| Patent | Date |
|---|
Substrate Edge Ring That Extends Process Environment Beyond Substrate Diameter
App 20220293397 - RICE; Michael R. ; et al. | 2022-09-15 |
Symmetric Plasma Process Chamber
App 20220254606 - CARDUCCI; James D. ; et al. | 2022-08-11 |
Symmetric plasma process chamber
Grant 11,315,760 - Carducci , et al. April 26, 2 | 2022-04-26 |
Plasma Chamber With A Multiphase Rotating Modulated Cross-flow
App 20220084794 - Collins; Kenneth S. ; et al. | 2022-03-17 |
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
App 20220051910 - Bera; Kallol ; et al. | 2022-02-17 |
Showerhead with interlaced gas feed and removal and methods of use
Grant 11,189,502 - Bera , et al. November 30, 2 | 2021-11-30 |
Symmetric Vhf Source For A Plasma Reactor
App 20210313147 - Ramaswamy; Kartik ; et al. | 2021-10-07 |
Plasma reactor with electrode array in ceiling
Grant 11,114,284 - Collins , et al. September 7, 2 | 2021-09-07 |
Ion-ion plasma atomic layer etch process
Grant 11,101,113 - Collins , et al. August 24, 2 | 2021-08-24 |
Symmetric VHF source for a plasma reactor
Grant 11,043,361 - Ramaswamy , et al. June 22, 2 | 2021-06-22 |
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
Grant 10,811,226 - Carducci , et al. October 20, 2 | 2020-10-20 |
Electrostatic chuck with variable pixelated magnetic field
Grant 10,790,180 - Hsu , et al. September 29, 2 | 2020-09-29 |
Electrostatic Chuck For High Bias Radio Frequency (rf) Power Application In A Plasma Processing Chamber
App 20200286717 - CHO; JAEYONG ; et al. | 2020-09-10 |
Apparatus and methods for reducing particles in semiconductor process chambers
Grant 10,770,269 - Nguyen , et al. Sep | 2020-09-08 |
Symmetric Plasma Process Chamber
App 20200185192 - CARDUCCI; James D. ; et al. | 2020-06-11 |
Apparatus To Reduce Polymers Deposition
App 20200185256 - NGUYEN; Andrew ; et al. | 2020-06-11 |
Symmetric plasma process chamber
Grant 10,615,006 - Carducci , et al. | 2020-04-07 |
Cooling base with spiral channels for ESC
Grant 10,586,718 - Knyazik , et al. | 2020-03-10 |
Symmetric plasma process chamber
Grant 10,580,620 - Carducci , et al. | 2020-03-03 |
Inductively coupled plasma apparatus
Grant 10,573,493 - Todorow , et al. Feb | 2020-02-25 |
Ion-ion Plasma Atomic Layer Etch Process
App 20200035454 - Collins; Kenneth S. ; et al. | 2020-01-30 |
Symmetric plasma process chamber
Grant 10,546,728 - Carducci , et al. Ja | 2020-01-28 |
Symmetric plasma process chamber
Grant 10,535,502 - Carducci , et al. Ja | 2020-01-14 |
Electrostatic Chuck With Variable Pixelated Magnetic Field
App 20200013661 - Hsu; Chih-Hsun ; et al. | 2020-01-09 |
Processing tool with electrically switched electrode assembly
Grant 10,510,515 - Collins , et al. Dec | 2019-12-17 |
Ion-ion plasma atomic layer etch process and reactor
Grant 10,475,626 - Collins , et al. Nov | 2019-11-12 |
Electrostatic chuck with variable pixelated magnetic field
Grant 10,460,968 - Hsu , et al. Oc | 2019-10-29 |
Symmetric plasma process chamber
Grant 10,453,656 - Carducci , et al. Oc | 2019-10-22 |
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
App 20190311920 - Bera; Kallol ; et al. | 2019-10-10 |
Rf Tailored Voltage On Bias Operation
App 20190311884 - KOBAYASHI; Satoru ; et al. | 2019-10-10 |
Apparatus for controlling temperature uniformity of a substrate
Grant 10,386,126 - Bera , et al. A | 2019-08-20 |
Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding
Grant 10,249,470 - Kenney , et al. | 2019-04-02 |
Plasma processing apparatus and liner assembly for tuning electrical skews
Grant 10,242,847 - Carducci , et al. | 2019-03-26 |
Plasma Reactor Having Radial Struts for Substrate Support
App 20190085467 - Nguyen; Andrew ; et al. | 2019-03-21 |
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
Grant 10,170,279 - Kenney , et al. J | 2019-01-01 |
Plasma Reactor With Electrode Array In Ceiling
App 20180374685 - Collins; Kenneth S. ; et al. | 2018-12-27 |
Processing Tool With Electrically Switched Electrode Assembly
App 20180374684 - Collins; Kenneth S. ; et al. | 2018-12-27 |
Multiple Electrode Substrate Support Assembly And Phase Control System
App 20180366306 - YANG; Yang ; et al. | 2018-12-20 |
Multiple electrode substrate support assembly and phase control system
Grant 10,153,139 - Yang , et al. Dec | 2018-12-11 |
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow
Grant 10,131,994 - Nguyen , et al. November 20, 2 | 2018-11-20 |
Plasma Reactor With Filaments And Rf Power Applied At Multiple Frequencies
App 20180308664 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Plasma Reactor With Phase Shift Applied Across Electrode Array
App 20180308663 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Plasma Reactor With Groups Of Electrodes
App 20180308667 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Ion-ion Plasma Atomic Layer Etch Process And Reactor
App 20180261429 - Collins; Kenneth S. ; et al. | 2018-09-13 |
Inductively Coupled Plasma Source With Symmetrical Rf Feed And Reactance Elements
App 20180218873 - Kenney; Jason A. ; et al. | 2018-08-02 |
Plasma Source With Symmetrical Rf Feed
App 20180211811 - Kenney; Jason A. ; et al. | 2018-07-26 |
Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Distribution Plates
App 20180138014 - Carducci; James D. ; et al. | 2018-05-17 |
Inductively coupled plasma source with symmetrical RF feed
Grant 9,928,987 - Kenney , et al. March 27, 2 | 2018-03-27 |
Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching
App 20180053631 - Dorf; Leonid ; et al. | 2018-02-22 |
Symmetric VHF Source for a Plasma Reactor
App 20180053630 - Ramaswamy; Kartik ; et al. | 2018-02-22 |
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure
Grant 9,896,769 - Nguyen , et al. February 20, 2 | 2018-02-20 |
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
Grant 9,870,897 - Carducci , et al. January 16, 2 | 2018-01-16 |
Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting Structure
App 20170350018 - Nguyen; Andrew ; et al. | 2017-12-07 |
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow Chamber
App 20170350017 - Nguyen; Andrew ; et al. | 2017-12-07 |
Apparatus And Methods For Reducing Particles In Semiconductor Process Chambers
App 20170345623 - NGUYEN; Andrew ; et al. | 2017-11-30 |
Symmetric VHF source for a plasma reactor
Grant 9,824,862 - Ramaswamy , et al. November 21, 2 | 2017-11-21 |
Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
Grant 9,799,491 - Dorf , et al. October 24, 2 | 2017-10-24 |
Symmetric Plasma Process Chamber
App 20170271129 - CARDUCCI; James D. ; et al. | 2017-09-21 |
Apparatus and methods for reducing particles in semiconductor process chambers
Grant 9,761,416 - Nguyen , et al. September 12, 2 | 2017-09-12 |
Symmetrical inductively coupled plasma source with symmetrical flow chamber
Grant 9,745,663 - Nguyen , et al. August 29, 2 | 2017-08-29 |
Symmetric plasma process chamber
Grant 9,741,546 - Carducci , et al. August 22, 2 | 2017-08-22 |
Electron beam plasma source with reduced metal contamination
Grant 9,721,760 - Dorf , et al. August 1, 2 | 2017-08-01 |
Uniform Low Electron Temperature Plasma Source With Reduced Wafer Charging And Independent Control Over Radical Composition
App 20170140900 - Dorf; Leonid ; et al. | 2017-05-18 |
Cooling Base With Spiral Channels For Esc
App 20170133244 - KNYAZIK; Vladimir ; et al. | 2017-05-11 |
Low Electron Temperature Etch Chamber With Independent Control Over Plasma Density, Radical Composition And Ion Energy For Atomic Precision Etching
App 20170125217 - Dorf; Leonid ; et al. | 2017-05-04 |
Electron beam plasma source with remote radical source
Grant 9,564,297 - Wu , et al. February 7, 2 | 2017-02-07 |
Multiple Electrode Substrate Support Assembly And Phase Control System
App 20160372307 - YANG; YANG ; et al. | 2016-12-22 |
Atomic layer etch process using an electron beam
Grant 9,520,294 - Agarwal , et al. December 13, 2 | 2016-12-13 |
Symmetric Plasma Process Chamber
App 20160314937 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314940 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314936 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314942 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Ion-ion Plasma Atomic Layer Etch Process And Reactor
App 20160276134 - Collins; Kenneth S. ; et al. | 2016-09-22 |
Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna
Grant 9,449,794 - Nguyen , et al. September 20, 2 | 2016-09-20 |
Electron beam plasma source with segmented suppression electrode for uniform plasma generation
Grant 9,443,700 - Dorf , et al. September 13, 2 | 2016-09-13 |
Inductively Coupled Plasma Apparatus
App 20160196953 - TODOROW; VALENTIN N. ; et al. | 2016-07-07 |
Interface treatment of semiconductor surfaces with high density low energy plasma
Grant 9,378,941 - Nainani , et al. June 28, 2 | 2016-06-28 |
Apparatus For Controlling Temperature Uniformity Of A Substrate
App 20160169593 - BERA; KALLOL ; et al. | 2016-06-16 |
Fast atomic layer etch process using an electron beam
Grant 9,362,131 - Agarwal , et al. June 7, 2 | 2016-06-07 |
Digital phase controller for two-phase operation of a plasma reactor
Grant 9,312,106 - Kobayashi , et al. April 12, 2 | 2016-04-12 |
Fast Atomic Layer Etch Process Using An Electron Beam
App 20160064231 - Agarwal; Ankur ; et al. | 2016-03-03 |
Atomic Layer Etch Process Using An Electron Beam
App 20160064244 - Agarwal; Ankur ; et al. | 2016-03-03 |
Plasma reactor with electron beam plasma source having a uniform magnetic field
Grant 9,269,546 - Wu , et al. February 23, 2 | 2016-02-23 |
Apparatus for controlling the temperature uniformity of a substrate
Grant 9,267,742 - Bera , et al. February 23, 2 | 2016-02-23 |
Feol Low-k Spacers
App 20160005833 - Collins; Kenneth S. ; et al. | 2016-01-07 |
Photoresist treatment method by low bombardment plasma
Grant 9,177,824 - Wu , et al. November 3, 2 | 2015-11-03 |
Independent control of RF phases of separate coils of an inductively coupled plasma reactor
Grant 9,161,428 - Collins , et al. October 13, 2 | 2015-10-13 |
Plasma Processing Apparatus And Liner Assembly For Tuning Electrical Skews
App 20150279633 - CARDUCCI; James D. ; et al. | 2015-10-01 |
Electron beam plasma source with arrayed plasma sources for uniform plasma generation
Grant 9,129,777 - Dorf , et al. September 8, 2 | 2015-09-08 |
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
Grant 9,111,722 - Dorf , et al. August 18, 2 | 2015-08-18 |
Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
Grant 9,082,590 - Carducci , et al. July 14, 2 | 2015-07-14 |
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
Grant 9,082,591 - Dorf , et al. July 14, 2 | 2015-07-14 |
Electrostatic Chuck With Variable Pixelated Magnetic Field
App 20150155193 - Hsu; Chih-Hsun ; et al. | 2015-06-04 |
Interface Treatment Of Semiconductor Surfaces With High Density Low Energy Plasma
App 20150093862 - Nainani; Aneesh ; et al. | 2015-04-02 |
Spatially Discrete Multi-loop Rf-driven Plasma Source Having Plural Independent Zones
App 20150075716 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
Symmetric Vhf Source For A Plasma Reactor
App 20150075719 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
Inductively Coupled Spatially Discrete Multi-loop Rf-driven Plasma Source
App 20150075717 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
Methods and apparatus for controlling plasma in a process chamber
Grant 8,980,760 - Agarwal , et al. March 17, 2 | 2015-03-17 |
In-situ VHF current sensor for a plasma reactor
Grant 8,970,226 - Hanawa , et al. March 3, 2 | 2015-03-03 |
Synchronized radio frequency pulsing for plasma etching
Grant 8,962,488 - Liao , et al. February 24, 2 | 2015-02-24 |
Electron beam plasma source with segmented beam dump for uniform plasma generation
Grant 8,951,384 - Dorf , et al. February 10, 2 | 2015-02-10 |
Symmetric VHF source for a plasma reactor
Grant 08920597 - | 2014-12-30 |
Symmetric VHF source for a plasma reactor
Grant 8,920,597 - Ramaswamy , et al. December 30, 2 | 2014-12-30 |
Photoresist Treatment Method By Low Bombardment Plasma
App 20140370708 - WU; BANQIU ; et al. | 2014-12-18 |
Charged Beam Plasma Apparatus For Photomask Manufacture Applications
App 20140356768 - WU; Banqiu ; et al. | 2014-12-04 |
Electron beam plasma source with profiled magnet shield for uniform plasma generation
Grant 8,894,805 - Bera , et al. November 25, 2 | 2014-11-25 |
Electron Beam Plasma Source With Reduced Metal Contamination
App 20140338835 - Dorf; Leonid ; et al. | 2014-11-20 |
Electron Beam Plasma Source With Remote Radical Source
App 20140339980 - Wu; Ming-Feng ; et al. | 2014-11-20 |
Symmetrical Plural-coil Plasma Source With Side Rf Feeds And Rf Distribution Plates
App 20140312766 - Carducci; James D. ; et al. | 2014-10-23 |
Digital Phase Controller For Two-phase Operation Of A Plasma Reactor
App 20140265910 - Kobayashi; Satoru ; et al. | 2014-09-18 |
Multiple Coil Inductively Coupled Plasma Source With Offset Frequencies And Double-walled Shielding
App 20140265832 - Kenney; Jason A. ; et al. | 2014-09-18 |
Apparatus And Methods For Reducing Particles In Semiconductor Process Chambers
App 20140272211 - NGUYEN; Andrew ; et al. | 2014-09-18 |
Electron Beam Plasma Source With Segmented Suppression Electrode For Uniform Plasma Generation
App 20140265855 - Dorf; Leonid ; et al. | 2014-09-18 |
Symmetrical Inductively Coupled Plasma Source With Side Rf Feeds And Spiral Coil Antenna
App 20140232263 - Nguyen; Andrew ; et al. | 2014-08-21 |
Apparatus for forming a magnetic field and methods of use thereof
Grant 8,773,020 - Leray , et al. July 8, 2 | 2014-07-08 |
Symmetric VHF plasma power coupler with active uniformity steering
Grant 8,652,297 - Collins , et al. February 18, 2 | 2014-02-18 |
Plasma Reactor With Electron Beam Plasma Source Having A Uniform Magnetic Field
App 20140035458 - Wu; Ming-Feng ; et al. | 2014-02-06 |
Symmetrical Inductively Coupled Plasma Source With Coaxial Rf Feed And Coaxial Shielding
App 20140020838 - Kenney; Jason A. ; et al. | 2014-01-23 |
Inductively Coupled Plasma Source With Plural Top Coils Over A Ceiling And An Independent Side Coil
App 20140020836 - NGUYEN; ANDREW ; et al. | 2014-01-23 |
Inductively Coupled Plasma Source With Symmetrical Rf Feed
App 20140020839 - Kenney; Jason A. ; et al. | 2014-01-23 |
Symmetrical Inductively Coupled Plasma Source With Symmetrical Flow Chamber
App 20140020835 - Nguyen; Andrew ; et al. | 2014-01-23 |
Symmetrical Inductively Coupled Plasma Source With Side Rf Feeds And Rf Distribution Plates
App 20140021861 - Carducci; James D. ; et al. | 2014-01-23 |
Inductively Coupled Plasma Source With Multiple Dielectric Windows And Window-supporting Structure
App 20140020837 - NGUYEN; ANDREW ; et al. | 2014-01-23 |
In-situ Vhf Current Sensor For A Plasma Reactor
App 20130320998 - HANAWA; HIROJI ; et al. | 2013-12-05 |
Plasma Reactor Gas Distribution Plate With Radially Distributed Path Splitting Manifold
App 20130315795 - Bera; Kallol ; et al. | 2013-11-28 |
Esc Cooling Base For Large Diameter Subsrates
App 20130284372 - TAVASSOLI; Hamid ; et al. | 2013-10-31 |
Two-phase Operation Of Plasma Chamber By Phase Locked Loop
App 20130284369 - Kobayashi; Satoru ; et al. | 2013-10-31 |
Independent Control Of Rf Phases Of Separate Coils Of An Inductively Coupled Plasma Reactor
App 20130284370 - Collins; Kenneth S. ; et al. | 2013-10-31 |
Three-coil Inductively Coupled Plasma Source With Individually Controlled Coil Currents From A Single Rf Power Generator
App 20130278142 - Dorf; Leonid ; et al. | 2013-10-24 |
Three-coil Inductively Coupled Plasma Source With Individually Controlled Coil Currents From A Single Rf Power Generator
App 20130278141 - Dorf; Leonid ; et al. | 2013-10-24 |
Plasma Processing Using Rf Return Path Variable Impedance Controller With Two-dimensional Tuning Space
App 20130277333 - Misra; Nipun ; et al. | 2013-10-24 |
Synchronized Radio Frequency Pulsing For Plasma Etching
App 20130213935 - LIAO; BRYAN ; et al. | 2013-08-22 |
Plasma reactor gas distribution plate with radially distributed path splitting manifold
Grant 8,512,509 - Bera , et al. August 20, 2 | 2013-08-20 |
In-situ VHF voltage sensor for a plasma reactor
Grant 8,513,939 - Hanawa , et al. August 20, 2 | 2013-08-20 |
Inductively Coupled Plasma Apparatus
App 20130134129 - TODOROW; VALENTIN N. ; et al. | 2013-05-30 |
Electron Beam Plasma Source With Profiled Conductive Fins For Uniform Plasma Generation
App 20130098555 - Bera; Kallol ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Segmented Beam Dump For Uniform Plasma Generation
App 20130098882 - Dorf; Leonid ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Arrayed Plasma Sources For Uniform Plasma Generation
App 20130098551 - Dorf; Leonid ; et al. | 2013-04-25 |
E-beam Plasma Source With Profiled E-beam Extraction Grid For Uniform Plasma Generation
App 20130098552 - Dorf; Leonid ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Profiled Chamber Wall For Uniform Plasma Generation
App 20130098553 - Bera; Kallol ; et al. | 2013-04-25 |
Overhead Electron Beam Source For Plasma Ion Generation In A Workpiece Processing Region
App 20130098873 - Ramaswamy; Kartik ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Profiled Magnet Shield For Uniform Plasma Generation
App 20130098883 - Bera; Kallol ; et al. | 2013-04-25 |
Switched Electron Beam Plasma Source Array For Uniform Plasma Production
App 20130098872 - Dorf; Leonid ; et al. | 2013-04-25 |
Symmetric Plasma Process Chamber
App 20130087286 - Carducci; James D. ; et al. | 2013-04-11 |
Synchronized radio frequency pulsing for plasma etching
Grant 8,404,598 - Liao , et al. March 26, 2 | 2013-03-26 |
Pulsed plasma high aspect ratio dielectric process
Grant 8,382,999 - Agarwal , et al. February 26, 2 | 2013-02-26 |
Method And Apparatus For Enhancing Flow Uniformity In A Process Chamber
App 20130008604 - BERA; KALLOL ; et al. | 2013-01-10 |
Method and apparatus for removing polymer from the wafer backside and edge
Grant 8,329,593 - Yousif , et al. December 11, 2 | 2012-12-11 |
Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber
Grant 8,313,664 - Chen , et al. November 20, 2 | 2012-11-20 |
Methods And Apparatus For Controlling Plasma In A Process Chamber
App 20120273341 - AGARWAL; ANKUR ; et al. | 2012-11-01 |
RF power delivery system in a semiconductor apparatus
Grant 8,206,552 - Chen , et al. June 26, 2 | 2012-06-26 |
Apparatus For Forming A Magnetic Field And Methods Of Use Thereof
App 20120097870 - LERAY; GARY ; et al. | 2012-04-26 |
In-situ Vhf Voltage/current Sensors For A Plasma Reactor
App 20120086464 - Hanawa; Hiroji ; et al. | 2012-04-12 |
Symmetric Vhf Source For A Plasma Reactor
App 20120043023 - Ramaswamy; Kartik ; et al. | 2012-02-23 |
Symmetric Vhf Plasma Power Coupler With Active Uniformity Steering
App 20120034136 - Collins; Kenneth S. ; et al. | 2012-02-09 |
Plasma Processing Apparatus And Liner Assembly For Tuning Electrical Skews
App 20120018402 - Carducci; James D. ; et al. | 2012-01-26 |
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator
Grant 8,080,479 - Collins , et al. December 20, 2 | 2011-12-20 |
Gas flow equalizer plate suitable for use in a substrate process chamber
Grant 8,075,728 - Balakrishna , et al. December 13, 2 | 2011-12-13 |
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes
Grant 8,076,247 - Collins , et al. December 13, 2 | 2011-12-13 |
Plasma reactor with reduced electrical skew using electrical bypass elements
Grant 7,988,815 - Rauf , et al. August 2, 2 | 2011-08-02 |
Apparatus For Controlling Temperature Uniformity Of A Substrate
App 20110180243 - BERA; KALLOL ; et al. | 2011-07-28 |
Process for wafer backside polymer removal and wafer front side photoresist removal
Grant 7,967,996 - Collins , et al. June 28, 2 | 2011-06-28 |
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
Grant 7,968,469 - Collins , et al. June 28, 2 | 2011-06-28 |
Apparatus And Method For Front Side Protection During Backside Cleaning
App 20110120505 - YOUSIF; IMAD ; et al. | 2011-05-26 |
Inductively Coupled Plasma Apparatus
App 20110094994 - TODOROW; VALENTIN N. ; et al. | 2011-04-28 |
Rf Feed Structure For Plasma Processing
App 20110094683 - CHEN; ZHIGANG ; et al. | 2011-04-28 |
Dual Mode Inductively Coupled Plasma Reactor With Adjustable Phase Coil Assembly
App 20110097901 - BANNA; SAMER ; et al. | 2011-04-28 |
Synchronized Radio Frequency Pulsing For Plasma Etching
App 20110031216 - LIAO; BRYAN ; et al. | 2011-02-10 |
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources
Grant 7,884,025 - Collins , et al. February 8, 2 | 2011-02-08 |
Apparatus and method for front side protection during backside cleaning
Grant 7,879,183 - Yousif , et al. February 1, 2 | 2011-02-01 |
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
Grant 7,879,731 - Collins , et al. February 1, 2 | 2011-02-01 |
Multi-diagnostic Apparatus For Substrate-level Measurements
App 20100327873 - Dorf; Leonid A. ; et al. | 2010-12-30 |
Pulsed Plasma High Aspect Ratio Dielectric Process
App 20100248488 - Agarwal; Ankur ; et al. | 2010-09-30 |
Electrical sensor for real-time feedback control of plasma nitridation
Grant 7,799,661 - Rauf September 21, 2 | 2010-09-21 |
Laterally grown nanotubes and method of formation
Grant 7,772,584 - Orlowski , et al. August 10, 2 | 2010-08-10 |
Thin-film capacitor with a field modification layer
Grant 7,751,177 - Roberts , et al. July 6, 2 | 2010-07-06 |
Efficient And Accurate Method For Real-time Prediction Of The Self-bias Voltage Of A Wafer And Feedback Control Of Esc Voltage In Plasma Processing Chamber
App 20100136793 - Chen; Zhigang ; et al. | 2010-06-03 |
Process Kit Having Reduced Erosion Sensitivity
App 20100101729 - KIM; JONG MUN ; et al. | 2010-04-29 |
Methods And Apparatus For Improving Flow Uniformity In A Process Chamber
App 20100081284 - BALAKRISHNA; AJIT ; et al. | 2010-04-01 |
Workpiece Support For A Plasma Reactor With Controlled Apportionment Of Rf Power To A Process Kit Ring
App 20100018648 - COLLINS; KENNETH S. ; et al. | 2010-01-28 |
Rf Power Delivery System In A Semiconductor Apparatus
App 20090321019 - Chen; Zhigang ; et al. | 2009-12-31 |
Thin-film Capacitor With A Field Modification Layer
App 20090279226 - Roberts; Douglas R. ; et al. | 2009-11-12 |
Electrical Control Of Plasma Uniformity Using External Circuit
App 20090230089 - BERA; KALLOL ; et al. | 2009-09-17 |
Gas Flow Equalizer Plate Suitable For Use In A Substrate Process Chamber
App 20090218043 - Balakrishna; Ajit ; et al. | 2009-09-03 |
Apparatus And Method For Front Side Protection During Backside Cleaning
App 20090214798 - YOUSIF; IMAD ; et al. | 2009-08-27 |
Method for removing metal foot during high-k dielectric/metal gate etching
Grant 7,579,282 - Rauf , et al. August 25, 2 | 2009-08-25 |
Method And Apparatus For Enhancing Flow Uniformity In A Process Chamber
App 20090188624 - BERA; KALLOL ; et al. | 2009-07-30 |
Process for wafer backside polymer removal with a ring of plasma under the wafer
Grant 7,552,736 - Collins , et al. June 30, 2 | 2009-06-30 |
Plasma reactor gas distribution plate with radially distributed path splitting manifold
App 20090162260 - BERA; Kallol ; et al. | 2009-06-25 |
Plasma reactor gas distribution plate having path splitting manifold side-by-side with showerhead
App 20090162262 - Bera; Kallol ; et al. | 2009-06-25 |
Plasma reactor gas distribution plate having a vertically stacked path splitting manifold
App 20090162261 - Baera; Kallol ; et al. | 2009-06-25 |
Plasma reactor gas distribution plate having a path splitting manifold immersed within a showerhead
App 20090159213 - Bera; Kallol ; et al. | 2009-06-25 |
Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
App 20090159002 - Bera; Kallol ; et al. | 2009-06-25 |
Method and apparatus for removing polymer from the wafer backside and edge
App 20090156013 - Yousif; Imad ; et al. | 2009-06-18 |
Method of making a contact on a backside of a die
Grant 7,544,605 - Sparks , et al. June 9, 2 | 2009-06-09 |
Multiple frequency pulsing of multiple coil source to control plasma ion density radial distribution
App 20090139963 - Panagopoulos; Theodoros ; et al. | 2009-06-04 |
Thin-film capacitor with a field modification layer and methods for forming the same
Grant 7,534,693 - Roberts , et al. May 19, 2 | 2009-05-19 |
Plasma Reactor With Reduced Electrical Skew Using Electrical Bypass Elements
App 20090025878 - Rauf; Shahid ; et al. | 2009-01-29 |
Plasma Reactor With Reduced Electrical Skew Using A Conductive Baffle
App 20090025879 - Rauf; Shahid ; et al. | 2009-01-29 |
Laterally Grown Nanotubes And Method Of Formation
App 20080211102 - Orlowski; Marius K. ; et al. | 2008-09-04 |
Process For Wafer Backside Polymer Removal With Wafer Front Side Gas Purge
App 20080179287 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Reactor With Wide Process Window Employing Plural Vhf Sources
App 20080179011 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Temperature-switched Process For Wafer Backside Polymer Removal And Front Side Photoresist Strip
App 20080179290 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Reactor For Wafer Backside Polymer Removal Using Plasma Products In A Lower Process Zone And Purge Gases In An Upper Process Zone
App 20080179007 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Reactor For Wafer Backside Polymer Removal Having An Etch Plasma Jet Stream Source
App 20080179009 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Reactor With Ion Distribution Uniformity Controller Employing Plural Vhf Sources
App 20080178803 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Process For Wafer Backside Polymer Removal With A Ring Of Plasma Under The Wafer
App 20080178913 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Reactor For Wafer Backside Polymer Removal Using An Etch Plasma Feeding A Lower Process Zone And A Scavenger Plasma Feeding An Upper Process Zone
App 20080179008 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Process For Wafer Backside Polymer Removal With A Plasma Stream
App 20080179289 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Process for wafer backside polymer removal and wafer front side photoresist removal
App 20080179291 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources
App 20080182417 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator
App 20080182418 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes
App 20080180028 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Process For Wafer Backside Polymer Removal And Wafer Front Side Scavenger Plasma
App 20080179288 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity
App 20080179181 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources
App 20080182416 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Method Of Making A Contact On A Backside Of A Die
App 20080119046 - Sparks; Terry G. ; et al. | 2008-05-22 |
Method Of Forming A Through-substrate Via
App 20080113505 - Sparks; Terry G. ; et al. | 2008-05-15 |
Laterally grown nanotubes and method of formation
Grant 7,371,677 - Orlowski , et al. May 13, 2 | 2008-05-13 |
Charge-free layer by layer etching of dielectrics
Grant 7,335,602 - Rauf , et al. February 26, 2 | 2008-02-26 |
Laterally grown nanotubes and method of formation
App 20070231946 - Orlowski; Marius K. ; et al. | 2007-10-04 |
Charge-free layer by layer etching of dielectrics
App 20070163994 - Rauf; Shahid ; et al. | 2007-07-19 |
Method for removing metal foot during high-k dielectric/metal gate etching
App 20070166973 - Rauf; Shahid ; et al. | 2007-07-19 |
Thin-film capacitor with a field modification layer and methods for forming the same
App 20070155113 - Roberts; Douglas R. ; et al. | 2007-07-05 |
Electrical sensor for real-time feedback control of plasma nitridation
App 20070155185 - Rauf; Shahid | 2007-07-05 |
Method and apparatus for improving nitrogen profile during plasma nitridation
App 20070049048 - Rauf; Shahid ; et al. | 2007-03-01 |
Method for etching a quartz layer in a photoresistless semiconductor mask
Grant 6,969,568 - Rauf , et al. November 29, 2 | 2005-11-29 |
Method for forming a semiconductor device having metal silicide
App 20050196961 - Zhang, Da ; et al. | 2005-09-08 |
Method for etching a quartz layer in a photoresistless semiconductor mask
App 20050164514 - Rauf, Shahid ; et al. | 2005-07-28 |
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