U.S. patent application number 10/745931 was filed with the patent office on 2004-08-26 for method and apparatus for processing substrates in a system having high and low pressure areas.
Invention is credited to Ngan, Kenny King-Tai, Wang, Hougong, Xu, Zheng.
Application Number | 20040166697 10/745931 |
Document ID | / |
Family ID | 26923695 |
Filed Date | 2004-08-26 |
United States Patent
Application |
20040166697 |
Kind Code |
A1 |
Wang, Hougong ; et
al. |
August 26, 2004 |
Method and apparatus for processing substrates in a system having
high and low pressure areas
Abstract
A positive pressure gradient is maintained across an open access
port of an interface chamber such as a load lock chamber which
provides an interface between a low pressure chamber such as a
transfer or buffer chamber, and a high pressure area such as a
staging area or factory interface area. When the access port of the
interface chamber is open to the high-pressure area, the positive
pressure gradient may be used in some applications to inhibit the
flow of gasses from the high-pressure area into the interior of the
interface chamber.
Inventors: |
Wang, Hougong; (Pleasanton,
CA) ; Xu, Zheng; (Santa Cruz, CA) ; Ngan,
Kenny King-Tai; (Fremont, CA) |
Correspondence
Address: |
KONRAD RAYNES & VICTOR, LLP
315 S. BEVERLY DRIVE
# 210
BEVERLY HILLS
CA
90212
US
|
Family ID: |
26923695 |
Appl. No.: |
10/745931 |
Filed: |
December 24, 2003 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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10745931 |
Dec 24, 2003 |
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10229879 |
Aug 27, 2002 |
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6672864 |
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60316632 |
Aug 31, 2001 |
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Current U.S.
Class: |
438/795 |
Current CPC
Class: |
H01L 21/67017 20130101;
H01L 21/67748 20130101; H01L 21/67201 20130101 |
Class at
Publication: |
438/795 |
International
Class: |
H01L 021/31; H01L
021/469 |
Claims
What is claimed is:
1. A method of processing a semiconductor substrate in a heating
chamber having a valve through which a substrate may selectively
loaded into and unloaded from said heating chamber, comprising:
pressurizing the interior of said heating chamber with a purge gas
to a pressure greater than the pressure external to said valve to
provide a positive pressure differential between said chamber
interior and said valve external pressure; opening said chamber
valve; admitting said purge gas into said chamber interior while
said chamber valve is open to maintain a positive pressure
differential while said chamber valve is open; removing a processed
substrate from said chamber interior through said opened chamber
valve; loading an unprocessed substrate into said chamber interior
through said opened chamber valve; closing said chamber valve;
pumping gas from said chamber interior to lower the chamber
interior pressure; and heating said unprocessed substrate while
pumping said chamber.
2. The method of claim 1 wherein said purge gas admitting is
controlled to be in a range of 20-4000 sccm.
3. The method of claim 2 wherein said purge gas admitting is
controlled to be in a range of 100-2000 sccm.
4. The method of claim 1 wherein said purge gas is selected from
the group consisting of argon, helium and nitrogen.
5. The method of claim 1 wherein said heating is initiated when
said interior pressure is in a range of 10-760 Torr.
6. The method of claim 1 further comprising opening a second
chamber valve and unloading said unprocessed substrate through said
opened second valve after said unprocessed substrate is heated.
7. The method of claim 6 further comprising loading a processed
substrate through said opened second valve and closing said second
valve and repeating said pressurizing.
8. A method of processing a semiconductor substrate, comprising:
loading a processed substrate from a process chamber into an opened
load lock chamber having a first interior pressure; closing the
load lock chamber; admitting a purge gas into the load lock chamber
to vent the load lock chamber to a second, higher pressure greater
than ambient pressure and to cool the substrate; opening the load
lock chamber and continuing to admit said purge gas into the
chamber interior while the chamber is open; removing the processed
substrate from the opened load lock chamber and loading it into a
cassette at ambient pressure; loading an unprocessed substrate from
a cassette at ambient pressure into the opened load lock chamber;
closing the load lock chamber; pumping gas from the chamber
interior to lower the chamber interior pressure; and heating the
unprocessed substrate to degas the unprocessed substrate while
pumping the chamber wherein the heating is initiated at a load lock
chamber interior pressure in a range of 10-760 Torr.
9. A system for processing a semiconductor substrate, comprising: a
chamber having a slit valve through which a substrate may
selectively loaded into and unloaded from said chamber, and a
heater adapted to heat a substrate in said chamber, a purge gas
inlet adapted to admit a purge gas into the interior of said
chamber; a pump coupled to said chamber and adapted to pump gas
from the interior of said chamber; a robot adapted to load
substrates through said chamber valve into said chamber; and a
controller adapted to control said valve, pump, inlet and robot to
pressurize the interior of said heating chamber with a purge gas to
a pressure greater than the pressure external to said valve to
provide a positive pressure differential between said chamber
interior and said valve external pressure; to open said chamber
valve; to admit said purge gas into said chamber interior while
said chamber valve is open to maintain a positive pressure
differential while said chamber valve is open; to load a substrate
into said chamber interior through said opened chamber valve; to
close said chamber valve; to pump gas from said chamber interior to
lower the chamber interior pressure; and to heat said unprocessed
substrate while pumping said chamber wherein said controller
initiates said heating when said interior pressure is in a range of
10-760 Torr.
10. A load lock system for transferring a semiconductor substrate
from ambient pressure to a vacuum pressure, said system for use
with a purge gas source and a pump, comprising: a load lock chamber
having a slit valve through which a substrate may selectively
loaded into and unloaded from said chamber, and a heater adapted to
heat a substrate in said chamber, a purge gas inlet adapted to be
coupled to said source and to admit a purge gas into the interior
of said chamber; and a controller adapted to control said valve,
pump, and inlet to pressurize the interior of said heating chamber
with a purge gas to a pressure greater than the ambient pressure
external to said valve to provide a positive pressure differential
between said chamber interior and said valve external pressure; to
open said chamber valve; to admit said purge gas into said chamber
interior while said chamber valve is open to maintain a positive
pressure differential while said chamber valve is open; to load a
substrate into said chamber interior through said opened chamber
valve; to close said chamber valve after an unprocessed substrate
is loaded into said chamber interior; to pump gas from said chamber
interior to lower the chamber interior pressure; and to heat said
unprocessed substrate while pumping said chamber wherein said
controller initiates said heating when said interior pressure is in
a range of 10-760 Torr.
11. The load lock system of claim 10 wherein controller controls
said inlet to admit said purge gas in a range of 20-4000 sccm.
12. The load lock system of claim 11 wherein controller controls
said inlet to admit said purge gas in a range of 100-2000 sccm.
13. The load lock system of claim 10 wherein said purge gas is
selected from the group consisting of argon, helium and
nitrogen.
14. A system for processing a semiconductor substrate, comprising:
a load lock chamber having a slit valve through which a substrate
may selectively loaded into and unloaded from said chamber, and a
heater adapted to heat a substrate in said chamber, a purge gas
inlet adapted to admit a purge gas into the interior of said
chamber; a pump coupled to said chamber and adapted to pump gas
from the interior of said chamber; a cassette; a robot adapted to
load and unload substrates through said chamber valve between said
chamber and said cassette; and a controller adapted to control said
valve, pump, inlet and robot to pressurize the interior of said
heating chamber with a purge gas to a pressure greater than the
pressure external to said valve to provide a positive pressure
differential between said chamber interior and said valve external
pressure; to open said chamber valve; to admit said purge gas into
said chamber interior while said chamber valve is open to maintain
a positive pressure differential while said chamber valve is open;
to unload a processed substrate from said chamber interior through
said opened chamber valve; to load an unprocessed substrate into
said chamber interior through said opened chamber valve; to close
said chamber valve; to pump gas from said chamber interior to lower
the chamber interior pressure; and to heat said unprocessed
substrate while pumping said chamber.
15. The system of claim 14 wherein said controller initiates said
heating when said interior pressure is in a range of 10-760
Torr.
16. The system of claim 14 wherein said load lock chamber has a
second slit valve through which a substrate may selectively loaded
into and unloaded from said load lock chamber; said system further
comprising a transfer chamber; and a second robot adapted to load
and unload substrates through said second slit valve between said
load lock chamber and said transfer, said controller being further
adapted to open said second valve and unload said unprocessed
substrate through said opened second valve after said unprocessed
substrate is heated.
17. A system for processing a semiconductor substrate, comprising:
a load lock chamber having a slit valve through which a substrate
may selectively loaded into and unloaded from said chamber, and a
heater adapted to heat a substrate in said chamber, a purge gas
inlet adapted to admit a purge gas into the interior of said
chamber; a pump coupled to said chamber and adapted to pump gas
from the interior of said chamber; a cassette; a robot adapted to
load and unload substrates through said chamber valve between said
chamber and said cassette; and controller means for controlling
said valve, pump, inlet and robot to pressurize the interior of
said heating chamber with a purge gas to a pressure greater than
the pressure external to said valve to provide a positive pressure
differential between said chamber interior and said valve external
pressure; for opening said chamber valve; to admit said purge gas
into said chamber interior while said chamber valve is open to
maintain a positive pressure differential while said chamber valve
is open; to unload a processed substrate from said chamber interior
through said opened chamber valve; to load an unprocessed substrate
into said chamber interior through said opened chamber valve; to
close said chamber valve; to pump gas from said chamber interior to
lower the chamber interior pressure; and to heat said unprocessed
substrate while pumping said chamber.
18. The system of claim 17 wherein said controller means initiates
said heating when said interior pressure is in a range of 10-760
Torr.
19. The system of claim 17 wherein said load lock chamber has a
second slit valve through which a substrate may selectively loaded
into and unloaded from said load lock chamber; said system further
comprising a transfer chamber; and a second robot adapted to load
and unload substrates through said second slit valve between said
load lock chamber and said transfer, said controller means further
for controlling said second slit valve and said second robot to
open said second valve and unload said unprocessed substrate
through said opened second valve after said unprocessed substrate
is heated.
20. The system of claim 17 wherein controller means controls said
inlet to admit said purge gas in a range of 100-2000 sccm.
Description
[0001] This application claims priority from U.S. Provisional
Application No. 60/316,632, filed Aug. 31, 2001, which is
incorporated herein by reference.
BACKGROUND
[0002] The present invention relates generally to the transfer of
substrates typically used in the fabrication of electronic devices
such as integrated circuits and flat panel displays. Specifically,
the invention relates to an interface chamber such as a loadlock
chamber used to transfer substrates from one environment to another
environment in a processing system.
[0003] Vacuum processing systems are often used in the fabrication
of integrated circuits and flat panel displays. For example, one
typical vacuum processing system includes a centralized transfer
chamber mounted on a monolith platform or mainframe structure. One
or more process chambers are in communication with the transfer
chamber via access ports and associated slit valves through which
the substrates are transferred between the transfer chamber and the
adjoining process chambers.
[0004] Substrates are passed through the system by a substrate
handling robot disposed in the transfer chamber. The slit valves
isolate the process chambers from each other and from the transfer
chamber while substrates are being processed. The transfer chamber
is typically held at a constant vacuum, while the process chambers
may be pumped to a greater or lesser vacuum than the transfer
chamber for performance of their respective processes. Afterward,
the process chamber pressure returns to the level in the transfer
chamber before opening the slit valve to permit access between the
chambers.
[0005] The substrate handling robot disposed in transfer chamber
typically retrieves one or more unprocessed substrates from one or
more loadlock chambers connected to the transfer chamber and places
the substrates in the process chambers. The loadlock chambers
selectively cycle between the pressure level of the ambient
environment and the pressure level in the transfer chamber to
transition the substrates between atmospheric pressure and the
vacuum environment of the transfer chamber. One type of loadlock
chamber in widespread use has a relatively large volume and is
capable of storing multiple substrates. Typically, thirteen to
twenty-five substrates are stacked vertically in one or more
substrate cassettes disposed in loadlock chambers. The substrate
cassettes typically include a plurality of substrate supports
spaced vertically to permit a substrate handling robot blade to
reach under a substrate to remove or place a substrate. Substrates
are typically loaded in and removed from the loadlock chamber by a
staging robot at or near a front-end staging area, which is also
often referred to as the "factory interface."
[0006] Typically, the factory interface area is maintained at or
near ambient or atmospheric pressure. Accordingly, prior to
transfer of substrates into or out of the loadlock chamber, the
atmospheric volume within the loadlock chamber is usually vented to
atmospheric pressure before opening the valves of the loadlock
chamber. Similarly, before transfer of substrates between the
loadlock chamber and the transfer chamber, the atmospheric volume
within the loadlock chamber is usually evacuated to the low
pressure maintained in the transfer chamber. Because of the sizable
volume within typical loadlock chambers, it may take a relatively
lengthy amount of time to vent and then evacuate the loadlock
chamber before permitting access to the substrates by the substrate
handling robot. This process may typically take approximately four
(4) minutes to complete in some applications. During this time, the
vacuum processing system may sit idle while awaiting the
introduction of additional unprocessed substrates into the
system.
[0007] It has been found that substantial production gains may be
made by reducing the atmospheric volume within the loadlock chamber
serving the transfer chamber. Accordingly, systems having single or
dual substrate loadlock chambers have been developed to reduce
venting and evacuation time within the loadlock process chamber,
which has resulted in a reduction of process chamber idle time and
an increase in production. Examples of such loadlock chambers
include those described in application Ser. No. 137,324, filed Jun.
3, 1999 and application Serial No. 505,901 filed Feb. 17, 2000
(having counterpart EP 1058291 published Dec. 6, 2000); and
application Ser. No. 464,362, filed Dec. 15, 1999 (having
counterpart EP 1109203 published Jun. 20, 2001), which are
incorporated herein by reference.
[0008] A reduction in the number of substrates housed in the
loadlock chamber often makes it desirable to increase the speed at
which the substrates are transferred through the loadlock chamber.
However in many applications it is desirable to heat the substrates
prior to processing in the processing chambers. Heating the
substrate may for example assist in degassing undesirable
contaminant gasses such from the substrate prior to introducing the
substrate into the main processing system. In those applications in
which the substrate is heated in the loadlock chamber prior to
processing, a shorter transition time through the loadlock chamber
reduces the time available to heat the substrates in the loadlock
chamber.
SUMMARY
[0009] The present inventions are directed to, in one aspect, a
method and apparatus for processing a semiconductor substrate in a
system which includes a chamber having a valve such as a slit valve
wherein the interior of the chamber is vented with a purge gas to a
pressure greater than the pressure external to the valve to provide
a positive pressure gradient between the chamber interior and the
valve external pressure. Upon opening the chamber valve to permit a
substrate to be loaded into or removed from the chamber, purge gas
is continued to be admitted into the chamber interior while the
chamber valve is open to maintain a positive pressure gradient
while said chamber valve is open. In some applications, such a
positive pressure gradient may be used to inhibit the passage of
contaminant gasses from the exterior of the chamber to the interior
while the slit valve is open.
[0010] Once the chamber valve is closed, the chamber may be pumped
down to a lower pressure and heating of the substrate may be
initiated. In one embodiment, the chamber may be a load lock
chamber having a heater to degas the substrate. The chamber slit
valve may provide access to a factory interface which is at ambient
pressure. In some applications, it is appreciated that the
degassing of a substrate in a load lock chamber may be initiated at
higher pressures and thus earlier in completion of the pumping
cycle where the admission of contaminant gasses is inhibited by a
positive pressure gradient maintained when the slit valve to the
factory interface is open.
[0011] There are additional aspects to the present inventions. It
should therefore be understood that the preceding is merely a brief
summary of some embodiments and aspects of the present inventions.
Additional embodiments and aspects of the present inventions are
referenced below. It should further be understood that numerous
changes to the disclosed embodiments could be made without
departing from the spirit or scope of the inventions. The preceding
summary therefore is not meant to limit the scope of the
inventions. Rather, the scope of the inventions is to be determined
by appended claims and their equivalents.
DRAWINGS
[0012] Embodiments of the invention are now described with
reference to the appended drawings, in which:
[0013] FIG. 1 is a top schematic view of a first embodiment of a
vacuum system in accordance with the present invention.
[0014] FIG. 2 is a side schematic view of the loadlock chamber of
FIG. 1.
[0015] FIG. 3 is a top schematic view of the cooling plate and gas
injector of FIG. 2.
[0016] FIGS. 4a-4d depict a flow chart representing an example of a
method of operating the system of FIG. 1.
[0017] FIGS. 5a-5h are side schematic views of the loadlock chamber
of FIG. 1 depicting corresponding steps of the process of FIG.
4.
DESCRIPTION
[0018] A vacuum processing system in accordance with one embodiment
of the present invention is indicated generally at 100 in FIG. 1.
The vacuum processing system 100 generally includes a factory
interface or front-end staging area 104 where substrate cassettes
108 are supported and substrates are loaded into and unloaded from
one or more loadlock chambers 112. The factory interface area 104
includes a staging robot 116 which unloads an unprocessed substrate
from one of the cassettes 108 and loads the unprocessed substrate
into a loadlock chamber 112. In the illustrated embodiment, the
staging robot 116 of the factory interface area 104 operates in an
atmosphere which is at or near the ambient (atmospheric) pressure
which is approximately 760 Torr. It is appreciated that in some
applications, the front-end area may have a pressure which is
greater than or less than ambient.
[0019] As best seen in FIG. 2, the loadlock chamber 112 has a slit
valve 118 which opens to permit access to the interior 120 of the
loadlock chamber. The staging robot 116 passes an unprocessed
substrate through the opened slit valve 118 and deposits it in the
chamber 112. In addition, the robot 116 removes a processed
substrate through the opened valve 118. In accordance with one
aspect of the present inventions, the loadlock chamber provides a
positive pressure gradient between the interior 120 of the chamber
and pressure of the front-end area 104 while the slit valve 118 is
open to the factory interface area 104. By a positive pressure
gradient, it is meant that the interior pressure of at least some
if not all of the chamber 112 is somewhat higher than that of the
factory interface area 104 notwithstanding the open slit valve 118
between the chamber interior 120 and the loadlock chamber exterior
122 within the front end area 104 surrounding the robot 116.
[0020] In the illustrated embodiment, the positive pressure
differential is maintained by injecting a gas such as a purge gas
into the chamber so that the pressure within the loadlock chamber
interior 120 is greater than that of the chamber exterior 122
adjacent the robot 116 while the slit valve 118 on the factory
interface side is open. The purge gas, which may be one of (or a
combination of two or more of) argon, helium, nitrogen, hydrogen,
or other suitable purge gasses, is injected into the chamber 112
through a suitable inlet 130. As best seen in FIG. 3, in the
illustrated embodiment, the inlet 130 is formed as an elongated
manifold having a plurality of orifices 132 distributed linearly
adjacent to and above a cooling plate 140 upon which a processed
substrate 142 is supported. In addition to maintaining the positive
pressure differential, the orifices 132 may be positioned to direct
a flow of gas over the surface of the substrate 142 to remove
particles that may have deposited onto the substrate. Copending
application Ser. No. 09/903,218, filed Jul. 10, 2001, assigned to
the assignee of the present application and incorporated by
reference in its entirety, describes a multi-substrate cooling
chamber having a gas injector, which is similarly shaped to
dislodge particles from the surface of a substrate being cooled in
the chamber. It is appreciated that the inlet 130 may have a
variety of shapes, depending upon the particular application. For
example, the inlet 130 may be a simple single orifice inlet or may
have several inlets distributed to provide the desired pressure
gradient in the interior of the chamber 112.
[0021] It is believed that maintaining a positive pressure gradient
while the factory interface side slit valve is open will have one
or more of various advantages, depending upon the application. For
example, as will be explained in greater detail below, in one
application it is believed that injecting a purge gas into the
loadlock chamber 112 while the slit valve 118 is open may permit a
degassing operation to be initiated more quickly once the slit
valve 118 is closed and the loadlock chamber is being pumped down.
Consequently, the degassing operation may be completed more quickly
permitting an improvement in throughput. In other applications, a
different advantage may result, depending upon the particular
application.
[0022] The system 100 includes a purge gas supply line 134 which is
coupled to the gas inlet 130 via a control valve 144. The flow rate
through the inlet 130 may be regulated by a flow controller 146. In
the illustrated embodiment, the flow rate through the gas inlet 130
is controlled to be in a range of 20-4000 standard cubic
centimeters per minute (sccm) and more preferably 100-2000 sccm.
The flow rate may of course, vary, depending upon the particular
application.
[0023] The system 100 further includes a transfer or buffer chamber
150 (FIG. 1) which houses a transfer robot 152. Once the
unprocessed substrate in the loadlock chamber 112 has been suitably
degassed and the chamber 112 has been pumped down to or about the
vacuum pressure of the transfer chamber 150, a slit valve 160 (FIG.
2) may be opened to provide access by the robot 152 to the interior
120 of the loadlock chamber 112. The transfer robot 152 removes the
unprocessed wafer or panel from the loadlock chamber and transfers
it to one or more of the processing chambers 170 arrayed around the
perimeter of the transfer chamber 150. The processing chambers 170
may perform a variety of processes with the substrate including
deposition of films by chemical vapor deposition or physical vapor
(sputtering) deposition, etching, cleaning or other processes. Once
the processing is complete, the transfer robot transfers the
processed substrate to a loadlock chamber 112. Following venting of
the loadlock chamber 112 to the pressure of the factory interface
104, the loadlock chamber 112 is opened on the factory interface
side and the staging robot 116 removes the processed substrate and
places it in a cassette. Preferably a positive pressure
differential is maintained between the loadlock chamber interior
and exterior while the factory interface side slit valve 118 is
opened as described above.
[0024] The loadlock chamber 112 functions as a pressure interface
chamber between the relatively low pressure of the transfer chamber
150 and the relatively high pressure of the factory interface area
104. The loadlock chamber 112 includes a pressure vessel 200 in
which the interior 120 may be pumped down to the pressure of the
transfer chamber 150. An exhaust port 202 is disposed through the
bottom of the loadlock chamber 112 and is connected to an onboard
vacuum pump 208 via an exhaust line 210. The onboard vacuum pump
208 is preferably disposed below the loadlock chamber 112 to pump
down the loadlock chamber 112. The pump 208 may be, for example, a
high vacuum turbo pump capable of providing milliTorr pressures
with very low vibration. One vacuum pump used to advantage is
available from BOC Edwards Vacuum Technology, Austin, Tex. However,
other pumps such as roughing pumps, cryogenic pumps or the like
could be used alone or in combination with one another.
[0025] In addition to the distributed gas injector inlet 130, the
loadlock chamber 112 may optionally have a second larger gas inlet,
referred to herein as a main gas inlet 220 which is disposed in a
wall of the loadlock chamber 112 to reduce the time needed to vent
the chamber interior up to the desired pressure level corresponding
to the factory interface pressure level. The main inlet 220 may,
like the gas injector inlet 130, be connected to a gas purge line
134 such as a nitrogen purge gas line, through a control valve 224.
The inlet 220 may be shaped to function as a gas diffuser to
distribute the purge gas along a larger surface area through a
plurality of gas diffuser ports 222 disposed along the length of
the inlet 220, thereby decreasing the time needed to vent the
loadlock chamber 112 up to the desired pressure level.
[0026] In the illustrated embodiment, the gas flow through the main
gas inlet 220 may be provided at a rate which provides a
substantially greater flow of gas into the chamber interior 120. In
some applications, the flow rate through the main inlet 220 may be
unregulated. Thus, the gas flow through the main inlet can provide
a "hard" or fast vent whereas the slower flow rate through the
injector 130 can provide a "soft" or more controlled vent. The flow
rate though the main inlet 220 may of course, vary, depending upon
the particular application.
[0027] It should be noted that the atmospheric volume within the
loadlock chamber 112 is desired to be as small as practical while
providing suitable volume for operation of the components contained
therein, thus providing for quick and efficient pump down and
venting of the loadlock chamber 112. In the illustrated embodiment,
the loadlock chamber 112 has a single processed substrate when the
chamber is vented up in pressure and has a single unprocessed
substrate when the chamber is pumped down in pressure. It is
appreciated that loadlock chambers which can accommodate a greater
number of substrates may be used as well.
[0028] The pressure vessel 200 of the loadlock chamber 112 includes
an access port 230 through which processed and unprocessed
substrates are passed between the loadlock chamber 112 and the
factory interface 104 when the slit valve 118 is opened. The access
port 230 may be sealed by the slit valve 118 in the closed position
(FIG. 5f) when the pressure within the chamber 112 is to be
lowered.
[0029] The staging robot 116 of the factory interface 104 places an
unprocessed substrate 232 on an unprocessed substrate support
structure indicated schematically at 234 in the loadlock chamber
112. In the illustrated embodiment, the support structure 234 in
the illustrated embodiment, has a lower position (FIG. 5e) which
provides clearance for the lateral movements of the staging robot
blade carrying the unprocessed substrate. Once the robot 116 has
positioned the unprocessed substrate 232 over the support structure
234, the support structure 234 can be raised to lift the
unprocessed substrate from the robot blade, permitting the robot
blade of the robot 116 to be removed from the chamber. It is
appreciated that other structures and mechanisms may be used to
load, remove and support the substrates within the chamber.
[0030] In the illustrated embodiment, the loadlock chamber 112 has
a heater 240 which may be used to heat and degas the unprocessed
substrates prior to the transfer of the unprocessed substrates to
the transfer chamber 150 for processing in the process chambers
170. The heater 240 may be disposed within the chamber interior or
alternatively may be positioned on the exterior of the loadlock
chamber adjacent to a chamber window through which heat energy may
be transferred into the chamber interior. If a window is utilized,
the window is preferably made of quartz but may be made of any
suitable material which is substantially transparent or conductive
of thermal energy.
[0031] Preferably, the heater 240 includes conventional resistive
heating lamps. Alternatively, the unprocessed substrate support
structure may include resistive heating elements disposed thereon
or embedded therein to heat the substrates and the chamber interior
prior to transferring the unprocessed substrate to the transfer
chamber.
[0032] As previously mentioned, the loadlock chamber 112 has a
cooling plate 140 upon which a processed substrate may be cooled
prior to being transferred to the factory interface area 104. The
cooling plate may be shaped so as to optimize cooling depending
upon the particular application. Other structures may also be used
to cool the processed substrates and alternatively, the cooling
structure may be omitted. Lift pins or other structures may be used
to lift the processed substrate from the cooling plate prior to
transfer to the staging robot 116. Conversely, the transfer robot
152 can deposit a processed substrate onto the cooling plate lift
pins which then lower the processed substrate onto the cooling
plate or other support structure. The injector 130 may assist in
cooling the processed substrate in addition to dislodging particles
from the surface of the substrate.
[0033] The operations of the system 100 are controlled by a
controller 250 which, in the illustrated embodiment, is a
programmed workstation. It is appreciated that other types of
controllers may be used including dedicated control circuitry. In
operation, a processed substrate 142 is transferred from the buffer
chamber 150 by the transfer robot 152 and is deposited onto the
cooling plate 140 of the load lock chamber 112 as indicated in
FIGS. 5a and 5b described in step 260 of FIG. 4a. An unprocessed
substrate 232 may also be unloaded from the load lock chamber 112
by the transfer robot 152 as indicated in process step 262 and FIG.
5b, for processing in the process chambers 170. The buffer side
slit valve 160 may then be sealed (step 264, FIG. 5c) and the
control valve 144 may be opened to admit the purge gas into the
chamber interior 120 through the gas injector as indicated into
step 264 and FIG. 5c.
[0034] In the illustrated embodiment, the flow rate through the
injector 130 is regulated by the regulator 146 to provide a
relatively slow or soft vent. To increase the overall venting rate,
the control valve 244 may be opened as well to admit the purge gas
into the chamber interior 120 through the main gas inlet 220 as
indicated in step 266 and FIG. 5d.
[0035] Once the chamber interior 120 has reached a pressure which
is approximately the same as but more preferably is somewhat higher
than that of the chamber exterior 122, the control valve 224 may be
closed (step 268, FIG. 4b) to terminate the fast vent as shown in
FIG. 5e. In addition, the factory interface side slit valve 118 may
be opened to permit an unprocessed substrate to be placed into the
chamber 112 by the factory interface side robot 116. However, it is
preferred that the control valve 144 remain open while the slit
valve 118 is open to ensure a positive pressure differential
between the chamber interior and exterior through the open slit
valve 118. It is believed that such an arrangement inhibits the
flow of oxygen or other contaminants into the chamber interior 120
while the slit valve 118 is open. At this time, the processed
substrate 142 may be removed (step 270) from the chamber as shown
in FIG. 5f and placed in a cassette 108 by the robot 116 (FIG.
1).
[0036] The factory side slit valve 118 may then be sealed (step
272) as shown in FIG. 5g and the control valve 144 may also be
closed to terminate the flow of purge gas through the slow vent
injector 130. In addition, pumping may be initiated to lower the
pressure in the chamber interior. Still further, the heater 240 may
be activated to begin degassing the unprocessed substrate within
the chamber. Because oxidation of the substrate may be enhanced by
heating the substrate, it is often desired to defer initiation of
the degas process until the loadlock chamber has been pumped down
sufficiently to remove a substantial portion of any oxygen which
may have entered the chamber while the factory side slit valve is
open.
[0037] In many applications, degassing may be initiated at a low
pressure such as 1 or 1.5 Torr. If the pressure at which pumping
begins is approximately 760 Torr, a significant amount of time may
be expended pumping the chamber pressure down to the 1 Torr range
before initiating degassing. However, in accordance with one aspect
of the present invention, it is believed that the pressure at which
degassing may be initiated without an unacceptable degree of
oxidation can be substantially higher, that is, substantially
earlier, when, in the earlier step, a positive pressure gradient is
maintained by pumping purge gas into the chamber interior while the
factory side slit valve is open. The higher the pressure at which
degassing is initiated, the longer the duration of time available
for degassing before the final evacuation pressure is reached. In
some applications, it is anticipated that degassing may be
initiated at a pressure in the range of 10-760 Torr. As a
consequence, degassing may be terminated more early or may be
conducted for a longer length of time, depending upon the
application.
[0038] Once the pressure of the transfer chamber has been reached
(step 274) and the degassing operation is complete, the transfer
chamber side slit valve 160 may be opened as shown in FIG. 5h. The
process may then be repeated by loading (step 260) a new processed
substrate 142 (FIG. 5a) and unloading (step 262) the unprocessed
and degassed substrate 232 from the chamber 112 through the open
transfer chamber side slit valve 160.
[0039] It will, of course, be understood that modifications of the
illustrated embodiments, in their various aspects, will be apparent
to those skilled in the art, some being apparent only after study,
others being matters of routine mechanical and electronic design.
Other embodiments are also possible, their specific designs
depending upon the particular application. As such, the scope of
the invention should not be limited by the particular embodiments
described herein but should be defined by the appended claims and
equivalents thereof.
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