Kosuda; Motomu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kosuda; Motomu.The latest application filed is for "sputtering apparatus and recording medium for recording control program thereof".

Company Profile

0.7.10

Kosuda; Motomu - Kawasaki JP
KOSUDA; Motomu - Kawasaki-shi JP
Kosuda; Motomu - Machida JP
Kosuda; Motomu - Machida-shi JP
Kosuda; Motomu - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Sputtering apparatus and recording medium for recording control program thereof Grant 10,378,100 - Yamaguchi , et al. A	2019-08-13
Sputtering Apparatus And Recording Medium For Recording Control Program Thereof App 20150101927 - YAMAGUCHI; Nobuo ; et al.	2015-04-16
Semiconductor device and method of manufacturing the same Grant 8,415,753 - Nakagawa , et al. April 9, 2	2013-04-09
Semiconductor Device And Method Of Manufacturing The Same App 20120199919 - Nakagawa; Takashi ; et al.	2012-08-09
Semiconductor Device And Method Of Manufacturing The Same App 20120043617 - Nakagawa; Takashi ; et al.	2012-02-23
Semiconductor manufacturing apparatus and method Grant 8,088,678 - Kitano , et al. January 3, 2	2012-01-03
Semiconductor element and manufacturing method thereof Grant 8,026,143 - Kitano , et al. September 27, 2	2011-09-27
Sputtering Apparatus And Recording Medium For Recording Control Program Thereof App 20110042209 - Yamaguchi; Nobuo ; et al.	2011-02-24
Sputtering film forming method, electronic device manufacturing method, and sputtering system Grant 7,857,946 - Kitano , et al. December 28, 2	2010-12-28
Semiconductor Manufacturing Apparatus And Method App 20100120238 - Kitano; Naomu ; et al.	2010-05-13
Method for depositing a metal gate on a high-k dielectric film Grant 7,655,549 - Sunil , et al. February 2, 2	2010-02-02
Substrate Treating System For Depositing A Metal Gate On A High-k Dielectric Film And Improving High-k Dielectric Film And Metal Gate Interface App 20090178621 - Sunil; Wickramanayaka ; et al.	2009-07-16
Semiconductor Element And Manufacturing Method Thereof App 20090170300 - Kitano; Naomu ; et al.	2009-07-02
Semiconductor Element And Manufacturing Method Thereof App 20080305597 - Kitano; Naomu ; et al.	2008-12-11
Sputtering Film Forming Method, Electronic Device Manufacturing Method, And Sputtering System App 20080264775 - Kitano; Naomu ; et al.	2008-10-30
Method for depositing a metal gate on a high-k dielectric film and improving high-k dielectric film and metal gate interface, and a substrate treating system App 20060194396 - Sunil; Wickramanayaka ; et al.	2006-08-31

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