U.S. patent application number 12/834485 was filed with the patent office on 2011-01-13 for chromatically corrected catadioptric objective and projection exposure apparatus including the same.
This patent application is currently assigned to Carl Zeiss SMT AG. Invention is credited to Alexander EPPLE.
Application Number | 20110007387 12/834485 |
Document ID | / |
Family ID | 40219273 |
Filed Date | 2011-01-13 |
United States Patent
Application |
20110007387 |
Kind Code |
A1 |
EPPLE; Alexander |
January 13, 2011 |
CHROMATICALLY CORRECTED CATADIOPTRIC OBJECTIVE AND PROJECTION
EXPOSURE APPARATUS INCLUDING THE SAME
Abstract
A catadioptric objective includes a plurality of optical
elements arranged along an optical axis to image a pattern from an
object field in an object surface of the objective to an image
field in an image surface region of the objective at an image-side
numerical aperture NA with electromagnetic radiation from a
wavelength band around a central wavelength .lamda.<300 nm. The
optical elements include a concave mirror and a plurality of
lenses. The projection objective forms an image of the pattern in a
respective Petzval surface for each wavelength .lamda. of a
wavelength band, the Petzval surfaces deviating from each other for
different wavelengths. The plurality of lenses include lenses made
from different materials having substantially different Abbe
numbers. A longitudinal departure p of the Petzval surface at a
given wavelength from a planar reference surface at an edge field
point of the image field (at maximum image height y') measured
parallel to the optical axis in the image surface region, varies
with the wavelength .lamda. according to:
dp/d.lamda.<(15.lamda./NA.sup.2)/nm.
Inventors: |
EPPLE; Alexander; (Aalen,
DE) |
Correspondence
Address: |
SUGHRUE MION, PLLC
2100 PENNSYLVANIA AVENUE, N.W., SUITE 800
WASHINGTON
DC
20037
US
|
Assignee: |
Carl Zeiss SMT AG
Oberkochen
DE
|
Family ID: |
40219273 |
Appl. No.: |
12/834485 |
Filed: |
July 12, 2010 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
11896689 |
Sep 5, 2007 |
7760425 |
|
|
12834485 |
|
|
|
|
Current U.S.
Class: |
359/351 ;
359/355 |
Current CPC
Class: |
G02B 17/0892 20130101;
G02B 27/0025 20130101; G03F 7/70225 20130101 |
Class at
Publication: |
359/351 ;
359/355 |
International
Class: |
G02B 17/08 20060101
G02B017/08; G02B 13/14 20060101 G02B013/14 |
Claims
1. A catadioptric objective comprising: a plurality of optical
elements arranged along an optical axis to image a pattern from an
object field in an object surface of the objective to an image
field in an image surface region of the objective at an image-side
numerical aperture NA with electromagnetic radiation from a
wavelength band around a central wavelength .lamda.<300 nm, the
optical elements including: a concave mirror; and a plurality of
lenses; wherein the projection objective forms an image of the
pattern in a respective Petzval surface for each wavelength .lamda.
of a wavelength band, the Petzval surfaces deviating from each
other for different wavelengths; wherein the plurality of lenses
include lenses made from different materials having substantially
different Abbe numbers; and wherein a longitudinal departure p of
the Petzval surface at a given wavelength from a planar reference
surface at an edge field point of the image field, at maximum image
height y', measured parallel to the optical axis in the image
surface region, varies with the wavelength .lamda. according to
dp/d.lamda.<(15.lamda./NA.sup.2)/nm.
2. Objective according to claim 1, wherein the objective reduces a
longitudinal departure p of the Petzval surface at a given
wavelength from a planar reference surface at an edge field point
of the image field at the maximum image height y' to less than
.lamda./NA.sup.2 for each wavelength in the wavelength band.
3. Objective according to claim 1, wherein the image field has an
image field size defined by the maximum image field height y'
greater than 3 mm.
4. Objective according to claim 3, wherein the maximum image field
height y' is at least 10 mm.
5. Objective according to claim 1, wherein the objective has an
image-side numerical aperture NA>0.2.
6. Objective according to claim 5, wherein the objective has an
image-side numerical aperture NA.gtoreq.0.6.
7. Objective according to claim 1, wherein the objective is
configured as an immersion objective with image-side numerical
aperture NA.gtoreq.1 when used in conjunction with an immersion
liquid in an image-side working space between an exit surface of
the objective and the image surface during operation.
8. Objective according to claim 1, wherein the concave mirror is
arranged at or optically close to a pupil surface of the objective
and a negative group comprising at least one negative lens is
arranged in front of the concave mirror on a reflecting side
thereof in a double pass region such that radiation passes at least
twice in opposite directions through the negative group.
9. Objective according to claim 1, wherein the plurality of lenses
include lenses made from different materials having different Abbe
numbers defining a median Abbe number, wherein at least one of the
plurality of lenses is a first lens made from a first material
having a first Abbe number equal to or greater than the median Abbe
number and at least one of the plurality of lenses is made from a
second material having an Abbe number smaller than the median Abbe
number.
10. Objective according to claim 9, wherein more than 50% of all
the lenses are made from the second material and less than 50% are
made from the first material.
11. Objective according to claim 9, wherein at least one second
lens made from the second material is a negative lens.
12. Objective according to claim 11, wherein the negative lens is a
biconcave negative lens.
13. Objective according to claim 11, wherein the negative lens has
an optically free diameter substantially smaller than an optically
free diameter of at least one lens directly adjacent to the
negative lens.
14. Objective according to claim 13, wherein the negative lens has
an optically free diameter which is less than 80% of an optically
free diameter of a largest lens of the objective.
15. Objective according to claim 14, wherein the optically free
diameter of the negative lens is less than 50% of the optically
free diameter of the largest lens of the objective.
16. Objective according to claim 11, wherein the negative lens is
arranged between two adjacent lenses, where each of the two
adjacent lenses has an optically free diameter substantially larger
than the optically free diameter of the negative lens.
17. Objective according to claim 11, wherein the objective includes
at least one waist region where a beam diameter of a radiation beam
passing through the objective has a local minimum, and wherein the
negative lens is positioned in the waist region.
18. Objective according to claim 11, wherein the objective includes
at least two negative lenses of the second material.
19. Objective according to claim 1, wherein more than 50% of all
the lenses are made of fused silica (SiO.sub.2).
20. Objective according to claim 9, wherein the first material is
fused silica (SiO.sub.2).
21. Objective according to claim 9, wherein the optical elements
include a lens doublet consisting of a first lens and a second lens
directly adjacent to the first lens, wherein the first lens is a
positive lens made from the first material and the second lens is a
negative lens made from the second material.
22. Objective according to claim 21, wherein the lens doublet is
arranged in a region optically close to a field surface of the
projection objective, where a chief ray height is at least 50% of a
maximum chief ray height in the objective.
23. Objective according to claim 22, wherein the field surface is
the object surface.
24. Objective according to claim 1, wherein the optical elements
are arranged to form at least one intermediate image in an
intermediate image surface between the object surface and the image
surface.
25. Objective according to claim 24, wherein the intermediate image
has substantial chromatic aberration and wherein at least one lens
is arranged in a region optically close to the intermediate
image.
26. Objective according to claim 25, wherein the lens arranged
close to the intermediate image is arranged in a region where a
marginal ray height of the imaging is smaller than a chief ray
height.
27. Objective according to claim 1, wherein the optical elements
are arranged to form exactly two intermediate images between the
object surface and the image surface.
28. Objective according to claim 1, wherein the objective includes:
a first objective part configured to image the pattern into a first
intermediate image; a second objective part configured to image the
first intermediate image into a second intermediate image; and a
third objective part configured to image the second intermediate
image onto the image surface.
29. Objective according to claim 28, wherein the second objective
part includes the at least one concave mirror.
30. Objective according to claim 28, wherein the first objective
part is a refractive objective part.
31. Objective according to claim 28, wherein the third objective
part is a refractive objective part.
32. Objective according to claim 28, further comprising: a first
deflecting mirror arranged to deflect radiation from the object
surface towards the concave mirror or to deflect radiation from the
concave mirror towards the image surface such that a double pass
region is formed geometrically between the first deflecting mirror
and the concave mirror.
33. Objective according to claim 32, further comprising: a second
deflecting mirror arranged to deflect radiation from the first
deflecting mirror towards the image surface such that the image
surface is parallel to the object surface.
34. Objective according to claim 28, wherein the second objective
part configured to image the first intermediate image into the
second intermediate image has a second magnification .beta..sub.2
according to the condition 0.8.ltoreq.|.beta..sub.2|.ltoreq.1.1
35. Objective according to claim 28, wherein the first objective
part configured to image the pattern into a first intermediate
image includes a sequence of consecutive lens groups having
alternating refractive powers including a first lens group with a
positive refractive power, a second lens group with negative
refractive power immediately following the first lens group, a
third lens group with positive refractive power immediately
following the second lens group, a fourth lens group with negative
refractive power immediately following the third lens group and a
fifth lens group with positive refractive power immediately
following the fourth lens group, such that at least two separate
waist regions are created where a beam diameter of radiation
passing through the first objective part has a local minimum.
36. Objective according to claim 28, wherein there is exactly one
concave mirror.
Description
[0001] The present application is a Continuation of U.S. patent
application Ser. No. 11/896,689, filed on Sep. 5, 2007, the entire
disclosure of which is incorporated herein by reference.
FIELD AND BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The invention relates to a catadioptric objective. The
objective may be configured as catadioptric projection objective
which may be used in a microlithographic projection exposure
apparatus to expose a radiation-sensitive substrate arranged in the
region of an image surface of the projection objective with at
least one image of pattern of a mask that is arranged in the region
of an object surface of the projection objective. The invention
also relates to a projection exposure apparatus which includes such
catadioptric objective.
[0004] 2. Description of Related Art
[0005] Microlithographic projection exposure methods and apparatus
are used to fabricate semiconductor components and other finely
patterned components. A microlithographic exposure process involves
using a mask (reticle) that carries or forms a pattern of a
structure to be imaged, for example a line pattern of a layer of a
semiconductor component. The pattern is positioned in a projection
exposure apparatus between an illumination system and a projection
objective in a region of the object surface of the projection
objective. Primary radiation from the ultraviolet electromagnetic
spectrum (UV radiation) is provided by a primary radiation source
and transformed by optical components of the illumination system to
produce illumination radiation directed at the pattern of the mask.
The radiation modified by the mask and the pattern passes through
the projection objective, which forms an image of the pattern in
the image surface of the projection objective, where a substrate to
be exposed is arranged. The substrate, e.g. a semiconductor wafer,
normally carries a radiation-sensitive layer (photoresist).
[0006] Various types of primary radiation sources are currently
used in the field of microlithography. In some cases, a laser is
used as primary radiation source. A natural bandwidth of the laser
may be narrowed by appropriate bandwidth narrowing devices. For
example, a natural bandwidth of about .DELTA..lamda.=500 pm may be
reduced by three orders of magnitude to obtain radiation having a
bandwidth .DELTA..lamda..apprxeq.0.5 pm used for the exposure.
Where radiation with a relatively small bandwidth is used for the
exposure, chromatic aberrations caused by the optical elements of
the projection objective may be kept relatively small without
specific efforts for chromatic correction (correction of chromatic
aberrations).
[0007] The situation is different in microlithographic systems
having primary radiation source emitting ultraviolet radiation from
a relatively broad wavelength band. For example, a mercury vapour
lamp or a light emitting diode (LED) may be used as primary
radiation source. Specifically, projection exposure systems having
a central wavelength .lamda.=365.5 nm.+-.2 nm (so-called i-line
system) have been in use for a long time. Those systems utilize the
i-line of a mercury vapour lamp, the natural bandwidth thereof
being limited to a narrower utilized band width .DELTA..lamda. of
about 2 nm with the aid of filters or in some other way. Other
spectral lines of a mercury vapour lamp may also be used for
exposure, such as the mercury h-line at about 405 nm and the
mercury g-line at about 436 nm. The electromagnetic spectrum of
each of the lines is relatively broad, thereby requiring that the
projection objective should provide a relatively efficient
correction of chromatic aberrations in order to ensure
low-aberration imaging even with such broad band radiation at the
required resolution. Chromatic correction is also required if it is
desired to use a laser source at the natural line width or a laser
source having only moderate line width narrowing.
[0008] Chromatic aberrations occur basically because of the fact
that the index of refraction, n, of transparent optical materials
varies as a function of the wavelength .lamda.. In general, the
index of refraction of optical materials is higher for shorter
wavelength than for longer wavelength. Chromatic aberrations may be
subdivided into different categories. A first category of chromatic
aberrations includes deviations of position, shape and/or size of
images formed at different wavelength from an ideal image. This
accounts for the fact that an image is formed for each wavelength
in a paraxial region, and the images usually differ in position,
shape and/or size. The chromatic aberrations of the first category
are usually referred to as "axial chromatic aberration" (or axial
color, AX) and "chromatic difference of magnification" (or lateral
color, LAT).
[0009] Axial chromatic aberration is the longitudinal variation of
paraxial focus (or image position) with wavelength. Where the index
of refraction of an optical material is higher for shorter
wavelength than for longer wavelength, the short wavelengths are
more strongly refracted at each surface of a lens element so that,
in a simple positive lens, for example, the relatively shorter
wavelength rays are brought to a focus closer to the lens than the
relatively longer wavelength rays. The paraxial distance along the
optical axis of the lens between the two focus points is the axial
chromatic aberration. When the shorter wavelength rays are brought
to focus closer to the positive lens than the longer wavelength
rays, the longitudinal axial chromatic aberration is usually termed
"undercorrected" or "negative".
[0010] When a lens system forms images of different sizes for
different wavelengths or spreads the image of an off-axis point
into a color fringe, the difference between the paraxial image
heights for different colors is usually denoted lateral color or
chromatic difference of magnification.
[0011] The chromatic variation of the index of refraction also
produces a variation of monochromatic aberrations, which may be
summarized in a second category of chromatic aberrations. The
variation of monochromatic aberrations include the chromatic
variation of spherical aberration, the chromatic variation of coma,
the chromatic variation of astigmatism, the chromatic variation of
distortion and the chromatic variation of image field
curvature.
[0012] In some cases, blurred images with low contrast particularly
near the outer edges of extended image fields have been observed in
objectives used with relatively broadband radiation sources.
SUMMARY OF THE INVENTION
[0013] It is one object of the invention to provide a catadioptric
objective useful for microlithography which may be operated with
ultraviolet radiation provided by a broadband radiation source.
[0014] It is another object of the invention to provide a
catadioptric objective useful for microlithography which generates
an image with sufficient contrast over the entire image field when
operated with ultraviolet radiation provided by a broadband
radiation source.
[0015] It is another object of the invention to provide a
catadioptric objective having a good correction status with respect
to chromatic variation of the Petzval sum.
[0016] It is another object of the invention to provide a
catadioptric objective which may be operated with ultraviolet
radiation provided by a broadband radiation source, where
manufacturing is facilitated with respect to choice of material and
with respect to quality tolerances of materials used for
transparent optical elements.
[0017] To address these and other objects the invention, according
to one formulation, the invention, provides a catadioptric
objective comprising a plurality of optical elements arranged along
an optical axis to image a pattern from an object field in an
object surface of the objective to an image field in an image
surface region of the objective at an image-side numerical aperture
NA with electromagnetic radiation from a wavelength band around a
central wavelength .lamda.. The optical elements include a concave
mirror and a plurality of lenses. The projection objective forms an
image of the pattern in a respective Petzval surface for each
wavelength .lamda. of a wavelength band, the Petzval surfaces
deviating from each other for different wavelengths. A longitudinal
departure p of the Petzval surface at a given wavelength from a
planar reference surface at an edge field point of the image field
(at maximum image height y'), measured parallel to the optical axis
in the image surface region, varies with the wavelength .lamda.
according to dp/d.lamda.<(0.2.lamda./NA.sup.2)/nm.
[0018] According to another formulation, there is provided a
catadioptric objective comprising a plurality of optical elements
arranged along an optical axis to image a pattern from an object
field in an object surface of the objective to an image field in an
image surface region of the objective at an image-side numerical
aperture NA with electromagnetic radiation from a wavelength band
around a central wavelength .lamda.. The optical elements include a
concave mirror and a plurality of lenses. The objective forms a
first image of the pattern in a first Petzval surface at a first
wavelength .lamda..sub.1<.lamda. of the wavelength band and a
second image of the pattern in a second Petzval surface at a second
wavelength .lamda..sub.2>.lamda. separated from the first
wavelength by a wavelength difference
.DELTA..lamda.=.lamda..sub.2-.lamda..sub.1 greater than 5 nm. A
longitudinal Petzval surface departure .DELTA.PS between the first
Petzval surface and the second Petzval surface, measured parallel
to the optical axis in the image surface region, is less than
.lamda./NA.sup.2 for all field points in the image field.
[0019] According to another formulation, there is provided a
catadioptric objective comprising a plurality of optical elements
arranged along an optical axis to image a pattern from an object
field in an object surface of the objective to an image field in an
image surface region of the objective at an image-side numerical
aperture NA with electromagnetic radiation from a wavelength band
around a central wavelength .lamda.. The optical elements include a
concave mirror and a plurality of lenses. The projection objective
forms an image of the pattern in a respective Petzval surface for
each wavelength .lamda. of a wavelength band, the Petzval surfaces
deviating from each other for different wavelengths. The plurality
of lenses includes lenses made from different materials having
substantially different Abbe numbers. A longitudinal departure p of
the Petzval surface at a given wavelength from a planar reference
surface at an edge field point of the image field (at maximum image
height y'), measured parallel to the optical axis in the image
surface region, varies with the wavelength .lamda. according to
dp/d.lamda.<(7.7.lamda./NA.sup.2)/nm.
[0020] According to another formulation, there is provided a
catadioptric objective comprising a plurality of optical elements
arranged along an optical axis to image a pattern from an object
field in an object surface of the objective to an image field in an
image surface region of the objective at an image-side numerical
aperture NA with electromagnetic radiation from a wavelength band
around a central wavelength .lamda.<300 nm. The optical elements
include a concave mirror and a plurality of lenses. The projection
objective forms an image of the pattern in a respective Petzval
surface for each wavelength .lamda. of a wavelength band, the
Petzval surfaces deviating from each other for different
wavelengths. The plurality of lenses includes lenses made from
different materials having substantially different Abbe numbers. A
longitudinal departure p of the Petzval surface at a given
wavelength from a planar reference surface at an edge field point
of the image field (at maximum image height y'), measured parallel
to the optical axis in the image surface region, varies with the
wavelength .lamda. according to
dp/d.lamda.<(15.lamda./NA.sup.2)/nm
[0021] The planar reference surface mentioned above may be the
paraxial image surface of the objective, sometimes denoted as
Gaussian image surface. The paraxial image surface extends
perpendicularly to the optical axis at the axial position where the
paraxial image (image formed by paraxial rays) is formed. The
planar reference surface may be the best focal plane of the
objective. In general, the best focal plane does not coincide with
the paraxial image plane but is slightly defocused relative thereto
into a position where all aberrations including defocus are well
balanced.
[0022] Every optical system has associated with it a sort of basic
field curvature, which is conventionally called the Petzval
curvature. When there is no astigmatism, the sagittal and tangetial
image surfaces coincide with each other and lay on the Petzval
surface. Positive lenses (lenses with positive refractive power)
introduce inward curvature of the Petzval surface to a system, and
negative lenses (lenses with negative refractive power) introduce
backward curvature. The Petzval curvature, 1/R.sub.P, is given by
the Petzval sum 1/R.sub.P, which is the reciprocal of the Petzval
radius R.sub.P, which is the radius of curvature of the Petzval
surface. The Petzval sum of dioptric (refractive) optical elements
may be defined as follows:
1 R P = - n img i 1 r i ( 1 n i - 1 n i - 1 ) ( 1 )
##EQU00001##
[0023] In this equation, R.sub.P is the radius of curvature of the
Petzval surface in the image space, n.sub.img is the refractive
index in the image space, r.sub.i is the radius of curvature of the
i.sup.th system surface (positive if convex towards the incoming
radiation), and n.sub.i and n.sub.i-1 are the refractive indices of
the medium downstream and upstream of the i.sup.th system surface.
In the absence of astigmatism, the Petzval curvature corresponds to
the curvature of the image surface. For reflective surfaces
(mirrors) the condition n.sub.i=-n.sub.i-1 holds such that:
1 R P = n img i 2 r i n i , ( 2 ) ##EQU00002##
wherein n.sub.i is the refractive index of the medium surrounding
the mirror surface. Equations (1) and (2) show that the condition
R.sub.P<0 holds for a positive lens, corresponding to an inward
curvature of the Petzval surface. Therefore, the image of a planar
object will be concave towards the radiation direction, which
condition is typically referred to as "undercorrection" of field
curvature. In contrast, the condition R.sub.P>0 holds for a
concave mirror, corresponding to overcorrection of the field
curvature.
[0024] The Petzval surface and the paraxial image surface coincide
on the optical axis. The curvature of the Petzval surface may
result in a situation where the Petzval surface departs from the
ideal image surface for field points further away from the optical
axis. The fact that the Petzval surface is curved transforms to a
longitudinal departure p of the Petzval surface from the ideal
image surface (which is usually flat) at a field point at the outer
edge of the image field (at maximum image field height y'),
measured parallel to the optical axis in the image space. The term
"image field curvature" is conventionally used to refer to such
longitudinal departure (or sag) at maximum image field height y',
and may not be confused with the "curvature of the image field",
which is the reciprocal of the radius of curvature of the image
field.
[0025] Generally, the image field curvature will be different for
different wavelengths, corresponding to a "chromatic variation of
image field curvature" (or chromatic variation of the Petzval sum)
of an optical system. With other words: the image field curvature
(or the Petzval sum) is a function of the wavelength .lamda..
Considering an optical system having lenses made from one material
only (one-material system) equation (1) may be reformulated using
parameter n.sub.g for the refractive index of all the lenses and
parameter n.sub.a for the refractive index of the medium in the
spaces between lenses according to:
1 R P = ( 1 n g - 1 n a ) n img lenses ( 1 r i , 1 - 1 r i , 2 ) (
3 ) 1 R P = ( 1 n g - 1 n a ) n img G , with ( 3 a ) G = lenses ( 1
r i , 1 - 1 r i , 2 ) ( 3 b ) .lamda. ( 1 R P ) = ( - 1 n g 2 ) n
img G n g .lamda. ( 3 c ) ##EQU00003##
[0026] Equation (3) gives the dioptric contribution to the system
Petzval sum. In the sum term on the right hand side of equation
(3), parameters r.sub.i,1 and r.sub.i,2 refer to the radius of
curvature of the entry surface and the exit surfaces of the lenses,
respectively. It is apparent that the sum term in the product on
the right hand side of the equation (3), corresponding to sum term
G as defined in equation (3b), describes a purely geometrical
property of the optical system, whereas the first factor of the
product in equation (3) includes the refractive index of the
lenses, is generally different from zero and varies with the
wavelength. Therefore, if the sum term (purely geometrical term G)
differs from 0, and if the transparent material used for the lenses
is a dispersive material (index of refraction varies with
wavelength) then the contribution to Petzval sum given in equation
(3) varies with the wavelength as given in equation (3c) assuming
that the dispersion of the medium adjacent to the mirrors is
negligible
[0027] As evident from equation (2), the contribution to Petzval
sum of reflective surfaces does not depend on the wavelength as
long as the reflective surfaces lie in a substantially
dispersion-free medium such as air or another gas. Therefore, the
entire chromatic variation of the Petzval sum in a catadioptric
optical system equals the chromatic variation of the Petzval sum of
the dioptric (refractive) optical components of the optical
system.
[0028] As outlined above, the Petzval sum is a parameter
representing the curvature of the image field in which an image
with optimum quality is generated (if no other aberrations such as
astigmatism exist). Where it is desired to determine whether or not
a given image field curvature is acceptable for an optical system
the problem may be described as follows. A longitudinal departure p
of the Petzval surface from a reference image surface at an edge
field point of the image field at image height y' measured parallel
to the optical axis in the image surface region, may be written as
follows:
p = 1 2 R P y '2 ( 4 ) ##EQU00004##
where R.sub.p is the Petzval radius (radius of the Petzval
surface). The longitudinal departure p effectively corresponds to a
defocus at the outer edge of the image field from a reference
surface, which may be a planar surface perpendicular to the optical
axis or a surface of another shape. Where it is desired to obtain a
diffraction limited image across the entire image field this
defocus (longitudinal departure) must not exceed a predefined
fraction of the depth of focus (DOF), which is proportional to the
Rayleigh unit RU defined as:
RU = .lamda. NA 2 ( 5 ) ##EQU00005##
[0029] Therefore, the defocus resulting from the Petzval sum should
not exceed a given threshold value according to:
p < A .lamda. NA 2 ( 6 ) ##EQU00006##
[0030] Generally, the condition A<1 should hold if diffraction
limited imaging is desired.
[0031] Where the Petzval sum varies with the wavelength, the
longitudinal departure p defined above also varies with the
wavelength such that the derivative of p with respect to wavelength
.lamda., dp/d.lamda., has a finite value differing from zero. The
derivative of p with respect to wavelength .lamda., dp/d.lamda.,
may be used to characterize the magnitude of the chromatic
variation of image field curvature in an optical system. The
derivative of p with respect to wavelength .lamda., dp/d.lamda.,
should not exceed a threshold value B in the wavelength band of
intended use such that
dp/d.lamda.<B (7)
[0032] In broadband applications, where it is desired to use at
least two wavelengths .lamda..sub.1 and .lamda..sub.2 spaced apart
by the wavelength difference .DELTA..lamda. condition (6) may be
reformulated as
dp/d.lamda.*.DELTA..lamda.<A*1RU (8)
[0033] Where the objective is configured to be used as a projection
objective in a microlithographic system it may be desirable that
the images formed for different wavelengths lay relatively close
together in a common image field region and the common image field
region is essentially flat in an area large enough to allow
economic manufacturing of components. In those embodiments the
objective may be configured to reduce an image field curvature for
each of the first and second wavelength in the image region to less
than a depth of focus of the objective. The depth of focus (DOF) is
proportional to the Rayleigh unit RU=.lamda./NA.sup.2.
[0034] In some embodiments the image field has an image field size
defined by a maximum image field height y' greater than 3 mm. Twice
the maximum image field height corresponds to the image field
diameter which may actually be used for lithographic purposes, for
example. The maximum image field height y' may be 5 mm or more, or
8 mm or more, or 10 mm or more, or 15 mm or more for example.
[0035] Embodiments may have an image-side numerical aperture
NA>0.2, thereby allowing use in microlithography, for example.
In some embodiments an image-side numerical aperture NA>0.3 or
NA>0.4 or NA.gtoreq.0.5 is obtained. The image-side numerical
aperture may be even greater, such as NA.gtoreq.0.6 or
NA.gtoreq.0.7 or NA.gtoreq.0.8. Embodiments may be used in an
immersion configuration, thereby allowing NA.gtoreq.1.0 in cases
where the objective is configured for such immersion operation.
[0036] The wavelength band may include wavelengths
.lamda..gtoreq.300 nm. For example where primary radiation is
provided by a mercury vapour radiation source the wavelength band
may include at least one of the mercury g-, h- and i-lines. In some
embodiments the wavelength band may include at least two mercury
spectral lines, for example each of the mercury g-, h- and i-lines.
The wavelength band may include wavelengths .lamda.<300 nm, such
as .lamda.<260 nm or .lamda.<200 nm, for example. The
wavelength may be larger than 100 nm or larger than 150 nm.
Wavelengths smaller than 300 nm may be provided by a laser
radiation source.
[0037] The wavelength band may include radiation of one spectral
line region only, where a considerable amount of energy of the
spectral line region may be used. The wavelength difference
.DELTA..lamda. may be 0.1 nm or more or 1 nm or more or 2 nm or
more in some cases. Larger wavelength differences are possible,
such as .DELTA..lamda.>5 nm. In some embodiments
.DELTA..lamda.>10 nm, or .DELTA..lamda.>25 nm, or
.DELTA..lamda.>50 nm. For example where the wavelength band
includes each of the mercury g-, h- and i-lines .DELTA..lamda. may
be larger than 70 nm. .DELTA..lamda. may be smaller than 200 nm or
smaller than 100 nm.
[0038] Catadioptric objectives useful for broadband application
with sufficient control of the chromatic variation of image field
curvature may be configured in a variety of ways.
[0039] In some embodiments, the concave mirror is arranged at or
optically close to a pupil surface of the objective and a negative
group comprising at least one negative lens is arranged in front of
the concave mirror on a reflecting side thereof in a double pass
region such that radiation passes at least twice in opposite
directions through the negative group. The negative group may be
positioned in direct proximity to the concave mirror in a region
near the pupil, where this region may be characterized by the fact
that the marginal ray height (MRH) of the imaging is greater than
the chief ray height (CRH). Preferably, the marginal ray height is
at least twice as large, in particular at least 5 to 10 times as
large, as the chief ray height in the region of the negative group.
A negative group in the region of large marginal ray heights can
contribute effectively to the chromatic correction, in particular
to the correction of the axial chromatic aberration AX, since the
axial chromatic aberration AX of a thin lens is proportional to the
square of the marginal ray height at the location of the lens (and
proportional to the refractive power and to the dispersion of the
lens). Added to this is the fact that the projection radiation
passes twice, in opposite through-radiating directions, through a
negative group arranged in direct proximity to a concave mirror,
with the result that the chromatically overcorrecting effect of the
negative group is utilized twice. The negative group may e.g.
consist of a single negative lens or contain at least two negative
lenses.
[0040] A combination--acting in the manner of a "Schupmann
achromat" (cf. U.S. Pat. No. 620,978)--of a concave mirror arranged
near or at the pupil with a negative group arranged directly in
front of the mirror surface can be utilized in catadioptric systems
with a variety of constructions.
[0041] In some embodiments at least two transparent optical
materials are used for the lenses to support chromatic correction,
particularly correction of chromatic variation of Petzval
curvature. In those embodiments the plurality of lenses includes
lenses made from different materials having different Abbe numbers.
The Abbe number .nu. for a material having a refractive index n
(dependent on the wavelength .lamda.) may be generally defined as
follows:
v = n - 1 n .lamda. 1 - n .lamda. 2 , ( 9 ) ##EQU00007##
where .lamda..sub.1 and .lamda..sub.2>.lamda..sub.1 are
different wavelengths that determine the bandwidth for the
calculation of the Abbe number, n is the index of refraction at a
wavelength .lamda. between .lamda..sub.2 and .lamda..sub.1 and
n.sub..lamda.1, n.sub..lamda.2 are the refractive indices for
.lamda..sub.1 and .lamda..sub.2, respectively. The Abbe number is
sometimes referred to as "reciprocal relative dispersion"
indicating that, in general, relatively high Abbe numbers
correspond to materials having relatively low dispersion and vice
versa, where the dispersion of a material is the rate of change of
the index of refraction with respect to wavelength, that is
dn/d.lamda..
[0042] Classical theory of correction of chromatic aberrations in
refractive optical systems teaches that at least two different
optical materials having different dispersion (or Abbe number) need
to be combined to correct axial chromatic aberration for two or
more different wavelengths in a wavelength band. Conventionally, an
optical system in which two wavelengths are brought to a common
focus is called an "achromat". An optical system in which three
wavelengths are brought to a common focus is usually called an
"apochromat". The term "superapochromat" may be used to denote
optical systems in which four or more wavelengths are brought into
a common focus.
[0043] While correction of axial chromatic aberration (AX) may be
considered as a prerequisite for obtaining a chromatically
corrected objective, the correction of AX alone is not a sufficient
condition to obtain a useful image in an extended image field
region where a broadband radiation source is used. Instead,
additional measures are required to address the correction of
chromatic variation of image field curvature, which will now be
explained in further detail.
[0044] For all optical systems employing a plurality of different
materials having different Abbe numbers a "median Abbe number" may
be defined. The "median Abbe number" may be determined in analogy
to statistics as a number dividing a higher half of sample from a
lower half. The median of a finite list of numbers can be found by
arranging all the numbers of the finite list from the lowest value
to the highest value and picking the middle one of the elements
which determines the median value. If there is an even number of
numbers on the list, the median is defined, for the purpose of this
application, as the mean value of the two middle values. For
example, if 60% of all the lenses of the plurality of lenses are
made from one and the same first material, and 40% are made from
the second material, then the median Abbe number is the Abbe number
of the first material.
[0045] At least one of the plurality of lenses may be a first lens
made from a first material having a first Abbe number equal to or
greater than the median Abbe number and at least one of the
plurality of lenses may be made from a second material having an
Abbe number smaller than the median Abbe number. For the purpose of
this application, the first material (having the relatively greater
Abbe number, generally corresponding to a relatively smaller
dispersion) will be denoted as "relative crown material" or simply
"crown material", whereas the second material having the relatively
smaller Abbe number (generally corresponding to relatively higher
dispersion) will be denoted as "relative flint material" or,
simply, "flint material".
[0046] In some embodiments, more than 50% of all the lenses are
made from a first material and less than 50% are made from a second
material. In some embodiments, less than 30% of all the lenses or
less than 20% of all the lenses are made from a second (relatively
high dispersion) material.
[0047] In some embodiments, more than 50% of all the lenses are
made from a second material and less than 50% are made from a first
material.
[0048] It has been found useful for the correction of chromatic
variation of the image field curvature if at least one second lens
(made from the second material) is a negative lens. With other
words: at least one lens made from a relative flint material
combined with lenses made of relative crown material may be a
powerful refractive means to correct chromatic aberration of image
field curvature.
[0049] It may be preferable that the negative lens has relatively
strong refractive power. Therefore, although the negative lens may
be designed as a meniscus lens, in some embodiments the negative
lens is a biconcave negative lens. The negative lens may be a
plano-concave lens.
[0050] Unlike negative lenses which are primarily provided to
support correction of axial chromatic aberration (AX) a negative
lens dedicated to support correction of chromatic variation of
image field curvature should be relatively small in diameter, e.g.
when compared to adjacent lenses. The negative lens may have an
optically free diameter substantially smaller than an optically
free diameter of at least one lens directly adjacent to the
negative lens. For example, the negative lens may be arranged
between two adjacent lenses, where each of the two adjacent lenses
has an optically free diameter substantially larger than the
optically free diameter of the negative lens, e.g. by at least 10%
or at least 20%. In some embodiments, the negative lens has an
optically free diameter which is less than 80% of an optically free
diameter of a largest lens (lens having the largest optically free
diameter) of the objective. The optically free diameter of the
negative lens may be less than 70% and/or less than 60% and/or less
than 50% of the optically free diameter of the largest lens of the
objective.
[0051] The negative lens may be arranged in a region of relatively
low marginal ray height. This allows designing the negative lens
with relatively strong negative refractive power while at the same
time the contribution of the negative lens to the overall
refractive power of the objective may be kept relatively small such
that it is not necessary to provide high power positive lenses to
compensate the dispersive effect of the negative lens. In some
embodiments the objective includes at least one waist region where
a beam diameter of a radiation beam passing through the objective
has a local minimum and the negative lens is positioned in the
waist region.
[0052] A negative lens as mentioned above may also be positioned
close to a field surface of the objective, such as the object
surface or the image surface. In embodiments having one or more
real intermediate images, a negative lens may be positioned close
to the intermediate image.
[0053] Although one single negative lens made of relative flint
material may be sufficient to correct chromatic variation of the
image field curvature in some embodiments, other embodiments have
at least two negative lenses of the second material. More than two
negative lenses of a second material may be provided if desired.
The negative lenses may be made from the same or different relative
flint materials.
[0054] In some embodiments most of the lenses are made of fused
silica (SiO.sub.2) which is essentially free of absorption down to
ultraviolet wavelength of about 190 nm and may be manufactured at
moderate costs with established processes.
[0055] Fused silica may be combined with different materials. For
example, in some embodiments lenses of fused silica are combined
with lenses made of one or more materials having a larger relative
dispersion than fused silica. In these combinations, fused silica
lenses are made from "relative crown material", whereas the other
lenses are made from "relative flint material". In theses
combinations, special optical glasses such as FK5, LF5 or LLF1
(sold by SCHOTT, Mainz, Germany) or comparable glasses with similar
optical properties provided by other manufacturers, such as OHARA,
may be used as relative flint material. In other material
combinations fused silica may be the relative flint material,
having a relatively higher dispersion than other lenses of the
objective. For example, fused silica lenses may be combined with
lenses made of calcium fluoride, for example in embodiments of
objectives designed for 193 nm operating wavelength. In this
material combination, calcium fluoride functions as the relative
crown material.
[0056] In some embodiments, the objective includes at least one
convex mirror in addition to the at least one concave mirror such
that the objective includes at least two curved mirrors having
opposite sense of curvature of the reflective surfaces. A convex
mirror has negative optical power like a diverging (negative) lens,
but no dispersion. The contribution of the convex mirror to Petzval
sum only depends on the radius of curvature of the curved mirror.
The contribution to Petzval sum of convex mirror has opposite sign
than the contribution of a concave mirror.
[0057] If at least one convex mirror is provided in addition to at
least one concave mirror, the choice for the materials or material
used for the refractive optical elements may be simplified since a
mix of materials with different Abbe numbers may no longer be
required to obtain sufficient chromatic correction, particularly
correction of chromatic variation of image field curvature (Petzval
sum) In some embodiments, at least 90% of the plurality of lenses
or all of the plurality of lenses are made from one or plurality of
materials having essentially the same Abbe number. A difference in
Abbe number may be less than 20%, for example. In some embodiments,
all lenses of the plurality of lenses are made from the same
material. The same material may be fused silica (SiO.sub.2),
calcium fluoride (CaF.sub.2) or a common crown glass like BK7, or
FK5 or glasses with similar optical properties.
[0058] If only one optical material is used for all lenses of an
objective (one-material system) the manufacturer of the objective
is less dependent on exact specifications for material properties
such as dispersion or partial dispersion of different glass types.
For example, if the dispersion or partial dispersion of the one
material used for all lenses of an optical system varies due to
charge fluctuations, theses variations are basically the same for
all used optical elements and thus may be relatively easily be
compensated for by relatively simple adjustments. Such
compensations may generally be more difficult if more than one
material is used, where the optical properties of each of the used
materials may fluctuate due to charge fluctuations in a different
way no longer allowing compensation with relatively simple
adjustments.
[0059] The Petzval sum of a catadioptric system, characterizing the
image field curvature, is a sum of the Petzval sum of all dioptric
(refractive) and of all catoptric (reflective) system members. As
can be seen from equation (3c), the variation of Petzval sum with
wavelength for the dioptric lenses depends on the dispersion
dn/d.lamda. of the used lens material. However, as can be seen from
equation (3a) the Petzval sum of the catoptric system elements does
not change with wavelength (assuming that the surrounding medium,
in general air or other gas does not show dispersion) therefore,
the total change of the Petzval sum with wavelength is given by the
dioptric contribution to the Petzval sum. Where it is desired to
correct the chromatic variation of image field curvature in an
optical system having only one material or materials having very
similar Abbe numbers it is preferred that the Petzval sum of all
dioptric components is substantially 0 or obtains a very small
value, so that it does not change significantly with
wavelength.
[0060] Where it is desired to have a sufficient correction of the
overall Petzval sum of the objective across a relatively large
field size it is then required that the total Petzval sum vanishes,
and thus the contribution to Petzval sum of all reflective
components should also be essentially zero. This may be achieved by
providing that each of the concave mirror and the at least one
convex mirror has a base curvature (i.e. the curvature of the
reflective surface at the vertex of the mirror, also denoted vertex
curvature) and wherein a sum of the base curvatures of all curved
mirrors is substantially zero. One or more convex mirrors may be
provided.
[0061] The previous and other properties can be seen not only in
the claims but also in the description and the drawings, wherein
individual characteristics may be used either alone or in
sub-combinations as an embodiment of the invention and in other
areas and may individually represent advantageous and patentable
embodiments.
BRIEF DESCRIPTION OF THE DRAWINGS
[0062] FIG. 1 shows a schematic drawing of an embodiment of a
projection exposure apparatus for microlithography having an
illumination system and a projection objective;
[0063] FIG. 2 shows a schematic drawing of a projection exposure
apparatus with a mercury vapor radiation source and a chromatically
corrected projection objective in FIG. 2A, different radiation
spectra in FIGS. 2B and 2C, and an illustration related to the
image field size and shape in FIG. 2D.
[0064] FIG. 3 shows a first embodiment of a catadioptric projection
objective in FIG. 3A and diagrams representing optical properties
of the embodiment in FIGS. 3B and 3C;
[0065] FIG. 4 shows a second embodiment of a catadioptric
projection objective in FIG. 4A and a diagram representing optical
properties of the embodiment in FIG. 4B;
[0066] FIG. 5 shows a third embodiment of a catadioptric projection
objective in FIG. 5A and diagrams representing optical properties
of the embodiment in FIGS. 5B, 5C and 5D;
[0067] FIG. 6 shows a fourth embodiment of a catadioptric
projection objective in FIG. 6A and diagrams representing optical
properties of the embodiment in FIGS. 6B, 6C, 6D and 6E;
[0068] FIG. 7 shows a fifth embodiment of a catadioptric projection
objective in FIG. 7A and diagrams representing optical properties
of the embodiment in FIGS. 7B, 7C and 7D;
[0069] FIG. 8 shows a sixth embodiment of a catadioptric projection
objective in FIG. 8A and diagrams representing optical properties
of the embodiment in FIGS. 8B, 8C and 8D;
[0070] FIG. 9 shows a seventh embodiment of a catadioptric
projection objective in FIG. 9A and diagrams representing optical
properties of the embodiment in FIGS. 9B, 9C and 9D;
[0071] FIG. 10 shows an eighth embodiment of a catadioptric
projection objective in FIG. 10A and diagrams representing optical
properties of the embodiment in FIGS. 10B, 100, 10D and 10E;
[0072] FIG. 11 shows a ninth embodiment of a catadioptric
projection objective in FIG. 11A and diagrams representing optical
properties of the embodiment in FIGS. 11B and 11C;
[0073] FIG. 12 shows three variants, in FIG. 12A-12C, of the
projection objective shown in FIG. 11A;
[0074] FIG. 13 shows a tenth embodiment of a catadioptric
projection objective in FIG. 13A and a diagram representing optical
properties of the embodiment in FIG. 13B;
[0075] FIG. 14 shows two variants, in FIGS. 14A and 14B, of the
projection objective in FIG. 13A; and
[0076] FIG. 15 shows a microscope objective according to an
embodiment.
DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
[0077] In the following description of preferred embodiments, the
term "optical axis" refers to a straight line or a sequence of a
straight-line segments passing through the centers of curvature of
optical elements. The optical axis can be folded by folding mirrors
(deflecting mirrors) such that angles are included between
subsequent straight-line segments of the optical axis. In the
examples presented below, the object is a mask (reticle) bearing
the pattern of a layer of an integrated circuit or some other
pattern, for example, a grating pattern. The image of the object is
projected onto a wafer serving as a substrate that is coated with a
layer of photoresist, although other types of substrates, such as
components of liquid-crystal displays or substrates for optical
gratings, are also feasible.
[0078] Where tables are provided to disclose the specification of a
design shown in a figure, the table or tables are designated by the
same numbers as the respective figures. Corresponding features in
the figures are designated with like or identical reference
identifications to facilitate understanding. Where lenses are
designated, an identification L3-2 denotes the second lens in the
third objective part (when viewed in the radiation propagation
direction).
[0079] FIG. 1 schematically shows a microlithography projection
exposure apparatus in the form of a wafer scanner WS set up for
producing specific layers of large-scale integrated semiconductor
components and permits exposures with a resolution capability of
down to R=180 nm or lower depending on the setting. A primary
radiation source S of the exposure apparatus includes a high power
mercury-arc lamp emitting ultraviolet radiation in a wavelength
band including the mercury g-line at about 436 nm, the mercury
h-line at about 405 nm and the mercury i-line at about 365 nm
(compare FIG. 2). In some embodiments, radiation intensity from
each of the three mercury lines is used for exposure such that the
optical systems downstream of the primary radiation source must be
configured to operate properly with different wavelengths from a
broad wavelength band having a wavelength difference .DELTA..lamda.
of about 70 nm (or more) between the shortest wavelength (i-line)
and the largest wavelength (g-line).
[0080] A downstream illumination system ILL receives the light from
the primary radiation source S and generates, in its exit plane EX,
a large, sharply delimited, homogeneously illuminated illumination
field that is adapted to the telecentricity requirements of the
projection objective PO and is centered about the optical axis
OA.sub.I of the illumination system. The illumination system ILL
has devices for setting the illumination mode and, in the example,
can be changed over between conventional illumination with a
variable degree of coherence, annular illumination and dipole or
quadrupole illumination.
[0081] Arranged between the exit-side last optical element of the
illumination system and the entrance of the projection objective is
a device RS for holding and manipulating a mask M such that a
pattern--arranged on the mask--of a specific layer of the
semiconductor component to be produced lies in the object plane OS
of the projection objective, said object plane coinciding with the
exit plane EX of the illumination system. The optical axis OA.sub.I
of the illumination system and the optical axis OA of the
projection objective PO are laterally offset relative to one
another in order to produce an off-axis field in relation to the
optical axis OA of the projection objective. The device RS--usually
referred to as "reticle stage"--for holding and manipulating the
mask contains a scanner drive enabling the mask to be moved
parallel to the object surface OS of the projection objective or
perpendicular to the optical axis of projection objective and
illumination system in a scanning direction (y-direction).
[0082] The projection objective PO follows in the radiation path
downstream of the plane EX, also designated as mask plane. The
projection objective may be a reducing objective set up for imaging
a demagnified image of the structure borne by the mask on a reduced
scale, for example on a scale of 4:1 or 5:1 or 10:1, onto a wafer W
coated with a photoresist layer. The projection objective may be a
unit magnification (1:1) system. The wafer W serving as a
light-sensitive substrate is arranged in such a way that its planar
substrate surface coincides with the planar image surface (image
plane) IS of the projection objective PO. The wafer is held by a
device WST (wafer stage) comprising a scanner drive in order to
move the wafer synchronously with the mask M in a fashion parallel
to the latter.
[0083] The projection objective PO has a last optical element LOE
as last, transparent optical component nearest the image surface
IS. The exit surface of the last optical element is the last
optical surface of the projection objective, being arranged at a
working distance of a few millimetres above the substrate surface
of the wafer in such a way that there is a gas-filled gap situated
between the exit surface of the projection objective and the
substrate surface (dry system). In other embodiments an immersion
system is used where the working distance between the last optical
element LOE and the wafer is filled with an immersion liquid (e.g.
water). The last optical element LOE may be a plano-convex lens,
providing a planar exit surface. In some embodiments, the last
optical element may be formed by a plane parallel plate, equally
providing a planar exit surface of the projection objective. The
exit surface of the projection objective may also be curved. Such
curved exit surface may be provided by a last optical element
formed like a biconvex lens, for example. In some embodiments the
last optical surface (exit surface of the projection objective) may
be concave.
[0084] The projection objective PO may be designed as a reducing
objective or as a 1:1 objective. The objective has, in addition to
a plurality of schematically indicated lenses (typical numbers of
lenses are often more than 10 or more than 15 lenses) and, if
appropriate, other transparent optical components, a (at least one)
concave mirror CM, which in the case of the example is arranged in
proximity to a pupil surface of the projection objective. For many
applications in the field of microlithograpy the image-side
numerical aperture of the projection objective is NA>0.6, and in
many embodiments NA is between approximately NA=0.65 and NA=0.85.
As a result, typical resolutions of down to R=180 nm or below are
possible at the operating wavelength predefined by the radiation
source S. Typical resolutions down to about 150 nm, or 130 nm, or
100 nm, or 90 nm or less are also possible basically depending on
the combination of image-side NA and the wavelength of the
radiation source.
[0085] In order for the projection objective to function properly
at a given wavelength or a given plurality of wavelengths within a
desired wavelength band the projection objective must be configured
to allow an exposure of substrates utilizing light from the
wavelength band for which the projection objective is designed.
This wavelength band may be denoted as "design wavelength band" and
denotes a range of wavelengths including those wavelengths for
which the optical performance of the projection objective is
sufficiently good to allow diffraction limited imaging with
relatively low aberration level. For example, where the
configuration of the projection objective is such that the design
wavelength band includes mercury g-, h- and i-lines, the projection
objective may be used in conjunction with a high power mercury-arc
lamp as a light source of the projection exposure apparatus.
Therefore, a projection objective configured for use with a
mercury-arc lamp should be optimized for at least one of the
mercury lines at about 365 nm (i-line), about 405 nm (h-line) and
about 436 nm (g-line), whereas the optical performance may
deteriorate significantly outside the design wavelength band.
Typically, a projection objective exclusively optimized for a
design wavelength band including mercury g-, h- and i-lines cannot
be properly operated for exposure at significantly smaller
wavelength, such as in the deep ultraviolet (DUV) region with
wavelengths smaller than about 260 nm and/or in the visible
wavelength range, e.g. at wavelengths larger than about 500 nm.
[0086] A projection objective may be designed such that a useful
image is formed for only one wavelength in a relatively narrow
wavelength band. Embodiments described in this application are
corrected to operate at two or more wavelengths spaced apart by a
wavelength difference .DELTA..lamda.. The wavelength difference may
be about 50 pm (50 picometers) or more, or 100 pm or more, or 1 nm
(1 nanometer) or more, 2 nm or more, for example. The wavelength
difference may be up to several tens of nanometers or more, for
example according to the condition .DELTA..lamda.<0.25 .mu.m.
The exemplary embodiment of FIG. 2 is chromatically corrected for
three wavelengths essentially corresponding to the wavelength of
the mercury g-, h- and i-lines, which corresponds to a wavelength
difference .DELTA..lamda. of more than 70 nm. In such case all
mercury lines can be used for exposure, whereby a larger fraction
of the output power of the primary radiation source can be utilized
for the exposure, thereby allowing a higher throughput of exposed
substrates per time unit.
[0087] As outlined above, every optical imaging system designed to
provide an image in an image field region has associated with it a
sort of basic field curvature, conventionally denoted as Petzval
curvature. The Petzval curvature is proportional to the Petzval sum
1/R.sub.P, which is the reciprocal of the Petzval radius R.sub.P,
which is the radius of curvature of the Petzval surface. Where the
optical system includes refractive optical elements, such as lenses
L1, L2, the image field curvature may be different for different
wavelengths, which effect is denoted here as "chromatic variation
of image field curvature". With other words: the objective forms a
first image of a pattern in a first Petzval surface PS1 at a first
wavelength .lamda..sub.1 of a wavelength band, and a second image
of the pattern in the second Petzval surface PS2 at a second
wavelength .lamda..sub.2>.lamda..sub.1, where the first and
second Petzval surface do not coincide. This situation is shown
schematically in FIG. 2A, where projection objective PO generates a
first Petzval surface PS1 for .lamda.=365 nm (I-line), a second
Petzval surface PS2 for .lamda.=436 nm (g-line) and a third Petzval
surface PS3 for .lamda.=405 nm (h-line). In the exemplary
embodiment the design of the projection objective is configured
such that the Petzval surface of the intermediate wavelength
.lamda.=405 nm is essentially planar and coincides with the planar
image surface IS of the projection objective (where the planar
radiation entry side of the substrate is arranged in a lithographic
process). Under these conditions, the Petzval surface PS1 for the
relatively shorter wavelength (i-line) is curved inwardly (concave
towards the projection objective, i.e. undercorrected), whereas the
Petzval surface PS2 of the greater wavelength (g-line) has the
opposite sense of curvature.
[0088] In the exemplary system of FIG. 2A, the Petzval surfaces of
all three wavelengths essentially coincide with the axial position
of the image surface IS on the optical axis OA. This corresponds to
a correction status where the axial chromatic aberration (AX) is
essentially corrected for each of the three wavelengths. Objectives
of this type are sometimes referred to as systems having three
common focii in the design wavelength band, or as apochromatic
systems. However, the situation is different for field points at
the outer edges of the effective image field IF corresponding to
field points having a maximum image field height y'. Due to the
bending of the Petzval surfaces, a longitudinal departure p (also
denoted as sag) of the Petzval surface (measured parallel to the
optical axis) for each of the largest and smallest wavelength is
given at the edge field point. The longitudinal departure p
effectively corresponds to a defocus at the outer edge of the image
field IF from the planar image surface IS, which is a reference
surface extending perpendicular to the optical axis in the image
space. The magnitude of the departure p is given in equation (4)
above. It may be seen qualitatively from FIG. 2A that such
longitudinal departure may cause the image quality to deteriorate
in regions close to the outer edges of an extended image field
since the Petzval surfaces of different wavelength no longer
coincide. A significant loss of contrast or a blurred image may
therefore result in regions further a part from the optical axis,
which effect becomes worse the larger image field size
(characterized by the maximum image field height Y') becomes. On
the other hand, if the chromatic variation of the image field
curvature is actively controlled by appropriate technical measures
within the projection objective, an image with sufficient quality
in the entire image field IF may be obtained. Embodiments may be
optimized in this regard by providing that the longitudinal
departure p between the relevant Petzval surfaces corresponding to
the wavelength used in the projection radiation is less than the
Rayleigh unit RU=.lamda./NA.sup.2 for all field points in the image
field IF. Specifically, where all relevant Petzval surfaces lie
within the region of the depth of focus DOF (which is proportional
to RU) the image quality will normally be sufficient for all field
points in the image field IF to allow diffraction limited
exposure.
[0089] Note that FIG. 2A is purely schematic and not to scale for
any of the features discussed in connection with FIG. 2A.
[0090] The meaning of some of the terms used in this application,
such as the term "wavelength difference .DELTA..lamda." and
"maximum image field height y'" will now be explained in more
detail in connection with FIGS. 2B, 2C and 2D. FIG. 2B shows
schematically the dependence of the intensity I of radiation source
on the wavelength .lamda. in a region where three defined spectral
lines occur within the spectrum. The three spectral lines may
correspond to the mercury g-, h- and i-lines, for example. The
spectral line arranged at the lower end of the spectrum in the
example has the maximum value I.sub.MAX of intensity of the
considered spectral range. In order to define the corresponding
wavelength difference .DELTA..lamda. the lower limit of the
spectral band, i.e. the first wavelength .lamda..sub.1, may be
defined as the wavelength where the intensity first exceeds a lower
intensity limit I.sub.L when coming from the smaller wavelength,
and the upper limit of the wavelength band may be defined as the
second wavelength .lamda..sub.2 where the intensity falls below the
lower limit I.sub.L at wavelength larger than the wavelength
corresponding to the spectral line on the upper end of the group of
spectral lines. The lower limit of intensity, I.sub.L may be
selected such that the condition I.sub.L=0.1 I.sub.MAX is
fulfilled. In the case of the mercury g-, h- and I-lines the
wavelength difference .DELTA..lamda. is larger than 70 nm according
to this definition. It might be useful to block other spectral
lines around the considered wavelength band with appropriate
filters or other means.
[0091] A similar definition of the wavelength difference
.DELTA..lamda. may be applied in a wavelength region including only
one spectral line, as schematically illustrated in FIG. 2C. The
single spectral line may be the mercury i-line, for example. Where
a laser radiation source is used, the wavelength of the maximum
value of intensity, I.sub.MAX, of the single spectral line may
correspond to the nominal operating wavelength of the laser
radiation source such, as about 193 nm for a ArF laser, for
example. It is evident that a corresponding value for the
wavelength difference .DELTA..lamda. becomes smaller where the
radiation source is provided with specific means to narrow the
natural bandwidth of the radiation source. For example, in case of
using a mercury i-line, interference filters or the like may be
used to narrow the natural band width of the mercury i-line. In the
case of laser radiation sources, band width narrowing apparatus
with relatively complex structure may be used to narrow the natural
bandwidth of the laser.
[0092] Conditions on the image-side of the objective are now
explained in connection with FIG. 2D. In embodiments of objectives
intended to be used in a microlithographic process, a relatively
large image field size is generally desired. For the purpose of
this application the image field size may be characterized by a
maximum image field height y', which corresponds to the radius of
the (circular) "design image field" of the objective. The design
image field IF.sub.D includes all field points of the image surface
for which the imaging fidelity of the objective is sufficiently
good for the intended lithographic process. With other words: all
imaging aberrations are corrected sufficiently for the intended
application within zones having radial coordinates equal to or
smaller than the maximum image field height y', whereas one or more
aberrations may be higher than a required threshold value for field
points outside the design image field IF.sub.D.
[0093] In general, not all field points within the design image
field IF.sub.D are used for a lithographic process. Instead,
exposure is only performed using field points lying within an
effective image field IF, which should be sufficiently large in
size to allow reasonably sized substrates to be exposed in a
lithographic process. In many projection exposure systems,
particularly those designed for a scanning operation, a slit-shaped
effective image field IF is used and a pattern to be imaged as well
as the substrate to be exposed are synchronously moved parallel to
a scanning direction during a projecting step, the scanning
direction corresponding to the y direction in the embodiment of
FIG. 1. FIG. 2D shows three examples of effective image fields IF1,
IF2 and IF3 which may be utilized in connection with embodiments of
catadioptric projection objectives as discussed here. The size of
an effective image field may generally be described in terms of a
length A parallel to the scanning direction and a width B>A
perpendicular to the scanning direction, thereby defining an aspect
ratio AR=B/A>1. In many embodiments the aspect ratio may be in
the range from 2:1 to 10:1, for example.
[0094] The effective image field must fit into the design image
field IF.sub.D in order to include only field points for which the
objective is sufficiently corrected and for which no vignetting
occurs. There are various ways to fit an effective image field into
a design image field depending on the design of a catadioptric
objective. In some embodiments an on-axis image field (image field
centred about the optical axis) may be used. Centred image fields
may be used for example in systems having a central pupil
obscuration (compare FIG. 4 or 11, for example) or in systems
having a physical beam splitter. Third effective image field IF3
having length A3 and width B3 is one example of a centred effective
image field fitting into the design image field IF.sub.D. In some
embodiments an effective image field having all field points
outside the optical axis (so-called off-axis field) must be used in
order to avoid vignetting. First effective image field IF1 is an
example of a rectangular off-axis effective image field having
length A1 and width B1. In some embodiments, effective image fields
with an arcuate shape (sometimes noted as annular field or ring
field) such as second effective image field IF2 are used. Note that
the first and second effective image fields, both situated entirely
outside of and at a radial distance from the optical axis OA, have
same length A1, A2 and width B1, B2, respectively. It is evident
from FIG. 2D that the useful dimensions of an effective image field
used for an exposure process may be larger the larger the maximum
image field height Y' (also denoted as image field semidiameter)
is.
[0095] A number of embodiments capable of obtaining relatively
small values for the chromatic variation of the Petzval sum will
now be described in detail.
[0096] FIG. 3 shows a first embodiment of a catadioptric projection
objective 300 designed for primary UV radiation including three
mercury lines at about 365 nm (i-line), about 405 nm (h-line) and
about 436 nm (g-line), i.e. an operating wavelength band with
wavelengths spaced apart by at least a wavelength difference
.DELTA..lamda.=71 nm. Given a demagnifying imaging scale of 4:1
(.beta.=-0.25) the projection objective is telecentric on the
object side and on the image side has an image-side numerical
aperture NA=0.5. The image field size is 26 mm by 5.5 mm. The
specification is given in tables 3, 3A.
[0097] Projection objective 300 is designed to project an image of
a pattern on a reticle arranged in the planar object surface OS
(object plane) into the planar image surface IS (image plane) on a
reduced scale, for example, 4:1, while creating exactly two real
intermediate images IMI1, IMI2. The rectangular effective object
field OF and image field IF are off-axis, i.e. entirely outside the
optical axis OA. A first refractive objective part OP1 is designed
for imaging the pattern provided in the object surface into the
first intermediate image IMI1. A second, catadioptric
(refractive/reflective) objective part OP2 images the first
intermediate image IMI1 into the second intermediate image IMI2 at
a magnification close to 1:(-1). A third, refractive objective part
OP3 images the second intermediate image IMI2 onto the image
surface IS with a strong reduction ratio.
[0098] Projection objective 300 is an example of a "concatenated"
projection objective having a plurality of cascaded objective parts
which are each configured as imaging systems and are linked via
intermediate images, the image (intermediate image) generated by a
preceding imaging system in the radiation path serving as object
for the succeeding imaging system in the radiation path. The
succeeding imaging system can generate a further intermediate image
(as in the case of the second objective part OP2) or forms the last
imaging system of the projection objective, which generates the
"final" image field in the image plane of the projection objective
(like the third objective part OP3). Systems of the type shown in
FIG. 3 are sometimes referred to as R-C-R system, where "R" denotes
a refractive imaging system and "C" denotes a catadioptric (or
catoptric) imaging system.
[0099] The path of the chief ray CR of an outer field point of the
off-axis object field OF is drawn bold in FIG. 3 in order to
facilitate following the beam path of the projection beam. For the
purpose of this application, the term "chief ray" (also known as
principal ray) denotes a ray running from an outermost field point
(farthest away from the optical axis) of the effectively used
object field OF to the center of the entrance pupil. Due to the
rotational symmetry of the system the chief ray may be chosen from
an equivalent field point in the meridional plane as shown in the
figures for demonstration purposes. In projection objectives being
essentially telecentric on the object side, the chief ray emanates
from the object surface parallel or at a very small angle with
respect to the optical axis. The imaging process is further
characterized by the trajectory of marginal rays. A "marginal ray"
as used herein is a ray running from an axial object field point
(field point on the optical axis) to the edge of an aperture stop.
That marginal ray may not contribute to image formation due to
vignetting when an off-axis effective object field is used. The
chief ray and marginal ray are chosen to characterize optical
properties of the projection objectives. The radial distance
between such selected rays and the optical axis at a given axial
position are denoted as "chief ray height" (CRH) and "marginal ray
height" (MRH), respectively. In so far as reference is made to a
"marginal ray height" (MRH) or a "chief ray height" (CRH) in this
application, this is taken to mean the paraxial marginal ray height
and the paraxial chief ray height.
[0100] Three mutually conjugated pupil surfaces P1, P2 and P3 are
formed at positions where the chief ray CR intersects the optical
axis. A first pupil surface P1 is formed in the first objective
part between object surface and first intermediate image, a second
pupil surface P2 is formed in the second objective part between
first and second intermediate image, and a third pupil surface P3
is formed in the third objective part between second intermediate
image and the image surface IS.
[0101] The second objective part OP2 includes a single concave
mirror CM situated at the second pupil surface P2. A first planar
folding mirror FM1 is arranged optically close to the first
intermediate image IMI1 at an angle of 45.degree. to the optical
axis OA such that it reflects the radiation coming from the object
surface in the direction of the concave mirror CM. A second folding
mirror FM2, having a planar mirror surface aligned at right angles
to the planar mirror surface of the first folding mirror, reflects
the radiation coming from the concave mirror CM in the direction of
the image surface, which is parallel to the object surface. The
folding mirrors FM1, FM2 are each located in the optical vicinity
of, but at a small distance from the closest intermediate image. A
double pass region where the radiation passes twice in opposite
directions is thereby formed geometrically between the deflecting
mirrors FM1, FM2 and the concave mirror CM. A single positive lens
L2-1 is arranged in the double pass region geometrically close to
the folding mirrors FM1, FM2 and optically close to both the first
and second intermediate images, thereby acting as a positive field
lens. A negative group NG having exactly one negative lens L2-2 is
arranged in a region with large marginal ray height near the
concave mirror and coaxial with the concave mirror such that the
radiation passes twice in opposite directions through the negative
group. No optical element is arranged between the negative group
and the concave mirror.
[0102] As a broadband radiation source is used, the projection
objective should be capable of reducing the chromatic aberrations
to an extent enabling a polychromatic imaging with sufficient
quality in the entire image field for the lithographic application.
For example, it is necessary to correct the primary chromatic
aberrations such as the longitudinal chromatic aberration (AX) and
the chromatic magnification aberration (LAT). The correction of
these chromatic aberrations is largely influenced by selecting
approriate diameters the concave mirror CM and the diverging lens
L2-2 that is passed through twice upstream of the concave mirror
and also the diameters of the lenses in the rear, third objective
part near the image. These are important for the correction of the
longitudinal chromatic aberration. The chromatic magnification
aberration LAT is substantially influenced by the refractive power
distribution of the lenses upstream and downstream of the pupil
positions and by the skilful positioning of the lenses in relation
to the chief ray heights.
[0103] The chromatic overcorrection required in an overall system
having positive refractive power takes place predominantly in the
region of the negative group NG which directly precedes the concave
mirror CM of the second objective part OP2. In the embodiment the
negative group is dimensioned with regard to diameter and
refractive power such that the sum of overcorrecting contributions
to the chromatic correction of axial color essentially balances the
sum of the undercorrecting contributions of the first objective
part OP1, which serves as relay system, and of the refractive third
objective part OP3, which serves as focusing system.
[0104] Options for correcting the chromatic variation of image
field curvature will now be described in detail. The embodiment
includes a single concave mirror CM combined with a negative group
NG (Schupmann achromat) to primarily correct primary chromatic
aberrations such as axial colour (AX) and lateral colour (LAT). A
concave mirror provides an overcorrecting contribution to Petzval
sum, therefore concave mirrors are comparable to negative lenses in
this respect. The dioptric components, such as lenses, contribute
an undercorrecting effect in order to obtain an essentially flat
image. In general, the magnitude of the undercorrecting effect
increases as the wavelength decreases. As outlined above,
reflective components, such as the concave mirror CM, do not
contribute to a variation of image field curvature. Therefore, one
means for effectively reducing a variation of Petzval sum in a
catadioptric objective containing at least one concave mirror is to
provide at least one overcorrecting dioptric (refractive) optical
element made from material having substantially higher dispersion
(smaller Abbe number) than other refractive optical elements in the
objective. In a situation where different wavelengths from a broad
wavelength band are to be used for the imaging such overcorrecting
dioptric element (or elements) made from a relatively high
dispersion material (relative flint material) may contribute in an
overcorrecting fashion to the Petzval sum. Where the magnitude of
dispersion (or Abbe number) and the refractive power of the
overcorrecting element or elements is selected properly, such
overcorrecting element or elements are capable of effectively
reducing a chromatic variation of image field curvature to such a
degree that the imaging performance is no longer limited by the
chromatic variation of the Petzval sum.
[0105] In the embodiment of FIG. 3A all lenses, with the exception
of two relatively small negative lenses L1-7 and L3-3 in the first
and third objective part OP1, OP3, respectively, are made from the
same material, namely synthetic fused silica (SiO.sub.2). The two
relatively small (small diameter) negative lenses L1-7 and L3-3 are
made of a special glass provided by SCHOTT, Mainz, Germany sold
under the designation LLF1. In this material combination, fused
silica is a typical representative of a glass having relatively low
dispersion (relatively high Abbe number, crown glass), while LLF1
is a typical representative of a glass having relatively high
dispersion (relatively low Abbe number, flint glass). Table A below
summarizes some relevant properties, such as refractive index and
Abbe number, for various transparent optical materials (left
column) which may be used to from lenses in optical systems in the
ultraviolet spectrum range (wavelength in top row).
TABLE-US-00001 TABLE A 192.999 193.000 193.001 360.000 365.500
370.000 405.000 436.000 .nu. (Abbe) SILUV 1.560972 1.560970
1.560969 1.475299 1.474477 1.473834 1.469595 1.466705 60.4 CAFUV
1.501396 1.501395 1.501394 1.445430 1.444863 1.444419 1.441484
1.439477 82.0 FK5 1.504780 1.503934 1.503272 1.498902 1.495918 62.2
LF5 1.621262 1.619068 1.617371 1.606590 1.599610 31.2 LLF1 1.580929
1.579164 1.577796 1.569035 1.563301 35.9
[0106] The designation "SILUV" represents fused silica, the
designation "CAFUV" represents calcium fluoride (CaF.sub.2) and the
designations FK5, LF5, and LLF1 represent special optical glasses
sold by SCHOTT, Mainz, Germany. Similar or comparable glasses with
similar optical properties provided by other sources, such as
OHARA, may also be used. While fused silica and calcium fluoride
are essentially free of absorption down to about 193 nm and below,
the special glasses FK5, LF5 and LLF1 are predominantly used for
wavelengths .lamda.>300 nm, particularly for optical systems for
the mercury i-line. The right column lists the Abbe numbers .nu.
for the materials, calculated for the wavelength band including the
mercury g-, h- and i-line according to the following equation:
v = n 405 - 1 n 365.5 - n 436 ( 10 ) ##EQU00008##
where n.sub.405, n.sub.365.5 and n.sub.436 are the refractive
indices of the material at 405 nm, 365 nm and 436 nm, respectively.
It is evident from the Abbe numbers in table A that fused silica is
the relative crown material (.nu.=60.4), whereas LLF1 is the
relative flint material (.nu.=35.9) and that the Abbe number
difference, .DELTA..nu., is relatively large (.DELTA..nu.=24.5).
Since the majority of lenses (20 out of 22 lenses) are made from
fused silica, the median Abbe number corresponds to the Abbe number
of fused silica (.nu.=60.4).
[0107] It has been found useful that the negative lenses of
relatively high dispersion material predominantly dedicated to
correcting chromatic variation of Petzval sum should be relatively
small in diameter and should have relatively large refractive
power. This may be understood as follows. As evident from equations
(3) (3a) (3b) (3d) above, the Petzval sum is a purely geometrical
property determined by the respective radii of curvature of the
optical surfaces within the optical system. The radius of curvature
of a lens or a mirror, however, determines the refractive (or
reflective) optical power of an optical surface. Therefore, a
correlation exists between the radii of curvature and the optical
power. As mentioned above, one or more negative lenses made from a
material with relatively high dispersion have been found to be
effective to correct chromatic variation of Petzval sum. Therefore,
one or more negative lenses made of relative flint material would
be desirable. On the other hand, overall positive optical power is
required for an imaging optical system, such as a projection
objective useful for microlithography, to form an image of an
object. In order to keep the optical system simple, negative
refractive power should be avoided as much as possible within the
objective. A reasonable compromise between those conflicting
requirements may be obtained if the negative refractive power in
high dispersion material (useful for correcting variation of
chromatic variation of Petzval sum) is provided by one or more
negative lenses having relatively small optically free diameter.
Where the optically free diameter of a negative lens is relatively
small, the negative lens may have strong negative refractive power
(relatively small radii of curvature of the optical surface) while
at the same time the contribution to overall refractive power of
the optical system may be kept relatively small due to the fact
that the relatively small negative lens is only effective in a
region of relatively small marginal ray height. With other words:
where a negative lens with strong negative power is provided in a
region of small marginal ray height (corresponding to a relatively
small utilized free diameter of the negative lens), such negative
lens may have a strong impact on the correction of chromatic
variation of Petzval sum, while at the same time an undesirable
influence on the imaging performed by the overall optical system
may be kept relatively small.
[0108] The design of the embodiment in FIG. 3A uses this basic
concept. Negative lens L1-7 having almost flat entry surface and
concave exit surface is placed very close to the first pupil
surface P1 of the first objective part OP1 in a region where the
diameter of the radiation beam forms a local minimum (a so-called
waist) between a group of positive lenses upstream of the waist and
a group of positive lenses downstream of the waist. The optically
free diameter of lens L1-7 is significantly smaller (more than 10%
or more than 20% or more than 30% smaller) than the optically free
diameter of the positive lenses L1-6 upstream and L1-8 downstream
of the negative lens. The optically free diameter of negative lens
L1-7 is less than 50% or even less than 40% of the diameter of the
largest lenses of the optical system, such as biconvex positive
lens L1-4 or negative lens L2-2 forming negative group NG. The
marginal ray height at negative lens L1-7 is only about 25% of the
maximum marginal ray height attained at the concave mirror CM.
Comparable conditions are obeyed for biconcave negative lens L3-3
provided in the third objective part OP3 between the second
intermediate image IMI2 and a third pupil surface P3 in a region of
a small waist in the radiation beam between negative meniscus lens
L3-2 upstream and biconvex positive lens L3-4 downstream of
negative lens L3-3. Each of the lenses upstream and downstream of
the flint material negative lens L3-3 have larger optically free
diameter than the negative lens, and the marginal ray height at the
negative lens is only about 35% of the marginal ray height of the
concave mirror CM.
[0109] Since only a small fraction (less than 10%, namely two out
of twenty-two lenses) are made from a second material with
relatively high dispersion, only a small amount of a second
material is used, which is advantageous in terms of costs and
manufacturing.
[0110] According to the teaching outlined above, an effective
contribution to correction of chromatic variation of Petzval sum
may also be obtained by providing at least one negative lens from
relative flint material in another position with relatively small
marginal ray height, such as optically close to an intermediate
image or optically close to the object or image surface, i.e. in a
manner of a field lens. For example, a small negative lens made
from relative flint material may be placed immediately upstream of
the first intermediate image and/or immediately downstream of the
second intermediate image. Such lenses may be provided
alternatively or in addition to small negative lenses of flint
material at other optical positions within in the optical
system.
[0111] Alternatively, or in addition, the general concept may be
used in such a way that one or more positive lenses made from a
relative crown material (smaller dispersion than the majority of
the other lenses) is provided in a region of relatively small
marginal ray height, such as near a field surface. For example, in
a projection objective having most or all lenses made from fused
silica, a positive lens made from calcium fluoride may be placed
optically near to one of the intermediate images IMI1 or IMI2, for
example. For example, biconvex positive lens L3-1 immediately
downstream of the second intermediate image IMI2 may be made from
calcium fluoride instead of fused silica to support correction of
chromatic variation of image field curvature.
[0112] Some relevant optical properties of the first embodiment in
FIG. 3A are shown in FIGS. 3B and 3C. The diagram of FIG. 3B shows
the chromatic focal shift, i.e. the position of the focal plane
with respect to the reference image plane for different wavelengths
between 360 nm and 440 nm. The curve exhibits three-zero-crossings
at about 380 nm, 405 nm and 428 nm, essentially corresponding to
the mercury i-, h- and g-lines, respectively. With other words: the
optical system of FIG. 3A has three common foci in the wavelength
band including the mercury i-, g- and h-lines indicating that axial
chromatic aberration (AX) is corrected for all mercury lines
(apochromatic system).
[0113] FIG. 3C shows a diagram representing the chromatic variation
of image field curvature, where the abscissa represents the
wavelengths .lamda. and the ordinate represents the longitudinal
departure p of the Petzval surface from an ideal image surface at
an edge field point of the image field at maximum image height y'
in units of the Rayleigh unit RU=.lamda./NA.sup.2. It can be seen
that the rate of change of the longitudinal departure p with
wavelength, dp/d.lamda., is about 0.0085 RU/nm or less over the
entire wavelength band between about 365 nm and about 440 nm. As a
consequence, the Petzval surfaces for all three wavelengths
provided by the mercury arc radiation source are well within the
depths of focus of the optical system from the center of the image
field around the optical axis up to the outer edges of the image
field, thereby allowing high contrast imaging with a broadband
radiation source (compare FIG. 2).
[0114] FIG. 4A shows a second embodiment of a catadioptric
projection objective 400 designed for primary UV radiation
including three mercury lines at about 365 nm (i-line), about 405
nm (h-line) and about 436 nm (g-line), i.e. an operating wavelength
band with wavelengths spaced apart by at least a wavelength
difference .DELTA..lamda.=71 nm. (NA=0.16). The projection
objective is a unit magnification system (imaging scale |.beta.|=1)
with a construction symmetric to a symmetry plane coinciding with
pupil surface P2. The specification is given in Tables 4, 4A.
[0115] Projection objective 400 is designed to project an image of
a pattern from the planar object surface OS to the planar image
surface IS while creating exactly two intermediate images IMI1,
IMI2. An image field centred about the optical axis OA (on-axis
field) is imaged with a central pupil obscuration. A first
refractive part OP1 generates the first intermediate image IMI1
with radiation from the object surface, a second, catadioptric
objective part OP2 creates a second intermediate image IMI2 from
the first intermediate image IMI1, and a refractive third objective
part OP3 generates the final image from the second intermediate
image IMI2 on the planar image surface IS. All optical elements are
aligned along one straight optical axis (in-line system).
[0116] The second objective part includes a first concave mirror
CM1 having a reflective surface facing the object surface and
receiving radiation from the first intermediate image IMI1, and a
second concave mirror CM2 having a reflective surface facing the
image surface and receiving radiation reflected from the first
concave mirror and reflecting such radiation towards the second
intermediate image IMI2. Each of the concave mirrors has a central
bore (hole or aperture) around the optical axis to allow the
radiation coming from the first intermediate image IMI1 to enter
the second objective part and to allow the radiation to exit the
second objective part to from second intermediate image IMI2,
respectively. Both intermediate images are formed in the region of
the bores. A large diameter biconcave negative lens disposed
symmetrically between the first and second concave mirrors CM1, CM2
forms a negative group NG optically close to the concave mirrors.
Thin and essentially powerless meniscus lenses are disposed between
the negative group NG and each of the concave mirrors CM1, CM2.
Those lenses may be omitted in other embodiments.
[0117] A majority of lenses (more than 75%) are made of fused
silica. Eight out of 31 lenses, indicated with hatching in FIG. 4A,
are made from a second material with relatively high dispersion,
namely LLF1.
[0118] Radiation from the object surface is transformed by the
first objective part OP1 to form the first intermediate image, and
then diverges through a negative group NG towards first concave
mirror CM1, which collects radiation and reflects the radiation
beam through the negative group NG towards the second concave
mirror CM2, which converges radiation beam and reflects the
radiation to pass a third time through a negative group NG prior to
forming the second intermediate image IMI2. The radiation is then
re-imaged by third objective part OP3 to form the final image in
the image surface IS. Each of the concave mirrors CM1, CM2 is
positioned optically close, but at the small distance from the
second pupil surface P2 in a region of large marginal ray height.
Negative group NG is positioned exactly in second pupil surface
P2.
[0119] The combined action of the concave mirrors and the negative
group NG in the region of large marginal ray heights close to the
second pupil surface provides a major contribution to correction of
axial chromatic aberration in a manner similar as described above
in connection with the Schupmann achromat (concave mirror CM and
negative group NG) in the first embodiment in FIG. 3A. FIG. 4B
shows the effect on chromatic focal shift indicating that the
projection objective is an apochromatic optical system capable to
be operated at all three wavelength (g-, h- and i-line) of the
mercury lamp.
[0120] Correction of chromatic variation of image field curvature
is primarily effected by the relatively high dispersion lenses L1-8
to L1-11 in first objective part (and symmetry related lenses in
the third objective OP3). These groups of lenses include a
biconcave negative lens L1-10 forming the smallest lens of that
lens groups surrounded by relatively larger lenses of flint
material. The negative lens L1-10 is arranged in a waist region
with local minimum of radiation beam diameter at a position with a
marginal ray height which is only about half of the marginal ray
height in the positive belly upstream of the negative lens and less
than about 30% of the marginal ray height in the region of negative
group NG or the concave mirrors CM1, CM2. Although the group of
relative flint material lenses includes one positive lens L1-9, the
overall refractive power of the group of lenses is negative
allowing to transform a convergent beam provided by lenses upstream
of the group into a diverging beam entering a thick biconvex
positive lens L1-12 downstream of the lens group.
[0121] This exemplary embodiment shows that the general effect
described in connection with the first embodiment may also be
obtained by distributing the desired negative refractive power in
the region of small marginal ray heights over two or more
relatively small lenses with overall negative refractive power.
Another contribution to correcting variation of image field
curvature may be obtained if the negative lens L1-2 in a first
minor waist region close to the object surface OS would be made of
a relatively high dispersion material, such as LLF1 instead of
fused silica:
[0122] The variation of image field curvature with wavelength may
be characterized by dp/d.lamda.=0.0121 RU/nm.
[0123] A third embodiment of catadioptric projection objective 500
having a general layout similar to the projection objective 300 of
FIG. 3A is shown in FIG. 5A. The general design with regard to the
folding of the optical axis with folding mirrors FM1, FM2 and a
catadioptric group with a single concave mirror CM and a negative
group NG immediately in front of the concave mirror and passed
twice by radiation is similar to the embodiment of FIG. 3A,
therefore, reference is made to that corresponding description.
[0124] Projection objective 500 is designed for primary UV
radiation from the very deep ultraviolet (VUV) spectral range at
about 193 nm, which may be provided by a ArF excimer laser
radiation source. Field size is 26 mm*5.5 mm and NA=1.0 in water
immersion.
[0125] In the spectral region below about 200 nm only a few
materials are sufficiently transparent to allow use as lens
material in a projection objective. Specifically, synthetic fused
silica and crystalline alkaline fluoride materials, such as barium
fluoride or calcium fluoride (CaF.sub.2) may be used as lens
materials. A combination of fused silica (lenses without hatching)
and calcium fluoride (lenses with hatching, appearing dark) is used
in the projection objective 500. In this material combination,
fused silica is the relative flint material (having larger
dispersion and smaller Abbe number, and calcium fluoride is the
relative crown material (see table A for general relationship,
absolute values are different at 193 nm).
[0126] As evident from FIG. 5A, the material having the relatively
smaller dispersion (CaF.sub.2) is predominately used in positive
lenses. Specifically positive lenses L1-10 and L1-11 immediately
upstream of the first intermediate image IMI1, positive lens L2-1
close to the intermediate images in the second objective part OP2,
and positive lens L3-1 being the first lens of the third objective
part OP3 following the second intermediate image IMI2 are made of
the relative crown material. On the other hand, the relative flint
material is used in other lenses, including small negative lens
L1-8 in a waist region near the first pupil surface P1 or negative
lenses L3-2 and L3-3 near a waist in the third objective part OP3.
The combined use of relative crown material and relative flint
material contributes to correction of chromatic aberrations to
improve bandwidth. As evident from FIG. 5B, a broad minimum of
axial chromatic aberration is obtained around the central
wavelength 193 nm. A corresponding bandwidth may be determined by
evaluating the relation between the wavefront aberrations and the
wavelength, as schematically shown in the diagram of FIG. 5D, where
the root-mean-square (RMS) value of the wavefront error (in
m.lamda.) is presented as a function of wavelength .lamda.. For the
purpose of this application, a wavefront error less than 10
m.lamda. is considered as defining a useful objective. Under this
condition, each of the wavelength between about 192.91 and 193.09
may be used for forming the image. Defining the wavelength
difference .DELTA..lamda. between the outer limits as the useful
bandwidth, the bandwidth of the system is about .DELTA..lamda.=0.18
nm (about 180 picometers). A value dp/d.lamda.=5.35 RU/nm is
obtained for this embodiment, indicating that partial correction is
obtained for the chromatic variation of image field curvature. This
is basically due the fact that the difference in dispersion of
available materials in VUV region limits the options for correcting
those aberrations with purely dioptric means FIG. 5C shows the
relatively small distortion.
[0127] The embodiments of projection objectives 600, 700, 800 and
900 in FIGS. 6A, 7A, 8A and 9A, respectively, may be used to
demonstrate ways to influence the chromatic properties of
projection objectives by using more than two different materials
having different dispersion. The general layout of the systems is
similar to those in FIGS. 3A and 5A, therefore reference is made to
the corresponding description. The specifications are given in
tables 6, 6A, 7, 7A, 8, 8A and 9, 9A, respectively.
[0128] In the projection objective 600 of FIG. 6A (fourth
embodiment) five different materials (fused silica, calcium
fluoride, FK5, LF5 and LLF1, see table A) are used in combination
to improve chromatic correction. An image-side numerical aperture
NA=0.60 is obtained in an 26 mm*5.5 mm image field. The system is
apochromatic, operating with almost no axial chromatic aberration
for each of the spectral lines of the mercury lamp (see FIG. 6B).
The distortion in the image field (FIG. 6C) and the wavefront error
(FIG. 6D) are well corrected for each of the spectral lines. As
evident from FIG. 6E, image-side telecentricity is well corrected
for the central wavelength .lamda.=405 nm. Deviations from perfect
telecentricity occur for smaller wavelength (about -7.5 mrad for
the i-line) and larger wavelength (about .+-.5 mrad for the
g-line).
[0129] Projection objective 700 (fifth embodiment) may be
understood as a variant of projection objective 600 since the
number, types and distribution of lenses is rather similar to that
embodiment. An image-side numerical aperture NA=0.60 is obtained in
an 26 mm*5.5 mm image field. However, the system is designed to
avoid use of calcium fluoride (which is relatively expensive) and
use of special glass LLF1 to reduce the total number of materials
used, thereby facilitating manufacturing. Consequently, only three
different materials, namely fused silica, FK5 and LF5 are used for
the lenses.
[0130] Apochromatic correction is still obtained (FIG. 7B),
however, some sacrifice is made with respect to correction of
distortion (FIG. 7C) and wavefront aberrations (FIG. 7D).
[0131] Projection objective 800 (sixth embodiment) in FIG. 8A is a
variant providing improved bandwidth, which is enabled by using
five different materials as listed in table A. An image-side
numerical aperture NA=0.60 is obtained in an 26 mm*5.5 mm image
field. The diagram of chromatic focal shift in FIG. 8B shows four
zero-crossings at about 360 nm, 380 nm, 405 nm and 436 nm,
indicating four common foci in the wavelength range covered by the
mercury spectral lines. Distortion is very well corrected (FIG.
8C). A wavefront aberrations significantly smaller than 10 m.lamda.
rms is obtained for all wavelengths between 360 nm and 440 nm
indicating that the projection objective may be modified to form a
superapochromtic projection objective for broadband application
using a continuous spectral range including the mercury g-, h-, and
i-lines.
[0132] Projection objective 900 in FIG. 9A (seventh embodiment) is
optimized for use with the mercury I-line only, but improved with
respect to bandwidth around the central wavelength of the i-line.
An image-side numerical aperture NA=0.80 is obtained in a 26 mm*5.5
mm image field. The projection objective allows to use a mercury
vapour radiation source with reduced complexity of construction
since the expenditure for filtering etc. may be reduced. As
indicated by FIGS. 9C and 9D the optical system provides very good
correction of distortion and wavefront error over a spectral range
with overall bandwidth (wavelength difference between smallest and
largest wavelength) of about 4 nm (365 nm.+-.2 nm). Chromatic
variation of image field curvature may be characterized by
dp/d.lamda.=0.036 RU/nm.
[0133] In each of the embodiments in FIGS. 5 to 9 the first
objective part configured to image the pattern into a first
intermediate image includes a sequence of consecutive lens groups
having alternating refractive powers including a first lens group
with a positive refractive power, a second lens group with negative
refractive power immediately following the first lens group, a
third lens group with positive refractive power immediately
following the second lens group, a fourth lens group with negative
refractive power immediately following the third lens group and a
fourth lens group with positive refractive power immediately
following the fourth lens group such that at least two separate
waist regions are created where a beam diameter of radiation
passing through the first objective part has a local minimum. The
waists are denoted with reference numerals W1 and W2, respectively
in FIG. 9. The waists are generally formed at or near a negative
lens. The double waist structure in the first (relay) objective
part supports Petzval sum correction by refractive means.
[0134] The projection objectives outlined in connection with the
above embodiments each provide good correction of wavefront error
and distortion as well as chromatic aberrations for the wavelength
or wavelengths for which they are designed. Significant
contributions to correction are made by the catadioptric group
(including at least one concave mirror at or near to a pupil and a
negative group close to the concave mirror) and the use of dioptric
materials with different dispersion. No special emphasis was placed
on the correction of the chromatic axial aberration of the pupil
imaging. This aberration may cause a natural (undercorrected)
chromatic variation of the focal length of the projection objective
which, in turn, transforms to a chromatic variation the position of
the entrance and exit pupil and therefore of telecentricity
properties in systems with fixed position of the aperture stop.
This is equivalent to an undercorrection of axial chromatic
aberration for the pupil imaging which may be favourably corrected
for at or close to the pupil positions of the pupil imaging, which
correspond to regions close to the object surface, image surface or
to intermediate image surfaces of the projection objective.
[0135] Projection objective 1000 (eighth embodiment) includes
dioptric means specifically dedicated to correcting the chromatic
axial aberration of the pupil imaging, thereby improving
object-side telecentricity. An image-side numerical aperture
NA=0.60 is obtained in an 26 mm*5.5 mm image field. Projection
objective 1000 includes a first achromatic group AG1 immediately
following the object surface in a region optically close to the
object surface where the chief ray height is larger than the
marginal ray height, and a second achromatic group AG2 optically
close to the first and second intermediate images IMI1 and IMI2,
i.e. optically close to another field surface optically conjugate
to the object surface OS.
[0136] The first achromatic group AG1 includes biconvex positive
lens L1-1 made of calcium fluoride, a negative meniscus lens L1-2
concave on the image-side and made of LF5, and a biconvex positive
lens L1-3 made of fused silica. Achromatic group AG2 is formed by a
biconvex positive lens L2-1 made of calcium fluoride, a negative
meniscus lens L2-2 having a concave surface opposite to the
positive lens L2-1 made of LF5, and a biconvex positive lens L2-3
made of calcium fluoride. LF5 is a relative flint material relative
to both calcium fluoride and fused silica. Therefore, lenses L1-1
and L1-2 may be described as forming a lens doublet with a positive
lens L1-1 made from a relative crown material, arranged directly
adjacent to a negative lens L1-2 made from a relative flint
material thereby creating a chromatic overcorrection of the axial
chromatic aberration of the pupil imaging. Likewise the combination
of lenses L1-2 and L1-3 may be described as a lens doublet having
such relative relation of dispersion and refractive power.
[0137] Similarly, second achromatic group AG2 may be described as
including two pairs of directly adjacent lenses, wherein one of the
lenses is a positive lens from relative crown material, and the
other lens is an negative lens from relative flint material.
[0138] Each of the achromatic groups AG1, AG2 is thereby effective
to reduce the axial chromatic aberration. Due to the positioning of
the achromatic lens groups AG1, AG2 close to field surfaces of
projection objective, the effect is to reduce axial chromatic
aberrations of the pupil imaging, which in turn in reduces
telecentricity errors on the object-side.
[0139] The effects on performance may be taken from FIG. 10B to
FIG. 10E. Axial chromatic aberration in the image surface is
corrected for three wavelengths around the considered mercury
spectral lines. Distortion is minimized for each of the mercury
spectral lines (FIG. 10C). Wavefront correction is significantly
better than 10 nm for each of the spectral lines (FIG. 10D).
Object-side telecentricity is perfect for about 405 nm and has an
absolute value less about than 1.5 mrad for each of the larger
wavelength (436 nm) and shorter wavelength (365 nm). It is evident
from a comparison with FIG. 6E that the achromatic groups AG1 and
AG2 are effective to sufficiently reduce telecentricity errors on
the object-side, thereby allowing to relax specifications for the
exit side telecentricity of the illumination system.
[0140] FIGS. 11 to 14 show embodiments of catadioptric projection
objectives useful for microlithography where all lenses are made
from the same material (so-called one-material systems). In the
embodiments, fused silica is used for all lenses. Correction of
chromatic variation of Petzval sum is obtained by balancing the
contribution of all dioptric components and all reflective
components of the projection objective such that the combined
Petzval sum of all dioptric components (lenses) is substantially 0
and that the combined Petzval sum of all reflective components
(mirrors) is substantially 0. In order to fulfil such requirements
for the reflective components, a convex mirror is provided in
addition to the at least one concave mirror utilized in connection
with negative refractive power to correct a major fraction of axial
and lateral color.
[0141] Projection objective 1100 forming a ninth embodiment is
designed for primary UV radiation including three mercury lines at
about 365 nm (i-line), about 405 nm (h-line) and about 436 nm
(g-line), i.e. an operating wavelength band with wavelengths spaced
apart by at least a wavelength difference .DELTA..lamda.=71 nm.
Given a demagnifying imaging scale of 4:1 (.beta.=-0.25) the
projection objective is telecentric on the object side and on the
image side and has an image-side numerical aperture NA=0.5. The
image field size is 26 mm by 5.5 mm. The specification is given in
tables 11, 11A.
[0142] Projection objective 1100 is designed to project an image of
a pattern on a reticle arranged in the planar object surface OS
(object plane) into the planar image surface IS (image plane) on a
reduced scale, for example, 4:1, while creating exactly two real
intermediate images IMI1, IMI2. The rectangular effective object
field OF and image field IF are off-axis, i.e. entirely outside the
optical axis OA. A first refractive objective part OP1 is designed
for imaging the pattern provided in the object surface into the
first intermediate image IMI1. A second, catadioptric
(refractive/reflective) objective part OP2 images the first
intermediate image IMI1 into the second intermediate image IMI2 at
a magnification close to 1:(-1). A third, catadioptric objective
part OP3 images the second intermediate image IMI2 onto the image
surface IS with a strong reduction ratio.
[0143] The first, purely refractive objective part OP1 has twelve
fused silica lenses forming a refractive single-waist relay system
having a first positive lens group LG1 formed by six immediately
consecutive positive lenses, a second, negative lens group LG2
formed by three immediately consecutive negative lenses, and a
positive lens group LG3 formed by four immediately consecutive
lenses.
[0144] The second objective part OP2 includes a single first
concave mirror CM1 situated close to the second pupil surface P2. A
first planar folding mirror FM1 is arranged optically close to the
first intermediate image IMI1 at an angle of 45.degree. to the
optical axis OA such that it reflects the radiation coming from the
object surface in the direction of the first concave mirror CM1. A
second folding mirror FM2, having a planar mirror surface aligned
at right angles to the planar mirror surface of the first folding
mirror, reflects the radiation coming from the first concave mirror
CM1 in the direction of the image surface, which is parallel to the
object surface. The folding mirrors FM1, FM2 are each located in
the optical vicinity of the closest intermediate image. A double
pass region where the radiation passes twice in opposite directions
is thereby formed geometrically between the deflecting mirrors FM1,
FM2 and the concave mirror CM1. A single positive lens L2-1 is
arranged in the double pass region geometrically close to the
folding mirrors FM1, FM2 and optically close to both the first and
second intermediate images, thereby acting as a positive field
lens. A negative group NG having exactly one negative meniscus lens
L2-2 is arranged in a region with large marginal ray height near
the concave mirror and coaxial with the concave mirror such that
the radiation passes twice in opposite directions through the
negative group. No optical element is arranged between the negative
group and the concave mirror.
[0145] The third objective part OP3 is a catadioptric objective
part including a second concave mirror CM2, a convex mirror CVM and
eight fused silica lenses. Second concave mirror CM2 has a central
hole in the region of the optical axis and a reflecting surface
facing the image surface. Convex mirror CVM has a convex reflecting
surface facing the second concave mirror CM2 and is positioned on
the optical axis on the image-side of second concave mirror CM2.
Radiation coming from second intermediate image IMI2 first passes a
negative-positive lens doublet prior to entering the space between
second concave mirror CM2 and convex mirror CVM through the central
hole in the second concave mirror CM2. Radiation passes a large
negative meniscus lens L3-3 placed directly in front of second
concave mirror CM2 and having the same sense of curvature.
Radiation diverged by negative lens L3-3 is incident on convex
mirror CVM, which has negative optical power, thereby increasing
the divergence angle of the reflected radiation beam directed
towards negative lens L3-3 and second concave mirror CM2. Radiation
passes through negative lens L3-3 a second time and is incident on
concave mirror CM2, which has positive optical power and generates
convergent radiation directed towards the image surface IS.
Radiation reflected by concave mirror CM2 passes negative lens L3-3
a third time and is directed past convex mirror CVM through lenses
L3-4 to L3-8 and a plane parallel plate towards image surface IS.
Second concave mirror CM2 and negative lens L3-3 are positioned
optically close to third pupil surface P3, thereby contributing to
correction of chromatic aberrations in a manner basically similar
to the combination of negative group NG and concave mirror CM1 in
the second objective part OP2. A central pupil obscuration is
generated due to the hole in second concave mirror CM2.
[0146] The radius of curvature of the convex mirror CVM is adapted
to the radii of curvature of the first and second concave mirrors
CM1, CM2 such that the sum of the base curvatures of the curved
mirrors is substantially 0 in the projection objective. As used in
this application, the term "base radius" refers to the radius of
curvature of the curved mirrors at the vertex thereof, i.e. at the
intersection of the optical axis OA with the surface of curvature
defined by the respective reflective surface. The sum of the base
curvatures of the curved mirrors may be exactly zero. However,
small deviations may also be acceptable depending on the
specification. In general, the sum may be considered as being
"substantially zero" if the condition:
|C.sub.M|<2 (9)
is fulfilled. In some embodiments the upper limit may be smaller
such that |C.sub.ML|<1 or |C.sub.ML|<0.5, for example. In
equation (9) parameter L denotes the geometrical distance between
the object surface OS and the image surface (also denoted as track
length) and
C M = Mirrors c i ( 10 ) ##EQU00009##
is the sum of the base curvatures c.sub.i of the curved mirrors in
the projection objective, where convex base curvatures are counted
positive and concave base curvatures are counted negative. In the
embodiment of FIG. 11A, |C.sub.ML|=0.251.
[0147] Some relevant optical properties of the ninth embodiment in
FIG. 11A are shown in FIGS. 11B and 11C. The diagram of FIG. 11B
shows the chromatic focal shift, i.e. the position of the focal
plane with respect to the reference image plane for different
wavelengths between 360 nm and 440 nm. The curve exhibits three
zero-crossings at about 360 nm, 405 nm and 437 nm, essentially
corresponding to the mercury I-, h- and g-lines, respectively.
[0148] FIG. 11C shows a diagram representing the chromatic
variation of image field curvature, where the abscissa represents
the wavelengths .lamda. and the ordinate represents the
longitudinal departure p of the Petzval surface from an ideal image
surface at an edge field point of the image field at maximum image
height y' in units of the Rayleigh unit RU=.lamda./NA.sup.2. It can
be seen that the rate of change of the longitudinal departure p
with wavelength, dp/d.lamda., is about 0.0028 RU/nm over the entire
wavelength band between about 365 nm and about 440 nm.
[0149] FIG. 12 shows schematically three variants of projection
objectives each having two concave mirrors and a single convex
mirror.
[0150] In the schematics, the curved mirrors are represented by
curved lines, lens groups with overall positive refractive power
are represented by double-arrows with arrow-heads pointing
outwardly, and lens groups with overall negative refractive power
are represented by double-arrows with arrow heads pointing
inwardly. Therefore, FIG. 12A basically corresponds to design
having the general layout of ninth embodiment in FIG. 11A (without
negative lens L3-3). In embodiments according to FIG. 12B the first
objective part OP1 is catadioptric, the second objective part OP2
is catadioptric and the third objective part OP3 is dioptric.
(C-C-R configuration) The combination of second concave mirror CM2
and convex mirror CVM is incorporated into the first objective part
OP1, whereas the third objective part is basically a single-waste
refractive objective part with one or more waists providing the
image-side numerical aperture from the numerical aperture present
at the second intermediate image. Note that in these embodiments no
lens is arranged between the second concave mirror CM2 and the
convex mirror CVM. A dioptric lens may be provided between the
convex mirror CVM and the concave mirror CM2, like shown in
embodiment 1100. Likewise, negative lens L3-3 in projection
objective 1100 may be omitted, where desired.
[0151] In the variant of FIG. 12C the combination of second concave
mirror CM2 and convex mirror CVM is incorporated in the
catadioptric second objective part such that convex mirror CVM is
disposed geometrically between the two concave mirrors CM1, CM2. In
this embodiment, the first objective part OP1 and the third
objective part OP3 each are purely refractive (R-C-R
configuration). A dioptric lens may be inserted between CVM and
CM2, if desired.
[0152] Projection objective 1300 (tenth embodiment) is another
example of a projection objective having exactly two intermediate
images, two concave mirrors and one convex mirror and a plurality
of lenses, where all lenses are made of the same material (fused
silica). The first objective part OP1 is purely refractive. Planar
first folding mirror FM1 is positioned inside first objective part
OP1 such that first intermediate image IMI1 is generated optically
behind the first folding mirror FM1. Alternatively, the
intermediate image may be positioned between first folding mirror
FM1 and concave mirror CM1. Catadioptric objective part OP2
includes first concave mirror CM1 at second pupil surface P2, and
negative group NG directly in front of first concave mirror CM1. A
negative field lens L2-1 is arranged optically close to both
intermediate images, a positive lens L2-2 is positioned in an
intermediate region. Third objective part OP3 is catadioptric and
includes second concave mirror CM2 having the mirror surface
concave towards the object-side and convex mirror CVM arranged
geometrically between second folding mirror FM2 and concave mirror
CM2 facing the image surface. A number of lenses is arranged
optically downstream of concave mirror CVM to converge radiation
towards the image surface.
[0153] The projection objective is designed to create an off-axis
image field without pupil obscuration despite the fact that a
mirror group with a convex mirror CVM and a concave mirror CM2 is
integrated into the third objective part. An arc shaped object
field OF and image field are used to avoid vignetting. Radiation
from the object surface forms first intermediate image IMI1, which
is re-imaged to form second intermediate image IMI2 by the second
objective part OP2. Second intermediate image IMI2 is created
geometrically near the outer edge of concave mirror CVM at a small
distance from the edge such that radiation reflected from second
folding mirror FM2 is first directed to concave mirror CM2. Concave
mirror CM2 is formed as a Mangin element by a reflective coating
applied to a convex back face of a transparent substrate L3-1
shaped like a positive meniscus lens passed twice by radiation
impinging on and reflected from second concave mirror CM2.
Radiation reflected from second concave mirror CM2 is incident on
concave mirror CVM, which reflects radiation through a lens portion
of the substrate L3-1 towards a group of lenses arranged
geometrically between concave mirror CM2 and image surface IS. The
convex mirror CM2 may also be realized as an individual mirror with
a lens upstream thereof or as a mirror without adjacent lens
element.
[0154] As evident from FIG. 13B, the system is apochromatic
allowing three common foci at about 371 nm, about 405 nm and about
420 nm within the wavelength band covered by the three mercury
lines. Chromatic variation of image field curvature may be
characterized by dp/d.lamda.=0.0309 RU/nm.
[0155] FIG. 14 shows two variants of catadioptric projection
objectives using an arc shaped field (ring field) to obtain an
image field without vignetting and pupil obscuration in a system
where a mirror group with a convex mirror CVM and a concave mirror
CM2 coaxial with the convex mirror are integrated. In the
embodiment of FIG. 14A the coaxial mirror group CM2, CVM is
incorporated in the third objective part, similar to the embodiment
of FIG. 13A. In the embodiment of FIG. 14B, the mirror group
including coaxial concave mirror CM2 and convex mirror CVM is
incorporated into the first objective part OP1 forming the first
intermediate image IMI2.
[0156] FIG. 15 shows an example of a catadioptric objective 1500
with improved correction of chromatic variation of Petzval sum in
accordance with the teachings outlined above. With an object placed
at infinity (corresponding to a collimated beam entering the
objective from the left hand side) a numerical aperture NA=0.6 is
obtained on the high NA side to the right. When the objective is
used in a microscope, an object to be magnified would be placed in
the image surface IS. The objective includes, from the low NA side
to the high NA side, a catadioptric first objective part OP1
creating first intermediate image IMI1, a second, catoptric (purely
reflective) objective part OP2 creating a second intermediate image
IMI2 from the first intermediate image, and a third, refractive
objective part OP3 re-imaging the second intermediate image IMI2
onto the image surface. All optical elements are aligned along an
unfolded, straight optical axis OA (in-line system). The first
objective part includes, from the object side to the image side, a
first concave mirror CM1 concave towards the image side, a negative
group NG formed by a single negative meniscus lens directly in
front of the concave mirror CM1, a thin meniscus lens L1-2, a
convex mirror CMV having a convex reflective surface facing the
first concave mirror CM1, and lenses L1-3 to L1-6 to converge
radiation towards the first intermediate image IMI1. Second
objective part OP2 is purely reflective (catoptric) and includes
two concave mirrors CM2, CM3 having aspheric reflecting surfaces
facing each other, where each concave mirror has a central hole on
the optical axis to allow radiation to enter and exit the space
included between the concave mirrors. First intermediate image IMI1
is formed in or near the hole in the third concave mirror CM3, and
second intermediate image IMI2 is formed in or near the hole of the
second concave mirror CM2. Purely refractive third objective part
OP3 collimates diverging radiation originating from second
intermediate image IMI2 towards the image surface IS1 when the
objective is transirradiated from the low NA side to the high NA
side.
[0157] Correction of axial chromatic aberration is mainly supported
by the combination of concave mirror CM1 and negative group NG
provided in a region of large marginal ray heights in the first
objective part OP1. A further contribution to overcorrection of the
field curvature is provided by the two concave mirrors CM2, CM3 in
the second objective part OP2. The overcorrection of field
curvature provided by the concave mirrors is compensated by convex
mirror CVM having opposite sign of curvature. Chromatic variation
of image field curvature may be characterized by dp/d.lamda.=0.0003
RU/nm.
[0158] Table B below summarizes the derivative of p with respect to
wavelength 2, dp/d.lamda. (in Rayleigh units (RU) per nanometer
(nm)) for each of the designs in the respective figures together
with other relevant data as explained above.
TABLE-US-00002 TABLE B FIG. 3 4 5 6 7 8 Table 3 4 5 6 7 8 .lamda.
[nm] 405 405 193 405 405 405 .DELTA..lamda. [nm] 71 71 0.18 71 71
71 L [mm] 1500 1000 1500 1500 1500 1500 NA 0.5 0.16 1 0.6 0.6 0.6
y' [mm] 15.5 20 15.5 15.5 15.5 15.5 .lamda./NA.sup.2 [.mu.m] 1.62
15.82 0.19 1.13 1.13 1.13 dp/d.lamda. [RE/nm] 0.0085 0.0121 5.35
0.0081 0.016 0.0019 FIG. 9 10 11 13 15 Table 9 10 11 13 15 .lamda.
[nm] 365.5 405 405 405 405 .DELTA..lamda. [nm] 5 71 71 71 71 L [mm]
1500 1500 1500 1500 247 NA 0.8 0.6 0.5 0.5 0.6 y' [mm] 15.5 15.5
15.5 15.9 0.25 .lamda./NA.sup.2 [.mu.m] 0.57 1.13 1.62 1.62 1.13
dp/d.lamda. [RE/nm] 0.036 0.0092 0.0028 0.0309 0.0003
[0159] Aspects of the invention may be implemented in catadioptric
objectives having different constructions. For example, folded
catadioptric projection objectives having at least one intermediate
image which have one or more planar folding mirrors in combination
with a single catadioptric group designed in the manner of a
"Schupmann achromat" basically as disclosed in U.S. Pat. No.
6,909,492 B2 or US 2004/0160677 A1 or US 2003/0011755 A1 or U.S.
Pat. No. 6,665,126 or EP 1 480 065 may be modified. Folded designs
with more than one catadioptric group designed in the manner of a
"Schupmann achromat" basically as disclosed in WO 2005/040890 my
also be modified. Unfolded projection objectives (in-line systems)
having a concave mirror arranged near the pupil and having a
further concave mirror as shown e.g. in EP 1 069 448 A1 may be
modified. Other in-line systems, in part having four or six concave
mirrors, basically as shown in the U.S. Pat. No. 6,636,350 or U.S.
Pat. No. 6,995,918 may be modified. Those system types can be
utilized in principle, with corresponding adaptation, in the
context of embodiments.
[0160] The above description of the preferred embodiments has been
given by way of example. From the disclosure given, those skilled
in the art will not only understand the present invention and its
attendant advantages, but will also find apparent various changes
and modifications to the structures and methods disclosed. It is
sought, therefore, to cover all changes and modifications as fall
within the spirit and scope of the invention, as defined by the
appended claims, and equivalents thereof.
[0161] The content of all the claims is made part of this
description by reference.
[0162] The following tables summarize specifications of embodiments
described above. In the tables, column 1 specifies the number of a
refractive surface or a reflective surface or a surface
distinguished in some other way, column 2 specifies the radius r
(radius of curvature) of the surface (in mm), column 3 specifies
the distance d--also denoted as thickness--between the surface and
the subsequent surface (in mm), and column 4 specifies the material
of the optical components. Column 5 indicates the refractive index
of the material, and column 6 specifies the optically free radius
or the optically free semidiameter (or the lens height) of a lens
surface or other surfaces (in mm). Radius r=0 corresponds to a
planar surface.
[0163] The table or tables are designated by the same numbers as
the respective figures. A table with additional designation "A"
specifies the corresponding aspheric or other relevant data. The
aspheric surfaces are calculated according to the following
specification:
p(h)=[((1/r)h.sup.2)/(1+SQRT(1-(1+K)(1/r).sup.2h.sup.2))]+C1*h.sup.4+C2*-
h.sup.6+ . . . .
[0164] In this case, the reciprocal (1/r) of the radius specifies
the surface curvature and h specifies the distance between a
surface point and the optical axis (i.e. the ray height).
Consequently, p(h) specifies the so-called sagitta, that is to say
the distance between the surface point and the surface vertex in
the z direction (direction of the optical axis). Constant K is the
conic constant, and parameters, C1, C2 are aspheric constants.
TABLE-US-00003 TABLE 3 NA 0.5 OBH 62 WL 405 365.5 436 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 SEMIDIAM. 0 0.000000
30.999606 62.0 1 442.210327 19.399644 SILUV 1.469595 1.474477
1.466705 66.7 2 -519.098537 133.950194 67.0 3 -115.471793 9.999752
SILUV 1.469595 1.474477 1.466705 66.4 4 620.664725 82.839011 73.7 5
-8114.454958 42.716031 SILUV 1.469595 1.474477 1.466705 103.6 6
-185.432886 0.999576 106.1 7 759.870106 45.909768 SILUV 1.469595
1.474477 1.466705 109.0 8 -223.104448 0.999513 109.0 9 108.556004
44.184151 SILUV 1.469595 1.474477 1.466705 92.3 10 226.758476
0.999571 86.8 11 87.389465 62.916943 SILUV 1.469595 1.474477
1.466705 72.7 12 46.681583 25.937231 37.1 13 -6393.436173 9.999569
LLF1 1.569035 1.579164 1.563301 32.1 14 64.185307 70.096512 26.2 15
-113.365188 45.892870 SILUV 1.469595 1.474477 1.466705 48.5 16
-75.373921 0.998865 59.9 17 204.094038 34.671249 SILUV 1.469595
1.474477 1.466705 65.4 18 -155.351422 54.833584 66.2 19 -500.000000
0.000000 SILUV 1.469595 1.474477 1.466705 56.5 20 -500.000000
90.000000 56.5 21 0.000000 -98.001733 REFL 47.0 22 -1918.979286
-30.000065 SILUV 1.469595 1.474477 1.466705 66.8 23 224.227390
-483.329791 69.4 24 146.188532 -15.000000 SILUV 1.469595 1.474477
1.466705 98.2 25 -3322.789744 -90.200337 114.2 26 303.674356
90.200337 REFL 139.6 27 -3322.789744 15.000000 SILUV 1.469595
1.474477 1.466705 106.1 28 146.188532 483.329791 88.8 29 224.227390
30.000065 SILUV 1.469595 1.474477 1.466705 68.5 30 -1918.979286
98.001733 66.3 31 0.000000 -90.000000 REFL 49.7 32 -500.000000
0.000000 SILUV 1.469595 1.474477 1.466705 56.3 33 -500.000000
-0.999434 56.3 34 -88.613541 -40.063824 SILUV 1.469595 1.474477
1.466705 59.9 35 389.461534 -0.999871 58.2 36 -85.096736 -9.999048
SILUV 1.469595 1.474477 1.466705 52.3 37 -60.357818 -43.175897 46.6
38 151.005116 -9.999800 LLF1 1.569035 1.579164 1.563301 45.2 39
-154.602510 -59.622445 46.3 40 -209.277964 -25.732855 SILUV
1.469595 1.474477 1.466705 63.6 41 -2668.608907 -37.078249 64.7 42
-118.939706 -25.943557 SILUV 1.469595 1.474477 1.466705 68.3 43
-208.205009 -32.287180 65.7 44 184.455133 -14.999433 SILUV 1.469595
1.474477 1.466705 65.3 45 -1666.008680 -3.979634 70.5 46
-1690.411885 -42.649332 SILUV 1.469595 1.474477 1.466705 71.5 47
109.373142 -0.999292 73.7 48 -122.073750 -31.195782 SILUV 1.469595
1.474477 1.466705 68.6 49 -428.173772 5.053196 66.5 50 0.000000
-84.671911 67.8 51 230.712331 -16.783825 SILUV 1.469595 1.474477
1.466705 58.5 52 95.347852 -25.305725 58.5 53 -118.738065
-26.920074 SILUV 1.469595 1.474477 1.466705 49.8 54 -3094.028810
-0.999632 46.4 55 -855.681538 -66.820809 SILUV 1.469595 1.474477
1.466705 43.5 56 0.000000 -6.000000 19.1 57 0.000000 0.000000
15.5
TABLE-US-00004 TABLE 3A Aspheric Constants SRF 3 8 15 17 22 K 0 0 0
0 0 C1 -1.352838E-08 2.450022E-08 5.831651E-07 -2.714687E-07
1.052250E-08 C2 2.806019E-12 5.467657E-14 -1.445186E-10
2.738411E-11 6.694347E-13 C3 7.585058E-17 -3.444541E-19
4.182731E-14 -4.384852E-15 -1.137411E-16 C4 -7.477742E-21
2.901679E-22 -1.166677E-17 6.483077E-19 1.982512E-20 C5
5.612990E-24 -1.706015E-26 2.227669E-21 -6.586345E-23 -1.232921E-24
C6 -4.972510E-28 3.517925E-31 -1.960258E-25 3.070880E-27
-1.927329E-29 SRF 25 27 30 34 41 K 0 0 0 0 0 C1 2.012570E-08
2.012570E-08 1.052250E-08 9.941130E-08 6.010073E-08 C2
-5.271557E-13 -5.271557E-13 6.694347E-13 1.079479E-11 6.526446E-12
C3 1.646217E-17 1.646217E-17 -1.137411E-16 7.576753E-16
4.150062E-16 C4 -1.435199E-22 -1.435199E-22 1.982512E-20
1.878135E-19 -1.474276E-20 C5 -1.610015E-26 -1.610015E-26
-1.232921E-24 -1.529136E-23 -4.873680E-24 C6 5.321668E-31
5.321668E-31 -1.927329E-29 3.782198E-27 6.536434E-28 SRF 44 47 52
54 K 0 0 0 0 C1 3.107676E-07 -3.227235E-08 -5.078522E-07
1.169030E-06 C2 8.839418E-12 -4.524537E-12 3.305415E-11
-2.964829E-10 C3 -1.295508E-15 -7.096715E-16 -1.195130E-14
5.174490E-14 C4 1.086911E-19 -2.046307E-22 1.805728E-18
-5.927366E-18 C5 -1.087279E-22 -1.265102E-23 -2.512187E-22
3.571492E-22 C6 1.276003E-26 1.254945E-27 1.386411E-26
-1.057399E-26
TABLE-US-00005 TABLE 4 NA 0.16 OBH 20 WL 405 365.5 436 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 SEMIDIAM. 0 0.000000
30.000000 20.0 1 0.000000 0.000000 LLF1 1.569035 1.579164 1.563301
24.9 2 0.000000 0.998996 24.9 3 71.505020 17.278950 SILUV 1.469595
1.474477 1.466705 25.8 4 -135.600697 15.835785 25.6 5 -102.466827
10.040269 SILUV 1.469595 1.474477 1.466705 23.8 6 46.804849
23.666744 23.7 7 -30.207629 11.605794 SILUV 1.469595 1.474477
1.466705 25.0 8 -40.037302 1.777476 31.0 9 -48.615984 15.261606
SILUV 1.469595 1.474477 1.466705 32.5 10 -49.955842 1.042998 37.9
11 237.806369 26.314328 SILUV 1.469595 1.474477 1.466705 44.5 12
-92.826530 1.098565 45.8 13 63.699725 24.305861 SILUV 1.469595
1.474477 1.466705 43.6 14 268.334625 31.933675 40.3 15 -78.553440
10.000200 SILUV 1.469595 1.474477 1.466705 31.1 16 -124.449232
10.194899 29.8 17 -67.929099 13.230878 LLF1 1.569035 1.579164
1.563301 27.0 18 -71.976583 1.003059 26.7 19 52.063287 15.522656
LLF1 1.569035 1.579164 1.563301 23.2 20 -2603.360008 6.694216 19.5
21 -52.911743 9.999313 LLF1 1.569035 1.579164 1.563301 16.9 22
141.860863 11.120098 15.6 23 -23.980962 18.719479 LLF1 1.569035
1.579164 1.563301 16.2 24 -32.850592 0.998004 22.4 25 49.471203
29.076524 SILUV 1.469595 1.474477 1.466705 24.6 26 -73.792921
1.012391 22.8 27 -374.091002 10.030736 SILUV 1.469595 1.474477
1.466705 21.5 28 -133.661999 7.972129 19.6 29 -155.779117 11.461812
SILUV 1.469595 1.474477 1.466705 17.5 30 -54.134768 2.490036 16.1
31 0.000000 0.000000 SILUV 1.469595 1.474477 1.466705 14.1 32
0.000000 20.000000 14.1 33 282.108008 40.676565 10.3 34 -390.922222
20.000015 SILUV 1.469595 1.474477 1.466705 22.3 35 -280.977870
42.922714 27.0 36 -211.457624 5.775018 SILUV 1.469595 1.474477
1.466705 40.1 37 0.000000 5.775018 SILUV 1.469595 1.474477 1.466705
42.7 38 211.457624 42.922714 45.5 39 280.977870 20.000015 SILUV
1.469595 1.474477 1.466705 72.4 40 390.922222 40.676565 76.7 41
-282.108008 -40.676565 REFL 86.7 42 390.922222 -20.000015 SILUV
1.469595 1.474477 1.466705 84.2 43 280.977870 -42.922714 83.9 44
211.457624 -5.775018 SILUV 1.469595 1.474477 1.466705 75.8 45
0.000000 -5.775018 SILUV 1.469595 1.474477 1.466705 75.4 46
-211.457624 -42.922714 75.8 47 -280.977870 -20.000015 SILUV
1.469595 1.474477 1.466705 83.9 48 -390.922222 -40.676565 84.2 49
282.108008 40.676565 REFL 86.7 50 -390.922222 20.000015 SILUV
1.469595 1.474477 1.466705 76.7 51 -280.977870 42.922714 72.4 52
-211.457624 5.775018 SILUV 1.469595 1.474477 1.466705 45.5 53
0.000000 5.775018 SILUV 1.469595 1.474477 1.466705 42.7 54
211.457624 42.922714 40.1 55 280.977870 20.000015 SILUV 1.469595
1.474477 1.466705 27.0 56 390.922222 40.676565 22.3 57 -282.108008
20.000000 10.3 58 0.000000 0.000000 SILUV 1.469595 1.474477
1.466705 14.1 59 0.000000 2.490036 14.1 60 54.134768 11.461812
SILUV 1.469595 1.474477 1.466705 16.1 61 155.779117 7.972129 17.5
62 133.661999 10.030736 SILUV 1.469595 1.474477 1.466705 19.6 63
374.091002 1.012391 21.5 64 73.792921 29.076524 SILUV 1.469595
1.474477 1.466705 22.8 65 -49.471203 0.998004 24.6 66 32.850592
18.719479 LLF1 1.569035 1.579164 1.563301 22.4 67 23.980962
11.120098 16.2 68 -141.860863 9.999313 LLF1 1.569035 1.579164
1.563301 15.6 69 52.911743 6.694216 16.9 70 2603.360008 15.522656
LLF1 1.569035 1.579164 1.563301 19.5 71 -52.063287 1.003059 23.2 72
71.976583 13.230878 LLF1 1.569035 1.579164 1.563301 26.7 73
67.929099 10.194899 27.0 74 124.449232 10.000200 SILUV 1.469595
1.474477 1.466705 29.8 75 78.553440 31.933675 31.1 76 -268.334625
24.305861 SILUV 1.469595 1.474477 1.466705 40.3 77 -63.699725
1.098565 43.6 78 92.826530 26.314328 SILUV 1.469595 1.474477
1.466705 45.8 79 -237.806369 1.042998 44.6 80 49.955842 15.261606
SILUV 1.469595 1.474477 1.466705 37.9 81 48.615984 1.777476 32.5 82
40.037302 11.605794 SILUV 1.469595 1.474477 1.466705 31.0 83
30.207629 23.666744 25.0 84 -46.804849 10.040269 SILUV 1.469595
1.474477 1.466705 23.7 85 102.466827 15.835785 23.8 86 135.600697
17.278950 SILUV 1.469595 1.474477 1.466705 25.6 87 -71.505020
0.998996 25.8 88 0.000000 0.000000 LLF1 1.569035 1.579164 1.563301
24.9 89 0.000000 30.000000 24.9 90 0.000000 0.000000 20.004
TABLE-US-00006 TABLE 4A Aspheric Constants SRF 28 46 49 52 54 K 0 0
0 0 0 C1 4.526533E-06 1.050730E-07 -9.387324E-09 1.050730E-07
-1.050730E-07 C2 1.481358E-09 -1.076582E-11 3.284049E-13
-1.076582E-11 1.076582E-11 C3 4.401153E-13 1.004293E-15
1.082200E-17 1.004293E-15 -1.004293E-15 C4 6.492931E-15
-1.102576E-19 -1.034500E-21 -1.102576E-19 1.102576E-19 C5
-1.244203E-17 7.702115E-24 8.502093E-26 7.702115E-24 -7.702115E-24
C6 1.672184E-20 -3.347093E-28 -1.706409E-30 -3.347093E-28
3.347093E-28 SRF 57 74 K 0 0 C1 9.387324E-09 -4.868716E-07 C2
-3.284049E-13 1.010109E-09 C3 -1.082200E-17 6.221108E-14 C4
1.034500E-21 -1.082355E-16 C5 -8.502093E-26 -8.554228E-20 C6
1.706409E-30 4.272266E-23
TABLE-US-00007 TABLE 5 NA 1 OBH 62 WL 193 192.95 193.05 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 SEMIDIAM. 0 0.000000
52.003963 62.0 1 -215.712833 23.035701 SILUV 1.560970 1.561050
1.560890 71.8 2 -128.076348 0.999450 76.0 3 151.426866 42.474347
CAFUV 1.501395 1.501443 1.501347 82.9 4 -729.275651 7.071245 81.3 5
-426.546840 9.999189 SILUV 1.560970 1.561050 1.560890 80.2 6
261.642774 16.043848 77.6 7 -11777.049949 9.999491 SILUV 1.560970
1.561050 1.560890 77.8 8 169.293494 56.379980 78.6 9 691.791322
73.161522 CAFUV 1.501395 1.501443 1.501347 96.0 10 -141.860549
0.999306 101.5 11 116.062052 46.924402 CAFUV 1.501395 1.501443
1.501347 91.5 12 494.204476 0.999795 87.1 13 102.783313 57.100880
SILUV 1.560970 1.561050 1.560890 73.0 14 63.969000 25.033136 42.1
15 -246.879276 9.999595 SILUV 1.560970 1.561050 1.560890 37.9 16
995.973277 82.840679 41.5 17 -227.141816 12.314049 SILUV 1.560970
1.561050 1.560890 75.2 18 -297.081330 1.000034 82.1 19 -432.392392
44.994112 CAFUV 1.501395 1.501443 1.501347 84.7 20 -113.419623
0.999918 89.2 21 -2525.154853 44.365477 CAFUV 1.501395 1.501443
1.501347 94.4 22 -139.684282 109.398402 96.7 23 0.000000 -98.001733
REFL 73.1 24 -443.052731 -30.000907 CAFUV 1.501395 1.501443
1.501347 83.1 25 373.578857 -362.178493 84.2 26 176.909720
-15.000000 SILUV 1.560970 1.561050 1.560890 90.3 27 563.266306
-51.728642 97.8 28 119.506240 -15.000000 SILUV 1.560970 1.561050
1.560890 99.8 29 420.143117 -37.416219 130.2 30 198.624832
37.416219 REFL 135.7 31 420.143117 15.000000 SILUV 1.560970
1.561050 1.560890 130.7 32 119.506240 51.728642 101.3 33 563.266306
15.000000 SILUV 1.560970 1.561050 1.560890 100.2 34 176.909720
362.178493 93.2 35 373.578857 30.000907 CAFUV 1.501395 1.501443
1.501347 93.1 36 -443.052731 98.001733 92.4 37 0.000000 -90.999924
REFL 71.6 38 -129.776522 -48.648200 CAFUV 1.501395 1.501443
1.501347 84.8 39 827.646034 -63.899751 83.0 40 372.011643 -9.999744
SILUV 1.560970 1.561050 1.560890 68.2 41 -273.104022 -28.121346
65.9 42 190.398249 -14.999809 SILUV 1.560970 1.561050 1.560890 66.6
43 1016.184194 -168.331693 73.2 44 531.087094 -56.072211 SILUV
1.560970 1.561050 1.560890 131.1 45 177.485817 -0.999626 137.2 46
-537.586457 -56.628557 SILUV 1.560970 1.561050 1.560890 140.0 47
397.129639 -44.087590 138.9 48 0.000000 43.087853 118.4 49
-153.486833 -67.057493 SILUV 1.560970 1.561050 1.560890 117.7 50
-249.299442 -20.267809 104.8 51 -162.370282 -20.842280 CAFUV
1.501395 1.501443 1.501347 92.1 52 -156.733700 -9.203222 83.7 53
-117.699878 -55.240329 CAFUV 1.501395 1.501443 1.501347 77.3 54
-149.805182 -0.998971 55.9 55 -62.433321 -55.696773 SILUV 1.560970
1.561050 1.560890 47.3 56 0.000000 -3.000000 H2OV193 1.437468
1.437576 1.437360 18.5 57 0.000000 0.000000 15.5
TABLE-US-00008 TABLE 5A Aspheric Constants SRF 1 10 17 21 24 K 0 0
0 0 0 C1 -6.708531E-08 2.403412E-08 4.755112E-08 -8.563057E-08
4.477313E-09 C2 -1.705483E-12 5.166728E-13 -1.636240E-11
2.159181E-12 -1.420701E-14 C3 -7.297932E-17 1.588393E-17
9.465561E-16 -8.271916E-17 1.771705E-18 C4 7.204007E-21
1.305430E-21 -1.062161E-19 7.540861E-21 5.190139E-22 C5
-1.589172E-24 -1.770637E-26 7.674898E-24 -3.712728E-25
-5.453752E-26 C6 9.231896E-29 2.718726E-30 -4.144957E-28
5.093035E-30 2.236635E-30 SRF 29 31 36 38 41 K 0 0 0 0 0 C1
6.085379E-09 6.085379E-09 4.477313E-09 1.767039E-08 -1.728330E-07
C2 -8.735959E-14 -8.735959E-14 -1.420701E-14 8.316564E-13
-1.025592E-11 C3 2.780158E-18 2.780158E-18 1.771705E-18
4.937988E-17 -8.277512E-16 C4 -9.170747E-23 -9.170747E-23
5.190139E-22 5.039321E-21 -4.377410E-20 C5 2.453451E-27
2.453451E-27 -5.453752E-26 -1.717773E-25 -1.042063E-23 C6
-3.229238E-32 -3.229238E-32 2.236635E-30 2.891565E-29 3.839128E-28
SRF 44 47 50 54 K 0 0 0 0 C1 3.870375E-08 -1.633267E-09
3.936289E-08 3.278814E-09 C2 -6.465213E-13 -4.107714E-14
-1.118071E-12 2.417322E-11 C3 -1.535545E-17 -1.794721E-17
2.312000E-17 -5.059698E-15 C4 -1.454853E-23 7.679954E-22
-3.066503E-21 5.143166E-19 C5 2.932144E-26 -1.568521E-26
1.702929E-25 -7.127504E-23 C6 -5.208776E-31 1.467656E-31
-3.177511E-30 2.926135E-27
TABLE-US-00009 TABLE 6 NA 0.6 OBH 62 WL 405 365.5 436 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 SEMIDIAM. 0 0.000000
36.200602 62.0 1 171.518544 32.339567 FK5 1.498902 1.503934
1.495918 69.8 2 -317.786104 79.008130 69.3 3 -147.047114 9.999748
FK5 1.498902 1.503934 1.495918 55.1 4 342.405051 20.144647 55.5 5
-140.400996 11.668079 FK5 1.498902 1.503934 1.495918 55.9 6
557.807949 37.480362 62.1 7 -682.419001 28.287548 FK5 1.498902
1.503934 1.495918 75.6 8 -158.158201 0.999647 79.5 9 2791.087463
36.298237 FK5 1.498902 1.503934 1.495918 85.4 10 -163.612629
0.999498 86.9 11 163.587527 34.932650 FK5 1.498902 1.503934
1.495918 83.0 12 -1411.005987 6.407633 80.6 13 77.014420 17.848764
LF5 1.606590 1.619068 1.599610 63.3 14 74.562204 75.241594 56.1 15
1709.016613 9.999818 FK5 1.498902 1.503934 1.495918 33.0 16
86.348889 19.951833 34.2 17 -115.135799 18.126817 FK5 1.498902
1.503934 1.495918 36.7 18 -84.865845 86.519899 41.5 19 19952.065163
33.257664 CAFUV 1.441484 1.444863 1.439477 67.2 20 -114.476351
0.999646 69.0 21 -269.872351 20.702731 LF5 1.606590 1.619068
1.599610 68.2 22 -138.267238 97.475014 69.5 23 0.000000 -71.735184
REFL 50.9 24 -245.337556 -29.999844 CAFUV 1.441484 1.444863
1.439477 61.3 25 333.850389 -296.940370 62.3 26 137.245344
-15.000000 SILUV 1.469595 1.474477 1.466705 63.0 27 1268.305030
-29.114799 67.6 28 132.293526 -15.000000 FK5 1.498902 1.503934
1.495918 70.7 29 435.521613 -64.440722 85.3 30 216.777334 64.440722
REFL 115.7 31 435.521613 15.000000 FK5 1.498902 1.503934 1.495918
94.0 32 132.293526 29.114799 80.7 33 1268.305030 15.000000 SILUV
1.469595 1.474477 1.466705 79.6 34 137.245344 296.940370 72.8 35
333.850389 29.999844 CAFUV 1.441484 1.444863 1.439477 67.9 36
-245.337556 71.735184 66.8 37 0.000000 -93.381314 REFL 50.5 38
-107.581987 -42.025300 SILUV 1.469595 1.474477 1.466705 64.5 39
247.652865 -0.999459 63.2 40 -365.522301 -9.999229 LF5 1.606590
1.619068 1.599610 59.3 41 -156.785496 -27.775457 55.7 42 215.516764
-9.999346 LF5 1.606590 1.619068 1.599610 54.1 43 -186.416544
-28.697629 54.3 44 -3995.126063 -21.876902 FK5 1.498902 1.503934
1.495918 58.7 45 162.926370 -12.599437 60.0 46 99.826076 -15.000424
SILUV 1.469595 1.474477 1.466705 60.0 47 153.618881 -144.443627
64.8 48 -186.191390 -23.831946 CAFUV 1.441484 1.444863 1.439477
87.4 49 -476.244153 -42.228444 86.6 50 -413.374893 -36.176646 CAFUV
1.441484 1.444863 1.439477 85.2 51 214.495806 -5.020862 84.4 52
201.213917 -19.999607 LF5 1.606590 1.619068 1.599610 83.4 53
358.671343 29.882770 86.1 54 0.000000 -58.991901 85.9 55
-301.790975 -29.667431 SILUV 1.469595 1.474477 1.466705 86.7 56
640.247261 -0.998732 85.4 57 -111.315063 -77.785400 LF5 1.606590
1.619068 1.599610 81.6 58 -111.070627 -1.047719 57.1 59 -91.910863
-11.770454 LF5 1.606590 1.619068 1.599610 55.9 60 -58.089956
-8.095749 47.6 61 -61.321099 -42.499546 CAFUV 1.441484 1.444863
1.439477 47.4 62 290.536721 -0.999509 41.6 63 -425.141129
-36.248294 LF5 1.606590 1.619068 1.599610 37.8 64 -5184.051745
-2.053661 23.8 65 0.000000 -5.000000 SILUV 1.469595 1.474477
1.466705 22.3 66 0.000000 -6.000000 20.0 67 0.000000 0.000000
15.5
TABLE-US-00010 TABLE 6A Aspheric Constants SRF 1 6 21 24 29 K 0 0 0
0 0 C1 7.821851E-09 2.019984E-07 -8.707918E-08 1.672282E-08
1.350610E-08 C2 -4.052293E-12 -1.334213E-11 -1.886222E-12
-3.595586E-13 -2.922381E-13 C3 3.821805E-16 -9.167908E-16
2.097888E-18 1.743202E-17 7.887008E-18 C4 -3.079520E-20
1.911693E-19 -2.628100E-20 4.201755E-22 -1.332483E-21 C5
1.934159E-24 -1.067121E-23 4.098044E-24 7.233906E-25 1.160768E-25
C6 -7.115391E-29 1.595763E-28 -3.598416E-28 -8.373187E-29
-1.934082E-30 SRF 31 36 38 56 58 K 0 0 0 0 0 C1 1.350610E-08
1.672282E-08 9.769778E-08 -6.550682E-08 9.791014E-09 C2
-2.922381E-13 -3.595586E-13 3.453391E-12 -1.560644E-13
-7.781176E-12 C3 7.887008E-18 1.743202E-17 2.976442E-16
-5.817328E-17 -9.884985E-17 C4 -1.332483E-21 4.201755E-22
1.726040E-20 -2.712719E-21 6.888650E-21 C5 1.160768E-25
7.233906E-25 -6.147409E-26 1.429099E-25 6.352680E-24 C6
-1.934082E-30 -8.373187E-29 1.933603E-28 -4.115515E-29
-1.260629E-28
TABLE-US-00011 TABLE 7 NA 0.6 OBH 62 WL 405 365.5 436 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 SEMIDIAM. 0 0.000000
34.808993 62.0 1 170.953570 48.314819 FK5 1.498902 1.503934
1.495918 69.6 2 -348.563652 76.127192 68.1 3 -121.551034 9.999796
FK5 1.498902 1.503934 1.495918 55.0 4 390.647960 20.425620 56.4 5
-137.936653 18.688128 FK5 1.498902 1.503934 1.495918 57.0 6
1839.684661 31.593236 65.7 7 -1016.867210 29.294191 FK5 1.498902
1.503934 1.495918 78.5 8 -162.136440 0.999636 82.1 9 4389.236277
36.772688 FK5 1.498902 1.503934 1.495918 88.1 10 -168.369436
0.999530 89.7 11 175.091671 35.550265 FK5 1.498902 1.503934
1.495918 86.1 12 -1214.508467 0.999763 83.8 13 81.914223 27.014446
LF5 1.606590 1.619068 1.599610 67.9 14 72.400375 51.756442 55.7 15
271.721751 52.860899 FK5 1.498902 1.503934 1.495918 41.6 16
82.426550 25.551029 33.3 17 -92.405936 26.193583 FK5 1.498902
1.503934 1.495918 36.9 18 -78.985036 51.966934 44.4 19 736.381190
40.572456 SILUV 1.469595 1.474477 1.466705 60.1 20 -109.010821
0.999212 62.5 21 -234.728770 16.781333 LF5 1.606590 1.619068
1.599610 60.9 22 -146.225510 76.172833 61.6 23 0.000000 -66.560378
REFL 47.7 24 -299.050945 -30.000133 SILUV 1.469595 1.474477
1.466705 57.7 25 323.230184 -319.705713 59.3 26 135.177370
-15.000000 SILUV 1.469595 1.474477 1.466705 69.1 27 766.049320
-29.585170 75.3 28 142.363008 -15.000000 FK5 1.498902 1.503934
1.495918 79.4 29 487.000553 -63.633859 95.8 30 223.534072 63.633859
REFL 124.3 31 487.000553 15.000000 FK5 1.498902 1.503934 1.495918
103.0 32 142.363008 29.585170 88.0 33 766.049320 15.000000 SILUV
1.469595 1.474477 1.466705 86.7 34 135.177370 319.705713 78.2 35
323.230184 30.000133 SILUV 1.469595 1.474477 1.466705 65.1 36
-299.050945 66.560378 63.5 37 0.000000 -103.992166 REFL 48.2 38
-103.786383 -42.306734 SILUV 1.469595 1.474477 1.466705 63.4 39
228.514801 -0.999313 62.2 40 -220.182594 -9.999287 LF5 1.606590
1.619068 1.599610 57.5 41 -110.370872 -28.069207 53.2 42 138.302084
-9.999765 LF5 1.606590 1.619068 1.599610 52.7 43 -213.235355
-9.705758 55.0 44 -1047.828065 -23.921683 FK5 1.498902 1.503934
1.495918 56.3 45 142.824452 -9.454040 58.2 46 104.729965 -19.886717
SILUV 1.469595 1.474477 1.466705 58.5 47 140.641782 -104.824622
64.1 48 -169.227381 -16.128099 SILUV 1.469595 1.474477 1.466705
83.4 49 -222.667961 -105.563157 82.5 50 0.000000 21.631658 87.1 51
-248.029065 -44.545250 SILUV 1.469595 1.474477 1.466705 86.8 52
205.620581 -5.466712 86.0 53 189.539651 -20.000871 LF5 1.606590
1.619068 1.599610 85.3 54 360.155646 -38.897623 88.2 55 -290.846282
-33.599052 SILUV 1.469595 1.474477 1.466705 88.7 56 436.910026
-0.998269 87.2 57 -107.156836 -82.856699 LF5 1.606590 1.619068
1.599610 80.9 58 -131.854211 -4.919893 53.9 59 -133.325829
-9.999244 LF5 1.606590 1.619068 1.599610 52.0 60 -53.333982
-7.270691 42.6 61 -55.970923 -33.068995 SILUV 1.469595 1.474477
1.466705 42.3 62 205.125551 -0.990514 38.8 63 -2418.727152
-26.895913 LF5 1.606590 1.619068 1.599610 35.0 64 -1099.461984
-2.248719 23.8 65 0.000000 -5.000000 SILUV 1.469595 1.474477
1.466705 22.3 66 0.000000 -6.000000 20.0 67 0.000000 0.000000
15.5
TABLE-US-00012 TABLE 7A Aspheric Constants SRF 1 10 25 28 37 K 0 0
0 0 0 C1 -2.114185E-08 1.054702E-07 -4.275135E-08 3.021420E-08
4.868775E-08 C2 -1.750724E-12 -3.764752E-13 -1.372984E-12
-1.683656E-13 -5.672263E-13 C3 1.274243E-16 -3.742119E-16
1.762178E-17 -8.145104E-18 9.474618E-17 C4 -1.457299E-20
-9.898545E-20 -2.356683E-20 8.879145E-21 -2.107717E-21 C5
1.135473E-24 -2.100825E-24 5.272291E-24 -1.554926E-24 8.157939E-26
C6 -4.050698E-29 -1.945638E-27 -5.662110E-28 1.021591E-28
1.338073E-29 SRF 39 48 50 68 70 K 0 0 0 0 0 C1 4.868775E-08
3.021420E-08 1.900388E-08 -5.250831E-08 1.468736E-08 C2
-5.672263E-13 -1.683656E-13 3.608771E-13 -9.201980E-13
-3.031829E-12 C3 9.474618E-17 -8.145104E-18 -5.270168E-17
-1.540202E-17 -1.306691E-15 C4 -2.107717E-21 8.879145E-21
2.365395E-20 -4.940151E-21 1.417316E-19 C5 8.157939E-26
-1.554926E-24 -6.443516E-24 3.358184E-25 -1.951105E-23 C6
1.338073E-29 1.021591E-28 7.466478E-28 -3.228554E-29
1.556934E-27
TABLE-US-00013 TABLE 8 NA 0.6 OBH 62 WL 405 360 370 436 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 INDEX4 SEMIDIAM. 0 0.000000
44.811170 62.0 1 210.182433 30.174472 FK5 1.498902 1.504780
1.503272 1.495918 70.7 2 -326.391489 88.409321 70.5 3 -130.618974
9.999831 FK5 1.498902 1.504780 1.503272 1.495918 58.2 4 267.126803
19.554220 60.3 5 -220.570364 9.999316 FK5 1.498902 1.504780
1.503272 1.495918 61.2 6 -1327.710736 47.668085 66.0 7 -1284.621428
39.185850 FK5 1.498902 1.504780 1.503272 1.495918 85.3 8
-137.855924 0.999817 88.3 9 487.178102 33.104977 FK5 1.498902
1.504780 1.503272 1.495918 91.2 10 -293.325530 1.000628 91.0 11
105.926259 43.802410 FK5 1.498902 1.504780 1.503272 1.495918 80.6
12 324.516337 1.015188 73.5 13 118.963359 29.431556 LF5 1.606590
1.621262 1.617371 1.599610 65.9 14 108.340385 31.172710 51.7 15
1396.105980 23.321303 FK5 1.498902 1.504780 1.503272 1.495918 38.9
16 71.044081 51.368380 27.7 17 -126.060484 41.789099 FK5 1.498902
1.504780 1.503272 1.495918 41.1 18 -99.403845 22.583650 52.7 19
857.805509 74.427244 CAFUV 1.441484 1.445430 1.444419 1.439477 61.4
20 -122.114606 5.533749 67.9 21 -209.762399 16.947254 LF5 1.606590
1.621262 1.617371 1.599610 66.4 22 -146.253848 70.999492 67.7 23
0.000000 -63.249129 REFL 55.7 24 -208.552769 -29.999696 CAFUV
1.441484 1.445430 1.444419 1.439477 61.6 25 424.428567 -324.827916
62.2 26 139.396378 -15.000000 SILUV 1.469595 1.475299 1.473834
1.466705 59.9 27 625.984557 -25.225350 66.1 28 135.274526
-15.000000 FK5 1.498902 1.504780 1.503272 1.495918 70.5 29
456.048088 -54.202821 84.4 30 212.790280 54.202821 REFL 108.3 31
456.048088 15.000000 FK5 1.498902 1.504780 1.503272 1.495918 92.1
32 135.274526 25.225350 80.1 33 625.984557 15.000000 SILUV 1.469595
1.475299 1.473834 1.466705 79.2 34 139.396378 324.827916 73.1 35
424.428567 29.999696 CAFUV 1.441484 1.445430 1.444419 1.439477 69.2
36 -208.552769 63.249129 68.4 37 0.000000 -75.015181 REFL 53.8 38
-102.357875 -40.431118 FK5 1.498902 1.504780 1.503272 1.495918 63.3
39 310.580801 -1.000180 61.5 40 -1464.052553 -10.066792 LF5
1.606590 1.621262 1.617371 1.599610 58.8 41 -119.074302 -65.705900
54.3 42 252.233957 -10.774655 LF5 1.606590 1.621262 1.617371
1.599610 52.7 43 -237.924629 -12.657002 54.1 44 -982.309305
-24.602972 CAFUV 1.441484 1.445430 1.444419 1.439477 56.1 45
134.357661 -9.844974 57.7 46 97.826963 -17.230429 FK5 1.498902
1.504780 1.503272 1.495918 57.7 47 168.004193 -87.239672 63.4 48
-175.762982 -25.893749 CAFUV 1.441484 1.445430 1.444419 1.439477
82.9 49 -699.027803 -17.210584 82.3 50 -149743.474739 -29.904546
CAFUV 1.441484 1.445430 1.444419 1.439477 81.9 51 177.810695
-4.217914 81.7 52 171.401135 -15.000047 LLF1 1.569035 1.580929
1.577796 1.563301 80.5 53 384.037176 -34.560433 81.3 54 0.000000
-36.090269 77.8 55 -275.985796 -34.854093 SILUV 1.469595 1.475299
1.473834 1.466705 85.0 56 366.768308 -0.999932 84.9 57 -122.626193
-68.301753 LLF1 1.569035 1.580929 1.577796 1.563301 83.4 58
-153.700052 -0.999887 66.1 59 -112.945765 -17.455396 LLF1 1.569035
1.580929 1.577796 1.563301 65.1 60 -74.284310 -5.894701 56.6 61
-78.256214 -41.228121 CAFUV 1.441484 1.445430 1.444419 1.439477
56.7 62 276.325888 -1.000199 53.4 63 -269.254473 -61.769289 LLF1
1.569035 1.580929 1.577796 1.563301 47.5 64 3062.914635 -1.999421
23.9 65 0.000000 -5.000000 SILUV 1.469595 1.475299 1.473834
1.466705 22.3 66 0.000000 -6.000000 20.0 67 0.000000 0.000000
15.5
TABLE-US-00014 TABLE 8A Aspheric Constants SRF 1 6 21 24 29 K 0 0 0
0 0 C1 1.862046E-08 1.365542E-07 -7.395316E-08 1.970356E-08
9.523709E-09 C2 -2.828954E-12 -2.458877E-12 -2.209504E-12
5.033917E-14 -1.069547E-13 C3 2.151571E-16 -5.576839E-16
-2.590830E-18 3.242161E-17 -4.405911E-17 C4 -1.753914E-20
-1.015221E-20 -2.666927E-20 -5.485376E-21 7.942019E-21 C5
1.937299E-24 6.091438E-24 4.049751E-24 9.280815E-25 -7.143343E-25
C6 -1.158966E-28 -2.884858E-28 -3.738732E-28 -6.499681E-29
2.799653E-29 SRF 31 36 38 56 58 K 0 0 0 0 0 C1 9.523709E-09
1.970356E-08 9.873859E-08 -5.846436E-08 -6.029739E-08 C2
-1.069547E-13 5.033917E-14 5.158775E-12 -8.519802E-13 -5.656839E-12
C3 -4.405911E-17 3.242161E-17 3.420249E-16 1.039592E-17
4.131463E-16 C4 7.942019E-21 -5.485376E-21 4.395630E-20
-1.484379E-20 -1.406823E-19 C5 -7.143343E-25 9.280815E-25
-7.030301E-25 1.237068E-24 2.390138E-23 C6 2.799653E-29
-6.499681E-29 3.152174E-28 -7.465268E-29 -1.707603E-27
TABLE-US-00015 TABLE 9 NA 0.8 OBH 62 WL 365.5 363 368 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 SEMIDIAM. 0 0.000000
42.281274 62.0 1 166.908129 34.871030 FK5 1.503934 1.504313
1.503563 74.1 2 -341.893289 0.999918 73.8 3 131.686316 35.947291
LLF1 1.579164 1.579953 1.578396 69.3 4 107.532111 30.309772 58.7 5
-195.556850 9.999800 FK5 1.503934 1.504313 1.503563 58.2 6
112.709650 26.612732 58.7 7 -382.031523 30.093650 FK5 1.503934
1.504313 1.503563 60.8 8 -330.495973 13.081852 70.2 9 528.171459
47.830904 FK5 1.503934 1.504313 1.503563 81.2 10 -126.002394
0.990028 83.4 11 105.174708 94.034451 LF5 1.619068 1.620048
1.618115 77.0 12 292.344324 21.869742 49.7 13 -234.084742 9.993574
LF5 1.619068 1.620048 1.618115 41.2 14 111.571995 10.348907 36.6 15
-4730.475364 16.938839 FK5 1.503934 1.504313 1.503563 38.9 16
-130.801477 33.406348 42.5 17 -122.494260 16.927788 CAFUV 1.444863
1.445117 1.444614 52.8 18 -91.730678 44.231022 56.6 19 -866.948845
33.656774 CAFUV 1.444863 1.445117 1.444614 71.7 20 -115.085426
4.628809 73.6 21 -349.685621 20.995629 LF5 1.619068 1.620048
1.618115 72.0 22 -163.782660 107.526737 72.9 23 0.000000 -55.573674
REFL 54.6 24 -154.658152 -29.626090 CAFUV 1.444863 1.445117
1.444614 65.6 25 572.342589 -288.913729 66.3 26 110.160044
-15.000000 SILUV 1.474477 1.474845 1.474117 74.0 27 1661.316293
-30.266996 87.2 28 158.023919 -15.000000 FK5 1.503934 1.504313
1.503563 89.5 29 461.458850 -36.803870 105.7 30 184.050543
36.803870 REFL 114.4 31 461.458850 15.000000 FK5 1.503934 1.504313
1.503563 105.3 32 158.023919 30.266996 90.4 33 1661.316293
15.000000 SILUV 1.474477 1.474845 1.474117 88.7 34 110.160044
288.913729 76.0 35 572.342589 29.626090 CAFUV 1.444863 1.445117
1.444614 69.8 36 -154.658152 55.573674 69.3 37 0.000000 -102.983229
REFL 52.9 38 -102.461599 -43.346204 SILUV 1.474477 1.474845
1.474117 71.4 39 800.608314 -0.999940 69.8 40 -187.732221
-10.035239 LF5 1.619068 1.620048 1.618115 66.3 41 -116.181870
-28.943519 61.9 42 272.293629 -10.394818 LF5 1.619068 1.620048
1.618115 61.6 43 -152.134293 -20.260151 62.9 44 -1759.716053
-78.616687 LLF1 1.579164 1.579953 1.578396 66.2 45 225.871084
-20.423140 80.8 46 121.303195 -20.000179 SILUV 1.474477 1.474845
1.474117 81.4 47 151.175562 -25.512299 89.5 48 -181.315542
-18.873440 CAFUV 1.444863 1.445117 1.444614 109.0 49 -225.795277
-79.146460 108.0 50 -229.348186 -68.605482 CAFUV 1.444863 1.445117
1.444614 116.8 51 265.046380 -5.694596 115.7 52 243.482530
-14.992693 LF5 1.619068 1.620048 1.618115 113.9 53 927.754944
-20.172540 113.1 54 0.000000 -10.314431 110.0 55 -228.338073
-51.669046 SILUV 1.474477 1.474845 1.474117 112.6 56 642.206527
-0.999876 110.6 57 -154.052849 -32.638805 LF5 1.619068 1.620048
1.618115 100.6 58 -355.383378 -8.665973 94.9 59 -103.705135
-18.674690 LF5 1.619068 1.620048 1.618115 81.9 60 -77.782031
-7.387778 68.5 61 -79.458605 -77.668297 CAFUV 1.444863 1.445117
1.444614 67.5 62 -1050.909172 -1.243784 44.3 63 -224.928327
-21.310075 FK5 1.503934 1.504313 1.503563 40.6 64 1305.278413
-1.998158 30.0 65 0.000000 -5.000000 SILUV 1.474477 1.474845
1.474117 26.8 66 0.000000 -6.000000 23.6 67 0.000000 0.000000
15.5
TABLE-US-00016 TABLE 9A Aspheric Constants SRF 1 8 21 24 29 K 0 0 0
0 0 C1 -1.069190E-08 9.416541E-08 -4.595192E-08 3.727563E-08
2.192364E-08 C2 -1.399566E-12 2.525251E-12 -1.284346E-12
2.351610E-13 -4.594443E-13 C3 2.336566E-17 -4.301671E-17
2.845285E-17 1.072476E-16 2.242516E-17 C4 -4.113735E-21
-3.682918E-20 -1.667194E-20 -2.008136E-20 -8.023095E-22 C5
2.551561E-25 -9.663120E-25 2.424974E-24 3.511793E-24 2.390197E-26
C6 -1.622700E-29 -3.447128E-28 -1.780620E-28 -2.459834E-28
-4.678263E-31 SRF 31 36 38 56 58 K 0 0 0 0 0 C1 2.192364E-08
3.727563E-08 8.350902E-08 9.823458E-09 -8.214838E-08 C2
-4.594443E-13 2.351610E-13 4.809445E-12 -4.162035E-12 5.487551E-12
C3 2.242516E-17 1.072476E-16 2.268610E-16 2.899377E-16
-6.017095E-16 C4 -8.023095E-22 -2.008136E-20 3.941727E-20
-1.644217E-20 4.538588E-20 C5 2.390197E-26 3.511793E-24
-1.253329E-24 5.972180E-25 -2.358426E-24 C6 -4.678263E-31
-2.459834E-28 4.149074E-28 -1.129886E-29 6.188033E-29
TABLE-US-00017 TABLE 10 NA 0.6 OBH 62 WL 405 365.5 436 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 SEMIDIAM. 0 0.000000
30.999411 62.0 1 160.049940 28.873463 CAFUV 1.441484 1.444863
1.439477 69.0 2 -612.800703 0.999346 68.7 3 562.651054 9.999487 LF5
1.606590 1.619068 1.599610 67.8 4 124.936938 4.912088 65.2 5
133.737902 30.988506 SILUV 1.469595 1.474477 1.466705 66.1 6
-610.136767 82.523616 65.6 7 5664.315171 10.019147 FK5 1.498902
1.503934 1.495918 55.0 8 97.875194 12.798979 52.9 9 138.126408
13.783375 FK5 1.498902 1.503934 1.495918 54.7 10 227.439334
35.032188 54.5 11 -140.068683 10.450931 LLF1 1.569035 1.579164
1.563301 56.6 12 -177.688800 0.999944 59.6 13 473.598029 34.727404
FK5 1.498902 1.503934 1.495918 62.4 14 -139.868570 19.240488 63.5
15 -1801.386070 10.050254 FK5 1.498902 1.503934 1.495918 58.5 16
3294.618402 1.054855 57.5 17 80.335540 47.778166 LF5 1.606590
1.619068 1.599610 54.8 18 68.155225 10.902616 39.5 19 133.649980
80.251715 LLF1 1.569035 1.579164 1.563301 38.5 20 154.882915
55.279023 42.6 21 -252.086079 20.530066 FK5 1.498902 1.503934
1.495918 56.7 22 -110.793858 14.517252 59.6 23 2813.840547
30.324966 CAFUV 1.441484 1.444863 1.439477 64.2 24 -117.864605
0.999050 65.1 25 -395.675659 12.899412 LF5 1.606590 1.619068
1.599610 62.5 26 -335.951936 116.084001 62.2 27 0.000000 -65.130908
REFL 50.3 28 -242.480715 -28.237391 CAFUV 1.441484 1.444863
1.439477 62.5 29 288.591213 -2.780254 63.7 30 -708.094923
-19.844459 LF5 1.606590 1.619068 1.599610 64.0 31 -197.420763
-2.401508 63.6 32 -176.742702 -34.902913 CAFUV 1.441484 1.444863
1.439477 64.3 33 840.762679 -242.286700 64.4 34 112.979620
-15.000000 SILUV 1.469595 1.474477 1.466705 58.0 35 -346.487350
-33.491143 64.2 36 159.571570 -15.000000 FK5 1.498902 1.503934
1.495918 69.2 37 464.555752 -45.208278 82.6 38 179.131521 45.208278
REFL 102.3 39 464.555752 15.000000 FK5 1.498902 1.503934 1.495918
88.6 40 159.571570 33.491143 77.4 41 -346.487350 15.000000 SILUV
1.469595 1.474477 1.466705 75.1 42 112.979620 242.286700 66.3 43
840.762679 34.902913 CAFUV 1.441484 1.444863 1.439477 73.8 44
-176.742702 2.401508 73.8 45 -197.420763 19.844459 LF5 1.606590
1.619068 1.599610 72.7 46 -708.094923 2.780254 73.3 47 288.591213
28.237391 CAFUV 1.441484 1.444863 1.439477 72.8 48 -242.480715
65.130908 71.9 49 0.000000 -109.174016 REFL 54.2 50 444.534782
-14.410283 SILUV 1.469595 1.474477 1.466705 56.3 51 556.321250
-21.392174 58.3 52 -197.721972 -43.357955 LF5 1.606590 1.619068
1.599610 63.3 53 -406.898787 -99.037117 61.8 54 -359.291375
-20.716603 LF5 1.606590 1.619068 1.599610 64.5 55 -201.379285
-12.859452 63.2 56 -1468.206088 -18.746270 FK5 1.498902 1.503934
1.495918 63.7 57 284.407201 -17.054527 64.3 58 111.237525
-15.013460 SILUV 1.469595 1.474477 1.466705 64.2 59 305.091626
-3.499576 69.8 60 -155.067381 -19.151255 CAFUV 1.441484 1.444863
1.439477 75.7 61 -272.458298 -83.309836 75.2 62 0.000000 9.395386
79.4 63 -3096.938214 -23.798328 CAFUV 1.441484 1.444863 1.439477
78.9 64 251.532882 -9.058033 79.2 65 186.412154 -16.074626 SILUV
1.469595 1.474477 1.466705 79.3 66 220.346643 -0.999405 83.4 67
-601.395145 -36.909051 SILUV 1.469595 1.474477 1.466705 87.1 68
210.054860 -0.997007 88.0 69 -128.898773 -94.527249 LF5 1.606590
1.619068 1.599610 85.9 70 -120.282475 -3.487284 59.8 71 -99.777439
-12.100203 LF5 1.606590 1.619068 1.599610 58.6 72 -68.345307
-5.410149 52.1 73 -71.199596 -40.265588 CAFUV 1.441484 1.444863
1.439477 52.2 74 214.629531 -0.999455 48.8 75 -239.769691
-46.991889 LLF1 1.569035 1.579164 1.563301 42.5 76 -825.534544
-2.340391 23.8 77 0.000000 -5.000000 SILUV 1.469595 1.474477
1.466705 22.3 78 0.000000 -6.000000 20.0 79 0.000000 0.000000
15.5
TABLE-US-00018 TABLE 10A Aspheric Constants SRF 1 10 25 28 37 K 0 0
0 0 0 C1 -2.114185E-08 1.054702E-07 -4.275135E-08 3.021420E-08
4.868775E-08 C2 -1.750724E-12 -3.764752E-13 -1.372984E-12
-1.683656E-13 -5.672263E-13 C3 1.274243E-16 -3.742119E-16
1.762178E-17 -8.145104E-18 9.474618E-17 C4 -1.457299E-20
-9.898545E-20 -2.356683E-20 8.879145E-21 -2.107717E-21 C5
1.135473E-24 -2.100825E-24 5.272291E-24 -1.554926E-24 8.157939E-26
C6 -4.050698E-29 -1.945638E-27 -5.662110E-28 1.021591E-28
1.338073E-29 SRF 39 48 50 68 70 K 0 0 0 0 0 C1 4.868775E-08
3.021420E-08 1.900388E-08 -5.250831E-08 1.468736E-08 C2
-5.672263E-13 -1.683656E-13 3.608771E-13 -9.201980E-13
-3.031829E-12 C3 9.474618E-17 -8.145104E-18 -5.270168E-17
-1.540202E-17 -1.306691E-15 C4 -2.107717E-21 8.879145E-21
2.365395E-20 -4.940151E-21 1.417316E-19 C5 8.157939E-26
-1.554926E-24 -6.443516E-24 3.358184E-25 -1.951105E-23 C6
1.338073E-29 1.021591E-28 7.466478E-28 -3.228554E-29
1.556934E-27
TABLE-US-00019 TABLE 11 NA 0.5 OBH 62 MATE- SEMI- SURF RADIUS
THICKNESS RIAL INDEX DIAM. 0 0.000000 65.555132 62.0 1 -262.692796
58.390159 SILUV 1.469595 68.9 2 -335.491269 1.002142 80.9 3
-485.982299 95.402145 SILUV 1.469595 81.6 4 -178.089496 0.998908
95.0 5 301.194343 30.926496 SILUV 1.469595 93.9 6 -730.523345
0.998615 92.7 7 134.963732 23.829147 SILUV 1.469595 83.9 8
214.686465 0.998184 79.9 9 94.793549 53.781244 SILUV 1.469595 72.2
10 80.671778 12.965521 49.6 11 143.725446 13.924891 SILUV 1.469595
47.4 12 56.122354 30.110864 37.8 13 184.633446 9.999420 SILUV
1.469595 32.2 14 70.709704 50.069936 28.7 15 -88.188113 9.998814
SILUV 1.469595 33.7 16 1639.141921 38.152732 42.3 17 -452.766366
47.717755 SILUV 1.469595 71.2 18 -90.282467 0.999222 77.1 19
-203.492844 18.252322 SILUV 1.469595 84.3 20 -151.049946 0.998618
87.6 21 3424.253364 28.068559 SILUV 1.469595 93.4 22 -275.141884
0.998939 94.7 23 1095.872351 30.146098 SILUV 1.469595 95.0 24
-289.000591 271.986113 94.9 25 0.000000 -165.255256 REFL 44.8 26
-543.613185 -29.999930 SILUV 1.469595 74.6 27 364.048320
-677.088340 76.0 28 225.653383 -15.000000 SILUV 1.469595 128.6 29
-8889.084188 -83.801565 147.7 30 406.604358 83.801565 REFL 172.2 31
-8889.084188 15.000000 SILUV 1.469595 153.4 32 225.653383
677.088340 136.8 33 364.048320 29.999930 SILUV 1.469595 91.3 34
-543.613185 165.255256 89.9 35 0.000000 -60.999486 REFL 46.5 36
-248.722657 -9.999624 SILUV 1.469595 49.7 37 -124.021747 -3.776030
49.8 38 -126.072837 -20.177162 SILUV 1.469595 50.8 39 -2579.523815
-40.088038 50.9 40 -304.558745 -24.999919 SILUV 1.469595 51.7 41
-228.739251 -127.090268 50.6 42 -195.231753 127.090268 REFL 56.5 43
-228.739251 24.999919 SILUV 1.469595 130.5 44 -304.558745 15.449014
149.9 45 -353.360267 -15.449014 REFL 163.0 46 -304.558745
-24.999919 SILUV 1.469595 159.3 47 -228.739251 -142.090268 148.6 48
0.000000 -10.000000 SILUV 1.469595 140.4 49 0.000000 -0.999090
139.8 50 -208.937715 -54.704843 SILUV 1.469595 135.0 51
-3444.288303 -0.998850 131.9 52 -159.376740 -30.213730 SILUV
1.469595 113.5 53 -226.044729 -0.998872 107.7 54 -99.116898
-28.577130 SILUV 1.469595 89.5 55 -104.030988 -24.590921 80.3 56
-180.364312 -9.999790 SILUV 1.469595 77.1 57 -68.074055 -93.378648
58.9 58 -87.812319 -27.638274 SILUV 1.469595 33.9 59 -248.098009
-5.059518 25.4 60 0.000000 -5.000000 SILUV 1.469595 23.1 61
0.000000 -10.000000 21.3 62 0.000000 0.000000 15.5
TABLE-US-00020 TABLE 11A Aspheric Constants SRF 1 13 20 27 29 K 0 0
0 0 0 C1 -5.755134E-08 1.257426E-07 1.746543E-08 -1.028877E-08
4.311682E-09 C2 -1.878304E-12 3.158426E-11 6.867790E-13
1.901025E-14 -4.199724E-14 C3 -6.883986E-17 5.520463E-15
2.422369E-17 1.731970E-18 4.941219E-19 C4 -1.810212E-20
1.538498E-18 8.419344E-22 -3.546398E-23 -4.176595E-24 C5
2.094060E-24 -6.359530E-22 2.862393E-26 2.594256E-27 5.734147E-30
C6 -2.075578E-28 -2.859857E-25 2.452940E-30 -2.169849E-31
1.584763E-34 SRF 31 33 40 42 44 K 0 0 0 1.096180 0 C1 4.311682E-09
-1.028877E-08 -8.491784E-10 0.000000E+00 -8.491784E-10 C2
-4.199724E-14 1.901025E-14 -1.138273E-14 0.000000E+00 -1.138273E-14
C3 4.941219E-19 1.731970E-18 -1.123799E-19 0.000000E+00
-1.123799E-19 C4 -4.176595E-24 -3.546398E-23 -1.110851E-24
0.000000E+00 -1.110851E-24 C5 5.734147E-30 2.594256E-27
-1.428900E-29 0.000000E+00 -1.428900E-29 C6 1.584763E-34
-2.169849E-31 -2.789684E-34 0.000000E+00 -2.789684E-34 SRF 46 51 59
K 0 0 0 C1 -8.491784E-10 -8.342928E-09 6.045965E-07 C2
-1.138273E-14 5.550791E-14 2.453289E-11 C3 -1.123799E-19
-4.161956E-19 -5.303577E-14 C4 -1.110851E-24 -1.852225E-24
-1.222148E-16 C5 -1.428900E-29 6.941238E-29 1.863660E-19 C6
-2.789684E-34 9.151959E-34 -1.271608E-22
TABLE-US-00021 TABLE 13 NA 0.5 OBH 63.13 MATE- SEMI- SURF RADIUS
THICKNESS RIAL INDEX DIAM. 0 0.000000 30.999901 63.1 1 352.100506
9.999238 SILUV 1.469595 67.6 2 299.112304 0.999782 68.3 3
160.170855 35.197130 SILUV 1.469595 70.0 4 -272.295394 37.070906
69.7 5 4280.985563 9.999101 SILUV 1.469595 61.3 6 144.106953
41.623829 58.6 7 -80.869280 10.596275 SILUV 1.469595 58.6 8
-147.787619 1.414406 65.2 9 -354.217751 10.723672 SILUV 1.469595
67.6 10 262.847784 20.206270 73.8 11 -537.366032 24.136927 SILUV
1.469595 76.2 12 -179.202003 1.004382 80.4 13 433.783416 49.527682
SILUV 1.469595 91.4 14 -163.736190 0.999059 93.1 15 257.199757
25.769544 SILUV 1.469595 89.4 16 15065.300591 0.998689 87.7 17
153.282386 24.817103 SILUV 1.469595 81.5 18 354.352062 0.998458
77.9 19 103.512120 49.204101 SILUV 1.469595 69.6 20 63.335357
5.215736 45.8 21 62.448757 53.951200 SILUV 1.469595 44.2 22
52.316362 36.399551 21.7 23 -57.975068 9.999020 SILUV 1.469595 27.3
24 -168.359577 21.370197 33.7 25 -110.026859 9.999453 SILUV
1.469595 44.4 26 -309.306552 0.998977 51.5 27 617.306803 52.552537
SILUV 1.469595 57.4 28 -751.837962 3.136581 75.7 29 -4472.469303
36.790931 SILUV 1.469595 79.2 30 -335.977329 0.999700 88.5 31
349.440658 48.466362 SILUV 1.469595 95.7 32 -161.233077 0.999113
98.5 33 251.193853 43.001663 SILUV 1.469595 102.9 34 -479.286567
95.998539 102.0 35 0.000000 -230.845227 REFL 74.2 36 137.186190
-10.000000 SILUV 1.469595 62.5 37 412.408427 -383.574884 65.4 38
933.172212 -30.001428 SILUV 1.469595 118.8 39 261.021411
-274.087200 120.2 40 365.416470 -15.000000 SILUV 1.469595 116.7 41
-276.031009 -54.345556 122.4 42 355.768801 54.345556 REFL 125.4 43
-276.031009 15.000000 SILUV 1.469595 121.0 44 365.416470 274.087200
112.0 45 261.021411 30.001428 SILUV 1.469595 111.1 46 933.172212
383.574884 109.7 47 412.408427 10.000000 SILUV 1.469595 69.3 48
137.186190 230.845227 66.6 49 0.000000 -293.610022 REFL 82.2 50
2450.097020 -25.000000 SILUV 1.469595 126.2 51 582.198145 25.000000
REFL 1.469595 128.7 52 2450.097020 173.510495 124.9 53 310.101034
-173.510495 REFL 56.8 54 2450.097020 -25.000000 SILUV 1.469595 56.6
55 582.198145 -14.321186 56.8 56 159.877367 -9.999169 SILUV
1.469595 56.5 57 -649.160080 -20.169434 58.7 58 188.208878
-67.830259 SILUV 1.469595 60.1 59 147.140721 -0.998999 73.6 60
-496.278915 -28.772948 SILUV 1.469595 75.8 61 229.044072 -0.998595
75.9 62 -176.316076 -25.458327 SILUV 1.469595 71.6 63 1913.113358
8.841967 70.8 64 0.000000 -9.840838 71.8 65 -97.753416 -47.419715
SILUV 1.469595 67.0 66 -92.271860 -30.224639 53.3 67 437.045983
-9.999462 SILUV 1.469595 50.9 68 -72.399349 -6.511379 47.1 69
-82.744883 -28.425240 SILUV 1.469595 48.1 70 732.945497 -0.999834
47.1 71 -86.412037 -19.156627 SILUV 1.469595 44.7 72 -253.551246
-1.075789 41.7 73 -73.478775 -23.301264 SILUV 1.469595 38.6 74
-72.591632 -9.781690 30.4 75 -469.190155 -12.924465 SILUV 1.469595
28.7 76 155.107728 -2.055207 25.7 77 0.000000 -5.000000 SILUV
1.469595 23.4 78 0.000000 -10.000000 21.6 79 0.000000 0.000000
15.8
TABLE-US-00022 TABLE 13A Aspheric Constants SRF 1 25 31 39 41 K 0 0
0 0 0 C1 -3.661258E-07 3.464559E-07 -1.305972E-07 -8.640857E-09
3.747660E-08 C2 1.843015E-10 -1.827813E-11 5.295276E-12
4.122788E-14 -7.383285E-13 C3 -6.268258E-14 9.923469E-15
-3.005150E-16 -1.211841E-18 2.271622E-17 C4 1.260432E-17
3.105717E-18 7.641800E-21 2.586648E-23 -6.270152E-22 C5
-1.377543E-21 -1.902555E-21 8.273928E-26 -6.141904E-28 1.356418E-26
C6 6.363984E-26 2.869632E-25 -9.242276E-30 6.191402E-33
-1.478323E-31 SRF 43 45 51 53 55 K 0 0 0 0 0 C1 3.747660E-08
-8.640857E-09 -5.179072E-10 -2.124238E-09 -5.179072E-10 C2
-7.383285E-13 4.122788E-14 -1.738331E-15 -1.918149E-14
-1.738331E-15 C3 2.271622E-17 -1.211841E-18 1.880377E-19
2.010594E-16 1.880377E-19 C4 -6.270152E-22 2.586648E-23
-1.509297E-23 -3.842452E-20 -1.509297E-23 C5 1.356418E-26
-6.141904E-28 6.484461E-28 8.836848E-24 6.484461E-28 C6
-1.478323E-31 6.191402E-33 -1.081688E-32 -8.715692E-28
-1.081688E-32 SRF 62 67 76 K 0 0 0 C1 3.148507E-08 -1.234016E-07
-1.048054E-06 C2 1.380670E-12 -4.625862E-12 1.803949E-09 C3
3.697255E-17 1.096597E-15 -2.780582E-12 C4 5.878420E-21
-2.873895E-19 3.426059E-15 C5 -5.716172E-25 5.922872E-23
-2.424520E-18 C6 4.374170E-29 -7.953932E-27 7.260331E-22
TABLE-US-00023 TABLE 15 NA 0.6 OBH 5 WL 405 365.5 436 SURF RADIUS
THICKNESS MATERIAL INDEX1 INDEX2 INDEX3 SEMIDIAM. 0 0.000000
100.000000 5.00 1 0.000000 23.978926 6.69 2 100.279375 4.997550
SILUV 1.469595 1.474477 1.466705 5.49 3 38.347603 48.860824 5.22 4
-63.524424 7.500790 SILUV 1.469595 1.474477 1.466705 4.67 5
-59.086406 3.427079 4.79 6 21.437764 -3.427079 REFL 4.72 7
-59.086406 -7.500790 SILUV 1.469595 1.474477 1.466705 6.71 8
-63.524424 -48.860824 8.64 9 38.347603 -4.997550 SILUV 1.469595
1.474477 1.466705 26.51 10 100.279375 -3.978926 32.70 11 68.011922
3.978926 REFL 33.28 12 100.279375 4.997550 SILUV 1.469595 1.474477
1.466705 32.95 13 38.347603 48.860824 28.42 14 -63.524424 7.500790
SILUV 1.469595 1.474477 1.466705 25.42 15 -59.086406 5.427079 25.92
16 0.000000 2.000000 SILUV 1.469595 1.474477 1.466705 24.76 17
0.000000 2.987131 24.61 18 225.245996 7.432028 SILUV 1.469595
1.474477 1.466705 23.91 19 -69.420918 19.596774 23.69 20 23.134512
20.599033 SILUV 1.469595 1.474477 1.466705 13.22 21 -276.448248
0.870385 5.51 22 -28.412945 1.997697 SILUV 1.469595 1.474477
1.466705 5.13 23 21.255456 1.109912 4.03 24 -31.221803 2.081591
SILUV 1.469595 1.474477 1.466705 3.80 25 -16.655361 21.725692 3.28
26 -28.142553 -16.629382 REFL 9.12 27 28.142553 23.241691 REFL 8.70
28 -27.198294 3.352300 SILUV 1.469595 1.474477 1.466705 4.74 29
-9.909839 0.198323 5.66 30 259.226768 3.184463 SILUV 1.469595
1.474477 1.466705 6.40 31 -21.910436 0.199199 6.86 32 27.736079
42.459484 SILUV 1.469595 1.474477 1.466705 7.28 33 -36.360999
0.198349 8.60 34 48.850843 3.912770 SILUV 1.469595 1.474477
1.466705 8.47 35 -29.828770 0.190193 8.27 36 11.325954 4.718220
SILUV 1.469595 1.474477 1.466705 7.08 37 -82.204408 1.146759 6.19
38 -19.195841 3.439905 SILUV 1.469595 1.474477 1.466705 5.78 39
-17.019410 0.355875 4.71 40 0.000000 2.000000 SILUV 1.469595
1.474477 1.466705 3.98 41 0.000000 4.000000 3.12 42 0.000000
0.000000 0.25
TABLE-US-00024 TABLE 15A Conic Constants Conic constant Srf K 26
-4.263306 27 -4.263306
* * * * *