method of manufacturing a multi-layer printed circuit
board recited in claim 21 comprises at least the following steps
(A) and (B):
[0079] (A) irradiating the central portion of a core substrate with
laser beams or drilling the central portion to form penetrating
openings which are formed into through holes and each of which has
a small diameter; and
[0080] (B) irradiating the central portion of said core substrate
with laser beams or drilling the central portion to form
penetrating openings which are formed into through holes and each
of which has a large diameter.
[0081] A method of manufacturing a multi-layer printed circuit
board recited in claim 22 is characterized by said through holes
each having the small diameter are mainly provided with power
supply lines and ground lines, and said through holes each having
the large diameter are mainly provided with signal lines, according
to claim 21.
[0082] In aspects claimed in claims 20 and 21, through holes each
having a small direction are formed in the central portion of the
core substrate by laser beams or by drilling and through holes each
having a large diameter are formed in the outer periphery by
drilling or a laser beam. Therefore, a core substrate having a high
degree of freedom of the wiring density can be formed in the
central portion with a low cost. When the through holes each having
the small diameter and formed in the central portion serve as the
power supply lines and the ground lines, a multiplicity of power
supply line and ground lines can be formed. Moreover, the length of
each electric wire from the IC chip to the external substrate can
be shortened. Therefore, an influence of the inductance of the
power supply lines and the ground lines which is exerted on the IC
chip can be reduced. As a result, malfunction of the IC chip can be
prevented. The through holes each having the large diameter and a
low probability of occurrence of a defect in the connection are
mainly used as signal lines. Moreover, the through holes each
having the small diameter and having a high probability of a defect
in the connection are mainly used s the power supply line and the
ground lines. Therefore, in a case where the through holes serving
as the power supply line and the ground lines encounters
disconnection, the multi-layer printed circuit board is able to
continue a normal operation.
[0083] A printed circuit board and a method of manufacturing said
printed circuit board recited in claim 23 comprises a core
substrate having the surface on which resin insulating layers and
conductor circuits are alternately built up, wherein
[0084] said core substrate is constituted by forming openings in a
resin plate by applying laser beams and by forming a sputtered
layer on said resin plate by sputtering which is performed after
said openings have been formed.
[0085] A printed circuit board and a method of manufacturing said
printed circuit board recited in claim 24 comprises at least the
following steps (A) to (F):
[0086] (A) forming openings in a resin plate which is formed into a
core substrate by applying laser beams;
[0087] (B) performing sputtering to form a sputtered layer on said
resin plate;
[0088] (C) performing electroless plating through said sputtered
layer;
[0089] (D) forming a resist having a predetermined pattern after
said electroless plating has been performed;
[0090] (E) performing electroplating to form an electroplated layer
in a portion in which said resist is not formed; and
[0091] (F) performing etching after said resist has been removed to
remove said sputtered layer and said electroless plated layer below
said resist so as to form a conductor circuit.
[0092] The foregoing process (a) may be performed by using one type
of the laser beam or a mixed laser beam of two or more laser
beams.
[0093] A printed circuit board and a method of manufacturing said
printed circuit board recited in claim 25 is characterized by a
carbon dioxide laser process, an excimer laser process, a YAG laser
process and an UV laser process, when said openings are formed in
said resin plate by applying laser beams.
[0094] A printed circuit board and a method of manufacturing said
printed circuit board recited in claim 26 is characterized in that
at least one type of materials selected from Cu, Ni, Cr, Pd and Mo,
is employed, when said sputtered layer is formed on said resin
plate by sputtering.
[0095] A printed circuit board and a method of manufacturing a
printed circuit board claimed in claims 23 to 26 have a structure
that the resin plate has openings formed by CO.sub.2 laser beams
(YAG laser beams, excimer laser beams or UV laser beams).
Therefore, penetrating openings each having a smaller diameter as
compared with that of each of penetrating openings formed by
drilling can be formed. As distinct from a structure that openings
are formed in a copper-clad laminated board by laser beams, leaving
of copper in the through hole which causes a plated film formed in
the through hole to be separated can be prevented. Moreover, time
required to form the openings can be shortened. The openings are
formed in the resin plate by using laser beams, and then one or
more elements selected from Cu, Ni, Cr, Pd and Mo is brought into
contact with the resin. Therefore, strength between the sputtered
layer and the resin of 1.0 kg/cm.sup.2 can be realized which is
substantially the same as that realized by the conventional
copper-clad laminated board.
BRIEF DESCRIPTION OF DRAWINGS
[0096] FIGS. 1 (A), 1 (B), 1 (C), 1 (D) and 1 (E) are diagrams
showing a process for manufacturing a multi-layer printed circuit
board according to a first embodiment of the present invention;
[0097] FIGS. 2 (A), 2 (B), 2 (C) and 2 (D) are diagrams showing a
process for manufacturing a multi-layer printed circuit board
according to the first embodiment;
[0098] FIGS. 3 (A), 3 (B) and 3 (C) are diagrams showing a process
for manufacturing a multi-layer printed circuit board according to
the first embodiment;
[0099] FIGS. 4 (A) and 4 (B) are diagrams showing a process for
manufacturing a multi-layer printed circuit board according to the
first embodiment;
[0100] FIGS. 5 (A) and 5 (B) are diagrams showing a process for
manufacturing a multi-layer printed circuit board according to the
first embodiment;
[0101] FIG. 6 is a diagram showing the cross section of the
multi-layer printed circuit board according to the first
embodiment;
[0102] FIGS. 7 (A) and 7 (B) are diagrams showing a process for
manufacturing a multi-layer printed circuit board according to a
first modification of the first embodiment;
[0103] FIGS. 8(A), 8(B) and 8(C) are diagrams showing a process for
manufacturing a multi-layer printed circuit board according to a
second modification of the first embodiment;
[0104] FIGS. 9 (A), 9 (B) and 9 (C) are diagrams showing a process
for manufacturing a multi-layer printed circuit board according to
a third modification of the first embodiment;
[0105] FIGS. 10 (A) and 10 (B) are plan views showing a copper-clad
laminated board constituting the multi-layer printed circuit board
according to third modification of the first embodiment;
[0106] FIG. 11 is a diagram showing a process for manufacturing a
multi-layer printed circuit board according to a fourth
modification of the first embodiment;
[0107] FIGS. 12 (A), 12 (B), 12 (C) and 12 (D) are diagrams showing
a process for manufacturing a multi-layer printed circuit board
according to a second embodiment;
[0108] FIGS. 13 (A), 13 (B), 13 (C) and 13 (D) are diagrams showing
a process for manufacturing the multi-layer printed circuit board
according to the second embodiment;
[0109] FIGS. 14 (A), 14 (B) and 14 (C) are diagrams showing a
process for manufacturing the multi-layer printed circuit board
according to the second embodiment;
[0110] FIGS. 15 (A), 15 (B) and 15 (C) are diagrams showing a
process for manufacturing the multi-layer printed circuit board
according to the second embodiment;
[0111] FIGS. 16 (A) and 16 (B) are diagrams showing a process for
manufacturing the multi-layer printed circuit board according to
the second embodiment;
[0112] FIGS. 17 (A) and 17 (B) are diagrams showing a process for
manufacturing the multi-layer printed circuit board according to
the second embodiment;
[0113] FIG. 18 is a cross sectional view showing the multi-layer
printed circuit board according to the second embodiment;
[0114] FIGS. 19 (A), 19 (B) and 19 (C) are diagrams showing a
process for manufacturing a multi-layer printed circuit board
according to a first modification of the second embodiment;
[0115] FIGS. 20 (A), 20 (B) and 20 (C) are diagrams showing a
process for manufacturing the multi-layer printed circuit board
according to the first modification of the second embodiment;
[0116] FIGS. 21 (A), 21 (B) and 21 (C) are diagrams showing a
process for manufacturing the multi-layer printed circuit board
according to the first modification of the second embodiment;
[0117] FIGS. 22 (A) and 22 (B) are diagrams showing a process for
manufacturing the multi-layer printed circuit board according to
the first modification of the second embodiment;
[0118] FIG. 23 is a cross sectional view showing the multi-layer
printed circuit board according to the first modification of the
second embodiment;
[0119] FIG. 24 is a cross sectional view showing a multi-layer
printed circuit board according to a second modification of the
second embodiment;
[0120] FIG. 25 is a graph showing results of a heat cycle test of
the second embodiment;
[0121] FIGS. 26 (A), 26 (B), 26 (C), 26 (D) and 26 (E) are diagrams
showing a process for manufacturing a printed circuit board
according to a third embodiment;
[0122] FIGS. 27 (A), 27 (B), 27 (C) and 27 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the third embodiment;
[0123] FIGS. 28 (A), 28 (B), 28 (C) and 28 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the third embodiment;
[0124] FIGS. 29 (A), 29 (B), 29 (C) and 29 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the third embodiment;
[0125] FIGS. 30 (A), 30 (B), 30 (C) and 30 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the third embodiment;
[0126] FIGS. 31 (A) and 31 (B) are diagrams showing a process for
manufacturing the printed circuit board according to the third
embodiment;
[0127] FIG. 32 is a cross sectional view showing a printed circuit
board according to the third embodiment;
[0128] FIGS. 33 (A), 33 (B), 33 (C), 33 (D) and 33 (E) are diagrams
showing a process for manufacturing a printed circuit board
according to a first modification of the third embodiment;
[0129] FIGS. 34 (A), 34 (B), 34 (C) and 34 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the first modification of the third embodiment;
[0130] FIGS. 35 (A), 35 (B), 35 (C) and 35 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the first modification of the third embodiment;
[0131] FIGS. 36 (A), 36 (B), 36 (C) and 36 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the first modification of the third embodiment;
[0132] FIGS. 37 (A), 37 (B), 37 (C) and 37 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the first modification of the third embodiment;
[0133] FIGS. 38 (A) and 38 (B) are diagrams showing a process for
manufacturing the printed circuit board according to the first
modification of the third embodiment;
[0134] FIG. 39 is a cross sectional view showing the printed
circuit board according to the first modification of the third
embodiment;
[0135] FIGS. 40 (A), 40 (B), 40 (C) and 40 (D) are diagrams showing
a process for manufacturing a printed circuit board according to a
fourth embodiment;
[0136] FIGS. 41 (A), 41 (B), 41 (C) and 41 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the fourth embodiment;
[0137] FIGS. 42 (A), 42 (B), 42 (C) and 42 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the fourth embodiment;
[0138] FIGS. 43 (A), 43 (B) and 43 (C) are diagrams showing a
process for manufacturing the printed circuit board according to
the fourth embodiment;
[0139] FIGS. 44 (A), 44 (B) and 44 (C) are diagrams showing a
process for manufacturing the printed circuit board according to
the fourth embodiment;
[0140] FIGS. 45 (A) and 45 (B) are diagrams showing a process for
manufacturing the printed circuit board according to the fourth
embodiment;
[0141] FIG. 46 is across sectional view showing the multi-layer
printed circuit board according to the fourth embodiment;
[0142] FIG. 47 is a cross sectional view showing the multi-layer
printed circuit board according to the fourth embodiment;
[0143] FIG. 48 (A) is a diagram showing wiring of electric lines in
a core substrate according to the fourth embodiment and FIG. 48 (B)
is a plan view showing the core substrate;
[0144] FIG. 49 is a diagram showing a carbon dioxide gas laser unit
for forming openings in the multi-layer printed circuit board
according to the fourth embodiment;
[0145] FIGS. 50 (A), 50 (B), 50 (C) and 50 (D) are diagrams showing
a process for manufacturing a printed circuit board according to a
first modification of the fourth embodiment;
[0146] FIGS. 51 (A), 51 (B), 51 (C) and 51 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the first modification of the fourth embodiment;
[0147] FIGS. 52 (A), 52 (B), 52 (C) and 52 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the first modification of the fourth embodiment;
[0148] FIGS. 53 (A), 53 (B) and 53 (C) are diagrams showing a
process for manufacturing the printed circuit board according to
the first modification of the fourth embodiment;
[0149] FIGS. 54 (A), 54 (B) and 54 (C) are diagrams showing a
process for manufacturing the printed circuit board according to
the first modification of the fourth embodiment;
[0150] FIGS. 55 (A), 55 (B) and 55 (C) are diagrams showing a
process for manufacturing the printed circuit board according to
the first modification of the fourth embodiment;
[0151] FIG. 56 is a cross sectional view showing the multi-layer
printed circuit board according to the first modification of the
fourth embodiment;
[0152] FIG. 57 is a cross sectional view showing a core substrate
of a multi-layer printed circuit board according to a second
modification of the fourth embodiment;
[0153] FIGS. 58 (A), 58 (B), 58 (C) and 58 (D) are diagrams showing
a process for manufacturing a printed circuit board according to a
fifth embodiment;
[0154] FIGS. 59 (A), 59 (B), 59 (C) and 59 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the fifth embodiment;
[0155] FIGS. 60 (A), 60 (B), 60 (C) and 60 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the fifth embodiment;
[0156] FIGS. 61 (A), 61 (B), 61 (C) and 61 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the fifth embodiment;
[0157] FIGS. 62 (A), 62 (B), 62 (C) and 62 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the fifth embodiment;
[0158] FIGS. 63 (A) and 63 (B) are diagrams showing a process for
manufacturing the printed circuit board according to the fifth
embodiment;
[0159] FIGS. 64 (A) and 64 (B) are diagrams showing a process for
manufacturing the printed circuit board according to the fifth
embodiment;
[0160] FIG. 65 is across sectional view showing the multi-layer
printed circuit board according to a fifth embodiment;
[0161] FIGS. 66 (A), 66 (B), 66 (C) and 66 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the fifth embodiment;
[0162] FIGS. 67 (A), 67 (B), 67 (C) and 67 (D) are diagrams showing
a process for manufacturing the printed circuit board according to
the fifth embodiment;
[0163] FIGS. 68 (A) and 68 (B) are diagrams showing a process for
manufacturing the printed circuit board according to the fifth
embodiment;
[0164] FIG. 69 is a cross sectional view showing a multi-layer
printed circuit board according to a second modification of the
fifth embodiment;
[0165] FIGS. 70 (A), 70 (B), 70 (C) and 70 (D) are diagrams showing
a process for manufacturing a conventional printed circuit
board.
BEST MODE FOR CARRYING OUT THE INVENTION
First Embodiment
[0166] The structure of a multi-layer printed circuit board
according to a first embodiment of the present invention will now
be described with reference to FIG. 6 which is a cross sectional
view.
[0167] As shown in FIG. 6, a multi-layer printed circuit board 10
incorporates a core substrate 30 having right and reverse sides on
which conductor circuits 34 are formed. Moreover, interlayer resin
insulating layers 40 are formed on the conductor circuits 34. Vias
52 and conductor circuit 54 are formed on the interlayer resin
insulating layers 40. Solder resists 60 are formed above the
interlayer resin insulating layers 40. Solder bumps 68 are formed
on the vias 52 and conductor circuits 54 through openings 62 of the
solder resists 60.
[0168] The multi-layer printed circuit board according to this
embodiment incorporate the core substrate 30 is constituted such
that a lower insulating layer 14 and an upper insulating layer 20
sandwich a metal layer (a circuit pattern) 18. Vias 32 are formed
to vertically correspond to each other through the circuit pattern
18 so that each through hole 36 is formed. On the other hand the
upper and lower vias 32 across the circuit pattern 18 are deviated
from each other so that each electric line is wired through the
circuit pattern 18.
[0169] In the first embodiment, the metal layer (the circuit
pattern) 18 is sandwiched by resins (insulating layers) 20 and 14
so that strength is maintained. Thus, the thickness of the core
substrate 30 can be reduced. Hence it follows that the thickness of
the multi-layer printed circuit board can be reduced and the
thermal conductivity can be improved.
[0170] In the first embodiment, non-penetrating openings 22 which
reach the metal layer 18 are formed in the lower insulating layer
14 and the upper insulating layer 20 of the core substrate 30 by a
laser process and filled with plating so that the vias 32 are
formed. Since the non-penetrating openings 22 which reach the metal
layer 18 are simply required to be formed in the lower insulating
layer 14 and the upper insulating layer 20, the depth of each
penetrating opening which is formed by a laser beam can be halved
as compared with a conventional core substrate. That is, the
conventional technique is required to form the penetrating opening
serving as the through hole such that the thickness of the
penetrating opening corresponds to the total thickness of the lower
insulating layer 14 and the upper insulating layer 20. On the other
hand, this embodiment is permitted to individually form the
penetrating opening in each of the lower insulating layer 14 and
the upper insulating layer 20. Therefore, the depth of each
penetrating opening is halved. Therefore, fine non-penetrating
openings can easily be formed by using laser beams. Hence it
follows that through holes each having a small diameter can be
formed. Thus, the degree of integration of the multi-layer printed
circuit board can be raised.
[0171] Since the core substrate 30 has a multilayer structure,
electric wires can be wired in each metal layer (the circuit
pattern) 18 between the lower insulating layer 14 and the upper
insulating layer 20 constituting the core substrate. Therefore, the
number of the layers of the multi-layer printed circuit board can
be reduced.
[0172] A method of manufacturing the above-mentioned multi-layer
printed circuit board described with reference to FIG. 6 will now
be described with reference to FIGS. 1 to 5.
[0173] (1) A one-side copper-clad plate 10 incorporating a
substrate (the lower insulating layer) 14 which is constituted by
resin having a thickness of 30 .mu.m to 300 .mu.m and on which
copper foil 12 having a thickness of 5 .mu.m to 50 .mu.m is
laminated is employed as a starting material (FIG. 1 (A)). The
lower insulating layer 14 is constituted by a glass cloth or an
aramid cloth impregnated with epoxy, BT (Bismaleimide-Triazine),
polyimide or olefin. As an alternative to this, resin having no
core member, such as the glass cloth or the aramid cloth, or a
resin film having a reinforcing resin layer laminated thereon may
be employed.
[0174] Initially, the one-side copper-clad plate 10 is etched
according to a pattern so that a circuit pattern 18 is formed on
the upper surface of the substrate 14 (FIG. 1 (B)). Then, a film 20
a constituted by resin having a thickness of 30 .mu.m to 300 .mu.m
is bonded to the upper surface of the circuit pattern 18 by
pressing (FIG. 1 (C)). The resin film 20.alpha. may be constituted
by the above-mentioned glass cloth or the aramid cloth impregnated
with epoxy, BT (Bismaleimide-Triazine), polyimide or olefin. As an
alternative to this, resin having no core member, such as the glass
cloth or the aramid cloth may be employed. That is, the lower
insulating layer 14 and the upper insulating layer 20 may be
constituted by the same material or different materials. It is
preferable that the same material and the same structure (whether
or not the core member is provided) are employed as the
characteristics of the multi-layer printed circuit board. When
different materials and different structures are employed, more
various materials can be selected. When the lower insulating layer
14 and the upper insulating layer 20 are constituted by the resin
having the core member made of the glass cloth or the aramid cloth,
the strength of the core substrate 30 can be increased. When the
core member is not used, metal migration through the core member
can be prevented. Thus, the insulating characteristic between
through holes can be maintained for a long time. Although the resin
film is bonded in this embodiment, resin may be applied and the
resin is hardened as a substitute for the resin film. The rough
surface may be formed on the circuit pattern. The rough surface may
be formed by oxidizing/reducing process, etching or electroless
plating. The rough surface can improve the adhesiveness.
[0175] Then, the resin film 20.alpha. is heated and hardened so
that the upper insulating layer 20 is formed. Then, CO.sub.2 laser,
YAG laser or excimer laser is used to form the non-penetrating
opening 22 which reaches the circuit pattern 18 and having a
diameter of 50 .mu.m and 250 .mu.m is formed in the upper
insulating layer 20 and the lower insulating layer 14 (FIG. 1 (D)).
The range of 75 to 150 is desirable. Since this embodiment has the
structure that each of the upper insulating layer 20 and the lower
insulating layer 14 has the small thickness of 30 .mu.m to 200
.mu.m, fine openings can be formed by applying laser beams.
[0176] Then, a desmear process is performed, and then a palladium
catalyst is supplied. Then, the core substrate 30 is immersed in
electroless plating solution so that an electroless plated film 24
having a thickness of 15 .mu.m is uniformly deposited on the
surface of the core substrate 30 (FIG. 1 (E)). Although the
electroless plating is employed in this embodiment, a metal film
made of copper or nickel may be formed by sputtering. Although
sputtering is disadvantage from a viewpoint of cost reduction, the
sputtering has an advantage that the adhesiveness with the resin
can be improved.
[0177] Then, a photosensitive dry film is bonded to the surface of
the core substrate 30, and then a mask is placed to form exposure
and development processes. Thus, a plating resist 26 having a
thickness of 15 .mu.m is formed (FIG. 2 (A)). Then, the core
substrate 30 is immersed in electroless plating solution, and then
an electric current is supplied through the electroless plated film
24 so that an electroplating 28 is formed in a portion in which the
resist 26 is not formed. At this time, the surface of the
non-penetrating opening 22 is flattened by enclosing the
electroplating 28 (FIG. 2 (B)).
[0178] Then, the resist 26 is separated and removed with 5% KOH,
and then etching is performance by using a mixed solution of
sulfuric acid and hydrogen peroxide so that the electroless plated
film 24 below the resist is dissolved and removed. Thus, the
conductor circuits 34 composed of the electroless plated film 24
and the electroplating 28 and having a thickness of 18 .mu.m (10
.mu.m to 30 .mu.m) and the vias 32 are obtained (FIG. 2 (C)). In
the first embodiment, the vias 32 are formed to correspond to each
other across the circuit pattern 18 so that the through hole 36 is
formed. On the other hand, the positions of the upper and lower
vias 32 across the circuit pattern 18 are deviated from each other,
electric lines are wired through the circuit pattern 18.
[0179] Moreover, the core substrate 30 is immersed in chromic acid
for 3 minutes to perform a process for etching the surface of the
core substrate 30 between the conductor circuits 34 by 1 .mu.m so
as to remove the palladium catalyst on the surface. Then, etching
solution containing a cupric salt complex and an organic acid is
used to form a rough surface (not shown) on the surface of each of
the conductor circuit 34 and the via 32. Then, the surfaces is
subjected to Sn substitution.
[0180] A thermosetting resin 36.alpha. made of epoxy, BT, polyimide
or olefin is applied to the surface of the core substrate 30, and
then the core substrate 30 is dried (pre-baked) (FIG. 2 (D)). Then,
CO.sub.2 laser, YAG laser or excimer laser is used to form
non-penetrating openings 42 which reach the conductor circuit 34
and the via 32 and each having a diameter of 100 .mu.m to 250
.mu.m. Then, heating is performed so that the interlayer resin
insulating layers 40 each having the non-penetrating opening 42 is
formed (FIG. 3 (A)). The interlayer resin insulating layer may be
made of the resin which is the same as the resin constituting the
lower insulating layer 14 and the upper insulating layer 20. As an
alternative to this, different resin may be employed. A mixed
material of thermosetting resin and thermoplastic resin may be
employed as a substitute for the thermosetting resin. Moreover, a
filler made of silicon or resin may be mixed. When a soluble filler
is mixed and the filler is dissolved with a chemicals solution, the
surface of the interlayer resin insulating layer can be roughened.
Although the resin is applied in this embodiment, a resin film may
be employed similarly to the upper insulating layer 20. In the
embodiment, it is desirable that the interlayer resin insulating
layer does not have a core part and has a high coefficient of
thermal expansion. Thus, a via can be easily made.
[0181] The resin film contains refractory resin, soluble particles,
a hardening agent and other components. The materials will now be
described.
[0182] The thermosetting resin film for use in the resin insulating
layer in the manufacturing method according to the present
invention has a structure that particles soluble in acid or an
oxidizer (hereinafter called "soluble particles") are dispersed in
resin which is refractory with respect to acid or an oxidizer
(hereinafter called "refractory resin").
[0183] The expressions "refractory" and "soluble" will now be
described. When materials are immersed in solution composed of the
same acid or the same oxidizers for the same time, a material of a
type which is dissolved at a relatively high dissolving rate is
called a "soluble" material for convenience. A material of a type
which is dissolved at a relatively slow dissolving rate is called a
"refractory material" for convenience.
[0184] The soluble particles are exemplified by resin particles
which are soluble in acid or an oxidizer (hereinafter called
"soluble resin particles"), inorganic particles which are soluble
in acid or an oxidizer (hereinafter called "inorganic soluble
particles") and metal particles which are soluble in acid or an
oxidizer (hereinafter called "soluble metal particles"). The
foregoing soluble particles may be employed solely or two or more
particles may be employed.
[0185] The shape of each of the soluble particles is not limited.
The shape may be a spherical shape or a pulverized shape. It is
preferable that the particles have a uniform shape. The reason for
this lies in that a rough surface having uniformly rough pits and
projections can be formed.
[0186] It is preferable that the mean particle size of the soluble
particles is 0.1 .mu.m to 10 .mu.m. When the particles have the
diameters satisfying the foregoing range, particles having two or
more particle sizes may be employed. That is, soluble particles
having a mean particle size of 0.1 .mu.m to 0.5 .mu.m and soluble
particles having a mean particle size of 1 .mu.m to 3 .mu.mm may be
mixed. Thus, a more complicated rough surface can be formed.
Moreover, the adhesiveness with the conductor circuit can be
improved. In the present invention, the particle size of the
soluble particles is the length of a longest portion of each of the
soluble particles.
[0187] The soluble resin particles may be particles constituted by
thermosetting resin or thermoplastic resin. When the particles are
immersed in solution composed of acid or an oxidizer, the particles
must exhibit dissolving rate higher than that of the foregoing
refractory resin.
[0188] Specifically, the soluble resin particles are exemplified by
particles constituted by epoxy resin, phenol resin, polyimide
resin, polyphenylene resin, polyolefin resin or fluorine resin. The
foregoing material may be employed solely or two or more materials
may be mixed.
[0189] The soluble resin particles may be resin particles
constituted by rubber. Rubber above is exemplified by polybutadiene
rubber, a variety of denatured polybutadiene rubber, such as
denatured epoxy rubber, denatured urethane rubber or denatured
(metha) acrylonitrile rubber, and (metha) acrylonitrile butadiene
rubber containing a carboxylic group. When the foregoing rubber
material is employed, the soluble resin particles can easily be
dissolved in acid or an oxidizer. That is, when the soluble resin
particles are dissolved with acid, dissolution is permitted with
acid except for strong acid. When the soluble resin particles are
dissolved, dissolution is permitted with permanganate which has a
relatively weak oxidizing power. When chromic acid is employed,
dissolution is permitted even at a low concentration. Therefore,
retention of the acid or the oxidizer on the surface of the resin
can be prevented. When a catalyst, such as palladium chloride, is
supplied after the rough surface has been formed as described
later, inhibition of supply of the catalyst and oxidation of the
catalyst can be prevented.
[0190] The inorganic soluble particles are exemplified by particles
made of at least a material selected from a group consisting of an
aluminum compound, a calcium compound, a potassium compound, a
magnesium compound and a silicon compound.
[0191] The aluminum compound is exemplified by alumina and aluminum
hydroxide. The calcium compound is exemplified by calcium carbonate
and calcium hydroxide. The potassium compound is exemplified by
potassium carbonate. The magnesium compound is exemplified by
magnesia, dolomite and basic magnesium carbonate. The silicon
compound is exemplified by silica and zeolite. The foregoing
material may be employed solely or two or more materials may be
mixed.
[0192] The soluble metal particles are exemplified by particles
constituted by at least one material selected from a group
consisting of copper, nickel, iron, zinc, lead, gold, silver,
aluminum, magnesium, potassium and silicon. The soluble metal
particles may have surfaces coated with resin or the like in order
to maintain an insulating characteristic.
[0193] When two or more types of the soluble particles are mixed,
it is preferable that the combination of the two types of soluble
particles is combination of resin particles and inorganic
particles. Since each of the particles has low conductivity, an
insulating characteristic with the resin film can be maintained.
Moreover, the thermal expansion can easily be adjusted with the
refractory resin. Thus, occurrence of a crack of the interlayer
resin insulating layer constituted by the resin film can be
prevented. Thus, separation between the interlayer resin insulating
layer and the conductor circuit can be prevented.
[0194] The refractory resin is not limited when the resin is able
to maintain the shape of the rough surface when the rough surface
is formed on the interlayer resin insulating layer by using acid or
oxidizer. The refractory resin is exemplified by thermosetting
resin, thermoplastic resin and their composite material. As an
alternative to this, the foregoing photosensitive resin of a type
having photosensitive characteristic imparted thereto may be
employed. When the photosensitive resin is employed, exposure and
development processes of the interlayer resin insulating layers can
be performed to form the openings for the via holes.
[0195] In particular, it is preferable that the resin containing
thermosetting resin is employed. In the foregoing case, the shape
of the rough surface can be maintained against plating solution and
when a variety of heating processes are performed.
[0196] The refractory resin is exemplified by epoxy resin, phenol
resin, phenoxy resin, polyimide resin, polyphenylene resin,
polyolefin resin and fluorine resin. The foregoing material may be
employed solely or two or more types of the materials may be
mixed.
[0197] It is preferable that epoxy resin having two or more epoxy
groups in one molecule thereof is employed. The reason for this
lies in that the foregoing rough surface can be formed. Moreover,
excellent heat resistance and the like can be obtained. Thus,
concentration of stress onto the metal layer can be prevented even
under a heat cycle condition. Thus, occurrence of separation of the
metal layer can be prevented.
[0198] The epoxy resin is exemplified by cresol novolac epoxy
resin, bisphenol-A epoxy resin, bisphenol-F epoxy resin, phenol
novolac epoxy resin, alkylphenol novolac epoxy resin, biphenol-F
epoxy resin, naphthalene epoxy resin, dicyclopentadiene epoxy
resin, an epoxy material constituted by a condensation material of
phenol and an aromatic aldehyde having a phenol hydroxyl group,
triglycidyl isocyanurate and alicyclic epoxy resin. The foregoing
material may be employed solely or two or more material may be
mixed. Thus, excellent heat resistance can be realized.
[0199] It is preferable that the soluble particles in the resin
film according to the present invention are substantially uniformly
dispersed in the refractory resin. The reason for this lies in that
a rough surface having uniform pits and projections can be formed.
When via holes and through holes are formed in the resin film,
adhesiveness with the metal layer of the conductor circuit can be
maintained. As an alternative to this, a resin film containing
soluble particles in only the surface on which the rough surface is
formed may be employed. Thus, the portions of the resin film except
for the surface is not exposed to acid or the oxidizer. Therefore,
the insulating characteristic between conductor circuits through
the interlayer resin insulating layer can reliably be
maintained.
[0200] It is preferable that the amount of the soluble particles
which are dispersed in the refractory resin is 3 wt % to 40 wt %
with respect to the resin film. When the amount of mixture of the
soluble particles is lower than 3 wt %, the rough surface having
required pits and projections cannot be formed. When the amount is
higher than 90 wt %, deep portions of the resin film are
undesirably dissolved when the soluble particles are dissolved by
using acid or the oxidizer. Thus, the insulating characteristic
between the conductor circuits through the interlayer resin
insulating layer constituted by the resin film cannot be
maintained. Thus, short circuit is sometimes is caused to
occur.
[0201] It is preferable that the resin film contains a hardening
agent and other components as well as the refractory resin.
[0202] The hardening agent is exemplified by an imidazole hardening
agent, an amine hardening agent, a guanidine hardening agent, an
epoxy adduct of each of the foregoing hardening agents, a
microcapsule of each of the foregoing hardening agents and an
organic phosphine compound, such as triphenylphosphine or
tetraphenyl phosphonium tetraphenyl borate.
[0203] It is preferable that the content of the hardening agent is
0.05 wt % to 10 wt % with respect to the resin film. When the
content is lower than 0.05 wt %, the resin film cannot sufficiently
be hardened. Thus, introduction of acid and the oxidizer into the
resin film occurs greatly. In the foregoing case, the insulating
characteristic of the resin film sometimes deteriorates. When the
content is higher than 10 wt %, an excessively large quantity of
the hardening agent component sometimes denatures the composition
of the resin. In the foregoing case, the reliability sometimes
deteriorates.
[0204] The other components are exemplified by an inorganic
compound which does not exert an influence on the formation of the
rough surface and a filler constituted by resin. The inorganic
compound is exemplified by silica, alumina and dolomite. The resin
is exemplified by polyimide resin, polyacrylic resin,
polyamideimide resin, polyphenylene resin, melanine resin and
olefin resin. When any one of the foregoing fillers is contained,
conformity of the thermal expansion coefficients can be
established. Moreover, heat resistance and chemical resistance can
be improved. As a result, the performance of the printed circuit
board can be improved.
[0205] The resin film may contain solvent. The solvent is
exemplified by ketone, such as acetone, methylethylketone or
cyclohexane; aromatic hydrocarbon, such as ethyl acetate, butyl
acetate, cellosolve acetate, toluene or xylene. The foregoing
material may be employed solely or two or more materials may be
mixed.
[0206] Then, a desmear process is performed, and then a palladium
catalyst is supplied, and then immersion into electroless plating
solution is performed so that an electroless plated film 44 having
a thickness of 15 .mu.m is uniformly deposited on the surface of
the interlayer resin insulating layers 90 (FIG. 3 (B)).
[0207] Then, a plating resist 46 is formed on the surface of the
electroless plated film 44 (FIG. 3 (C)). Then, an electroplating 48
is formed on a portion in which the resist 46 is not formed (FIG. 4
(A)).
[0208] Then, the resist 46 is separated and removed, and then
etching is performed so that the electroless plated film 42 below
the plating resist is dissolved and removed. Thus, a conductor
circuit 54 composed of the electroless plated film 42 and the
electroplating 48 and having a thickness of 18 .mu.m (10 .mu.m to
30 .mu.m) and vias 52 are obtained (FIG. 4 (B)). Then, a rough
layer (not shown) is formed on the surface of each of the conductor
circuit 54 and the vias 52.
[0209] Then, solder bumps are formed on the above-mentioned
multi-layer printed circuit board. Initially, 46.67 g of oligomer
(having a molecular weight of 4000) which is obtained by forming
50% of epoxy groups of 60 wt % cresol novolac epoxy resin
(manufactured by Nippon Kayaku) dissolved in DMDG into an acrylic
structure and which imparts photosensitive characteristic, 15.0 g
of 80 wt % bisphenol A epoxy resin (Epicoat 1001 manufactured by
Yuka Shell) dissolved in methylethyl ketone, 1.6 g of imidazole
hardening material (2E4MZ-CN manufactured by Shikoku Chemicals), 3
g of polyhydric acryl monomer which is a photosensitive monomer
(R604 manufactured by Nippon Kayaku), 1.5 g of polyhydric acryl
monomer (DPE6A manufactured by Kyoei Chemical) and 0.71 g of
dispersing defoaming agent (S-65 manufactured by Sannopuko) were
mixed with one another. Then, 2 g of benzophenone (manufactured by
Kanto Chemical) serving as a photoinitiator and 0.2 g of Michler's
ketone (manufactured by Kanto Chemical) serving as a
photosensitizer were added. Then, the viscosity was adjusted to 2.0
Pas at 25.degree. C. so that a solder resist composition was
obtained.
[0210] Note that the viscosity was measured by using No. 4 rotor of
a B-type viscometer (DVL-B manufactured by Tokyo Keiki (Tokimec))
when the velocity was 60 rpm and No. 3 rotor of the same when the
velocity was 6 rpm.
[0211] A solder resist composition 70.alpha. was applied to each
side of the multi-layer printed circuit board to have a thickness
of 20 .mu.m. Then, a drying process was performed at 70.degree. C.
for 20 minutes and 70.degree. C. for 30 minutes. Then, a photomask
film having a circular pattern (a mask pattern) drawn thereon and a
thickness of 5 mm was made hermetic contact and placed. Then,
exposure was performed with ultraviolet rays with 1000 mJ/cm.sup.2,
and then a DMTG development process was performed. Then, a heat
process was performed at 80.degree. C. for one hour, 100.degree. C.
for one hour, 120.degree. C. for one hour and 150.degree. C. for
three hours. Thus, a solder resist layer (having a thickness of 20
mm) 60 having the opening 62 (having a diameter of 200 .mu.m)
formed in the solder pad portions (including the via holes and
their land portions) was formed (FIG. 5 (A)).
[0212] Then, immersion in electroless nickel plating solution
composed of 2.3.times.10.sup.-1 mol/l nickel chloride,
2.8.times.10.sup.-1 mol/l sodium hypophosphite and
1.6.times.10.sup.-1 mol/l sodium citrate and having pH=4.5 is
performed for 20 minutes. Thus, a metal layer 64 having a thickness
of 5 .mu.m is formed in the opening 62. Then, immersion in
electroless gold plating solution is performed which is composed of
7.6.times.10.sup.-3 mol/l gold potassium cyanide,
1.9.times.10.sup.-1 mol/l ammonia chloride, 1.2.times.10.sup.-1
mol/l sodium citrate and 1.7.times.10.sup.-1 mol/l sodium
hypophosphite is performed under condition of 80.degree. C. for 7.5
minutes. Thus, a gold plated layer 66 having a thickness of 0.03
.mu.m is formed on the metal layer 72 (FIG. 5 (B)).
[0213] Then, the opening 62 of the solder resist layer 60 is filled
with solder paste (not shown). Then, solder enclosed in the opening
62 is reflowed at 200.degree. C. so that solder bump (solder) 68 is
formed (see FIG. 6).
[0214] After the flux is cleaned, an apparatus incorporating a
rooter is operated to section and cut the substrate to have a
proper size. Then, a checker process is performed in which short
circuit and disconnection of the printed circuit board are
inspected so that a required printed circuit board is obtained.
First Modification of First Embodiment
[0215] A method of manufacturing a multi-layer printed circuit
board according to a first modification of the first embodiment
will now be described with reference to FIG. 7.
[0216] The first modification is arranged to perform the processes
according to the first embodiment shown in FIGS. 1 (A) and 1 (B).
In the first embodiment, the film 20 which is formed into the upper
insulating layer 20 is directly bonded in the process shown in FIG.
1 (C). In the first modification, as shown in FIG. 7 (A), resin 19
is applied to the upper surface of a circuit pattern 18. Then, the
resin is semi-dried until stage B is realized, and then the film 20
a is brought into hermetic contact by pressing (FIG. 7 (B)). The
core substrate according to the first modification is excellent in
the surface smoothness as compared with the first embodiment.
Second Modification of First Embodiment
[0217] A method of manufacturing a multi-layer printed circuit
board of a multi-layer printed circuit board according to a second
modification of the first embodiment will now be described with
reference to FIG. 8.
[0218] The second modification is arranged to perform a process
similar to that according to the first modification shown in FIG. 1
(A). In the first modification, the film 20 serving as the upper
insulating layer 20 is directly bonded to the resin 19 in the
process shown in FIG. 1 (B). On the other hand, the second
modification is arranged as shown in FIG. 8 (A) such that the resin
19 is applied to the surface of the circuit pattern 18. Then, the
resin is semi-hardened until a stage-B state is realized. Then,
buffing of the resin 19 is performed by means of belt sander
polishing using #600 belt sand-paper (manufactured by Sankyo
Chemical) so that the resin 19 is smoothed (FIG. 8 (B)). Then, a
heat process is performed so that the resin 19 is hardened. Then,
the film 20.alpha. is brought into hermetic contact by using a
press (FIG. 8 (C)). The core substrate according to the second
modification is excellent in the surface smoothness as compared
with the first modification.
[0219] In the second modification, the vias 32 and the conductor
circuits 34 are provided for the core substrate 30 (a process shown
in FIG. 2 (C)). The foregoing resin is applied and polished before
the resin 40.alpha. which is formed into the interlayer resin
insulating layer is applied (a process shown in FIG. 2 (D)) so that
the surfaces of the vias 32 and the conductor circuits 34 are
smoothed.
Third Modification of First Embodiment
[0220] A method of manufacturing a multi-layer printed circuit
board according to a third modification of the first embodiment
will now be described with reference to FIGS. 9 and 10.
[0221] In the third modification, a one-side copper-clad plate 110
incorporates the copper foil 12 which has a thickness (100 .mu.m)
smaller than that according to the first embodiment FIG. 9 (A)).
Initially, a mask is applied to the outer periphery of the one-side
copper-clad plate 110 so that etching is performed. Thus, the
thickness of the copper foil in the central portion is reduced to
about 30 .mu.m (FIG. 9 (B)). FIG. 10 (A) is a plan view showing the
one-side copper-clad plate 110 shown in FIG. 9 (B). FIG. 9 (B)
corresponds to a cross sectional view taken along X-X shown in FIG.
10 (A), that is, a portion adjacent to the right-hand end.
[0222] Then, the copper foil 12 is etched according to the pattern
so that the circuit pattern 18 is formed in the central portion
such that the copper foil 12 having the thickness of 100 .mu.m is
left (FIG. 9 (C)). FIG. 10 (B) is a plan view of the one-side
copper-clad plate 110 shown in FIG. 9 (C). As shown in the drawing,
the copper foil 12 is left in the outer periphery of the one-side
copper-clad plate 110. Moreover, 9 circuit patterns 70 are formed
on the inside of the copper foil 12. The circuit patterns 70 is a
set of circuit patterns 18 shown in FIG. 9 (C).
[0223] The one-side copper-clad plate 110 according to the third
modification permits 9 multi-layer printed circuit boards to be
obtained. The following process is performance so that the
interlayer resin insulating layer, the circuits and so forth are
formed similarly to the first embodiment. Then, cutting is
performed so that the 9 multi-layer printed circuit boards are
formed. When the cutting process is performed, the residual outer
periphery of the copper foil 12 is discarded.
[0224] The multi-layer printed circuit board according to the third
modification has the thick copper foil 12 left in the outer
periphery of the lower insulating layer 14. Therefore, in a case
where the circuit pattern (the metal layer) 18, the lower
insulating layer 14 and the upper insulating layer 20 (the core
substrate) each having a small thickness are employed, warpage of
the core substrate does not occur in the manufacturing process.
Fourth Modification of First Embodiment
[0225] The structure of a multi-layer printed circuit board
according to a fourth modification of the first embodiment will now
be described with reference to FIG. 11.
[0226] The multi-layer printed circuit board according to the first
embodiment described with reference to FIG. 6 incorporates the
solder bumps 68 for connecting a daughter board, the solder bumps
68 being disposed on the lower surface of the multi-layer printed
circuit board. On the other hand, the fourth modification
incorporates conductive connection pins 78. Since the other
structure is similar to that of the multi-layer printed circuit
board described with reference to FIG. 6, the other structure is
omitted from description.
Second Embodiment
[0227] The structure of the multi-layer printed circuit board
according to a second embodiment of the present invention will now
be described with reference to FIG. 18 which is a cross sectional
view.
[0228] A multi-layer printed circuit board 210 according to the
second embodiment incorporates conductor circuit 234 formed on each
of the upper surface and the lower surface of a core substrate 230.
An interlayer resin insulating layer 250 is formed on each
conductor circuit 234. The lower interlayer resin insulating layer
250 has via holes 260 and conductor circuits 258. An upper
interlayer resin insulating layer 281 having via holes 285 is
formed on the lower interlayer resin insulating layer 250 which is
the upper layer. A solder resist layer 270 is formed on the surface
of the upper interlayer resin insulating layer 281 of the upper
layer and the lower interlayer resin insulating layer 250 which is
the lower layer.
[0229] Solder bumps 276U for establishing the connection with the
IC chip is disposed in the opening 271U of the solder resist layer
270 on the upper surface of the multi-layer printed circuit board
210. On the other hand, the package substrate has a bottom surface
on which the solder resist layer 270 is formed in which openings
271D are formed in which solder bumps 276D for establishing the
connection with the daughter board are disposed.
[0230] The solder bumps 276U are connected to through holes 236
through via holes 285 formed in the interlayer resin insulating
layer 281 and the via holes 260 formed in the interlayer resin
insulating layer 250. On the other hand, the solder bumps 276D are
connected to the through holes 236 through via holes 260 formed in
the interlayer resin insulating layer 250.
[0231] Each of the through holes 236 formed in the core substrate
230 incorporates a first electroplated layer 224, an electroless
plated film 226 and a second electroplated layer 228. Since the
through holes 236 are formed by enclosing plating, the strength of
the core substrate 230 can be increased. Thus, warpage does not
easily occur. Hence it follows that the thickness of the core
substrate can be reduced and the heat radiating characteristic of
the multi-layer printed circuit board can be improved. Since each
through hole 236 is formed by enclosing the first electroplated
layer 224, the electroless plated film 226 and the second
electroplated layer 228, insufficient enclosure in the through hole
can be prevented.
[0232] As described later, the multi-layer printed circuit board
according to the second embodiment incorporates the through holes
236 which are formed by laser beams. Therefore, through holes 236
each having a small diameter can be formed at short pitches. It
leads to a fact that a high degree of integration can be
realized.
[0233] A method of manufacturing a multi-layer printed circuit
board 210 shown in FIG. 18 will now be described with reference to
the drawings.
[0234] (1) A substrate 230 obtained by causing a glass cloth or an
aramid cloth to be impregnated with BT (Bismaleimide-Triazine)
resin, polyimide resin, olefin adjacent or polyphenol ether resin
is employed as a starting material (FIG. 12 (A)). It is preferable
that the thickness of the substrate 230 satisfies a range from 20
.mu.m to 800 .mu.m, more preferably 100 .mu.m to 500 .mu.m. The
reason for this lies in that the foregoing thickness enables the
strength required as the core substrate to be maintained. Thus,
non-penetrating openings can easily be formed by laser beams.
Although the core member is impregnated with the resin, resin
having no core member or resin obtained by laminating reinforcing
resin laser may be employed as a substitute for the foregoing
structure.
[0235] (2) A metal layer 222 having a thickness of 6 .mu.m to 20 mm
is formed on the lower surface of the substrate 230 by sputtering
(FIG. 12 (B)). The metal layer 222 may be made of copper, nickel,
chrome, cobalt or aluminum. It is preferable that copper or an
alloy mainly composed of copper is employed because the cost can be
reduced and electric resistance can be decreased. In this
embodiment, sputtering is employed which is excellent in the
adhesiveness with the substrate 230 constituted by resin and with
which the thickness can be reduced. As an alternative to this,
low-cost electroless plating or evaporation with which a thin metal
layer can be formed at a low cost may be employed. As an
alternative to this, electroplating may be performed after the
electroless plating, sputtering or the evaporation. As the core
substrate, a copper-clad laminated board incorporating laminated
copper foil may be employed. It is preferable that the thickness of
the metal layer 222 satisfies a range from 6 .mu.m to 20 .mu.m,
more preferably a range from 8 .mu.m to 15 .mu.m. Since the
foregoing thickness permits the strength to be maintained, warpage
can be prevented. Moreover, laser beam energy can be absorbed when
the non-penetrating openings are formed in the substrate 230 as
described later.
[0236] (3) Then, the substrate 230 is irradiated with carbon
dioxide laser beam through the surface in which the metal layer 222
is not formed so that non-penetrating openings 232 which reach the
metal layer 222 are formed (FIG. 12 (C)). It is preferable that the
diameter of each non-penetrating opening is 50 .mu.m to 250 .mu.m,
more preferably 75 .mu.m to 150 .mu.m. It is preferable that the
pitch is 400 .mu.m to 600 .mu.m. It is preferable that the radius
of each non-penetrating opening 232 has a small diameter to raise
the wiring density. However, the manufacturing yield deteriorates
in inverse proportion to the radius. Each non-penetrating opening
232 may be formed by the carbon dioxide laser or a mask having
penetrating openings may be placed on the substrate 230 to
collectively form the non-penetrating openings. Although the carbon
dioxide laser is employed because of a low cost and a large output
of the carbon dioxide laser, excimer, UV or YAG may be employed as
a substitute for the carbon dioxide laser. The foregoing lasers may
be mixed.
[0237] Then, acid or an oxidizer is used to perform a process for
desmearing the inside portion of each non-penetrating opening 232.
Then, oxygen, carbon tetrachloride or nitrogen may be used to
perform a dry process, such as a plasma process, a corona process
or an UV process so as to smooth the inner wall of each
non-penetrating opening 232.
[0238] (4) Then, a film 23 is brought into hermetic contact with
the metal film 20, and then the substrate 230 is immersed in
electrolytic copper plating solution to supply an electric current
through the metal layer 222 so as to form a first plated layer 224
on the inner surface of each non-penetrating opening 232 (FIG. 12
(D)). It is preferable that the first electroplated layer is formed
by copper plating with which electric resistance can be decreased.
As an alternative to this, nickel, chrome, cobalt or aluminum may
be employed.
[0239] (5) A metal film 226 having a thickness of 0.1 .mu.m to 10
.mu.m is formed on the upper surface of the substrate 230 by
electroless plating (FIG. 13 (A)). The metal layer may be made of
copper, nickel, chrome, cobalt or aluminum. It is preferable that
copper or an alloy mainly composed of copper is employed because
the cost can be reduced and the electric resistance can be
decreased. As an alternative to the electroless plating, sputtering
or evaporation excellent in the adhesiveness with the substrate 230
made of the resin may be employed. It is preferable that the
thickness of the metal film 226 satisfies a range from 0.1 .mu.m to
10 .mu.m. When the thickness satisfies the foregoing range, the
circuit can be formed in a case where etching is performed. It is
preferable that the thickness satisfies a range from 0.5 .mu.m to 5
.mu.m.
[0240] (6) The substrate 230 is immersed in electrolytic copper
plating solution to supply an electric current to the metal film
226 so that the non-penetrating opening 232 is filled with a second
plated layer 228 so that each through hole 236 is formed (FIG. 13
(B)). It is preferable that the electroplating is performed by
using the same metal as that for constituting the first plated
layer. As described above with reference to FIG. 18, it is
preferable that height H1 of the first plated layer 224 and height
H2 of the second plated layer 228 are substantially the same. When
the height are not same, it is desirable that the width of H2 is 5
to 100 .mu.m. Thus, the second plated layer is easily plated and
the flatness of the land can be improved. To smooth the surface of
the second plated layer 228, etching, buffing, belt-sander
polishing or jet scrub polishing with which abrasive grains are
sprayed may be performed.
[0241] (7) The film 23 is separated, and then etching resist is
applied according to a predetermined pattern so that patterning is
performed. Thus, a conductor circuit 234 is formed on the surface
of the core substrate 230. Moreover, a land 236a is formed around
each through hole 236 (FIG. 13 (C)). It is preferable that the
shape of the land is a circular shape or an elliptic shape. As an
alternative to this, a square shape or a rectangular shape may be
employed. It is preferable that the diameter of the land 236a is
1.00 time to 1.25 times the diameter of the through hole. It is
preferable that thickness H3 of each of the land 236a and the
conductor circuit is minimized to smooth the interlayer resin
insulating layer which is the upper layer.
[0242] The multi-layer printed circuit board according to the
second embodiment is manufactured such that the metal film 226
serving as the land 236a of the through hole 236 is formed. Then,
the second plated layer 228 is formed in the through hole.
Therefore, separation of the land 236a constituted by the metal
film 226 can be prevented so that the reliability of the through
hole 236 can be improved. Since excellent reliability in connection
can be realized, the thickness of the land can be reduced. As a
result, the smoothness of the interlayer resin insulating layer
which is the upper layer and which is formed in the process to be
described later can be improved. Thus, occurrence of separation and
a crack of the foregoing interlayer resin insulating layer can be
prevented.
[0243] (8) The substrate having the conductor circuits 234 and the
lands 236a is cleaned with water, and then the substrate is dried.
Then, etching solution is sprayed to both sides of the substrate so
that the surface of the lower conductor circuit 234 and the surface
of each land 236a of each through hole 236 is etched. Thus, a rough
surface 234.beta. is formed on the overall surface of each
conductor circuit 234. Moreover, a rough surface 236.beta. is
formed on each land 236a of each through hole 236 (FIG. 13 (D)).
The etching solution is mixed solution of 10 parts by weight of
copper (II) imidazole complex, 7 parts by weight of glycolic acid,
5 parts by weight of potassium chloride and 78 parts by weight of
ion exchange water.
[0244] In the process (1) of this embodiment is performed such that
the rough surface is formed by etching. As an alternative to this,
a rough layer may be formed by electroless plating. In the
foregoing case, the substrate 230 having the conductor circuits 234
formed thereon is degreased with alkali so as to be subjected to
soft etching. Then, a process using catalyst solution composed of
palladium chloride and organic acid is performed to supply Pd
catalyst. Then, the foregoing catalyst is activated. Then, the
substrate 230 is immersed in electroless plating solution composed
of 3.2.times.10.sup.-2 mol/l copper sulfate, 3.9.times.10.sup.-3
mol/l nickel sulfate, 5.4.times.10.sup.-2 mol/l complexing agent,
3.3.times.10.sup.-1 mol/l sodium hypophosphite, 5.0.times.10.sup.-1
boric acid, 0.1 g/l surface active agent (Surfil 465 manufactured
by Nissin Chemical) having PH=9. After immersion has been performed
for one minute, the substrate 230 is vibrated vertically and
laterally one time for four seconds. Thus, a coating layer and a
rough layer constituted by a needle alloy made of Cu--Ni--P are
formed on the surface of each conductor circuit 234 and each land
236a of the through hole 236. Moreover, a metal layer constituted
by Sn, Pb or Ni is formed on the surface of the rough layer.
[0245] (9) Then, a thermosetting olefin resin sheet having a
thickness of 50 .mu.m is, at a pressure of 5 kg/cm.sup.2,
vacuum-seal laminated to each of the two sides of the substrate
subjected to the foregoing process while the temperature is being
raised to 50.degree. C. to 150.degree. C. Thus, an interlayer resin
insulating layer 250 constituted by cycloolefin resin is formed
(FIG. 14 (A)). Note that the degree of vacuum realized when the
vacuum sealing process is performed is 10 mmHg.
[0246] (10) Then, CO.sub.2 gas laser beams having a wavelength of
10.4 .mu.m are used for under conditions that the beam diameter is
5 mm, the mode is a top-hat mode, the pulse width is 15 .mu.s, the
diameter of the opening in the mask is 0.5 mm and three shots were
performed so that an opening 248 serving as a via hole and having a
diameter of 80 .mu.m is formed in the lower interlayer resin
insulating layer 250 made of olefin resin (FIG. 14 (B)). Then,
oxygen plasma is used to perform a desmear process.
[0247] (11) Then, a plasma process was performed by using SV-4540
manufactured by Nihon Shinku Gijyutu to roughen the surface of the
interlayer resin insulating layer 250 (FIG. 14 (C)). At this time,
argon gas was used as the inactive gas to perform a plasma process
for two minutes under conditions that the electric power was 200 W,
the gas pressure was 0.6 Pa and the temperature was 70.degree.
C.
[0248] (12) Then, the same apparatus was operated to change the
internal argon gas, and then sputtering was performed such that a
Ni--Cu alloy was a target under conditions that the atmospheric
pressure was 0.6 Pa, the temperature was 80.degree. C., electric
power was 200 W and the duration was 5 minutes. Thus, a Ni--Cu
alloy layer 252 was formed on the surface of a polyolefin
interlayer resin insulating layer 250. The thickness of the formed
Ni--Cu alloy layer 252 was 0.2 .mu.m (FIG. 15 (A)).
[0249] (13) A marketed photosensitive dry film was bonded to each
of the two sides of the processed substrate, and then a photomask
was placed. Then, exposure was performed with 100 mJ/cm.sup.2, and
then a development process was performed by using 0.8% sodium
carbonate. Thus, a pattern of a plating resist 254 having a
thickness of 15 .mu.m was formed (FIG. 15 (B)).
[0250] (14) Then, electric plating was performed under the
following conditions so that an electroplated film 256 having a
thickness of 15 .mu.m was formed (FIG. 15 (C)). The electroplated
film 256 results in enlargement of the thickness of a portion which
is formed into the conductor circuit 258 in a process to be
described later and completion of enclosure of plating in the
portion which will be formed into the via hole 260. Note that the
additive to be added to the electroplating solution is Kapalasid H
L manufactured by Atotech Japan.
[Electroplating Solution]
TABLE-US-00001 [0251] sulfuric acid 2.24 mol/l copper sulfate 0.26
mol/l additive 19.5 mol/l
[Electroplating Conditions]
TABLE-US-00002 [0252] current density 1 A/dm.sup.2 duration 65
minutes temperature 22 .+-. 2.degree. C.
[0253] (15) Then, the plating resist 254 was separated and removed
with 5% NaOH, and then the Ni--Cu alloy layer 252 present below the
plating resist 254 was dissolved and removed by etching which uses
mixed solution of nitric acid, sulfuric acid and hydrogen peroxide.
Thus, the conductor circuit 258 (including the via holes 260)
constituted by electro-copper plated film 256 or the like and
having a thickness of 16 .mu.m was formed (FIG. 16 (A)).
[0254] (16) Then, the processes (10) to (16) are repeated so that
the upper interlayer resin insulating layer 281 and the via holes
285 were formed (FIG. 16 (B)).
[0255] (17) Then, a solder resist composition similar to that
according to the first embodiment was applied to the both sides of
the multi-layer printed circuit board to have a thickness of 20
.mu.m. Then, a drying process was performed under conditions that
the duration was 20 minutes at 70.degree. C. and 30 minutes at
70.degree. C. Then, a photomask having a pattern of the opening
drawn thereon and a thickness of 5 mm was brought into hermetic
contact with the resist layer. Then, exposure was performed by
using 1000 mJ/cm.sup.2 ultraviolet rays, and then a development
process was performed by using DMTG solution. Thus, openings 271U
each having a diameter of 200 .mu.m were formed in the upper
surface and openings 271D each having a diameter of 500 .mu.m were
formed in the lower surface.
[0256] Then, a heating process was performed under conditions that
the durability was one hour at 80.degree. C., one hour at
100.degree. C., one hour at 120.degree. C. substrate and three
hours at 150.degree. C. Thus, the solder resist layer was hardened
so that the solder resist layer (the organic resin insulating
layer) 270 having openings corresponding to the solder pad portions
and a thickness of 20 .mu.m was formed (FIG. 17 (A)). The
non-hardened resin film was used to press and exposure, development
or a laser beam may be employed to provide solder pads.
[0257] (18) Then, the nickel-plated layer 272 having a thickness of
5 .mu.m was, similarly to the first embodiment, formed in the
surface of the opening 271 of the substrate having the solder
resist layer (the organic resin insulating layer) 270 formed
thereon. Moreover, the gold-plated layer 274 having a thickness of
0.03 .mu.m was formed on the nickel-plated layer 272 (FIG. 17
(B)).
[0258] (19) Then, solder paste was printed to the openings 271U and
271D of the solder resist layer 270, and reflowing is performed at
200.degree. C. Thus, the solder bumps (solder) 276U and 276D were
formed so that the multi-layer printed circuit board 210 was
manufactured (FIG. 18).
First Modification of Second Embodiment
[0259] A multi-layer printed circuit board and a manufacturing
method therefor according to a first modification of the second
embodiment will now be described.
[0260] FIG. 23 shows the cross section of the multi-layer printed
circuit board according to the first modification which is applied
to a package substrate. The multi-layer printed circuit board
according to the first modification has a structure similar to that
according to the second embodiment described with reference to FIG.
18. The second embodiment is structured such that the solder bumps
276D are provided for the portion adjacent to the daughter board.
On the other hand, the first modification has the structure that
the conductive connection pins 278 are provided.
[0261] The method of manufacturing the multi-layer printed circuit
board according to the first modification will now be described.
The method of forming the core substrate is similar to processes
(1) to (8) according to the second embodiment described with
reference to FIGS. 12 and 13. Therefore, description of the method
is omitted.
[0262] The method of manufacturing a resin film for forming the
interlayer resin insulating layer will now be described.
[0263] Thirty parts by weight of bisphenol-A epoxy resin (Epicoat
1001 having an epoxy equivalent of 469 and manufactured by Yuka
Shell), 40 parts by weight of cresol novolac epoxy resin (epichron
N-673 having an epoxy equivalent of 215 and manufactured by
Dainippon Ink & Chemicals), 120 parts by weight of phenol
novolac resin containing a triazine structure (Phenolight KA-7052
having a phenol hydroxyl group equivalent of 120 and manufactured
by Dainippon Ink & Chemicals) were heated and dissolved in 20
parts by weight of ethyldiglycol acetate and 20 parts by weight of
solvent naphtha such that stirring was performed. Then, 15 parts by
weight of polybutadiene rubber having epoxy terminal (Denalex
R-45EPT manufactured by Nagase Chemicals), 1.5 part by weight of
pulverized 2-phenyl-4,5-bis(hydroxymethyl) imidazole, 2 parts by
weight of particle-size reduced silica and 0.5 part by weight of
silicon defoaming agent were added. Thus, an epoxy resin
composition was prepared.
[0264] The obtained epoxy resin composition was applied to the
surface of a PET film having a thickness of 38 .mu.m by using a
roll coater such that the thickness after the PET film was dried
was 50 .mu.m. Then, drying was performed at 80.degree. C. to
120.degree. C. for 10 minutes. Thus, a resin film for forming the
interlayer resin insulating layer was manufactured.
[0265] (9) The thus-manufactured resin film for the interlayer
resin insulating layer was placed on each side of the substrate 230
shown in FIG. 13 (D). Then, temporal pressing under conditions that
the pressure was 4 kgf/cm.sup.2, the temperature was 80.degree. C.
and the pressing duration was 10 seconds, and then cutting was
performed. Then, a vacuum laminator apparatus was operated to bond
the resin film so that the interlayer resin insulating layer 250
was formed (FIG. 19 (A)). That is, main pressing of the resin film
for the interlayer resin insulating layer to the surface of the
substrate was performed under conditions that the degree of vacuum
was 0.5 Torr, the pressure was 4 kgf/cm.sup.2, the temperature was
80.degree. C. and the pressing duration was 60 seconds. Then,
hardening with heat was performed at 170.degree. C. for 30
minutes.
[0266] (10) A mask 249 incorporating penetrating openings 249a
formed therein and having a thickness of 1.2 mm is placed on the
interlayer resin insulating layer 250. Then, a CO.sub.2 gas laser
beam having a wavelength of 10.4.mu. mm was used to form openings
248 for the via holes each having a diameter of 80 .mu.m were
formed in the interlayer resin insulating layer 250 under
conditions that the beam diameter was 4.0 mm, the mode was the
top-hat mode, the pulse width was 5.0 .mu.s, the diameter of each
penetrating opening in the mask was 1.0 mm and one short is
performed (FIG. 19 (B)).
[0267] (11) The substrate 230 having the openings 248 for the via
holes was, for 10 minutes, immersed in solution which contained 60
g/l permanganic acid and the temperature of which was 80.degree. C.
Thus, epoxy resin particles present on the surface of the
interlayer resin insulating layer 250 are dissolved and removed. As
a result, the surface of the interlayer resin insulating layer 250
including the inner wall of each opening 248 for the via hole was
roughened (FIG. 19 (C)).
[0268] (12) Then, the substrate subjected to the foregoing process
was immersed in neutral solution (manufactured by Siplay), and then
cleaned with water. The surface of the substrate subjected to the
roughening process (depth of roughness was 3 .mu.m) is supplied
with palladium catalyst. Thus, the catalyst cores were allowed to
adhere to the surface of the interlayer resin insulating layer 250
and the inner wall of each opening 248 for the via hole.
[0269] (13) Then, the substrate was immersed in electroless copper
plating solution having the following composition so that an
electroless copper plated film 251 having a thickness of 0.6 .mu.m
to 3.0 .mu.m was formed on the overall surface of the rough surface
(FIG. 20 (A)).
[Electroless Plating Solution]
TABLE-US-00003 [0270] NiSO.sub.4 0.003 mol/l tartaric acid 0.200
mol/l copper sulfate 0.030 mol/l HCHO 0.050 mol/l NaOH 0.100 mol/l
.alpha.,.alpha.'-bipyridyl 40 mg/l polyethylene glycol (PEG) 0.10
g/l
[Electroless Plating Conditions]
[0271] 40 minutes in a state where the temperature of the solution
was 35.degree. C.
[0272] (14) A marketed photosensitive dry film was bonded to the
electroless-copper-plated film 251. Then, a mask was placed so that
exposure was performed with 100 mJ/cm.sup.2. Then, a development
process was performed by using 0.8% sodium carbonate so that a
plating resist 254 having a thickness of 30 .mu.m was formed (FIG.
20 (B)).
[0273] (15) Then, the substrate was cleaned with water, the
temperature of which was 50.degree. C. to remove grease. Then,
cleaning with water, the temperature of which was 25.degree. C., so
that an electroless copper-plated film 256 having a thickness of 20
.mu.m was formed (FIG. 20 (C)).
[Electroplating Solution]
TABLE-US-00004 [0274] sulfuric acid 2.34 mol/l copper sulfate 0.26
mol/l additive 19.5 mol/l (Kapalacid HL manufactured by Atotech
Japan)
[Electroplating Conditions]
TABLE-US-00005 [0275] Current Density 1 A/dm.sup.2 Duration 65
minutes Temperature 22 .+-. 2.degree. C.
[0276] (16) The plating resist 254 was separated and removed with
5% NaOH, and then the electroless-plated film 251 below the plating
resist 254 was dissolved and removed by performing etching using
mixed solution of sulfuric acid and hydrogen peroxide. Thus, a
conductor (including via holes 260) 258 constituted by electroless
copper-plated film 251 and electrolytic copper-plated film 256 and
having a thickness of 18 .mu.m was formed (FIG. 21 (A)).
[0277] (17) A process similar to the process (8) for roughening the
conductor circuit 234 according to the second embodiment was
performed. Etching solution containing cupric complex and organic
acid was used to form a rough surface 262 (FIG. 21 (B)).
[0278] (18) The foregoing processes (9) to (17) were repeated so
that the interlayer resin insulating layer 281, the conductor
circuit 283 and the via holes 285 were formed on the upper
interlayer resin insulating layer 250. Thus, the multi-layer
printed circuit board was obtained (FIG. 21 (C)).
[0279] (19) Then, a solder resist composition similar to that
according to the second embodiment and having a thickness of 20
.mu.m was applied to each side of the multi-layer printed circuit
board. Then, a drying process was performed at 70.degree. C. for 20
minutes and at 70.degree. C. for 30 minutes. Then, a photomask
having a pattern of the opening of the solder resist drawn thereon
and having a thickness of 5 mm was brought into contact with the
solder resist layer. Then, exposure was performed at 1000
mJ/cm.sup.2, and then a development process was performed by using
DMTG solution so that the openings 271U and 271D were formed.
[0280] Then, a heat process was performed at 80.degree. C. for one
hour, 100.degree. C. for one hour, 120.degree. C. for one hour and
150.degree. C. for three hours to harden the solder resist layer.
Thus, the solder resist pattern layer 270 having openings and a
thickness of 20 .mu.m was formed (FIG. 22 (A)). The solder resist
composition may be a marketed solder resist composition.
[0281] (20) Then, similarly to the second embodiment, a
nickel-plated layer 272 having a thickness of 5 .mu.m was provided
for each of the openings 271U and 271D. Then, the gold-plate layer
274 having a thickness of 0.03 .mu.m was provided for the surface
of the nickel-plate layer 272 (FIG. 22 (B)).
[0282] (21) Then, solder paste containing tin-lead was printed to
each opening 271U in the solder resist layer 270 on the surface of
the substrate on which the IC chip was mounted. Moreover, solder
paste containing tin-antimony was printed to each opening 271D in
the solder resist layer 270 on the other surface. Then, reflowing
at 200.degree. C. was performed so that solder bumps 276U were
provided for the upper surface. Then, the conductive connection
pins 278 were provided for the lower surface. Thus, the printed
circuit board was manufactured (see FIG. 23).
Second Modification of Second Embodiment
[0283] The cross section of a multi-layer printed circuit board
according to a second modification is shown in FIG. 24. The
structure of the second modification is similar to that according
to the second embodiment. Note that the multi-layer printed circuit
board according to the second modification has the structure that
the interlayer resin insulating layer 250 and the interlayer resin
insulating layer 281 are constituted by adhesive agent 257 for the
upper layer and adhesive agent 255 for the lower layer each having
the following composition. Moreover, coating in the liquid state is
Performed, and then exposure and development were performed to form
the openings.
[0284] A. Raw Material Composition for Preparing Adhesive Agent for
Electroless Plating (Adhesive Agent for Upper Layer)
[Resin Composition (1)]
[0285] Mixing and stirring of 35 parts by weight of resin solution
obtained by dissolving 25% acryl material of cresol novolac epoxy
resin (manufactured by Nippon Kayaku and having a molecular weight
of 2500) in DMDG at a concentration of 80 wt %, 3.15 parts by
weight of photosensitive monomer (Aronix M315 manufactured by
Toagosei Chemical), 0.5 part by weight of defoaming agent (S-65
manufactured by Sannopuko) and 3.6 parts by weight of NMP were
performed so that the composition was obtained.
[Resin Composition (2)]
[0286] Mixing of 12 parts by weight of polyether sulfon (PES), 7.2
parts by weight of epoxy resin particles (Polymerpol manufactured
by Sanyo Chemical) having a mean diameter of 1.0 .mu.m and 3.09
parts by weight of the epoxy resin particles having a mean diameter
of 0.5 was performed. Then, 30 parts by weight of NMP were added,
and then stirring and mixing using beads mill were performed. Thus,
the composition was obtained.
[0287] [Hardening Agent Composition (3)]
[0288] Mixing of 2 parts by weight of imidazole hardening agent
(2E4MZ-CN manufactured by Shikoku Chemicals), 2 parts by weight of
photoinitiator (Ilugacur I-907 manufactured by Chibagaigi), 0.2
part by weight of a photosensitizer (DETX-S manufactured by Nihon
Kayaku) and 1.5 part by weight of NMP was performed, and then
stirring was performed. Thus, the composition was obtained.
[0289] B. Raw Material Composition for Preparing Interlayer Resin
Insulating Agent (Adhesive Agent for Lower Layer)
[Resin Composition (1)]
[0290] Mixing of 35 parts by weight of resin solution obtained by
dissolving 25% acrylic material of cresol novolac epoxy resin
(manufactured by Nihon Kayaku and having a molecular weight of
2500) was dissolved in DMDG at a concentration of 80 wt %, 4 parts
by weight of photosensitive monomer (Aronix M315 manufactured by
Toagosei Chemical), 0.5 part by weight of defoaming agent (S-65
manufactured by Sannopuko) and 3.6 parts by weight of NMP was
performed, and then stirring was performed. Thus, the composition
was obtained.
[Resin Composition (2)]
[0291] Mixing of 12 parts by weight of polyether sulfon (PES) and
14.49 parts by weight of epoxy resin particles (Polymer Pol
manufactured by Sanyo Chemical) having a mean particle size of 0.5
.mu.m was performed. Then, 30 parts by weight of NMP were added,
and the stirring and mixing were performed. Thus, the composition
was obtained.
[Hardening Agent Composition (3)]
[0292] Mixing of 2 parts by weight of imidazole hardening agent
(2E4MZ-CN manufactured by Shikoku Chemicals), 2 parts by weight of
photoinitiator (Ilugacur I-907 manufactured by Chibagaigi), 0.2
part by weight of a photosensitizer (DETX-S manufactured by Nihon
Kayaku) and 1.5 part by weight of NMP was performed, and then
stirring was performed. Thus, the composition was obtained.
Comparative Example 1
[0293] The multi-layer printed circuit board according to
comparative example 1 has a similar structure to that according to
the second embodiment. In the second embodiment, plating is
enclosed in each through hole 236. In comparative example 1, a
resin filler is enclosed.
[0294] Each of the second embodiment, the first modification, the
second modification and the comparative example 1 was subject to a
heat cycle test (1000 cycles each cycle was such that -65.degree.
C./3 minutes +130.degree. C./3 minutes). Results were shown in
table in FIG. 25. The second embodiment, the first modification and
the second modification were free of warpage and disconnection even
after the heat cycle was completed. Comparative example 1
encountered warpage. Note that the amount of warpage was measured
such that the height of the end of the substrate placed on a flat
frame was measured by a measuring instrument.
Third Embodiment
[0295] The structure of a printed circuit board according to a
third embodiment will now be described with reference to FIG. 32
which shows the cross section of a printed circuit board 310.
[0296] The printed circuit board 310 incorporates a core substrate
330 and buildup circuit layers 380A and 380B. The buildup circuit
layers 380A and 380B are constituted by interlayer resin insulating
layers 350 and 381, respectively. The interlayer resin insulating
layer 350 has via holes 360 and conductor circuits 358. The
interlayer resin insulating layer 381 has via holes 385 and
conductor circuits 383. A solder resist layer 370 having openings
371 is formed on the interlayer resin insulating layer 381.
[0297] The core substrate 330 incorporates a core member 330a
having a core impregnated with resin; and a resin insulating layer
330b in which soluble particle are dispersed in refractory resin.
The resin insulating layer 330b is roughened by dissolving
particles on the surface thereof. Each of the through holes 344
formed in the core substrate 330 has a structure that a metal film
335 is formed in a penetrating opening 332 in the core substrate
330.
[0298] In this embodiment, the penetrating openings 332 in the core
substrate 330 are formed by laser beams as described later. Since
the penetrating openings 332 are formed in a state where the metal
film is not formed, proper through holes can be formed. When the
metal film 335 is deposited in the penetrating opening 332 to form
the through hole 344 and when a filler 346 has been enclosed in the
through hole 344, retention any air bubble can be prevented.
Therefore, as distinct from the conventional printed circuit board
described with reference to FIG. 70, occurrence of a corner crack
starting with a burr can be prevented. As a result, reliability in
connection of the through hole 344 can be improved. Since the rough
surface is provided for the surface of the core substrate 330, the
adhesiveness of the metal film 335 can be improved. The warpage
does not easily occur.
[0299] A method of manufacturing the printed circuit board
described with reference to FIG. 32 will now be described with
reference to FIGS. 26 to 32.
[0300] (1) A core member 330a constituted by BT
(Bismaleimide-Triazine), FR-4 or FR-5 having a thickness of 0.05 mm
to 1.0 mm is employed as a starting material (FIG. 26 (A)). Since
the core member 330a is constituted by any one of BT
(Bismaleimide-Triazine), FR-4 or FR-5 having a core made of glass
fibers or polyimide fibers and impregnated with resin, the strength
required for the core substrate can be maintained. It is preferable
that the thickness is 0.1 mm to 0.8 mm. The reason for this lies in
that both of opening easiness of the through hole by using the
laser beam and the strength required for the core substrate can be
realized.
[0301] (2) Then, a thermosetting resin insulating film having a
thickness of 0.01 mm to 0.1 mm and to be described later is bonded
to each of the two sides of the core member 330a. Thus, the resin
insulating layer 330b constitutedby the thermosetting resin is
formed.
[0302] As a result of the foregoing process, the core substrate 330
constituted by the core member 330a and the resin insulating layer
330b is formed (FIG. 26 (B)). It is preferable that the thickness
of the core substrate 330 is 0.12 mm to 1.2 mm.
[0303] (3) Then, penetrating openings 332 for through holes are
formed in the core substrate 330 by using laser beams (FIG. 26
(C)). The core substrate 330 constituted by the core member 330a
and the resin insulating layers 330b formed on the two sides of the
core member 330a is different from the conventional copper-clad
laminated board, the penetrating openings 332 can properly be
formed by using laser beams.
[0304] (4) Then, the overall surface of the core substrate 330 is
roughened with acid or an oxidizer so that a rough surface 334 is
formed on the overall surface of the core substrate 330 (FIG. 26
(D)). It is preferable that the rough surface 334 has Ra (mean
roughness height) of 0.1 .mu.m to 3.0 .mu.m. The thermosetting
resin for constituting the resin insulating layer 330b provided on
the right side of the core substrate has a structure that the
soluble particles are dispersed in the refractory resin. Therefore,
when the surface soluble particles are dissolved by using acid or
the like, the rough surface 334 can be formed on the surface of the
core substrate 330.
[0305] (5) Then, the metal film 335 constituted by Cu is formed on
the overall surface of the core substrate 330 by sputtering (FIG.
26 (E)). As an alternative to sputtering, evaporation or
electroless plating may be employed. Then, the core substrate 330
is subjected to electroplating so that an electroplated film 336 is
formed on the metal film 335 (FIG. 27 (A)). Since a rough surface
324 is formed on the surface of the core substrate 330 by
performing the foregoing process, the adhesiveness with the metal
film 335 formed on the surface of the core substrate 330 can be
improved. Since retention of an air bubble can be prevented when
the metal film 335 has been deposited in each penetrating opening
332, the reliability in connection of the through hole 344 can be
improved.
[0306] (6) Then, a marketed dry film is bonded to each of the two
sides of the substrate 330, and then a photomask film is placed.
Then, exposure and development processes are performed so that the
pattern of the resist 338 is formed (FIG. 27 (B)).
[0307] (7) Then, the resist 338 is separated and removed with 5%
NaOH, and then the metal film 335 and the electroplated film 336
present below the resist 338 are dissolved and removed by etching
using mixed solution of nitric acid, sulfuric acid and hydrogen
peroxide. Thus, a lower conductor circuit 342 and through holes 344
constituted by the metal film 335 and the electroplated film 336
are formed (FIG. 27 (C)). Note the pattern of the lower conductor
core substrate 342 and the through holes 344 may be formed by a
semi-additive method.
[0308] (8) Similarly to the second embodiment, the surface of the
lower conductor circuit 342 and the surface 344a of the land of the
through hole 344 are etched, a rough surface 342.alpha. is formed
on the overall surface of the lower conductor circuit 342 (FIG. 27
(D)).
[0309] (9) A resin filler 346 mainly composed of epoxy resin is
applied to each of the two sides of the substrate 330 by operating
a printer. Thus, the space between the lower conductor circuits 342
or the inside portion of the through hole 344 is filled with the
resin filler 346. Then, heating and drying are performed. That is,
the foregoing process causes the resin filler 346 to be enclosed
between the lower conductor circuits 342 or the inside portion of
the through holes 344 (FIG. 28 (A)). As distinct from the
conventional printed circuit board described with reference to FIG.
70, no burr is present in each through hole. Therefore, when the
resin filler 346 has been enclosed in each through holes 344,
retention of an air bubble or non-filling does not occur.
Therefore, no corner crack occurs and, therefore, the reliability
of the through holes 344 can be improved.
[0310] (10) Either side of the substrate 330 subjected to the
process (9) is polished in a belt sander manner using belt abrasive
paper (manufactured by Sankyo Chemical). Thus, polishing is
performed in such a manner that the resin filler 346 is not left on
the surface of the lower conductor circuit 342 and the surfaces
344a of the lands of the through holes 344. Then, buffing is
performed to remove damage caused from the belt sander polishing.
The foregoing sequential polishing process is performed for the
other surface of the substrate 330. Then, the enclosed resin filler
346 is heated and hardened (FIG. 28 (B)).
[0311] (11) Then, etching solution which is the same as the etching
solution employed in the foregoing process (8) is sprayed to both
sides of the substrate 330 subjected to the process (10). Thus, the
surface of the lower conductor circuit 342 which has temporarily
been smoothed and the surfaces 344a of the lands of the through
holes 344 are etched. Thus, a rough surface 342.beta. is formed on
the overall surface of the lower conductor circuit 342 (FIG. 28
(C)).
[0312] (12) Then, similarly to the second embodiment, interlayer
resin insulating layers 350 constitute by cyclo-olefin resin are
provided for the substrate 330 subjected to the foregoing process
(FIG. 28 (D)).
[0313] (13) Then, similarly to the second embodiment, a mask 349
having openings and CO.sub.2 gas laser beams are use to form
openings 351 for via holes each having a diameter of 80 .mu.m are
formed in the interlayer resin insulating layer 350 (FIG. 29
(A)).
[0314] (14) Then, similarly to the second embodiment, a plasma
process is performed so that a rough surface 350.alpha. is formed
on each interlayer resin insulating layer 350 (FIG. 29 (B)).
[0315] (15) Then, similarly to the second embodiment, a Ni/Cu metal
layer 353 is formed on the surface of each interlayer resin
insulating layer 350 (FIG. 29 (C)).
[0316] (16) Similarly to the second embodiment, a pattern of a
plating resist 354 having a thickness of 15 .mu.m is formed on the
substrate subjected to the foregoing process (FIG. 29 (D)).
[0317] (17) Then, similarly to the second embodiment,
electroplating is performed so that an electroplated film 356
having a thickness of 15 .mu.m is formed (FIG. 30 (A)).
[0318] (18) Then, similarly to the second embodiment, a conductor
circuit 358 (including via holes 360) constituted by the Ni/Cu
metal layer 353 or the like and having a thickness of 16 .mu.m is
formed (FIG. 30 (B)). Then, the etching process which is the same
as the process (11) is performed to roughen the surface of the
conductor circuit 358. Thus, a rough surface 358.alpha. is formed
(FIG. 30 (C)).
[0319] (19) Then, the processes (12) to (18) are repeated so that
an interlayer resin insulating layer 381 and a conductor circuit
383 (including via holes 385) are formed at the further upper
positions (FIG. 30 (D)).
[0320] (20) Then, similarly to the first embodiment, the two sides
of the substrate are coated with the solder resist composition so
that solder resist layers (organic resin insulating layers) 70
incorporating openings 371 and each having a thickness of 20 .mu.m
are formed (FIG. 31 (A)).
[0321] (21) Then, similarly to the first embodiment, a
nickel-plated layer 372 is formed on each of the openings 371 of
the substrate having the solder resist layer 370 formed thereon.
Then, a gold-plated layer 374 is formed on the nickel-plated layer
372 (FIG. 31 (B)).
[0322] (22) Then, solder paste is printed on each of the openings
371 in the solder resist layer 370, and then reflowing is performed
at 200.degree. C. Thus, solder bumps (solder) 376 are formed so
that a printed circuit board 310 having the solder bumps 376 is
manufactured (see FIG. 32).
[0323] The thermosetting resin film contains refractory resin,
soluble particles, a hardening agent and other components same as
the first embodiment.
First Modification of Third Embodiment
[0324] A printed circuit board 320 according to a first
modification of the third embodiment will now be described with
reference to FIG. 39. In the third embodiment, the BGA is provided.
The first modification has a structure similar to that according to
the third embodiment. As shown in FIG. 39, a PGA method is employed
with which connection is established through conductive connection
pins 396 as shown in FIG. 39.
[0325] A method of manufacturing the printed circuit board
according to the first modification of the present invention will
now be described. When the printed circuit board according to the
first modification is manufactured, the following materials are
employed. A. a raw material composition (an adhesive agent for the
upper layer) for preparing an adhesive agent for electroless
plating and B. a raw material composition (an adhesive agent for
the lower layer) for preparing the resin insulating agent are
similar to those according to the second modification of the second
embodiment. C. the resin film for the interlayer resin insulating
layer is similar to that according to the first modification of the
second embodiment. Therefore, D. a resin filler will now be
described.
[0326] D. Preparation of Resin Filler
[0327] The following materials are introduced into a container: 100
parts by weight of bisphenol-F epoxy monomer (YL983U manufactured
by Yuka Shell and having a molecular weight of 310), 170 parts by
weight of SiO.sub.2 spherical particles (CRS 1101-CE manufactured
by Adotech) having surfaces each of which is coated with a silane
coupling agent and a mean particle size of 1.6 .mu.m and structured
such that the diameter of the largest particle is 15 .mu.m or
smaller and 1.5 part by weight of a leveling agent (Pelenol S4
manufactured by Sannopuko). The materials are stirred and mixed so
that a resin filler having viscosity of 45 Pas to 49 Pas at
23.+-.1.degree. C. is prepared.
[0328] Note that 6.5 parts by weight of imidazole hardening agent
(2E4MZ-CN manufactured by Shikoku Chemicals) are employed as the
hardening agent.
[0329] A method of manufacturing the printed circuit board
described with reference to FIG. 39 will now be described with
reference to FIGS. 33 to 39.
[0330] (1) A core member 330a constituted by any one of BT
(Bismaleimide-Triazine), FR-4 and FR-5 having a thickness of 0.1 mm
to 1.0 mm is employed as the starting material (FIG. 33 (A)). When
any one of BT, FR-4 and FR-5 having a structure that the core is
impregnated with resin is employed as the core member 330a, the
strength required for the core substrate can be maintained.
[0331] (2) Then, the raw material composition B for preparing the
resin insulating agent is stirred and mixed so that the viscosity
is adjusted to 1.5 Pas. Thus, the interlayer resin insulating agent
(for the lower layer) is obtained.
[0332] Then, the raw material composition A for preparing the
adhesive agent for electroless plating is stirred and mixed so that
the viscosity is adjusted to 7 Pas. Thus, adhesive agent solution
(for the upper layer) for electroless plating is obtained.
[0333] (3) Then, the resin insulating agent (for the lower layer)
obtained in the process (2) and having the viscosity of 1.5 Pas is
applied to each of the two side of the core member 330a within 24
hours after the preparation by using a roll coater. Then, the core
member 330a in a state where it is placed horizontally is allowed
to stand for 20 minutes. Then, drying (prebaking) is performed at
60.degree. C. for 30 minutes. Then, the adhesive agent solution
(for the upper layer) obtained in the process (2) and having the
viscosity 7 Pas is applied within 24 hours after the preparation.
Then, the core member 330a in a state where it is placed
horizontally is allowed to stand for 20 minutes. Then, drying
(prebaking) is performed at 60.degree. C. for 30 minutes. Thus, the
resin insulating layer 330b is formed. It is preferable that the
thickness of the resin insulating layer 330b is 0.01 mm to 0.1
mm.
[0334] As a result of the foregoing processes, the core substrate
330 constituted by the core member 330a and the resin insulating
layer 330b can be formed (FIG. 33 (B)). It is preferable that the
thickness of the core substrate 330 is 0.12 mm to 1.2 mm.
[0335] (4) Then, penetrating openings 332 for through holes are
formed in the core substrate 330 by applying laser beams (FIG. 33
(C)). As distinct from the conventional copper-clad laminated
board, penetrating openings can properly be formed in the core
substrate 330 constituted by the core member 330a and the resin
insulating layer 330b formed on each of the two sides of the core
member 330a such that laser beams are applied.
[0336] (5) Then, the overall surface of the core substrate 330 is
roughened with acid or the oxidizer so that the rough surface 334
is formed on the overall surface of the core substrate 330 (FIG. 33
(D)). It is preferable that Ra (mean roughness height) of the
formed rough surface 334 is 0.1 .mu.m to 3.0 .mu.m. The resin for
constituting the resin insulating layer 330b formed on each of the
two sides of the core substrate has the structure that soluble
particles are dispersed in the refractory resin. Therefore, when
the soluble particles on the surface are dissolved by using acid or
the like, the rough surface can be formed on the surface of the
core substrate.
[0337] (6) Then, the metal film 335 is formed on the overall
surface of the core substrate 330 (FIG. 33 (E)). At this time,
evaporation or sputtering may be employed as a substitute for
electroless plating. Then, the core substrate 330 is
electroless-plated so that the electroplated film 336 is formed on
the metal film 335 (FIG. 34 (A)). Since the surface of the core
substrate 330 has been roughened as a result of the foregoing
process, the adhesiveness with the metal film 335 formed on the
surface of the core substrate 330 can be improved. Moreover, the
reliability of the through holes can be improved. Since any air
bubble is not left when the metal film 335 is deposited in each of
the penetrating openings 332, the reliability in connection of the
through hole 344 can be improved.
[0338] (7) Then, a marketed photosensitive dry film is bonded to
each of the two sides of the substrate 330. Then, a photomask is
placed, and then exposure and development processes are performed.
Thus, the pattern of the resist 338 is formed (FIG. 34 (B)).
[0339] (8) Then, the resist 338 is separated and removed with 5%
NaOH, and then the metal film 335 and the electroplated film 336
present below the resist 338 are dissolved and removed by
performing etching using mixed solution of nitric acid, sulfuric
acid and hydrogen peroxide. Thus, the lower conductor circuit 342
and the through holes 344 constituted by the metal film 335 and the
electroplated film 336 are formed (FIG. 34 (C)). Note that the
pattern of the lower conductor circuit 342 and the through holes
344 may be formed by the semi-additive method.
[0340] (9) Then, the substrate 330 having the through holes 344 and
the lower conductor circuit 342 formed thereon is cleaned with
water and dried. Then, a blacking process is performed by using a
blacking bath (an oxidizing bath) which is solution containing NaOH
(10 g/l), NaClO.sub.2 (40 g/l) and Na.sub.3PO.sub.4 (6 g/l).
Moreover, a reducing process is performed by using a reducing bath
which is solution containing NaOH (10 g/l) and NaBH.sub.4 (6 g/l).
Thus, the rough surface 342.alpha. is formed on the overall surface
of the lower conductor circuit 342 including the through holes 344
(FIG. 34 (D)).
[0341] (10) The resin filler described in D is prepared, and then
the following method is employed to form a layer of the resin
filler 346 in each of the through holes 344 and the portion of
either side of the substrate 330 in which the lower conductor
circuit 342 is not formed within 24 hours from preparation. That
is, initially a squeeze is used to inwards push the resin filler
346 into each of the through holes 344. Then, drying is performed
at 100.degree. C. for 20 minutes. As distinct from the conventional
printed circuit board described with reference to FIG. 70, no burr
is present in the through hole. Therefore, leaving of any air
bubble and non-filling occur when the resin filler 346 has been
enclosed in the through hole 344. Therefore, occurrence of a corner
crack can be prevented. Hence it follows that the reliability of
the through hole 344 can be improved.
[0342] Then, a mask having opening corresponding to the portions in
which the lower conductor circuit 342 is not formed is placed on
the substrate 330. Then, a squeeze is used to form a layer of the
resin filler 346 in the portion in which the lower conductor
circuit 342 is not formed and which is formed into a recess
portion. Then, drying is performed at 100.degree. C. for 20 minutes
(FIG. 35 (A)).
[0343] (11) Either side of the substrate 330 subjected to the
process (10) is polished in a belt-sander polishing method using
#600 belt abrasive paper (manufactured by Sankyo Chemical) in such
a manner that the resin filler 346 is not left on the surface of
the lower conductor circuit 342 and surfaces 344a of the lands of
the through holes 344. Then, buffing is performed to remove damage
caused from the belt-sander polishing process. The foregoing
sequential polishing processes are performed for another surface of
the substrate 330. Then, a heating process is performed at
100.degree. C. for one hour and 150.degree. C. for one hour so that
the resin filler 346 is hardened.
[0344] Thus, the surface portion of the resin filler 346 and the
surface of the lower conductor circuit 342 formed in the through
holes 344 and the portion in which the lower conductor circuit 342
is not formed are flattened. Thus, a substrate is obtained which
has the structure that the resin filler 346, the lower conductor
circuit 342 and the through holes 344 are in firmly contact with
one another through the rough surface 342.alpha. (FIG. 35 (B)).
That is, as a result of the foregoing process, the surface of the
resin filler 346 and that of the lower conductor circuit 342 are
flushed with each other.
[0345] (12) The substrate 330 is cleaned with water and degreased
with acid, and then soft etching is performed. Then, etching
solution is sprayed to the two sides of the substrate 330 so as to
etch the surface of the lower conductor circuit 342 and surfaces of
the lands 394a of the through holes 344. Thus, the rough surface
342.beta. is formed on the overall surface of the lower conductor
circuit 342 (FIG. 35 (C)). The etching solution is etching solution
(Mech Etch Bond manufactured by Mec Company Ltd.) composed of 10
parts by weight of imidazole copper (II) complex, 7 parts by weight
of glycolic acid and 5 parts by weight of potassium chloride.
[0346] (13) Similarly to the first modification of the second
embodiment, the interlayer resin insulating layer 350 is formed on
the substrate 330 (FIG. 35 (D)).
[0347] (14) Then, similarly to the first modification of the second
embodiment, the mask 349 having openings is used to form openings
351 for via holes each having a diameter of 80 .mu.m are formed in
the interlayer resin insulating layer 350 by applying CO.sub.2 gas
laser beams (FIG. 36 (A)).
[0348] (15) Then, similarly to the first modification of the second
embodiment, the rough surface 350.alpha. is formed on the surface
of the interlayer resin insulating layer 350 including the inner
walls of the openings 351 for via holes (FIG. 36 (B)).
[0349] (16) Then, the substrate 330 subjected to the foregoing
process is, similarly to the first modification of the second
embodiment, subjected to a process such that catalyst cores are
allowed to adhere to the surface of the interlayer resin insulating
layer 350 and the inner walls of the openings 351 for via
holes.
[0350] (17) Then, similarly to the first modification of the second
embodiment, the electroless copper-plated film 353 having a
thickness of 0.6 .mu.m to 3.0 .mu.m is formed to the overall
surface of the rough surface 350.alpha. (FIG. 36 (C)).
[0351] (18) Similarly to the first modification of the second
embodiment, the plating resist 354 having a thickness of 30 .mu.m
is formed (FIG. 36 (D)).
[0352] (19) Similarly to the first modification of the second
embodiment, electroless plating is performed so that the
electrolytic copper-plated film 356 having a thickness of 20 .mu.m
is formed (FIG. 37 (A)).
[0353] (20) Similarly to the first modification of the second
embodiment, an etching process for dissolution and removal is
performed so that the conductor circuit 358 (including the via
holes 360) composed of the electroless copper-plated film 353 and
the electrolytic copper-plated film 356 and having a thickness of
18 .mu.m is formed (FIG. 37 (B)).
[0354] (21) A process similar to the process (12) is performed so
that etching solution containing cupric complex and organic acid is
used to form the rough surface 358.alpha. (FIG. 37 (C)).
[0355] (22) The processes (13) to (21) are repeated so that the
interlayer resin insulating layer 385 and the conductor circuit 383
(including the via holes 385) are formed in the upper layer portion
(FIG. 37 (D)).
[0356] (23) Then, a solder resist composition similar to that
according to the first embodiment is applied to each of the two
sides of the substrate to have thickness of 20 .mu.m. Thus, the
solder resist layer 370 is formed which incorporates openings 371U
and 371D and which has a thickness of 20 .mu.m (FIG. 38 (A)).
[0357] (24) Then, similarly to the first embodiment, the
nickel-plated layer 372 having a thickness of 5 .mu.m is provided
for the openings 371U and 371D in the substrate having the solder
resist layer 370 formed thereon. Then, the gold-plated layer 374
having a thickness of 0.03 .mu.m is formed on the nickel-plated
layer 372 (FIG. 38 (B)).
[0358] (25) Then, solder paste containing tin-lead is printed to
the opening 371U of the solder resist layer 370 on the surface of
the substrate on which the IC chip is mounted. Moreover, solder
paste serving as the conductive adhesive agent 397 is printed to
the inner surfaces of the openings 371D on the other surface of the
substrate. Then, the conductive connection pins 396 are joined to a
proper pin holding unit so as to be supported. A fixing portion 398
of each of the conductive connection pins 396 is brought into
contact with the conductive adhesive agent 397 in each of the
conductive connection pins 396. Then, reflowing is performed so
that the conductive connection pins 396 are secured to the
conductive adhesive agent 397. The conductive connection pins 396
are joined by a method with which the conductive adhesive agent 397
is formed into a ball shape which is introduced into each of the
openings 371D. Another method may be employed with which the
conductive adhesive agent 397 is joined to the fixing portions 398
so as to join the conductive connection pins 396, after which
reflowing is performed. Thus, a printed circuit board 20 having the
conductive connection pins 396 can be obtained (see FIG. 39).
[0359] In the foregoing embodiment, the resin insulating layer
constituting the core substrate has the structure that soluble
particles are dispersed in the refractory resin so as to roughen
the surface. As an alternative to employment of the resin
containing the soluble particles, the resin insulating layer may be
constituted by soluble resin and refractory resin to dissolve the
soluble resin to roughen the surface of the resin insulating layer.
A method may be employed with which the surface of the interlayer
resin insulating layer is subjected to a plasma process or a
polishing process so as to roughen the surface.
[0360] The third embodiment enables through holes each having a
diameter of 100 .mu.m or smaller can reliably be formed. Moreover,
any air bubble is not formed and the interlayer resin insulating
layer can be flattened. Therefore, the connection easiness and the
reliability can be improved. When the interlayer material (the
resin insulating layer) of the core substrate is made of the same
material as that of the interlayer resin insulating layer, the
layers does not easily separated. As a result, the reliability can
furthermore be improved.
Fourth Embodiment
[0361] The structure of a multi-layer printed circuit board
according to a fourth embodiment will now be described with
reference to FIG. 46 which is a cross sectional view showing a
multi-layer printed circuit board 410 serving as a package
substrate and FIG. 47 showing a state in which an IC chip has been
mounted so as to be joined to a daughter board.
[0362] As shown in FIG. 47, the multi-layer printed circuit board
410 incorporates a core substrate 430 having through holes 436A
each having a small diameter (100 .mu.m) formed in the central
portion thereof. Moreover, through holes 436B each having a large
diameter (300 .mu.m) are formed in the outer periphery of the core
substrate 430. A conductor circuit 434 is formed on each of the two
sides of the core substrate 430. A lower interlayer resin
insulating layer 450 having via holes 460 and a conductor circuit
458 is formed on the core substrate 430. An upper interlayer resin
insulating layer 481 having via holes 485 and a conductor circuit
483 is formed on the lower interlayer resin insulating layer 450. A
solder resist layer 470 is formed on the upper interlayer resin
insulating layer 481.
[0363] Solder bumps 476S, 476V and 476G for establishing the
connection to the IC chip are disposed in the openings in the
solder resist layer 470 on the upper surface of the multi-layer
printed circuit board 410. On the other hand, solder bumps 476S,
476V and 476G for establishing the connection to the daughter board
are disposed in the openings of the solder resist layer 470 on the
bottom surface of the package substrate.
[0364] The IC chip 90 has a pad 92S for a signal, a pad 92V for the
power source and a grounding pad 92G. The pad 92S for a signal is
allowed to pass through the via hole 485 of the upper interlayer
resin insulating layer 481 and the via hole 460 of the lower
interlayer resin insulating layer 450 through the solder bump 476S
for a signal so as to be connected to the through holes 436B formed
in the outer periphery of the core substrate 430 and having a large
diameter. Then, the connection is established from the through
holes 436B having the large diameter to pass through the lower via
holes 460 and 485 and the solder bump 476S for a signal to the pad
96S for a signal adjacent to the daughter board 94.
[0365] On the other hand, the pad 92V for the power source of the
IC chip 90 is allowed to pass through the solder bump 476V for the
power source and the upper via holes 485 and 460 so as to be
connected to the through hole 436A formed in the central portion of
the core substrate 430 and having a small diameter. Then, the
connection is established from the through hole 436A having the
small diameter to pass through the lower via holes 460 and 485 so
as to be connected to the pad 96V for the power source adjacent to
the daughter board 94 from the solder bump 476V for the power
source. Similarly, the grounding pad 92G of the IC chip 90 is,
through the grounding solder bump 476G and the upper via holes 485
and 460, connected to the through holes 436A formed in the central
portion of the core substrate 430 and having the small diameter.
Then, the connection is established from the through hole 436A
having the small diameter to be connected to the grounding pad 96G
adjacent to the daughter board 94 from the grounding solder bump
476G through the lower via holes 460 and 485.
[0366] The method of wiring the electric lines between the IC chip
and the core substrate is shown in FIG. 48 (A). The upper surface
of the core substrate 430 is shown in FIG. 48 (B). Note that FIG.
47 shows a state where the numbers of the through holes 436A and
436B are decreased for convenience in drawing.
[0367] As shown in FIG. 48 (B), the through holes 436A each having
the small diameter are formed in the central portion of the core
substrate 430. On the other hand, the through holes 436B each
having the large diameter are formed in the outer periphery of the
substrate. As shown in FIG. 48 (A), electric lines from the pad 92V
for the power source and the grounding pad 92G of the IC chip 90
are mainly wired in the through holes 436A each having the small
diameter and provided for the core substrate 430. Electric lines
from the signal pads 92S of the IC chip 90 are mainly wired in the
through holes 436B each having the large diameter and provided for
the core substrate. As described later, it is preferable that the
through holes 436A each having the small diameter are formed by
laser beams and the through holes 436B each having the large
diameter are formed by drilling. As an alternative to this, all of
the through holes 436A each having the small diameter and the
through holes 436B each having the large diameter may be formed by
laser beams or drilling.
[0368] In the fourth embodiment, the through holes 436A each having
the small diameter are, by laser beams, formed in the central
portion of the core substrate 430. Moreover, the through holes 436B
each having the large diameter are, by drilling, formed in the
outer periphery. Therefore, the core substrate exhibiting a high
wiring density in the central portion thereof can be formed with a
low cost. Since the through holes 436A each having the small
diameter and formed in the central portion are used as the power
supply lines and the ground lines, a multiplicity of power source
lines and ground lines can be provided. Moreover, the length of the
electric from the IC chip 90 to the daughter board 94 can be
shortened. Therefore, the inductance of the power supply line and
the ground line to the IC chip can be reduced. As a result,
electric power can instantaneously be supplied, change in the earth
level can be prevented and, therefore, malfunction of the IC chip
can be prevented. The through holes 436B each having the large
diameter having low probability of occurrence of defective
connection are mainly used as the signal lines. The through holes
436A each having the small diameter having a high probability of
occurrence of the defective connection are mainly used as the power
source lines and the ground lines. Therefore, the normal operation
of the multi-layer printed circuit board can be continued in case
where the power source line or the through hole adjacent to the
ground line encounters disconnection. The warpage does not easily
occur.
[0369] A method of manufacturing the multi-layer printed circuit
board 410 shown in FIGS. 46 and 47 will now be described with
reference to the drawings.
[0370] The schematic structure of a carbon dioxide gas laser for
forming penetrating openings in the core substrate 430 and the
lower interlayer resin insulating layer 450 will now be described
with reference to FIG. 49.
[0371] As the laser unit according to this embodiment, ML505GT
manufactured by Mitsubishi Electric is employed. As a CO.sub.2
laser emitter 180, ML5003D2 manufactured by Mitsubishi Electric is
employed.
[0372] A light beam emitted from the laser emitter 180 is allowed
to pass through a transferring mask 182 for clearing the focal
point on the substrate so as to be made incident on a galvano head
170. The galvano head 170 incorporates a galvano mirror in the form
of one pair consisting of two mirrors which are a galvano mirror
174X for scanning the laser beam in the X direction and a galvano
mirror 174Y for scanning the laser beam in the Y direction. The
mirrors 174X and 174Y are moved by control motors 172X and 172Y.
The motors 172X and 172Y responds to a control command issued from
a control unit (not shown) to adjust the angle of each of the
mirrors 174X and 174Y. Moreover, the motors 172X and 172Y transmits
detection signals supplied from included encoders to the
computer.
[0373] The laser beam is allowed to pass through the galvano
mirrors 174X and 174Y so as to be scanned in the X-Y directions.
Then, the laser beam is allowed to pass through a f-.theta. lens
176 so that penetrating openings 433A for the through holes are
formed in the core substrate 430. The core substrate 430 is placed
on an X-Y table 190 which moves in the X-Y directions.
[0374] The process for manufacturing the multi-layer printed
circuit board according to the fourth embodiment will now be
described with reference to FIGS. 40 to 45. In the fourth
embodiment, the multi-layer printed circuit board is formed by the
semi-additive method.
[0375] (1) As shown in FIG. 40 (A), a copper-clad laminated board
430A incorporating the substrate 430 constituted by glass epoxy
resin or BT (Bismaleimide-Triazine) resin having a thickness of 0.8
mm and having two sides to each of which copper foil 432 having a
thickness of 18 .mu.m is laminated is employed as the starting
material. The copper-clad laminated board 430A is subjected to a
blacking process using a blacking bath (an oxidizing bath) which is
solution containing NaOH (10 g/l), NaClO.sub.2 (40 g/l) and
Na.sub.3PO.sub.4 (6 g/l). Moreover, a reducing process is performed
by using a reducing bath which is solution containing NaOH (10 g/l)
and NaBH.sub.4 (6 g/l). Thus, the rough surface 432.beta. is formed
on the overall surface of the copper foil 432 (FIG. 40 (B)).
Although the blacking and reducing processes are employed to form
the rough surface, the rough surface may be formed by etching or
electroless plating to be described later.
[0376] (2) Then, the substrate 430 is placed on the X-Y table 190
of the carbon dioxide laser unit described with reference to FIG.
49. Then, CO.sub.2 gas laser beams having a wavelength of 10.4
.mu.m are used under conditions that the beam diameter is 5 mm, the
mode is the top-hat mode, the pulse width is 50 .mu.s and the
number of shots is 10 to form penetrating openings 433A each having
a diameter of 100 .mu.m and formed in the central portion of the
substrate 430 at pitches of 300 .mu.m (see FIGS. 40 (C) and 48
(B)).
[0377] (3) A drill 498 is used to form penetrating openings 433B
each having a diameter of 300 .mu.m in the outer periphery of the
substrate 430 at pitches of 600 .mu.m (FIGS. 40 (D) and 48
(B)).
[0378] Then, the substrate 430 is immersed in electroless plating
solution so as to cause copper-plated film to deposit on the side
wall of each of the penetrating openings 433A and 433B. Thus, the
through holes 436A and 436B are formed (FIG. 41 (A)). Then, a usual
method is employed to perform etching in accordance with the
pattern so that inner copper pattern (the lower conductor circuit)
434 is formed on each of the two sides of the substrate (FIG. 41
(B)).
[0379] (4) The substrate having the lower conductor circuit 434
formed thereon is cleaned with water, and then the substrate is
dried. Then, etching solution is sprayed to the two sides of the
substrate so as to etch the surface of the lower conductor circuit
434 and the surfaces of the lands 436a of the through holes 436A
and 436B. Thus, a rough surface 434.beta. is formed on the overall
surface of the lower conductor circuit 434 and a rough surface
436.beta. is formed on each of the lands 936a of the through holes
436A and 436B and the inner walls (FIG. 41 (C)). The rough surfaces
can be formed by the blacking and reducing processes. In the
foregoing case, the blacking process is performed by using a
blacking bath (an oxidizing bath) which is solution containing NaOH
(10 g/l), NaClO.sub.2 (40 g/l) and Na.sub.3PO.sub.4 (6 g/l).
Moreover, the reducing process is performed by using a reducing
bath which is solution containing NaOH (10 g/l) and NaBH.sub.4 (6
g/l).
[0380] The rough surfaces can be formed by immersing the substrate
in etching solution composed of the cupric complex, organic acid
salt, hydrogen peroxide and sulfuric acid or by spraying the
foregoing etching solution. The rough surfaces can be formed by
electroless plating. When the rough surfaces are formed by
electroless plating, the substrate 430 having the conductor circuit
434 formed thereon is degreased with alkali to perform soft
etching. Then, a process using catalyst solution composed of
palladium chloride and organic acid is performed to impart Pd
catalyst. Then, the catalyst is activated. Then, the substrate 430
is immersed in electroless plating solution composed of
3.2.times.10.sup.-2 mol/l copper sulfate, 3.9.times.10.sup.-3 mol/l
nickel sulfate, 5.4.times.10.sup.-2 mol/l complexing agent,
3.3.times.10.sup.-1 mol/l sodium hypophosphite, 5.0.times.10.sup.-1
mol/l boric acid, 0.1 g/l surface active agent (Surfil 465
manufactured by Nissin Chemical) having PH=9. After immersion has
been performed for one minute, the substrate 430 is vibrated
vertically and laterally one time for four seconds. Thus, a coating
layer and a rough layer constituted by a needle alloy made of
Cu--Ni--P are formed on the surface of each conductor circuit 434
and each land 436a of the through hole 436.
[0381] (5) A resin filler 440 mainly composed of cyclo-olefin resin
or epoxy resin is applied to the two sides of the substrate by
using a printer. Thus, the resin filler 440 is enclosed between the
conductor circuits 434 and into the through holes 436A and 436B.
Then, heating and drying processes are performed. That is, the
foregoing process causes the resin filler 440 to be enclosed
between the lower conductor circuits 434 and into the through holes
436A and 436B (FIG. 41 (D)).
[0382] (6) The substrate subjected to the process (5) is polished,
heated and hardened (FIG. 42 (A)).
[0383] (7) The etching solution which is the same as that used in
the process (4) is sprayed to the two sides of the substrate
subjected to the process (6). Thus, the surface of the conductor
circuit 434 and the surfaces of the lands 436a of the through holes
436 which have temporarily be flattened are etched. Thus, the rough
surface 434.beta. is formed on the overall surface of the lower
conductor circuit 434. Moreover, the rough layer 436.beta. is
formed on the surfaces of the lands 436a of the through holes (FIG.
42 (B)). Although the rough surfaces are formed by etching in the
foregoing process, the rough layers may be formed by electroless
plating.
[0384] (8) Then, the substrate subjected to the foregoing process
is provided with the lower interlayer resin insulating layer 450
constituted by cyclo-olefin resin (FIG. 42 (C)).
[0385] (9) Then, similarly to the second embodiment, CO.sub.2 gas
laser beams were applied to form openings 448 for via holes each
having a diameter of 80 .mu.m in the interlayer resin insulating
layer 450 (FIG. 42 (D)). Then, oxygen plasma was used to perform a
desmear process.
[0386] (10) Then, a plasma process is performed to roughen the
surface of the interlayer resin insulating layer 450 (FIG. 43
(A)).
[0387] (11) Then, similarly to the second embodiment, a Ni--Cu
alloy layer 452 was formed on the surface of a polyolefin
interlayer resin insulating layer 450 (FIG. 43 (B)).
[0388] (12) A pattern of a resist 454 was, similarly to the second
embodiment, formed on the substrate subjected to the foregoing
process (FIG. 43 (C)).
[0389] (13) Then, similarly to the second embodiment,
electroplating was performed so that an electrolytic-plated film
456 having a thickness of 15 .mu.m was formed (FIG. 44 (A)).
[0390] (14) Then, similarly to the second embodiment, etching was
performed to perform dissolution and removal so that a conductor
circuit 458 (including via holes 460) constituted by electrolytic
copper-plated film 456 and having a thickness of 16 .mu.m was
formed (FIG. 44 (B)).
[0391] (15) Then, the foregoing processes (5) to (13) are repeated
so that further upper interlayer resin insulating layer 150, the
conductor circuit 483 and the via holes 485 were formed (FIG. 44
(C)).
[0392] (16) Then, a solder resist composition is, similarly to the
first embodiment, applied to the two sides of the multi-layer
printed circuit board to have a thickness of 20 .mu.m. Thus, the
solder resist layer (an organic resin insulating layer) 470 having
the openings 471 corresponding to the solder pad portions and
having a thickness of 20 .mu.m was formed (FIG. 45 (A)).
[0393] (17) Then, similarly to the first embodiment, the
nickel-plated layer 472 having a thickness of 5 .mu.m was formed in
each opening 471. Moreover, the gold-plated layer 474 having a
thickness of 0.03 .mu.m was formed on the nickel-plated layer 472
(FIG. 45 (B)).
[0394] (18) Then, solder paste is printed to the openings in the
solder resist layer 470, and then reflowing is performed at
200.degree. C. Thus, solder bumps (solder) 476S, 476V and 476G are
formed. Thus, the multi-layer printed circuit board 410 is
manufactured (see FIG. 46).
[0395] (19) Finally, the IC chip 90 is placed such that pads 92S,
92V and 92G correspond to the solder bumps 476S, 476V and 476G of
the multi-layer printed circuit board 410. Then, reflowing is
performed so that the IC chip 90 is joined. Then, the foregoing
package substrate 410 is placed on the daughter board 94, and then
reflowing is performed so as to be placed on the daughter board
(FIG. 47).
First Modification of Fourth Embodiment
[0396] FIG. 56 shows the cross section of a multi-layer printed
circuit board according to a first modification of the fourth
embodiment and applied to a package substrate. A multi-layer
printed circuit board 110 according to the first modification is
similar to that according to the fourth embodiment described with
reference to FIG. 46. In the fourth embodiment, the solder bumps
476S, 476V and 476G are formed on the lower surface of the
multi-layer printed circuit board. In the first modification, the
conductive connection pins 478 are provided.
[0397] A method of manufacturing the multi-layer printed circuit
board according to the first modification will now be
described.
[0398] Note that the process A for manufacturing the resin film for
the interlayer resin insulating layer is similar to that according
to the first modification of the second embodiment. The process B
for preparing the resin filler is similar to that according to the
first modification of the third embodiment.
[0399] Method of Manufacturing Multi-Layer Printed Circuit
Board
[0400] (1) A copper-clad laminated board 430A incorporating a
substrate 430 having a thickness of 0.8 mm and constituted by glass
epoxy resin or BT (Bismaleimide-Triazine) and two sides to each of
which copper foil 432 having a thickness of 18 .mu.m is laminated
was employed as the starting material (FIG. 50 (A)). Initially, the
copper-clad laminated board 430A was subjected to a blacking
process using a blacking bath (an oxidizing bath) which is solution
containing NaOH (10 g/l), NaClO.sub.2 (40 g/l) and Na.sub.3PO.sub.4
(6 g/l). Moreover, a reducing process was performed by using a
reducing bath which was solution containing NaOH (10 g/l) and
NaBH.sub.4 (6 g/l). Thus, the rough surface 432.beta. was formed on
the overall surface of the copper foil 432 (FIG. 50 (B)). The rough
surface 432.beta. can be omitted.
[0401] (2) Then, the substrate 430 is placed on the table of a
carbon dioxide laser unit described with reference to FIG. 49.
Then, carbon dioxide gas laser beams are applied so that
penetrating openings 433A each having a diameter of 100 .mu.m are
formed in the central portion of the substrate 430 at pitches of
300 .mu.m (FIGS. 50 (C) and 48 (B)).
[0402] (3) A drill 98 is used to form penetrating openings 433B
each having a diameter of 300 .mu.m in the outer periphery of the
core substrate 430 at pitches of 600 .mu.m (FIGS. 50 (D) and 48
(B)).
[0403] Then, the core substrate 430 was immersed in electroless
plating solution to cause copper-plated film to deposit on each of
the side walls of the penetrating openings 433A and 433B so that
through holes 436A and 436B are formed (FIG. 51 (A)). A usual
method is employed to perform etching to correspond to the pattern
so that inner copper pattern (the lower conductor circuit) 434 was
formed on each of the two sides of the substrate (FIG. 51 (B)).
[0404] (4) The substrate having the lower conductor circuit 434
formed thereon was cleaned with water, and then the substrate was
dried. Then, etching solution was sprayed to the two sides of the
substrate so that the surface of the lower conductor circuit 434
and the surfaces of the lands 436a of the through holes 436A and
936B are etched. Thus, a rough surface 434.beta. was formed on the
overall surface of the lower conductor circuit 434. Moreover, a
rough surface 436.beta. was formed on each of the surfaces and the
inner walls of the lands 436a of the through holes 436A and 4365
(FIG. 51 (C)).
[0405] (5) The resin filler for use in the process B was prepared,
and then a layer of the resin filler 440 was formed in through
holes 436A and 436B, a portion of either side of the substrate 430
on which the conductor circuit is not formed and the output
periphery of the conductor circuit 434 within 24 hours after the
preparation (FIG. 51 (D)).
[0406] That is, a squeeze was used to inwards push the resin filler
440 into the through holes 436A and 436B. Then, drying was
performed at 100.degree. C. for 20 minutes. Then, a mask having
openings corresponding to the portions in which the conductor
circuit is not formed was placed on the substrate. Then, the
squeeze was used to form a layer of the resin filler 440 in the
portion which is formed into a recess and in which the conductor
circuit is not formed. Then, drying was performed at 100.degree. C.
for 20 minutes.
[0407] (6) The substrate subjected to the process (5) was polished.
Then, the resin filler 440 was hardened (FIG. 52 (A)).
[0408] (7) The substrate was cleaned with water, and then the
substrate was degreased with acid. Then, soft etching was
performed, and then etching solution was sprayed to the two sides
of the substrate. Thus, the surface of the lower conductor circuit
434 and the surfaces and the inner walls of the lands 436a of the
through holes 436A and 436B were etched. Thus, the rough surface
434.beta. was formed on the overall surface of the lower conductor
circuit 434 and the rough surface 436.beta. was formed on each of
the surfaces of the lands 436a of the through holes (FIG. 52
(B)).
[0409] (8) Similarly to the first modification of the second
embodiment, a resin film for the interlayer resin insulating layer
was placed on each of the two sides of the substrate so as to be
bonded. Thus, the interlayer resin insulating layer 450 was formed
(FIG. 52 (C)).
[0410] (9) Similarly to the first modification of the second
embodiment, a mask 449 having a thickness of 1.2 mm and penetrating
openings 449a formed therein is placed on the interlayer resin
insulating layer 450. Then, CO.sub.2 gas laser beams were applied
to form the openings 448 each having a diameter of 80 .mu.m in the
interlayer resin insulating layer 450 (FIG. 52 (D)).
[0411] (10) Similarly to the first modification of the second
embodiment, the surface of the interlayer resin insulating layer
450 including the inner wall of each of the openings 448 for the
via holes was roughened (FIG. 53 (A)).
[0412] (11) Then, catalyst cores were allowed to adhere to the
surface of the interlayer resin insulating layer 450 and the inner
wall of each of the openings 448 for the via holes.
[0413] (12) Similarly to the first modification of the second
embodiment, the electroless copper-plated film 451 was formed (FIG.
53 (B)).
[0414] (13) Similarly to the first modification of the second
embodiment, the plating resist 454 having a thickness of 30 .mu.m
was formed (FIG. 53 (C)).
[0415] (14) Then, similarly to the first modification of the second
embodiment, electrolytic copper plating was performed. Thus, the
electrolytic copper-plated film 456 having a thickness of 20 .mu.m
was formed (FIG. 54 (A)).
[0416] (15) The plating resist 54 was separated and removed with 5%
NaOH, and then the electroless plated film 451 below the plating
resist 454 was etched with mixed solution of sulfuric acid and
hydrogen peroxide. Thus, a conductor circuit (including via holes
460) 458 composed of the electroless copper-plated film 451 and the
electrolytic copper-plated film 456 and having a thickness of 18
.mu.m was formed (FIG. 54 (B)).
[0417] (16) A process similar to the process (7) was performed such
that the etching solution containing cupric complex and organic
acid was used to form the rough surface 462 (FIG. 54 (C)).
[0418] (17) The processes (8) to (16) were repeated so that further
upper interlayer resin insulating layer 487, the conductor circuit
483 and the via holes 485 were formed. Thus, the multi-layer
printed circuit board was obtained (FIG. 55 (A)).
[0419] (18) The solder resist composition similar to that according
to the first embodiment was applied to the two sides of the
multi-layer printed circuit board to have a thickness of 20 .mu.m.
Thus, openings 471 each having a diameter of 200 .mu.m were formed.
Hence it follows that the solder resist layer 470 having a
thickness of 20 .mu.m was formed (FIG. 55 (B)).
[0420] (19) Then, the nickel-plate layer 472 having a thickness of
5 .mu.m was formed in each of the openings 471 of the substrate
having the solder resist layer 470. Then, the gold-plated layer 474
having a thickness of 0.03 .mu.m was formed on the nickel-plated
layer 472 (FIG. 55 (C)).
[0421] (20) Then, solder paste containing tin-lead was printed to
the openings in the solder resist layer 470 on the surface of the
substrate on which the IC chip is mounted. Then, solder paste
containing tin-antimony was printed in the operations of the solder
resist layer 470 on the other surface. Then, reflowing was
performed at 200.degree. C. substrate 430 so that solder bumps
476S, 476V and 476G were formed. Then, the conductive connection
pins 478 were provided for the lower surface. As a result, the
printed circuit board 110 was manufactured (see FIG. 56).
Second Modification of Fourth Embodiment
[0422] A second modification of the fourth embodiment will now be
described. In the first embodiment and first modification, the
penetrating openings 433A and 433B are formed in the copper-clad
laminated board. On the other hand, the second modification has the
structure that the resin layer is formed in the copper-clad
laminated board. Then, the penetrating openings 433A and 434B are
formed.
[0423] A method of forming a core substrate according to the second
modification will now be described with reference to FIG. 57.
[0424] (1) A copper-clad laminated board 430A incorporating a
substrate 430 constituted by glass epoxy resin, BT, FR-4 or FR-5
resin having a thickness of 0.8 mm and having two sides to each of
which copper foil 432 having a thickness of 18 .mu.m is laminated
was employed as the starting material (FIG. 57 (A)). A usual method
was employed to perform etching to correspond to the pattern so
that the inner copper pattern (the lower conductor circuit) 431 was
formed on each of the two sides of the substrate (FIG. 57 (B)).
[0425] (2) A thermosetting resin insulating film similar to that
according to the third embodiment is bonded to each of the two
sides of the substrate 430 so that the resin layer 435 is formed
(FIG. 57 (C)).
[0426] (3) The substrate 430 is placed on a table of a carbon
dioxide laser unit similar to that according to the fourth
embodiment. Then, carbon dioxide gas laser beams are applied so
that penetrating openings 433A each having a diameter of 100 .mu.m
are formed in the central portion of the substrate 430 at pitches
of 300 .mu.m (FIG. 57 (D)).
[0427] (4) Then, the drill 98 is used to form penetrating openings
433B each having a diameter of 300 .mu.m in the outer periphery of
the core substrate 430 at pitches of 600 .mu.m (FIG. 57 (E)).
[0428] (5) Then, immersion in electroless plating solution is
performed to cause the copper-plated films to deposit on the side
walls of the penetrating openings 433A and 433B. Thus, the through
holes 436A and 436B are formed. Then, etching is performed so that
the conductor circuit 434 is formed (FIG. 57 (F)). The following
processes are similar to those according to the fourth embodiment
and the second modification. Therefore, the following processes are
omitted from illustration and description.
[0429] In the foregoing embodiment, the through holes each having
the small diameter are formed in the central portion and the
through holes each having the large diameter are formed in the
outer periphery. The present invention is not limited. The through
holes each having the small diameter may arbitrarily be formed in a
portion in which the wiring density must be raised.
Comparative Example 2
[0430] The structure is similar to that according to the fourth
embodiment except for a structure that each of the through holes in
the core substrate is formed to have a diameter of 100 .mu.m by
using laser beams.
Comparative Example 3
[0431] The structure is similar to that according to the fourth
embodiment except for a structure that each of the through holes in
the core substrate is formed to have a diameter of 300 .mu.m by
drilling.
Comparative Example 4
[0432] The structure is similar to that according to the first
modification except for a structure that each of the through holes
in the core substrate is formed to have a diameter of 100 .mu.m by
using laser beams.
Comparative Example 5
[0433] The structure is similar to that according to the first
modification except for a structure that each of the through holes
in the core substrate is formed to have a diameter of 300 .mu.m by
drilling.
[0434] A high-frequency IC chip adapted to 1 GHz was mounted on
each of the multi-layer printed circuit boards according to the
fourth embodiment, the first modification and the second
modification and the multi-layer printed circuit boards according
to comparative examples 2, 3, 4 and 5. Thus, comparative tests were
performed.
[0435] As a result, the IC chips according to comparative examples
3 and 5 encountered frequent occurrence of errors. A consideration
can be made that the foregoing errors are caused from insufficient
supply of electric power because the numbers of the power supply
lines and the earth lines are too small.
[0436] On the other hand, the multi-layer printed circuit boards
according to the fourth embodiment, the first modification and the
second modification and comparative examples 2 and 4 resulted in
stable operations. The multi-layer printed circuit boards according
to comparative examples 2 and 4 have the structure that all of
through holes are formed by laser beams. Therefore, the
manufacturing cost is raised excessively as compared with the
multi-layer printed circuit boards according to the fourth
embodiment, the first modification and the second modification.
Thus, the possibility of disconnection of the through hole is
raised.
Fifth Embodiment
[0437] The structure of a multi-layer printed circuit board
according to a fifth embodiment of the present invention will now
be described with reference to FIG. 65 which is a cross sectional
view showing a multi-layer printed circuit board 510. The
multi-layer printed circuit board 510 incorporates a core substrate
530 having the right and reverse sides on which buildup multilayer
printed circuit boards 580A and 580B are formed. Each of the
buildup multilayer printed circuit boards 580A and 580B
incorporates an interlayer resin insulating layer 550 having via
holes 560 and a conductor circuit 558; and an interlayer resin
insulating layer 581 having via holes 585 and a conductor circuit
583. The buildup multilayer printed circuit board 580A and the
buildup multilayer printed circuit board 580B are connected to each
other through holes 536 formed in penetrating openings 531 formed
in the core substrate. A solder resist 570 is formed on the
interlayer resin insulating layer 581. Solder bumps 576 are
provided for the via holes 585 and the conductor circuit 583
through openings 571 of the solder resist 570.
[0438] In this embodiment, penetrating openings 531 are formed in
the core substrate 530 by applying CO.sub.2 laser beams (YAG laser,
excimer laser or UV laser). Thus, penetrating openings each having
a small diameter can be formed. Moreover, a sputtered layer 532 is
formed on the core substrate 530 by sputtering. Since the sputtered
layer is formed after the penetrating openings have been formed,
retention of metal, such as copper, on the inner wall of the
through hole when openings have been formed by the laser beams can
be prevented which causes separation of the plated film formed on
the inner surface of the through hole.
[0439] A method of manufacturing the multi-layer printed circuit
board 510 will now be described. Note that the material A which is
the adhesive agent for electroless plating and the material B which
is the interlayer resin insulating agent are similar to those
according to the second modification of the second embodiment.
Moreover, the composition C of the resin filler is similar to that
according to the first modification of the third embodiment.
[0440] (1) A core substrate 530 constituted by thermosetting
insulating resin, thermoplastic resin insulating resin or their
composite material having a thickness of 50 .mu.m to 700 .mu.m is
used as the starting material (FIG. 58 (A)). The core substrate is
made of one or more types of materials selected from epoxy resin,
phenol resin, BT (Bismaleimide-Triazine) resin, FR-5, PPE and
polyolefin. A reinforcing agent may be added.
[0441] (2) Then, penetrating openings 531 are formed in the core
substrate 530 by applying CO.sub.2 laser beams (YAG laser, excimer
laser or UV laser) (FIG. 58 (B)). It is most preferable that the
CO.sub.2 laser beam is employed because penetrating openings can
adequately be formed in the core substrate. As distinct from the
conventional copper-clad laminated board, the penetrating openings
are formed in only the resin. Therefore, the penetrating openings
can easily be formed. The diameter of each penetrating opening must
be 75 .mu.m to 250 .mu.m. As a result of the foregoing process,
penetrating openings each having a smaller diameter as compared
with the openings formed by the drill can be formed.
[0442] (3) A sputtered layer 532 is formed on the core substrate
530 by sputtering (FIG. 58 (C)). The thickness of the sputtered
layer 532 must be about 0.01 .mu.m to about 0.1 .mu.m. The metal
for use in the sputtering process may be one or more materials
selected from Ni, Cr, Pd and Mo as well as Cu. Strength between the
sputtered layer and the resin of 1.0 kg/cm.sup.2 which is similar
to that realized by the conventional copper-clad laminated board
can be maintained. After the penetrating openings 531 have been
formed, the sputtered layer 532 is formed. Thus, as distinct from
the structure that the openings are formed in the copper-clad
laminated board by applying laser beams, retention of copper on the
inner wall of the through hole after the opening has been formed
and, therefore, separation of the plated film formed on the inner
surface of the through hole can be prevented.
[0443] (4) The core substrate 530 having the through holes 536
formed therein is subjected to the electroless plating process so
that an electroless plated layer 537 is formed (FIG. 58 (D)). It is
preferable that the thickness of the electroless plating is about
0.1 .mu.m to 0.2 .mu.m. It is preferable that Cu or Ni is employed
to form the foregoing layer.
[0444] (5) Then, a resist 539 corresponding to a predetermined
pattern is formed on the foregoing layer by applying a dry film or
a liquid resist (FIG. 59 (A)). Then, electroplated layer is
performed to correspond to the predetermined pattern so that an
electroplated layer 533 is formed (FIG. 59 (B)).
[0445] (6) Then, the resist 539 on the core substrate 530 is
separated and removed. Then, etching is performed so that the
sputtered layer 532 and the electroless plated layer 537 below the
resist 539 are removed. Thus, a conductor circuit 534 and through
holes 536 are formed. Moreover, etching is performed so that a
rough layer 538 is formed on the surfaces of the conductor circuit
534 and the through holes 536 (FIG. 59 (C)).
[0446] (7) The material C which was the raw material composition
for preparing the resin filler was mixed and kneaded so that the
resin filler was obtained.
[0447] (8) The resin filler temperature in the process (7) was
applied and enclosed to the space between the conductor circuits
534 and the inside portions of the through holes 536 within 24
hours after the preparation.
[0448] The application was performed by a printing method using a
squeeze. The first application operation was performed such that
the through holes 536 were mainly filled with the resin filler.
Then, drying was performed at a temperature of 100.degree. C. for
20 minutes in a drying furnace.
[0449] A second application operation was performed such that
recesses formed when the conductor circuit 534 was formed were
mainly filled with the resin filler. Moreover, the space between
the conductor circuit 534 and the conductor circuit 534 and the
inside portion of each of the through holes 536 were filled with
the resin filler 540. Then, drying was performed under the same
drying conditions (FIG. 59 (D)).
[0450] (9) The substrate 530 subjected to the process (8) is
polished and hardened (FIG. 60 (A)).
[0451] (10) The substrate 530 having the conductor circuit 534
formed thereon is degreased with alkali to perform soft etching.
Then, a process using catalyst solution composed of palladium
chloride and organic acid is performed to supply a Pd catalyst.
Then, the catalyst is activated, and then a coating layer
constituted by a needle alloy made of Cu--Ni--P and a rough layer
542 are formed on the surfaces of the conductor circuit and the
lands of the through holes (FIG. 60 (B)).
[0452] (11) The raw material composition for preparing the material
B which is the interlayer resin insulating agent was stirred and
mixed to adjust the viscosity to 1.5 Pas. Thus, an interlayer resin
insulating material (for the lower layer) is obtained.
[0453] Then, the raw material composition for preparing the
material A which is the adhesive agent for electroless plating is
stirred and mixed, and then the viscosity is adjusted to 7 Pas.
Thus, adhesive agent solution for electroless plating (for the
upper layer) is obtained.
[0454] (12) The interlayer resin insulating agent (for the lower
layer) 544 obtained in the process (11) and having the viscosity of
1.5 Pas is applied to the two sides of the substrate 530 described
in (10) within 24 hours after the preparation by using a roll
coater. Then, the substrate 530 in a state where it is placed
horizontally is allowed to stand for 20 minutes. Then, drying
(prebaking) is performed at 60.degree. C. for 30 minutes. Then,
photosensitive adhesive agent solution (for the upper layer) 546
obtained in the process (11) and having the viscosity of 7 Pas is
applied within 24 hours after the preparation. Then, the substrate
530 in a horizontal state is allowed to stand for 20 minutes, and
then drying (prebaking) is performed at 60.degree. C. for 30
minutes. Thus, an adhesive agent layer 550a having a thickness of
35 .mu.m is formed (FIG. 60 (C)).
[0455] (13) A photomask film 551 having a black circle 551a having
a diameter of 85 .mu.m is brought into hermetic contact with the
two sides of the substrate 530 having the adhesive agent layer
formed in the process (12). Then, ultra high-pressure mercury lamp
was operated to perform exposure at 500 mJ/cm.sup.2 (FIG. 60 (D)).
Then, spray development using DMTG solution is performed. Then, the
foregoing substrate is exposed by the ultra high-pressure mercury
lamp at 3000 mJ/cm.sup.2. Then, a heating process (post baking) is
performed at 100.degree. C. for one hour, 120.degree. C. for one
hour and 150.degree. C. for three hours. Thus, an interlayer resin
insulating layer (two-layer structure) 550 excellent in the
dimension accuracy corresponding to the photomask film,
incorporating openings (openings for forming via holes) 548 each
having a diameter of 85 .mu.m and having a thickness of 35 .mu.m is
formed (FIG. 61 (A)). Note that a tin-plated layer (not shown) was
partially exposed in the opening 548 serving as the via hole.
[0456] (14) The core substrate 530 having the openings 548 is
immersed in chromic acid for 19 minutes to dissolve and remove
epoxy resin particles present on the surface of the interlayer
resin insulating layer. Thus, the surface of the interlayer resin
insulating layer 550 is roughened. Then, the substrate 530 is
immersed in neutral solution (manufactured by Shilay), and then the
substrate 530 is cleaned with water (FIG. 61 (B)).
[0457] Then, a palladium catalyst (manufactured by Atotech) is
supplied to the surface of the substrate 530 subjected to the
roughening process (depth of the roughened portion is 6 .mu.m).
Thus, catalyst cores are allowed to adhere to the surface of the
interlayer resin insulating layer 550 and the inner walls of the
openings 548 for the via holes. As an alternative to this, strong
acid (hydrochloric acid, sulfonic acid, nitric acid or the like) or
permanganic acid may be employed.
[0458] (15) The substrate 530 is immersed in electroless plating
solution having the following composition to form an electroless
copper-plated film 552 having a thickness of 0.6 .mu.m to 1.2 .mu.m
is formed on the overall rough surface (FIG. 61 (C)).
[Electroless Plating Solution]
TABLE-US-00006 [0459] EDTA 0.08 mol/l Copper Sulfate 0.03 mol/l
HCHO 0.05 mol/l NaOH 0.05 mol/l .alpha.,.alpha.'-bipyridyl 80 mg/l
PEG 0.10 g/l
[Electroless Plating Conditions]
[0460] 20 minutes when the temperature of the solution is
65.degree. C.
[0461] (16) A marketed photosensitive dry film is bonded to the
surface of the electroless copper-plated film 552 formed in the
process (15). Then, a mask is placed, and then exposure is
performed at 100 mJ/cm.sup.2. Then, a development process is
performed by using sodium carbonate so that a plating resist 554
having a thickness of 15 .mu.m is obtained (FIG. 61 (D)).
[0462] (17) Then, similarly to the first modification of the second
embodiment, the portion in which the resist is not formed is
subjected to electrolytic copper plating. Thus, an electrolytic
copper-plated film 556 having a thickness of 15 .mu.m is formed
(FIG. 62 (A)).
[0463] (18) The plating resist 554 was separated and removed with
5% KOH, and then the electroless copper-plated film 552 was
subjected to an etching process using mixed solution of sulfuric
acid and hydroperoxide so as to be dissolved and removed. Thus, the
conductor circuit 558 having a thickness of 18 .mu.m (including the
via holes 560) is constituted by the electroless copper-plated film
552 and the electrolytic copper-plated film 556 was formed (FIG. 62
(B)).
[0464] (19) A process similar to the process (10) is performed such
that etching solution containing cupric complex and organic acid
was used to form the rough layer 562. Then, Sn-substitution for the
surface was performed (FIG. 62 (C)).
[0465] (20) The processes (11) to (19) were repeated so that the
further upper interlayer resin insulating layer 581, the conductor
circuit 583 and the via holes 585 were formed. Thus, the
multi-layer printed circuit board was obtained. Note that the
Sn-substitution for the rough surface 162 in the surface layer was
not performed (FIG. 62 (D)).
[0466] (21) The two sides of the multi-layer printed circuit board
were coated with the solder resist composition 570a similarly to
the first embodiment to have a thickness of 20 .mu.m (FIG. 63 (A)).
Then, exposure was performed by using ultraviolet rays, and a DMTG
process was performed. Then, a heating process was performed so
that the solder resist 570 (having a thickness of 20 .mu.m)
incorporating openings 571 (each having a diameter of 200 .mu.m)
formed in the solder pad portions (including the via holes and
their lands) was formed (FIG. 63 (B)).
[0467] (22) Then, similarly to the first embodiment, a metal layer
572 having a thickness of 5 .mu.m and constituted by nickel was
formed in each of the openings 571 (FIG. 64 (A)). Thus, when the
conductor circuit 583 for forming the solder pads 77 has pits and
projections, the pits and projections can completely be coated. As
a result, the surface condition of the metal layer 572 can be
uniformed.
[0468] (23) Then, the gold-plated layer 574 having a thickness of
0.03 .mu.m was formed on the metal layer 572 (FIG. 64 (B)).
[0469] (24) Then, solder paste was printed to the opening 571 of
the solder resist 570. Then, reflowing was performed at 200.degree.
C. so that the solder bumps 576 (solder) were formed (see FIG.
65).
First Modification of Fifth Embodiment
[0470] The structure of the first modification is basically the
same as that of the fifth embodiment.
[0471] As an alternative to the interlayer resin insulating layer,
the thermosetting resin film according to the third embodiment was
employed. Thus, an interlayer resin insulating layer having a
thickness of 35 .mu.m and incorporating via holes was formed.
Second Modification of Fifth Embodiment
[0472] A manufacturing method according to the second modification
is basically the same as processes (1) to (10) according to the
fifth embodiment.
[0473] As an alternative to the interlayer resin insulating layer,
the film was previously manufactured by polyolefin which was a low
dielectric material. Then, the film was pressed with heat so that
via holes were formed by using carbon dioxide laser beams, excimer
laser beams or UV laser beams.
[0474] (11) Then, the substrate subjected to the foregoing process
is provided with an interlayer resin insulating layer 550
constituted by cyclo-olefin resin similarly to the second
embodiment (FIG. 66 (A)).
[0475] (12) Then, similarly to the second embodiment, CO, gas laser
beams were used to form the openings 548 for the via holes each
having a diameter of 80 .mu.m in the interlayer resin insulating
layer 550 (FIG. 66 (B)).
[0476] (13) Then, a plasma process was performed to roughen the
surface of the interlayer resin insulating layer 550 (FIG. 66
(C)).
[0477] (14) Then, similarly to the second embodiment, the Ni--Cu
alloy layer 52 was formed on the surface of the polyolefin
interlayer resin insulating layer 550 (FIG. 66 (D)).
[0478] (15) The substrate subjected to the foregoing process was
provided with the pattern of the plating resist 554 similarly to
the second embodiment (FIG. 67 (A)).
[0479] (16) Then, similarly to the second embodiment,
electroplating was performed so that the electrolytic copper-plated
film 556 having a thickness of 15 .mu.m was formed (FIG. 67
(B)).
[0480] (17) Then, the plating resist 554 was separated and removed
with 5% NaOH, and then the electroless Ni--Cu alloy layer 552
present below the plating resist 554 was dissolved and removed by
performing etching. Thus, the conductor circuit 558 (including the
via holes 560) constituted by the electrolytic copper-plated film
556 and so forth and having a thickness of 16 .mu.m was formed
(FIG. 67 (C)).
[0481] (18) Then, the processes (11) to (17) are repeated so that
upper interlayer resin insulating layer 581, the conductor circuit
583 and the via holes 585 were formed (FIG. 67 (D)).
[0482] (19) Then, the solder resist composition was applied to the
multi-layer printed circuit board to have a thickness of 20 .mu.m
similarly to the first embodiment. Thus, the openings 571 each
having a diameter of 200 .mu.m were formed. Then, a heating process
was performed to harden the solder resist layer. Thus, the solder
resist layer (the organic resin layer) 570 incorporating the
openings 571 corresponding to the solder pad portions and having a
thickness of 20 .mu.m was formed (FIG. 68 (A)).
[0483] (20) Then, the nickel-plated layer 572 having a thickness of
5 .mu.m was formed on the inner surface of each of the openings
571U and 571D of the substrate having the solder resist (the
organic resin layer) 570 similarly to the first embodiment. Then,
the gold-plated layer 574 having a thickness of 0.03 .mu.m was
formed on the metal layer 572 (FIG. 68 (B)).
[0484] (21) Then, solder paste is printed to the openings in the
solder resist 570. Then, reflowing is performed at 200.degree. C.
so that solder bumps (solder) 576 are formed so that the
multi-layer printed circuit board 510 is manufactured (FIG.
69).
Third Modification of Fifth Embodiment
[0485] The third modification is basically the same as the second
modification. As an alternative to the resin filler which is
enclosed, a resin film is directly bonded to simultaneously perform
enclosure of the resin and formation of the insulating layer. The
resin film may be a resin film similar to that according to the
first modification or the second modification.
[0486] The fifth embodiment enables through holes each having a
small diameter (100 .mu.m or smaller) to be formed in the core
substrate. When reliability tests were performed at high
temperatures and high humidity in a state where heat cycles were
carried out, the electric characteristics are not different between
the right side and the reverse side. Moreover, any separation and
crack of the conductor circuit, the resin filler or the interlayer
resin insulating layer starting with the through hole was not
observed. Therefore, a high-density and reliable multi-layer
buildup printed circuit board can be obtained. When the present
invention is applied to the buildup multilayer printed circuit
board, a significant effect can be obtained.
* * * * *