Yoshioka; Ken

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yoshioka; Ken.The latest application filed is for "resin composition for generating allylphenol-maleimide copolymer for electronic component protective film, and electronic component protective film comprising this copolymer".

Company Profile

1.63.91

Yoshioka; Ken - Fukui JP
YOSHIOKA; Ken - Nagano JP
Yoshioka; Ken - Hiroshima JP
Yoshioka; Ken - Fukui-shi JP
Yoshioka; Ken - Hikari JP
Yoshioka; Ken - Shizuoka JP
Yoshioka; Ken - Shizuoka City JP
Yoshioka; Ken - Hikari-shi JP
Yoshioka; Ken - Kanagawa JP
Yoshioka; Ken - Yamaguchi JP
Yoshioka, Ken - Shizuoka-shi JP
Yoshioka, Ken - Kudamatsu-shi JP
Yoshioka, Ken - Hamamatsu-shi JP
Yoshioka, Ken - Yamaguchi-ken JP
Yoshioka; Ken - Kudamatsu JP
Yoshioka; Ken - Hitachiota JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Screwless hinges for eyewear Grant 11,226,495 - Pol , et al. January 18, 2	2022-01-18
Resin Composition For Generating Allylphenol-maleimide Copolymer For Electronic Component Protective Film, And Electronic Component Protective Film Comprising This Copolymer App 20210388227 - OHTSUKA; Keiko ; et al.	2021-12-16
Vehicle seat device Grant 11,065,985 - Maekawa , et al. July 20, 2	2021-07-20
Screwless Hinges For Eyewear App 20200241319 - Pol; Alessandro ; et al.	2020-07-30
Vehicle Seat Device App 20200215935 - MAEKAWA; Yasuhiko ; et al.	2020-07-09
Plasma processing apparatus and plasma processing method Grant 9,378,929 - Maeda , et al. June 28, 2	2016-06-28
Plasma Processing Apparatus And Plasma Processing Method App 20150221477 - MAEDA; Kenji ; et al.	2015-08-06
Plasma processing apparatus Grant 9,039,865 - Yoshioka , et al. May 26, 2	2015-05-26
Method and apparatus for repairing an electrostatic chuck device, and the electrostatic chuck device Grant 9,017,786 - Yoshioka , et al. April 28, 2	2015-04-28
Plasma processing apparatus and plasma processing method Grant 8,951,385 - Maeda , et al. February 10, 2	2015-02-10
Plasma processing apparatus Grant 8,940,128 - Sakka , et al. January 27, 2	2015-01-27
Plasma processing apparatus and method Grant 8,795,467 - Nishio , et al. August 5, 2	2014-08-05
Plasma Processing Apparatus And Plasma Processing Method App 20130267098 - MAEDA; Kenji ; et al.	2013-10-10
Method And Apparatus For Repairing An Electrostatic Chuck Device, And The Electrostatic Chuck Device App 20120300357 - Yoshioka; Ken ; et al.	2012-11-29
Plasma Processing Apparatus App 20120273136 - Edamura; Manabu ; et al.	2012-11-01
Plasma processing method and plasma processing apparatus Grant 8,282,848 - Ohmoto , et al. October 9, 2	2012-10-09
Method and apparatus for repairing an electrostatic chuck device, and the electrostatic chuck device Grant 8,252,132 - Yoshioka , et al. August 28, 2	2012-08-28
Plasma processing apparatus Grant 8,231,759 - Edamura , et al. July 31, 2	2012-07-31
Manufacturing method in plasma processing apparatus Grant 8,092,637 - Kouzuma , et al. January 10, 2	2012-01-10
Plasma Processing Apparatus App 20120000774 - YOSHIOKA; Ken ; et al.	2012-01-05
Apparatus and method for plasma etching Grant 8,083,889 - Miya , et al. December 27, 2	2011-12-27
Plasma Processing Apparatus App 20110297320 - Sakka; Yusaku ; et al.	2011-12-08
Plasma processing apparatus and method Grant 8,062,473 - Nishio , et al. November 22, 2	2011-11-22
Plasma Processing Apparatus App 20110132540 - SAKKA; Yusaku ; et al.	2011-06-09
Plasma Processing Apparatus App 20110108194 - YOSHIOKA; Ken ; et al.	2011-05-12
Plasma Processing Apparatus App 20100294432 - EDAMURA; Manabu ; et al.	2010-11-25
Plasma processing method Grant 7,833,429 - Nishio , et al. November 16, 2	2010-11-16
Plasma Processing Apparatus App 20100263796 - Edamura; Manabu ; et al.	2010-10-21
Method And Apparatus For Repairing An Electrostatic Chuck Device, And The Electrostatic Chuck Device App 20100177455 - Yoshioka; Ken ; et al.	2010-07-15
Plasma processing apparatus Grant 7,744,721 - Edamura , et al. June 29, 2	2010-06-29
Plasma processing apparatus and method Grant 7,740,739 - Nishio , et al. June 22, 2	2010-06-22
Apparatus and method for plasma etching Grant 7,713,756 - Miya , et al. May 11, 2	2010-05-11
Plasma Processing Apparatus App 20100078130 - Edamura; Manabu ; et al.	2010-04-01
Plasma Processing Apparatus And Method App 20100018649 - Nishio; Ryoji ; et al.	2010-01-28
Plasma Processing Apparatus and Plasma Processing Method App 20090321017 - Tsubone; Tsunehiko ; et al.	2009-12-31
Uniformly Dispersed Photocatalyst Coating Liquid, Method For Producing Same, And Photocatalytically Active Composite Material Obtained By Using Same App 20090317624 - Yoshioka; Ken ; et al.	2009-12-24
Plasma processing apparatus and method Grant 7,608,162 - Ohmoto , et al. October 27, 2	2009-10-27
Apparatus And Method For Plasma Etching App 20090223633 - MIYA; Go ; et al.	2009-09-10
Vacuum Processing Apparatus And Semiconductor Manufacturing Line Using The Same App 20090220322 - Soraoka; Minoru ; et al.	2009-09-03
Manufacturing Method In Plasma Processing Apparatus App 20090218316 - KOUZUMA; Yutaka ; et al.	2009-09-03
Apparatus And Method For Plasma Etching App 20090095423 - MIYA; Go ; et al.	2009-04-16
Plasma Processing Apparatus And Method App 20090078375 - Nishio; Ryoji ; et al.	2009-03-26
Plasma processing method and plasma processing apparatus App 20080280451 - Ohmoto; Yutaka ; et al.	2008-11-13
Plasma Processing Apparatus And Plasma Processing Method App 20080236614 - YAKUSHIJI; Mamoru ; et al.	2008-10-02
Plasma Processing Apparatus App 20080170969 - Yoshioka; Ken ; et al.	2008-07-17
Vacuum Processing Apparatus And Semiconductor Manufacturing Line Using The Same App 20080138180 - Soraoka; Minoru ; et al.	2008-06-12
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 7,347,656 - Soraoka , et al. March 25, 2	2008-03-25
Plasma Processing Apparatus And Method App 20080023145 - Ohmoto; Yutaka ; et al.	2008-01-31
Plasma Processing Apparatus And Method App 20080011716 - NISHIO; Ryoji ; et al.	2008-01-17
Plasma Processing Apparatus And Method App 20080011425 - Nishio; Ryoji ; et al.	2008-01-17
Plasma processing apparatus Grant 7,288,166 - Ohmoto , et al. October 30, 2	2007-10-30
Semiconductor integrated circuit arrangement fabrication method Grant RE39,895 - Tokunaga , et al. October 23, 2	2007-10-23
Sample holding electrode and a plasma processing apparatus using the same App 20070209933 - Yoshioka; Ken ; et al.	2007-09-13
Apparatus And Method For Plasma Etching App 20070184563 - Miya; Go ; et al.	2007-08-09
Plasma processing method and plasma processing apparatus Grant 7,224,568 - Ishimura , et al. May 29, 2	2007-05-29
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 7,201,551 - Soraoka , et al. April 10, 2	2007-04-10
Method for operating a semiconductor processing apparatus Grant 7,183,715 - Kanno , et al. February 27, 2	2007-02-27
Wafer processing method Grant 7,138,606 - Kanno , et al. November 21, 2	2006-11-21
Plasma processing apparatus App 20060175016 - Edamura; Manabu ; et al.	2006-08-10
Plasma processing method and plasma processing apparatus App 20060171093 - Ishimura; Hiroaki ; et al.	2006-08-03
Surface processing method of a specimen and surface processing apparatus of the specimen Grant 7,049,243 - Ono , et al. May 23, 2	2006-05-23
Plasma processing method and apparatus App 20060032585 - Kai; Yoshitaka ; et al.	2006-02-16
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 6,962,472 - Soraoka , et al. November 8, 2	2005-11-08
Plasma processing apparatus App 20050224182 - Edamura, Manabu ; et al.	2005-10-13
Flexible metal laminate and heat-resistant adhesive composition App 20050175850 - Koyano, Ichirou ; et al.	2005-08-11
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20050175435 - Soraoka, Minoru ; et al.	2005-08-11
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 6,895,685 - Soraoka , et al. May 24, 2	2005-05-24
Flexible metal stacked body App 20050104214 - Maeda, Akihiro ; et al.	2005-05-19
Wafer stage for wafer processing apparatus Grant 6,895,179 - Kanno , et al. May 17, 2	2005-05-17
Plasma processing apparatus and method App 20050087305 - Nishio, Ryoji ; et al.	2005-04-28
Method for operating a semiconductor processing apparatus App 20050089625 - Kanno, Seiichiro ; et al.	2005-04-28
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield Grant 6,867,144 - Ohmoto , et al. March 15, 2	2005-03-15
Apparatus and method for plasma etching App 20050028934 - Miya, Go ; et al.	2005-02-10
Plasma processing apparatus Grant 6,850,012 - Edamura , et al. February 1, 2	2005-02-01
Plasma processing apparatus and method Grant 6,846,363 - Kazumi , et al. January 25, 2	2005-01-25
Plasma processing method and apparatus App 20050014380 - Kai, Yoshitaka ; et al.	2005-01-20
Weatherstrip for automobile Grant 6,837,005 - Arata , et al. January 4, 2	2005-01-04
Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method Grant 6,835,665 - Mise , et al. December 28, 2	2004-12-28
Surface processing method of a specimen and surface processing apparatus of the specimen App 20040259361 - Ono, Tetsuo ; et al.	2004-12-23
Plasma processing apparatus and method Grant 6,833,051 - Kazumi , et al. December 21, 2	2004-12-21
Semiconductor processing apparatus Grant 6,825,617 - Kanno , et al. November 30, 2	2004-11-30
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20040197169 - Soraoka, Minoru ; et al.	2004-10-07
Plasma processing apparatus and method App 20040173314 - Nishio, Ryoji ; et al.	2004-09-09
Semiconductor processing apparatus App 20040168767 - Kanno, Seiichiro ; et al.	2004-09-02
Plasma processing apparatus App 20040163595 - Edamura, Manabu ; et al.	2004-08-26
Plasma processing apparatus App 20040149385 - Ohmoto, Yutaka ; et al.	2004-08-05
Plasma processing apparatus and method Grant 6,759,338 - Ohmoto , et al. July 6, 2	2004-07-06
Plasma processing apparatus and method Grant 6,756,737 - Doi , et al. June 29, 2	2004-06-29
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20040118005 - Soraoka, Minoru ; et al.	2004-06-24
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 6,752,580 - Soraoka , et al. June 22, 2	2004-06-22
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 6,752,579 - Soraoka , et al. June 22, 2	2004-06-22
Wafer processing method App 20040076411 - Kanno, Seiichiro ; et al.	2004-04-22
Wafer stage for wafer processing apparatus App 20040055540 - Kanno, Seiichiro ; et al.	2004-03-25
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 6,705,828 - Soraoka , et al. March 16, 2	2004-03-16
Wafer processing apparatus, wafer stage, and wafer processing method App 20040045813 - Kanno, Seiichiro ; et al.	2004-03-11
Plasma processing method and apparatus for etching nonvolatile material App 20040040662 - Edamura, Manabu ; et al.	2004-03-04
Substrate processing apparatus and substrate processing method App 20040026036 - Shimeno, Kazuhiro ; et al.	2004-02-12
Specimen surface processing method Grant 6,677,244 - Ono , et al. January 13, 2	2004-01-13
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 6,672,819 - Soraoka , et al. January 6, 2	2004-01-06
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield Grant 6,649,021 - Ohmoto , et al. November 18, 2	2003-11-18
Wafer stage for wafer processing apparatus and wafer processing method Grant 6,646,233 - Kanno , et al. November 11, 2	2003-11-11
Wafer Stage For Wafer Processing Apparatus And Wafer Processing Method App 20030168439 - Kanno, Seiichiro ; et al.	2003-09-11
Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method App 20030170998 - Mise, Nobuyuki ; et al.	2003-09-11
Etching end point judging method, etching end point judging device, and insulating film etching method using these methods Grant 6,596,551 - Usui , et al. July 22, 2	2003-07-22
Plasma processing apparatus App 20030057845 - Edamura, Manabu ; et al.	2003-03-27
Method for processing specimens, an apparatus therefor and a method of manufacture of a magnetic head App 20030052079 - Yoshioka, Ken ; et al.	2003-03-20
Weatherstrip for automobile App 20030042752 - Arata, Mithuaki ; et al.	2003-03-06
Etching end point judging device App 20030036282 - Usui, Tatehito ; et al.	2003-02-20
Semiconductor wafer processing apparatus and method App 20030029572 - Kanno, Seiichiro ; et al.	2003-02-13
Semiconductor Wafer Processing Apparatus And Method App 20030030960 - Kanno, Seiichiro ; et al.	2003-02-13
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 6,519,504 - Soraoka , et al. February 11, 2	2003-02-11
Method for processing specimens Grant 6,491,832 - Yoshioka , et al. December 10, 2	2002-12-10
Plasma processing apparatus and method App 20020134510 - Kazumi, Hideyuki ; et al.	2002-09-26
Method for processing specimens, an apparatus therefor and a method of manufacture of a magnetic head App 20020129900 - Yoshioka, Ken ; et al.	2002-09-19
Plasma processing apparatus and method App 20020124963 - Kazumi, Hideyuki ; et al.	2002-09-12
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield App 20020127858 - Ohmoto, Yutaka ; et al.	2002-09-12
Plasma processing apparatus and method App 20020125828 - Doi, Akira ; et al.	2002-09-12
Plasma processing method App 20020123229 - Ono, Tetsuo ; et al.	2002-09-05
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20020099469 - Soraoka, Minoru ; et al.	2002-07-25
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20020091465 - Soraoka, Minoru ; et al.	2002-07-11
Plasma processing apparatus and method App 20020084035 - Kazumi, Hideyuki ; et al.	2002-07-04
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20020082744 - Soraoka, Minoru ; et al.	2002-06-27
Apparatus for processing specimens App 20020079057 - Yoshioka, Ken ; et al.	2002-06-27
Vacuum processing apparatus and semiconductor manafacturing line using the same App 20020068982 - Soraoka, Minoru ; et al.	2002-06-06
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20020062166 - Soraoka, Minoru ; et al.	2002-05-23
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20020062165 - Soraoka, Minoru ; et al.	2002-05-23
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20020061244 - Soraoka, Minoru ; et al.	2002-05-23
Plasma processing apparatus and method Grant 6,388,382 - Doi , et al. May 14, 2	2002-05-14
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20020028131 - Soraoka, Minoru ; et al.	2002-03-07
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield App 20020023716 - Ohmoto, Yutaka ; et al.	2002-02-28
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield App 20020025686 - Ohmoto, Yutaka ; et al.	2002-02-28
Glass guide App 20010054259 - Terasawa, Takayuki ; et al.	2001-12-27
Substrate processing apparatus and substrate processing method App 20010050146 - Shimeno, Kazuhiro ; et al.	2001-12-13
Adhesive for electronic parts and adhesive tape for electronic parts Grant 6,329,050 - Yoshioka , et al. December 11, 2	2001-12-11
Plasma processing apparatus and method App 20010042595 - Kazumi, Hideyuki ; et al.	2001-11-22
Plasma processing apparatus and method App 20010040009 - Kazumi, Hideyuki ; et al.	2001-11-15
Plasma processing apparatus and method App 20010037861 - Kazumi, Hideyuki ; et al.	2001-11-08
Plasma processing apparatus App 20010037857 - Kazumi, Hideyuki ; et al.	2001-11-08
Vacuum processing apparatus and semiconductor manufacturing line using the same App 20010025204 - Soraoka, Minoru ; et al.	2001-09-27
Vaccum processing apparatus and semiconductor manufacturing line using the same App 20010025207 - Soraoka, Minoru ; et al.	2001-09-27
Electrostatic chuck, and method of and apparatus for processing sample using the chuck App 20010019472 - Kanno, Seiichiro ; et al.	2001-09-06
Plasma processing apparatus and method App 20010019881 - Ohmoto, Yutaka ; et al.	2001-09-06
Plasma treatment device Grant 6,245,202 - Edamura , et al. June 12, 2	2001-06-12
Plasma processing apparatus and method Grant 6,180,019 - Kazumi , et al. January 30, 2	2001-01-30
Semiconductor integrated circuit arrangement fabrication method Grant 5,962,347 - Tokunaga , et al. October 5, 1	1999-10-05
Electrostatic chuck, and method of and apparatus for processing sample Grant 5,946,184 - Kanno , et al. August 31, 1	1999-08-31
Semiconductor integrated circuit arrangement fabrication method Grant 5,874,013 - Tokunaga , et al. February 23, 1	1999-02-23
Vacuum processing apparatus and semiconductor manufacturing line using the same Grant 5,855,726 - Soraoka , et al. January 5, 1	1999-01-05
Superconducting magnet abnormality detection and protection apparatus Grant 5,502,613 - Saitoh , et al. March 26, 1	1996-03-26
Coil structure and coil container Grant 5,343,180 - Fukumoto , et al. August 30, 1	1994-08-30