Multi-layered structure including an epitaxial layer having a low dislocation defect density, semiconductor device comprising the same, and method of fabricating the semiconductor device

Abstract

A multi-layered structure of a semiconductor device includes a substrate, and a heteroepitaxial layer having a low dislocation defect density on the substrate. The heteroepitaxial layer consists of a main epitaxial layer and at least one intermediate epitaxial layer sandwished in the main epitaxial layer. At their interface, the heteroepitaxial layer, i.e., the bottom portion of the main epitaxial layer, and the substrate have different lattice constants. Also, the intermediate epitaxial layer has a different lattice constant from that of the portions of the main epitaxial layer contiguous to the intermediate epitaxial layer. The intermediate epitaxial layer also has a thickness smaller than the net thickness of the main epitaxial layer such that the intermediate epitaxial layer absorbs the strain in the heteroepitaxial layer. Thus, it is possible to obtain a multi-layered structure comprising an epitaxial layer that is relatively thin and has a low dislocation defect density.

Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a semiconductor device comprising an epitaxial layer. More particularly, the present invention relates to a multi-layered structure including an epitaxial layer, to a semiconductor device comprising the same, and to a method of fabricating the semiconductor device.

[0003] 2. Description of the Related Art

[0004] Recently, the use tensile-strained silicon as a channel layer has been researched as a way to improve carrier mobility in a field effect transistor (hereinafter, referred to as a FET).

[0005] In general, the tensile-strained silicon channel layer is produced by forming an Si.sub.1-xGe.sub.x virtual substrate on a silicon substrate, annealing the resultant structure to relax the structure, and forming a silicon channel layer on the relaxed Si.sub.1-xGe.sub.x virtual substrate. As a result, the tensile-strained silicon channel layer can be obtained by using the tensile strain in silicon caused by a lattice mismatch between the relaxed Si.sub.1-xGe.sub.x virtual substrate and the silicon channel layer.

[0006] In forming the Si.sub.1-xGe.sub.x virtual substrate on the silicon substrate, dislocations thread within the Si.sub.1-xGe.sub.x virtual substrate when the strain caused by the lattice mismatch with the silicon substrate is relaxed. The threads of the dislocations in the virtual substrate accumulate at the top portion of the virtual substrate, and propagate into the silicon channel, thereby causing carrier scattering to occur in the channel. Carrier scattering prevents the FET from providing high carrier mobility.

[0007] An attempt to reduce the dislocation defect density of the epitaxial layer is described in U.S. Pat. No. 5,659,187. The patent discloses that an epitaxial layer, used as a virtual substrate, and having a composition graded by 0.025 to 2% per 1,000 .ANG. in its direction of thickness, has a reduced dislocation defect density.

[0008] Meanwhile, in order to form a tensile-strained silicon channel layer that provides sufficient carrier mobility at the top of an Si.sub.1-xGe.sub.x virtual substrate, the value of X at the top surface of the Si.sub.1-xGe.sub.x virtual substrate must be 0.2 or more. And preferably, the value of X at the bottom surface of the Si.sub.1-xGe.sub.x virtual substrate contiguous to (i.e., interfacing with) the silicon substrate is 0.

[0009] Therefore, in a case in which an Si.sub.1-xGe.sub.x layer is used as the virtual substrate, and the composition of the Si.sub.1-xGe.sub.x was graded by 2% per 1,000 .ANG. as described in the above-mentioned patent, the Si.sub.1-xGe.sub.x virtual substrate would have to be at least 1 .mu.m thick if the value of X were to be 0 at the bottom surface and 0.2 or more at the top surface. Such a thick epitaxial layer presents problems in implementing a subsequent photolithography process.

[0010] Another attempt to reduce the dislocation defect density, proposes a chemical mechanical polishing (CMP) process to eliminate the threads of the dislocations accumulating at the top portion of the epitaxial layer.

[0011] Nonetheless, despite the use of the above-described methods, the dislocation defect density of an Si.sub.1-xGe.sub.x virtual substrate remains high--on the order of 10.sup.6/cm.sup.2.

SUMMARY OF THE INVENTION

[0012] An object of the present invention is to solve the above-described problems and limitations of the prior art.

[0013] Thus, it is one object of the present invention to provide a multi-layered structure comprising an epitaxial layer that is relatively thin and yet has a low dislocation defect density.

[0014] It is thus another object of the present invention to provide a semiconductor device having a multi-layered structure comprising an epitaxial layer and having high carrier mobility.

[0015] According to one aspect of the present invention, the invention provides a multi-layered structure comprising a substrate, and a heteroepitaxial layer disposed on the substrate. The heteroepitaxial layer consists of a main epitaxial layer having a lattice constant different from that of the substrate, and at least one intermediate epitaxial layer sandwiched within the main epitaxial layer. The intermediate epitaxial layer has a lattice constant different from portions of the main epitaxial layer contiguous to the intermediate epitaxial layer. Also, the intermediate epitaxial layer has a thickness smaller than that of the main epitaxial layer such that the intermediate epitaxial layer absorbs the strain in the heteroepitaxial layer.

[0016] The main epitaxial layer may have a graded composition from its bottom surface to its top surface or the main epitaxial layer may have a uniform composition throughout its entirety.

[0017] Preferably, the main epitaxial layer is composed of Si.sub.1-xGe.sub.x (0<X<1). In this case, the substrate is composed of monocrystalline silicon, and the value of X may be 0 at the bottom surface of the main epitaxial layer. The value of X may also thus increase in a graduated manner to the top surface of the main epitaxial layer or the value of X may be constant throughout the main epitaxial layer.

[0018] The intermediate epitaxial layer may have a uniform composition throughout. The intermediate epitaxial layer may be formed of Si, SiC, or SiGeC. Preferably, the sum of the thicknesses of the at least one intermediate epitaxial layer is 1/2 or less of the net thickness of the main epitaxial layer.

[0019] According to another aspect of the present invention, the invention provides a semiconductor device comprising a strained channel layer, and wherein the heteroepitaxial layer is interposed between the substrate and the channel layer. The channel layer may be a tensile-strained layer. Also, the channel layer may be composed of Si or SiC.

[0020] As was mentioned above, the composition of the main epitaxial layer may be graded from the bottom surface to the top surface of the layer. In this case, the semiconductor device preferably further comprises a uniform epitaxial layer interposed between the heteroepitaxial layer and the channel layer. The composition of the uniform epitaxial layer is the same as that at the top surface of the heteroepitaxial layer.

[0021] According to still another aspect of the present invention, the invention provides a method of fabricating the semiconductor device including steps of providing a substrate, forming the heteroepitaxial layer on the substrate whereby the intermediate epitaxial layer will absorb the strain in the heteroepitaxial layer, annealing the heteroepitaxial layer, and forming the channel layer on the annealed heteroepitaxial layer.

[0022] The substrate on which the heteroepitaxial layer is formed may be polished using a chemical mechanical polishing (CMP) process, before the channel layer is formed.

[0023] Also, the heteroepitaxial layer may be formed by ultrahigh vacuum chemical vapor deposition (UHVCVD), reduced pressure chemical vapor deposition (RPCVD), low pressure chemical vapor deposition (LPCVD), or molecular beam epitaxy (MBE).

[0024] Also, in the case mentioned above in which the heteroepitaxial layer has a graded composition, a uniform epitaxial layer may be formed on the heteroepitaxial layer before the channel layer is formed, wherein the composition of the uniform epitaxial layer is the same as that of the top portion of the heteroepitaxial layer.

BRIEF DESCRIPTION OF THE DRAWINGS

[0025] The above and other objects, features and advantages of the present invention will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings, in which:

[0026] FIGS. 1A and 1B are sectional views of a substrate, illustrating a method of fabricating a semiconductor device according to the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0027] The preferred embodiments of the present invention will be described in detail hereinafter with reference to FIGS. 1A and 1B.

[0028] Referring first to FIG. 1A, a heteroepitaxial layer is formed on a substrate 100. The substrate 100 may be made of monocrystalline silicon. The heteroepitaxial layer comprises a main epitaxial layer 200 and at least one intermediate epitaxial layer 300 sandwiched within the main epitaxial layer 200. The heteroepitaxial layer having the intermediate epitaxial layer 300 may be formed by ultrahigh vacuum chemical vapor deposition (UHVCVD), reduced pressure chemical vapor deposition (RPCVD), low pressure chemical vapor deposition (LPCVD), or molecular beam epitaxy (MBE). Subsequently, the heteroepitaxial layer comprising the at least one intermediate epitaxial layer 300 is annealed. Preferably, the annealing process is performed for at least one hour at 950.degree. C.

[0029] The main epitaxial layer 200 is formed of a material having a lattice constant different from that of the substrate 100. Generally, an epitaxial layer is strained by a lattice mismatch with an underlying substrate, and dislocations occur in the epitaxial layer when the strain is relaxed by the annealing process. However, according to the present invention, dislocations can be prevented from occurring in the main epitaxial layer 200 by forming the intermediate epitaxial layer 300 therein. Here, the intermediate epitaxial layer 300 must have a lattice constant different from that of the portions of the main epitaxial layer 200 contiguous to the intermediate epitaxial layer 300.

[0030] Assuming that the thicknesses of the main epitaxial layer 200 and the intermediate epitaxial layer 300 are small, the magnitudes of the strain in the main epitaxial layer 200 and the intermediate epitaxial layer 300 are identical. In addition, the orientation of the strain in the main epitaxial layer 200 is different from that in the intermediate epitaxial layer 300 because the lattice constants of the main epitaxial layer 200 and the intermediate epitaxial layer 300 are mismatched. That is, the main epitaxial layer 200 and intermediate epitaxial layer 300 are strained in tension and compression, or in compression and tension, respectively, and the levels of the strain are identical. This condition can be represented by the following mathematical expression:

Be.sub.1.sup.2h.sub.1=Be.sub.2.sup.2h.sub.2

[0031] wherein B=2G(1+n)/(1-n), G=shear modulus, n=Poisson's ratio, e=lattice mismatch, and h=layer thickness.

[0032] Referring to the mathematical expression, the larger the net thickness (h.sub.2) of the main epitaxial layer 200 becomes, the greater is the strain applied to the intermediate epitaxial layer 300. Accordingly, when the thickness of the main epitaxial layer 200 is sufficiently large relative to the thickness of the intermediate epitaxial layer 300, the intermediate epitaxial layer 300 absorbs almost all of the strain in the heteroepitaxial layer. Accordingly, the thickness of the intermediate epitaxial layer 300 must be small compared to the net thickness of the main epitaxial layer 200. Preferably, the thickness of the intermediate epitaxial layer 300 is 1/2 of that of the main epitaxial layer 200. And, it follows that when more than one intermediate epitaxial layer 300 is present in the heteroepitaxial layer, the sum of the thicknesses of the intermediate epitaxial layers 300 is preferably 1/2 of the net thickness of the main epitaxial layer 200.

[0033] The annealing process relaxes the strain at the interface between the intermediate epitaxial layer 300 and the main epitaxial layer 200. The relieving of strain due to the annealing process causes dislocations to occur in the intermediate epitaxial layer 300 that has absorbed almost all of the strain from the main epitaxial layer 200. However, the dislocations are suppressed in the main epitaxial layer 200 in which the strain has been relieved by the intermediate epitaxial layer 300. Accordingly, the main epitaxial layer 200 has a low number of dislocations, i.e., a low dislocation defect density.

[0034] The main epitaxial layer 200 may have a graded composition from the bottom surface 200a, contiguous to the substrate 100, to the top surface 200b thereof, which is to say from the bottom surface to the top surface of the heteroepitaxial layer. Alternatively, the main epitaxial layer 200 may have a uniform composition from the bottom surface 200a to the top surface 200b.

[0035] The main epitaxial layer 200 may be formed of Si.sub.1-xGe.sub.x (0<X<1).

[0036] In the case in which the substrate 100 is a monocrystalline silicon substrate and the main epitaxial layer 200 has a graded composition, it is possible for the value of X to be 0 at the bottom surface 200a of the heteroepitaxial layer. Preferably, the value of X is 0.2 or more at the top surface 200b. Generally, the dislocation density of the graded main epitaxial layer 200 can be minimized solely by fabricating the main epitaxial layer 200 such that the value of X varies by 0.02 or less per 1,000 .ANG. in the direction of thickness of the heteroepitaxial layer. However, as described above, according to the present invention, dislocations in the main epitaxial layer 200 can be suppressed by forming the intermediate epitaxial layer 300 in the main epitaxial layer 200. Accordingly, the value of X in a main epitaxial layer formed of Si.sub.1-xGe.sub.x can vary by 0.02 or more per 1,000 .ANG. in the direction of thickness of the heteroepitaxial layer. Consequently, when the value of X is 0.2 at the top surface 200b of the heteroepitaxial layer, the thickness of the main epitaxial layer 200 can be 1 .mu.m or less and still have a low dislocation defect density.

[0037] Alternatively, the value of X in the composition Si.sub.1-xGe.sub.x of the main epitaxial layer 200 may be constant from the bottom surface 200a of the main epitaxial layer to the top surface 200b. In this case, the value of X may be 0.2 or more. In general, in the case of an epitaxial layer having a uniform composition, the layer is formed thick enough to limit the ability of dislocations to propagate all the way to the top surface of the epitaxial layer. However, according to the present invention as described above, the heteroepitaxial layer can be relatively thin without incurring dislocations because of the forming of the intermediate epitaxial layer 300 prior to the annealing process. Such a relatively thin (hetero)epitaxial layer facilitates a subsequent photolithography process.

[0038] The intermediate epitaxial layer 300 may have a uniform composition. Preferably, the intermediate epitaxial layer 300 is formed of Si, SiC, or SiGeC.

[0039] Referring to FIG. 1B, preferably, the substrate 100 on which the heteroepitaxial layer is formed is polished using a chemical mechanical polishing (hereinafter, referred to as CMP) process. As described above, although it is unlikely that a significant number of dislocation defects will be present at the top surface 200b of the heteroepitaxial layer, the CMP process will nonetheless eliminate any dislocation defects that have been incurred at the top surface 200b.

[0040] Subsequently, a uniform epitaxial layer 400 (an epitaxial layer having a uniform composition) may be formed on the polished heteroepitaxial layer. The uniform epitaxial layer 400 may be omitted in the case in which the main epitaxial layer 200 has a uniform composition. The uniform epitaxial layer 400 has the same composition as that of the heteroepitaxial layer at the top surface 200b, i.e., at the surface at which the uniform epitaxial layer 400 interfaces with the heteroepitaxial layer.

[0041] A channel layer is formed on the uniform epitaxial layer 400. The channel layer is formed of a material having a lattice constant different from that of the uniform epitaxial layer 400, i.e. different from that at the top surface 200b of the heteroepitaxial layer. Alternatively, the channel layer is formed directly on the heteroepitaxial layer in the above-described case in which the uniform epitaxial layer 400 is omitted. In this latter case, the channel layer is formed of a material having a lattice constant different from that of the heteroepitaxial layer. For example, the channel layer may be formed of Si or SiC.

[0042] As a result, the channel layer is formed as a strained channel layer 500 due to a lattice mismatch with the uniform epitaxial layer 400 or the heteroepitaxial layer. When the lattice constant of the channel layer is smaller than that of the uniform epitaxial layer 400 or the heteroepitaxial layer, the strained channel layer 500 is strained in tension, i.e., is a tensile-strained channel layer 500. In the case in which the channel layer 500 is formed of Si and the uniform epitaxial layer 400 or the heteroepitaxial layer 200 is formed of Si.sub.1-xGe.sub.x (0<X<1), the value of X is preferably 0.2 or more. This is because proper carrier mobility is obtained in the channel layer 500 when X has a value of 0.2 or more in this case.

[0043] Meanwhile, few dislocation defects propagate into the channel layer 500 because of the low dislocation defect density of the main epitaxial layer 200 and the lack of dislocation defects incurred at the top surface 200b of the heteroepitaxial layer 200. Accordingly, carrier scattering is reduced and therefore, carrier mobility in the channel layer is high.

[0044] According to the present invention as described above, a thin epitaxial layer having a low dislocation defect density can be provided by forming the epitaxial layer as heteroepitaxial layer consisting of a main epitaxial layer and an intermediate epitaxial layer having a thickness less than that of the main epitaxial layer. Also, the present invention provides a semiconductor device having high carrier mobility.

[0045] Although the present invention have been described above in detail with respect to the preferred embodiments thereof, those skilled in the art will appreciate that various modifications and/or additions can be made to the preferred embodiments without departing from the true scope and spirit of the invention as defined by the appended claims.

Claims

1-24. (canceled)

25. A method of fabricating a semiconductor device, comprising: providing a substrate; forming a heteroepitaxial layer on the substrate by forming a main epitaxial layer having a bottom surface on said substrate, and a top surface, the lattice constant of the main epitaxial layer being different from that of the substrate, and forming at least one intermediate epitaxial layer that is situtated within the main epitaxial layer above said bottom surface and beneath said top surface, the intermediate epitaxial layer having a lattice constant different from that of portions of the main epitaxial layer interfacing with the intermediate epitaxial layer, and the thickness of the intermediate epitaxial layer being smaller than the net thickness of the main epitaxial layer; annealing said heteroepitaxial layer, whereby the intermediate epitaxial layer absorbs the strain imposed on the heteroepitaxial layer by said annealing; and forming on the annealed heteroepitaxial layer a channel layer having a lattice constant different from that of said heteroepitaxial layer at the top surface of said main epitaxial layer.

26. The method according to claim 25, and further comprising polishing the substrate on which the heteroepitaxial layer is formed using a chemical mechanical polishing (CMP) process before forming the channel layer.

27. The method according to claim 25, wherein the heteroepitaxial layer is formed by ultrahigh vacuum chemical vapor deposition (UHVCVD), reduced pressure chemical vapor deposition (RPCVD), a low pressure chemical vapor deposition (LPCVD), or molecular beam epitaxy (MBE).

28. The method according to claim 25, wherein said forming of the main epitaxial layer comprises varying the composition thereof from its bottom surface to its top surface.

29. The method according to claim 28, and further comprising forming a uniform epitaxial layer having a uniform composition throughout on the heteroepitaxial layer before forming the channel layer, and wherein the composition of the uniform epitaxial layer is the same as that of the main epitaxial layer at the top surface thereof.

30. The method according to claim 25, wherein the main epitaxial layer is formed so as to have a uniform composition throughout.

31. The method according to claim 25, wherein said forming of the main epitaxial layer comprises forming a layer of Si.sub.1-xGe.sub.x (0<X<1) on the substrate.

32. The method according to claim 31, wherein the substrate provided is a monocrystalline silicon substrate, and said main epitaxial layer is formed such that the value of X is 0 at the bottom surface of the main epitaxial layer and varies in a graduated manner from the bottom surface to the top surface thereof.

33. The method according to claim 32, wherein the main epitaxial layer is formed such that the value of X is 0.2 or more at the top surface thereof.

34. The method according to claim 31, wherein the main epitaxial layer is formed such that the value of X is constant throughout.

35. The method according to claim 34, wherein the main epitaxial layer is formed such that the value of X is 0.2 or more.

36. The method according to claim 25, wherein the intermediate epitaxial layer is formed such that its composition is uniform throughout.

37. The method according to claim 25, wherein said forming of the intermediate epitaxial layer consists of forming a layer of Si, SiC, or SiGeC.

38. The method according to claim 25, wherein the heteroepitaxial layer is formed such that the sum of the thicknesses of the at least one intermediate epitaxial layer is 1/2 or less of the net thickness of the main epitaxial layer.

39. The method according to claim 25, wherein the channel layer is formed of a material having a lattice constant smaller than that of the heteroepitaxial layer at the top surface of said main epitaxial layer.

40. The method according to claim 25, wherein said forming of a channel layer comprises forming the channel layer of Si or SiC.