Kagoshima; Akira

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kagoshima; Akira.The latest application filed is for "plasma processing apparatus and plasma processing system".

Company Profile

16.52.72

Kagoshima; Akira - Tokyo JP
Kagoshima; Akira - Kudamatsu JP
KAGOSHIMA; Akira - Kudamatsu-shi JP
Kagoshima, Akira - Kadamatsu-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Analysis method and semiconductor etching apparatus Grant 11,410,836 - Asakura , et al. August 9, 2	2022-08-09
Plasma processing apparatus and analysis method for analyzing plasma processing data Grant 11,404,253 - Asakura , et al. August 2, 2	2022-08-02
Plasma processing apparatus Grant 11,289,313 - Umeda , et al. March 29, 2	2022-03-29
Plasma Processing Apparatus And Plasma Processing System App 20210074528 - Asakura; Ryoji ; et al.	2021-03-11
Plasma processing apparatus and plasma processing system Grant 10,872,750 - Asakura , et al. December 22, 2	2020-12-22
Plasma Processing Apparatus And Analysis Method For Analyzing Plasma Processing Data App 20200328067 - ASAKURA; Ryoji ; et al.	2020-10-15
Plasma processing apparatus and analysis method for analyzing plasma processing data Grant 10,734,207 - Asakura , et al.	2020-08-04
Plasma Processing Apparatus And Data Analysis Apparatus App 20200066500 - ASAKURA; Ryoji ; et al.	2020-02-27
Plasma processing apparatus and data analysis apparatus Grant 10,510,519 - Asakura , et al. Dec	2019-12-17
Plasma processing apparatus, plasma processing method and plasma processing analysis method Grant 10,408,762 - Asakura , et al. Sept	2019-09-10
Plasma Processing Apparatus App 20190221407 - UMEDA; Shota ; et al.	2019-07-18
Analysis Method And Semiconductor Etching Apparatus App 20190189397 - Asakura; Ryoji ; et al.	2019-06-20
Plasma Processing Apparatus, Plasma Processing Method And Plasma Processing Analysis Method App 20190170653 - ASAKURA; Ryoji ; et al.	2019-06-06
Analysis method and semiconductor etching apparatus Grant 10,262,842 - Asakura , et al.	2019-04-16
Plasma processing apparatus Grant 10,262,840 - Kagoshima , et al.	2019-04-16
Plasma Processing Apparatus App 20190100840 - KAGOSHIMA; Akira ; et al.	2019-04-04
Plasma Processing Apparatus And Plasma Processing System App 20190051502 - ASAKURA; Ryoji ; et al.	2019-02-14
Plasma processing apparatus Grant 10,184,182 - Kagoshima , et al. Ja	2019-01-22
Plasma processing apparatus and plasma processing method Grant 10,153,217 - Shiraishi , et al. Dec	2018-12-11
Plasma Processing Apparatus And Plasma Processing Method App 20180068909 - SHIRAISHI; Daisuke ; et al.	2018-03-08
Plasma Processing Apparatus And Analysis Method For Analyzing Plasma Processing Data App 20180025894 - ASAKURA; Ryoji ; et al.	2018-01-25
Plasma processing method Grant 9,824,866 - Kagoshima , et al. November 21, 2	2017-11-21
Data Management Apparatus And Monitoring Method Of Same App 20170230271 - KAGOSHIMA; Akira ; et al.	2017-08-10
Plasma Processing Apparatus And Data Analysis Apparatus App 20160379896 - ASAKURA; Ryoji ; et al.	2016-12-29
Plasma processing apparatus and analyzing apparatus Grant 9,464,936 - Asakura , et al. October 11, 2	2016-10-11
Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus Grant 9,443,704 - Asakura , et al. September 13, 2	2016-09-13
Plasma Processing Apparatus, Plasma Processing Method And Plasma Processing Analysis Method App 20160225681 - ASAKURA; Ryoji ; et al.	2016-08-04
Data Analysis Method For Plasma Processing Apparatus, Plasma Processing Method And Plasma Processing Apparatus App 20160203957 - ASAKURA; Ryoji ; et al.	2016-07-14
Plasma Processing Apparatus App 20160155611 - KAGOSHIMA; Akira ; et al.	2016-06-02
Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus Grant 9,324,588 - Asakura , et al. April 26, 2	2016-04-26
Data Analysis Method For Plasma Processing Apparatus, Plasma Processing Method And Plasma Processing Apparatus App 20160020123 - ASAKURA; Ryoji ; et al.	2016-01-21
Semiconductor manufacturing equipment Grant 9,110,461 - Morisawa , et al. August 18, 2	2015-08-18
Analysis method, analysis device, and etching processing system Grant 9,091,595 - Asakura , et al. July 28, 2	2015-07-28
Plasma processing apparatus Grant 8,992,721 - Kagoshima , et al. March 31, 2	2015-03-31
Analysis Method And Semiconductor Etching Apparatus App 20150083328 - ASAKURA; Ryoji ; et al.	2015-03-26
Etching apparatus, control simulator, and semiconductor device manufacturing method Grant 8,924,001 - Morisawa , et al. December 30, 2	2014-12-30
Plasma Processing Method App 20140339193 - Kagoshima; Akira ; et al.	2014-11-20
Semiconductor Etching Apparatus And Analyzing Apparatus App 20140262029 - ASAKURA; Ryoji ; et al.	2014-09-18
Plasma Processing Apparatus App 20140277626 - KAGOSHIMA; Akira ; et al.	2014-09-18
Plasma processing apparatus and plasma processing method Grant 8,828,184 - Kagoshima , et al. September 9, 2	2014-09-09
Plasma processing apparatus and plasma processing method Grant 8,784,677 - Shiraishi , et al. July 22, 2	2014-07-22
Vacuum processing apparatus Grant 8,731,706 - Kimura , et al. May 20, 2	2014-05-20
Analysis Method, Analysis Device, And Etching Processing System App 20140022540 - ASAKURA; Ryoji ; et al.	2014-01-23
Semiconductor Manufacturing Equipment App 20130173042 - Morisawa; Toshihiro ; et al.	2013-07-04
Plasma Processing Apparatus And Plasma Processing Method App 20130119016 - KAGOSHIMA; Akira ; et al.	2013-05-16
Etching Apparatus, Control Simulator,and Semiconductor Device Manufacturing Method App 20120310403 - Morisawa; Toshihiro ; et al.	2012-12-06
Etching process state judgment method and system therefor Grant 8,282,849 - Morisawa , et al. October 9, 2	2012-10-09
Plasma Etching Apparatus App 20120085494 - Uchida; Hiroshige ; et al.	2012-04-12
Plasma Processing Apparatus And Plasma Processing Method App 20120018094 - SHIRAISHI; Daisuke ; et al.	2012-01-26
Etching endpoint determination method Grant 8,083,960 - Uchida , et al. December 27, 2	2011-12-27
Plasma Processing Apparatus App 20110083808 - KAGOSHIMA; Akira ; et al.	2011-04-14
Plasma Processing Method App 20100297783 - IKUHARA; Shoji ; et al.	2010-11-25
Plasma Processing System App 20100258246 - Iwakoshi; Takehisa ; et al.	2010-10-14
Plasma Processing Apparatus App 20100132888 - IKUHARA; Shoji ; et al.	2010-06-03
Vacuum Processing Apparatus App 20100068009 - Kimura; Shingo ; et al.	2010-03-18
Disturbance-free, recipe-controlled plasma processing system and method Grant 7,601,240 - Kagoshima , et al. October 13, 2	2009-10-13
Etching process state judgment method and system therefor App 20090253222 - Morisawa; Toshihiro ; et al.	2009-10-08
Etching Endpoint Determination Method App 20090211706 - Uchida; Hiroshige ; et al.	2009-08-27
Disturbance-Free, Recipe-Controlled Plasma Processing System And Method App 20090120580 - Kagoshima; Akira ; et al.	2009-05-14
Method for processing semiconductor Grant 7,473,332 - Tanaka , et al. January 6, 2	2009-01-06
System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation Grant 7,343,217 - Tanaka , et al. March 11, 2	2008-03-11
Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus Grant 7,330,346 - Ikuhara , et al. February 12, 2	2008-02-12
Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus App 20070217118 - Ikuhara; Shoji ; et al.	2007-09-20
Disturbance-free, recipe-controlled plasma processing system and method App 20070193687 - Kagoshima; Akira ; et al.	2007-08-23
Particle control device and particle control method for vacuum processing apparatus Grant 7,166,480 - Shiraishi , et al. January 23, 2	2007-01-23
Plasma processing apparatus App 20060260746 - Ikuhara; Shoji ; et al.	2006-11-23
Method and apparatus for processing semiconductor Grant 7,122,096 - Tanaka , et al. October 17, 2	2006-10-17
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and system therefor App 20060212156 - Tanaka; Junichi ; et al.	2006-09-21
Method for controlling semiconductor processing apparatus Grant 7,107,115 - Tanaka , et al. September 12, 2	2006-09-12
Data processing apparatus for semiconductor processing apparatus App 20060199288 - Tanaka; Junichi ; et al.	2006-09-07
Method for controlling semiconductor processing apparatus App 20060129264 - Tanaka; Junichi ; et al.	2006-06-15
Disturbance-free, recipe-controlled plasma processing system and method App 20060124243 - Kagoshima; Akira ; et al.	2006-06-15
Maintenance method and system for plasma processing apparatus Grant 7,062,347 - Yamamoto , et al. June 13, 2	2006-06-13
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor Grant 7,058,470 - Tanaka , et al. June 6, 2	2006-06-06
Method for controlling semiconductor processing apparatus Grant 7,010,374 - Tanaka , et al. March 7, 2	2006-03-07
Plasma processing apparatus and processing method App 20050284574 - Tanaka, Junichi ; et al.	2005-12-29
Etching system and etching method App 20050236364 - Kagoshima, Akira ; et al.	2005-10-27
Semiconductor manufacturing apparatus and method for assisting monitoring and analysis of the same App 20050217794 - Kagoshima, Akira ; et al.	2005-10-06
Plasma processing apparatus and processing method Grant 6,939,435 - Tanaka , et al. September 6, 2	2005-09-06
Plasma processing method App 20050189320 - Ichimaru, Tomoyoshi ; et al.	2005-09-01
Plasma Processing Apparatus And Processing Method App 20050189070 - Tanaka, Junichi ; et al.	2005-09-01
Method for processing semiconductor App 20050158886 - Tanaka, Junichi ; et al.	2005-07-21
Etching system and etching method Grant 6,916,396 - Kagoshima , et al. July 12, 2	2005-07-12
Plasma processing apparatus and method Grant 6,908,529 - Yamamoto , et al. June 21, 2	2005-06-21
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor App 20050087298 - Tanaka, Junichi ; et al.	2005-04-28
Disturbance-free, recipe-controlled plasma processing method Grant 6,881,352 - Kagoshima , et al. April 19, 2	2005-04-19
Mask trimming apparatus and mask trimming method App 20050054205 - Tanaka, Junichi ; et al.	2005-03-10
Disturbance-free, recipe-controlled plasma processing system and method App 20050022932 - Kagoshima, Akira ; et al.	2005-02-03
Method of detecting particles and a processing apparatus using the same App 20050016953 - Arai, Takeshi ; et al.	2005-01-27
Apparatus and method for producing semiconductors Grant 6,830,649 - Kagoshima , et al. December 14, 2	2004-12-14
Semiconductor plasma processing apparatus with first and second processing state monitoring units Grant 6,828,165 - Tanaka , et al. December 7, 2	2004-12-07
Data processing apparatus for semiconductor processing apparatus App 20040177924 - Tanaka, Junichi ; et al.	2004-09-16
Plasma processing apparatus and method App 20040173311 - Ichimaru, Tomoyoshi ; et al.	2004-09-09
Method for controlling semiconductor processing apparatus App 20040175880 - Tanaka, Junichi ; et al.	2004-09-09
Method and apparatus for processing semiconductor App 20040175849 - Tanaka, Junichi ; et al.	2004-09-09
Data processing apparatus for semiconductor processing apparatus Grant 6,776,872 - Tanaka , et al. August 17, 2	2004-08-17
Particle control device and particle control method for vacuum processing apparatus App 20040149208 - Shiraishi, Daisuke ; et al.	2004-08-05
Plasma processing apparatus for processing semiconductor wafer using plasma Grant 6,771,481 - Nishio , et al. August 3, 2	2004-08-03
Maintenance method and system for plasma processing apparatus etching and apparatus Grant 6,745,096 - Yamamoto , et al. June 1, 2	2004-06-01
Disturbance-free, recipe-controlled plasma processing system and method Grant 6,733,618 - Kagoshima , et al. May 11, 2	2004-05-11
Etching system and etching method App 20040060659 - Morioka, Natsuyo ; et al.	2004-04-01
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor Grant 6,706,543 - Tanaka , et al. March 16, 2	2004-03-16
Etching system and etching method App 20030230551 - Kagoshima, Akira ; et al.	2003-12-18
Maintenance method and system for plasma processing apparatus App 20030201240 - Yamamoto, Hideyuki ; et al.	2003-10-30
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor App 20030199108 - Tanaka, Junichi ; et al.	2003-10-23
Data processing apparatus for semiconductor processing apparatus App 20030168171 - Tanaka, Junichi ; et al.	2003-09-11
Plasma processing apparatus and method App 20030170984 - Yamamoto, Hideyuki ; et al.	2003-09-11
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor Grant 6,616,759 - Tanaka , et al. September 9, 2	2003-09-09
Disturbance-free, recipe-controlled plasma processing system and method App 20030113945 - Kagoshima, Akira ; et al.	2003-06-19
Apparatus and method for producing semiconductors App 20030114011 - Kagoshima, Akira ; et al.	2003-06-19
Method Of Monitoring And/or Controlling A Semiconductor Manufacturing Apparatus And A System Therefor App 20030045009 - Tanaka, Junichi ; et al.	2003-03-06
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor App 20030045007 - Tanaka, Junichi ; et al.	2003-03-06
Method and system for simulating processing condition of sample App 20030033130 - Hara, Tsutomu ; et al.	2003-02-13
Maintenance method and system for plasma processing apparatus etching and apparatus App 20030019839 - Yamamoto, Hideyuki ; et al.	2003-01-30
Disturbance-free, recipe-controlled plasma processing system and method App 20030003607 - Kagoshima, Akira ; et al.	2003-01-02
Plasma processing apparatus for processing semiconductor wafer using plasma App 20020114123 - Nishio, Ryoji ; et al.	2002-08-22