Nozawa; Toshihisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nozawa; Toshihisa.The latest application filed is for "substrate processing apparatus having electrostatic chuck and substrate processing method".

Company Profile

9.91.120

Nozawa; Toshihisa - Kawasaki-shi JP
Nozawa; Toshihisa - Kawasaki-she JP
Nozawa; Toshihisa - Miyagi JP
Nozawa; Toshihisa - Kawasaki JP
Nozawa; Toshihisa - Kanagawa JP
Nozawa; Toshihisa - Tokyo JP
Nozawa; Toshihisa - Amagasaki JP
Nozawa; Toshihisa - Taiwa-cho JP
Nozawa; Toshihisa - Sendai Miyagi JP
Nozawa; Toshihisa - Kurokawa-gun JP
Nozawa; Toshihisa - Sendai JP
NOZAWA; Toshihisa - Amagasaki-Shi JP
NOZAWA; Toshihisa - Sendai City JP
Nozawa; Toshihisa - Hyogo N/A JP
Nozawa; Toshihisa - Amagasaki City JP
Nozawa; Toshihisa - Kobe JP
Nozawa; Toshihisa - Hyogo-Ken JP
Nozawa; Toshihisa - Kobe-city JP
Nozawa; Toshihisa - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate Processing Apparatus Having Electrostatic Chuck And Substrate Processing Method App 20210166940 - Nozawa; Toshihisa	2021-06-03
Structures Including Dielectric Layers And Methods Of Forming Same App 20210066075 - Zhang; Yan ; et al.	2021-03-04
Method Of Forming Structures Using A Neutral Beam, Structures Formed Using The Method And Reactor System For Performing The Method App 20210017648 - Kubota; Tomohiro ; et al.	2021-01-21
Plasma Device Using Coaxial Waveguide, And Substrate Treatment Method App 20210013010 - Yoshikawa; Jun ; et al.	2021-01-14
Method Of Forming An Electronic Structure Using Reforming Gas, System For Performing The Method, And Structure Formed Using The Method App 20200395209 - Yoshimoto; Shinya ; et al.	2020-12-17
Film forming apparatus and shower head Grant 10,844,489 - Iwasaki , et al. November 24, 2	2020-11-24
Method of spacer-defined direct patterning in semiconductor fabrication Grant 10,658,181 - Nozawa , et al.	2020-05-19
Multi-cell resonator microwave surface-wave plasma apparatus Grant 10,424,462 - Funk , et al. Sept	2019-09-24
Method Of Spacer-defined Direct Patterning In Semiconductor Fabrication App 20190259612 - Nozawa; Toshihisa ; et al.	2019-08-22
Substrate Processing Method And Apparatus App 20190259611 - Nakano; Akinori ; et al.	2019-08-22
Placing bed structure, treating apparatus using the structure, and method for using the apparatus Grant 10,388,557 - Kawamura , et al. A	2019-08-20
Wafer processing apparatus, recording medium and wafer conveying method Grant 10,290,523 - Nozawa	2019-05-14
Methods for manufacturing semiconductor devices Grant 10,262,865 - Fukazawa , et al.	2019-04-16
Film forming apparatus Grant 10,145,014 - Nozawa , et al. De	2018-12-04
Methods For Manufacturing Semiconductor Devices App 20180301342 - Fukazawa; Atsuki ; et al.	2018-10-18
Wafer Processing Apparatus, Recording Medium And Wafer Conveying Method App 20180269088 - NOZAWA; Toshihisa	2018-09-20
Method Of Depositing And Etching Si-containing Film App 20180182614 - NOZAWA; Toshihisa	2018-06-28
Method of depositing and etching Si-containing film Grant 9,960,033 - Nozawa May 1, 2	2018-05-01
Top dielectric quartz plate and slot antenna concept Grant 9,947,516 - Zhao , et al. April 17, 2	2018-04-17
Microwave surface-wave plasma device Grant 9,947,515 - Funk , et al. April 17, 2	2018-04-17
Method of depositing and etching film in one processing apparatus Grant 9,896,762 - Nozawa February 20, 2	2018-02-20
Microwave surface-wave plasma device Grant 9,793,095 - Funk , et al. October 17, 2	2017-10-17
Shower plate sintered integrally with gas release hole member and method for manufacturing the same Grant 9,767,994 - Okesaku , et al. September 19, 2	2017-09-19
Plasma Processing Apparatus App 20170198395 - NOZAWA; Toshihisa	2017-07-13
Method Of Etching Transition Metal Film And Substrate Processing Apparatus App 20170125261 - MIYAMA; Ryo ; et al.	2017-05-04
Plasma processing apparatus Grant 9,631,274 - Nozawa , et al. April 25, 2	2017-04-25
Plasma Processing Apparatus App 20170076914 - NOZAWA; Toshihisa	2017-03-16
Plasma processing apparatus Grant 9,574,267 - Nozawa , et al. February 21, 2	2017-02-21
Plasma Processing Apparatus App 20170011886 - NOZAWA; Toshihisa ; et al.	2017-01-12
Plasma Processing Apparatus And Method For Determining Replacement Of Member Of Plasma Processing Apparatus App 20160189931 - NOZAWA; Toshihisa	2016-06-30
Plasma Processing Apparatus App 20160189934 - NOZAWA; Toshihisa	2016-06-30
Plasma processing apparatus Grant 9,343,270 - Nozawa , et al. May 17, 2	2016-05-17
Film Forming Apparatus And Shower Head App 20160122873 - Iwasaki; Masahide ; et al.	2016-05-05
Plasma Processing Apparatus And Cleaning Method App 20160071700 - NOZAWA; Toshihisa	2016-03-10
Apparatus for plasma treatment and method for plasma treatment Grant 9,277,637 - Nozawa , et al. March 1, 2	2016-03-01
Placing Bed Structure, Treating Apparatus Using The Structure, And Method For Using The Apparatus App 20160020135 - KAWAMURA; Kohei ; et al.	2016-01-21
Top Dielectric Quartz Plate and Slot Antenna Concept App 20150348761 - Zhao; Jianping ; et al.	2015-12-03
Etching Method, Substrate Processing Method, Pattern Forming Method, Method For Manufacturing Semiconductor Element, And Semiconductor Element App 20150325448 - MATSUOKA; Takaaki ; et al.	2015-11-12
Placing bed structure, treating apparatus using the structure, and method for using the apparatus Grant 9,177,846 - Kawamura , et al. November 3, 2	2015-11-03
Plasma Processing Apparatus And Substrate Processing Apparatus Provided With Same App 20150255258 - Nozawa; Toshihisa ; et al.	2015-09-10
Etching method, substrate processing method, pattern forming method, method for manufacturing semiconductor element, and semiconductor element Grant 9,117,764 - Matsuoka , et al. August 25, 2	2015-08-25
Film Forming Apparatus App 20150211124 - Nozawa; Toshihisa ; et al.	2015-07-30
Plasma Processing Apparatus App 20150194290 - Nozawa; Toshihisa ; et al.	2015-07-09
Substrate Processing Apparatus App 20150176125 - NOZAWA; Toshihisa ; et al.	2015-06-25
Plasma Processing Apparatus App 20150159269 - NOZAWA; Toshihisa ; et al.	2015-06-11
Plasma Processing Apparatus App 20150159270 - NOZAWA; Toshihisa ; et al.	2015-06-11
Multi-cell Resonator Microwave Surface-wave Plasma Apparatus App 20150126046 - Funk; Merritt ; et al.	2015-05-07
Plasma Processing Apparatus And Plasma Processing Method App 20150110973 - NEMOTO; Takenao ; et al.	2015-04-23
Film Forming Method, Film Forming Device, And Film Forming System App 20150087140 - Nozawa; Toshihisa ; et al.	2015-03-26
Shower Plate Sintered Integrally With Gas Release Hole Member And Method For Manufacturing The Same App 20150069674 - OKESAKU; Masahiro ; et al.	2015-03-12
Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus Grant 8,973,527 - Nozawa , et al. March 10, 2	2015-03-10
Plasma treatment device and optical monitor device Grant 8,974,628 - Nozawa , et al. March 10, 2	2015-03-10
Plasma processing apparatus and gas supply device for plasma processing apparatus Grant 8,967,082 - Iwasaki , et al. March 3, 2	2015-03-03
Top plate of microwave plasma processing apparatus, plasma processing apparatus and plasma processing method Grant 8,967,080 - Tian , et al. March 3, 2	2015-03-03
Plasma etching apparatus, plasma etching method, and semiconductor device manufacturing method Grant 8,969,210 - Nozawa , et al. March 3, 2	2015-03-03
Valve and processing apparatus provided with the same Grant 8,968,472 - Nozawa March 3, 2	2015-03-03
Manufacturing method of top plate of plasma processing apparatus Grant 8,925,351 - Tian , et al. January 6, 2	2015-01-06
Shower plate sintered integrally with gas release hole member and method for manufacturing the same Grant 8,915,999 - Okesaku , et al. December 23, 2	2014-12-23
Microwave Surface-Wave Plasma Device App 20140262042 - Funk; Merritt ; et al.	2014-09-18
Microwave Surface-Wave Plasma Device App 20140262041 - Funk; Merritt ; et al.	2014-09-18
Plasma Processing Apparatus App 20140251541 - IWAO; Toshihiko ; et al.	2014-09-11
Plasma Processing Apparatus App 20140238607 - NOZAWA; Toshihisa ; et al.	2014-08-28
Method and system for performing different deposition processes within a single chamber Grant 8,815,014 - Faguet , et al. August 26, 2	2014-08-26
Plasma Processing Apparatus App 20140231016 - YOSHIKAWA; Jun ; et al.	2014-08-21
Processing device Grant 8,785,809 - Nozawa , et al. July 22, 2	2014-07-22
Surface treatment for a fluorocarbon film Grant 8,765,605 - Horigome , et al. July 1, 2	2014-07-01
Process Monitoring Device For Use In Substrate Process Apparatus, Process Monitoring Method And Substrate Processing Apparatus App 20140166205 - Tian; Caizhong ; et al.	2014-06-19
Apparatus For Plasma Treatment And Method For Plasma Treatment App 20130302992 - Nozawa; Toshihisa ; et al.	2013-11-14
Manufacturing Method Of Top Plate Of Plasma Processing Apparatus App 20130292047 - Tian; Caizhong ; et al.	2013-11-07
Processing method Grant 8,545,711 - Nozawa , et al. October 1, 2	2013-10-01
Method of operating on-off valve Grant 8,500,089 - Nozawa August 6, 2	2013-08-06
Semiconductor device manufacturing method Grant 8,497,214 - Ueda , et al. July 30, 2	2013-07-30
Plasma Treatment Device And Optical Monitor Device App 20130180660 - Nozawa; Toshihisa ; et al.	2013-07-18
Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor device Grant 8,486,792 - Ueda , et al. July 16, 2	2013-07-16
Plasma processing apparatus Grant 8,480,848 - Tian , et al. July 9, 2	2013-07-09
Etching Method, Substrate Processing Method, Pattern Forming Method, Method For Manufacturing Semiconductor Element, And Semiconductor Element App 20130157468 - Matsuoka; Takaaki ; et al.	2013-06-20
Processing Method App 20130126001 - Nozawa; Toshihisa ; et al.	2013-05-23
Interlayer Insulating Layer Forming Method And Semiconductor Device App 20130130513 - Miyatani; Kotaro ; et al.	2013-05-23
Ceiling Plate And Plasma Process Apparatus App 20130081763 - TIAN; Caizhong ; et al.	2013-04-04
Plasma Processing Method App 20130065399 - UDEA; Hirokazu ; et al.	2013-03-14
Plasma processing unit Grant 8,387,560 - Tian , et al. March 5, 2	2013-03-05
Etching method and recording medium Grant 8,383,519 - Nozawa , et al. February 26, 2	2013-02-26
Processing apparatus and processing method Grant 8,366,869 - Nozawa , et al. February 5, 2	2013-02-05
Ceiling plate and plasma process apparatus Grant 8,343,308 - Tian , et al. January 1, 2	2013-01-01
Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniques Grant 8,323,521 - Zhao , et al. December 4, 2	2012-12-04
Plasma processing apparatus and method for adjusting plasma density distribution Grant 8,273,210 - Tian , et al. September 25, 2	2012-09-25
Plasma processing apparatus and plasma processing method Grant 8,267,040 - Ishibashi , et al. September 18, 2	2012-09-18
Light emitting device and method for manufacturing light emitting device Grant 8,263,174 - Yagi , et al. September 11, 2	2012-09-11
Processing Device App 20120204983 - Nozawa; Toshihisa ; et al.	2012-08-16
Plasma Processing Apparatus And Gas Supply Device For Plasma Processing Apparatus App 20120186521 - Iwasaki; Masahide ; et al.	2012-07-26
Method Of Operating On-off Valve App 20120174986 - NOZAWA; Toshihisa	2012-07-12
Film Forming Method Of Amorphous Carbon Film And Manufacturing Method Of Semiconductor Device Using The Same App 20120156884 - Nozawa; Toshihisa ; et al.	2012-06-21
Plasma Processing Apparatus, Plasma Processing Method, Method For Cleaning Plasma Processing Apparatus And Pressure Control Valve For Plasma Processing Apparatus App 20120111427 - Nozawa; Toshihisa ; et al.	2012-05-10
Processing device Grant 8,173,928 - Nozawa , et al. May 8, 2	2012-05-08
Film forming apparatus and method for manufacturing light emitting element Grant 8,158,012 - Nozawa , et al. April 17, 2	2012-04-17
Plasma Etching Apparatus, Plasma Etching Method, And Semiconductor Device Manufacturing Method App 20120064726 - Nozawa; Toshihisa ; et al.	2012-03-15
Fabrication method of a semiconductor device and a semiconductor device Grant 8,124,523 - Kawamura , et al. February 28, 2	2012-02-28
On-off valve and process apparatus employing the on-off valve Grant 8,123,194 - Nozawa February 28, 2	2012-02-28
Substrate processing apparatus and temperature control device Grant 8,110,044 - Nozawa , et al. February 7, 2	2012-02-07
Gate valve and semiconductor manufacturing apparatus Grant 8,091,863 - Komoto , et al. January 10, 2	2012-01-10
Surface Treatment For A Fluorocarbon Film App 20110318919 - Horigome; Masahiro ; et al.	2011-12-29
Substrate processing apparatus Grant 8,052,887 - Nozawa , et al. November 8, 2	2011-11-08
Plasma processing method for forming a film and an electronic component manufactured by the method Grant 8,021,975 - Miyatani , et al. September 20, 2	2011-09-20
Method And System For Performing Different Deposition Processes Within A Single Chamber App 20110135842 - FAGUET; Jacques ; et al.	2011-06-09
Plasma processing apparatus Grant 7,940,009 - Ishibashi , et al. May 10, 2	2011-05-10
Plasma processing equipment Grant 7,930,992 - Nozawa , et al. April 26, 2	2011-04-26
Film Forming Method Of Silicon Oxide Film, Silicon Oxide Film, Semiconductor Device, And Manufacturing Method Of Semiconductor Device App 20110074013 - Ueda; Hirokazu ; et al.	2011-03-31
Microwave plasma processing apparatus Grant 7,895,971 - Tian , et al. March 1, 2	2011-03-01
Plasma Generation Controlled by Gravity-Induced Gas-Diffusion Separation (GIGDS) Techniques App 20110039355 - Zhao; Jianping ; et al.	2011-02-17
Substrate processing apparatus Grant 7,874,781 - Nozawa , et al. January 25, 2	2011-01-25
Top Plate Of Microwave Plasma Processing Apparatus, Plasma Processing Apparatus And Plasma Processing Method App 20110000780 - Tian; Caizhong ; et al.	2011-01-06
Plasma processing device Grant 7,828,927 - Ishibashi , et al. November 9, 2	2010-11-09
Etching Method And Recording Medium App 20100279510 - Nozawa; Toshihisa ; et al.	2010-11-04
Plasma Processing Apparatus And Method For Plasma-processing Semiconductor Substrate App 20100279512 - Udea; Hirokazu ; et al.	2010-11-04
Placing Bed Structure, Treating Apparatus Using The Structure, And Method For Using The Apparatus App 20100264115 - Kawamura; Kohei ; et al.	2010-10-21
Plasma Processing Apparatus And Method For Adjusting Plasma Density Distribution App 20100252412 - Tian; Caizhong ; et al.	2010-10-07
Semiconductor Device Manufacturing Method App 20100216300 - Ueda; Hirokazu ; et al.	2010-08-26
Plasma processing device Grant 7,779,783 - Ishibashi , et al. August 24, 2	2010-08-24
Deposition Apparatus, Deposition System And Deposition Method App 20100175989 - Moyama; Kazuki ; et al.	2010-07-15
Shower Plate Sintered Integrally With Gas Release Hole Member And Method For Manufacturing The Same App 20100178775 - Okesaku; Masahiro ; et al.	2010-07-15
Plasma processing apparatus and plasma processing method Grant 7,754,995 - Nozawa , et al. July 13, 2	2010-07-13
Valve And Processing Apparatus Provided With The Same App 20100132891 - Nozawa; Toshihisa	2010-06-03
Substrate Processing Apparatus App 20100116789 - Nozawa; Toshihisa ; et al.	2010-05-13
Light Emitting Device Manufacturing Apparatus and Method App 20100055816 - Nozawa; Toshihisa ; et al.	2010-03-04
Ceiling Plate And Plasma Process Apparatus App 20100032094 - Tian; Caizhong ; et al.	2010-02-11
Amorphous Carbon Film, Semiconductor Device, Film Forming Method, Film Forming Apparatus And Storage Medium App 20100032838 - Kikuchi; Yoshiyuki ; et al.	2010-02-11
Fabrication Method Of A Semiconductor Device And A Semiconductor Device App 20100025856 - Kawamura; Kohei ; et al.	2010-02-04
Microwave Introduction Device App 20090266487 - Tian; Caizhong ; et al.	2009-10-29
Substrate Processing Apparatus App 20090266711 - ISHIBASHI; Kiyotaka ; et al.	2009-10-29
Plasma Processing Apparatus App 20090242130 - Tian; Caizhong ; et al.	2009-10-01
Gate Valve And Semiconductor Manufacturing Apparatus App 20090230342 - KOMOTO; Shinji ; et al.	2009-09-17
Thin Film Forming Method And Layered Structure Of Thin Film App 20090208707 - Ueda; Hirokazu ; et al.	2009-08-20
Light-emitting Device, Method For Manufacturing Light-emitting Device, And Substrate Processing Apparatus App 20090206728 - Nozawa; Toshihisa ; et al.	2009-08-20
Apparatus for Manufacturing Light Emitting Elements and Method of Manufacturing Light Emitting Elements App 20090202708 - Moyama; Kazuki ; et al.	2009-08-13
Plasma Processing System App 20090194237 - NOZAWA; Toshihisa ; et al.	2009-08-06
Plasma Processing Apparatus App 20090194238 - Ishibashi; Kiyotaka ; et al.	2009-08-06
Temperature Control Device And Processing Apparatus Using The Same App 20090183677 - Tian; Caizhong ; et al.	2009-07-23
Substrate processing apparatus and substrate processing method App 20090169344 - Nozawa; Toshihisa ; et al.	2009-07-02
Light Emitting Device And Method For Manufacturing Light Emitting Device App 20090156084 - Yagi; Yasushi ; et al.	2009-06-18
Etching Method And Etching Apparatus App 20090137125 - Nozawa; Toshihisa ; et al.	2009-05-28
Plasma Processing Apparatus App 20090074632 - Ishibashi; Kiyotaka ; et al.	2009-03-19
Plasma Processing Apparatus App 20090050052 - Tian; Caizhong ; et al.	2009-02-26
Processing Apparatus and Processing Method App 20090053900 - Nozawa; Toshihisa ; et al.	2009-02-26
Plasma processing method for forming a film and an electronic component manufactured by the method App 20090026588 - Miyatani; Kotaro ; et al.	2009-01-29
Film Forming Apparatus And Method For Manufacturing Light Emitting Element App 20090014412 - Nozawa; Toshihisa ; et al.	2009-01-15
Film Forming Method of Amorphous Carbon Film and Manufacturing Method of Semiconductor Device Using the Same App 20090011602 - Nozawa; Toshihisa ; et al.	2009-01-08
Processing Device App 20090008369 - Nozawa; Toshihisa ; et al.	2009-01-08
Plasma processing device Grant 7,469,654 - Ishibashi , et al. December 30, 2	2008-12-30
Temperature Controlling Method for Substrate Processing System and Substrate Processing System App 20080271471 - Nozawa; Toshihisa ; et al.	2008-11-06
Plasma processing apparatus App 20080254220 - Tian; Caizhong ; et al.	2008-10-16
On-off Valve And Process Apparatus Employing The On-off Valve App 20080230734 - Nozawa; Toshihisa	2008-09-25
Microwave Plasma Processing Apparatus App 20080190560 - Tian; Caizhong ; et al.	2008-08-14
Plasma processing system for treating a substrate Grant 7,396,431 - Chen , et al. July 8, 2	2008-07-08
Plasma Processing Unit App 20080035058 - Tian; Caizhong ; et al.	2008-02-14
Microwave Plasma Processing Apparatus App 20070283887 - Tian; Caizhong ; et al.	2007-12-13
Substrate Processing Apparatus and Temperature Control Device App 20070272155 - Nozawa; Toshihisa ; et al.	2007-11-29
Plasma Processing Apparatus and Plasma Processing Method App 20070264441 - Ishibashi; Kiyotaka ; et al.	2007-11-15
Shield Body and Vacuum Processing Apparatus App 20070240979 - Nozawa; Toshihisa ; et al.	2007-10-18
Substrate Processing Apparatus App 20070221130 - Nozawa; Toshihisa ; et al.	2007-09-27
Method for treating a substrate Grant 7,268,084 - Chen , et al. September 11, 2	2007-09-11
Substrate processing apparatus App 20070163502 - Nozawa; Toshihisa ; et al.	2007-07-19
Plasma processing apparatus App 20070137575 - Ohmi; Tadahiro ; et al.	2007-06-21
Plasma processing equipment App 20070113788 - Nozawa; Toshihisa ; et al.	2007-05-24
Substrate processing device App 20070000612 - Nozawa; Toshihisa ; et al.	2007-01-04
Deposition apparatus and deposition method App 20060213444 - Samukawa; Seiji ; et al.	2006-09-28
Vapor deposition apparatus measuring film thickness by irradiating light App 20060185588 - Nozawa; Toshihisa ; et al.	2006-08-24
Substrate holding mechanism using electrostaic chuck and method of manufacturing the same App 20060175772 - Nozawa; Toshihisa	2006-08-10
Plasma processing apparatus and plasma processing method App 20060156984 - Nozawa; Toshihisa ; et al.	2006-07-20
Plasma processing apparatus and plasma processing method App 20060108331 - Nozawa; Toshihisa ; et al.	2006-05-25
Plasma processing system for treating a substrate App 20060065367 - Chen; Lee ; et al.	2006-03-30
Method for treating a substrate App 20060065629 - Chen; Lee ; et al.	2006-03-30
Plasma processing device App 20060005769 - Ishibashi; Kiyotaka ; et al.	2006-01-12
Plasma processing device App 20050172901 - Ishibashi, Kiyotaka ; et al.	2005-08-11
Plasma processing device App 20050139322 - Ishibashi, Kiyotaka ; et al.	2005-06-30
Substrate processing apparatus and substrate processing method App 20040168633 - Nozawa, Toshihisa ; et al.	2004-09-02
Substrate processing apparatus App 20040168768 - Nozawa, Toshihisa ; et al.	2004-09-02
Method for microfabricating diamond Grant 5,888,846 - Miyata , et al. March 30, 1	1999-03-30
Electrostatic chuck having a multilayer structure for attracting an object Grant 5,539,179 - Nozawa , et al. July 23, 1	1996-07-23
Plasma etching apparatus Grant 5,290,381 - Nozawa , et al. March 1, 1	1994-03-01
Plasma processing apparatus Grant 5,271,788 - Hasegawa , et al. December 21, 1	1993-12-21
Electrostatic chuck and plasma apparatus equipped therewith Grant 5,255,153 - Nozawa , et al. October 19, 1	1993-10-19
Plasma treating apparatus Grant 5,250,137 - Arami , et al. October 5, 1	1993-10-05
Liquid level detecting device and a processing apparatus Grant 5,234,527 - Nozawa , et al. August 10, 1	1993-08-10
Apparatus for forming reduced pressure and for processing object Grant 5,223,113 - Kaneko , et al. June 29, 1	1993-06-29
Support table for plate-like body and processing apparatus using the table Grant 5,221,403 - Nozawa , et al. June 22, 1	1993-06-22
Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is applied Grant 5,147,497 - Nozawa , et al. September 15, 1	1992-09-15