Patent | Date |
---|
Optical apparatus for use in photolithography Grant 9,933,707 - Kwan , et al. April 3, 2 | 2018-04-03 |
Lithographic Apparatus And Device Manufacturing Method App 20150015858 - HOOGENDAM; Christiaan Alexander ;   et al. | 2015-01-15 |
Polarization-modulating optical element Grant 8,861,084 - Fiolka , et al. October 14, 2 | 2014-10-14 |
Lithographic apparatus and device manufacturing method Grant 8,860,922 - Hoogendam , et al. October 14, 2 | 2014-10-14 |
Lithographic Apparatus And Device Manufacturing Method App 20140293248 - STREEFKERK; Bob ;   et al. | 2014-10-02 |
Lithographic apparatus and device manufacturing method Grant 8,810,771 - Hoogendam , et al. August 19, 2 | 2014-08-19 |
Lithographic apparatus and device manufacturing method Grant 8,711,330 - Streefkerk , et al. April 29, 2 | 2014-04-29 |
Lithographic apparatus and device manufacturing method Grant 8,570,486 - Mulkens , et al. October 29, 2 | 2013-10-29 |
Catadioptric Projection Objective App 20120250147 - Shafer; David ;   et al. | 2012-10-04 |
Lithographic Apparatus And Device Manufacturing Method App 20120194790 - Hubertus Mulkens; Johannes Catharinus ;   et al. | 2012-08-02 |
Lithographic Apparatus And Device Manufacturing Method App 20120120377 - HOOGENDAM; Christiaan Alexander ;   et al. | 2012-05-17 |
Lithographic apparatus and device manufacturing method Grant 8,174,674 - Mulkens , et al. May 8, 2 | 2012-05-08 |
Lithographic Apparatus And Device Manufacturing Method App 20120086926 - Hoogendam; Christiaan Alexander ;   et al. | 2012-04-12 |
Lithographic apparatus and device manufacturing method Grant 8,102,502 - Hoogendam , et al. January 24, 2 | 2012-01-24 |
Lithographic appararus and method Grant 8,094,287 - Van Empel , et al. January 10, 2 | 2012-01-10 |
Projection Objective For A Microlithographic Projection Exposure Apparatus App 20110228246 - Kneer; Bernhard ;   et al. | 2011-09-22 |
Catadioptric Projection Objective App 20110211252 - Shafer; David ;   et al. | 2011-09-01 |
Polarization-modulating Optical Element App 20110188019 - Fiolka; Damian ;   et al. | 2011-08-04 |
Optical Assembly App 20110181857 - Bieg; Hermann ;   et al. | 2011-07-28 |
Optical element module Grant 7,986,472 - Kugler , et al. July 26, 2 | 2011-07-26 |
Projection Optics For Microlithography App 20110157572 - Mann; Hans-Juergen | 2011-06-30 |
Method Of Measuring A Deviation Of An Optical Surface From A Target Shape App 20110141484 - ARNOLD; Ralf ;   et al. | 2011-06-16 |
Microlithographic Projection Exposure Apparatus App 20110134403 - Feldmann; Heiko ;   et al. | 2011-06-09 |
Illuminator for a lithographic apparatus and method Grant 7,952,685 - Klaassen , et al. May 31, 2 | 2011-05-31 |
Microlithographic Projection Exposure Apparatus App 20110109893 - Gruner; Toralf ;   et al. | 2011-05-12 |
Illumination System For Microlithography App 20110096316 - BROTSACK; Markus | 2011-04-28 |
Apparatus For Microlithographic Projection Exposure And Apparatus For Inspecting A Surface Of A Substrate App 20110085179 - Mann; Hans-Juergen ;   et al. | 2011-04-14 |
Euv Illumination System With A System For Measuring Fluctuations Of The Light Source App 20110079737 - Scholz; Axel ;   et al. | 2011-04-07 |
Catadioptric Projection Objective App 20110075121 - Epple; Alexander ;   et al. | 2011-03-31 |
Microlithographic Exposure Method As Well As A Projection Exposure System For Carrying Out The Method App 20110069296 - GRUNER; Toralf ;   et al. | 2011-03-24 |
Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device Grant 7,911,598 - Kraus , et al. March 22, 2 | 2011-03-22 |
Projection Objective And Projection Exposure Apparatus With Negative Back Focus Of The Entry Pupil App 20110063596 - Mann; Hans-Juergen ;   et al. | 2011-03-17 |
Optical System For A Microlithographic Projection Exposure Apparatus And Microlithographic Exposure Method App 20110063597 - Mengel; Markus | 2011-03-17 |
Optical Element Module App 20110063590 - Bischoff; Thomas ;   et al. | 2011-03-17 |
Optical Aperture Device App 20110063595 - Bieg; Hermann ;   et al. | 2011-03-17 |
Optical composite material and method for its production Grant 7,907,347 - Eva , et al. March 15, 2 | 2011-03-15 |
Cleaning Module And Euv Lithography Device With Cleaning Module App 20110058147 - Ehm; Dirk Heinrich ;   et al. | 2011-03-10 |
Lens Comprising A Plurality Of Optical Element Disposed In A Housing App 20110051110 - Kwan; Yim-Bun Patrick | 2011-03-03 |
Cleaning Module, Euv Lithography Device And Method For The Cleaning Thereof App 20110043774 - HEMBACHER; Stefan ;   et al. | 2011-02-24 |
Catadioptric Projection Objective App 20110038061 - EPPLE; Alexander ;   et al. | 2011-02-17 |
Projection system for EUV lithography Grant RE42,118 - Hudyma , et al. February 8, 2 | 2011-02-08 |
Illumination system for microlithography Grant 7,884,922 - Brotsack February 8, 2 | 2011-02-08 |
Projection Objective For Lithography App 20110026110 - Feldmann; Heiko ;   et al. | 2011-02-03 |
Projection Objective For Microlithography App 20110026003 - Zellner; Johannes ;   et al. | 2011-02-03 |
Optical integrator for an illumination system of a microlithographic projection exposure apparatus Grant 7,880,969 - Wolf , et al. February 1, 2 | 2011-02-01 |
Projection Objective Of A Microlithographic Projection Exposure Apparatus App 20110019169 - Conradi; Olaf ;   et al. | 2011-01-27 |
Illumination Optics And Projection Exposure Apparatus App 20110019172 - Hoegele; Artur ;   et al. | 2011-01-27 |
Optical Unit Having Adjustable Force Action On An Optical Module App 20110019171 - Schubert; Erich ;   et al. | 2011-01-27 |
Method for a multiple exposure, microlithography projection exposure installation and a projection system Grant 7,875,418 - Scharnweber January 25, 2 | 2011-01-25 |
EUV illumination system with a system for measuring fluctuations of the light source Grant 7,875,865 - Scholz , et al. January 25, 2 | 2011-01-25 |
Illumination system particularly for microlithography Grant RE42,065 - Antoni , et al. January 25, 2 | 2011-01-25 |
Projection Illumination System For Euv Microlithography App 20110014799 - Dinger; Udo ;   et al. | 2011-01-20 |
Illumination System For Illuminating A Mask In A Microlithographic Projection Exposure Apparatus App 20110012010 - Major; Andras G. | 2011-01-20 |
Projection Exposure System For Microlithography With A Measurement Device App 20110013171 - Mueller; Ulrich ;   et al. | 2011-01-20 |
Focusing-device for the radiation from a light source Grant 7,871,171 - Antoni , et al. January 18, 2 | 2011-01-18 |
Microlithographic Projection Exposure Apparatus App 20110007293 - Fiolka; Damian ;   et al. | 2011-01-13 |
Chromatically Corrected Catadioptric Objective And Projection Exposure Apparatus Including The Same App 20110007387 - EPPLE; Alexander | 2011-01-13 |
Catadioptric projection objective Grant 7,869,122 - Shafer , et al. January 11, 2 | 2011-01-11 |
Projection objective and projection exposure apparatus with negative back focus of the entry pupil Grant 7,869,138 - Mann , et al. January 11, 2 | 2011-01-11 |
Optical Imaging Arrangement App 20110001949 - Kwan; Yim-Bun Patrick | 2011-01-06 |
Illumination System For A Microlithography Projection Exposure Apparatus App 20110001948 - Dinger; Udo | 2011-01-06 |
Facet Mirror For Use In A Projection Exposure Apparatus For Microlithography App 20110001947 - Dinger; Udo ;   et al. | 2011-01-06 |
Optical element module Grant 7,859,641 - Bischoff , et al. December 28, 2 | 2010-12-28 |
Illumination optics for projection microlithography Grant 7,858,957 - Warm , et al. December 28, 2 | 2010-12-28 |
Optical element App 20100321649 - Baer; Norman | 2010-12-23 |
Method For Operating An Illumination System Of A Microlithographic Projection Exposure Apparatus App 20100321661 - Natt; Oliver ;   et al. | 2010-12-23 |
Projection Objective For Immersion Lithography App 20100323299 - DODOC; Aurelian ;   et al. | 2010-12-23 |
Illumination Device Of A Microlithographic Projection Exposure Apparatus, And Microlithographic Projection Exposure Method App 20100315616 - Deguenther; Markus | 2010-12-16 |
System For Measuring The Image Quality Of An Optical Imaging System App 20100315651 - Mengel; Markus ;   et al. | 2010-12-16 |
Filter Device For The Compensation Of An Asymmetric Pupil Illumination App 20100309450 - Maul; Manfred ;   et al. | 2010-12-09 |
Illumination System For A Microlithographic Projection Exposure Apparatus App 20100309449 - Horn; Jan ;   et al. | 2010-12-09 |
Illumination system and polarizer for a microlithographic projection exposure apparatus Grant 7,847,920 - Fiolka , et al. December 7, 2 | 2010-12-07 |
Microlithographic exposure method as well as a projection exposure system for carrying out the method Grant 7,847,921 - Gruner , et al. December 7, 2 | 2010-12-07 |
High-NA projection objective Grant 7,848,016 - Dodoc December 7, 2 | 2010-12-07 |
Hologram and method of manufacturing an optical element using a hologram Grant 7,848,031 - Hetzler , et al. December 7, 2 | 2010-12-07 |
Lens Blank And Lens Elements As Well As Method For Their Production App 20100296160 - EVA; Eric | 2010-11-25 |
Optical Element For Reflection Of Uv Radiation, Method For Manufacturing The Same And Projection Exposure Apparatus Comprising The Same App 20100290021 - PAZIDIS; Alexandra ;   et al. | 2010-11-18 |
Method For Improving The Imaging Properties Of A Projection Objective, And Such A Projection Objective App 20100290024 - Conradi; Olaf ;   et al. | 2010-11-18 |
Projection objective for lithography Grant 7,835,073 - Feldmann , et al. November 16, 2 | 2010-11-16 |
Projection exposure apparatus, projection exposure method and projection objective Grant 7,834,981 - Rostalski , et al. November 16, 2 | 2010-11-16 |
Composite Body App 20100284652 - Morrison; Fraser ;   et al. | 2010-11-11 |
Microlithographic Projection Exposure Apparatus App 20100283985 - Layh; Michael ;   et al. | 2010-11-11 |
Microlithographic Projection Exposure Apparatus App 20100283984 - Layh; Michael ;   et al. | 2010-11-11 |
Projection objective of a microlithographic projection exposure apparatus Grant 7,830,611 - Conradi , et al. November 9, 2 | 2010-11-09 |
Illumination Optics For A Microlithographic Projection Exposure Apparatus App 20100277707 - Fiolka; Damian | 2010-11-04 |
Illumination System Of A Microlothographic Projection Exposure Apparatus App 20100277708 - Fiolka; Damian ;   et al. | 2010-11-04 |
Vibration damping for photolithographic lens mount Grant 7,826,155 - Geuppert , et al. November 2, 2 | 2010-11-02 |
Replacement Apparatus For An Optical Element App 20100271716 - Kugler; Jens ;   et al. | 2010-10-28 |
Optical Assembly App 20100271607 - Bieg; Hermann ;   et al. | 2010-10-28 |
Imaging Optical System And Projection Exposure Installation App 20100265481 - Mann; Hans-Juergen ;   et al. | 2010-10-21 |
Catadioptric Projection Objective App 20100265572 - Shafer; David ;   et al. | 2010-10-21 |
Projection Lens System Of A Microlithographic Projection Exposure Installation App 20100265478 - Beierl; Helmut ;   et al. | 2010-10-21 |
Illumination System For Illuminating A Mask In A Microlithographic Exposure Apparatus App 20100265482 - Schubert; Erich ;   et al. | 2010-10-21 |
Mirror For The Euv Wavelength Range, Projection Objective For Microlithography Comprising Such A Mirror, And Projection Exposure Apparatus For Microlithography Comprising Such A Projection Objective App 20100265480 - DODOC; Aurelian | 2010-10-21 |
Microlithographic projection exposure apparatus Grant 7,817,250 - Fiolka , et al. October 19, 2 | 2010-10-19 |
Composite structure for microlithography and optical arrangement Grant 7,816,022 - Ekstein , et al. October 19, 2 | 2010-10-19 |
Optical imaging arrangement Grant 7,817,248 - Kwan October 19, 2 | 2010-10-19 |
Mirror For Guiding A Radiation Bundle App 20100261120 - Waldis; Severin ;   et al. | 2010-10-14 |
Oblique Mirror-type Normal-incidence Collector System For Light Sources, Particularly Euv Plasma Discharge Sources App 20100259742 - Singer; Wolfgang | 2010-10-14 |
Illumination Optics For Microlithography App 20100253926 - Endres; Martin ;   et al. | 2010-10-07 |
Catadioptric Projection Objective App 20100253999 - Shafer; David ;   et al. | 2010-10-07 |
Projection exposure apparatus and method for operating the same Grant 7,808,615 - Gruner , et al. October 5, 2 | 2010-10-05 |
Positioning Unit And Alignment Device For An Optical Element App 20100245847 - Weber; Ulrich ;   et al. | 2010-09-30 |
Faceted mirror apparatus Grant 7,802,891 - Seifert , et al. September 28, 2 | 2010-09-28 |
Projection exposure method and projection exposure apparatus for microlithography Grant 7,800,732 - Zimmermann , et al. September 21, 2 | 2010-09-21 |
Apparatus for mounting two or more elements and method for processing the surface of an optical element Grant 7,800,849 - Holderer , et al. September 21, 2 | 2010-09-21 |
Filter device for the compensation of an asymmetric pupil illumination Grant 7,798,676 - Maul , et al. September 21, 2 | 2010-09-21 |
Optical System App 20100231888 - Mueller; Ralf ;   et al. | 2010-09-16 |
Microlithographic Projection Exposure Apparatus App 20100231883 - Dodoc; Aurelian ;   et al. | 2010-09-16 |
Imaging Optical System And Related Installation And Method App 20100231884 - Mann; Hans-Juergen | 2010-09-16 |
Calibration Of A Position Measuring Device Of An Optical Device App 20100235127 - Kwan; Yim-Bun Patrick | 2010-09-16 |
Optical Element With At Least One Electrically Conductive Region, And Illumination System With The Optical Element App 20100231877 - Wolschrijn; Bastiaan Theodoor ;   et al. | 2010-09-16 |
Imaging Optical System And Projection Exposure Apparatus For Microlithography Including An Imaging Optical System App 20100231886 - Mann; Hans-Juergen | 2010-09-16 |
Bundle-guiding Optical Collector For Collecting The Emission Of A Radiation Source App 20100231882 - Dinger; Udo ;   et al. | 2010-09-16 |
Illumination System Of A Microlithographic Projection Exposure Apparatus App 20100231887 - Fiolka; Damian ;   et al. | 2010-09-16 |
Imaging Optical System And Projection Exposure System For Microlithography App 20100231885 - Mann; Hans-Juergen | 2010-09-16 |
System for measuring the image quality of an optical imaging system Grant 7,796,274 - Mengel , et al. September 14, 2 | 2010-09-14 |
Illumination system particularly for microlithography Grant RE41,667 - Antoni , et al. September 14, 2 | 2010-09-14 |
Method and apparatus for interferometrically measuring the shape of a test object Grant 7,791,737 - Doerband , et al. September 7, 2 | 2010-09-07 |
Optical assembly Grant 7,791,826 - Bieg , et al. September 7, 2 | 2010-09-07 |
Lens blank and lens elements as well as method for their production Grant 7,791,811 - Eva September 7, 2 | 2010-09-07 |
Projection method including pupillary filtering and a projection lens therefor Grant 7,791,711 - Holderer , et al. September 7, 2 | 2010-09-07 |
Optical System And Method For Characterising An Optical System App 20100220303 - Fiolka; Damian | 2010-09-02 |
Projection Exposure Apparatus For Semiconductor Lithography Comprising A Cooling Device App 20100220302 - Gischa; Roland | 2010-09-02 |
High-NA projection objective with aspheric lens surfaces Grant 7,787,177 - Schuster August 31, 2 | 2010-08-31 |
Illumination optics for a microlithographic projection exposure apparatus Grant 7,787,104 - Fiolka August 31, 2 | 2010-08-31 |
Imaging Microoptics For Measuring The Position Of An Aerial Image App 20100214565 - Rostalski; Hans-Juergen ;   et al. | 2010-08-26 |
Projection Objective And Method For Optimizing A System Aperture Stop Of A Projection Objective App 20100214551 - Schuster; Karl-Heinz | 2010-08-26 |
Optical Element Module With Minimized Parasitic Loads App 20100214675 - Kugler; Jens ;   et al. | 2010-08-26 |
Projection lens system of a microlithographic projection exposure installation Grant 7,782,440 - Beierl , et al. August 24, 2 | 2010-08-24 |
Illumination system of a microlithographic projection exposure apparatus Grant 7,782,443 - Fiolka , et al. August 24, 2 | 2010-08-24 |
Projection objective having a high aperture and a planar end surface Grant 7,782,538 - Beder , et al. August 24, 2 | 2010-08-24 |
Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources Grant 7,781,750 - Singer August 24, 2 | 2010-08-24 |
Projection Objective For Micrlolithography Having An Obscurated Pupil App 20100208225 - Kraehmer; Daniel ;   et al. | 2010-08-19 |
Method And Apparatus For Measuring Scattered Light On An Optical System App 20100208254 - ARNZ; Michael | 2010-08-19 |
Method For Arranging An Optical Module In A Measuring Apparatus And A Measuring Apparatus App 20100208230 - Rath; Martin ;   et al. | 2010-08-19 |
Method for improving the imaging properties of a projection objective, and such a projection objective Grant 7,777,963 - Conradi , et al. August 17, 2 | 2010-08-17 |
Projection Objective For Microlithography App 20100201964 - Kugler; Jens ;   et al. | 2010-08-12 |
Device For Controlling Temperature Of An Optical Element App 20100200777 - Hauf; Markus | 2010-08-12 |
Optical System Of A Microlithographic Projection Exposure Apparatus App 20100201960 - Tschischgale; Joerg ;   et al. | 2010-08-12 |
Optical Correction Device App 20100201958 - Hauf; Markus ;   et al. | 2010-08-12 |
Projection Exposure Method, System And Objective App 20100201962 - Juergens; Dirk | 2010-08-12 |
Projection Objective For Microlithography App 20100201959 - Beierl; Helmut ;   et al. | 2010-08-12 |
Projection Objective Having Mirror Elements With Reflective Coatings App 20100195075 - Chan; Danny ;   et al. | 2010-08-05 |
Optical Membrane Element App 20100195076 - Mueller; Ulrich ;   et al. | 2010-08-05 |
Projection Objective For Microlithography, Projection Exposure Apparatus, Projection Exposure Method And Optical Correction Plate App 20100195070 - Loering; Ulrich ;   et al. | 2010-08-05 |
Illumination System For A Microlithography Projection Exposure Installation App 20100195077 - KOEHLER; Jess ;   et al. | 2010-08-05 |
Optical assembly, projection exposure apparatus and projection objective Grant 7,768,721 - Weber , et al. August 3, 2 | 2010-08-03 |
Replacement apparatus for an optical element Grant 7,768,723 - Kugler , et al. August 3, 2 | 2010-08-03 |
Method and device for processing optical workpiece surfaces Grant 7,765,903 - Schorcht , et al. August 3, 2 | 2010-08-03 |
Optical imaging device and imaging method for microscopy App 20100188738 - Epple; Alexander ;   et al. | 2010-07-29 |
Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements Grant 7,763,870 - Ehm , et al. July 27, 2 | 2010-07-27 |
Microlithography optical system Grant 7,764,427 - Schuster July 27, 2 | 2010-07-27 |
Method For Producing An Optical Element Through A Molding Process, Optical Element Produced According To The Method, Collector, And Lighting System App 20100182710 - DINGER; Udo ;   et al. | 2010-07-22 |
Method For Examining A Wafer With Regard To A Contamination Limit And Euv Projection Exposure System App 20100183962 - DORSEL; Andreas ;   et al. | 2010-07-22 |
Method and apparatus for determining at least one optical property of an imaging optical system Grant 7,760,345 - Manger , et al. July 20, 2 | 2010-07-20 |
System for measuring the image quality of an optical imaging system Grant 7,760,366 - Mengel , et al. July 20, 2 | 2010-07-20 |
Chromatically corrected catadioptric objective and projection exposure apparatus including the same Grant 7,760,425 - Epple July 20, 2 | 2010-07-20 |
Reflecting optical element with eccentric optical passageway Grant 7,760,327 - Scherle , et al. July 20, 2 | 2010-07-20 |
Method Of Measuring A Deviation Of An Optical Surface From A Target Shape App 20100177320 - Arnold; Ralf ;   et al. | 2010-07-15 |
Optical Element And Method Of Calibrating A Measuring Apparatus Comprising A Wave Shaping Structure App 20100177321 - HETZLER; Jochen ;   et al. | 2010-07-15 |
Polarization-modulating Optical Element App 20100177293 - Fiolka; Damian ;   et al. | 2010-07-15 |
Microlithography projection objective with crystal lens Grant 7,755,839 - Schuster , et al. July 13, 2 | 2010-07-13 |
Correcting device to compensate for polarization distribution perturbations Grant 7,755,833 - Hembd July 13, 2 | 2010-07-13 |
Device and method for range-resolved determination of scattered light, and an illumination mask Grant 7,755,748 - Arnz , et al. July 13, 2 | 2010-07-13 |
Projection Objective And Projection Exposure Apparatus Including The Same App 20100172019 - ULRICH; WILHELM ;   et al. | 2010-07-08 |
Method For A Multiple Exposure, Microlithography Projection Exposure Installation And A Projection System App 20100173250 - Scharnweber; Ralf | 2010-07-08 |
Projection objective and method for optimizing a system aperture stop of a projection objective Grant 7,751,127 - Schuster July 6, 2 | 2010-07-06 |
Refractive projection objective for immersion lithography Grant 7,751,129 - Dodoc , et al. July 6, 2 | 2010-07-06 |
Method and apparatus for aligning optical elements Grant 7,749,051 - Zaiser July 6, 2 | 2010-07-06 |
Illumination System Of A Microlithographic Projection Exposure Apparatus App 20100165318 - Fiolka; Damian ;   et al. | 2010-07-01 |
Illumination System For Illuminating A Mask In A Microlithographic Projection Exposure Apparatus App 20100157269 - Deguenther; Markus ;   et al. | 2010-06-24 |
Apparatus For Manipulation Of An Optical Element App 20100157270 - Muehlbeyer; Michael ;   et al. | 2010-06-24 |
Illumination System Of A Microlothographic Projection Exposure Apparatus App 20100157268 - Fiolka; Damian ;   et al. | 2010-06-24 |
Lithography Projection Objective, And A Method For Correcting Image Defects Of The Same App 20100157435 - Loering; Ulrich ;   et al. | 2010-06-24 |
Projection Exposure Method And Projection Exposure Apparatus For Microlithography App 20100157266 - Zimmermann; Joerg ;   et al. | 2010-06-24 |
Method Of Structuring A Photosensitive Material App 20100149503 - Goehnermeier; Aksel | 2010-06-17 |
High Positioning Reproducible Low Torque Mirror - Actuator Interface App 20100149671 - Soemers; Herman M.J.R. ;   et al. | 2010-06-17 |
Projection Objective And Method For Its Manufacture App 20100149517 - Mann; Hans-Juergen ;   et al. | 2010-06-17 |
Illumination Device Of A Microlithographic Projection Exposure Apparatus, And Microlithographic Projection Exposure Method App 20100149504 - Deguenther; Markus | 2010-06-17 |
Methods For Producing An Antireflection Surface On An Optical Element, Optical Element And Associated Optical Arrangement App 20100149510 - ZACZEK; Christoph ;   et al. | 2010-06-17 |
Optical imaging device and imaging method for microscopy App 20100149632 - Mann; Hans-Juergen ;   et al. | 2010-06-17 |
Projection Lens For Microlithography And Corresponding Terminal Element App 20100149500 - Eva; Eric | 2010-06-17 |
Method of manufacturing an optical element Grant 7,738,117 - Altenberger , et al. June 15, 2 | 2010-06-15 |
Positioning unit and alignment device for an optical element Grant 7,738,193 - Weber , et al. June 15, 2 | 2010-06-15 |
Optical element, projection lens and associated projection exposure apparatus Grant 7,738,187 - Pazidis , et al. June 15, 2 | 2010-06-15 |
Projection objective and projection exposure apparatus including the same Grant 7,738,188 - Ulrich , et al. June 15, 2 | 2010-06-15 |
Exposure Apparatus And Measuring Device For A Projection Lens App 20100141912 - Ehrmann; Albrecht ;   et al. | 2010-06-10 |
Method And System For Indirect Determination Of Local Irradiance In An Optical System App 20100141917 - Meltzer; Frank ;   et al. | 2010-06-10 |
Optical system of a microlithographic projection exposure apparatus Grant 7,733,501 - Tschischgale , et al. June 8, 2 | 2010-06-08 |
Microlithography Projection Optical System And Method For Manufacturing A Device App 20100134907 - Mann; Hans-Juergen ;   et al. | 2010-06-03 |
Diaphragm Changing Device App 20100134777 - Bieg; Hermann ;   et al. | 2010-06-03 |
Projection Objective App 20100134880 - Mann; Hans-Juergen | 2010-06-03 |
Optical System Of A Microlithographic Projection Exposure Apparatus App 20100134891 - Mueller; Ralf ;   et al. | 2010-06-03 |
Projection Exposure System For Microlithography App 20100134768 - Hetzler; Jochen ;   et al. | 2010-06-03 |
Catoptric Objectives And Systems Using Catoptric Objectives App 20100134908 - Mann; Hans-Jurgen ;   et al. | 2010-06-03 |
Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus Grant 7,728,975 - Totzeck , et al. June 1, 2 | 2010-06-01 |
Optical element unit Grant 7,729,065 - Schoeppach , et al. June 1, 2 | 2010-06-01 |
Method of manufacturing an optical element Grant 7,728,987 - Arnold , et al. June 1, 2 | 2010-06-01 |
Projection Objective For A Microlithography Apparatus And Method App 20100128367 - Beckenbach; Mariella ;   et al. | 2010-05-27 |
Chromatically Corrected Objective And Projection Exposure Apparatus Including The Same App 20100128240 - Epple; Alexander ;   et al. | 2010-05-27 |
Lithographic apparatus, device manufacturing method and exchangeable optical element Grant 7,724,351 - Loopstra , et al. May 25, 2 | 2010-05-25 |
Catadioptric objective comprising two intermediate images Grant RE41,350 - Shafer , et al. May 25, 2 | 2010-05-25 |
Catoptric objectives and systems using catoptric objectives Grant 7,719,772 - Mann , et al. May 18, 2 | 2010-05-18 |
Imaging system for a microlithographical projection light system Grant 7,719,658 - Dorsel , et al. May 18, 2 | 2010-05-18 |
Method of designing a projection system, lithographic apparatus and device manufacturing method Grant 7,714,307 - Bociort , et al. May 11, 2 | 2010-05-11 |
Illumination system for a microlithography projection exposure installation Grant 7,714,983 - Koehler , et al. May 11, 2 | 2010-05-11 |
Imaging system with mirror group Grant 7,712,905 - Shafer , et al. May 11, 2 | 2010-05-11 |
Optical element for correction of aberration, and a lithographic apparatus comprising same Grant 7,715,107 - Loopstra , et al. May 11, 2 | 2010-05-11 |
Optical Arrangement For Three-dimensionally Patterning A Material Layer App 20100112465 - Feldmann; Heiko | 2010-05-06 |
Apparatus And Method For Measuring The Outgassing And Euv Lithography Apparatus App 20100112494 - Kraus; Dieter ;   et al. | 2010-05-06 |
Imaging device in a projection exposure machine Grant 7,710,542 - Hummel , et al. May 4, 2 | 2010-05-04 |
Projection objective of a microlithographic projection exposure apparatus Grant 7,710,640 - Beder , et al. May 4, 2 | 2010-05-04 |
Method For The Spatially Resolved Measurement Of Birefringence, And A Measuring Apparatus App 20100103420 - Pahl; Ulrich ;   et al. | 2010-04-29 |
Illumination System Of A Microlithographic Projection Exposure Apparatus App 20100103400 - Deguenther; Markus ;   et al. | 2010-04-29 |
High Transmission, High Aperture Catadioptric Projection Objective And Projection Exposure Apparatus App 20100097592 - Kraehmer; Daniel ;   et al. | 2010-04-22 |
High positioning reproducible low torque mirror-actuator interface Grant 7,699,480 - Soemers , et al. April 20, 2 | 2010-04-20 |
Catadioptric projection objective Grant 7,697,198 - Shafer , et al. April 13, 2 | 2010-04-13 |
Symmetrical objective having four lens groups for microlithography Grant 7,697,211 - Shafer , et al. April 13, 2 | 2010-04-13 |
Projection Objective And Projection Exposure Apparatus For Microlithography App 20100085644 - Rostalski; Hans-Juergen | 2010-04-08 |
Lithography projection objective, and a method for correcting image defects of the same Grant 7,692,868 - Loering , et al. April 6, 2 | 2010-04-06 |
Structure for use in a projection exposure system for manufacturing semiconductors Grant 7,692,881 - Kwan , et al. April 6, 2 | 2010-04-06 |
Optical Measurement Apparatus For A Projection Exposure System App 20100079738 - Eisenmenger; Johannes ;   et al. | 2010-04-01 |
Projection Objective For Microlithography App 20100079739 - Goehnermeier; Aksel ;   et al. | 2010-04-01 |
Projection Objective For Microlithography App 20100079741 - Kraehmer; Daniel ;   et al. | 2010-04-01 |
Support For A Component Of An Optical Device App 20100079737 - Bischoff; Thomas ;   et al. | 2010-04-01 |
Method and system for indirect determination of local irradiance in an optical system Grant 7,686,505 - Meltzer , et al. March 30, 2 | 2010-03-30 |
Optical System Of A Microlithographic Projection Exposure Apparatus App 20100073655 - Dodoc; Aurelian ;   et al. | 2010-03-25 |
Method And System For Removing Contaminants From A Surface App 20100071720 - Ehm; Dirk Heinrich ;   et al. | 2010-03-25 |
Lithographic apparatus and device manufacturing method Grant 7,684,013 - Hansen , et al. March 23, 2 | 2010-03-23 |
Method and a device for positioning an element in an optical system Grant 7,684,131 - Aubele March 23, 2 | 2010-03-23 |
Catoptric objectives and systems using catoptric objectives Grant 7,682,031 - Mann , et al. March 23, 2 | 2010-03-23 |
Diaphragm changing device Grant 7,684,125 - Bieg , et al. March 23, 2 | 2010-03-23 |
Optical Element For Radiation In The Euv And/or Soft X-ray Region And An Optical System With At Least One Optical Element App 20100067653 - Wedowski; Marco ;   et al. | 2010-03-18 |
Connecting Arrangement For An Optical Device App 20100065252 - Methe; Heiko ;   et al. | 2010-03-18 |
Imaging Device With Exchangeable Diaphragms And Method Therefor App 20100066990 - Bieg; Hermann ;   et al. | 2010-03-18 |
Projection objective of a microlithographic projection exposure apparatus Grant 7,679,831 - Kraehmer , et al. March 16, 2 | 2010-03-16 |
Projection objective of a microlithographic projection exposure apparatus and method for its production Grant 7,679,721 - Clauss March 16, 2 | 2010-03-16 |
Catadioptric projection objective Grant 7,679,821 - Shafer , et al. March 16, 2 | 2010-03-16 |
Correction Of Optical Elements By Correction Light Irradiated In A Flat Manner App 20100060988 - Bleidistel; Sascha ;   et al. | 2010-03-11 |
Illumination System For Illuminating A Mask In A Microlithographic Exposure Apparatus App 20100060873 - Deguenther; Markus ;   et al. | 2010-03-11 |
Cleaning method, apparatus and cleaning system Grant 7,671,347 - Ehm , et al. March 2, 2 | 2010-03-02 |
Catadioptric projection objective Grant 7,672,047 - Shafer , et al. March 2, 2 | 2010-03-02 |
Lens made of a crystalline material Grant 7,672,044 - Enkisch , et al. March 2, 2 | 2010-03-02 |
Polarization-modulating Optical Element App 20100045957 - Fiolka; Damian ;   et al. | 2010-02-25 |
Microlithographic Projection Exposure Apparatus App 20100045952 - Dodoc; Aurelian ;   et al. | 2010-02-25 |
Euv Lithography Apparatus And Method For Determining The Contamination Status Of An Euv-reflective Optical Surface App 20100045948 - KRAUS; Dieter ;   et al. | 2010-02-25 |
Illumination Optics For A Microlithographic Projection Exposure Apparatus App 20100039636 - Fiolka; Damian | 2010-02-18 |
Method And Device For Monitoring Multiple Mirror Arrays In An Illumination System Of A Microlithographic Projection Exposure Apparatus App 20100039629 - Xalter; Stefan ;   et al. | 2010-02-18 |
Microlithographic projection exposure apparatus with immersion projection lens Grant 7,663,735 - Fiolka February 16, 2 | 2010-02-16 |
Method For Cleaning An Euv Lithography Device, Method For Measuring The Residual Gas Atmosphere And The Contamination And Euv Lithography Device App 20100034349 - KRAUS; Dieter ;   et al. | 2010-02-11 |
Method And Apparatus For Producing An Element Having At Least One Freeform Surface Having A High Accuracy Of Form And A Low Surface Roughness App 20100033696 - BOEHM; Thure ;   et al. | 2010-02-11 |
Devices and methods for inspecting optical elements with a view to contamination Grant 7,659,976 - Kaller , et al. February 9, 2 | 2010-02-09 |
Projection Objective Of A Microlithographic Projection Exposure Apparatus App 20100026978 - Ruoff; Johannes ;   et al. | 2010-02-04 |
Reflective Optical Element For Euv Lithography Device App 20100027107 - Yakshin; Andrey E. ;   et al. | 2010-02-04 |
Removing Reflective Layers From Euv Mirrors App 20100027106 - WEISER; Martin ;   et al. | 2010-02-04 |
Adjustment arrangement of an optical element Grant 7,656,595 - Beck , et al. February 2, 2 | 2010-02-02 |
Projection Exposure Tool For Microlithography With A Measuring Apparatus And Method For Measuring An Irradiation Strength Distribution App 20100020302 - Freimann; Rolf | 2010-01-28 |
Catadioptric Projection Objective With Pupil Correction App 20100020390 - Dodoc; Aurelian | 2010-01-28 |
Catadioptric Projection Objective App 20100014153 - Shafer; David ;   et al. | 2010-01-21 |
Method For Improving Imaging Properties Of An Optical System, And Such An Optical System App 20100014065 - Gruner; Toralf ;   et al. | 2010-01-21 |
Immersion lithography objective Grant 7,649,702 - Gellrich , et al. January 19, 2 | 2010-01-19 |
Method For Producing Facet Mirrors And Projection Exposure Apparatus App 20100007866 - Warm; Berndt ;   et al. | 2010-01-14 |
Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element Grant 7,646,004 - Wedowski , et al. January 12, 2 | 2010-01-12 |
Illumination System Of A Microlithographic Projection Exposure Apparatus App 20100002217 - Fiolka; Damian ;   et al. | 2010-01-07 |
Method of aligning an optical system Grant 7,643,149 - Freimann , et al. January 5, 2 | 2010-01-05 |
Device Consisting Of At Least One Optical Element App 20090324174 - Kwan; Yim-Bun Patrick ;   et al. | 2009-12-31 |
Optical System Of A Microlithographic Projection Exposure Apparatus App 20090323042 - Totzeck; Michael ;   et al. | 2009-12-31 |
Catoptric Illumination System For Microlithography Tool App 20090323044 - Ossmann; Jens ;   et al. | 2009-12-31 |
Illumination System Of A Microlithographic Projection Exposure Apparatus App 20090323043 - Dieckmann; Nils ;   et al. | 2009-12-31 |
Chromatically Corrected Objective And Projection Exposure Apparatus Including The Same App 20090316256 - EPPLE; Alexander ;   et al. | 2009-12-24 |
Method For Removing Contamination On Optical Surfaces And Optical Arrangement App 20090314931 - EHM; Dirk Heinrich ;   et al. | 2009-12-24 |
Euv Illumination System App 20090316130 - Endres; Martin ;   et al. | 2009-12-24 |
Illumination System Particularly For Microlithography App 20090316128 - Mann; Hans-Juergen ;   et al. | 2009-12-24 |
Housing Structure App 20090303626 - Xalter; Stefan ;   et al. | 2009-12-10 |
Specification, Optimization And Matching Of Optical Systems By Use Of Orientational Zernike Polynomials App 20090306921 - Totzeck; Michael ;   et al. | 2009-12-10 |
Protective coating system for reflective optical elements, reflective optical element and method for the production thereof Grant 7,629,055 - Trenkler December 8, 2 | 2009-12-08 |
Illumination System Of A Microlithographic Projection Exposure Apparatus, And Depolarizer App 20090296066 - Fiolka; Damian | 2009-12-03 |
High-na Projection Objective With Aspheric Lens Surfaces App 20090296204 - Schuster; Karl-Heinz | 2009-12-03 |
Illumination system with zoom objective Grant 7,626,770 - Singer , et al. December 1, 2 | 2009-12-01 |
Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm Grant 7,623,620 - Mann , et al. November 24, 2 | 2009-11-24 |
Method of manufacturing a miniaturized device Grant 7,623,218 - Wegmann , et al. November 24, 2 | 2009-11-24 |
Projection Objective Of A Microlithographic Projection Exposure Apparatus App 20090284831 - Schuster; Karl-Heinz ;   et al. | 2009-11-19 |
Projection Exposure Methods And Systems App 20090280437 - Graeupner; Paul | 2009-11-12 |
Masks, Lithography Device And Semiconductor Component App 20090268189 - MANN; Hans-Juergen ;   et al. | 2009-10-29 |
Holding device for an optical element with support force equalization Grant 7,609,464 - Rief , et al. October 27, 2 | 2009-10-27 |
Catoptric Objectives And Systems Using Catoptric Objectives App 20090262443 - Mann; Hans-Juergen ;   et al. | 2009-10-22 |
Method And Device For Replacing Objective Parts App 20090260654 - Geuppert; Bernhard ;   et al. | 2009-10-22 |
Illumination Optics For Projection Microlithography And Related Methods App 20090262324 - Patra; Michael ;   et al. | 2009-10-22 |
Optical system, method of manufacturing an optical system and method of manufacturing an optical element Grant 7,605,926 - Hetzler , et al. October 20, 2 | 2009-10-20 |
Method for distortion correction in a microlithographic projection exposure apparatus Grant 7,605,905 - Kirchner , et al. October 20, 2 | 2009-10-20 |
Optical system and method for improving imaging properties thereof Grant 7,605,914 - Stammler , et al. October 20, 2 | 2009-10-20 |
High positioning reproducible low torque mirror-actuator interface Grant 7,604,359 - Soemers , et al. October 20, 2 | 2009-10-20 |
Optical device with raster elements, and illumination system with the optical device Grant 7,605,386 - Singer , et al. October 20, 2 | 2009-10-20 |
Optical Element And Method App 20090257032 - Eva; Eric ;   et al. | 2009-10-15 |
Device And Method For The Optical Measurement Of An Optical System By Using An Immersion Fluid App 20090257049 - Wegmann; Ulrich ;   et al. | 2009-10-15 |
Optical Element With Multiple Primary Light Sources App 20090257040 - Dinger; Udo | 2009-10-15 |
Charged Particle Inspection Method and Charged Particle System App 20090256075 - Kemen; Thomas ;   et al. | 2009-10-15 |
Methods of testing and manufacturing optical elements Grant 7,602,502 - Schulte , et al. October 13, 2 | 2009-10-13 |
Device consisting of at least one optical element Grant 7,603,010 - Kwan , et al. October 13, 2 | 2009-10-13 |
Illuminating Optical Unit And Projection Exposure Apparatus For Microlithography App 20090251677 - Endres; Martin ;   et al. | 2009-10-08 |
Transmitting Optical Element With Low Foreign-element Contamination App 20090251673 - CLAUSS; Wilfried | 2009-10-08 |
Reflective Optical Element And Euv Lithography Appliance App 20090251772 - TRENKLER; Johann ;   et al. | 2009-10-08 |
Optical System With An Exchangeable, Manipulable Correction Arrangement For Reducing Image Aberrations App 20090244509 - Limbach; Guido ;   et al. | 2009-10-01 |
Method And Device For Connecting An Optical Element To A Frame App 20090244508 - Schoeppach; Armin ;   et al. | 2009-10-01 |
Method and Apparatus for Interferometrically Measuring the Shape of a Test Object App 20090237672 - Doerband; Bernd ;   et al. | 2009-09-24 |
Projection Exposure Method And Projection Exposure System Therefor App 20090237636 - KALLER; Julian ;   et al. | 2009-09-24 |
System for reducing the coherence of laser radiation Grant 7,593,095 - Fiolka , et al. September 22, 2 | 2009-09-22 |
Illumination system particularly for microlithography Grant 7,592,598 - Mann , et al. September 22, 2 | 2009-09-22 |
Optical System And Method Of Use App 20090231565 - Conradi; Olaf | 2009-09-17 |
Optical Arrangement, In Particular Projection Exposure Apparatus For Euv Lithography, As Well As Reflective Optical Element With Reduced Contamination App 20090231707 - EHM; Dirk Heinrich ;   et al. | 2009-09-17 |
Method of aligning an optical system App 20090231593 - Freimann; Rolf ;   et al. | 2009-09-17 |
Optical Arrangement For Immersion Lithography With A Hydrophobic Coating, As Well As Projection Exposure Apparatus Comprising The Same App 20090233233 - SIX; Stephan ;   et al. | 2009-09-17 |
Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method Grant 7,589,903 - Beder , et al. September 15, 2 | 2009-09-15 |
Actuator device Grant 7,589,921 - Kwan , et al. September 15, 2 | 2009-09-15 |
Projection Objective Of A Microlithographic Projection Exposure Apparatus App 20090225296 - Fischer; Juergen | 2009-09-10 |
Optical System And Method For Improving Imaging Properties Thereof App 20090225308 - Stammler; Thomas ;   et al. | 2009-09-10 |
Projection Exposure Apparatus And Optical System App 20090225297 - Bleidistel; Sascha ;   et al. | 2009-09-10 |
Processes And Device For The Deposition Of Films On Substrates App 20090223812 - YAKSHIN; Andrey E. ;   et al. | 2009-09-10 |
EUV illumination system Grant 7,586,113 - Endres , et al. September 8, 2 | 2009-09-08 |
Optical Device With Stiff Housing App 20090219497 - Schoeppach; Armin ;   et al. | 2009-09-03 |
Multi mirror system for an illumination system Grant 7,583,433 - Antoni , et al. September 1, 2 | 2009-09-01 |
Method of manufacturing an optical component Grant 7,581,305 - Geuppert , et al. September 1, 2 | 2009-09-01 |
Reflective optical element for ultraviolet radiation, projection optical system and projection exposure system therewith, and method for forming the same Grant 7,583,443 - Zaczek September 1, 2 | 2009-09-01 |
Projection Exposure Apparatus For Microlithography App 20090213342 - Weippert; Hans-Joachim ;   et al. | 2009-08-27 |
Method For Improving The Imaging Properties Of An Optical System, And Such An Optical System App 20090213352 - Goehnermeier; Aksel | 2009-08-27 |
Illumination System For A Microlithography Projection Exposure Apparatus App 20090213356 - Gruner; Toralf ;   et al. | 2009-08-27 |
Optical apparatus comprising an optical component and an adjustment device and method for influencing a polarization state of the optical component Grant 7,580,207 - Melzer August 25, 2 | 2009-08-25 |
Method Of Manufacturing A Projection Objective And Projection Objective App 20090207487 - Feldmann; Heiko ;   et al. | 2009-08-20 |
Groupwise corrected objective Grant 7,576,934 - Schottner , et al. August 18, 2 | 2009-08-18 |
Masks, lithography device and semiconductor component Grant 7,572,556 - Mann , et al. August 11, 2 | 2009-08-11 |
Unit magnification projection objective Grant 7,573,655 - Shafer August 11, 2 | 2009-08-11 |
Method of optimizing imaging performance Grant 7,570,345 - Reisinger , et al. August 4, 2 | 2009-08-04 |
Device for preventing the displacement of an optical element Grant 7,564,636 - Zengerling , et al. July 21, 2 | 2009-07-21 |
Method for a multiple exposure, microlithography projection exposure installation and a projection system Grant 7,561,253 - Scharnweber July 14, 2 | 2009-07-14 |
Projection objective Grant 7,557,902 - Dinger , et al. July 7, 2 | 2009-07-07 |
Projection objective Grant 7,557,996 - Dodoc July 7, 2 | 2009-07-07 |
Device for adjusting the illumination dose on a photosensitive layer Grant 7,551,263 - Gruner , et al. June 23, 2 | 2009-06-23 |
Illumination system for a microlithography projection exposure installation Grant 7,551,261 - Fiolka June 23, 2 | 2009-06-23 |
Lithography lens system and projection exposure system provided with at least one lithography lens system of this type Grant 7,551,361 - Rostalski , et al. June 23, 2 | 2009-06-23 |
Process for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and assembly Grant 7,551,375 - Rau , et al. June 23, 2 | 2009-06-23 |
Optical imaging device Grant 7,548,387 - Rassel , et al. June 16, 2 | 2009-06-16 |
Projection exposure system having a reflective reticle Grant RE40,743 - Fuerter , et al. June 16, 2 | 2009-06-16 |
Optical element unit for exposure processes Grant 7,545,483 - Gellrich , et al. June 9, 2 | 2009-06-09 |
Lithographic apparatus and device manufacturing method Grant 7,545,481 - Streefkerk , et al. June 9, 2 | 2009-06-09 |
Projection objective of a microlithographic projection exposure apparatus Grant 7,545,482 - Fischer June 9, 2 | 2009-06-09 |
Method of producing aspherical optical surfaces Grant 7,540,983 - Knohl , et al. June 2, 2 | 2009-06-02 |
Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus Grant 7,542,217 - Singer , et al. June 2, 2 | 2009-06-02 |
Lithographic apparatus and device manufacturing method Grant 7,532,304 - Hoogendam , et al. May 12, 2 | 2009-05-12 |
Microlithographic projection exposure apparatus Grant 7,532,306 - Dodoc , et al. May 12, 2 | 2009-05-12 |
Optical element Grant 7,529,046 - Schletterer , et al. May 5, 2 | 2009-05-05 |
Lithographic apparatus and device manufacturing method Grant 7,525,640 - Jansen , et al. April 28, 2 | 2009-04-28 |
Optical component, comprising a material with a predetermined homogeneity of thermal expansion Grant 7,524,072 - Laufer , et al. April 28, 2 | 2009-04-28 |
Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components Grant 7,522,260 - Kirchner , et al. April 21, 2 | 2009-04-21 |
System and method for determining a shape of a surface of an object and method of manufacturing an object having a surface of a predetermined shape Grant 7,522,292 - Doerband April 21, 2 | 2009-04-21 |
Microlithographic exposure apparatus Grant 7,518,797 - Pazidis , et al. April 14, 2 | 2009-04-14 |
Support device for positioning an optical element Grant 7,515,359 - Kugler , et al. April 7, 2 | 2009-04-07 |
Replacement apparatus for an optical element Grant 7,515,363 - Kugler , et al. April 7, 2 | 2009-04-07 |
Optical beam transformation system and illumination system comprising an optical beam transformation system Grant 7,511,886 - Schultz , et al. March 31, 2 | 2009-03-31 |
Refractive optical imaging system, in particular projection objective for microlithography Grant 7,511,890 - Ulrich , et al. March 31, 2 | 2009-03-31 |
Method of manufacturing a miniaturized device Grant 7,508,489 - Schwab , et al. March 24, 2 | 2009-03-24 |
8-mirror microlithography projection objective Grant 7,508,580 - Mann , et al. March 24, 2 | 2009-03-24 |
Catadioptric projection system for 157 nm lithography Grant 7,508,581 - Hudyma March 24, 2 | 2009-03-24 |
Projection exposure system and method of manufacturing a miniaturized device Grant 7,508,488 - Freimann , et al. March 24, 2 | 2009-03-24 |
Projection optical system Grant 7,492,509 - Rostalski , et al. February 17, 2 | 2009-02-17 |
Lithographic apparatus, system and device manufacturing method Grant 7,491,951 - Van Der Velden , et al. February 17, 2 | 2009-02-17 |
Monocrystalline optical component with curved surface and multilayer coating Grant 7,489,441 - Scheible, legal representative , et al. February | 2009-02-10 |
Imaging device in a projection exposure machine Grant 7,486,382 - Back , et al. February 3, 2 | 2009-02-03 |
Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component Grant 7,483,223 - Egle , et al. January 27, 2 | 2009-01-27 |
Microlithograph system Grant 7,483,121 - Kraehmer , et al. January 27, 2 | 2009-01-27 |
Mirror for use in a projection exposure apparatus Grant 7,481,543 - Dinger , et al. January 27, 2 | 2009-01-27 |
Projection exposure apparatus and projection optical system Grant 7,477,355 - Fehr , et al. January 13, 2 | 2009-01-13 |
Illumination system for a wavelength of .ltoreq. 193 nm, with sensors for determining an illumination Grant 7,473,907 - Singer , et al. January 6, 2 | 2009-01-06 |
Arrangement of optical elements in a microlithographic projection exposure apparatus Grant 7,474,469 - Totzeck , et al. January 6, 2 | 2009-01-06 |
Device for the low-deformation replaceable mounting of an optical element Grant 7,471,469 - Sorg , et al. December 30, 2 | 2008-12-30 |
Lithography projection objective, and a method for correcting image defects of the same Grant 7,463,423 - Loering , et al. December 9, 2 | 2008-12-09 |
Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements Grant 7,462,842 - Wedowski , et al. December 9, 2 | 2008-12-09 |
Projection exposure apparatus Grant 7,463,422 - Kamenow , et al. December 9, 2 | 2008-12-09 |
Projection objective for immersion lithography Grant 7,460,206 - Weissenrieder , et al. December 2, 2 | 2008-12-02 |
Collector configured of mirror shells Grant 7,460,212 - Singer , et al. December 2, 2 | 2008-12-02 |
Projection exposure system Grant 7,457,043 - Kneer , et al. November 25, 2 | 2008-11-25 |
Illumination system particularly for microlithography Grant 7,456,408 - Mann , et al. November 25, 2 | 2008-11-25 |
Adjustment arrangement of an optical element Grant 7,457,059 - Beck , et al. November 25, 2 | 2008-11-25 |
Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus Grant 7,456,933 - Wegmann , et al. November 25, 2 | 2008-11-25 |
Blazed diffractive optical element and projection objective for a microlithographic projection exposure apparatus Grant 7,453,643 - Kleemann November 18, 2 | 2008-11-18 |
Reflective projection lens for EUV-photolithography Grant 7,450,301 - Mann , et al. November 11, 2 | 2008-11-11 |
Optical subassembly and projection objective in semiconductor lithography Grant 7,448,763 - Frommeyer , et al. November 11, 2 | 2008-11-11 |
Optical projection lens system Grant 7,450,312 - Shafer , et al. November 11, 2 | 2008-11-11 |
Lithographic apparatus and device manufacturing method Grant 7,446,849 - Van Empel , et al. November 4, 2 | 2008-11-04 |
Imaging system, in particular a projection objective of a microlithographic projection exposure apparatus Grant 7,446,951 - Schuster November 4, 2 | 2008-11-04 |
Catadioptric projection objective Grant 7,446,952 - Epple November 4, 2 | 2008-11-04 |
Apparatus for scattered light inspection of optical elements Grant 7,443,500 - Kaller October 28, 2 | 2008-10-28 |
Illumination system particularly for microlithography Grant 7,443,948 - Schultz , et al. October 28, 2 | 2008-10-28 |
Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate Grant 7,442,908 - Schuster October 28, 2 | 2008-10-28 |
Method of calibrating an interferometer optics and of processing an optical element having an optical surface Grant 7,436,520 - Doerband October 14, 2 | 2008-10-14 |
Optical measuring apparatus and operating method for imaging error correction in an optical imaging system Grant 7,436,521 - Emer , et al. October 14, 2 | 2008-10-14 |
Lithographic apparatus and device manufacturing method Grant 7,433,015 - Mulkens , et al. October 7, 2 | 2008-10-07 |
Projection objective and method for its manufacture Grant 7,429,116 - Mann , et al. September 30, 2 | 2008-09-30 |
Objectives as a microlithography projection objective with at least one liquid lens Grant 7,428,105 - Shafer , et al. September 23, 2 | 2008-09-23 |
Optical component that includes a material having a thermal longitudinal expansion with a zero crossing Grant 7,428,037 - Laufer , et al. September 23, 2 | 2008-09-23 |