Kwon; HakYong
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kwon; HakYong.The latest application filed is for "method for filling a gap in a three-dimensional structure on a semiconductor substrate".
- Kwon; HakYong - Hwaseong-si KR
- KWON; HakYong - Yongin-si KR
| Patent | Date |
|---|---|
| Gas-phase reactor system including a gas detector Grant 11,453,946 - Kim , et al. September 27, 2 | 2022-09-27 |
| Method of using a gas-phase reactor system including analyzing exhausted gas Grant 11,345,999 - Kim , et al. May 31, 2 | 2022-05-31 |
| Cyclical deposition method including treatment step and apparatus for same Grant 11,251,040 - Lee , et al. February 15, 2 | 2022-02-15 |
| Method For Filling A Gap In A Three-dimensional Structure On A Semiconductor Substrate App 20210332479 - KIM; KiKang ; et al. | 2021-10-28 |
| Method Of Using A Gas-phase Reactor System Including Analyzing Exhausted Gas App 20200385868 - Kim; SungBae ; et al. | 2020-12-10 |
| Gas-phase Reactor System Including A Gas Detector App 20200385867 - Kim; SungBae ; et al. | 2020-12-10 |
| Cyclical Deposition Method Including Treatment Step And Apparatus For Same App 20200266057 - Lee; SeungHwan ; et al. | 2020-08-20 |
| Substrate Supporting Unit And A Substrate Processing Device Including The Same App 20200141003 - Lee; SeungHwan ; et al. | 2020-05-07 |
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