loadpatents
name:-0.061341047286987
name:-0.052349090576172
name:-0.016429901123047
WANG; Xikun Patent Filings

WANG; Xikun

Patent Applications and Registrations

Patent applications and USPTO patent grants for WANG; Xikun.The latest application filed is for "gate contact over active regions".

Company Profile
18.49.52
  • WANG; Xikun - Sunnyvale CA
  • Wang, Xikun - Sunyvale CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Gate Contact Over Active Regions
App 20210249270 - THAREJA; Gaurav ;   et al.
2021-08-12
High temperature RF heater pedestals
Grant 11,062,887 - Park , et al. July 13, 2
2021-07-13
Methods and apparatus for hybrid feature metallization
Grant 11,024,537 - Shaviv , et al. June 1, 2
2021-06-01
Gate contact over active processes
Grant 11,004,687 - Thareja , et al. May 11, 2
2021-05-11
Methods and apparatus for filling a feature disposed in a substrate
Grant 10,950,500 - Shaviv , et al. March 16, 2
2021-03-16
Methods And Apparatus For Hybrid Feature Metallization
App 20210043506 - Shaviv; Roey ;   et al.
2021-02-11
Selective cobalt removal for bottom up gapfill
Grant 10,770,346 - Wang , et al. Sep
2020-09-08
Gate Contact Over Active Processes
App 20200258744 - A1
2020-08-13
Methods And Apparatus For Filling A Feature Disposed In A Substrate
App 20200251340 - Kind Code
2020-08-06
Tantalum-containing material removal
Grant 10,727,080 - Wang , et al.
2020-07-28
Method for creating a fully self-aligned via
Grant 10,699,953 - Mullick , et al.
2020-06-30
Method and apparatus for reducing particle defects in plasma etch chambers
Grant 10,658,161 - Wang , et al.
2020-05-19
High Temperature Rf Heater Pedestals
App 20200090912 - Park; Soonam ;   et al.
2020-03-19
Method For Creating A Fully Self-Aligned Via
App 20190378756 - Mullick; Amrita B. ;   et al.
2019-12-12
Oxide and metal removal
Grant 10,465,294 - Wang , et al. No
2019-11-05
Method And Apparatus For Reducing Particle Defects In Plasma Etch Chambers
App 20190295826 - Wang; Xikun ;   et al.
2019-09-26
Selective Cobalt Removal For Bottom Up Gapfill
App 20190122923 - Wang; Xikun ;   et al.
2019-04-25
Selective tungsten removal
Grant 10,256,112 - Wang , et al.
2019-04-09
Methods of etching films with reduced surface roughness
Grant 10,233,547 - Schmiege , et al.
2019-03-19
Tantalum-containing Material Removal
App 20190013211 - Wang; Xikun ;   et al.
2019-01-10
Selective cobalt removal for bottom up gapfill
Grant 10,163,696 - Wang , et al. Dec
2018-12-25
Methods And Apparatus For Filling A Feature Disposed In A Substrate
App 20180323103 - Shaviv; Roey ;   et al.
2018-11-08
Selective in situ cobalt residue removal
Grant 10,049,891 - Wang , et al. August 14, 2
2018-08-14
Methods of Etching Films with Reduced Surface Roughness
App 20180195179 - Schmiege; Benjamin ;   et al.
2018-07-12
Selective Cobalt Removal For Bottom Up Gapfill
App 20180138085 - Wang; Xikun ;   et al.
2018-05-17
Cobalt-containing material removal
Grant 9,947,549 - Wang , et al. April 17, 2
2018-04-17
Cobalt-containing Material Removal
App 20180102259 - Wang; Xikun ;   et al.
2018-04-12
Methods of etching films with reduced surface roughness
Grant 9,896,770 - Schmiege , et al. February 20, 2
2018-02-20
Selective etch for metal-containing materials
Grant 9,711,366 - Ingle , et al. July 18, 2
2017-07-18
Metal removal with reduced surface roughness
Grant 9,659,791 - Wang , et al. May 23, 2
2017-05-23
High Aspect Ratio 3-d Flash Memory Device
App 20170110475 - Liu; Jie ;   et al.
2017-04-20
Methods Of Etching Films With Reduced Surface Roughness
App 20170096740 - Schmiege; Benjamin ;   et al.
2017-04-06
Selective titanium nitride removal
Grant 9,607,856 - Wang , et al. March 28, 2
2017-03-28
Tungsten separation
Grant 9,553,102 - Wang , et al. January 24, 2
2017-01-24
Metal Removal With Reduced Surface Roughness
App 20170018439 - Wang; Xikun ;   et al.
2017-01-19
Methods of etching films with reduced surface roughness
Grant 9,540,736 - Schmiege , et al. January 10, 2
2017-01-10
Aluminum selective etch
Grant 9,520,303 - Wang , et al. December 13, 2
2016-12-13
Chlorine-based hardmask removal
Grant 9,478,434 - Wang , et al. October 25, 2
2016-10-25
Plasma-free metal etch
Grant 9,472,417 - Ingle , et al. October 18, 2
2016-10-18
Vertical gate separation
Grant 9,449,846 - Liu , et al. September 20, 2
2016-09-20
Dry-etch for selective tungsten removal
Grant 9,412,608 - Wang , et al. August 9, 2
2016-08-09
Oxide And Metal Removal
App 20160222522 - Wang; Xikun ;   et al.
2016-08-04
Vertical Gate Separation
App 20160218018 - Liu; Jie ;   et al.
2016-07-28
Titanium nitride removal
Grant 9,373,522 - Wang , et al. June 21, 2
2016-06-21
Fluorine-based hardmask removal
Grant 9,355,862 - Pandit , et al. May 31, 2
2016-05-31
V trench dry etch
Grant 9,355,856 - Wang , et al. May 31, 2
2016-05-31
Selective Etch For Metal-containing Materials
App 20160118268 - Ingle; Nitin K. ;   et al.
2016-04-28
Oxide and metal removal
Grant 9,309,598 - Wang , et al. April 12, 2
2016-04-12
Gas-phase tungsten etch
Grant 9,299,575 - Park , et al. March 29, 2
2016-03-29
Selective etch for metal-containing materials
Grant 9,299,582 - Ingle , et al. March 29, 2
2016-03-29
Aluminum oxide selective etch
Grant 9,299,583 - Wang , et al. March 29, 2
2016-03-29
Chlorine-based Hardmask Removal
App 20160086816 - Wang; Xikun ;   et al.
2016-03-24
Fluorine-based Hardmask Removal
App 20160086815 - Pandit; Mandar ;   et al.
2016-03-24
V Trench Dry Etch
App 20160079072 - Wang; Xikun ;   et al.
2016-03-17
Titanium oxide etch
Grant 9,287,134 - Wang , et al. March 15, 2
2016-03-15
Tungsten Separation
App 20160056167 - Wang; Xikun ;   et al.
2016-02-25
Methods Of Etching Films With Reduced Surface Roughness
App 20160032460 - Schmiege; Benjamin ;   et al.
2016-02-04
Selective Titanium Nitride Removal
App 20150357205 - Wang; Xikun ;   et al.
2015-12-10
Oxide And Metal Removal
App 20150345028 - Wang; Xikun ;   et al.
2015-12-03
Metal Removal
App 20150345029 - Wang; Xikun ;   et al.
2015-12-03
Even tungsten etch for high aspect ratio trenches
Grant 9,190,293 - Wang , et al. November 17, 2
2015-11-17
Gas-phase Tungsten Etch
App 20150262829 - Park; Seung ;   et al.
2015-09-17
Titanium Oxide Etch
App 20150206764 - WANG; Xikun ;   et al.
2015-07-23
Dry-etch For Selective Tungsten Removal
App 20150179464 - Wang; Xikun ;   et al.
2015-06-25
Even Tungsten Etch For High Aspect Ratio Trenches
App 20150170935 - Wang; Xikun ;   et al.
2015-06-18
Selective titanium nitride removal
Grant 9,040,422 - Wang , et al. May 26, 2
2015-05-26
Plasma-free Metal Etch
App 20150129546 - Ingle; Nitin K. ;   et al.
2015-05-14
Selective Etch For Metal-containing Materials
App 20150129545 - Ingle; Nitin K. ;   et al.
2015-05-14
Aluminum Selective Etch
App 20150129541 - Wang; Xikun ;   et al.
2015-05-14
Dry-etch for selective tungsten removal
Grant 8,980,763 - Wang , et al. March 17, 2
2015-03-17
Tungsten oxide processing
Grant 8,951,429 - Liu , et al. February 10, 2
2015-02-10
Selective Titanium Nitride Removal
App 20140256131 - Wang; Xikun ;   et al.
2014-09-11
Dry-etch For Selective Tungsten Removal
App 20140154889 - Wang; Xikun ;   et al.
2014-06-05
Method And Apparatus For Reducing Particle Defects In Plasma Etch Chambers
App 20120091095 - WANG; Xikun ;   et al.
2012-04-19
Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal
Grant 8,016,948 - Wang , et al. September 13, 2
2011-09-13
Method for etching high dielectric constant materials
Grant 7,964,512 - Wang , et al. June 21, 2
2011-06-21
Solid yttrium oxide-containing substrate which has been cleaned to remove impurities
App 20110036874 - Wang; Xikun ;   et al.
2011-02-17
Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate
Grant 7,846,264 - Wang , et al. December 7, 2
2010-12-07
Device and method for etching flash memory gate stacks comprising high-k dielectric
Grant 7,780,862 - Shen , et al. August 24, 2
2010-08-24
Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal
App 20090025751 - Wang; Xikun ;   et al.
2009-01-29
Etch methods to form anisotropic features for high aspect ratio applications
Grant 7,368,394 - Shen , et al. May 6, 2
2008-05-06
Etch Methods To Form Anisotropic Features For High Aspect Ratio Applications
App 20080057729 - Shen; Meihua ;   et al.
2008-03-06
Device And Method For Etching Flash Memory Gate Stacks Comprising High-k Dielectric
App 20080011423 - SHEN; MEIHUA ;   et al.
2008-01-17
Device and method for etching flash memory gate stacks comprising high-k dielectric
App 20070224813 - Shen; Meihua ;   et al.
2007-09-27
Fluorine free integrated process for etching aluminum including chamber dry clean
Grant 7,270,761 - Wang , et al. September 18, 2
2007-09-18
Etch methods to form anisotropic features for high aspect ratio applications
App 20070199922 - Shen; Meihua ;   et al.
2007-08-30
Etch methods to form anisotropic features for high aspect ratio applications
App 20070202700 - Leucke; Uwe ;   et al.
2007-08-30
Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate
App 20070151581 - Wang; Xikun ;   et al.
2007-07-05
Cleaning method used in removing contaminants from the surface of an oxide or fluoride comprising a group III B metal
App 20070134416 - Wang; Xikun ;   et al.
2007-06-14
Method for etching high dielectric constant materials
App 20070042601 - Wang; Xikun ;   et al.
2007-02-22
Method and apparatus for cleaning a substrate processing chamber
App 20040200498 - Wang, Xikun ;   et al.
2004-10-14
Two-stage etching process
Grant 6,787,054 - Wang , et al. September 7, 2
2004-09-07
Fluorine free integrated process for etching aluminum including chamber dry clean
App 20040074869 - Wang, Xikun ;   et al.
2004-04-22
Self-cleaning etch process
Grant 6,699,399 - Qian , et al. March 2, 2
2004-03-02
Methods for etching an organic anti-reflective coating
Grant 6,649,532 - Chen , et al. November 18, 2
2003-11-18
Methods For Etching An Organic Anti-reflective Coating
App 20030209520 - Chen, Hui ;   et al.
2003-11-13
Cleaning ceramic surfaces
App 20030190870 - Shih, Hong ;   et al.
2003-10-09
Two-stage etching process
App 20030173333 - Wang, Xikun ;   et al.
2003-09-18
Two-stage self-cleaning silicon etch process
Grant 6,527,968 - Wang , et al. March 4, 2
2003-03-04
Self-cleaning etch process
Grant 6,136,211 - Qian , et al. October 24, 2
2000-10-24

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