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FUSED THIOPHENE MOLECULE AND p-TYPE SEMICONDUCTOR FILM AND ELECTRONIC DEVICE
App 20210371428 - MATSUZAWA; NOBUYUKI ; et al. | 2021-12-02 |
FUSED HETERO 5-MEMBERED RING MOLECULE, p-TYPE SEMICONDUCTOR FILM AND ELECTRONIC DEVICE
App 20210320266 - MATSUZAWA; NOBUYUKI ; et al. | 2021-10-14 |
P-type semiconductor film containing heterofullerene, and electronic device
Grant 11,031,558 - Matsuzawa , et al. June 8, 2 | 2021-06-08 |
P-type Semiconductor Film Containing Heterofullerene, And Electronic Device
App 20200381626 - MATSUZAWA; Nobuyuki ; et al. | 2020-12-03 |
Heterofullerene And N-type Semiconductor Film Using Same, And Electronic Device
App 20200239313 - MATSUZAWA; NOBUYUKI ; et al. | 2020-07-30 |
Semiconductor device having stacked chips, a re-distribution layer, and penetration electrodes
Grant 9,917,066 - Aoi , et al. March 13, 2 | 2018-03-13 |
Photo mask and method for forming pattern using the same
Grant 9,291,889 - Yoshioka , et al. March 22, 2 | 2016-03-22 |
Photomask, and pattern formation method and exposure apparatus using the photomask
Grant 9,046,783 - Misaka , et al. June 2, 2 | 2015-06-02 |
Semiconductor Device And Method For Manufacturing Same
App 20140327157 - AOI; NOBUO ; et al. | 2014-11-06 |
Photo Mask And Method For Forming Pattern Using The Same
App 20140308604 - YOSHIOKA; Yoshimasa ; et al. | 2014-10-16 |
Photomask, And Pattern Formation Method And Exposure Apparatus Using The Photomask
App 20130260293 - MISAKA; Akio ; et al. | 2013-10-03 |
Pattern formation method
Grant 8,268,535 - Endo , et al. September 18, 2 | 2012-09-18 |
Chemically Amplified Resist Material And Pattern Formation Method Using The Same
App 20120009795 - ENDOU; Masayuki ; et al. | 2012-01-12 |
Exposure system and pattern formation method
Grant 8,088,565 - Endo , et al. January 3, 2 | 2012-01-03 |
Pattern formation method
Grant 8,080,364 - Endo , et al. December 20, 2 | 2011-12-20 |
Pattern forming method
Grant 8,067,148 - Endou , et al. November 29, 2 | 2011-11-29 |
Pattern forming method
Grant 7,998,658 - Endou , et al. August 16, 2 | 2011-08-16 |
Pattern formation method
Grant 7,998,663 - Endo , et al. August 16, 2 | 2011-08-16 |
Method Of Accelerating Self-assembly Of Block Copolymer And Method Of Forming Self-assembled Pattern Of Block Copolymer Using The Accelerating Method
App 20110186544 - ENDOU; Masayuki ; et al. | 2011-08-04 |
Pattern Formation Method
App 20110189616 - ENDO; Masayuki ; et al. | 2011-08-04 |
Resist Material And Pattern Formation Method Using The Resist Material
App 20110177454 - Endou; Masayuki ; et al. | 2011-07-21 |
Photomask And Pattern Formation Method Using The Same
App 20110136048 - SHIMIZU; Tadami ; et al. | 2011-06-09 |
Pattern formation method
Grant 7,947,432 - Endo , et al. May 24, 2 | 2011-05-24 |
Pattern formation method
Grant 7,943,285 - Endo , et al. May 17, 2 | 2011-05-17 |
Barrier film material and pattern formation method using the same
Grant 7,939,242 - Endo , et al. May 10, 2 | 2011-05-10 |
Process for preparing a dispersion liquid of zeolite fine particles
Grant 7,923,522 - Hamada , et al. April 12, 2 | 2011-04-12 |
Dry etching method, fine structure formation method, mold and mold fabrication method
Grant 7,919,005 - Nakagawa , et al. April 5, 2 | 2011-04-05 |
Photomask and pattern formation method using the same
Grant 7,914,953 - Shimizu , et al. March 29, 2 | 2011-03-29 |
Dry etching method, fine structure formation method, mold and mold fabrication method
Grant 7,906,030 - Nakagawa , et al. March 15, 2 | 2011-03-15 |
Barrier film material and pattern formation method using the same
Grant 7,871,759 - Endo , et al. January 18, 2 | 2011-01-18 |
Film-forming Composition, Insulating Film With Low Dielectric Constant, Formation Method Thereof, And Semiconductor Device
App 20100283133 - Hamada; Yoshitaka ; et al. | 2010-11-11 |
Resist Material And Method For Forming Pattern Using The Same
App 20100266958 - ENDOU; Masayuki ; et al. | 2010-10-21 |
Semiconductor Manufacturing Apparatus And Pattern Formation Method
App 20100265477 - Endo; Masayuki ; et al. | 2010-10-21 |
Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device
App 20100233482 - Hamada; Yoshitaka ; et al. | 2010-09-16 |
Pattern Forming Method
App 20100221672 - ENDOU; Masayuki ; et al. | 2010-09-02 |
Method for forming insulating film with low dielectric constant
Grant 7,786,022 - Hamada , et al. August 31, 2 | 2010-08-31 |
Pattern Forming Method
App 20100209850 - ENDOU; Masayuki ; et al. | 2010-08-19 |
Semiconductor manufacturing apparatus and pattern formation method
Grant 7,771,918 - Endo , et al. August 10, 2 | 2010-08-10 |
Exposure System And Pattern Formation Method
App 20100183988 - ENDO; Masayuki ; et al. | 2010-07-22 |
Dry etching method, fine structure formation method, mold and mold fabrication method
Grant 7,758,761 - Nakagawa , et al. July 20, 2 | 2010-07-20 |
Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device
Grant 7,754,330 - Hamada , et al. July 13, 2 | 2010-07-13 |
Dry etching method, fine structure formation method, mold and mold fabrication method
Grant 7,731,862 - Nakagawa , et al. June 8, 2 | 2010-06-08 |
Barrier film material and pattern formation method using the same
Grant 7,727,707 - Endo , et al. June 1, 2 | 2010-06-01 |
Exposure system and pattern formation method
Grant 7,713,685 - Endo , et al. May 11, 2 | 2010-05-11 |
Exposure system and pattern formation method using the same
Grant 7,700,268 - Endo , et al. April 20, 2 | 2010-04-20 |
Method For Pattern Formation
App 20100055626 - Endou; Masayuki ; et al. | 2010-03-04 |
Ester compound, polymer, resist composition, and patterning process
Grant 7,666,967 - Harada , et al. February 23, 2 | 2010-02-23 |
Pattern formation method
Grant 7,655,385 - Endo , et al. February 2, 2 | 2010-02-02 |
Organic Silicon Oxide Fine Particle And Preparation Method Thereof, Porous Film-forming Composition, Porous Film And Formation Method Thereof, And Semiconductor Device
App 20090294922 - Hamada; Yoshitaka ; et al. | 2009-12-03 |
Organic Silicon Oxide Fine Particles And Preparation Method Thereof, Porous Film-forming Composition, Porous Film And Formation Method Thereof, And Semiconductor Device
App 20090294726 - Hamada; Yoshitaka ; et al. | 2009-12-03 |
Pattern formation method
Grant 7,595,142 - Endo , et al. September 29, 2 | 2009-09-29 |
Resist material and pattern formation method
Grant 7,588,876 - Kishimura , et al. September 15, 2 | 2009-09-15 |
Barrier Film Material And Pattern Formation Method Using The Same
App 20090227111 - Endo; Masayuki ; et al. | 2009-09-10 |
Resist protective coating material and patterning process
Grant 7,569,323 - Hatakeyama , et al. August 4, 2 | 2009-08-04 |
Pattern Formation Method
App 20090186484 - ENDO; Masayuki ; et al. | 2009-07-23 |
Material for forming insulating film with low dielectric constant, low dielectric insulating film, method for forming low dielectric insulating film and semiconductor device
Grant 7,563,706 - Nakagawa , et al. July 21, 2 | 2009-07-21 |
Pattern formation method and method for forming semiconductor device
Grant 7,563,709 - Nakagawa , et al. July 21, 2 | 2009-07-21 |
Pattern formation method
Grant 7,556,914 - Endo , et al. July 7, 2 | 2009-07-07 |
Barrier film material and pattern formation method using the same
Grant 7,550,253 - Endo , et al. June 23, 2 | 2009-06-23 |
Chemically amplified resist material, topcoat film material and pattern formation method using the same
Grant 7,541,132 - Endo , et al. June 2, 2 | 2009-06-02 |
Pattern formation method
Grant 7,524,772 - Endo , et al. April 28, 2 | 2009-04-28 |
Barrier Film Material And Pattern Formation Method
App 20090104560 - ENDO; Masayuki ; et al. | 2009-04-23 |
Pattern Formation Method
App 20090092930 - ENDO; Masayuki ; et al. | 2009-04-09 |
Exposure system and pattern formation method
App 20090091719 - Endo; Masayuki ; et al. | 2009-04-09 |
Photomask And Pattern Formation Method Using The Same
App 20090075182 - Shimizu; Tadami ; et al. | 2009-03-19 |
Polymer, resist composition and patterning process
Grant 7,488,567 - Harada , et al. February 10, 2 | 2009-02-10 |
Dry etching method, fine structure formation method, mold and mold fabrication method
App 20090017259 - Nakagawa; Hideo ; et al. | 2009-01-15 |
Dry etching method, fine structure formation method, mold and mold fabrication method
App 20090011065 - Nakagawa; Hideo ; et al. | 2009-01-08 |
Pattern formation method through liquid immersion lithography
Grant 7,470,501 - Endo , et al. December 30, 2 | 2008-12-30 |
Resist material and pattern formation method using the same
Grant 7,462,438 - Endo , et al. December 9, 2 | 2008-12-09 |
Siloxane Polymer, Preparation Method Thereof, Porous-film Forming Coating Solution Containing The Polymer, Porous Film, And Semiconductor Device Using The Porous Film
App 20080292863 - Yagihashi; Fujio ; et al. | 2008-11-27 |
Film-forming Composition, Insulating Film With Low Dielectric Constant, Formation Method Thereof, And Semiconductor Device
App 20080290521 - Hamada; Yoshitaka ; et al. | 2008-11-27 |
Semiconductor Interlayer-insulating Film Forming Composition, Preparation Method Thereof, Film Forming Method, And Semiconductor Device
App 20080290472 - Yagihashi; Fujio ; et al. | 2008-11-27 |
Resist material and pattern formation method using the same
Grant 7,455,950 - Endo , et al. November 25, 2 | 2008-11-25 |
Chemically Amplified Resist Material, Topcoat Film Material And Pattern Formation Method Using The Same
App 20080286687 - ENDO; Masayuki ; et al. | 2008-11-20 |
Process for Preparing a Zeolite-Containing Film
App 20080248328 - Hamada; Yoshitaka ; et al. | 2008-10-09 |
Process for Preparing a Dispersion Liquid of Zeolite Fine Particles
App 20080248280 - Hamada; Yoshitaka ; et al. | 2008-10-09 |
Barrier Film Material And Pattern Formation Method Using The Same
App 20080233491 - ENDO; Masayuki ; et al. | 2008-09-25 |
Pattern Formation Method
App 20080227038 - ENDO; Masayuki ; et al. | 2008-09-18 |
Sulfonamide compound, polymer compound, resist material and pattern formation method
Grant 7,413,843 - Kishimura , et al. August 19, 2 | 2008-08-19 |
Barrier Film Material And Pattern Formation Method Using The Same
App 20080193883 - ENDO; Masayuki ; et al. | 2008-08-14 |
Pattern Formation Method
App 20080193882 - Endo; Masayuki ; et al. | 2008-08-14 |
Semiconductor device comprising porous film
Grant 7,405,459 - Ogihara , et al. July 29, 2 | 2008-07-29 |
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
Grant 7,402,621 - Ogihara , et al. July 22, 2 | 2008-07-22 |
Pattern formation method
Grant 7,393,794 - Endo , et al. July 1, 2 | 2008-07-01 |
Pattern formation method
Grant 7,378,229 - Endo , et al. May 27, 2 | 2008-05-27 |
Resist material and pattern formation method
Grant 7,378,216 - Kishimura , et al. May 27, 2 | 2008-05-27 |
Polymer, resist composition and patterning process
Grant 7,378,218 - Harada , et al. May 27, 2 | 2008-05-27 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20080118737 - Ogihara; Tsutomu ; et al. | 2008-05-22 |
Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition
Grant 7,374,857 - Maesawa , et al. May 20, 2 | 2008-05-20 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,357,961 - Iwabuchi , et al. April 15, 2 | 2008-04-15 |
Chemically amplified resist material and pattern formation method using the same
App 20080081287 - Endo; Masayuki ; et al. | 2008-04-03 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,341,775 - Hamada , et al. March 11, 2 | 2008-03-11 |
Resist material and pattern formation method
Grant 7,338,743 - Endo , et al. March 4, 2 | 2008-03-04 |
Pattern formation method and method for forming semiconductor device
App 20080045005 - Nakagawa; Hideo ; et al. | 2008-02-21 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device
Grant 7,332,446 - Ogihara , et al. February 19, 2 | 2008-02-19 |
Pattern formation method
App 20080032239 - Endo; Masayuki ; et al. | 2008-02-07 |
Chemically amplified resist material and pattern formation method using the same
Grant 7,314,703 - Endo , et al. January 1, 2 | 2008-01-01 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,309,722 - Ogihara , et al. December 18, 2 | 2007-12-18 |
Pattern formation method
App 20070287102 - Endo; Masayuki ; et al. | 2007-12-13 |
Concave pattern formation method and method for forming semiconductor device
Grant 7,294,571 - Nakagawa , et al. November 13, 2 | 2007-11-13 |
Method for forming semiconductor device
Grant 7,291,554 - Nakagawa , et al. November 6, 2 | 2007-11-06 |
Resist material and pattern formation method using the same
App 20070248894 - Endo; Masayuki ; et al. | 2007-10-25 |
Method for fabricating semiconductor device
Grant 7,273,820 - Nakagawa , et al. September 25, 2 | 2007-09-25 |
Material for forming insulating film with low dielectric constant, low dielectric insulating film, method for forming low dielectric insulating film and semiconductor device
App 20070218643 - Nakagawa; Hideo ; et al. | 2007-09-20 |
Method for fabricating semiconductor device
App 20070202666 - Nakagawa; Hideo ; et al. | 2007-08-30 |
Dry etching method, fine structure formation method, mold and mold fabrication method
App 20070187362 - Nakagawa; Hideo ; et al. | 2007-08-16 |
Dry etching method, fine structure formation method, mold and mold fabrication method
App 20070187359 - Nakagawa; Hideo ; et al. | 2007-08-16 |
Pattern formation method
Grant 7,255,974 - Endo , et al. August 14, 2 | 2007-08-14 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20070178319 - Hamada; Yoshitaka ; et al. | 2007-08-02 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,244,657 - Ogihara , et al. July 17, 2 | 2007-07-17 |
Polymer, resist composition, and patterning process
Grant 7,241,553 - Hatakeyama , et al. July 10, 2 | 2007-07-10 |
Semiconductor manufacturing apparatus and pattern formation method
App 20070153245 - Endo; Masayuki ; et al. | 2007-07-05 |
Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst
Grant 7,239,018 - Hamada , et al. July 3, 2 | 2007-07-03 |
Composition For Forming Porous Film, Porous Film And Method For Forming The Same, Interlevel Insulator Film, And Semiconductor Device
App 20070135565 - Ogihara; Tsutomu ; et al. | 2007-06-14 |
Novel ester compound, polymer, resist composition, and patterning process
App 20070128555 - Harada; Yuji ; et al. | 2007-06-07 |
Pattern formation method and exposure system
App 20070128558 - Endo; Masayuki ; et al. | 2007-06-07 |
Barrier film material and pattern formation method using the same
App 20070111541 - Endo; Masayuki ; et al. | 2007-05-17 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20070108593 - Ogihara; Tsutomu ; et al. | 2007-05-17 |
Sulfonamide compound, polymer compound, resist material and pattern formation method
App 20070099117 - Kishimura; Shinji ; et al. | 2007-05-03 |
Composition For Forming Porous Film, Porous Film And Method For Forming The Same, Interlevel Insulator Film, And Semiconductor Device
App 20070087124 - Iwabuchi; Motoaki ; et al. | 2007-04-19 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,205,338 - Ogihara , et al. April 17, 2 | 2007-04-17 |
Water-soluble material, chemically amplified resist and pattern formation method using the same
App 20070082292 - Endo; Masayuki ; et al. | 2007-04-12 |
Water-soluble material, chemically amplified resist and pattern formation method using the same
Grant 7,198,888 - Endo , et al. April 3, 2 | 2007-04-03 |
Semiconductor manufacturing apparatus and pattern formation method
Grant 7,195,860 - Endo , et al. March 27, 2 | 2007-03-27 |
Resist protective coating material and patterning process
App 20070026341 - Hatakeyama; Jun ; et al. | 2007-02-01 |
Polymer compound, resist material and pattern formation method
Grant 7,169,530 - Kishimura , et al. January 30, 2 | 2007-01-30 |
Polymers, resist compositions and patterning process
Grant 7,169,869 - Harada , et al. January 30, 2 | 2007-01-30 |
Sulfonamide compound, polymer compound, resist material and pattern formation method
Grant 7,166,418 - Kishimura , et al. January 23, 2 | 2007-01-23 |
Semiconductor fabrication apparatus and pattern formation method using the same
App 20070009841 - Endo; Masayuki ; et al. | 2007-01-11 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20060289849 - Yagihashi; Fujio ; et al. | 2006-12-28 |
Chemically amplified resist material and pattern formation method using the same
App 20060281025 - Endo; Masayuki ; et al. | 2006-12-14 |
Pattern formation method
App 20060275707 - Endo; Masayuki ; et al. | 2006-12-07 |
Polymer, resist composition and patterning process
App 20060269871 - Harada; Yuji ; et al. | 2006-11-30 |
Resist material and pattern formation method using the same
App 20060263719 - Endo; Masayuki ; et al. | 2006-11-23 |
Pattern formation method
Grant 7,135,273 - Endo , et al. November 14, 2 | 2006-11-14 |
Pattern formation method
Grant 7,132,224 - Endo , et al. November 7, 2 | 2006-11-07 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,132,473 - Ogihara , et al. November 7, 2 | 2006-11-07 |
Polymers, resist compositions and patterning process
Grant 7,125,643 - Harada , et al. October 24, 2 | 2006-10-24 |
Polymers, resist compositions and patterning process
Grant 7,125,641 - Harada , et al. October 24, 2 | 2006-10-24 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,126,208 - Iwabuchi , et al. October 24, 2 | 2006-10-24 |
Sulfonates, polymers, resist compositions and patterning process
Grant 7,125,642 - Harada , et al. October 24, 2 | 2006-10-24 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film
Grant 7,119,354 - Yagihashi , et al. October 10, 2 | 2006-10-10 |
Material for forming insulating film with low dielectric constant, low dielectric insulating film, method for forming low dielectric insulating film and semiconductor device
App 20060202356 - Nakagawa; Hideo ; et al. | 2006-09-14 |
Pattern formation method and exposure system
Grant 7,094,521 - Endo , et al. August 22, 2 | 2006-08-22 |
Pattern formation method
App 20060178005 - Endo; Masayuki ; et al. | 2006-08-10 |
Polymer, resist composition and patterning process
App 20060177765 - Harada; Yuji ; et al. | 2006-08-10 |
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
Grant 7,084,505 - Hamada , et al. August 1, 2 | 2006-08-01 |
Pattern formation method
App 20060163198 - Endo; Masayuki ; et al. | 2006-07-27 |
Pattern formation method and exposure system
App 20060160032 - Endo; Masayuki ; et al. | 2006-07-20 |
Polymers, resist compositions and patterning process
Grant 7,078,147 - Harada , et al. July 18, 2 | 2006-07-18 |
Pattern formation method
App 20060148266 - Endo; Masayuki ; et al. | 2006-07-06 |
Polymers, resist compositions and patterning process
Grant 7,067,231 - Harada , et al. June 27, 2 | 2006-06-27 |
Barrier film material and pattern formation method using the same
App 20060127812 - Endo; Masayuki ; et al. | 2006-06-15 |
Polymer compound, resist material and pattern formation method
Grant 7,060,775 - Kishimura , et al. June 13, 2 | 2006-06-13 |
Pattern-forming material and method of forming pattern
Grant 7,041,428 - Kishimura , et al. May 9, 2 | 2006-05-09 |
Pattern formation method
Grant 7,029,827 - Endo , et al. April 18, 2 | 2006-04-18 |
Pattern formation method
Grant 7,022,466 - Endo , et al. April 4, 2 | 2006-04-04 |
Pattern formation method
Grant 7,011,934 - Endo , et al. March 14, 2 | 2006-03-14 |
Resist material and pattern formation method
App 20060051702 - Endo; Masayuki ; et al. | 2006-03-09 |
Exposure system and pattern formation method
App 20060051709 - Endo; Masayuki ; et al. | 2006-03-09 |
Polymers, resist compositions and patterning process
Grant 7,005,228 - Hatakeyama , et al. February 28, 2 | 2006-02-28 |
Pattern formation method
App 20060040215 - Endo; Masayuki ; et al. | 2006-02-23 |
Resist compositions and patterning process
Grant 7,001,707 - Hatakeyama , et al. February 21, 2 | 2006-02-21 |
Pattern formation method
Grant 6,992,015 - Endo , et al. January 31, 2 | 2006-01-31 |
Exposure system, exposure method and method for fabricating semiconductor device
App 20060019204 - Endo; Masayuki ; et al. | 2006-01-26 |
Immersion exposure liquid and pattern formation method
App 20060014105 - Endo; Masayuki ; et al. | 2006-01-19 |
Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method
App 20060008711 - Endo; Masayuki ; et al. | 2006-01-12 |
Exposure system and pattern formation method
App 20050277069 - Endo, Masayuki ; et al. | 2005-12-15 |
Resist material and pattern formation method
App 20050277057 - Kishimura, Shinji ; et al. | 2005-12-15 |
Semiconductor manufacturing apparatus and pattern formation method
App 20050277068 - Endo, Masayuki ; et al. | 2005-12-15 |
Resist material and pattern formation method
App 20050266337 - Kishimura, Shinji ; et al. | 2005-12-01 |
Material for forming insulating film with low dielectric constant, low dielectric insulating film, method for forming low dielectric insulating film and semiconductor device
App 20050263908 - Nakagawa, Hideo ; et al. | 2005-12-01 |
Resist material and pattern formation method
App 20050266338 - Kishimura, Shinji ; et al. | 2005-12-01 |
Polymers, resist compositions and patterning process
App 20050267275 - Harada, Yuji ; et al. | 2005-12-01 |
Semiconductor manufacturing apparatus and pattern formation method
App 20050255413 - Endo, Masayuki ; et al. | 2005-11-17 |
Resist material and pattern formation method using the same
App 20050233259 - Endo, Masayuki ; et al. | 2005-10-20 |
Polymer, resist composition, and patterning process
App 20050221221 - Hatakeyama, Jun ; et al. | 2005-10-06 |
Pattern formation method
Grant 6,949,329 - Endo , et al. September 27, 2 | 2005-09-27 |
Polymers, resist compositions and patterning process
Grant 6,946,235 - Harada , et al. September 20, 2 | 2005-09-20 |
Water-soluble material, chemically amplified resist and pattern formation method using the same
App 20050191576 - Endo, Masayuki ; et al. | 2005-09-01 |
Method for forming semiconductor device
App 20050191860 - Nakagawa, Hideo ; et al. | 2005-09-01 |
Pattern formation material and pattern formation method
Grant 6,936,401 - Endo , et al. August 30, 2 | 2005-08-30 |
Polymer compound, resist material and pattern formation method
App 20050186501 - Kishimura, Shinji ; et al. | 2005-08-25 |
Barrier film material and pattern formation method using the same
App 20050186516 - Endo, Masayuki ; et al. | 2005-08-25 |
Polymers, resist compositions and patterning process
Grant 6,933,095 - Harada , et al. August 23, 2 | 2005-08-23 |
Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device
Grant 6,930,393 - Hamada , et al. August 16, 2 | 2005-08-16 |
Polymer, resist composition, and patterning process
App 20050175935 - Harada, Yuji ; et al. | 2005-08-11 |
Pattern formation method and method for forming semiconductor device
App 20050170269 - Nakagawa, Hideo ; et al. | 2005-08-04 |
Chemically amplified resist and pattern formation method
App 20050164122 - Endo, Masayuki ; et al. | 2005-07-28 |
Method for forming semiconductor device
App 20050164494 - Nakagawa, Hideo ; et al. | 2005-07-28 |
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
App 20050165197 - Ogihara, Tsutomu ; et al. | 2005-07-28 |
Pattern formation method
App 20050158672 - Endo, Masayuki ; et al. | 2005-07-21 |
Esters, polymers, resist compositions and patterning process
Grant 6,916,592 - Harada , et al. July 12, 2 | 2005-07-12 |
Pattern formation method
Grant 6,913,873 - Endo , et al. July 5, 2 | 2005-07-05 |
Exposure mask, method for manufacturing the mask, and exposure method
Grant 6,913,857 - Sasago , et al. July 5, 2 | 2005-07-05 |
Exposure system and pattern formation method using the same
App 20050136361 - Endo, Masayuki ; et al. | 2005-06-23 |
Pattern formation method
Grant 6,908,729 - Endo , et al. June 21, 2 | 2005-06-21 |
Pattern formation method
App 20050130079 - Endo, Masayuki ; et al. | 2005-06-16 |
Pattern formation method
App 20050130067 - Endo, Masayuki ; et al. | 2005-06-16 |
Pattern formation method
Grant 6,902,999 - Endo , et al. June 7, 2 | 2005-06-07 |
Semiconductor manufacturing apparatus and pattern formation method
App 20050106512 - Endo, Masayuki ; et al. | 2005-05-19 |
Polymers, resist compositions and patterning process
App 20050106499 - Harada, Yuji ; et al. | 2005-05-19 |
Polymers, resist compositions and patterning process
App 20050089797 - Harada, Yuji ; et al. | 2005-04-28 |
Resist compositions and patterning process
App 20050084796 - Hatakeyama, Jun ; et al. | 2005-04-21 |
Semiconductor fabrication apparatus and pattern formation method using the same
App 20050074704 - Endo, Masayuki ; et al. | 2005-04-07 |
Polymer compound, resist material and pattern formation method
App 20050074693 - Kishimura, Shinji ; et al. | 2005-04-07 |
Resist compositions and patterning process
Grant 6,875,556 - Harada , et al. April 5, 2 | 2005-04-05 |
Pattern formation method
App 20050069814 - Endo, Masayuki ; et al. | 2005-03-31 |
Polymers, resist compositions and patterning process
Grant 6,872,514 - Harada , et al. March 29, 2 | 2005-03-29 |
Sulfonamide compound, polymer compound, resist material and pattern formation method
App 20050058935 - Kishimura, Shinji ; et al. | 2005-03-17 |
Polymers, resist compositions and patterning process
Grant 6,864,037 - Hatakeyama , et al. March 8, 2 | 2005-03-08 |
Polymers, resist compositions and patterning process
Grant 6,861,197 - Harada , et al. March 1, 2 | 2005-03-01 |
Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition
App 20050038261 - Maesawa, Tsuneaki ; et al. | 2005-02-17 |
Chemically amplified resist compositions and patterning process
Grant 6,855,477 - Hatakeyama , et al. February 15, 2 | 2005-02-15 |
Pattern formation method
Grant 6,841,488 - Endo , et al. January 11, 2 | 2005-01-11 |
Pattern formation method
App 20040259008 - Endo, Masayuki ; et al. | 2004-12-23 |
Pattern formation method
App 20040259040 - Endo, Masayuki ; et al. | 2004-12-23 |
Pattern formation method
App 20040253548 - Endo, Masayuki ; et al. | 2004-12-16 |
Pattern formation method
App 20040253547 - Endo, Masayuki ; et al. | 2004-12-16 |
Pattern forming material and method of pattern formation
Grant 6,830,869 - Kishimura , et al. December 14, 2 | 2004-12-14 |
Polymers, resist compositions and patterning process
Grant 6,824,955 - Harada , et al. November 30, 2 | 2004-11-30 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040232553 - Iwabuchi, Motoaki ; et al. | 2004-11-25 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040235971 - Hamada, Yoshitaka ; et al. | 2004-11-25 |
Pattern formation method
App 20040224525 - Endo, Masayuki ; et al. | 2004-11-11 |
Pattern formation method and exposure system
App 20040224265 - Endo, Masayuki ; et al. | 2004-11-11 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040219372 - Ogihara, Tsutomu ; et al. | 2004-11-04 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040216641 - Hamada, Yoshitaka ; et al. | 2004-11-04 |
Pattern formation material and pattern formation method
Grant 6,806,029 - Kishimura , et al. October 19, 2 | 2004-10-19 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040202874 - Iwabuchi, Motoaki ; et al. | 2004-10-14 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040201007 - Yagihashi, Fujio ; et al. | 2004-10-14 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040201014 - Yagihashi, Fujio ; et al. | 2004-10-14 |
Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device
App 20040195660 - Hamada, Yoshitaka ; et al. | 2004-10-07 |
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
App 20040188846 - Hamada, Yoshitaka ; et al. | 2004-09-30 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device
App 20040188809 - Ogihara, Tsutomu ; et al. | 2004-09-30 |
Composition for forming porous film and method for forming the same, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040180554 - Hamada, Yoshitaka ; et al. | 2004-09-16 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040180222 - Ogihara, Tsutomu ; et al. | 2004-09-16 |
Resist compositions and patterning process
Grant 6,790,586 - Hatakeyama , et al. September 14, 2 | 2004-09-14 |
Pattern formation method
App 20040161710 - Endo, Masayuki ; et al. | 2004-08-19 |
Sulfonates, polymers, resist compositions and patterning process
App 20040157156 - Harada, Yuji ; et al. | 2004-08-12 |
Polymers, resist compositions and patterning process
App 20040157155 - Harada, Yuji ; et al. | 2004-08-12 |
Resist compositions and patterning process
App 20040144752 - Harada, Yuji ; et al. | 2004-07-29 |
Pattern formation method
Grant 6,764,811 - Endo , et al. July 20, 2 | 2004-07-20 |
Pattern formation material and pattern formation method
Grant 6,753,132 - Kishimura , et al. June 22, 2 | 2004-06-22 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040105986 - Ogihara, Tsutomu ; et al. | 2004-06-03 |
Pattern formation material and method
Grant 6,737,213 - Kishimura , et al. May 18, 2 | 2004-05-18 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040091419 - Ogihara, Tsutomu ; et al. | 2004-05-13 |
Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method
Grant 6,721,390 - Matsuo , et al. April 13, 2 | 2004-04-13 |
Pattern formation method
Grant 6,716,730 - Endo , et al. April 6, 2 | 2004-04-06 |
Pattern formation material, water-soluble material and pattern formation method
App 20040058271 - Endo, Masayuki ; et al. | 2004-03-25 |
Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method
App 20040058253 - Endo, Masayuki ; et al. | 2004-03-25 |
Polymers, resist compositions and patterning process
Grant 6,710,148 - Harada , et al. March 23, 2 | 2004-03-23 |
Pattern forming material and method of pattern formation
App 20040043321 - Kishimura, Shinji ; et al. | 2004-03-04 |
Method for producing semiconductor device
App 20040029363 - Nakagawa, Hideo ; et al. | 2004-02-12 |
Polymers, resist compositions and patterning process
App 20040030079 - Harada, Yuji ; et al. | 2004-02-12 |
Pattern-forming material and method of forming pattern
App 20040029035 - Kishimura, Shinji ; et al. | 2004-02-12 |
Pattern formation material and pattern formation method
Grant 6,689,536 - Kishimura , et al. February 10, 2 | 2004-02-10 |
Pattern formation material and pattern formation method
App 20040013978 - Endo, Masayuki ; et al. | 2004-01-22 |
Pattern formation method
App 20040009433 - Endo, Masayuki ; et al. | 2004-01-15 |
Pattern formation method
Grant 6,673,523 - Kishimura , et al. January 6, 2 | 2004-01-06 |
Polymers, resist compositions and patterning process
Grant 6,660,447 - Hatakeyama , et al. December 9, 2 | 2003-12-09 |
Pattern formation method
App 20030224296 - Endo, Masayuki ; et al. | 2003-12-04 |
Pattern formation method
App 20030224589 - Endo, Masayuki ; et al. | 2003-12-04 |
Novel esters, polymers, resist compositions and patterning process
App 20030219678 - Harada, Yuji ; et al. | 2003-11-27 |
Polymers, resist compositions and patterning process
App 20030215740 - Harada, Yuji ; et al. | 2003-11-20 |
Material for forming insulating film with low dielectric constant, low dielectric insulating film method for forming low dielectric insulating film and semiconductor device
App 20030213958 - Nakagawa, Hideo ; et al. | 2003-11-20 |
Polymers, resist compositions and patterning process
App 20030215739 - Harada, Yuji ; et al. | 2003-11-20 |
Pattern formation material and pattern formation method
Grant 6,645,694 - Kishimura , et al. November 11, 2 | 2003-11-11 |
Pattern formation material and pattern formation method
Grant 6,632,582 - Kishimura , et al. October 14, 2 | 2003-10-14 |
Polymers, resist compositions and patterning process
App 20030165773 - Harada, Yuji ; et al. | 2003-09-04 |
Ester compounds
Grant 6,603,037 - Harada , et al. August 5, 2 | 2003-08-05 |
Pattern formation method
App 20030143494 - Endo, Masayuki ; et al. | 2003-07-31 |
Pattern formation method
App 20030143824 - Endo, Masayuki ; et al. | 2003-07-31 |
Pattern formation material and pattern formation method
App 20030113670 - Kishimura, Shinji ; et al. | 2003-06-19 |
Novel Ester Compounds
App 20030100791 - Harada, Yuji ; et al. | 2003-05-29 |
Chemically amplified resist compositions and patterning process
App 20030099901 - Hatakeyama, Jun ; et al. | 2003-05-29 |
Pattern formation method
App 20030091941 - Kishimura, Shinji ; et al. | 2003-05-15 |
Pattern formation material and pattern formation method
App 20030091930 - Kishimura, Shinji ; et al. | 2003-05-15 |
Pattern formation material and pattern formation method
App 20030087184 - Kishimura, Shinji ; et al. | 2003-05-08 |
Pattern formation method
App 20030087194 - Endo, Masayuki ; et al. | 2003-05-08 |
Pattern formation method
App 20030082486 - Endo, Masayuki ; et al. | 2003-05-01 |
Polymers, resist compositions and patterning process
App 20030082479 - Hatakeyama, Jun ; et al. | 2003-05-01 |
Pattern formation method
App 20030082926 - Endo, Masayuki ; et al. | 2003-05-01 |
Pattern formation method
App 20030049570 - Endo, Masayuki ; et al. | 2003-03-13 |
Pattern formation method
Grant 6,528,240 - Kishimura , et al. March 4, 2 | 2003-03-04 |
Polymers, resist compositions and patterning process
App 20030031953 - Hatakeyama, Jun ; et al. | 2003-02-13 |
Polymers, resist compositions and patterning process
App 20030031952 - Harada, Yuji ; et al. | 2003-02-13 |
Pattern formation method
App 20030017425 - Endo, Masayuki ; et al. | 2003-01-23 |
Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method
App 20030016780 - Matsuo, Takahiro ; et al. | 2003-01-23 |
Polymers, resist compositions and patterning process
App 20030008231 - Harada, Yuji ; et al. | 2003-01-09 |
Pattern formation material and pattern formation method
App 20020197557 - Kishimura, Shinji ; et al. | 2002-12-26 |
Exposure mask, method for manufacturing the mask, and exposure method
App 20020192573 - Sasago, Masaru ; et al. | 2002-12-19 |
Polymers, resist compositions and patterning process
App 20020161148 - Harada, Yuji ; et al. | 2002-10-31 |
Pattern formation method
App 20020142251 - Endo, Masayuki ; et al. | 2002-10-03 |
Mold, method for fabricating mold and pattern formation method
App 20020127499 - Endo, Masayuki ; et al. | 2002-09-12 |
Pattern formation method
App 20020076937 - Endo, Masayuki ; et al. | 2002-06-20 |
Resist compositions and patterning process
App 20020051935 - Hatakeyama, Jun ; et al. | 2002-05-02 |
Polymers, resist compositions and patterning process
App 20020051936 - Harada, Yuji ; et al. | 2002-05-02 |
Polymers, resist compositions and patterning process
App 20020051937 - Hatakeyama, Jun ; et al. | 2002-05-02 |
Polymers, resist compositions and patterning process
App 20020048724 - Harada, Yuji ; et al. | 2002-04-25 |
Pattern formation material and pattern formation method
App 20020039700 - Kishimura, Shinji ; et al. | 2002-04-04 |
Pattern formation material and pattern formation method
App 20020037471 - Kishimura, Shinji ; et al. | 2002-03-28 |
Electron beam aligner, outgassing collection method and gas analysis method
App 20020030801 - Endo, Masayuki ; et al. | 2002-03-14 |
Pattern formation material and pattern formation method
App 20020013059 - Kishimura, Shinji ; et al. | 2002-01-31 |
Pattern formation material and pattern formation method
App 20020012870 - Kishimura, Shinji ; et al. | 2002-01-31 |
Pattern formation method
App 20010049075 - Kishimura, Shinji ; et al. | 2001-12-06 |
Pattern formation material and method
App 20010033999 - Kishimura, Shinji ; et al. | 2001-10-25 |
Pattern formation material and method
App 20010028989 - Kishimura, Shinji ; et al. | 2001-10-11 |
Method of forming micropatterns by having a resist film absorb water
Grant 5,741,628 - Matsuo , et al. April 21, 1 | 1998-04-21 |
Method of producing a stencil mask
Grant 5,401,932 - Hashimoto , et al. March 28, 1 | 1995-03-28 |
Process for forming a positive pattern through deep ultraviolet exposure, heat treatment and development with TMAH solution containing an alcohol to improve adhesion
Grant 5,300,404 - Tani , et al. April 5, 1 | 1994-04-05 |
Method for forming pattern
Grant 5,252,435 - Tani , et al. October 12, 1 | 1993-10-12 |
Pattern forming method using contrast enhanced material
Grant 4,849,323 - Endo , et al. July 18, 1 | 1989-07-18 |
Integrator for an exposure apparatus or the like
Grant 4,841,341 - Ogawa , et al. June 20, 1 | 1989-06-20 |
Exposure apparatus
Grant 4,805,000 - Ogawa , et al. February 14, 1 | 1989-02-14 |
Method for correction for chromatic aberration and exposure apparatus using the same
Grant 4,782,368 - Ogawa , et al. November 1, 1 | 1988-11-01 |
Water-soluble photopolymer and method of forming pattern by use of the same
Grant 4,745,042 - Sasago , et al. May 17, 1 | 1988-05-17 |
Exposure apparatus
Grant 4,724,466 - Ogawa , et al. February 9, 1 | 1988-02-09 |
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