TEGAL CORPORATION
Patent Applications and Registrations
Patent applications and USPTO patent grants for TEGAL CORPORATION.The latest application filed is for "nanolayer deposition process for composite films".
Company Profile
0.77.31
Trademarks
- TEGAL CORPORATION - Petaluma CA
- Tegal Corporation - N/A
- TEGAL CORPORATION - Petatuma CA
- TEGAL CORPORATION - 2201 South McDowell Boulevard Petaluma CA
- Tegal Corporation -
- Tegal Corporation - Novato CA
- Tegal Corp. - Novato CA
- Tegal Corporation - Richmond CA
Trademarks
Patent Activity
| Patent | Date |
|---|---|
| Nanolayer Deposition Process For Composite Films App 20120021138 - Ditizio; Robert Anthony ; et al. | 2012-01-26 |
| Apparatus And A Method For Controlling The Depth Of Etching During Alternating Plasma Etching Of Semiconductor Substrates App 20110120648 - Puech; Michel ; et al. | 2011-05-26 |
| Apparatus and a method for controlling the depth of etching during alternating plasma etching of semiconductor substrates Grant 7,892,980 - Puech , et al. February 22, 2 | 2011-02-22 |
| System and method for semiconductor processing Grant 7,867,905 - Nguyen , et al. January 11, 2 | 2011-01-11 |
| Nanolayer Deposition Using Bias Power Treatment App 20100285237 - Ditizio; Robert Anthony ; et al. | 2010-11-11 |
| Nanolayer Deposition Process App 20100190353 - Nguyen; Tue ; et al. | 2010-07-29 |
| Nanolayer deposition process Grant 7,713,592 - Nguyen , et al. May 11, 2 | 2010-05-11 |
| Plasma semiconductor processing system and method Grant 7,678,705 - Nguyen , et al. March 16, 2 | 2010-03-16 |
| Dry Etch Stop Process For Eliminating Electrical Shorting In Mram Device Structures App 20100022030 - Ditizio; Robert Anthony | 2010-01-28 |
| Dry etch stop process for eliminating electrical shorting in MRAM device structures Grant 7,645,618 - Ditizio January 12, 2 | 2010-01-12 |
| Stress adjustment in reactive sputtering App 20090242392 - Laptev; Pavel N. ; et al. | 2009-10-01 |
| Control of crystal orientation and stress in sputter deposited thin films App 20090246385 - FELMETSGER; Valery ; et al. | 2009-10-01 |
| Stress adjustment in reactive sputtering App 20090242388 - LAPTEV; Pavel N. ; et al. | 2009-10-01 |
| Reactor With Heated And Textured Electrodes And Surfaces App 20080318432 - DeOrnellas; Stephen P. ; et al. | 2008-12-25 |
| System for, and method of, etching a surface on a wafer Grant 7,467,598 - Laptev December 23, 2 | 2008-12-23 |
| Semiconductor processing system and method Grant 7,442,615 - Nguyen , et al. October 28, 2 | 2008-10-28 |
| Reactor with heated and textured electrodes and surfaces Grant 7,439,188 - DeOrnellas , et al. October 21, 2 | 2008-10-21 |
| High pressure chemical vapor trapping method Grant 7,425,224 - Nguyen September 16, 2 | 2008-09-16 |
| Plasma enhanced pulsed layer deposition Grant 7,361,387 - Nguyen April 22, 2 | 2008-04-22 |
| High-adhesive backside metallization App 20080083611 - Felmetsger; Valery | 2008-04-10 |
| Nanolayer Thick Film Processing System App 20070251451 - Nguyen; Tue ; et al. | 2007-11-01 |
| System for, and method of, etching a surface on a wafer Grant 7,270,729 - Laptev September 18, 2 | 2007-09-18 |
| Dry etch stop process for eliminating electrical shorting in MRAM device structures App 20070155027 - Ditizio; Robert Anthony | 2007-07-05 |
| Nanolayer thick film processing system and method Grant 7,235,484 - Nguyen , et al. June 26, 2 | 2007-06-26 |
| Plasma etch reactor and method Grant 7,223,699 - DeOrnellas , et al. May 29, 2 | 2007-05-29 |
| Permanent adherence of the back end of a wafer to an electrical component or sub-assembly Grant 7,208,396 - Felmetsger April 24, 2 | 2007-04-24 |
| Reactive sputtering of silicon nitride films by RF supported DC magnetron Grant 7,179,350 - Laptev , et al. February 20, 2 | 2007-02-20 |
| Integrated decoupling capacitor process App 20070026626 - Ditizio; Robert ; et al. | 2007-02-01 |
| System and method for processing a wafer including stop-on-aluminum processing Grant 7,169,623 - Ditizio January 30, 2 | 2007-01-30 |
| System and method for semiconductor processing App 20070020898 - Nguyen; Tue ; et al. | 2007-01-25 |
| Semiconductor processing system and method App 20070020945 - Nguyen; Tue ; et al. | 2007-01-25 |
| Method to plasma deposit on organic polymer dielectric film Grant 7,163,721 - Zhang , et al. January 16, 2 | 2007-01-16 |
| Assembly line processing method Grant 7,153,542 - Nguyen , et al. December 26, 2 | 2006-12-26 |
| Replaceable shielding apparatus Grant 7,115,169 - Nguyen October 3, 2 | 2006-10-03 |
| System and method for processing a wafer including stop-on-alumina processing App 20060186496 - Ditizio; Robert | 2006-08-24 |
| Multilayer copper structure for improving adhesion property Grant 7,087,522 - Nguyen August 8, 2 | 2006-08-08 |
| Removable lid and floating pivot Grant 7,074,278 - Nguyen , et al. July 11, 2 | 2006-07-11 |
| High pressure chemical vapor trapping method App 20060131363 - Nguyen; Tue | 2006-06-22 |
| Multi-thermal zone shielding apparatus Grant 7,049,549 - Nguyen , et al. May 23, 2 | 2006-05-23 |
| System and method for processing a wafer including stop-on-aluminum processing App 20060051881 - Ditizio; Robert | 2006-03-09 |
| Method and system for sequential processing in a two-compartment chamber App 20060046412 - Nguyen; Tue ; et al. | 2006-03-02 |
| Method and system for sequential processing in a two-compartment chamber App 20060040055 - Nguyen; Tue ; et al. | 2006-02-23 |
| High pressure chemical vapor trapping system Grant 6,998,097 - Nguyen February 14, 2 | 2006-02-14 |
| Method for using a hard mask for critical dimension growth containment Grant 6,958,295 - DeOrnellas , et al. October 25, 2 | 2005-10-25 |
| Plasma etch reactor and method App 20050164513 - DeOrnellas, Stephen P. ; et al. | 2005-07-28 |
| Method and system for sequential processing in a two-compartment chamber Grant 6,921,555 - Nguyen , et al. July 26, 2 | 2005-07-26 |
| Method to deposit an impermeable film on porous low-k dielectric film Grant 6,919,101 - Zhang , et al. July 19, 2 | 2005-07-19 |
| Plasma etch reactor and method Grant 6,905,969 - DeOrnellas , et al. June 14, 2 | 2005-06-14 |
| Method to deposit an impermeable film on porous low-k dielectric film App 20050084619 - Zhang, Zhihong ; et al. | 2005-04-21 |
| Redistributing radiation guide Grant 6,859,262 - Nguyen February 22, 2 | 2005-02-22 |
| Two-compartment chamber for sequential processing Grant 6,858,085 - Nguyen , et al. February 22, 2 | 2005-02-22 |
| Multi-thermal zone shielding apparatus Grant 6,844,527 - Nguyen , et al. January 18, 2 | 2005-01-18 |
| Plasma enhanced pulsed layer deposition App 20050005855 - Nguyen, Tue | 2005-01-13 |
| Multi-thermal zone shielding apparatus App 20040261722 - Nguyen, Tue ; et al. | 2004-12-30 |
| Cluster tool with a hollow cathode array Grant 6,830,664 - Clarke December 14, 2 | 2004-12-14 |
| Nanolayer thick film processing system and method App 20040224505 - Nguyen, Tue ; et al. | 2004-11-11 |
| Visual indicator cold trapping system Grant 6,800,254 - Nguyen , et al. October 5, 2 | 2004-10-05 |
| Method for minimizing the critical dimension growth of a feature on a semiconductor wafer Grant 6,774,046 - DeOrnellas , et al. August 10, 2 | 2004-08-10 |
| Nanolayer thick film processing system and method Grant 6,756,318 - Nguyen , et al. June 29, 2 | 2004-06-29 |
| Plasma etch reactor and method Grant 6,620,335 - DeOrnellas , et al. September 16, 2 | 2003-09-16 |
| Plasma etch reactor and method App 20020139665 - DeOrnellas, Stephen P. ; et al. | 2002-10-03 |
| Method for using a hard mask for critical dimension growth containment App 20020132485 - DeOrnellas, Stephen P. ; et al. | 2002-09-19 |
| Cobalt silicide etch process and apparatus Grant 6,391,148 - Marks , et al. May 21, 2 | 2002-05-21 |
| Reactor with heated and textured electrodes and surfaces App 20020036064 - DeOrnellas, Stephen ; et al. | 2002-03-28 |
| Plasma etch reactor having a plurality of magnets Grant 6,354,240 - DeOrnellas , et al. March 12, 2 | 2002-03-12 |
| Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing Grant 6,346,428 - Athavale , et al. February 12, 2 | 2002-02-12 |
| Plasma reactor with a deposition shield App 20010029894 - DeOrnellas, Stephen P. ; et al. | 2001-10-18 |
| Method for minimizing the critical dimension growth of a feature on a semiconductor wafer App 20010031561 - DeOrnellas, Stephen P. ; et al. | 2001-10-18 |
| Cobalt silicide etch process and apparatus App 20010003676 - Marks, Steven ; et al. | 2001-06-14 |
| Plasma etch reactor and method for emerging films Grant 6,190,496 - DeOrnellas , et al. February 20, 2 | 2001-02-20 |
| Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls Grant 6,127,277 - DeOrnellas , et al. October 3, 2 | 2000-10-03 |
| Plasma etch reactor and method for emerging films Grant 6,048,435 - DeOrnellas , et al. April 11, 2 | 2000-04-11 |
| Plasma reactor with a deposition shield Grant 6,006,694 - DeOrnellas , et al. December 28, 1 | 1999-12-28 |
| Integrated semiconductor wafer processing system Grant 5,672,239 - DeOrnellas September 30, 1 | 1997-09-30 |
| Mass flow stabilized Grant 4,958,658 - Zajac September 25, 1 | 1990-09-25 |
| Method and apparatus for low pressure plasma Grant 4,949,670 - Krogh August 21, 1 | 1990-08-21 |
| Plasma etch isotropy control Grant 4,889,588 - Fior December 26, 1 | 1989-12-26 |
| Ignitor for a microwave sustained plasma Grant 4,888,088 - Slomowitz December 19, 1 | 1989-12-19 |
| Spatula for wafer transport Grant 4,867,631 - Warenback , et al. September 19, 1 | 1989-09-19 |
| Cassette elevator for use in a modular article processing machine Grant 4,861,222 - Mirkovich August 29, 1 | 1989-08-29 |
| Modular article processing machine and method of article handling therein Grant 4,801,241 - Zajac , et al. January 31, 1 | 1989-01-31 |
| Plasma Reactor with removable insert Grant 4,793,975 - Drage December 27, 1 | 1988-12-27 |
| Magnetically coupled wafer lift pins Grant 4,790,258 - Drage , et al. December 13, 1 | 1988-12-13 |
| Xenon enhanced plasma etch Grant 4,786,359 - Stark , et al. November 22, 1 | 1988-11-22 |
| Non-uniform gas inlet for dry etching apparatus Grant 4,780,169 - Stark , et al. October 25, 1 | 1988-10-25 |
| Chrome mask etch Grant 4,774,164 - Peavey , et al. September 27, 1 | 1988-09-27 |
| Wafer cassette having multi-directional access Grant 4,727,993 - Mirkovich , et al. March 1, 1 | 1988-03-01 |
| Electrostatic wafer clamp Grant 4,724,510 - Wicker , et al. February 9, 1 | 1988-02-09 |
| Optical process for determining the endpoint of a process via analog multiplication of photocell signals Grant 4,720,628 - Drake, Jr. January 19, 1 | 1988-01-19 |
| Selective plasma etching during formation of integrated circuitry Grant 4,687,543 - Bowker August 18, 1 | 1987-08-18 |
| Plasma etch process Grant 4,678,540 - Uchimura July 7, 1 | 1987-07-07 |
| Vacuum load lock apparatus Grant 4,632,624 - Mirkovich , et al. December 30, 1 | 1986-12-30 |
| Pin lift plasma processing Grant 4,624,728 - Bithell , et al. November 25, 1 | 1986-11-25 |
| Article transport apparatus Grant 4,619,573 - Rathmann , et al. October 28, 1 | 1986-10-28 |
| Compound flow plasma reactor Grant 4,614,639 - Hegedus September 30, 1 | 1986-09-30 |
| Process monitor and method thereof Grant 4,611,919 - Brooks, Jr. , et al. September 16, 1 | 1986-09-16 |
| Plasma reactor having slotted manifold Grant 4,590,042 - Drage May 20, 1 | 1986-05-20 |
| Plasma reactor removable insert Grant 4,585,920 - Hoog , et al. April 29, 1 | 1986-04-29 |
| Variable duty cycle, multiple frequency, plasma reactor Grant 4,585,516 - Corn , et al. April 29, 1 | 1986-04-29 |
| Plasma reactor apparatus Grant 4,579,618 - Celestino , et al. April 1, 1 | 1986-04-01 |
| Module presence sensor Grant 4,575,714 - Rummel March 11, 1 | 1986-03-11 |
| Plasma reactor chuck assembly Grant 4,547,247 - Warenback , et al. October 15, 1 | 1985-10-15 |
| Modular plasma reactor with local atmosphere Grant 4,539,062 - Zajac September 3, 1 | 1985-09-03 |
| Plasma reactor apparatus and method Grant 4,464,223 - Gorin August 7, 1 | 1984-08-07 |
| Apparatus for controlling a plasma reaction Grant 4,357,195 - Gorin November 2, 1 | 1982-11-02 |
| Package and sterilizing process for same Grant 4,321,232 - Bithell March 23, 1 | 1982-03-23 |
| Plasma reactor apparatus Grant 4,209,357 - Gorin , et al. June 24, 1 | 1980-06-24 |
| Gaseous plasma reaction apparatus Grant 3,875,068 - Mitzel April 1, 1 | 1975-04-01 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 