loadpatents
name:-0.11069798469543
name:-0.059832096099854
name:-0.045932054519653
Liang; Qiwei Patent Filings

Liang; Qiwei

Patent Applications and Registrations

Patent applications and USPTO patent grants for Liang; Qiwei.The latest application filed is for "methods for graphene formation".

Company Profile
45.60.90
  • Liang; Qiwei - Fremont CA
  • LIANG; Qiwei - Midlothian VA
  • Liang; Qiwei - Santa Clara CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Batch curing chamber with gas distribution and individual pumping
Grant 11,408,075 - Khan , et al. August 9, 2
2022-08-09
Multi-source ion beam etch system
Grant 11,387,071 - Liang , et al. July 12, 2
2022-07-12
Gas delivery module
Grant 11,361,978 - Khan , et al. June 14, 2
2022-06-14
Methods For Graphene Formation
App 20220172948 - Zhou; Jie ;   et al.
2022-06-02
Monopole Antenna Array Source For Semiconductor Process Equipment
App 20220139668 - Liang; Qiwei ;   et al.
2022-05-05
Blending Of Agricultural Products Via Hyperspectral Imaging And Analysis
App 20220139076 - DEEVI; Seetharama C. ;   et al.
2022-05-05
Methods for graphene formation using microwave surface-wave plasma on dielectric materials
Grant 11,289,331 - Zhou , et al. March 29, 2
2022-03-29
Chemical control features in wafer process equipment
Grant 11,264,213 - Liang , et al. March 1, 2
2022-03-01
Blending of agricultural products via hyperspectral imaging and analysis
Grant 11,250,259 - Deevi , et al. February 15, 2
2022-02-15
Monopole antenna array source for semiconductor process equipment
Grant 11,244,808 - Liang , et al. February 8, 2
2022-02-08
Substrate transfer blade
Grant D941,787 - Malik , et al. January 25, 2
2022-01-25
Monopole antenna array source with gas supply or grid filter for semiconductor process equipment
Grant 11,222,769 - Liang , et al. January 11, 2
2022-01-11
Chemical control features in wafer process equipment
Grant 11,222,771 - Liang , et al. January 11, 2
2022-01-11
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers
App 20220004104 - BABAYAN; Viachslav ;   et al.
2022-01-06
Self-assembled Monolayer Deposition From Low Vapor Pressure Organic Molecules
App 20210375600 - Liang; Qiwei ;   et al.
2021-12-02
Method and apparatus for post exposure processing of photoresist wafers
Grant 11,112,697 - Babayan , et al. September 7, 2
2021-09-07
Gas abatement apparatus
Grant 11,110,383 - Khan , et al. September 7, 2
2021-09-07
Method and apparatus for thin wafer carrier
Grant 11,094,573 - Qiao , et al. August 17, 2
2021-08-17
Pin-less Substrate Transfer Apparatus And Method For A Processing Chamber
App 20210225687 - MALIK; Sultan ;   et al.
2021-07-22
Chemical delivery chamber for self-assembled monolayer processes
Grant 11,066,747 - Liang , et al. July 20, 2
2021-07-20
Methods And Apparatus For Carbon Compound Film Deposition
App 20210217585 - LIANG; Qiwei ;   et al.
2021-07-15
Multi-source Ion Beam Etch System
App 20210104374 - Liang; Qiwei ;   et al.
2021-04-08
High temperature vapor delivery system and method
Grant 10,954,594 - Babayan , et al. March 23, 2
2021-03-23
Low vapor pressure chemical delivery
Grant 10,947,621 - Khan , et al. March 16, 2
2021-03-16
Blending of agricultural products via hyperspectral imaging and analysis
Grant 10,896,325 - Deevi , et al. January 19, 2
2021-01-19
Gas Abatement Apparatus
App 20200368666 - KHAN; Adib ;   et al.
2020-11-26
Gas Delivery System For High Pressure Processing Chamber
App 20200350183 - LIANG; Qiwei ;   et al.
2020-11-05
Gas Delivery Module
App 20200343103 - KHAN; Adib M. ;   et al.
2020-10-29
Gas delivery module
Grant 10,748,783 - Khan , et al. A
2020-08-18
Gas delivery system for high pressure processing chamber
Grant 10,720,341 - Liang , et al.
2020-07-21
In-situ CVD and ALD coating of chamber to control metal contamination
Grant 10,704,141 - Malik , et al.
2020-07-07
Semiconductor Processing System
App 20200185260 - MALIK; Sultan ;   et al.
2020-06-11
Gas abatement apparatus
Grant 10,675,581 - Khan , et al.
2020-06-09
Method And Apparatus For Thin Wafer Carrier
App 20200161156 - QIAO; Jingyu ;   et al.
2020-05-21
Flow Control Features Of Cvd Chambers
App 20200149166 - CHUC; Kien N. ;   et al.
2020-05-14
Plasma reactor with non-power-absorbing dielectric gas shower plate assembly
Grant 10,615,007 - Stowell , et al.
2020-04-07
Methods For Graphene Formation
App 20200105525 - Zhou; Jie ;   et al.
2020-04-02
Gas control in process chamber
Grant 10,590,530 - Liang , et al.
2020-03-17
Gas Abatement Apparatus
App 20200038797 - KHAN; Adib ;   et al.
2020-02-06
Flow control features of CVD chambers
Grant 10,550,472 - Chuc , et al. Fe
2020-02-04
Gas Delivery Module
App 20200035509 - KHAN; Adib M. ;   et al.
2020-01-30
Processing Apparatus
App 20200035513 - KHAN; Adib ;   et al.
2020-01-30
High pressure wafer processing systems and related methods
Grant 10,529,603 - Liang , et al. J
2020-01-07
Chemical Control Features In Wafer Process Equipment
App 20190385823 - Liang; Qiwei ;   et al.
2019-12-19
In-situ Cvd And Ald Coating Of Chamber To Control Metal Contamination
App 20190368035 - MALIK; Sultan ;   et al.
2019-12-05
Method and apparatus for post exposure processing of photoresist wafers
Grant 10,474,033 - Babayan , et al. Nov
2019-11-12
Integrated Cluster Tool For Selective Area Deposition
App 20190301009 - KAUFMAN-OSBORN; Tobin ;   et al.
2019-10-03
Monopole antenna array source with phase shifted zones for semiconductor process equipment
Grant 10,431,427 - Liang , et al. O
2019-10-01
Chemical Control Features In Wafer Process Equipment
App 20190244792 - Liang; Qiwei ;   et al.
2019-08-08
Integrated cluster tool for selective area deposition
Grant 10,358,715 - Kaufman-Osborn , et al.
2019-07-23
Chemical control features in wafer process equipment
Grant 10,354,843 - Liang , et al. July 16, 2
2019-07-16
High Pressure Wafer Processing Systems And Related Methods
App 20190198367 - LIANG; Qiwei ;   et al.
2019-06-27
Gas Control In Process Chamber
App 20190194805 - LIANG; Qiwei ;   et al.
2019-06-27
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers
App 20190187563 - BABAYAN; Viachslav ;   et al.
2019-06-20
Gas Delivery System For High Pressure Processing Chamber
App 20190148178 - LIANG; Qiwei ;   et al.
2019-05-16
Semiconductor processing system and methods using capacitively coupled plasma
Grant 10,283,321 - Yang , et al.
2019-05-07
Gas Delivery System For High Pressure Processing Chamber
App 20190119769 - KHAN; Adib ;   et al.
2019-04-25
Low Vapor Pressure Chemical Delivery
App 20190119813 - KHAN; Adib ;   et al.
2019-04-25
Workpiece processing chamber having a thermal controlled microwave window
Grant 10,269,541 - Stowell , et al.
2019-04-23
Gas control in process chamber
Grant 10,240,232 - Liang , et al.
2019-03-26
High pressure wafer processing systems and related methods
Grant 10,224,224 - Liang , et al.
2019-03-05
Batch Curing Chamber With Gas Distribution And Individual Pumping
App 20190048470 - KHAN; Adib ;   et al.
2019-02-14
Microwave Reactor For Deposition or Treatment of Carbon Compounds
App 20190051495 - Liang; Qiwei ;   et al.
2019-02-14
Method and apparatus for post exposure processing of photoresist wafers
Grant 10,203,604 - Babayan , et al. Feb
2019-02-12
Gas Delivery System For High Pressure Processing Chamber
App 20190017131 - Khan; Adib M. ;   et al.
2019-01-17
Gas delivery system for high pressure processing chamber
Grant 10,179,941 - Khan , et al. Ja
2019-01-15
Workpiece Processing Chamber Having a Rotary Microwave Plasma Source
App 20180352617 - Stowell; Michael W. ;   et al.
2018-12-06
Monopole Antenna Array Source With Gas Supply Or Grid Filter For Semiconductor Process Equipment
App 20180342374 - Liang; Qiwei ;   et al.
2018-11-29
Monopole Antenna Array Source With Phase Shifted Zones For Semiconductor Process Equipment
App 20180342372 - Liang; Qiwei ;   et al.
2018-11-29
Monopole Antenna Array Source For Semiconductor Process Equipment
App 20180342373 - Liang; Qiwei ;   et al.
2018-11-29
Batch curing chamber with gas distribution and individual pumping
Grant 10,113,236 - Khan , et al. October 30, 2
2018-10-30
Pulsed plasma for film deposition
Grant 10,096,466 - Xue , et al. October 9, 2
2018-10-09
Blending Of Agricultural Products Via Hyperspectral Imaging And Analysis
App 20180285621 - DEEVI; Seetharama C. ;   et al.
2018-10-04
High Pressure Wafer Processing Systems And Related Methods
App 20180258533 - Liang; Qiwei ;   et al.
2018-09-13
High Pressure Wafer Processing Systems And Related Methods
App 20180261480 - LIANG; Qiwei ;   et al.
2018-09-13
Workpiece processing chamber having a rotary microwave plasma source
Grant 10,039,157 - Stowell , et al. July 31, 2
2018-07-31
Plasma Reactor With Non-power-absorbing Dielectric Gas Shower Plate Assembly
App 20180182599 - Stowell; Michael W. ;   et al.
2018-06-28
Blending of agricultural products via hyperspectral imaging and analysis
Grant 9,996,745 - Deevi , et al. June 12, 2
2018-06-12
Chemical control features in wafer process equipment
Grant 9,978,564 - Liang , et al. May 22, 2
2018-05-22
Plasma reactor with non-power-absorbing dielectric gas shower plate assembly
Grant 9,905,400 - Stowell , et al. February 27, 2
2018-02-27
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers
App 20170363960 - BABAYAN; Viachslav ;   et al.
2017-12-21
Integrated Cluster Tool For Selective Area Deposition
App 20170350004 - KAUFMAN-OSBORN; Tobin ;   et al.
2017-12-07
Chemical Delivery Chamber For Self-assembled Monolayer Processes
App 20170306491 - LIANG; Qiwei ;   et al.
2017-10-26
Chemical Control Features In Wafer Process Equipment
App 20170236691 - Liang; Qiwei ;   et al.
2017-08-17
Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layer
Grant 9,733,579 - Nam , et al. August 15, 2
2017-08-15
Process Chamber For Dielectric Gapfill
App 20170226637 - Lubomirsky; Dmitry ;   et al.
2017-08-10
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers
App 20170154797 - Babayan; Viachslav ;   et al.
2017-06-01
Sealing groove methods for semiconductor equipment
Grant 9,646,807 - Lubomirsky , et al. May 9, 2
2017-05-09
High Temperature Vapor Delivery System And Method
App 20170088949 - BABAYAN; Viachslav ;   et al.
2017-03-30
Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methods
Grant 9,534,289 - Xue , et al. January 3, 2
2017-01-03
Gas Control In Process Chamber
App 20160369395 - LIANG; Qiwei ;   et al.
2016-12-22
Pulsed Plasma For Film Deposition
App 20160276150 - Xue; Jun ;   et al.
2016-09-22
Tooling Configuration For Electric/magnetic Field Guided Acid Profile Control In A Photoresist Layer
App 20160109813 - NAM; Sang Ki ;   et al.
2016-04-21
Plasma Reactor With Non-power-absorbing Dielectric Gas Shower Plate Assembly
App 20160111256 - Stowell; Michael W. ;   et al.
2016-04-21
Chemical Control Features In Wafer Process Equipment
App 20160005572 - Liang; Qiwei ;   et al.
2016-01-07
Plasma Process Chambers Employing Distribution Grids Having Focusing Surfaces Thereon Enabling Angled Fluxes To Reach A Substrate, And Related Methods
App 20150368801 - XUE; Jun ;   et al.
2015-12-24
Workpiece Processing Chamber Having A Rotary Microwave Plasma Source
App 20150351166 - Stowell; Michael W. ;   et al.
2015-12-03
Workpiece Processing Chamber Having A Thermal Controlled Microwave Window
App 20150348757 - Stowell; Michael W. ;   et al.
2015-12-03
Batch Curing Chamber With Gas Distribution And Individual Pumping
App 20150329970 - KHAN; Adib ;   et al.
2015-11-19
Blending Of Agricultural Products Via Hyperspectral Imaging And Analysis
App 20150289557 - Deevi; Seetharama C. ;   et al.
2015-10-15
Combined Inductive And Capacitive Sources For Semiconductor Process Equipment
App 20150279623 - LIANG; Qiwei
2015-10-01
Semiconductor processing system and methods using capacitively coupled plasma
Grant 9,144,147 - Yang , et al. September 22, 2
2015-09-22
Chemical control features in wafer process equipment
Grant 9,132,436 - Liang , et al. September 15, 2
2015-09-15
Sealing Groove Methods For Semiconductor Equipment
App 20150047786 - LUBOMIRSKY; Dmitry ;   et al.
2015-02-19
Flow Control Features Of Cvd Chambers
App 20150013793 - CHUC; Kien N. ;   et al.
2015-01-15
Flow control features of CVD chambers
Grant 8,894,767 - Chuc , et al. November 25, 2
2014-11-25
Multiple Chamber Module And Platform In Semiconductor Process Equipment
App 20140261168 - Liang; Qiwei ;   et al.
2014-09-18
Blending Of Agricultural Products Via Hyperspectral Imaging And Analysis
App 20140137877 - Deevi; Seetharama C. ;   et al.
2014-05-22
Chemical Control Features In Wafer Process Equipment
App 20140097270 - Liang; Qiwei ;   et al.
2014-04-10
Process Chamber For Dielectric Gapfill
App 20140083362 - LUBOMIRSKY; Dmitry ;   et al.
2014-03-27
Precursor Distribution Features For Improved Deposition Uniformity
App 20130306758 - Park; Soonam ;   et al.
2013-11-21
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma
App 20130153148 - Yang; Jang-Gyoo ;   et al.
2013-06-20
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma
App 20130082197 - Yang; Jang-Gyoo ;   et al.
2013-04-04
Inductive Plasma Sources For Wafer Processing And Chamber Cleaning
App 20130034666 - Liang; Qiwei
2013-02-07
Flowable dielectric equipment and processes
Grant 8,357,435 - Lubomirsky , et al. January 22, 2
2013-01-22
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma
App 20120180954 - Yang; Jang-Gyoo ;   et al.
2012-07-19
Process Chamber For Dielectric Gapfill
App 20120073501 - Lubomirsky; Dmitry ;   et al.
2012-03-29
Remote plasma source seasoning
Grant 7,989,365 - Park , et al. August 2, 2
2011-08-02
Remote Plasma Source Seasoning
App 20110045676 - Park; Soonam ;   et al.
2011-02-24
Flow Control Features Of Cvd Chambers
App 20110011338 - Chuc; Kien N. ;   et al.
2011-01-20
Thermal management of inductively coupled plasma reactors
Grant 7,811,411 - Lu , et al. October 12, 2
2010-10-12
Internal balanced coil for inductively coupled high density plasma processing chamber
Grant 7,789,993 - Chen , et al. September 7, 2
2010-09-07
Plasma Source For Chamber Cleaning And Process
App 20100098882 - Lubomirsky; Dmitry ;   et al.
2010-04-22
Two-piece dome with separate RF coils for inductively coupled plasma reactors
Grant 7,651,587 - Lu , et al. January 26, 2
2010-01-26
Flowable Dielectric Equipment And Processes
App 20090277587 - Lubomirsky; Dmitry ;   et al.
2009-11-12
Flowable Dielectric Equipment And Processes
App 20090280650 - Lubomirsky; Dmitry ;   et al.
2009-11-12
Internal balanced coil for inductively coupled high density plasma processing chamber
Grant 7,572,647 - Chen , et al. August 11, 2
2009-08-11
Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
Grant 7,510,624 - Liang , et al. March 31, 2
2009-03-31
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080188087 - CHEN; ROBERT ;   et al.
2008-08-07
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080188090 - Chen; Robert ;   et al.
2008-08-07
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080185284 - Chen; Robert ;   et al.
2008-08-07
In-situ process state monitoring of chamber
App 20080063810 - Park; Soonam ;   et al.
2008-03-13
Process Chamber For Dielectric Gapfill
App 20070289534 - Lubomirsky; Dmitry ;   et al.
2007-12-20
Process Chamber For Dielectric Gapfill
App 20070281106 - Lubomirsky; Dmitry ;   et al.
2007-12-06
Process Chamber For Dielectric Gapfill
App 20070277734 - Lubomirsky; Dmitry ;   et al.
2007-12-06
Two-piece dome with separate RF coils for inductively coupled plasma reactors
App 20070037397 - Lu; Siqing ;   et al.
2007-02-15
Thermal management of inductively coupled plasma reactors
App 20070034153 - Lu; Siqing ;   et al.
2007-02-15
Inductive plasma system with sidewall magnet
App 20060177600 - Lu; Siqing ;   et al.
2006-08-10
Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
App 20060130756 - Liang; Qiwei ;   et al.
2006-06-22
Magnetic-field concentration in inductively coupled plasma reactors
App 20060075967 - Lu; Siqing ;   et al.
2006-04-13
Non-intrusive plasma probe
Grant 6,894,474 - Cox , et al. May 17, 2
2005-05-17
Non-intrusive plasma probe
App 20030227283 - Cox, Michael S. ;   et al.
2003-12-11
Temperature controlled chamber
Grant 6,598,559 - Vellore , et al. July 29, 2
2003-07-29
Temperature control system for process chamber
Grant 6,326,597 - Lubomirsky , et al. December 4, 2
2001-12-04

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