U.S. patent application number 10/401640 was filed with the patent office on 2003-10-02 for methods and apparatus for determining an etch endpoint in a plasma processing system.
Invention is credited to Dassapa, M.J. Francois Chandrasekar, Hudson, Eric A., Wiepking, Mark, Winniczek, Jaroslaw W..
Application Number | 20030183335 10/401640 |
Document ID | / |
Family ID | 22594268 |
Filed Date | 2003-10-02 |
United States Patent
Application |
20030183335 |
Kind Code |
A1 |
Winniczek, Jaroslaw W. ; et
al. |
October 2, 2003 |
Methods and apparatus for determining an etch endpoint in a plasma
processing system
Abstract
Methods and apparatus for ascertaining the end of an etch
process while etching through a target layer on a substrate in a
plasma processing system which employs an electrostatic chuck. The
end of the etch process is ascertained by monitoring the electric
potential of the substrate to detect a pattern indicative of the
end of the etch process. By the way of example, changes to this
potential may be observed by monitoring the current flowing to the
pole of the electrostatic chuck. Upon ascertaining the pattern
indicative of the end of the etch process, for example by
monitoring the current signal, a control signal is produced to
terminate the etch. If a bias compensation power supply is provided
to keep the currents flowing to the poles of the electrostatic
chuck substantially equal but opposite in sign throughout the etch,
the compensation voltage output by the bias compensation power
supply may be monitored for the aforementioned pattern indicative
of the end of the etch process in order to terminate the etch.
Inventors: |
Winniczek, Jaroslaw W.;
(Daly City, CA) ; Dassapa, M.J. Francois
Chandrasekar; (Fremont, CA) ; Hudson, Eric A.;
(Berkeley, CA) ; Wiepking, Mark; (Santa Clara,
CA) |
Correspondence
Address: |
BEYER WEAVER & THOMAS LLP
P.O. BOX 778
BERKELEY
CA
94704-0778
US
|
Family ID: |
22594268 |
Appl. No.: |
10/401640 |
Filed: |
March 27, 2003 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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10401640 |
Mar 27, 2003 |
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09792376 |
Feb 23, 2001 |
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6562187 |
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09792376 |
Feb 23, 2001 |
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09164389 |
Sep 30, 1998 |
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6228278 |
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Current U.S.
Class: |
156/345.1 ;
257/E21.528 |
Current CPC
Class: |
H01L 22/26 20130101;
H01J 37/32935 20130101; H01J 37/32963 20130101 |
Class at
Publication: |
156/345.1 |
International
Class: |
C23F 001/00; H01L
021/306 |
Claims
What is claimed is:
1. An endpointing arrangement for ascertaining an end of an etch
process while etching through a target layer on a substrate in a
plasma processing system, comprising: an electrostatic chuck having
a first pole and a second pole; a first DC power supply coupled to
said first pole and said second pole for supplying chucking
voltages to said first pole and said second pole; a first current
monitoring circuit coupled between said first pole and said first
DC power supply for monitoring a first current supplied to said
first pole, said first current monitoring circuit outputting a
first signal indicative of said first current; a second current
monitoring circuit coupled between said second pole and said first
DC power supply for monitoring a second current supplied to said
second pole, said second current monitoring circuit outputting a
second signal indicative of said second current; a differential
amplifier arrangement coupled to said first current monitoring
circuit and said second current monitoring circuit, said
differential amplifier arrangement receives said first signal and
said second signal as input and outputs a control signal; a
variable DC power supply coupled to said differential amplifier
arrangement for receiving said control signal, said variable DC
power supply being configured to output a compensation voltage for
biasing said first DC power supply responsive to said control
signal; and an endpoint monitoring circuit coupled to said variable
DC power supply, said endpoint monitoring circuit receives as an
input said compensation voltage and includes circuitry for
analyzing said compensation voltage for a pattern characteristic of
said end of said etch process, said endpoint monitoring circuit
further including circuitry for outputting an endpoint signal
indicative of said end of said etch process upon ascertaining said
pattern in said compensation voltage.
2. The endpointing arrangement of claim 1 wherein said compensation
voltage biases said first DC power supply to maintain said first
current and said second current substantially constant during said
etch process.
3. A method for ascertaining an end of an etch process while
etching through a target layer on a substrate in a plasma
processing system, said plasma processing system including an
electrostatic chuck having a first pole, a first DC power supply
coupled to said first pole for supplying a chucking voltage to said
first pole, a first current monitoring circuit coupled between said
first pole and said first DC power supply for monitoring a first
current supplied to said first pole, said first current monitoring
circuit outputting a first signal indicative of said first current,
and a variable DC power supply configured to output a compensation
voltage for biasing said first DC power supply responsive to said
first signal, thereby causing said chucking voltage to vary
responsive to said compensation voltage, said method comprising:
coupling an endpoint monitoring circuit to said variable DC power
supply, said endpoint monitoring circuit having an endpoint
monitoring input and an endpoint monitoring output; receiving at
said endpoint monitoring input said compensation voltage;
analyzing, using said endpoint monitoring circuit, said
compensation voltage for a pattern characteristic of said end of
said etch process; and outputting at said endpoint monitoring
output an endpoint signal indicative of said end of said etch
process upon ascertaining said pattern in said compensation
voltage.
4. The method of claim 3 wherein said electrostatic chuck includes
a second pole coupled to said first DC power supply, said plasma
processing system includes a second current monitoring circuit
coupled between said second pole and said first DC power supply for
monitoring a second current supplied to said second pole, wherein
said compensation voltage output by said variable DC power supply
is responsive to both said first signal and a second signal output
by said second current monitoring circuit, said second signal being
indicative of said second current.
5. The method of claim 4 wherein said plasma processing system
includes a differential amplifier arrangement coupled to said first
current monitoring circuit and said second current monitoring
circuit, said differential amplifier arrangement receives said
first signal and said second signal as input and outputs a control
signal to said variable DC supply to cause said compensation
voltage output by said variable DC power supply to vary responsive
to both said first signal and said second signal.
6. The method of claim 4 wherein said first signal and said second
signal is employed by said variable DC power supply to maintain
said first current and said second current substantially constant
during said etch process.
7. The method of claim 4 wherein said endpoint monitoring circuit
includes a general purpose microcomputer.
8. The method of claim 4 wherein said electrostatic chuck
represents a Johnsen-Rahbek chuck.
9. The method of claim 4 wherein said substrate includes a
conductive layer underlying said target layer.
10. The method of claim 4 wherein said substrate includes a
dielectric layer underlying said target layer.
11. The method of claim 4 wherein said target layer represents a
silicon dioxide-containing layer, said substrate further includes a
dielectric layer underlying said target layer.
12. The method of claim 4 wherein said target layer represents a
low dielectric constant layer, said substrate further includes a
dielectric layer underlying said target layer.
13. An endpointing arrangement for ascertaining an end of an etch
process while etching through a target layer on a substrate in a
plasma processing system, comprising: an electrostatic chuck having
a first pole; a first DC power supply coupled to said first pole
for supplying a chucking voltage to said first pole; a first
current monitoring circuit coupled between said first pole and said
first DC power supply for monitoring a first current supplied to
said first pole, said first current monitoring circuit outputting a
first signal indicative of said first current; a variable DC power
supply configured to output a compensation voltage for biasing said
first DC power supply responsive to said first signal, thereby
causing said chucking voltage to vary responsive to said
compensation voltage; an endpoint monitoring circuit coupled to
said variable DC power supply, said endpoint monitoring circuit
receives as an input said compensation voltage and includes
circuitry for analyzing said compensation voltage for a pattern
characteristic of said end of said etch process, said endpoint
monitoring circuit further including circuitry for outputting an
endpoint signal indicative of said end of said etch process upon
ascertaining said pattern in said compensation voltage.
14. The endpointing arrangement of claim 13 wherein said
electrostatic chuck includes a second pole coupled to said first DC
power supply, said endpointing arrangement further comprises: a
second current monitoring circuit coupled between said second pole
and said first DC power supply for monitoring a second current
supplied to said second pole, said second current monitoring
circuit outputting a second signal indicative of said second
current, wherein said compensation voltage output by said variable
DC power supply is responsive to both said first signal and said
second signal.
15. The endpointing arrangement of claim 14 wherein said
compensation voltage output by said variable DC power supply is
configured to keep said first current and said second current
substantially equal but opposite in sign.
16. The endpointing arrangement of claim 14 wherein said
compensation voltage output by said variable DC power supply is
configured to keep said first current and said second current
substantially constant throughout said etching irrespective whether
magnitudes of said first current and said second current are
equal.
17. The endpointing arrangement of claim 14 further comprising a
differential amplifier arrangement coupled to said first current
monitoring circuit and said second current monitoring circuit, said
differential amplifier arrangement receives said first signal and
said second signal as input and outputs a control signal to said
variable DC supply to cause said compensation voltage output by
said variable DC power supply to vary responsive to both said first
signal and said second signal.
18. The endpointing arrangement of claim 14 wherein said endpoint
monitoring circuit includes a general purpose microcomputer.
19. The endpointing arrangement of claim 14 wherein said
electrostatic chuck represents a Johnsen-Rahbek chuck.
20. The endpointing arrangement of claim 14 wherein said substrate
includes a conductive layer underlying said target layer.
21. The endpointing arrangement of claim 14 wherein said substrate
includes a dielectric layer underlying said target layer.
22. The endpointing arrangement of claim 14 wherein said target
layer represents a silicon dioxide-containing layer, said substrate
further includes a dielectric layer underlying said target
layer.
23. An endpointing arrangement for ascertaining an end of an etch
process while etching through a target layer on a substrate in a
plasma processing system, comprising: an electrostatic chuck having
a first pole; a first DC power supply coupled to said first pole
for supplying a chucking voltage to said first pole; a first
current monitoring circuit coupled between said first pole and said
first DC power supply for monitoring a first current supplied to
said first pole, said first current monitoring circuit outputting a
first signal indicative of said first current; an endpoint
monitoring circuit coupled to said first current monitoring
circuit, said endpoint monitoring circuit receives as a first input
said first signal and includes circuitry for analyzing said first
signal for a pattern characteristic of said end of said etch
process, said endpoint monitoring circuit further including
circuitry for outputting an endpoint signal indicative of said end
of said etch process upon ascertaining said pattern in said first
signal.
24. The endpointing arrangement of claim 23 wherein said
electrostatic chuck includes a second pole coupled to said first DC
power supply, said endpointing arrangement further comprises: a
second current monitoring circuit coupled between said second pole
and said first DC power supply for monitoring a second current
supplied to said second pole, said second current monitoring
circuit outputting a second signal indicative of said second
current, wherein said endpoint monitoring circuit receives as a
second input said second signal, said endpoint signal being
responsive to both said first signal and said second signal.
25. The endpointing arrangement of claim 23 wherein said
electrostatic chuck represents a monopolar electrostatic chuck.
26. An endpointing arrangement for ascertaining an end of an etch
process while etching through a target layer on a substrate in a
plasma processing system, comprising: an electrostatic chuck having
a first pole and a second pole; a first DC power supply coupled to
said first pole and said second pole for supplying chucking
voltages to said first pole and said second pole; a first current
monitoring circuit coupled between said first pole and said first
DC power supply for monitoring a first current supplied to said
first pole, said first current monitoring circuit outputting a
first signal indicative of said first current; a second current
monitoring circuit coupled between said second pole and said first
DC power supply for monitoring a second current supplied to said
second pole, said second current monitoring circuit outputting a
second signal indicative of said second current; a differential
amplifier arrangement coupled to said first current monitoring
circuit and said second current monitoring circuit, said
differential amplifier arrangement receives said first signal and
said second signal as inputs and outputs a differential output
signal responsive to both said first signal and said second signal.
an endpoint monitoring circuit coupled to said differential
amplifier arrangement, said endpoint monitoring circuit receives as
an input said differential output signal and includes circuitry for
analyzing said differential output signal for a pattern
characteristic of said end of said etch process, said endpoint
monitoring circuit further including circuitry for outputting an
endpoint signal indicative of said end of said etch process upon
ascertaining said pattern in said differential output signal.
27. The endpointing arrangement of claim 26 wherein said
electrostatic chuck represents a Johnsen-Rahbek chuck.
28. The endpointing arrangement of claim 26 wherein said substrate
includes a conductive layer underlying said target layer.
29. The endpointing arrangement of claim 26 wherein said substrate
includes a dielectric layer underlying said target layer.
30. An endpointing arrangement for ascertaining an end of an etch
process while etching through a target layer on a substrate in a
plasma processing system, comprising: an electrostatic chuck having
a first pole and a second pole; a first DC power supply coupled to
said first pole and said second pole for supplying chucking
voltages to said first pole and said second pole; a first current
path coupled in parallel with outputs of said first DC power
supply; a first current monitoring circuit coupled to a node in
said first current path for monitoring a first current flowing to
said node, said first current monitoring circuit outputting a first
signal indicative of said first current; and an endpoint monitoring
circuit coupled to said first current monitoring circuit, said
endpoint monitoring circuit receives as an input said first signal
and includes circuitry for analyzing said first signal for a
pattern characteristic of said end of said etch process, said
endpoint monitoring circuit further including circuitry for
outputting an endpoint signal indicative of said end of said etch
process upon ascertaining said pattern in said first signal.
31. The endpointing arrangement of claim 30 wherein said first
current monitoring circuit is coupled in series between said node
and ground.
32. The endpointing arrangement of claim 30 further comprising a
variable DC power supply, said first current monitoring circuit is
coupled in series between said variable DC power supply and said
node.
33. An endpointing arrangement for ascertaining an end of an etch
process while etching through a target layer on a substrate in a
plasma processing system, comprising: an electrostatic chuck having
a first pole; a first DC power supply coupled to said first pole
for supplying a chucking voltage to said first pole; an endpoint
monitoring circuit configured to receive a signal reflecting a
potential of said substrate, said endpoint monitoring circuit
including circuitry configured to analyze said signal reflecting
said potential of said substrate for a pattern characteristic of
said end of said etch process, said endpoint monitoring circuit
further including circuitry for outputting an endpoint signal
indicative of said end of said etch process upon ascertaining said
signal reflecting said potential of said substrate.
34. The endpointing arrangement of claim 33 wherein said signal
reflecting said potential of said substrate is obtained by a probe
in contact with said substrate.
Description
BACKGROUND OF THE INVENTION
[0001] The present invention relates to the manufacture of
semiconductor devices. More particularly, the present invention
relates to improved techniques for ascertaining the end of an etch
process for endpointing purposes while etching through a selected
layer on a substrate.
[0002] In the manufacture of semiconductor devices, such as
integrated circuits or flat panel displays, the substrate (e.g.,
the wafer or the glass panel) may be processed in a plasma
processing chamber. Processing may include the deposition of layers
of materials on the substrate and the selective etching of the
deposited layer(s). To prepare a layer for etching, the substrate
surface is typically masked with an appropriate photoresist or hard
mask. During etching, a plasma is formed from the appropriate
etchant source gas to etch through regions unprotected by the mask.
The etching is terminated once it is determined that the target
layer is etched through. This termination of the etch is typically
referred to as the etch "endpoint."
[0003] To determine when to terminate an etch, many techniques have
been employed in the art. By way of example, the etch may be
terminated upon the expiration of a predefined period of time. The
predefined period of time may be empirically determined in advance
by etching a few sample substrates prior to the production run.
However, there is no allowance made for substrate-to-substrate
variations as there is no feedback control.
[0004] More commonly, the end of an etch process may be dynamically
ascertained by monitoring the optical emission of the plasma. When
the target layer is etched through, the optical emission of the
plasma may change due to the reduced concentration of the etch
byproducts, the increased concentration of the etchants, the
increased concentration of the byproducts formed by reaction with
the material(s) of the underlayer, and/or due to the change in the
impedance of the plasma itself.
[0005] It has been found, however, that the optical emission-based
technique has some disadvantages. By way of example, the use of
some etchants and/or additive gases interferes with the optical
emission endpoint technique, giving rise to inaccurate readings. As
a further example, as the feature sizes decrease, the amount of
film exposed to the plasma through openings in the mask is also
reduced. Accordingly, the amount of byproduct gases that is formed
from reactions with the exposed film reduces, rendering signals
that rely on plasma optical emission less reliable.
[0006] It has been found that, as the target layer etch is
completed and the underlayer is exposed to the plasma, the
self-induced bias of the substrate may change. By way of example,
for the etch of a dielectric target layer, the self-induced bias of
the substrate is observed to change as a conductive underlayer is
exposed to the plasma. As a further example, for the etch of a
conductive target layer, the self-induced bias of the substrate is
observed to change when a dielectric underlayer is exposed to the
plasma. By monitoring the change in the self-induced bias of the
substrate, the end of the etch process may be ascertained for
endpointing purposes.
[0007] To facilitate discussion, FIG. 1 illustrates a typical
endpointing arrangement wherein the self-induced bias on the wafer
is monitored to determine when the target layer is etched through
for the purpose of endpointing the etch. As shown in FIG. 1, a
wafer 102 is shown disposed on an electrode 104, which is typically
made of a metallic material. Electrode 104, which functions as a
chuck in this example, is energized by an RF power source 106
through a capacitor 108. During etching, the self-induced bias on
wafer 102 is detected at a node 110 through a monitoring circuit
112. Monitoring circuit 112 include a low pass filter 114, which
blocks the RF component of the signal and allows only the DC
component to pass through. Since the self-induced bias on the wafer
tends to be in the hundreds of volts, the signal that is passed
through low pass filter 114 is typically stepped down through a
voltage divider circuit to allow the monitoring electronics (not
shown to simplify the discussion) to monitor the change in the
self-induced bias on wafer 102. This information pertaining to
changes in the self-induced bias on the wafer allows the
endpointing electronics to determine when the etch should be
terminated.
[0008] However, the sensitivity and accuracy of the monitoring
technique discussed in FIG. 1 may degrade as the percentage of the
target film exposed to the plasma decreases and/or if the DC
conductivity between the plasma and the electrode is decreased
(e.g., due to the presence of a dielectric layer underlying the
target layer to be etched). Furthermore, the monitoring technique
of FIG. 1 is typically ineffective when electrostatic chucks are
employed. This is because electrostatic chucks typically employ a
dielectric layer between the conductive chuck body and the
substrate. The presence of this dielectric layer interferes with
the current path between the plasma and the chuck, rendering it
very difficult to accurately determine the self-induced bias on the
wafer at node 110. Furthermore, the relationship between the
voltage detected at node 110 and the self-induced bias on wafer 102
is not linear. By way of example, the resistance of the
electrostatic chuck depends, in part, on the voltage existing on
the chuck. Accordingly even if a signal can be detected at node
110, it is difficult to correlate the signal detected with the
self-induced bias on the substrate for endpointing purposes.
[0009] In view of the foregoing, there are desired improved
techniques for detecting the end of a plasma etch process for
endpointing purposes.
SUMMARY OF THE INVENTION
[0010] The invention relates to methods and apparatus for
ascertaining the end of an etch process while etching through a
target layer on a substrate in a plasma processing system. This
invention exploits the change in the electric potential of the
substrate which, for many different etch applications, corresponds
to the end of the etch process. In one embodiment, the endpointing
arrangement includes a current monitoring circuit configured to
monitor the current flowing to a pole of the electrostatic chuck to
detect a pattern indicative of the end of the etch process. Upon
ascertaining the pattern indicative of the end of the etch process
in the current signal, a control signal is produced to terminate
the etch.
[0011] In another embodiment, the chuck represents a bipolar
electrostatic chuck and currents flowing to both poles of the
electrostatic chucks are monitored for the aforementioned pattern
indicative of the end of the etch process in order to terminate the
etch. In yet another embodiment, the differential of the currents
supplied to the poles of the electrostatic chuck is monitored for
the aforementioned pattern indicative of the end of the etch
process in order to terminate the etch.
[0012] In yet another embodiment, the electrostatic power supply
includes a bias compensation power supply, which monitors currents
supplied to the electrostatic chuck poles and outputs a
compensation voltage responsive thereto. The compensation voltage
is then input into the chuck power supply in order to keep the
currents supplied to the poles substantially equal but opposite in
sign throughout the etch. In this embodiment, the compensation
voltage is monitored for the aforementioned pattern indicative of
the end of the etch process in order to terminate the etch.
[0013] These and other advantages of the present invention will
become apparent upon reading the following detailed descriptions
and studying the various drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0014] The present invention is illustrated by way of example, and
not by way of limitation, in the figures of the accompanying
drawings and in which like reference numerals refer to similar
elements and in which:
[0015] FIG. 1 illustrates a typical endpointing arrangement wherein
the self-induced bias on the wafer is monitored to determine when
the target layer is etched through for the purpose of endpointing
the etch.
[0016] FIG. 2 is a simplified illustration of a compensation
arrangement for keeping the currents supplied to the chuck poles
substantially equal in magnitude but opposite in sign as the etch
progresses.
[0017] FIG. 3 illustrates a typical compensation voltage as the
etch progresses through the target layer.
[0018] FIG. 4 illustrates, in accordance with one embodiment of the
present invention, a simplified arrangement for monitoring the
compensation voltage for the purpose of endpointing the etch.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0019] The present invention will now be described in detail with
reference to a few preferred embodiments thereof as illustrated in
the accompanying drawings. In the following description, numerous
specific details are set forth in order to provide a thorough
understanding of the present invention. It will be apparent,
however, to one skilled in the art, that the present invention may
be practiced without some or all of these specific details. In
other instances, well known process steps and/or structures have
not been described in detail in order to avoid unnecessarily
obscuring the present invention.
[0020] It is appreciated by the inventors herein that as the etch
progresses through a target layer, and particularly as the target
layer is etched through to the underlayer, the electric potential
of the substrate changes. The change in the substrate potential is
particularly pronounced at the end of the etch. While not wishing
to be bound by theory, it is believed that, as the target layer is
etched through, the capacitive and resistive coupling between the
substrate and the plasma changes. As one possible explanation, the
self-induced bias on the substrate may change due to the increased
current leakage between the plasma and the substrate as the etch
features (such as vias or trenches) are etched down to a stop
layer. It is also possible that the properties of the plasma itself
are changed as the target layer is etched through. This change
brings about a change in the plasma impedance, which in turn
changes the self-induced bias on the substrate.
[0021] When an electrostatic chuck is employed in the plasma
processing system, direct measurement of the substrate electric
potential is difficult, because the dielectric layer of the ESC
introduces a large resistance between the substrate and the
electrical measurement circuitry. The present invention overcomes
these difficulties.
[0022] It is appreciated by the inventors herein that changes in
the substrate electric potential cause variations in the current
flowing from the ESC power supply to the poles of the electrostatic
chuck. In one of the embodiments of the present invention, the
currents flowing to the poles of the electrostatic chuck are
monitored. In this manner, the change of substrate potential
associated with the end of the etch process may be ascertained, and
the information derived therefrom may be employed to endpoint the
etch.
[0023] More preferably, some electrostatic chuck power supplies
employ a compensation circuit to keep the currents flowing to the
poles of the electrostatic chucks substantially equal in magnitude
but opposite in sign. Compensation circuits are employed since if
electrostatic forces between the chuck poles and the overlying
substrate regions vary during an etch, inconsistent chucking,
inconsistent heat transfer, and undesirable etch results may occur.
In some systems, however, the compensation circuit may be employed
to keep the currents flowing to the poles of the electrostatic
chuck substantially constant (i.e., relatively unchanging even if
they are unequal throughout the etch).
[0024] In general, the compensation circuit typically monitors the
currents flowing to the poles of the electrostatic chuck and
provides a control signal to a variable bias compensation power
supply. When the currents flowing to the poles of the electrostatic
chuck poles change, the changing control signal varies the voltage
output by a bias compensation power supply. The voltage output by
the bias compensation power supply, referred to herein as the
compensation voltage, is then employed to offset the voltages
supplied to the chuck poles in order to keep the currents flowing
to the electrostatic chuck poles substantially equal in magnitude
but opposite in sign (or substantially constant in other systems as
mentioned earlier).
[0025] It is discovered by the inventors that the compensation
voltage changes as the etch progresses and typically changes
dramatically as the target layer is cleared, i.e., etched through.
In accordance with one embodiment of the present invention,
information regarding end of the etch process may be obtained by
monitoring the compensation voltage in order to endpoint the
etch.
[0026] To facilitate discussion, FIG. 2 is a simplified
illustration of a compensation arrangement for keeping the currents
supplied to the chuck poles substantially equal but opposite in
sign as the etch progresses. It should be kept in mind, however,
that while the compensation arrangement of the exemplary embodiment
functions to keep the currents supplied to the chuck poles
substantially equal but opposite in sign, the concepts disclosed
herein also apply equally to compensation arrangements that keep
the currents flowing to the poles substantially unchanging (i.e.,
relatively unchanging even if they are unequal throughout the
etch). The adaptation of the exemplary arrangement to work with
such a compensation circuit is well within the skills of one of
ordinary skills in the art given this disclosure.
[0027] With reference to FIG. 2, the object to be processed 200,
e.g. a wafer or glass panel, includes the target layer to be
etched, and is represented in a simplified manner by a photoresist
mask layer 202, a target layer 204, underlayer film or films 206,
and the substrate 207. Target layer 204 may represent any layer to
be etched through. In one example, target layer 204 represents a
silicon dioxide-containing layer such as a doped CVD (chemical
vapor deposition) or PECVD (plasma-enhanced chemical vapor
deposition) glass layer. In another example, target layer 204 may
represent a low dielectric constant (low-k dielectric) layer. In
yet another example, target layer 204 represents a metal layer or
polysilicon (doped or undoped) to be etched. Underlayer film or
films 206 may include any and all layers and/or structures that
underlie target layer 204. Underlayer film or films 206 may
include, for example, one or more conductive (metallic or doped
polysilicon) layers and/or one or more dielectric layers. By way of
example, an etch stop layer may be disposed immediately below
target layer 204 and may be formed of, for example, silicon
nitride, titanium silicide, or titanium nitride material. Substrate
207 represents the supporting material of the object to be etched,
for example, a wafer or glass panel. For the sake of discussion in
the present example, substrate 207 does not include the layers
and/or device structures which may be present on its surface, which
are instead represented by the aforementioned layers 202, 204, and
206. In some cases, the underlayer film or films 206 may be absent,
and the target layer 204 is disposed directly on the substrate
207.
[0028] In the example of FIG. 2 a Johnsen-Rahbek chuck is employed
although the invention is believed to work with any type of
electrostatic chuck such as monopole ESC chucks, multipole ESC
chucks of any configuration, or the like. The construction of a
Johnsen-Rahbek chuck is well known in the art and will not be
discussed in detail here for brevity's sake. Further, although the
chuck poles are of a concentric configuration in the example of
FIG. 2, the poles of the electrostatic chuck may assume any
configuration and/or geometry (e.g., inter-digitated). For the
concentric Johnsen Rahbek chuck of the example of FIG. 2, an outer
pole 208 and an inner pole 210 are embedded in a slightly
conductive layer 212, which may be formed of, for example, a
ceramic material that is lightly doped for conductivity. An RF
electrode 214, which is disposed below slightly conductive layer
212, is typically formed of a metallic material and is coupled to
an RF power supply 216 through a capacitor 218. To facilitate
chucking, the poles of chuck 220 are coupled to an electrostatic
power supply 222.
[0029] Electrostatic chuck power supply 222 includes a main power
supply 224, which supplies the DC chucking voltages to the poles of
chuck 220. Low pass filters to 230 and 232 are interposed between
poles 208 and 210 and electrostatic chuck power supply 222 to
couple main power supply 224 to poles 208 and 210 of chuck 220 and
to isolate RF power 216 from power supply 222. Current monitoring
circuits 234 and 236 are coupled in series with the current paths
between the poles of the electrostatic chuck and ESC power supply
222 to monitor the currents in these legs.
[0030] Each of current monitor circuits 234 and 236 may be
implemented by a simple resistive arrangement, and the potential
difference across each may be ascertained to determine the current
flowing to each of poles 208 and 210. The outputs of current
monitor circuits 234 and 236 are input into a comparator circuit
238, which may represent, for example, a differential amplifier
circuit. Comparator circuit 238 outputs a control signal 240 for
controlling a variable bias compensation power supply 242. Bias
compensation power supply 242 changes its output responsive to
control signal 240. The output of bias compensation power supply
242 is employed to bias main power supply 224 to keep the currents
flowing to poles 208 and 210 substantially equal in magnitude and
opposite in sign. The arrangement of FIG. 2, including the bias
compensation arrangement in electrostatic chuck power supply 222,
is well known in the art.
[0031] As target layer 204 is etched through, the compensation
voltage at node 250 changes as the compensation circuit attempts to
keep the currents flowing to poles 208 and 210 substantially equal.
It is appreciated by the inventors herein that the information
contained in the compensation voltage, which is found either in
control signal 240 or at node 250 at the output of bias
compensation power supply 242, includes information pertaining the
progress of the etch and particularly pertaining when the end of
the etch occurs. This is because, as explained earlier, the
electric potential of the substrate 207 changes as the etch
progresses, and causes the currents flowing to each of the poles
208 and 210 to change. These changes are detected by current
monitor circuits 234 and 236 to produce a control signal 240, which
serves as the feedback signal to bias compensation power supply
242, whose job it is to bias main power supply 224 to keep the
currents flowing to poles 208 and 210 substantially equal.
[0032] FIG. 3 illustrates a typical compensation voltage as the
etch progresses through the target layer. At point 302, the etch
begins on compensation voltage plot 300. As the etch progress, the
compensation voltage changes. Although the change is illustrated in
FIG. 3 by an increasing compensation voltage, the compensation
voltage may change in other ways, such as decreasing, as the etch
progresses in other substrates. As the etch clears the target
layer, a significant change in the compensation voltage is
typically observed. Although the end of the etch is evidenced by a
steep upward slope in the vicinity of region 304 in FIG. 3, the end
of the etch may also be evidenced (in other etch processes) by a
sharp downward slope, a spike or a sudden dip in the signal.
Irrespective of the exact shape of the compensation voltage plot at
the time the etch ends, the end of the etch is typically evidenced
by a clearly discernible change in the compensation voltage. The
specific characteristic shape of the compensation voltage plot at
the time the etch ends may be ascertained by performing sample
etches on sample wafers. Thereafter, the monitoring circuitry may
be instructed to look for the ascertained characteristic shape in
the compensation plot that signals the end of the etch for
endpointing purposes.
[0033] FIG. 4 illustrates, in accordance with one embodiment of the
present invention, a simplified arrangement for monitoring the
compensation voltage for the purpose of endpointing the etch. In
FIG. 4, the voltage at node 250 is input into endpoint monitoring
circuitry 402, which outputs an endpoint signal 404 when the
characteristic change indicative of the end of the etch process is
ascertained. Monitoring circuitry 402 may represent, for example,
programmable digital circuitry that has been programmed to analyze
the input compensation voltage signal and to output a control
signal 404 for endpointing the etch process. In one example,
monitoring circuitry 402 represents a general purpose digital
computer (e.g., a microcomputer) or a digital signal processor that
has been programmed to analyze the digitized compensation voltage
signal for changes indicative of the end of the etch process.
[0034] In accordance with another embodiment of the present
invention, it is also possible to monitor control signal 240 itself
for changes characteristic of the end of the etch for endpointing
purposes. In accordance with yet another embodiment of the present
invention, the currents through the legs themselves may be
monitored (by, for example, monitoring the outputs of current
monitor circuits 234 and 236) for changes in the current(s) that
are indicative of the end of the etch process. This latter
embodiment is particularly useful for chucks which do not employ
compensation circuitry.
[0035] In accordance with another embodiment of the present
invention, the difference in currents through the pole legs may be
monitored indirectly by the current monitoring circuit 248, even in
the absence of power supply 242.
[0036] As can be appreciated from the foregoing, many embodiments
of the invention take advantage of existing signals in the
electrostatic chuck power supply for the purpose of ascertaining
when the end of the etch occurs in order to terminate the etch. In
an indirect manner, changes in the currents supplied to the poles
of the electrostatic chuck are employed to ascertain the etch
progress for endpointing purposes. Unlike prior art techniques, the
endpointing technique of the present invention does not require
directly monitoring the self-induced bias of the substrate through
the electrode (as was done in the case of FIG. 1). Accordingly, the
technique works even with electrostatic chucks, which has a
nonconductive dielectric layer disposed between the wafer and the
body of the chuck.
[0037] In fact, the accurate determination of when the etch ends is
possible even if there is a nonconductive layer disposed between
the chuck's metallic body and the target layer. The presence of the
nonconductive dielectric layer, either as part of the electrostatic
chuck or within the substrate, would presumably have caused the
prior art endpointing circuitry of FIG. 1 to fail to accurately
provide an endpoint signal since the prior art technique depends on
the direct measurement of the self-induced bias on the substrate
through the electrode for endpointing purposes. Additionally, one
of ordinary skills in the art would have assumed that the presence
of a dielectric layer on the surface of the electrode and/or under
the target layer would block the electrical path, rendering the
direct monitoring of the self-induced bias on the substrate
impossible and/or very difficult. Since the present invention does
not rely on direct contact between the substrate and the electrode,
the presence of a such a dielectric layer does not prevent the
ascertaining of the end of the etch in the present invention.
[0038] It is also observed that the inventive endpointing technique
is highly sensitive and is capable of accurately providing
endpointing information even when etching substrates having a small
fraction (or percentage) of the target layer exposed to the etching
plasma. The sensitivity appears to increase if a conductive layer,
e.g., a conductive metal or doped polysilicon interconnect layer,
is disposed below the target layer to be etched. As alluded to
earlier, the sensitivity of the present technique is such that the
end of the etch process may be ascertained even if there is a
dielectric layer disposed under the target layer. Furthermore,
since endpointing does not depend on monitoring the optical
emission of the plasma, the inventive technique also works
irrespective of the etchant and/or additive gas employed.
[0039] While this invention has been described in terms of several
preferred embodiments, there are alterations, permutations, and
equivalents which fall within the scope of this invention. In
general, it is proposed that the endpoint data can be derived from
the changes in the substrate potential, which can in turn be
obtained by looking at various signals at various points in the
system. Thus, although the endpoint data can be ascertained by
monitoring the changes in the current(s) flowing to the pole(s) of
the ESC chuck (which reflect the changes in the substrate
potential), there are other ways of obtaining this substrate
potential-based endpoint data when an ESC chuck is involved. By way
of example, a probe which contacts the backside of the substrate or
some appropriate place on the substrate may be employed to measure
the substrate potential directly throughout the etch, and the probe
signal may be analyzed for changes indicative of the etch
termination for endpointing purposes.
[0040] As another example, the leakage flow rate of coolant gas
from the edges of the ESC chuck may be monitored during the etch,
as an indirect measure of the substrate electric potential. This
flow rate is dependent upon the clamping force of the ESC, which
is, in turn, dependent upon the potential difference(s) between the
ESC and the substrate. As the etch proceeds, detectable changes in
the flow rate may arise due to changes in the substrate potential.
In one embodiment, the leakage flow rate may be monitored in
conjunction with or as part of a pressure control arrangement which
supplies the coolant gas to the interface between the substrate and
the ESC. The flow rate signal may be analyzed for changes
indicative of the etch termination, for endpointing purposes.
[0041] In fact, given this disclosure, one of ordinary skills in
the art will readily recognize that changes in the substrate
potential impact other signals at various points in the plasma
processing system. With the knowledge imparted by this disclosure,
the identification of the possible signals and locations in a
specific plasma processing system that may be monitored to
ascertain the changes in the substrate potential is well within the
skills of one familiar with plasma processing equipment. It should
also be noted that there are many alternative ways of implementing
the methods and apparatuses of the present invention. It is
therefore intended that the following appended claims be
interpreted as including all such alterations, permutations, and
equivalents as fall within the true spirit and scope of the present
invention.
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