U.S. patent application number 12/511515 was filed with the patent office on 2010-01-28 for catadioptric projection objective with pupil correction.
This patent application is currently assigned to Carl Zeiss SMT AG. Invention is credited to Aurelian Dodoc.
Application Number | 20100020390 12/511515 |
Document ID | / |
Family ID | 38828374 |
Filed Date | 2010-01-28 |
United States Patent
Application |
20100020390 |
Kind Code |
A1 |
Dodoc; Aurelian |
January 28, 2010 |
CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL CORRECTION
Abstract
A catadioptric projection objective includes a plurality of
optical elements arranged to image an off-axis object field
arranged in an object surface onto an off-axis image field arranged
in an image surface of the projection objective. The optical
elements form: a first, refractive objective part that can generate
a first intermediate image from radiation coming from the object
surface and including a first pupil surface; a second objective
part including at least one concave mirror that can image the first
intermediate image into a second intermediate image and including a
second pupil surface optically conjugated to the first pupil
surface; and a third objective part that can image the second
intermediate image onto the image surface and including a third
pupil surface optically conjugated to the first and second pupil
surface. The optical elements are arranged between the object
surface and the first pupil surface form a Fourier lens group which
includes a negative lens group arranged optically close to the
first pupil surface.
Inventors: |
Dodoc; Aurelian;
(Heidenheim, DE) |
Correspondence
Address: |
FISH & RICHARDSON PC
P.O. BOX 1022
MINNEAPOLIS
MN
55440-1022
US
|
Assignee: |
Carl Zeiss SMT AG
Oberkochen
DE
|
Family ID: |
38828374 |
Appl. No.: |
12/511515 |
Filed: |
July 29, 2009 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
PCT/EP2007/001708 |
Feb 28, 2007 |
|
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12511515 |
|
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Current U.S.
Class: |
359/364 |
Current CPC
Class: |
G02B 17/0816 20130101;
G02B 17/08 20130101; G03F 7/70341 20130101; G03F 7/70275 20130101;
G02B 17/0804 20130101; G02B 17/0812 20130101; G02B 17/0892
20130101; G03F 7/70225 20130101; G02B 17/00 20130101 |
Class at
Publication: |
359/364 |
International
Class: |
G02B 17/08 20060101
G02B017/08 |
Claims
1. A projection objective having an optical axis, the projection
objective comprising: a plurality of optical elements arranged to
image an object field arranged in an object surface of the
projection objective onto an image field arranged in an image
surface of the projection objective, the object field being
entirely outside the optical axis of the projection objective, the
image field being entirely outside the optical axis of the
projection objective, and the optical elements forming: a first,
refractive objective part configured to generate a first
intermediate image from radiation coming from the object surface,
the first, refractive objective part including a first pupil
surface; a second objective part comprising at least one concave
mirror configured to image the first intermediate image into a
second intermediate image, the second objective part including a
second pupil surface optically conjugated to the first pupil
surface; and a third objective part configured to image the second
intermediate image onto the image surface, the third object part
including a third pupil surface optically conjugated to the first
and second pupil surfaces; and a correcting element, wherein:
optical elements arranged between the object surface and the first
pupil surface form a Fourier lens group that comprises a negative
lens group arranged optically close to the first pupil surface; the
correcting element is in a space at or optically close to the first
pupil surface, or the correcting element can be inserted into the
space at or optically close to the first pupil surface; and the
projection objective is a catadioptric projection objective.
2. The projection objective according to claim 1, wherein the
projection objective is configured to be used in a microlithography
projection-exposure system.
3. The projection objective according to claim 1, wherein the
correcting element is a plane plate having at least one aspheric
surface.
4. The projection objective according to claim 1, wherein: the
projection objective is configured to be used in a microlithography
projection-exposure system; and when the projection objective is in
the microlithography projection-exposure system, the correcting
element can be exchanged with another correcting element having a
different shape without removing the projection objective from the
microlithography projection-exposure system.
5. The projection objective according to claim 1, wherein the
correcting element is configured to be moved or tilted relative to
a nearest pupil position.
6. The projection objective according to claim 1, wherein the
negative lens group comprises a biconcave negative lens immediately
upstream of the first pupil surface along a direction that the
radiation propagates through the projection objective.
7. The projection objective according to claim 1, wherein the
negative lens group is a single biconcave negative lens arranged
immediately upstream of the first pupil surface along a direction
that the radiation propagates through the projection objective so
that no positive lens is arranged between the biconcave negative
lens and the first pupil surface.
8. The projection objective according to claim 1, wherein the
Fourier lens group consists of: a first positive lens group
immediately down-stream of the object surface along a direction
that the radiation propagates through the projection objective; a
first negative lens group immediately following the first positive
lens group along the direction that the radiation propagates
through the projection objective; a second positive lens group
immediately following the first negative lens group along a
direction that the radiation propagates through the projection
objective; and a second negative lens group immediately following
the second positive lens group along the direction that the
radiation propagates through the projection objective, the second
negative lens group being arranged optically close to the first
pupil surface.
9. The projection objective according to claim 8, wherein the first
negative lens group is arranged optically close to the object
surface in a region where the condition |RHR|>0.5 holds, and RHR
is a ray height ratio.
10. The projection objective according to claim 8, wherein the
first negative lens group comprises a negative meniscus lens having
a concave surface facing the object surface.
11. The projection objective according to claim 1, further
comprising an aperture stop positioned at the first pupil
surface.
12. The projection objective according to claim 1, wherein the
third objective part comprises between the third pupil surface and
the image surface in this order along a direction that the
radiation propagates through the projection objective: a front
positive lens group; a zone lens having negative refractive power
at least in a peripheral zone around the optical axis of the
projection objective; and a rear positive lens group comprising a
last optical element of the projection objective immediately
upstream of the image surface along the light propagation direction
of the projection objective.
13. A projection objective having an optical axis, the projection
objective comprising: a plurality of optical elements arranged to
image an object field arranged in an object surface of the
projection objective onto an image field arranged in an image
surface of the projection objective, the object field being
entirely outside the optical axis of the projection objective, the
image field being entirely outside the optical axis of the
projection objective, and the optical elements forming: a first,
refractive objective part configured to generate a first
intermediate image from radiation coming from the object surface,
the first, refractive objective part including a first pupil
surface; a second objective part comprising at least one concave
mirror configured to image the first intermediate image into a
second intermediate image, the second objective part including a
second pupil surface optically conjugated to the first pupil
surface; and a third objective part configured to image the second
intermediate image onto the image surface, the third object part
including a third pupil surface optically conjugated to the first
and second pupil surfaces, wherein: optical elements arranged
between the object surface and the first pupil surface form a
Fourier lens group that comprises a negative lens group arranged
optically close to the first pupil surface; the Fourier lens group
is configured such that a Petzval radius R.sub.P at the first pupil
surface satisfies the condition: |R.sub.P|>150 mm; and the
projection objective is a catadioptric projection objective.
14. The projection objective according to claim 13, wherein the
projection objective is configured to be used in a microlithography
projection-exposure system.
15. The projection objective according to claim 13, wherein the
negative lens group comprises a biconcave negative lens immediately
upstream of the first pupil surface along a direction that the
radiation propagates through the projection objective.
16. The projection objective according to claim 13, wherein the
negative lens group is a single biconcave negative lens arranged
immediately upstream of the first pupil surface along a direction
that the radiation propagates through the projection objective so
that no positive lens is arranged between the biconcave negative
lens and the first pupil surface.
17. The projection objective according to claim 13, wherein the
Fourier lens group consists of: a first positive lens group
immediately down-stream of the object surface along a direction
that the radiation propagates through the projection objective; a
first negative lens group immediately following the first positive
lens group along the direction that the radiation propagates
through the projection objective; a second positive lens group
immediately following the first negative lens group along a
direction that the radiation propagates through the projection
objective; and a second negative lens group immediately following
the second positive lens group along the direction that the
radiation propagates through the projection objective, the second
negative lens group being arranged optically close to the first
pupil surface.
18. The projection objective according to claim 13, further
comprising an aperture stop positioned at the first pupil
surface.
19. The projection objective according to claim 13, wherein the
third objective part comprises between the third pupil surface and
the image surface in this order along a direction that the
radiation propagates through the projection objective: a front
positive lens group; a zone lens having negative refractive power
at least in a peripheral zone around the optical axis of the
projection objective; and a rear positive lens group comprising a
last optical element of the projection objective immediately
upstream of the image surface along the light propagation direction
of the projection objective.
20. A system, comprising: an illumination system; and a projection
objective according to claim 1, wherein the system is a
microlithography projection-exposure system.
Description
[0001] This application is a continuation of, and claims benefit
under 35 USC 120 to, international application PCT/EP2007/001708,
filed Feb. 28, 2007, which is hereby incorporated by reference in
its entirety.
FIELD
[0002] The disclosure relates to a catadioptric projection
objective including a plurality of optical elements arranged to
image an off-axis object field arranged in an object surface of the
projection objective onto an off-axis image field arranged in an
image surface of the projection objective.
BACKGROUND
[0003] Catadioptric projection objectives are employed, for
example, in projection exposure systems, in particular wafer
scanners or wafer steppers, used for fabricating semiconductor
devices and other types of microdevices and serve to project
patterns on photomasks or reticles, hereinafter referred to
generically as "masks" or "reticles," onto an object having a
photosensitive coating with ultrahigh resolution on a reduced
scale.
SUMMARY
[0004] In some embodiments, the disclosure provides a catadioptric
projection objective for microlithography suitable for use in the
vacuum ultraviolet (VUV) range, where correction of imaging
aberrations for different field points is facilitated. In certain
embodiments, field dependent variations are largely avoided upon
correction of imaging aberrations.
[0005] In some embodiments, the disclosure provides a catadioptric
projection objective that includes a plurality of optical elements
arranged to image an off-axis object field arranged in an object
surface onto an off-axis image field arranged in an image surface
of the projection objective. The optical elements form: a first,
refractive objective part that can generate a first intermediate
image from radiation coming from the object surface and including a
first pupil surface; a second objective part including at least one
concave mirror that can image the first intermediate image into a
second intermediate image and including a second pupil surface
optically conjugated to the first pupil surface; and a third
objective part that can image the second intermediate image onto
the image surface and including a third pupil surface optically
conjugated to the first and second pupil surface. Optical elements
arranged between the object surface and the first pupil surface
form a Fourier lens group that includes a negative lens group
arranged optically close to the first pupil surface.
[0006] The correction status of the first pupil surface can be
influenced in a targeted manner to provide a first pupil surface
having a surface curvature substantially weaker (radius of
curvature substantially larger) than in certain known systems. A
corrected pupil image is desirable to avoid field variations of
correction effects induced by correcting elements positioned at the
pupil position. Field curvature is generally the main aberration of
the image of the entrance pupil to the first pupil surface. In
order to correct the pupil image, a mechanism for correcting field
curvature is desirably positioned in the objective part upstream
the pupil surface.
[0007] A specific distribution of refractive power within the
Fourier lens group can be provided to influence the pupil imaging
which images the entrance pupil of the projection objective into
the first pupil surface. Overall positive refractive power is
involved for the Fourier lens group to collect radiation having a
relatively large object-side numerical aperture into a beam passing
through the first pupil surface. An undercorrection of the first
pupil surface with regard to image curvature is thereby produced.
Providing a negative lens group optically close to the first pupil
surface may at least partly counteract the overall effect of the
Fourier lens group on the curvature of the first pupil surface and
provides a "flattening effect" on the curvature of the first pupil
surface.
[0008] If it is often desired to effect a correction of aberrations
essentially constant for all field points one or more correction
elements may be placed in or optically close to a pupil surface. A
variation of correcting effects across the field is also dependent
on the path of ray bundles from different field points near the
pupil surface. In case of large differences a correction element
placed at or close to the pupil surface may have a field-dependent
correcting effect. Even where a correction status of a pupil
surface is relatively good, there is still a dependency from the
angles of incidence of different rays at the pupil surface for
different field points. It may be desirable to improve the
correction status of the pupil surface. In particular, this can
provide a mechanism to reduce the curvature of the first pupil
surface.
[0009] Although it may be possible to provide at least one (weak)
positive lens between the negative lens group and the pupil
surface, the flattening effect may be improved where the negative
lens group is arranged immediately upstream of the first pupil
surface such that no positive lens is arranged between the negative
lens group and the pupil surface.
[0010] Optionally, at least one negative lens of the negative lens
group is arranged very close to or at the first pupil surface.
Where negative refractive power is provided very close to or at the
first pupil surface, the overall influence of this negative
refractive power on the refractive power of the Fourier lens group
is relatively small (due to a small value for the chief ray height,
CRH), whereas at the same time the influence on correction of image
field curvature of the pupil imaging may be relatively strong to
provide the flattening effect on the curvature of the first pupil
surface. In some embodiments, the negative lens group includes at
least one negative lens arranged in a region where a marginal ray
height MRH is substantially greater than a chief ray height CRH
such that the condition |RHR|<0.2 is fulfilled for the ray
height ratio RHR=CRH/MRH. Optionally, the condition
|RHR.ANG.<0.1 holds.
[0011] In some embodiments, the negative lens group is formed by a
single negative lens, whereby negative refractive power can be
provided in an axially narrow space close to the first pupil
surface. In certain embodiments, the negative lens group may be
formed by two or more lenses including at least one negative lens,
where the lenses in combination have negative refractive power.
[0012] In some embodiments, the negative lens group includes a
biconcave negative lens immediately upstream of the first pupil
surface, where the biconcave negative lens can be preceded by a
positive lens upstream thereof such that the biconcave negative
lens is the only lens of the negative lens group. A targeted
concentration of negative refractive power close to the first pupil
surface is thereby obtained.
[0013] In some embodiments, the Fourier lens group is configured
such that a Petzval radius R.sub.P at the first pupil surface obeys
the condition |R.sub.P|>150 mm, which is relatively large
compared to certain known systems having comparable object-side
numerical aperture. The Petzval radius as used here corresponds to
the radius of curvature of the first pupil surface. The Petzval
radius is proportional to the reciprocal of the Petzval sum
1/R.sub.P of the Fourier lens group. The Petzval radius may be
significantly larger than that, such as larger than 200 mm or
larger than 250 mm.
[0014] In some embodiments, an aperture stop is positioned at the
first pupil surface. The aperture stop may have a variable diameter
allowing to adjust the utilized image-side numerical aperture NA.
The variable aperture stop may be designed as a planar aperture
stop, because little or no significant influence on telecentricity
will generally occur when the diameter of the aperture stop is
changed at a relatively flat first pupil surface.
[0015] In some embodiments the Fourier lens group has a first
positive lens group ("P") immediately following the object surface,
a first negative lens group ("N") immediately following the first
positive lens group, a second positive lens group immediately
following the first negative lens group, and a second negative lens
group immediately following the second positive lens group and
arranged optically close to the first pupil surface. Such Fourier
lens group therefore includes two subsequent lens combinations of
type P-N. A beneficial distribution of correcting effect for
different aberrations, such as spherical aberration of the first
pupil surface, astigmatism and field curvature may be obtained in
this structure.
[0016] In some embodiments, the Fourier lens group has been
improved with respect to lens material consumption and correcting
effect by providing that the Fourier lens group includes at least
one aspheric surface optically close to the object surface where
RHR>|0.5| and at least one aspheric surface optically close to
the first pupil surface where |RHR|<0.2. Optionally, at least
one aspheric surface is provided in an intermediate region between
the object surface and the first pupil surface in a region where
the condition 0.2<|RHR|<|0.5| applies. The aspheric surface
in the intermediate region may be provided in addition to the
aspheric surfaces close to the field surface (object surface) and
the first pupil surface.
[0017] In some embodiments, the third objective part is largely
responsible for providing the high image-side numerical aperture
provides significant contribution to correction of spherical
aberration and coma of the imaging process. The third objective
part, which can be purely refractive, may include between the third
pupil surface and the image surface in his order: a front positive
lens group; a zone lens having negative refractive power at least
in a peripheral zone around an optical axis; and a rear positive
lens group including a last optical element of the projection
objective immediately upstream of the image surface.
[0018] The zone lens may have positive refractive power in a
central zone around the optical axis. The zone lens may be designed
as an aspheric lens configured to provide a negative refractive
effect which increases from a central zone to a peripheral zone of
the negative zone lens. In some embodiments, the zone lens is a
meniscus lens having a concave surface facing the object surface.
The zone lens may be arranged immediately upstream of the last
optical element.
[0019] These features of the third lens group may be beneficial
independent of the type of optical design and of the design of the
first lens group in different projection objectives having a final
imaging subsystem to image a final intermediate image onto the
image surface.
[0020] Different types of projection objectives may be used. In
some embodiments, the catadioptric projection objective is designed
as an "in-line-system" i.e. as a catadioptric projection objective
having one straight (unfolded) optical axis common to all optical
elements of the projection objective. From an optical point of
view, in-line systems may be favorable since optical problems
caused by utilizing planer folding mirrors, such as polarization
effects, can largely be avoided. Also from a manufacturing point of
view, in-line systems may be designed such that conventional
mounting techniques for optical elements can be utilized, thereby
improving mechanical stability, of the projection objective.
[0021] In some embodiments, the second objective part has a mirror
group having an object-side mirror group entry for receiving
radiation coming from the object surface and an image-side mirror
group exit for exiting radiation emerging from the mirror group
exit towards the image surface, where the mirror group includes an
even number of concave mirrors. In some embodiments, the second
objective part has exactly two concave mirrors. The second
objective part may be catadioptric (including at least one
transparent lens in addition to at least one concave mirror) or
catoptric (having only mirrors). In some embodiments capable of
providing an obscuration free imaging without vignetting at very
high image-side numerical apertures NA>1 all concave mirrors of
the mirror group are optically remote from a pupil surface.
[0022] In certain embodiments, the second objective part has
exactly one concave mirror positioned at or optically close to the
pupil surface of the second objective part, and one or more
negative lenses arranged ahead of the concave mirror in a region of
relatively large marginal ray heights in order to correct axial
chromatic aberration (CHL) and contribute to Petzval sum correction
("Schupmann principle"). The projection objective may include a
first planar folding mirror (deflecting mirror) tilted relative to
the optical axis to deflect radiation coming from the optical
surface towards the concave mirror or to deflect radiation coming
from the concave mirror towards the image surface. A second planar
folding mirror optically downstream of the first planar folding
mirror may be provided and oriented at right angles to the first
folding mirror to allow parallel orientation of object surface and
image surface. Representative examples of folded catadioptric
projection objective using planar folding mirrors in combination
with a single concave mirror are disclosed, for example, in US
2003/0234912 A1 or US 2004/0233405 A1 or WO 2005/111689 A2 or U.S.
Pat. No. 6,995,833 B2. The disclosure of these documents related to
the general layout of these systems is incorporated herein by
reference.
[0023] The previous and other properties can be seen not only in
the claims but also in the description and the drawings, wherein
individual characteristics may be used either alone or in
sub-combinations as embodiments of the disclosure and in other
areas and may individually represent advantageous and patentable
embodiments.
BRIEF DESCRIPTION OF THE DRAWINGS
[0024] FIG. 1 is a meridional section of a projection
objective;
[0025] FIG. 2 is a meridional section of a reference projection
objective;
[0026] FIGS. 3A-3C show diagrams indicating the correction status
of the first pupil surface of the reference system of FIG. 2;
[0027] FIGS. 4A-4C show diagrams indicating the correction status
of the third pupil surface of the reference system shown in FIG.
2;
[0028] FIGS. 5A-5C show diagrams indicating the correction status
of the first pupil surface in FIG. 1;
[0029] FIG. 6 shows a meridional section of a projection
objective;
[0030] FIG. 7 shows an enlarged detail of the Fourier lens group
LG1 of the projection objective in FIG. 6;
[0031] FIG. 8 shows a diagram representing the field variation of
the RMS spot size of the projection objective in FIG. 6;
[0032] FIG. 9 shows a diagram indicating the field variation of
tangential shell and sagittal shell in the embodiment of FIG.
6;
[0033] FIG. 10 shows a diagram of the dependency of the ray
deflection angle RDA from the normalized pupil height PH for a zone
lens L3-11 in FIG. 6;
[0034] FIG. 11 shows a meridional section of another embodiment of
a catadioptric projection objective;
[0035] FIG. 12 shows an enlarged detail of the Fourier lens group
LG1 of FIG. 11;
[0036] FIG. 13 shows a diagram representing the field variation of
the RMS spot size of the projection objective in FIG. 11;
[0037] FIG. 14 shows a diagram indicating the field variation of
tangential shell and sagittal shell in the embodiment of FIG.
11;
[0038] FIG. 15 shows a meridional section of another projection
objective having a single concave mirror at a pupil surface;
[0039] FIG. 16 shows an enlarged detail of the Fourier lens group
of FIG. 15;
[0040] FIG. 17 shows a diagram representing the field variation of
the RMS spot size of the projection objective in FIG. 15;
[0041] FIG. 18 shows a diagram indicating the field variation of
tangential shell and sagittal shell in the embodiment of FIG.
15.
DETAILED DESCRIPTION
[0042] In the following description, the term "optical axis" refers
to a straight line or a sequence of straight-line segments passing
through the centers of curvature of the optical elements. The
optical axis can be folded by folding mirrors (deflecting mirrors).
In the case of the examples presented here, the object is a mask
(reticle) bearing the pattern of a layer of an integrated circuit
or some other pattern, for example, a grating pattern. The image of
the object is projected onto a wafer serving as a substrate that is
coated with a layer of photoresist, although other types of
substrates, such as components of liquid-crystal displays or
substrates for optical gratings, are also feasible.
[0043] Where tables are provided to disclose the specification of a
design shown in a figure, the table or tables are designated by the
same numbers as the respective figures. Corresponding features in
the figures are designated with like or identical reference
identifications to facilitate understanding. Where lenses are
designated, an identification L3-2 denotes the second lens in the
third objective part (when viewed in the light propagation
direction).
[0044] FIG. 1 shows a catadioptric projection objective 100
designed for ca. .lamda..apprxeq.193 nm UV operating wavelength. It
is designed to project an image of a pattern on a reticle arranged
in the planar object surface OS (object plane) into the planar
image surface IS (image plane) on a reduced scale, for example,
4:1, while creating exactly two real intermediate images IMI1,
IMI2. The effective object field OF and image field IF are
off-axis, i.e. entirely outside the optical axis AX. A first
refractive objective part OP1 is designed for imaging the pattern
in the object surface into the first intermediate image IMI1 at an
enlarged scale. A second, catoptric (purely reflective) objective
part OP2 images the first intermediate image IMI1 into the second
intermediate image IMI2 at a magnification close to 1:1. A third,
refractive objective part OP3 images the second intermediate image
IMI2 onto the image surface IS with a strong reduction ratio.
[0045] The path of the chief ray CR of an outer field point of the
off-axis object field OF is drawn bold in FIG. 1 in order to
facilitate following the beam path of the projection beam. For the
purpose of this application, the term "chief ray" (also known as
principal ray) denotes a ray running from an outermost field point
(farthest away from the optical axis) of the effectively used
object field OF to the center of the entrance pupil. Due to the
rotational symmetry of the system the chief ray may be chosen from
an equivalent field point in the meridional plane as shown in the
figures for demonstration purposes. In projection objectives being
essentially telecentric on the object side, the chief ray emanates
from the object surface parallel or at a very small angle with
respect to the optical axis. The imaging process is further
characterized by the trajectory of marginal rays. A "marginal ray"
as used herein is a ray running from an axial object field point
(field point on the optical axis) to the edge of an aperture stop.
That marginal ray may not contribute to image formation due to
vignetting when an off-axis effective object field is used. The
chief ray and marginal ray are chosen to characterize optical
properties of the projection objectives. The radial distances
between such selected rays and the optical axis at a given axial
position are denoted as "chief ray height" (CRH) and "marginal ray
height" (MRH), respectively.
[0046] Three mutually conjugated pupil surfaces P1, P2 and P3 are
formed at positions where the chief ray CR intersects the optical
axis. A first pupil surface P1 is formed in the first objective
part between object surface and first intermediate image, a second
pupil surface P2 is formed in the second objective part between
first and second intermediate image, and a third pupil surface P3
is formed in the third objective part between second intermediate
image and the image surface IS.
[0047] The second objective part OP2 includes a first concave
mirror CM1 having the concave mirror surface facing the object
side, and a second concave mirror CM2 having the concave mirror
surface facing the image side. The mirror surfaces are both
continuous or unbroken, i.e. they do not have a hole or bore in the
area used for reflection. The mirror surfaces facing each other
define a catadioptric cavity, which is also denoted intermirror
space, enclosed by the curved surfaces defined by the concave
mirrors. The intermediate images IMI1, IMI2 are both situated
inside the catadioptric cavity well apart from the mirror
surfaces.
[0048] Objective 100 is rotational symmetric and has one straight
optical axis AX common to all refractive and reflective optical
components ("In-line system"). There are no folding mirrors. An
even number of reflections occurs. Object surface and image surface
are parallel. There is no image flip. The concave mirrors have
small diameters allowing to bring them close together and rather
close to the intermediate images lying in between. The concave
mirrors are both constructed and illuminated as off-axis sections
of axial symmetric surfaces. The light beam passes by the edges of
the concave mirrors facing the optical axis without vignetting.
Both concave mirrors are positioned optically remote from a pupil
surface rather close to the next intermediate image. The objective
has an unobscured circular pupil centered around the optical axis
thus allowing use as projection objectives for
microlithography.
[0049] The projection objective 100 is designed as an immersion
objective for .lamda.=193 nm having an image side numerical
aperture NA=1.55 when used in conjunction with a high index
immersion fluid between the exit surface of the objective and the
image surface. The projection objective is designed for a
rectangular 26 mm * 5.5 mm image field and is corrected for a
design object field having object field radius (object height) 63.7
mm.
[0050] The specification for this design is summarized in Table 1.
The leftmost column lists the number of the refractive, reflective,
or otherwise designated surface, the second column lists the
radius, r, of curvature of that surface [mm], the third column
indicates aspheric surfaces "AS". The fourth column lists the
distance, d [mm], between a surface and the next surface, a
parameter that is referred to as the "thickness" of the optical
element, the fifth column lists the material employed for
fabricating that optical element, and the sixth column lists the
refractive index of the material employed for its fabrication. The
seventh column lists the optically utilizable, clear, semi diameter
[mm] (optically free radius) of the optical component. A radius of
curvature r=0 in a table designates a planar surface (having
infinite radius).
[0051] A number of surfaces (indicated AS) are aspherical surfaces.
Table 1A lists the associated data for those aspherical surfaces,
from which the sagitta or rising height p(h) of their surface
figures as a function of the height h may be computed employing the
following equation:
p(h)=[((1/r)h.sup.2)/(1+SQRT(1-(1+K)(1/r).sup.2h.sup.2))]+C1h.sup.4+C2h.-
sup.6+ . . . ,
where the reciprocal value (1/r) of the radius is the curvature of
the surface in question at the surface vertex and h is the distance
of a point thereon from the optical axis. The sagitta or rising
height p(h) thus represents the distance of that point from the
vertex of the surface in question, measured along the z-direction,
i.e., along the optical axis. The constants K, C1, C2, etc., are
listed in Table 1A.
[0052] First objective part OP1 imaging the (rectangular) effective
object field OF into the first intermediate image IMI1 may be
subdivided into a first lens group LG1 with overall positive
refractive power between object surface and first pupil surface P1,
and a second lens group LG2 with overall positive refractive power
between first pupil surface P1 and the first intermediate image
IMI1. First lens group LG1 is designed to image the telecentric
entrance pupil of the projection objective into first pupil surface
P1, thereby acting in the manner of a Fourier lens group performing
a single Fourier transformation.
[0053] The first lens group includes, in this order from the object
surface, an positive meniscus lens L1-1 with object-side convex
aspheric surface, a positive meniscus lens L1-2 with object-side
concave aspheric surface, a thick positive meniscus lens L1-3 with
image-side concave aspheric surface and a biconcave negative lens
L1-4 aspheric on the exit surface immediately upstream of the first
pupil surface.
[0054] Negative lens L1-4 forms a negative lens group positioned
optically close to the first pupil surface P1 at a position where
the condition RHR<0.2 applies for the ray height ratio
RHR=CRH/MRH.
[0055] A transparent plane parallel plate PP may optionally be
positioned close to the first pupil surface P1. The plane parallel
plate PP may be provided with one or two aspheric surfaces to act
as a correcting element. Due to the position close to the pupil
surface, any correcting effect of the parallel plate PP has
essentially the same influence on all ray bundles originating from
different field points such that little or no field variation of
the correcting effect is obtained (essentially field-constant
correcting effect).
[0056] The correcting element can be mounted in such a way it can
be exchanged without removing the objective from the projection
exposure system, and can be replaced by another correcting element,
having another shape adapted to correct aberrations. Alternatively,
or in addition, the correcting element may be configured to be
moved or tilted relative to the nearest pupil position or other
lenses in the optical system, enhancing the correction
capabilities.
[0057] The second lens group LG2 includes a positive meniscus lens
L1-5 with aspheric convex exit surface immediately downstream of
the first pupil surface, a thin positive meniscus lens L1-6 with
image-side concave surface, and a thin positive meniscus lens L1-7
having an object-side concave surface and an aspheric exit surface
lens immediately upstream of the first intermediate image.
[0058] The negative lens group, which is formed by a single
biconcave negative lens L1-4 in this embodiment, is effective to
counteract the effect on image field curvature provided by the
positive lenses L1-1 to L1-3 upstream thereof, thereby flattening
the first pupil surface P1 while, at the same time, contributing
only little to the overall refractive power of the Fourier lens
group LG1. Therefore, the pupil surface can be flattened without
necessitating additional positive refractive power in the Fourier
lens group to counteract the negative power of the negative lens.
This may be understood by considering a system of thin lenses
(representing the Fourier lens group LG1). The overall refractive
power of this system may be described by:
.phi.=.SIGMA..omega..sub.i.phi..sub.i
[0059] where .phi. is the overall refractive power, .phi..sub.i is
the refractive power of single lens with index i, and .omega..sub.i
is the ratio MRH.sub.i/MRH.sub.1, where MRH.sub.i is the marginal
ray height at lens i and MRH.sub.1 is the marginal ray height at
the first pupil surface.
[0060] The image field curvature may be described by the Petzval
sum:
PTZ=.SIGMA..phi..sub.i/n.sub.i=0
where a value PTZ=0 represents an entirely flat (planar)
surface.
[0061] According to these conditions the negative refractive power
in a system desirably compensates the positive refractive power in
order to correct for image field curvature. Obtaining a positive
overall refractive power of the system involves a marginal ray
height MRH.sub.i at the position of a negative lens or negative
lenses that is smaller than the respective values at positive
lenses. According to these conditions negative lenses at small
marginal ray heights will typically compensate for image curvature
effected by positive refractive power at larger marginal ray
heights. The typical "belly-waist" structure of refractive
projection objectives is a typical consequence following from these
conditions. A negative lens group arranged close to an object
surface or an image surface of an imaging system may be used to
reduce image field curvature. Now consider the pupil imaging e.g.
imaging the entrance pupil of the projection objective into the
first pupil surface. In this pupil imaging the object (entrance
pupil) is typically not accessible in telecentric systems since it
is located almost at infinity. However, the image of the entrance
pupil in the pupil imaging is the first pupil surface arranged in
the optical system where the chief ray intersects the optical axis.
Providing a negative lens group upstream of and close to that first
pupil surface may be used to reduce the field curvature of the
pupil imaging, i.e. may be used to flatten the first pupil
surface.
[0062] Some beneficial effects of a negative lens group provided
within the Fourier lens group optically close to the first pupil
surface are now explained by comparing some relevant properties of
the first embodiment shown in FIG. 1 with corresponding properties
of a reference system REF shown in FIG. 2, where the reference
system does not have the negative lens group. In the reference
system REF, features and feature groups corresponding to respective
features and feature groups of the embodiment of FIG. 1 are
designated with the same reference identifications. Specifications
of reference system REF are given in tables 2, 2A.
[0063] In order to illustrate the correction status of the
projection objectives at various positions within the projection
objective, use will be made of "field curve diagrams" and "spot
diagrams". A field curve diagram is a diagram displaying the
distance between the paraxial tangential image position or the
paraxial sagittal image position and the image plane for each field
height. A spot diagram is a diagram displaying the intersection
points with the image plane of a bundle of rays emerging from a
field point. In the spot diagrams, the geometrical RMS R size is
given by the following equation:
RMS
R=SQRT(.SIGMA.R.sup.2.sub.i)/k=SQRT(.SIGMA.(X.sub.i-X.sub.0).sup.2+(-
Y.sub.i-Y.sub.0).sup.2)/k
where Xi, Yi are the x and y coordinates of ray i at the image
plane, k is the number of rays and X0, Y0 is the average position
of the ray coordinates in the image surface.
[0064] The correction status of the first pupil surface P1 of the
reference system REF in FIG. 2 is shown using spot diagrams in FIG.
3A and FIG. 3B and field curves in FIG. 3C. A significant
image-field curvature is evident. The correction status of the
third pupil surface P3 (within the third objective part OP3) is
shown using spot diagrams (FIGS. 4A, 4B) and a field curve diagram
(FIG. 4C). The diagrams of FIGS. 4A-4C indicate a significant
degree of astigmatism. A large difference between the correction
status of the first pupil P1 and the third pupil P3 is also evident
from a comparison of these figures.
[0065] The Petzval radius R.sub.P of the first lens group LG1
(Fourier lens group) performing the imaging of the entrance pupil
onto the first pupil surface P1 is R.sub.P=-139 mm. The image field
curvature of the imaging of the third pupil is substantially
overcorrected having a Petzval radius R.sub.P=+110 mm. The last
positive lens group between the third pupil P3 and the image
surface IS is mainly responsible to provide the required image-side
numerical aperture NA. Therefore, this lens group has strong
positive refractive power. In the reference system, the image field
curvature contribution provided by this lens group is difficult to
compensate. A correction compromise is obtained by flattening the
tangential shell, as evident from FIG. 4C.
[0066] In the following, third order aberrations refer to
aberrations of the pupil image. The object of pupil imagery is the
entrance pupil, which is assumed to be at infinity in object
space.
[0067] The third order aberrations, represented by the Seidel
aberration error sums SA3 (third order spherical aberration), CMA3
(third order coma), AST3 (third order astigmatism), PTZ3 (third
order Petzval sum) and DIS3 (third order distortion) are as
follows:
SA3=-3.279689 mm, CMA3=-0.693865 mm, AST3=-0.811623 mm,
PTZ3=-5.011397 mm and DIS3=-6.331224 mm.
[0068] Significant improvements are obtained in the embodiment of
FIG. 1, which includes negative lens group L1-4 immediately
upstream of the first pupil surface. The correction status of the
first pupil surface P1 is given in the spot diagrams in FIG. 5A and
FIG. 5B and the field curves in FIG. 5C. The Seidel aberration sums
are as follows:
SA3=1.087472, CMA3=0.083425, AST3=1.342253, PTZ3=-2.642283 and
DIS3=-2.242963.
[0069] It is evident that the spot size is significantly smaller
than in the reference system (Note that scales differ by factor 10
between FIGS. 3A, 3B and FIGS. 5A, 5B). Further, the correction of
tangential and sagittal shell is substantially improved (scales
differ by factor 20 between FIGS. 3C and 5C). These data indicate a
significantly improved correction status. The Petzval radius
R.sub.P of the first pupil surface is R.sub.P=-290 mm, which is a
significant improvement when compared to the reference system
(R.sub.P=-139 mm).
[0070] FIG. 6 shows a catadioptric projection objective 600
designed as an immersion objective for .lamda.=248 nm having an
image-side numerical aperture NA=1.47 when used in conjunction with
a high index immersion fluid between the exit surface of the
objective and the image surface. The projection objective is
designed for a rectangular 26 mm.times.5.5 mm image field. At
NA=1.47 a maximum ray angle in the immersion liquid is
72.65.degree., the ray angle being measured between the propagation
direction of the ray having maximum inclination towards the optical
axis, and the optical axis.
[0071] The sequence of objective parts and lens groups is the same
as in FIG. 1, indicated by using the same reference
identifications. The first lens group LG1 performing the Fourier
transformation between the object surface OS and the first pupil
surface P1 is shown in detail in FIG. 7. The specifications are
given in Tables 6, 6A.
[0072] The first lens group LG1 includes, in this sequence from the
object surface OS to the first pupil surface P1, a biconvex
positive lens L1-1 having a strongly curved entry surface and an
almost flat exit surface, a negative meniscus lens L1-2 having a
concave entry surface facing the object surface, a biconvex
positive lens L1-3, a thin positive lens L1-4 having a strongly
aspheric exit surface providing positive refractive power around
the optical axis and negative refractive power in a zone near the
outer edge of the lens, and a negative group formed by a single
biconcave negative lens L1-5 immediately upstream and very close to
the first pupil surface P1. The structure of this lens group
includes two lens combinations of type P-N, where P represents
positive refractive power and N represents negative refractive
power. The first lens combination P-N formed by lenses L1-1 and
L1-2 provides a strong contribution to correction of spherical
aberration of the pupil (PSA). Negative lens L1-5 contributes to
correction of third order spherical aberration of the pupil (PSA3)
and coma (CMA3). The second P-N combination formed by positive
lenses L1-3 and L1-4 and negative lens L1-5 secures correction of
astigmatism (AST3) and image field curvature (PTZ3). The
contributions of the single lenses to third order Seidel
aberrations are summarized in Table A.
TABLE-US-00001 TABLE A Lens SA3 CMA3 AST3 PTZ3 L1-1 0.525336
-0.325503 -2.799435 -1.937709 L1-2 1.798902 -0.285417 0.416959
0.062927 L1-3 -1.755569 0.247167 1.457322 -2.126689 L1-4 -1.05019
-1.015048 0.872844 -1.165997 L1-5 0.907359 1.122079 0.492766
2.768379
[0073] It is evident that the imaging of the entrance pupil onto
the first pupil surface P1 has a good correction status. This is
also evident from FIG. 8 showing a diagram of the variation of the
RMS spot size (in mm) as a function of the fractional object height
FBY in the first pupil surface. The best focal plane is at -0.346
mm from the specified pupil position. This plane provides a
preferred position for a correcting element, such as an aspheric
plane parallel plate PP as discussed in connection with FIG. 1. The
diagram of FIG. 9 shows that the field variation of tangential
shell and sagittal shell is significantly improved (i.e. reduced)
when compared to the reference system REF. The first pupil surface
has only slight curvature, represented by a Petzval radius
R.sub.P=-291 mm.
[0074] In the embodiment of FIG. 6, the third objective part
provides a significant contribution to correction of spherical
aberration and coma of the object imaging (the imaging between the
object surface OS and the image surface IS optically conjugated
thereto). The third objective part includes, between the third
pupil surface P3 and the image surface IS, in this order a biconvex
positive lens L3-10 serving as a positive front lens, a zone lens
L3-11 having negative refractive power in a peripheral zone apart
the optical axis and positive refractive power in a center region
including the optical axis, and a plano-convex lens L3-12 forming a
rear positive lens group immediately upstream of the image surface.
The zone lens L3-11 has a rotationally symmetric aspheric exit
surface. In order to demonstrate the optical effect of zone lens
L3-11 the diagram in FIG. 10 shows a ray deflection angle RDA (in
degree) on the abscissa and the normalized pupil height PH on the
ordinate. The ray deflection is demonstrated for a ray bundle
originating from the optical axis. It is evident that the sense of
deflection changes sign between the middle region around the
optical axis (PH=0) and the edge of the pupil (PH=1) at about
PH=0.95. This lens has a strong correcting effect on spherical
aberration and coma of the object imaging.
[0075] A further embodiment having the general layout as shown in
FIGS. 1 or 6 is shown in FIG. 11. The specifications are given in
Table 11, 11A. The immersion-type projection objective 1100 is
designed for operation wavelength .lamda.=193 nm and has an
image-side NA=1.43 in a rectangular field of size 26 mm.times.4 mm.
All lenses are made from the same material, fused silica
(SiO.sub.2). The structure of the first lens group LG1 (Fourier
lens group) is shown in detail in FIG. 12. The first group includes
only four lenses, namely a biconvex positive lens L1-1, a biconvex
positive lens L1-2, a positive meniscus lens L1-3 having an
image-side concave surface, and a biconcave negative lens L1-4
forming the negative lens group immediately up-stream of the first
pupil surface P1. Aspheric surfaces, marked by "X" are used to
support correction of field-dependent and aperture-dependent
aberrations. The aspheric surface on the entry-side of first lens
L1-1 immediately following the object surface contributes
particularly to correction of the field-dependent aberrations, such
as distortion. The aspheric surface on the exit-side of negative
lens L1-4 immediately upstream of the pupil surface is
predominantly effective to correct pupil aberrations essentially
without influencing field-dependent aberrations. An intermediate
asphere on the exit-side of biconvex lens L1-2 influences both
field-dependent and aperture-dependent aberrations.
[0076] The correction status of first pupil surface P1 is
represented by the diagrams in FIG. 13, showing the variation of
the spot RMS across the field, and the tangential and sagittal
shells are given in FIG. 14.
[0077] A further embodiment of a catadioptric projection objective
1500 designed for .lamda.=193 nm UV operating wavelength is shown
in FIG. 15. An image-side numerical aperture NA=1.5 is obtained in
a rectangular 26 mm.times.5 mm image field when used in
immersion-operation with an immersion fluid between the exit
surface of the projection objective and the image surface. The
specification is given in Tables 15, 15A.
[0078] Folded projection objective 1500 is designed to project an
image of a pattern on a reticle arranged in the planar object
surface OS (object plane) into the planar image surface IS (image
plane) on a reduced scale, for example, 4:1, while creating exactly
two real intermediate images IMI1, IMI2. The rectangular effective
object field OF and image field IF are off-axis, i.e. entirely
outside the optical axis AX. A first refractive objective part OP1
is designed for imaging the pattern in the object surface into the
first intermediate image IMI1. A second, catadioptric
(refractive/reflective) objective part OP2 images the first
intermediate image IMI1 into the second intermediate image IMI2 at
a magnification close to 1:(-1). A third, refractive objective part
OP3 images the second intermediate image IMI2 onto the image
surface IS with a strong reduction ratio.
[0079] Three mutually conjugated pupil surfaces P1, P2 and P3 are
formed at positions where the chief ray CR intersects the optical
axis. A first pupil surface P1 is formed in the first objective
part between object surface and first intermediate image, a second
pupil surface P2 is formed in the second objective part between
first and second intermediate image, and a third pupil surface P3
is formed in the third objective part between second intermediate
image and the image surface IS.
[0080] The second objective part OP2 includes a single concave
mirror CM. A first planar folding mirror FM1 is arranged optically
close to the first intermediate image IMI1 at an angle of
45.degree. to the optical axis AX such that it reflects the
radiation coming from the object surface in the direction of the
concave mirror CM. A second folding mirror FM2, having a planar
mirror surface aligned at right angles to the planar mirror surface
of the first folding mirror, reflects the radiation coming from the
concave mirror CM in the direction of the image surface, which is
parallel to the object surface.
[0081] The folding mirrors FM1, FM2 are each located in the optical
vicinity of an intermediate image, so that the etendue (geometrical
flux) is kept small. The intermediate images are optionally not
located on the planar mirror surfaces, which results in a finite
minimum distance between the intermediate image and the optically
closest mirror surface. This is to ensure that any faults in the
mirror surface, such as scratches or impurities, are not imaged
sharply onto the image surface.
[0082] The first objective part OP1 includes two lens groups LG1,
LG2 each with positive refractive power on either side of the first
pupil surface P1. First lens group LG1 is designed to image the
telecentric entrance pupil of the projection objective into the
first pupil surface P1, thereby acting in the manner of a Fourier
lens group performing a single Fourier transformation.
[0083] FIG. 16 shows an enlarged detail of the first lens group LG1
(Fourier lens group) imaging the object surface onto the first
pupil surface P1. The first lens group includes a plane parallel
plate PP adjacent to the object surface, a thin positive meniscus
lens L1-1, a thick positive meniscus lens L1-2, a thin, strongly
aspheric meniscus lens L1-3 having an aspheric image-side concave
surface, a thick, positive meniscus lens L1-4 and a negative group
formed by a single biconcave negative lens L1-5 immediately
upstream of the first pupil surface P1 and optically close thereto.
The positive meniscus lenses concave towards the pupil surface have
strong positive power providing a strongly converging effect on the
ray bundles, but there is only little contribution to image-field
curvature due to the similar radii of the entrance and exit
surfaces.
[0084] The correction status of first pupil surface P1 is
represented by the diagrams in FIG. 17, showing the variation of
the spot RMS across the field, and the tangential and sagittal
shells are given in FIG. 18.
[0085] The above description of embodiments has been given by way
of example. From the disclosure given, those skilled in the art
will not only understand the present disclosure and its attendant
advantages, but will also find apparent various changes and
modifications to the structures and methods disclosed. It is
sought, therefore, to cover all changes and modifications as fall
within the spirit and scope of the disclosure, as defined by the
appended claims, and equivalents thereof.
TABLE-US-00002 TABLE 1 NA = 1.55; field size 26 mm * 5.5 mm;
.lamda. = 193 nm Surface Radius Thickness Material Index (193 nm)
1/2 Diameter 0 0.000000 29.999023 AIR 1.00000000 63.700 1 0.000000
-0.293904 AIR 1.00000000 76.311 2 116.967388 AS 33.971623 SIO2V
1.56078570 93.710 3 268.858710 45.405733 AIR 1.00000000 92.342 4
-252.724978 AS 58.607153 SIO2V 1.56078570 92.157 5 -152.905212
0.986967 AIR 1.00000000 102.264 6 100.588881 94.936165 SIO2V
1.56078570 89.748 7 480.541211 AS 22.683526 AIR 1.00000000 61.038 8
-151.461922 9.967307 SIO2V 1.56078570 58.676 9 -1104.178549 AS
2.998283 AIR 1.00000000 54.598 10 0.000000 0.000000 AIR 1.00000000
53.972 11 0.000000 26.000000 AIR 1.00000000 53.972 12 -4615.634680
9.983258 SIO2V 1.56078570 77.043 13 -7648.187834 9.234701 AIR
1.00000000 82.010 14 -625.750713 48.866298 SIO2V 1.56078570 85.509
15 -110.073136 AS 47.938753 AIR 1.00000000 90.434 16 693.459276
15.566986 SIO2V 1.56078570 114.997 17 2225.036283 111.995402 AIR
1.00000000 115.765 18 -209.012550 24.611839 SIO2V 1.56078570
126.681 19 -181.333947 AS 37.469604 AIR 1.00000000 129.924 20
0.000000 238.315935 AIR 1.00000000 129.948 21 -214.798316 AS --
REFL 1.00000000 151.231 22 186.831531 AS 238.315935 REFL 1.00000000
153.712 23 0.000000 37.462671 AIR 1.00000000 111.274 24 297.174670
29.574318 SIO2V 1.56078570 123.808 25 1191.420870 35.484494 AIR
1.00000000 123.384 26 4081.914442 22.323161 SIO2V 1.56078570
122.901 27 273.503277 AS 0.998916 AIR 1.00000000 122.715 28
231.074591 AS 9.994721 SIO2V 1.56078570 108.656 29 162.434674
7.329878 AIR 1.00000000 100.728 30 173.924185 9.996236 SIO2V
1.56078570 100.278 31 147.324038 39.865421 AIR 1.00000000 96.038 32
517.833939 AS 9.994259 SIO2V 1.56078570 95.918 33 418.975568
18.691694 AIR 1.00000000 97.853 34 402.609022 9.991838 SIO2V
1.56078570 103.816 35 225.169608 AS 18.474719 AIR 1.00000000
105.756 36 350.705440 AS 25.452147 SIO2V 1.56078570 107.818 37
-3388.791523 12.488356 AIR 1.00000000 110.250 38 1008.270218 AS
41.022442 SIO2V 1.56078570 119.521 39 -314.632041 3.943706 AIR
1.00000000 121.832 40 1442.963243 AS 12.476333 SIO2V 1.56078570
126.022 41 -1002.829857 14.096377 AIR 1.00000000 126.891 42
194.591039 81.128704 SIO2V 1.56078570 132.890 43 -264.895277 AS
-22.880987 AIR 1.00000000 131.108 44 0.000000 -0.362185 AIR
1.00000000 132.343 45 0.000000 24.001275 AIR 1.00000000 132.533 46
159.644367 50.327970 SIO2V 1.56078570 109.736 47 494.742901 AS
0.961215 AIR 1.00000000 105.155 48 328.066727 14.868291 SIO2V
1.56078570 92.427 49 -3072.231603 AS 0.927658 AIR 1.00000000 86.384
50 84.317525 69.022697 LuAG 2.15000000 64.842 51 0.000000 3.100000
HINDLIQ 1.65002317 24.540 52 0.000000 0.000000 15.928
TABLE-US-00003 TABLE 1A Aspheric constants SRF 2 4 7 9 15 K 0 0 0 0
0 C1 -4.353148e-08 -9.800573e-08 2.666231e-07 1.295769e-07
1.774606e-08 C2 -1.948518e-13 5.499401e-13 -1.471516e-11
1.032347e-11 1.042043e-13 C3 -3.477204e-16 -1.499103e-16
-1.385474e-15 5.718200e-15 2.794961e-17 C4 2.346643e-20
-1.967686e-20 2.138176e-18 -4.988183e-18 -3.892158e-21 C5
-2.078112e-24 4.517642e-24 -1.482225e-22 1.949505e-21 4.464755e-25
C6 -8.347999e-31 -2.738209e-28 -8.304062e-27 -2.335999e-25
4.773462e-30 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
0.000000e+00 SRF 19 21 22 27 28 K 0 -2.01691 -1.35588 0 0 C1
-1.294881e-08 -1.791441e-08 1.799581e-08 -2.305522e-07
-5.364751e-08 C2 2.960445e-14 1.393731e-13 6.604119e-14
-2.977863e-12 2.985313e-12 C3 -3.744673e-18 -1.959652e-18
1.091967e-18 1.067601e-15 1.185542e-16 C4 3.872183e-22 3.972150e-23
3.177716e-23 -7.036742e-20 -5.029250e-20 C5 -1.724706e-26
-6.577183e-28 -5.281159e-28 2.314154e-24 3.896020e-24 C6
4.346424e-31 6.141114e-33 1.575655e-32 -3.151486e-29 -1.479810e-28
C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
SRF 32 35 36 38 40 K 0 0 0 0 0 C1 2.753990e-08 1.438723e-07
4.030346e-08 4.491651e-08 -9.637167e-08 C2 -2.426854e-11
-2.226044e-11 -6.610222e-12 -5.791619e-12 3.256893e-12 C3
1.360579e-15 1.482620e-15 2.501723e-16 5.024169e-16 -9.241857e-17
C4 -1.150640e-19 -5.040252e-20 -2.574681e-21 -3.768862e-20
9.112235e-21 C5 7.525459e-24 1.831772e-24 -7.619628e-25
1.711080e-24 9.519978e-26 C6 -2.203312e-30 -8.726413e-29
1.815817e-29 -3.990765e-29 -1.423818e-29 C7 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 SRF 43 47 49 K
0 0 0 C1 5.213696e-08 -1.687244e-07 1.276858e-07 C2 -2.852489e-13
1.277072e-11 1.143276e-12 C3 6.349974e-17 -5.376139e-16
-2.525252e-16 C4 -4.223029e-21 1.564911e-20 9.197266e-20 C5
1.155960e-25 -3.759137e-25 -8.401499e-24 C6 -1.415349e-30
1.266337e-29 6.171793e-28 C7 0.000000e+00 0.000000e+00 0.000000e+00
C8 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00
0.000000e+00 0.000000e+00
TABLE-US-00004 TABLE 2 (REF) NA = 1.55; field size 26 mm * 5.5 mm;
.lamda. = 193 nm Surface Radius Thickness Material Index (193 nm)
1/2 Diameter 0 0.000000 29.999023 AIR 1.00000000 63.700 1 0.000000
-0.017795 AIR 1.00000000 76.344 2 171.343027 AS 42.631678 SIO2V
1.56078570 85.956 3 -4741.853546 61.874338 AIR 1.00000000 86.356 4
105.977997 65.572103 SIO2V 1.56078570 88.863 5 -861.150434 AS
6.951388 AIR 1.00000000 82.403 6 258.046433 33.648405 SIO2V
1.56078570 67.159 7 1920.848867 AS 8.790277 AIR 1.00000000 50.974 8
0.000000 0.000000 AIR 1.00000000 47.230 9 0.000000 26.000000 AIR
1.00000000 47.230 10 0.000000 10.337048 SIO2V 1.56078570 61.729 11
0.000000 48.824997 AIR 1.00000000 65.126 12 -409.968959 9.999996
SIO2V 1.56078570 87.149 13 -1728.574510 AS 0.999396 AIR 1.00000000
92.240 14 -1262.850901 37.699713 SIO2V 1.56078570 94.725 15
-164.338442 35.734593 AIR 1.00000000 97.786 16 -892.837978
27.787355 SIO2V 1.56078570 106.595 17 -216.768119 AS 37.495802 AIR
1.00000000 107.808 18 0.000000 231.516797 AIR 1.00000000 107.221 19
-184.700839 AS -231.516797 REFL 1.00000000 157.546 20 202.731693 AS
231.516797 REFL 1.00000000 156.228 21 0.000000 37.496341 AIR
1.00000000 114.709 22 162.462380 39.081598 SIO2V 1.56078570 112.418
23 264.446518 AS 63.339427 AIR 1.00000000 109.444 24 -571.769195 AS
9.999663 SIO2V 1.56078570 91.313 25 708.749519 17.121515 AIR
1.00000000 87.569 26 -507.008359 9.999717 SIO2V 1.56078570 86.854
27 140.591845 19.187442 AIR 1.00000000 84.837 28 184.194102 AS
15.968244 SIO2V 1.56078570 86.582 29 283.845514 31.748225 AIR
1.00000000 90.637 30 4904.309359 10.047458 SIO2V 1.56078570 103.627
31 274.252599 AS 13.944029 AIR 1.00000000 113.490 32 309.375419 AS
28.215577 SIO2V 1.56078570 120.624 33 -920.430769 1.767414 AIR
1.00000000 124.772 34 18975.064444 AS 70.355114 SIO2V 1.56078570
127.703 35 -162.879880 12.292563 AIR 1.00000000 132.134 36
-2025.460472 AS 9.999587 SIO2V 1.56078570 141.670 37 -722.326749
0.998787 AIR 1.00000000 143.067 38 276.303253 73.567109 SIO2V
1.56078570 150.848 39 -523.286381 AS -10.418710 AIR 1.00000000
149.454 40 0.000000 -0.362185 AIR 1.00000000 145.848 41 0.000000
11.777558 AIR 1.00000000 145.992 42 203.342152 65.192017 SIO2V
1.56078570 131.067 43 -779.130399 AS 0.997958 AIR 1.00000000
126.720 44 305.958782 21.191217 SIO2V 1.56078570 103.169 45
-48623.319668 AS 0.987133 AIR 1.00000000 97.187 46 95.078716
76.560136 LuAG 2.15000000 71.117 47 0.000000 3.100000 HINDLIQ
1.65002317 24.554 48 0.000000 0.000000 15.926
TABLE-US-00005 TABLE 2A Aspheric constants SRF 2 5 7 13 17 K 0 0 0
0 0 C1 5.535754e-09 -2.163453e-08 2.131940e-07 -6.511619e-08
1.346551e-08 C2 -2.217501e-12 3.505228e-13 2.096996e-11
2.291139e-13 7.406450e-13 C3 1.496293e-16 3.144204e-15 2.247871e-15
-8.522321e-17 2.478135e-17 C4 -8.752146e-21 -5.148203e-19
2.662065e-18 3.174503e-21 4.410963e-22 C5 2.789483e-25 3.453724e-23
-1.491642e-21 -1.364637e-25 1.313895e-26 C6 -2.329972e-30
-9.033416e-28 6.227531e-25 4.124720e-30 -8.547823e-31 C7
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
SRF 19 20 23 24 28 K -1.52592 -1.42277 0 0 0 C1 -1.765080e-08
1.613577e-08 -4.798352e-08 4.255285e-08 -1.477745e-07 C2
4.917900e-14 4.357122e-14 -1.311955e-12 -1.146206e-11 1.210948e-12
C3 -9.914290e-19 9.093916e-19 3.514210e-18 6.521380e-16
-5.978764e-16 C4 5.089307e-24 8.683689e-24 1.024784e-21
-6.959952e-20 5.086484e-20 C5 -1.439617e-28 -2.826288e-29
1.466905e-25 8.075085e-24 -2.048151e-24 C6 -2.489761e-34
3.718326e-33 -6.750818e-30 -3.306910e-28 1.559775e-28 C7
0.000000e+00 C8 0.000000e+00 C9 0.000000e+00 SRF 31 32 34 36 39 K 0
0 0 0 0 C1 -5.803167e-08 -8.321353e-08 -3.416619e-08 -3.711339e-08
4.221371e-09 C2 5.110289e-12 3.106108e-12 1.834441e-12 3.509157e-13
-1.476275e-13 C3 -7.215213e-16 -1.869923e-16 -1.168356e-16
1.204985e-17 3.254133e-18 C4 4.298822e-20 7.706750e-21
-1.174247e-22 6.896527e-22 9.967170e-22 C5 -1.225430e-24
-4.141276e-25 4.114824e-25 3.435906e-26 -5.090064e-26 C6
7.229558e-30 1.166645e-29 -1.539536e-29 -2.039666e-30 6.695129e-31
C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
SRF 43 45 K 0 0 C1 6.584837e-09 4.103097e-08 C2 1.476709e-12
1.320693e-12 C3 -2.128509e-16 2.055670e-16 C4 1.488828e-20
-1.513267e-20 C5 -5.015220e-25 8.328043e-25 C6 7.209855e-30
-7.654058e-30 C7 0.000000e+00 0.000000e+00 C8 0.000000e+00
0.000000e+00 C9 0.000000e+00 0.000000e+00
TABLE-US-00006 TABLE 6 NA = 1.47; field size 26 mm * 5.5 mm;
.lamda. = 248 nm Surface Radius Thickness Material Index (248 nm)
1/2 Diameter 0 0.000000 29.999023 AIR 1.00000000 63.700 1 0.000000
-0.016587 AIR 1.00000000 75.565 2 128.928301 AS 42.026693 SIO2V
1.50885281 87.914 3 -2130.241282 44.327573 AIR 1.00000000 87.576 4
-117.301124 AS 37.980898 SIO2V 1.50885281 87.249 5 -121.095557
0.999318 AIR 1.00000000 97.646 6 124.335144 49.904800 SIO2V
1.50885281 88.572 7 -1015.089235 0.999887 AIR 1.00000000 85.114 8
841.474542 19.999813 SIO2V 1.50885281 79.220 9 -265.863207 AS
24.244189 AIR 1.00000000 74.122 10 -130.163272 19.998818 SIO2V
1.50885281 61.644 11 245.744624 AS 8.799263 AIR 1.00000000 54.069
12 0.000000 0.000000 AIR 1.00000000 53.816 13 0.000000 0.998863 AIR
1.00000000 53.816 14 262.324322 24.657808 SIO2V 1.50885281 60.964
15 -241.892483 1.204928 AIR 1.00000000 64.095 16 -388.893369
20.002393 SIO2V 1.50885281 65.782 17 -134.956755 AS 95.737496 AIR
1.00000000 68.599 18 270.042558 21.031793 SIO2V 1.50885281 102.358
19 651.399601 64.989823 AIR 1.00000000 102.511 20 -126.975206
19.999827 SIO2V 1.50885281 102.966 21 -145.489260 AS 37.494736 AIR
1.00000000 110.060 22 0.000000 275.711491 AIR 1.00000000 116.538 23
-253.239170 AS -- REFL 1.00000000 195.865 24 186.748589 AS
275.711491 REFL 1.00000000 140.517 25 0.000000 37.497070 AIR
1.00000000 114.897 26 -4183.753618 43.458815 SIO2V 1.50885281
118.592 27 -202.559737 AS 13.648419 AIR 1.00000000 119.292 28
-175.419986 AS 19.999522 SIO2V 1.50885281 116.494 29 -154.929816
0.999549 AIR 1.00000000 118.150 30 -229.271599 19.999486 SIO2V
1.50885281 105.369 31 122.750670 AS 49.793521 AIR 1.00000000
100.243 32 190.556325 AS 46.859904 SIO2V 1.50885281 121.109 33
-943.347591 7.041362 AIR 1.00000000 121.790 34 -845.190598
19.999826 SIO2V 1.50885281 122.081 35 147.937513 AS 29.168833 AIR
1.00000000 128.004 36 1388.526462 AS 45.306600 SIO2V 1.50885281
131.120 37 -523.436578 4.347825 AIR 1.00000000 133.458 38
5449.999826 AS 19.999851 SIO2V 1.50885281 134.608 39 -348.816325
0.999597 AIR 1.00000000 137.891 40 340.272237 AS 67.587519 SIO2V
1.50885281 153.819 41 -323.687667 58.231540 AIR 1.00000000 155.356
42 0.000000 0.000000 AIR 1.00000000 154.131 43 0.000000 -57.242893
AIR 1.00000000 154.131 44 225.119659 90.762438 SIO2V 1.50885281
154.660 45 -354.115170 AS 0.997569 AIR 1.00000000 152.747 46
332.230008 48.061330 SIO2V 1.50885281 131.162 47 -1361.523117 AS
1.268990 AIR 1.00000000 127.295 48 -810.795253 19.998161 SIO2V
1.50885281 122.580 49 -451.036733 AS 0.994751 AIR 1.00000000
113.480 50 93.456855 76.027617 LUAG 2.02093434 71.508 51 0.000000
3.100000 HIL001 1.54048002 26.023 52 0.000000 0.000000 15.926
TABLE-US-00007 TABLE 6A Aspheric constants SRF 2 4 9 11 17 K 0 0 0
0 0 C1 -4.384112e-08 -4.412855e-08 2.029683e-07 3.217532e-08
6.242700e-08 C2 6.119422e-13 -1.990073e-12 7.567548e-13
2.824684e-12 2.636674e-12 C3 -2.550937e-17 8.072280e-16
-8.040857e-16 -3.870631e-15 7.268545e-16 C4 -2.008613e-19
-1.589989e-19 -2.373612e-20 -2.969833e-19 -1.576215e-19 C5
6.058069e-23 3.137776e-23 1.268368e-23 6.242046e-22 1.095770e-22 C6
-9.717788e-27 -5.193051e-27 -3.735037e-27 -7.218140e-26
-3.106810e-26 C7 8.441816e-31 3.741282e-31 2.516910e-31
-5.174396e-29 4.585559e-30 C8 -3.120207e-35 -1.034688e-35
-8.393442e-36 1.110006e-32 -3.071967e-34 C9 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 SRF 21 23 24 27
28 K 0 -3.141 -1.33118 0 0 C1 -2.862443e-08 -2.174149e-08
1.549149e-08 8.131862e-08 7.955643e-08 C2 -8.771349e-13
2.517297e-13 3.397419e-14 -1.707739e-12 2.867120e-12 C3
-1.596517e-17 -5.825790e-18 1.032630e-19 -3.301596e-17
-1.099153e-15 C4 -4.646004e-21 1.362810e-22 1.136332e-22
-5.761262e-20 3.424317e-20 C5 8.126190e-25 -3.290251e-27
-8.250734e-27 4.724568e-24 3.332299e-25 C6 -1.135755e-28
6.790431e-32 3.149468e-31 -1.202012e-28 -4.827974e-29 C7
7.299024e-33 -9.159117e-37 -5.928263e-36 4.082908e-34 2.861844e-33
C8 -2.111452e-37 6.183391e-42 4.153068e-41 1.760434e-38
-6.298301e-38 C9 0.000000e+00 0.000000e+00 0.000000e+00
0.000000e+00 0.000000e+00 SRF 31 32 35 36 38 K 0 0 0 0 0 C1
-8.939854e-08 -1.036340e-07 -9.696640e-08 8.511140e-08
-6.457556e-08 C2 4.348686e-12 1.316189e-12 1.108503e-13
-2.457731e-12 8.723554e-13 C3 -8.114178e-16 6.095759e-17
-1.060162e-16 3.903750e-17 -3.888178e-17 C4 6.060580e-20
2.984406e-21 8.228345e-21 -6.588883e-21 6.708466e-22 C5
-3.926918e-24 5.719431e-26 -4.559678e-25 5.019357e-25 -3.249478e-26
C6 7.618517e-29 2.198926e-29 1.569417e-29 -1.721031e-29
3.981782e-30 C7 8.937963e-33 -2.899121e-33 -4.855487e-34
2.943619e-34 -1.652000e-34 C8 -7.773344e-37 7.179029e-38
4.866053e-39 -4.420955e-39 1.394293e-39 C9 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 SRF 40 45 47 49
K 0 0 0 0 C1 -3.047152e-08 2.876681e-08 -7.237631e-08 3.127564e-08
C2 -2.503917e-13 -4.981655e-13 7.328144e-12 -1.483849e-12 C3
-2.036991e-17 2.984706e-17 -5.046596e-16 2.815259e-17 C4
2.564810e-21 -7.422489e-22 1.891226e-20 2.747470e-20 C5
-1.078825e-25 1.333563e-26 -2.625122e-25 -3.683041e-24 C6
2.525531e-30 -4.886557e-31 5.993731e-30 2.331163e-28 C7
6.070121e-36 5.284852e-36 -6.235738e-34 -8.136306e-33 C8
-9.848310e-40 3.056734e-41 1.667827e-38 1.346431e-37 C9
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
TABLE-US-00008 TABLE 11 NA = 1.43; field size 26 mm * 4 mm; .lamda.
= 193 nm Surface Radius Thickness Material Index (193 nm) 1/2
Diameter 0 0.000000 33.332248 AIR 1.00000000 60.000 1 0.000000
-0.004263 AIR 1.00000000 72.779 2 357357.144810 AS 46.089360 SIO2V
1.56078570 76.013 3 -417.562806 74.837927 AIR 1.00000000 81.763 4
280.404005 60.022974 SIO2V 1.56078570 101.278 5 -166.627712 AS
0.999622 AIR 1.00000000 101.071 6 116.529317 38.169032 SIO2V
1.56078570 71.306 7 405.500190 15.365869 AIR 1.00000000 60.252 8
-238.458946 9.999795 SIO2V 1.56078570 56.004 9 211.906189 AS
10.592661 AIR 1.00000000 47.114 10 0.000000 0.000000 AIR 1.00000000
46.365 11 0.000000 2.965376 AIR 1.00000000 46.365 12 0.000000
9.999570 SIO2V 1.56078570 48.729 13 0.000000 0.999095 AIR
1.00000000 53.095 14 251.808655 75.306859 SIO2V 1.56078570 59.619
15 -209.119448 AS 19.949752 AIR 1.00000000 76.307 16 297.229724
41.623543 SIO2V 1.56078570 91.301 17 -368.032393 AS 17.309640 AIR
1.00000000 91.926 18 -304.574570 9.998928 SIO2V 1.56078570 86.542
19 -1835.490188 AS 37.493067 AIR 1.00000000 85.640 20 0.000000
269.847723 AIR 1.00000000 88.712 21 -193.435450 AS -- REFL
1.00000000 156.793 22 230.296849 AS 269.847723 REFL 1.00000000
162.808 23 0.000000 37.496545 AIR 1.00000000 115.972 24 222.765081
32.374348 SIO2V 1.56078570 118.274 25 139.308788 AS 20.243523 AIR
1.00000000 111.594 26 504.166848 AS 50.121407 SIO2V 1.56078570
111.843 27 -296.072806 9.056420 AIR 1.00000000 110.445 28
-602.578656 9.999975 SIO2V 1.56078570 97.132 29 93.726568 AS
13.818669 AIR 1.00000000 83.497 30 110.971133 AS 9.999545 SIO2V
1.56078570 83.171 31 124.632154 62.097682 AIR 1.00000000 80.656 32
-132.174351 11.899629 SIO2V 1.56078570 81.715 33 -40607.350265 AS
24.348045 AIR 1.00000000 102.447 34 1799.174156 AS 51.395108 SIO2V
1.56078570 115.369 35 -187.360985 0.997962 AIR 1.00000000 123.742
36 -700.986626 AS 65.447368 SIO2V 1.56078570 144.945 37 -188.074155
1.059137 AIR 1.00000000 150.242 38 -5408.105536 AS 29.786331 SIO2V
1.56078570 175.144 39 -1608.220868 35.803900 AIR 1.00000000 175.488
40 202.569243 79.929030 SIO2V 1.56078570 175.217 41 -580676.026640
AS 28.659957 AIR 1.00000000 170.624 42 0.000000 0.000000 AIR
1.00000000 171.264 43 0.000000 -25.369612 AIR 1.00000000 171.264 44
192.367691 75.692630 SIO2V 1.56078570 153.859 45 784.958025 AS
0.995706 AIR 1.00000000 148.467 46 127.716618 51.629289 SIO2V
1.56078570 104.469 47 697.612041 AS 0.960830 AIR 1.00000000 94.717
48 50.984791 43.213390 SIO2V 1.56078570 47.246 49 0.000000 3.444444
HINDLIQ 1.65002317 21.011 50 0.000000 0.000000 15.000
TABLE-US-00009 TABLE 11A Aspheric constants SRF 2 5 9 15 17 K 0 0 0
0 0 C1 -6.886423e-08 -5.399934e-09 7.670365e-07 -1.468962e-08
2.941498e-08 C2 5.485090e-13 -1.665701e-13 -1.648448e-11
1.288281e-11 -2.652838e-11 C3 -1.310182e-15 1.141289e-15
-7.138563e-14 1.151797e-16 8.340750e-16 C4 4.553614e-19
-2.207616e-19 2.971898e-17 -1.481358e-19 8.678296e-20 C5
-1.343018e-22 2.537949e-23 -1.082266e-20 2.848823e-23 1.861559e-23
C6 1.960673e-26 -1.868665e-27 5.685298e-24 -7.123479e-27
-4.697518e-27 C7 -1.250480e-30 8.263513e-32 -2.060132e-27
9.661060e-31 3.445831e-31 C8 1.179973e-35 -1.667241e-36
2.897054e-31 -4.638795e-35 -8.934923e-36 C9 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 SRF 19 21 22 25
26 K 0 -1.49741 -1.62646 0 0 C1 2.476984e-08 -1.522752e-08
1.471219e-08 -2.496187e-07 -1.110036e-07 C2 1.500487e-11
-1.396376e-15 3.623941e-14 9.991017e-12 2.261667e-11 C3
-4.386995e-16 -1.165187e-18 -1.591633e-18 6.981563e-16 1.059597e-16
C4 4.006150e-20 5.254699e-23 2.344572e-22 -5.968529e-20
-2.875234e-19 C5 -2.400161e-23 -2.875966e-27 -1.338490e-26
4.601373e-24 4.467403e-23 C6 2.853406e-27 8.782897e-32 4.654398e-31
-1.413493e-27 -4.303454e-27 C7 -1.087783e-31 -1.455581e-36
-8.796362e-36 1.323528e-31 2.330243e-31 C8 4.311181e-37
9.964499e-42 7.028833e-41 -3.872736e-36 -5.208998e-36 C9
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
SRF 29 30 33 34 36 K 0 0 0 0 0 C1 -2.267301e-07 -8.519491e-08
2.440652e-07 1.018655e-07 -3.263771e-08 C2 -1.583065e-11
-3.972995e-11 -2.702153e-11 -2.093056e-11 4.414943e-12 C3
6.128819e-15 4.407665e-15 3.482308e-16 1.840200e-15 -3.226771e-16
C4 -1.569530e-18 -6.334167e-19 2.746742e-19 -1.201814e-19
1.696874e-20 C5 1.407627e-22 -1.585820e-23 -4.143028e-23
5.796403e-24 -7.791980e-25 C6 -7.921382e-27 1.683303e-26
3.274508e-27 -1.854295e-28 2.511951e-29 C7 -3.596221e-31
-2.727972e-30 -1.458485e-31 3.605510e-33 -4.563870e-34 C8
5.039527e-35 1.787510e-34 3.028396e-36 -4.430267e-38 3.025968e-39
C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00
SRF 38 41 45 47 K 0 0 0 0 C1 9.235685e-09 2.984374e-08
-5.662983e-08 4.426415e-08 C2 -4.548242e-13 3.795044e-13
5.304155e-12 -1.939003e-13 C3 4.711657e-17 2.322935e-17
-2.666811e-16 4.722428e-16 C4 -6.285778e-22 -2.741671e-21
7.087400e-21 -3.883053e-20 C5 -3.584554e-26 1.065528e-25
-2.346928e-26 -4.947922e-25 C6 1.500601e-30 -1.995489e-30
-3.324754e-30 4.961940e-28 C7 -2.277407e-35 1.285834e-35
7.276997e-35 -4.556416e-32 C8 1.311951e-40 2.890527e-41
-3.730749e-40 1.483979e-36 C9 0.000000e+00 0.000000e+00
0.000000e+00 0.000000e+00
TABLE-US-00010 TABLE 15 NA = 1.50; field size 26 mm * 5 mm; .lamda.
= 193 nm Surface Radius Thickness Material Index (193 nm) 1/2
Diameter 0 0.000000 56.505360 AIR 1.00000000 61.600 1 0.000000
0.628593 AIR 1.00000000 84.411 2 0.000000 9.999465 SIO2V 1.56078570
84.665 3 0.000000 1.018383 AIR 1.00000000 87.136 4 267.687560
23.051668 SIO2V 1.56078570 94.506 5 2076.339784 3.011269 AIR
1.00000000 95.214 6 195.468828 118.243767 SIO2V 1.56078570 99.907 7
213.465552 65.301393 AIR 1.00000000 87.739 8 233.154018 24.923341
SIO2V 1.56078570 92.865 9 -1992.179958 AS 1.169743 AIR 1.00000000
91.232 10 397.921478 69.915906 SIO2V 1.56078570 91.709 11
505.661172 17.194249 AIR 1.00000000 95.812 12 -735.689494 9.999732
SIO2V 1.56078570 96.173 13 887.983169 8.242783 AIR 1.00000000
100.163 14 0.000000 0.000000 AIR 1.00000000 101.571 15 0.000000
42.782393 AIR 1.00000000 101.571 16 -410.552179 AS 78.848881 SIO2V
1.56078570 128.012 17 -163.270786 336.654237 AIR 1.00000000 134.938
18 237.665945 66.291266 SIO2V 1.56078570 153.690 19 -1317.124240 AS
86.415659 AIR 1.00000000 152.243 20 222.206724 27.565105 SIO2V
1.56078570 112.997 21 921.104852 AS 68.984477 AIR 1.00000000
110.393 22 0.000000 0.000000 AIR 1.00000000 82.262 23 0.000000
-223.984401 REFL 1.00000000 82.262 24 112.393927 AS -9.995120 SIO2V
1.56078570 93.383 25 618.177768 -30.194887 AIR 1.00000000 110.198
26 180.843143 -9.993434 SIO2V 1.56078570 111.320 27 459.728303
-49.418013 AIR 1.00000000 131.268 28 166.364160 49.418013 REFL
1.00000000 133.173 29 459.728303 9.993434 SIO2V 1.56078570 130.248
30 180.843143 30.194887 AIR 1.00000000 106.184 31 618.177768
9.995120 SIO2V 1.56078570 102.211 32 112.393927 AS 223.984401 AIR
1.00000000 87.128 33 0.000000 0.000000 AIR 1.00000000 69.972 34
0.000000 -63.976352 REFL 1.00000000 69.972 35 412.103957 -20.679211
SIO2V 1.56078570 92.437 36 203.153828 -0.998595 AIR 1.00000000
95.263 37 -1996.505583 -25.026685 SIO2V 1.56078570 104.114 38
387.517974 -0.999117 AIR 1.00000000 105.544 39 -217.409028
-35.834400 SIO2V 1.56078570 112.665 40 -1732.046627 -89.753105 AIR
1.00000000 111.738 41 -432.227186 -24.454670 SIO2V 1.56078570
100.002 42 -429.393785 AS -61.820584 AIR 1.00000000 96.269 43
127.267221 AS -9.998963 SIO2V 1.56078570 96.639 44 -354.132669
-7.868044 AIR 1.00000000 110.880 45 -523.720649 -14.975470 SIO2V
1.56078570 112.701 46 -341.520890 AS -0.997791 AIR 1.00000000
118.281 47 -411.353502 -48.777625 SIO2V 1.56078570 120.957 48
342.083102 -8.810353 AIR 1.00000000 122.794 49 514.961229 AS
-14.987375 SIO2V 1.56078570 123.090 50 291.403757 -79.216652 AIR
1.00000000 128.222 51 826.480933 AS -24.931069 SIO2V 1.56078570
151.976 52 388.289534 -1.073107 AIR 1.00000000 155.772 53
1460.275628 -24.262791 SIO2V 1.56078570 162.233 54 543.277065
-0.999651 AIR 1.00000000 163.887 55 -4320.460965 -27.112870 SIO2V
1.56078570 168.245 56 901.554468 -0.999423 AIR 1.00000000 168.871
57 -227.624376 -78.149238 SIO2V 1.56078570 170.522 58 -2243.544699
-9.897025 AIR 1.00000000 167.855 59 0.000000 0.000000 AIR
1.00000000 165.919 60 0.000000 -43.822974 AIR 1.00000000 165.919 61
-193.437748 -56.826827 SIO2V 1.56078570 128.975 62 4852.914186 AS
-1.258966 AIR 1.00000000 124.642 63 -126.542916 -25.022273 SIO2V
1.56078570 89.797 64 -202.284936 AS -0.996510 AIR 1.00000000 78.587
65 -95.520347 -72.724717 LUAG 2.10000000 70.909 66 0.000000
-6.000000 HIINDLIQ 1.64000000 28.915 67 0.000000 0.000000
15.401
TABLE-US-00011 TABLE 15A Aspheric constants SRF 9 16 19 21 24 K 0 0
0 0 0 C1 1.993155e-07 7.648792e-08 1.310449e-08 1.499407e-08
-1.140413e-07 C2 -2.965837e-11 -1.147476e-12 -1.473288e-13
4.898569e-13 -1.405657e-12 C3 7.084938e-15 -1.620016e-16
1.789597e-18 -4.831673e-18 -6.422308e-16 C4 -1.108567e-18
1.291519e-20 -3.347563e-23 5.603761e-22 9.595133e-20 C5
1.294384e-22 -4.536509e-25 7.855804e-28 1.107164e-28 -1.651690e-23
C6 -8.666805e-27 8.063130e-30 -1.561895e-32 -1.720748e-31
1.285598e-27 C7 2.821071e-31 -5.992411e-35 1.565488e-37
3.402783e-35 -5.054656e-32 C8 0.000000e+00 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 SRF 32 42 43 46 49 K 0 0 0 0
0 C1 -1.140413e-07 -4.189168e-08 -1.685701e-07 6.336319e-09
5.280703e-08 C2 -1.405657e-12 -3.147936e-13 9.635698e-12
4.071242e-12 1.157060e-12 C3 -6.422308e-16 -1.294082e-18
-1.217963e-15 -3.577670e-16 -7.824880e-17 C4 9.595133e-20
-2.828644e-22 1.012583e-19 2.732048e-20 7.171704e-21 C5
-1.651690e-23 4.489648e-26 -8.858422e-24 -1.655966e-24
-3.888551e-26 C6 1.285598e-27 -1.468171e-29 4.866371e-28
6.535740e-29 -2.007284e-29 C7 -5.054656e-32 1.147294e-33
-1.337836e-32 -1.353076e-33 4.237726e-34 C8 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00
0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 SRF 51 62 64 K
0 0 0 C1 -6.339317e-09 4.857833e-08 -2.139384e-07 C2 9.839286e-13
-8.830803e-12 1.525695e-11 C3 -3.557535e-17 7.521403e-16
-4.799207e-15 C4 2.050828e-21 -4.932093e-20 1.286852e-18 C5
-7.703006e-26 2.223792e-24 -3.670356e-22 C6 2.045013e-30
-5.700404e-29 7.133596e-26 C7 -2.770838e-35 -3.566708e-35
-9.239454e-30 C8 0.000000e+00 4.807714e-38 6.969720e-34 C9
0.000000e+00 -1.056980e-42 -2.499170e-38
* * * * *