U.S. patent application number 11/115322 was filed with the patent office on 2005-11-10 for design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program.
Invention is credited to Kotani, Toshiya, Maeda, Shimon, Nojima, Shigeki.
Application Number | 20050251781 11/115322 |
Document ID | / |
Family ID | 35240786 |
Filed Date | 2005-11-10 |
United States Patent
Application |
20050251781 |
Kind Code |
A1 |
Kotani, Toshiya ; et
al. |
November 10, 2005 |
Design pattern correcting method, design pattern forming method,
process proximity effect correcting method, semiconductor device
and design pattern correcting program
Abstract
A design pattern correcting method of correcting a design
pattern in relation to a minute step of the design pattern, is
disclosed, which comprises extracting at least one of two edges
extended from a vertex of the design pattern, measuring a length of
the extracted edge, determining whether or not the length of the
measured edge is shorter than a predetermined value, extracting two
vertexes connected to the extracted edge if it is determined that
the length of the extracted edge is shorter than the predetermined
value, and reshaping the design pattern to match positions of the
two extracted vertexes with each other.
Inventors: |
Kotani, Toshiya;
(Machida-shi, JP) ; Nojima, Shigeki;
(Yokohama-shi, JP) ; Maeda, Shimon; (Tokyo,
JP) |
Correspondence
Address: |
FINNEGAN, HENDERSON, FARABOW, GARRETT & DUNNER
LLP
901 NEW YORK AVENUE, NW
WASHINGTON
DC
20001-4413
US
|
Family ID: |
35240786 |
Appl. No.: |
11/115322 |
Filed: |
April 27, 2005 |
Current U.S.
Class: |
716/52 ; 430/30;
430/311; 430/5; 716/53 |
Current CPC
Class: |
G03F 1/36 20130101 |
Class at
Publication: |
716/019 ;
430/005; 430/030; 430/311 |
International
Class: |
G06F 017/50; G03F
009/00; G03C 005/00 |
Foreign Application Data
Date |
Code |
Application Number |
Apr 28, 2004 |
JP |
2004-134011 |
Claims
What is claimed is:
1. A design pattern correcting method of correcting a design
pattern in relation to a minute step of the design pattern,
comprising: extracting at least one of two edges extended from a
vertex of the design pattern; measuring a length of the extracted
edge; determining whether or not the length of the measured edge is
shorter than a predetermined value; extracting two vertexes
connected to the extracted edge if it is determined that the length
of the extracted edge is shorter than the predetermined value; and
reshaping the design pattern to match positions of the two
extracted vertexes with each other.
2. A design pattern correcting method of correcting a design
pattern according to claim 1, wherein a point at which edges other
than the extracted edge are extended and intersected is regarded as
a new vertex to match the positions of the two vertexes with each
other.
3. A design pattern correcting method of correcting a design
pattern according to claim 1, wherein, when it is determined that
the lengths of the two edges are shorter than the predetermined
value, the design pattern is reshaped to match the positions of two
vertexes other than a common vertex of the edges with each
other.
4. A design pattern correcting method of correcting a design
pattern according to claim 3, wherein a point at which edges other
than the extracted edge are extended and intersected is regarded as
a new vertex to match the positions of the two vertexes with each
other.
5. A design pattern correcting method of correcting a design
pattern according to claim 1, wherein the predetermined value is
less than a minimum width which limits the design pattern.
6. A design pattern correcting method of correcting a design
pattern in relation to a minute step of the design pattern,
comprising: extracting an edge extended from a vertex of the design
pattern; measuring a length of the extracted edge; determining
whether or not the length of the measured edge is shorter than a
predetermined value; judging that a design rule is violated to
output an error if it is determined that the length of the edge is
shorter than the predetermined value; and reshaping the design
pattern not to violate the design rule.
7. A design pattern correcting method of correcting a design
pattern according to claim 6, wherein the predetermined value is
less than a minimum width which limits the design pattern.
8. A design pattern process proximity effect correcting method of
correcting a design pattern process proximity effect of a design
pattern in relation to a minute step of the design pattern,
comprising: extracting an edge extended from a predetermined vertex
of the design pattern; measuring a length of the extracted edge;
determining whether or not the length of the measured edge is
shorter than a predetermined value; extracting two vertexes
connected to the extracted edge if it is determined that the length
of the extracted edge is shorter than the predetermined value;
dividing the extracted edge into edge units for pattern correction
with a vertex excluding the two extracted vertexes as a starting
point; allocating a correction value for said each divided edge
unit; and resizing the design pattern corresponding to the
correction value for said each allocated edge unit.
9. A design pattern process proximity effect correcting method,
according to claim 8, wherein the predetermined value is less than
a minimum width which limits the design pattern.
10. A design pattern process proximity effect correcting method of
making a process proximity effect correction on a design pattern
corrected by the design pattern correcting method as recited in
claim 1.
11. A design pattern process proximity effect correcting method of
making a process proximity effect correction on a design pattern
corrected by the design pattern correcting method as recited in
claim 6.
12. A mask manufacturing method for manufacturing a mask by using a
design pattern corrected by the design pattern process proximity
effect correcting method as recited in claim 8.
13. A mask manufacturing method for manufacturing a mask by using a
design pattern corrected by the design pattern process proximity
effect correcting method as recited in claim 10.
14. A mask manufacturing method for manufacturing a mask by using a
design pattern corrected by the design pattern process proximity
effect correcting method as recited in claim 11.
15. A semiconductor device manufacturing method of manufacturing a
semiconductor device, comprising forming a pattern of a desired
shape on a wafer by exposing the wafer to light by using a mask
manufactured according to the mask manufacturing method as recited
in claim 12.
16. A semiconductor device manufacturing method of manufacturing a
semiconductor device, comprising forming a pattern of a desired
shape on a wafer by exposing the wafer to light by using a mask
manufactured according to the mask manufacturing method as recited
in claim 13.
17. A semiconductor device manufacturing method of manufacturing a
semiconductor device, comprising forming a pattern of a desired
shape on a wafer by exposing the wafer to light by using a mask
manufactured according to the mask manufacturing method as recited
in claim 14.
18. A program of causing a computer to execute a design pattern
correcting method, comprising: extracting at least one of two edges
extended from a vertex of the design pattern; measuring a length of
the extracted edge; determining whether or not the length of the
measured edge is shorter than a predetermined value; extracting two
vertexes connected to the extracted edge if it is determined that
the length of the extracted edge is shorter than the predetermined
value; and reshaping the design pattern to match positions of the
two extracted vertexes with each other.
19. A program of causing a computer to execute a design pattern
correcting method, comprising: extracting an edge extended from a
vertex of the design pattern; measuring a length of the extracted
edge; determining whether or not the length of the measured edge is
shorter than a predetermined value; judging that a design rule is
violated to output an error if it is determined that the length of
the edge is shorter than the predetermined value; and reshaping the
design pattern not to violate the design rule.
20. A program of causing a computer to execute a design pattern
process proximity effect correcting method, comprising: extracting
an edge extended from a predetermined vertex of the design pattern;
measuring a length of the extracted edge; determining whether or
not the length of the measured edge is shorter than a predetermined
value; extracting two vertexes connected to the extracted edge if
it is determined that the length of the extracted edge is shorter
than the predetermined value; dividing the extracted edge into edge
units for pattern correction with a vertex excluding the two
extracted vertexes as a starting point; allocating a correction
value for said each divided edge unit; and resizing the design
pattern corresponding to the correction value for said each
allocated edge unit.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is based upon and claims the benefit of
priority from prior Japanese Patent Application No. 2004-134011,
filed Apr. 28, 2004, the entire contents of which are incorporated
herein by reference.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to a design pattern correcting
method for correcting a design pattern, a design pattern forming
method for forming a design pattern based on a design rule, a
process proximity effect correcting method for, when forming a
desired pattern planar shape on a wafer using a design pattern,
implementing a processing for proximity effect correction, a
semiconductor device and a design pattern correcting program.
[0004] 2. Description of the Related Art
[0005] In recent years, progress of semiconductor manufacturing
technology is very remarkable and semiconductors whose minimum
design rule is 0.18 .mu.m have been mass-produced. Such
miniaturization has been achieved by remarkable progresses of such
fine pattern forming technology as mask process technology,
lithography process technology and etching process technology.
[0006] At a time when the pattern size was sufficiently large, a
mask pattern having the same shape as a pattern written by a
designer was formed and the mask pattern was transferred to resist
coated on a wafer with a photolithography machine, thereby forming
the designed mask pattern. However, influence made by refraction of
exposure light upon the dimension of the wafer has been increased
by the miniaturization of the pattern size, and the process
technology for the mask and wafer for forming such a fine pattern
accurately has become difficult. Therefore, it has been difficult
to form a pattern just the same as a designed one on a wafer even
if the same mask as the design pattern is employed.
[0007] In order to improve the correspondence of the design
pattern, technologies called optical proximity correction (OPC) for
implementing a predetermined correction and process proximity
correction (PPC) have been used for a mask pattern for forming the
same pattern as the design pattern on the wafer.
[0008] The OPC technology and PPC technology (hereinafter expressed
as PPC including OPC) are classified largely to two methods.
According to one of them, a moving amount of an edge constituting a
design pattern corresponding to the width of the design pattern or
a most proximate distance between the patterns is specified as a
rule, and the edge is moved following the rule. A second method is
to optimize an edge moving amount such that the same pattern as the
design pattern can be formed on the wafer by using a lithography
simulator capable of estimating the diffracted light intensity
distribution of exposure light. Further, a correcting method
capable of achieving a higher precision correction by combining
these two methods has been proposed (for example, Jpn. Pat. Appln.
KOKAI Publication No. 2002-258459).
[0009] Generally, the PPC method using the lithography simulator is
called model base PPC. According to this method, by comparing an
optical image calculated from a model with a design pattern, the
edge of the pattern is moved corresponding to the comparison
result. At that time, the design pattern needs to be divided to
edge groups of a certain unit, and an appropriate correction value
is calculated for each edge. With miniaturization of lithography
intensified, the resolution of the pattern on the wafer has been
deteriorated more and more, and particularly, deterioration
(meaning that the shape of the pattern cannot be formed on the
wafer just as the design pattern indicates) of the resolution at a
corner portion of the pattern is remarkable.
[0010] Therefore, when the pattern is divided to edge groups,
usually the corner portion of the pattern in which the
deterioration of the resolution is particularly serious is
preferentially divided. Consequently, such an edge division that
the corner portion of the pattern is optimized is achieved, so that
the shape of the corner portion in which the deterioration of the
resolution is serious can be optimally corrected.
[0011] However, examples of the design pattern include a design
pattern having a small step in the vicinity of a corner portion
thereof. In the case of setting a design rule of the layout or
using an automatic layout design tool indispensable for designing a
large-scale device, generation of the step in the vicinity of the
pattern corner portion is an unavoidable problem. Because the edge
division is started from the corner portion of the pattern as
described above, even a minute step is recognized as a corner
portion. As a result, predetermined edge division cannot be
performed between an original corner portion and the minute step,
and consequently, the correction is not carried out in a
predetermined manner at the corner portion in which the
deterioration of the resolution is serious, so that a problem may
occur in mask formation or the configuration of the wafer.
[0012] In such a pattern having a small step in the vicinity of a
corner portion thereof, conventionally, it is difficult to finish
the corner portion into a desired pattern and this is a main cause
which deteriorates pattern accuracy.
BRIEF SUMMARY OF THE INVENTION
[0013] According to a first aspect of the present invention, there
is provided a design pattern correcting method of correcting a
design pattern in relation to a minute step of the design pattern,
comprising:
[0014] extracting at least one of two edges extended from a vertex
of the design pattern;
[0015] measuring a length of the extracted edge;
[0016] determining whether or not the length of the measured edge
is shorter than a predetermined value;
[0017] extracting two vertexes connected to the extracted edge if
it is determined that the length of the extracted edge is shorter
than the predetermined value; and
[0018] reshaping the design pattern to match positions of the two
extracted vertexes with each other.
[0019] According to a second aspect of the present invention, there
is provided a design pattern correcting method of correcting a
design pattern in relation to a minute step of the design pattern,
comprising:
[0020] extracting an edge extended from a vertex of the design
pattern;
[0021] measuring a length of the extracted edge;
[0022] determining whether or not the length of the measured edge
is shorter than a predetermined value;
[0023] judging that a design rule is violated to output an error if
it is determined that the length of the edge is shorter than the
predetermined value; and
[0024] reshaping the design pattern not to violate the design
rule.
[0025] According to a third aspect of the present invention, there
is provided a design pattern process proximity effect correcting
method of correcting a design pattern process proximity effect of a
design pattern in relation to a minute step of the design pattern,
comprising:
[0026] extracting an edge extended from a predetermined vertex of
the design pattern;
[0027] measuring a length of the extracted edge;
[0028] determining whether or not the length of the measured edge
is shorter than a predetermined value;
[0029] extracting two vertexes connected to the extracted edge if
it is determined that the length of the extracted edge is shorter
than the predetermined value;
[0030] dividing the extracted edge into edge units for pattern
correction with a vertex excluding the two extracted vertexes as a
starting point;
[0031] allocating a correction value for the each divided edge
unit; and
[0032] resizing the design pattern corresponding to the correction
value for the each allocated edge unit.
[0033] According to a fourth aspect of the present invention, there
is provided a design pattern process proximity effect correcting
method of making a process proximity effect correction on a design
pattern corrected by the design pattern correcting method as
recited in the first aspect of the present invention.
[0034] According to a fifth aspect of the present invention, there
is provided a design pattern process proximity effect correcting
method of making a process proximity effect correction on a design
pattern corrected by the design pattern correcting method as
recited in the second aspect of the present invention.
[0035] According to a sixth aspect of the present invention, there
is provided a mask manufacturing method for manufacturing a mask by
using a design pattern corrected by the design pattern process
proximity effect correcting method as recited in the third aspect
of the present invention.
[0036] According to a seventh aspect of the present invention,
there is provided a mask manufacturing method for manufacturing a
mask by using a design pattern corrected by the design pattern
process proximity effect correcting method as recited in the fourth
aspect of the present invention.
[0037] According to an eighth aspect of the present invention,
there is provided a mask manufacturing method for manufacturing a
mask by using a design pattern corrected by the design pattern
process proximity effect correcting method as recited in the fifth
aspect of the present invention.
[0038] According to a ninth aspect of the present invention, there
is provided a semiconductor device manufacturing method of
manufacturing a semiconductor device, comprising forming a pattern
of a desired shape on a wafer by exposing the wafer to light by
using a mask manufactured according to the mask manufacturing
method as recited in the sixth aspect of the present invention.
[0039] According to a tenth aspect of the present invention, there
is provided a semiconductor device manufacturing method of
manufacturing a semiconductor device, comprising forming a pattern
of a desired shape on a wafer by exposing the wafer to light by
using a mask manufactured according to the mask manufacturing
method as recited in the seventh aspect of the present
invention.
[0040] According to an eleventh aspect of the present invention,
there is provided a semiconductor device manufacturing method of
manufacturing a semiconductor device, comprising forming a pattern
of a desired shape on a wafer by exposing the wafer to light by
using a mask manufactured according to the mask manufacturing
method as recited in the eighth aspect of the present
invention.
[0041] According to a twelfth aspect of the present invention,
there is provided a program of causing a computer to execute a
design pattern correcting method, comprising:
[0042] extracting at least one of two edges extended from a vertex
of the design pattern;
[0043] measuring a length of the extracted edge;
[0044] determining whether or not the length of the measured edge
is shorter than a predetermined value;
[0045] extracting two vertexes connected to the extracted edge if
it is determined that the length of the extracted edge is shorter
than the predetermined value; and
[0046] reshaping the design pattern to match positions of the two
extracted vertexes with each other.
[0047] According to a thirteenth aspect of the present invention,
there is provided a program of causing a computer to execute a
design pattern correcting method, comprising:
[0048] extracting an edge extended from a vertex of the design
pattern;
[0049] measuring a length of the extracted edge;
[0050] determining whether or not the length of the measured edge
is shorter than a predetermined value;
[0051] judging that a design rule is violated to output an error if
it is determined that the length of the edge is shorter than the
predetermined value; and
[0052] reshaping the design pattern not to violate the design
rule.
[0053] According to a fourteenth aspect of the present invention,
there is provided a program of causing a computer to execute a
design pattern process proximity effect correcting method,
comprising:
[0054] extracting an edge extended from a predetermined vertex of
the design pattern;
[0055] measuring a length of the extracted edge;
[0056] determining whether or not the length of the measured edge
is shorter than a predetermined value;
[0057] extracting two vertexes connected to the extracted edge if
it is determined that the length of the extracted edge is shorter
than the predetermined value;
[0058] dividing the extracted edge into edge units for pattern
correction with a vertex excluding the two extracted vertexes as a
starting point;
[0059] allocating a correction value for the each divided edge
unit; and
[0060] resizing the design pattern corresponding to the correction
value for the each allocated edge unit.
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING
[0061] FIG. 1 is a diagram showing a finished pattern shape on a
wafer to a design pattern 11 when there is no minute step in the
vicinity of a pattern corner portion;
[0062] FIG. 2 is a diagram showing a pattern shape of a pattern
after OPC of the design pattern in FIG. 1;
[0063] FIG. 3 is a diagram showing a finished pattern shape on the
wafer after OPC of the design pattern of FIG. 1;
[0064] FIG. 4 is a diagram showing a finished pattern shape on the
wafer to the design pattern 11 when there is a minute step in the
vicinity of the pattern corner portion;
[0065] FIG. 5 is a diagram showing a pattern shape after OPC of the
design pattern in FIG. 4;
[0066] FIG. 6 is a diagram showing a finished pattern shape on the
wafer after OPC of the design pattern of FIG. 5;
[0067] FIG. 7 shows an example of a flow chart for correcting a
design pattern in which a minute step exists in the vicinity of the
pattern corner portion;
[0068] FIG. 8 shows an example of a flow chart for correcting a
design pattern in which a minute step exists in the vicinity of the
pattern corner portion;
[0069] FIG. 9 shows an example of a flow chart for correcting a
design pattern in which a minute step exists in the vicinity of the
pattern corner portion;
[0070] FIG. 10 is a diagram showing a design pattern in which a
minute step exists in the vicinity of the pattern corner portion
before correction;
[0071] FIG. 11 is a diagram showing the design pattern shown in
FIG. 10 after correction;
[0072] FIG. 12 shows a flow chart for correcting the design pattern
shown in FIG. 10;
[0073] FIG. 13 is a diagram showing a design pattern in which a
minute step exists in the vicinity of the pattern corner portion
before correction;
[0074] FIG. 14 is a diagram showing the design pattern shown in
FIG. 13 after correction;
[0075] FIG. 15 shows a flow chart for correcting the design pattern
shown in FIG. 13;
[0076] FIG. 16 is a diagram showing a design pattern in which a
minute step exists in the vicinity of the pattern corner portion
before correction;
[0077] FIG. 17 is a diagram showing the design pattern shown in
FIG. 16 after correction;
[0078] FIG. 18 shows a flow chart for correcting the design pattern
shown in FIG. 16;
[0079] FIG. 19 is a diagram showing a design pattern in which a
minute step exists in the vicinity of the pattern corner portion
before correction;
[0080] FIG. 20 is a diagram showing the design pattern shown in
FIG. 19 after correction;
[0081] FIG. 21 shows a flow chart for correcting the design pattern
shown in FIG. 19;
[0082] FIG. 22 is a diagram showing a design pattern in which two
minute steps exist in the vicinity of the pattern corner portion
before correction;
[0083] FIG. 23 is a diagram showing the design pattern shown in
FIG. 22 after correction of the single minute step;
[0084] FIG. 24 is a diagram showing the design pattern shown in
FIG. 22 after correction of the two minute step;
[0085] FIG. 25 is a cross sectional view showing a device structure
in a step of a method of manufacturing a semiconductor device
according to another embodiment of the present invention, which is
used to explain the manufacturing method;
[0086] FIG. 26 is a cross sectional view showing a device structure
in a step following to the step in FIG. 25 of the method of
manufacturing the semiconductor device according to the embodiment
of the present invention, which is used to explain the
manufacturing method of the semiconductor device;
[0087] FIG. 27 is a cross sectional view showing a device structure
in a step following to the step in FIG. 26 of the method of
manufacturing the semiconductor device according to the embodiment
of the present invention, which is used to explain the
manufacturing method of the semiconductor device;
[0088] FIG. 28 is a cross sectional view showing a device structure
in a step following to the step in FIG. 27 of the method of
manufacturing the semiconductor device according to the embodiment
of the present invention, which is used to explain the
manufacturing method of the semiconductor device;
[0089] FIG. 29 is a cross sectional view showing a device structure
in a step following to the step in FIG. 28 of the method of
manufacturing the semiconductor device according to the embodiment
of the present invention, which is used to explain the
manufacturing method of the semiconductor device;
[0090] FIG. 30 is a cross sectional view showing a device structure
in a step following to the step in FIG. 29 of the method of
manufacturing the semiconductor device according to the embodiment
of the present invention, which is used to explain the
manufacturing method of the semiconductor device; and
[0091] FIG. 31 is a cross sectional view showing a device structure
in a step following to the step in FIG. 30 of the method of
manufacturing the semiconductor device according to the embodiment
of the present invention, which is used to explain the
manufacturing method of the semiconductor device.
DETAILED DESCRIPTION OF THE INVENTION
[0092] Embodiments of the present invention will be described with
reference to the accompanying drawings.
First Embodiment
[0093] FIGS. 1 to 3 show changes of a pattern in case where a
minute step exists in the vicinity of a pattern corner portion.
FIGS. 4 to 6 show changes of a pattern in case where no minute step
exists in the vicinity of the pattern corner portion.
[0094] FIGS. 1 to 3 show examples in which no minute step exist in
the vicinity of the pattern corner portion, FIG. 1 shows a finished
pattern shape 12 on a wafer to a design pattern 11, FIG. 2 shows a
mask pattern shape 13 after OPC and FIG. 3 shows a finished pattern
shape 14 on the wafer after OPC. FIGS. 4 to 6 show examples in
which a minute step exists in the vicinity of the pattern corner
portion and FIG. 4 shows the finished pattern shape 12 on the wafer
to the design pattern 11, FIG. 5 shows a mask pattern shape 13
after OPC and FIG. 6 shows a finished pattern shape 14 on the wafer
after OPC.
[0095] Because if no minute step exists as shown in FIGS. 1 to 3,
edge division can be implemented to a predetermined position with
the corner portion as a starting point, the finished planar shape
of the corner portion on the wafer can be finished as desired.
[0096] To the contrary, if a minute step exists in the vicinity of
the corner portion, as shown in FIGS. 4 to 6, the minute step is
regarded identical to the corner portion under a conventional
method. Therefore, the edge cannot be divided at a predetermined
position due to the existence of the minute step. As a result, no
predetermined shape can be obtained on the wafer, thereby reducing
yield rate of the device and mask production.
[0097] Then, according to this embodiment, a design rule is formed
so as to exclude such a minute step at the design stage as
described below. That is, explaining with reference to a flow chart
shown in FIG. 7,
[0098] 1. Extracting a corner portion (vertex) of a design pattern
(step S11)
[0099] 2. Extracting an edge extended from the extracted corner
portion (step S12)
[0100] 3. Measuring the length of the extracted edge (step S13)
[0101] 4. Determining the length of the measured edge (step
S14)
[0102] 5. If it is determined that the length of the measured edge
is shorter than a predetermined value (when it is determined that
it is a minute step), that is, if the determination result is YES,
it is recognized that the design rule is violated (step S14) and
error is outputted. Here, the predetermined value mentioned here is
less than a minimum value which limits the design pattern.
[0103] Then, by reshaping the pattern of a portion which is
determined to be an error, the minute step of the design pattern is
excluded (step S15). Next, whether or not all corner portions are
extracted is determined (step S16) and if the result is YES, this
procedure is finished. If the determination result is NO, the
procedure returns to step S11 for extracting the corner portion of
the design pattern. If the determination result is NO in step S14
for determining the length of the extracted edge, whether or not
all the corner portions are extracted is determined (step S17) and
if the determination result is YES, this procedure is finished. If
the determination result is NO, the procedure returns to step S11
for extracting the corner portion of the design pattern.
[0104] In the above-described steps, the design pattern is
corrected. Then, process proximity effect correction is carried out
on the design pattern corrected in such a way and a mask is
manufactured with the design pattern which has undergone the
process proximity effect correction.
Second Embodiment
[0105] Next, a second embodiment of the invention in which edge
division is carried out without affecting the edge division even if
a minute step exists in a design pattern will be described with
reference to a flow chart of FIG. 8.
[0106] 1-4. Step S21 to step S24 which are the same as step S11 to
step S14 of the first embodiment are carried out.
[0107] 5. If it is determined that the length of the edge is
shorter than a predetermined value in step S24 (when it is
determined to be a minute step), that is, the determination result
is YES, the extracted corner portion (vertex constituting the
minute step) is not adopted as an edge division start point (step
S25).
[0108] 6. If the determination result is NO in step S24, the
extracted corner portion is adopted as an edge division start point
(step S27).
[0109] 7. A correction value is allocated for each division unit of
the edge and resize is made corresponding to the correction value
(step S28).
[0110] Next, whether or not all corner portions are extracted is
determined (step S29) and if the result is YES, this procedure is
finished. If the determination result is NO, the procedure returns
to step S21 for extracting the corner portion of the design
pattern. If the determination result is YES in step S24 for
determining the length of the extracted edge and the extracted
corner portion is not adopted as an edge division start point (step
S25), whether or not all the corner portions are extracted is
determined (step S26) and if the determination result is YES, this
procedure is finished. If the determination result is NO, the
procedure returns to step S21 for extracting the corner portion of
the design pattern.
[0111] In the above-described steps, the process proximity effect
correction is carried out to the design pattern. Then, a mask is
manufactured with the design pattern which has undergone process
proximity effect correction.
Third Embodiment
[0112] Next, a method for forming a new design pattern by excluding
a minute step existing in a design pattern will be described with
reference to a flow chart of FIG. 9. According to this method,
following steps are executed.
[0113] 1. Extracting a corner portion of a design pattern (step
S31)
[0114] 2. Extracting an edge extended from the extracted corner
portion (step S32)
[0115] 3. Measuring the length of the extracted edge (step S33)
[0116] 4. Determining the length of the extracted edge (step
S34)
[0117] 5. If it is determined that the length of the edge is short
(when determined to be a minute step), coordinates of two vertexes
constituting those edges are extracted (step S35).
[0118] 6. The design pattern is reshaped such that the coordinates
of the extracted two vertexes coincide each other (step S36).
[0119] Next, whether or not all corner portions are extracted is
determined (step S37) and if the result is YES, this procedure is
finished. If the determination result is NO, the procedure returns
to step S31 for extracting the corner portion of the design
pattern. If the determination result is NO in step S34 for
determining the length of the extracted edge, whether or not all
the corner portions are extracted is determined (step S38) and if
the determination result is YES, this procedure is finished. If the
determination result is NO, the procedure returns to step S31 for
extracting the corner portion of the design pattern.
[0120] In the above-described steps, a design pattern excluding the
minute step is formed. Then, the process proximity effect
correction is carried out to the formed design pattern and a mask
is manufactured using the design pattern which has undergone the
process proximity effect correction.
[0121] FIG. 10 shows a design pattern formed according to a
conventional method, namely, a design pattern before the correction
of this embodiment is carried out, and FIG. 11 shows an example of
the design pattern formed by correction according to this
embodiment. FIG. 12 shows the above-mentioned corrected flow
chart.
[0122] As for the design pattern of FIG. 10, a corner portion Q of
a pattern 31 is extracted (step 41), and two edges QP and QR
extended from the corner portion Q are extracted (step 42). The
lengths of the two extracted edges QP and QR are measured (step
43). If the lengths of both the QP and QR are a predetermined value
or less, it is determined that this portion is a minute step (step
44). Two vertex coordinates P and Q constituting the edge QP are
extracted (step 45), and the design pattern is reshaped such that
these coordinates coincide each other (step 46). Likewise, two
vertex coordinates Q and R which constitute the edge QR are
extracted (step 47), and the design pattern is reshaped such that
these coordinates coincide each other (step 48). The vertex P
coinciding with the vertex Q and the vertex R coinciding with the
vertex Q means the vertex P coinciding with the vertex R.
Therefore, by extending a line other than QP including the vertex P
while extending a line other than QR including the vertex R, the
two vertexes P, R are matched with a vertex S as shown in FIG. 11.
A hatched area 32 in FIG. 11 obtained in this way is a pattern
added portion. That is, according to this embodiment, a pattern
having no step can be formed by adding the hatched area 32 as shown
in FIG. 11.
[0123] FIG. 13 shows a design pattern to be formed according to the
conventional method, namely, a design pattern before the correction
based on this embodiment. FIG. 14 shows an example of the design
pattern to be formed by correction according to this embodiment.
FIG. 15 shows a flow chart of the correction.
[0124] As for the design pattern of FIG. 13, a corner portion Q of
a pattern 41 is extracted (step 51), and two edges QP and QR
extended from the corner portion Q are extracted (step 52). The
lengths of the two extracted edges QP and QR are measured (step
53). If the lengths of both the QP and QR are a predetermined value
or less, it is determined that this portion is a minute step (step
54). Two vertex coordinates P and Q constituting the edge QP are
extracted (step 55), and the design pattern is reshaped such that
these coordinates coincide each other (step 56). Likewise, two
vertex coordinates Q and R which constitute the edge QR are
extracted (step 57), and the design pattern is reshaped such that
these coordinates coincide each other (step 58). The vertex P
coinciding with the vertex Q and the vertex R coinciding with the
vertex Q means the vertex P coinciding with the vertex R.
Therefore, by extending a line other than QP including the vertex P
while extending a line other than QR including the vertex R, the
two vertexes P, R are matched with a vertex S as shown in FIG. 14.
A deleted area 43 in FIG. 14 obtained in this way is a pattern
deleted portion. That is, according to this embodiment, a pattern
having no step can be formed, by deleting the blank area 43 as
shown in FIG. 14.
[0125] FIG. 16 shows a design pattern formed according to the
conventional method, namely, a design pattern before correction
based on this embodiment. FIG. 17 shows an example of the design
pattern formed by correction according to this embodiment. FIG. 18
shows a flow chart of the correction.
[0126] As for the design pattern of FIG. 16, a corner portion Q of
a pattern 51 is extracted (step 61), and two edges QP and QR
extended from the corner portion Q are extracted (step 62). The
lengths of the two extracted edges QP and QR are measured (step
63). If the lengths of both the QP and QR are a predetermined value
or less, it is determined that this portion is a minute step (step
64). Two vertex coordinates P, Q constituting the edge QP are
extracted (step 65), and the design pattern is reshaped such that
these coordinates coincide each other (step 66). Likewise, two
vertex coordinates Q, R which constitute the edge QR are extracted
(step 67), and the design pattern is reshaped such that these
coordinates coincide each other (step 68). The vertex P coinciding
with the vertex Q and the vertex R coinciding with the vertex Q
means the vertex P coinciding with the vertex R. Therefore, by
extending a line other than QP including the vertex P while
extending a line other than QR including the vertex R, the two
vertexes P, R are matched with a vertex S as shown in FIG. 17. A
blank area 53 in FIG. 17 obtained in this way is a pattern deleted
portion. That is, according to this embodiment, a pattern having no
step can be formed, by deleting the blank area 53 as shown in FIG.
17.
[0127] FIG. 19 shows a design pattern formed according to the
conventional method, namely, a design pattern before correction
based on this embodiment. FIG. 20 shows an example of the design
pattern formed by correction according to this embodiment. FIG. 21
shows a flow chart of the correction.
[0128] As for the design pattern of FIG. 19, corner portions P and
Q of a pattern 61 is extracted (step 71), and an edge PQ extended
from the corner portions P and Q is extracted (step 72). The length
of the extracted edge PQ is measured (step 73). If the length of
the PQ is a predetermined value or less, it is determined that this
portion is a minute step (step 74). Two vertex coordinates P and Q
constituting the edge PQ are extracted (step 75), and the design
pattern is reshaped such that these coordinates coincide each other
(step 76). That is, by extending a line including the vertex P
while extending a line including the vertex Q, the two vertexes P,
Q are matched with a vertex S as shown in FIG. 20. A hatched area
62 in FIG. 20 obtained in this way is a pattern added portion.
According to this embodiment, a pattern having no step can be
formed by adding the hatched area 62 as shown in FIG. 20.
[0129] According to the embodiments, by detecting the length of an
edge forming the corner portion to a design pattern possessing the
minute step, the minute step can be extracted. By correcting the
design pattern based on the extracted minute step, deterioration of
correction accuracy at the corner portion can be prevented, thereby
making it possible to form a highly accurate pattern.
[0130] If a plurality minute steps are disposed continuously as
shown in FIG. 22, the minute steps having an edge length less than
a predetermined value can be deleted by executing the processing
described above plural times. FIG. 22 shows an original design
pattern and FIG. 23 shows a design pattern after the processing
indicated by the above embodiments is executed a single time. By
applying the above-described processing to the design pattern shown
in FIG. 23 again, the minute steps can be deleted. FIG. 24 shows
the design pattern after the second processing is carried out. By
executing the processing indicated by the embodiments plural times,
the minute pattern formed with edges less than the predetermined
value can be deleted from the design pattern, so that a highly
accurate pattern in which deterioration of the correction accuracy
at the corner portion can be formed.
Fourth Embodiment
[0131] Next, a method of manufacturing a semiconductor device
according to a fourth embodiment of the present invention will be
explained with reference to FIGS. 25-31.
[0132] Here, a method of manufacturing a MOS (Metal Oxide
Semiconductor) transistor as an example of semiconductor devices,
by using a photo mask provided by the above-described embodiments,
will be explained.
[0133] As shown in FIG. 25, a gate insulating film 72 is formed on
a silicon semiconductor substrate 71 by using a thermal oxidation
method, a polysilicon film 73 is formed on the gate insulating film
72 by CVD (Chemicla Vapor Deposition) method. After that, the
polysilicon film 73 and the gate insulating film 72 are subjected
to patterning to form a gate structure comprised of the polysilicon
film 73 and the gate insulating film 72. To form this gate
structure, a photo resist layer 74 is formed on the polysilicon
film 73, and then the photo resist layer 74 is patterning-processed
by lithography to form a photo resist pattern.
[0134] At this patterning of the photo resist layer 74, use is made
of a mask 75 manufactured by using a design pattern corrected by
the design pattern process proximity effect correcting method as
described in the second embodiment. To be specific, the mask 75 is
mounted above the silicon semiconductor substrate 71, and light
beams are radiated onto the silicon semiconductor substrate 71 via
the mask 75 from a light beam source, not shown, to transfer a
pattern of the mask 75 to the photo resist layer 74.
[0135] Subsequently, the transferred pattern is developed so that a
photo resist pattern 74 corresponding to the pattern of the mask 75
is formed, as shown in FIG. 26.
[0136] Next, as shown in FIG. 27, the polysilicon film 73 and the
gate insulating film 72 are patterning-processed to form the gate
structure comprised of the polysilicon film 73 and the gate
insulating film 72, by using the photo resist pattern 74 as an
etching mask. Then, impurities are implanted into the silicon
semiconductor substrate 71 to form source/drain regions 76, by
using the photo resist pattern 74, the polysilicon film 73
(polysilicon electrode) and the gate insulating film 72, as a
mask.
[0137] Subsequently, the photo resist pattern 74 is removed by a
known method. Then, as shown in FIG. 28, an interlayer insulating
film 77 is formed over the silicon semiconductor substrate 71 by
CVD method. Following this, openings are formed in the interlayer
insulating film 77 for contact to the polysilicon electrode 73 and
source/drain regions 76. To form the openings, a photo resist layer
78 is formed on the interlayer insulating film 77, and then the
photo resist layer 78 is patterning-processed by lithography to
form a photo resist pattern.
[0138] At this patterning of the photo resist layer 78, use is made
of a mask 79 manufactured by using a design pattern corrected by
the design pattern process proximity effect correcting method as
described in the second embodiment. To be specific, the mask 79 is
mounted above the silicon semiconductor substrate 71, and light
beams are radiated onto the silicon semiconductor substrate 71 via
the mask 79 from a light beam source, not shown, to transfer a
pattern of the mask 79 to the photo resist layer 78.
[0139] Subsequently, the transferred pattern is developed so that a
photo resist pattern 78 corresponding to the pattern of the mask 79
is formed, as shown in FIG. 29.
[0140] Next, as shown in FIG. 30, the interlayer insulating film 77
is patterning-processed to form the openings for contact to the
polysilicon electrode 73 and source/drain regions 76, by using the
photo resist pattern 78 as an etching mask.
[0141] Subsequently, the photo resist pattern 78 is removed by a
known method. Then, as shown in FIG. 31, contact metals 80 are
formed in the openings for contact to the polysilicon electrode 73
and source/drain regions 76, and wiring metals 81 contacting the
contact metals 50 are formed on the interlayer insulating film 77
by a known method. With the manufacturing method, since use is made
in each of the patterning processes of a mask manufactured by using
a design pattern corrected by the design pattern process proximity
effect correcting method as described in the above described
embodiments (for example, the second example), desired patterns are
formed on the semiconductor wafer with high accuracy, resulting in
providing a highly accurate semiconductor device.
[0142] According to the embodiments of the present invention, it is
possible to improve dimensional precision of a resist pattern
formed in an exposure technique which forms a liquid film in a
local region on a resist film.
[0143] According to the embodiments of the present invention, the
shape of the corner portion in which deterioration of the
resolution remarkably appears can be finished as a desired pattern
indicates. As a result, the yield of device manufacturing can be
greatly improved.
[0144] The minute steps disposed in the vicinity of the corner
portion of the design pattern is an obstacle to forming a desired
shape on the wafer for the process proximity effect correction,
thereby inducing deterioration of the yield of the device.
According to the embodiments of the present invention, by forming a
pattern excluding the minute steps and carrying out the process
proximity effect correction on the data, the planar shape on the
wafer at the pattern corner portion can be finished into a desired
pattern.
[0145] In the meantime, the present invention is not restricted to
the above-described respective embodiments but may be modified in
various ways within a scope not departing from the gist of the
invention. There have been described the design pattern forming
method based on the new design rule as the first embodiment, the
process proximity effect correcting method as the second
embodiment, the design pattern correcting method for correcting the
design pattern as the third embodiment, and the method of
manufacturing a semiconductor device as the fourth embodiment. The
present invention can be applied to the mask pattern forming method
for forming a pattern subjected to the process proximity effect
correction for the design pattern formed by the first and third
embodiments. Further, the present invention can be applied to the
mask manufacturing method for manufacturing a mask from the mask
pattern formed according to the first to third embodiments.
[0146] In addition, the design pattern correcting method and the
design pattern process proximity effect correcting method described
in the embodiments can be distributed by storing as a program which
can be executed by a computer in a recording medium such as a
magnetic disk (such as floppy (registered trademark) disk or hard
disk), an optical disk (such as a CD-ROM or DVD), an optical
magnetic disk (such as MO), or a semiconductor memory. Any types of
recording mediums can be used as long as the program can be
recorded in the recording mediums and executed by a computer. The
program including a sequence of procedures can be distributed as
recording mediums via a communication network such as LAN or
Internet. Any types of computers can be used as long as the
computers can execute the above-described processing operations by
reading the program recorded in a recording medium and controlling
an operation in accordance with the program.
[0147] Additional advantages and modifications will readily occur
to those skilled in the art. Therefore, the invention in its
broader aspects is not limited to the specific details and
representative embodiments shown and described herein. Accordingly,
various modifications may be made without departing from the spirit
or scope of the general inventive concept as defined by the
appended claims and their equivalents.
* * * * *