| Patent | Date |
|---|
Systems And Methods For Monitoring Faults, Anomalies, And Other Characteristics Of A Switched Mode Ion Energy Distribution System
App 20220157555 - Carter; Daniel ; et al. | 2022-05-19 |
Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
Grant 11,189,454 - Carter , et al. November 30, 2 | 2021-11-30 |
Cathode For Solid-state Lithium Battery
App 20210359339 - Lou; Sally S. ; et al. | 2021-11-18 |
System, Method, And Apparatus For Ion Current Compensation
App 20210327679 - Carter; Daniel ; et al. | 2021-10-21 |
System, method, and apparatus for controlling ion energy distribution in plasma processing systems
Grant 11,011,349 - Brouk , et al. May 18, 2 | 2021-05-18 |
Physical vapor deposition with isotropic neutral and non-isotropic ion velocity distribution at the wafer surface
Grant 10,648,074 - Hoffman , et al. | 2020-05-12 |
Ion Energy Bias Control With Plasma-source Pulsing
App 20200090905 - Brouk; Victor ; et al. | 2020-03-19 |
Physical Vapor Deposition With Isotropic Neutral And Non-isotropic Ion Velocity Distribution At The Wafer Surface
App 20190338411 - Hoffman; Daniel J. ; et al. | 2019-11-07 |
Physical vapor deposition system with a source of isotropic ion velocity distribution at the wafer surface
Grant 10,400,328 - Hoffman , et al. Sep | 2019-09-03 |
System, Method, And Apparatus For Controlling Ion Energy Distribution In Plasma Processing Systems
App 20190180982 - Brouk; Victor ; et al. | 2019-06-13 |
Projected plasma source
Grant 10,225,919 - Hoffman , et al. | 2019-03-05 |
Plasma source device and methods
Grant 10,224,186 - Polak , et al. | 2019-03-05 |
Annular baffle
Grant 10,012,248 - Hoffman , et al. July 3, 2 | 2018-07-03 |
Physical Vapor Deposition System with a Source of Isotropic Ion Velocity Distribution at the Wafer Surface
App 20180119272 - Hoffman; Daniel J. ; et al. | 2018-05-03 |
System, Method, And Apparatus For Controlling Ion Energy Distribution In Plasma Processing Systems
App 20180019100 - Brouk; Victor ; et al. | 2018-01-18 |
Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surface
Grant 9,856,558 - Hoffman , et al. January 2, 2 | 2018-01-02 |
Hdd Pattern Implant System
App 20170365288 - Foad; Majeed A. ; et al. | 2017-12-21 |
Systems And Methods For Monitoring Faults, Anomalies, And Other Characteristics Of A Switched Mode Ion Energy Distribution System
App 20170278665 - Carter; Daniel ; et al. | 2017-09-28 |
Method of controlling the switched mode ion energy distribution system
Grant 9,767,988 - Brouk , et al. September 19, 2 | 2017-09-19 |
Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
Grant 9,685,297 - Carter , et al. June 20, 2 | 2017-06-20 |
HDD pattern implant system
Grant 9,685,186 - Foad , et al. June 20, 2 | 2017-06-20 |
Physical vapor deposition chamber with capacitive tuning at wafer support
Grant 9,593,411 - Hoffman , et al. March 14, 2 | 2017-03-14 |
Systems, methods, and apparatus for minimizing cross coupled wafer surface potentials
Grant 9,589,767 - Hoffman , et al. March 7, 2 | 2017-03-07 |
Electrostatic remote plasma source system and method
Grant 9,524,854 - Hoffman , et al. December 20, 2 | 2016-12-20 |
Annular Baffle
App 20160341227 - HOFFMAN; Daniel J. ; et al. | 2016-11-24 |
Plasma Source Device and Methods
App 20160268104 - Polak; Scott ; et al. | 2016-09-15 |
Wafer chucking system for advanced plasma ion energy processing systems
Grant 9,435,029 - Brouk , et al. September 6, 2 | 2016-09-06 |
Method of controlling the switched mode ion energy distribution system
Grant 9,362,089 - Brouk , et al. June 7, 2 | 2016-06-07 |
System, method and apparatus for controlling ion energy distribution of a projected plasma
Grant 9,309,594 - Hoffman , et al. April 12, 2 | 2016-04-12 |
System, method and apparatus for controlling ion energy distribution
Grant 9,287,086 - Brouk , et al. March 15, 2 | 2016-03-15 |
Ion Energy Bias Control Apparatus
App 20160020072 - Brouk; Victor ; et al. | 2016-01-21 |
Systems and methods for calibrating a switched mode ion energy distribution system
Grant 9,210,790 - Hoffman , et al. December 8, 2 | 2015-12-08 |
Method for controlling ion energy distribution
Grant 9,208,992 - Brouk , et al. December 8, 2 | 2015-12-08 |
Electrostatic Remote Plasma Source System And Method
App 20150279631 - Hoffman; Daniel J. ; et al. | 2015-10-01 |
Capacitively coupled remote plasma source
Grant 9,142,388 - Hoffman , et al. September 22, 2 | 2015-09-22 |
Wide dynamic range ion energy bias control; fast ion energy switching; ion energy control and a pulsed bias supply; and a virtual front panel
Grant 9,105,447 - Brouk , et al. August 11, 2 | 2015-08-11 |
Method For Controlling Ion Energy Distribution
App 20150144596 - Brouk; Victor ; et al. | 2015-05-28 |
Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning
Grant 9,017,533 - Forster , et al. April 28, 2 | 2015-04-28 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
Grant 8,980,044 - Brillhart , et al. March 17, 2 | 2015-03-17 |
Systems, Methods, And Apparatus For Minimizing Cross Coupled Wafer Surface Potentials
App 20150024515 - Hoffman; Daniel J. ; et al. | 2015-01-22 |
Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning
Grant 08920611 - | 2014-12-30 |
Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning
Grant 8,920,611 - Forster , et al. December 30, 2 | 2014-12-30 |
Remote plasma source generating a disc-shaped plasma
Grant 8,884,525 - Hoffman , et al. November 11, 2 | 2014-11-11 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
Grant 8,801,893 - Brillhart , et al. August 12, 2 | 2014-08-12 |
Capacitively Coupled Remote Plasma Source
App 20140210345 - Hoffman; Daniel J. | 2014-07-31 |
Annular Baffle
App 20140130926 - HOFFMAN; Daniel J. ; et al. | 2014-05-15 |
Electrostatic remote plasma source
Grant 8,723,423 - Hoffman , et al. May 13, 2 | 2014-05-13 |
Systems And Methods For Calibrating A Switched Mode Ion Energy Distribution System
App 20140062303 - Hoffman; Daniel J. ; et al. | 2014-03-06 |
Systems And Methods For Monitoring Faults, Anomalies, And Other Characteristics Of A Switched Mode Ion Energy Distribution System
App 20140062495 - Carter; Daniel ; et al. | 2014-03-06 |
Wide Dynamic Range Ion Energy Bias Control; Fast Ion Energy Switching; Ion Energy Control And A Pulsed Bias Supply; And A Virtual Front Panel
App 20140061156 - Brouk; Victor ; et al. | 2014-03-06 |
Annular baffle
Grant 8,647,438 - Hoffman , et al. February 11, 2 | 2014-02-11 |
Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
Grant 8,617,351 - Hoffman , et al. December 31, 2 | 2013-12-31 |
Cathode with inner and outer electrodes at different heights
Grant 8,607,731 - Hoffman , et al. December 17, 2 | 2013-12-17 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Grant 8,608,900 - Buchberger, Jr. , et al. December 17, 2 | 2013-12-17 |
Methods for depositing metal in high aspect ratio features
Grant 8,563,428 - Brown , et al. October 22, 2 | 2013-10-22 |
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
Grant 8,546,267 - Brillhart , et al. October 1, 2 | 2013-10-01 |
Substrate Cleaning Chamber And Cleaning And Conditioning Methods
App 20130192629 - Mehta; Vineet ; et al. | 2013-08-01 |
Substrate cleaning chamber and cleaning and conditioning methods
Grant 8,435,379 - Mehta , et al. May 7, 2 | 2013-05-07 |
Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
Grant 8,357,264 - Shannon , et al. January 22, 2 | 2013-01-22 |
Physical Vapor Deposition Chamber With Capacitive Tuning At Wafer Support
App 20130008778 - HOFFMAN; DANIEL J. ; et al. | 2013-01-10 |
Projected Plasma Source
App 20130001196 - Hoffman; Daniel J. ; et al. | 2013-01-03 |
Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator
Grant 8,337,661 - Shannon , et al. December 25, 2 | 2012-12-25 |
Capacitively coupled plasma reactor having very agile wafer temperature control
Grant 8,337,660 - Buchberger, Jr. , et al. December 25, 2 | 2012-12-25 |
Method Of Controlling The Switched Mode Ion Energy Distribution System
App 20120319584 - Brouk; Victor ; et al. | 2012-12-20 |
Method Of Controlling The Switched Mode Ion Energy Distribution System
App 20120318456 - Brouk; Victor ; et al. | 2012-12-20 |
Method of processing a workpiece in a plasma reactor using feed forward thermal control
Grant 8,329,586 - Buchberger, Jr. , et al. December 11, 2 | 2012-12-11 |
Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
Grant 8,324,525 - Shannon , et al. December 4, 2 | 2012-12-04 |
Substrate support having fluid channel
Grant 8,279,577 - Nguyen , et al. October 2, 2 | 2012-10-02 |
Remote Plasma Source Generating A Disc-shaped Plasma
App 20120242229 - Hoffman; Daniel J. ; et al. | 2012-09-27 |
System, Method And Apparatus For Controlling Ion Energy Distribution Of A Projected Plasma
App 20120217221 - Hoffman; Daniel J. ; et al. | 2012-08-30 |
Plasma Immersion Chamber
App 20120199071 - COLLINS; KENNETH S. ; et al. | 2012-08-09 |
Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone
Grant 8,231,799 - Bera , et al. July 31, 2 | 2012-07-31 |
Electrostatic Remote Plasma Source
App 20120187844 - Hoffman; Daniel J. ; et al. | 2012-07-26 |
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
Grant 8,221,580 - Buchberger, Jr. , et al. July 17, 2 | 2012-07-17 |
Methods For Depositing Metal In High Aspect Ratio Features
App 20120149192 - BROWN; KARL ; et al. | 2012-06-14 |
Capacitively coupled plasma reactor having very agile wafer temperature control
Grant 8,157,951 - Buchberger, Jr. , et al. April 17, 2 | 2012-04-17 |
Wafer Chucking System for Advanced Plasma Ion Energy Processing Systems
App 20120052599 - Brouk; Victor ; et al. | 2012-03-01 |
Gas flow diffuser
Grant 8,123,902 - Brillhart , et al. February 28, 2 | 2012-02-28 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Grant 8,092,639 - Buchberger, Jr. , et al. January 10, 2 | 2012-01-10 |
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
Grant 8,092,638 - Brillhart , et al. January 10, 2 | 2012-01-10 |
Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target
Grant 8,070,925 - Hoffman , et al. December 6, 2 | 2011-12-06 |
Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor
Grant 8,048,328 - Lindley , et al. November 1, 2 | 2011-11-01 |
Methods to avoid unstable plasma states during a process transition
Grant 8,048,806 - Kutney , et al. November 1, 2 | 2011-11-01 |
System, Method And Apparatus For Controlling Ion Energy Distribution
App 20110259851 - Brouk; Victor ; et al. | 2011-10-27 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
Grant 8,034,180 - Brillhart , et al. October 11, 2 | 2011-10-11 |
Method for agile workpiece temperature control in a plasma reactor using a thermal model
Grant 8,021,521 - Buchberger, Jr. , et al. September 20, 2 | 2011-09-20 |
Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources
Grant 8,018,164 - Shannon , et al. September 13, 2 | 2011-09-13 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
Grant 8,012,304 - Brillhart , et al. September 6, 2 | 2011-09-06 |
Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator
Grant 8,002,945 - Shannon , et al. August 23, 2 | 2011-08-23 |
Capacitively Coupled Plasma Reactor With Magnetic Plasma Control
App 20110201134 - Hoffman; Daniel J. ; et al. | 2011-08-18 |
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
Grant 7,988,872 - Brillhart , et al. August 2, 2 | 2011-08-02 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
Grant 7,972,467 - Bera , et al. July 5, 2 | 2011-07-05 |
High density plasma gapfill deposition-etch-deposition process etchant
Grant 7,972,968 - Lee , et al. July 5, 2 | 2011-07-05 |
Method of plasma load impedance tuning by modulation of an unmatched low power RF generator
Grant 7,967,944 - Shannon , et al. June 28, 2 | 2011-06-28 |
Capacitively coupled plasma reactor with magnetic plasma control
Grant 7,955,986 - Hoffman , et al. June 7, 2 | 2011-06-07 |
Method Of Processing A Workpiece In A Plasma Reactor Using Multiple Zone Feed Forward Thermal Control
App 20110068085 - Brillhart; Paul Lukas ; et al. | 2011-03-24 |
Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
Grant 7,910,013 - Hoffman , et al. March 22, 2 | 2011-03-22 |
Method Of Processing A Workpiece In A Plasma Reactor Using Feed Forward Thermal Control
App 20110065279 - Buchberger, JR.; Douglas A. ; et al. | 2011-03-17 |
Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
Grant 7,901,952 - Hoffman , et al. March 8, 2 | 2011-03-08 |
Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor
Grant 7,883,633 - Lindley , et al. February 8, 2 | 2011-02-08 |
Substrate Support Having Fluid Channel
App 20110024047 - NGUYEN; Andrew ; et al. | 2011-02-03 |
Capacitivley Coupled Plasma Reactor Having A Cooled/heated Wafer Support With Uniform Temperature Distribution
App 20100319852 - Brillhart; Paul Lukas ; et al. | 2010-12-23 |
Plasma Reactor With Feed Forward Thermal Control System Using A Thermal Model For Accommodating Rf Power Changes Or Wafer Temperature Changes
App 20100319851 - Buchberger, JR.; Douglas A. ; et al. | 2010-12-23 |
Plasma Reactor With A Multiple Zone Thermal Control Feed Forward Control Apparatus
App 20100314046 - Brillhart; Paul Lukas ; et al. | 2010-12-16 |
Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition
App 20100314245 - Brown; Karl ; et al. | 2010-12-16 |
Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition
App 20100314244 - Brown; Karl ; et al. | 2010-12-16 |
Method for monitoring process drift using plasma characteristics
Grant 7,848,898 - Shannon , et al. December 7, 2 | 2010-12-07 |
Method Of Cooling A Wafer Support At A Uniform Temperature In A Capacitively Coupled Plasma Reactor
App 20100300621 - Brillhart; Paul Lukas ; et al. | 2010-12-02 |
Capacitively Coupled Plasma Reactor Having Very Agile Wafer Temperature Control
App 20100303680 - Buchberger, JR.; Douglas A. ; et al. | 2010-12-02 |
Plasma control using dual cathode frequency mixing
Grant 7,838,430 - Shannon , et al. November 23, 2 | 2010-11-23 |
Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
Grant 7,795,153 - Hoffman , et al. September 14, 2 | 2010-09-14 |
Method of plasma confinement for enhancing magnetic control of plasma radial distribution
Grant 7,780,866 - Miller , et al. August 24, 2 | 2010-08-24 |
Methods and apparatus for controlling characteristics of a plasma
Grant 7,777,599 - Shannon , et al. August 17, 2 | 2010-08-17 |
Substrate support having heat transfer system
Grant 7,768,765 - Nguyen , et al. August 3, 2 | 2010-08-03 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma
Grant 7,754,997 - Bera , et al. July 13, 2 | 2010-07-13 |
Modulation Of Rf Returning Straps For Uniformity Control
App 20100136261 - Tso; Alan ; et al. | 2010-06-03 |
Physical Vapor Deposition Reactor With Circularly Symmetric Rf Feed And Dc Feed To The Sputter Target
App 20100096261 - HOFFMAN; DANIEL J. ; et al. | 2010-04-22 |
Control Of Erosion Profile On A Dielectric Rf Sputter Target
App 20100089748 - C.FORSTER; JOHN ; et al. | 2010-04-15 |
Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor
Grant 7,695,983 - Hoffman April 13, 2 | 2010-04-13 |
High Density Plasma Gapfill Deposition-etch-deposition Process Using Fluorocarbon Etchant
App 20100041207 - Lee; Young S. ; et al. | 2010-02-18 |
Method For Controlling Radial Distribution Of Plasma Ion Density And Ion Energy At A Workpiece Surface By Multi-frequency Rf Impedance Tuning
App 20100012480 - Forster; John C. ; et al. | 2010-01-21 |
Apparatus For Controlling Radial Distribution Of Plasma Ion Density And Ion Energy At A Workpiece Surface By Multi-frequency Rf Impedance Tuning
App 20100012029 - FORSTER; John C. ; et al. | 2010-01-21 |
Cathode With Inner And Outer Electrodes At Different Heights
App 20090314433 - Hoffman; Daniel J. ; et al. | 2009-12-24 |
Plasma Reactor With Plasma Load Impedance Tuning For Engineered Transients By Synchronized Modulation Of An Unmatched Low Power Rf Generator
App 20090294061 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method Of Plasma Load Impedance Tuning By Modulation Of A Source Power Or Bias Power Rf Generator
App 20090294275 - Shannon; Steven C. ; et al. | 2009-12-03 |
Plasma Reactor With High Speed Plasma Load Impedance Tuning By Modulation Of Different Unmatched Frequency Sources
App 20090295295 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method Of Plasma Load Impedance Tuning For Engineered Transients By Synchronized Modulation Of An Unmatched Low Power Rf Generator
App 20090298287 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method Of Plasma Load Impedance Tuning By Modulation Of An Unmatched Low Power Rf Generator
App 20090295296 - Shannon; Steven C. ; et al. | 2009-12-03 |
Plasma Reactor With High Speed Plasma Impedance Tuning By Modulation Of Source Power Or Bias Power
App 20090297404 - SHANNON; STEVEN C. ; et al. | 2009-12-03 |
Plasma Reactor With Plasma Load Impedance Tuning For Engineered Transients By Synchronized Modulation Of A Source Power Or Bias Power Rf Generator
App 20090294062 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method Of Plasma Load Impedance Tuning For Engineered Transients By Synchronized Modulation Of A Source Power Or Bias Power Rf Gererator
App 20090294414 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method for determining plasma characteristics
Grant 7,620,511 - Shannon , et al. November 17, 2 | 2009-11-17 |
Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fields
App 20090250432 - Hoffman; Daniel J. ; et al. | 2009-10-08 |
Method of controlling plasma distribution uniformity by superposition of different constant solenoid fields
App 20090250335 - Hoffman; Daniel J. ; et al. | 2009-10-08 |
Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surface
App 20090229969 - Hoffman; Daniel J. ; et al. | 2009-09-17 |
Method of determining wafer voltage in a plasma reactor from applied bias voltage and current and a pair of constants
Grant 7,585,685 - Hoffman September 8, 2 | 2009-09-08 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
Grant 7,585,384 - Bera , et al. September 8, 2 | 2009-09-08 |
Matching network characterization using variable impedance analysis
Grant 7,554,334 - Shannon , et al. June 30, 2 | 2009-06-30 |
Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current
Grant 7,553,679 - Hoffman June 30, 2 | 2009-06-30 |
Methods And Apparatus For Controlling Characteristics Of A Plasma
App 20090140828 - Shannon; Steven C. ; et al. | 2009-06-04 |
Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content
Grant 7,540,971 - Bera , et al. June 2, 2 | 2009-06-02 |
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
Grant 7,541,292 - Bera , et al. June 2, 2 | 2009-06-02 |
Method For Determining Plasma Characteristics
App 20090132189 - Shannon; Steven C. ; et al. | 2009-05-21 |
Method For Monitoring Process Drift Using Plasma Characteristics
App 20090130856 - Shannon; Steven C. ; et al. | 2009-05-21 |
Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling chamber parameters of source power and bias power
Grant 7,521,370 - Hoffman April 21, 2 | 2009-04-21 |
Plasma generation and control using dual frequency RF signals
Grant 7,510,665 - Shannon , et al. March 31, 2 | 2009-03-31 |
Gasless high voltage high contact force wafer contact-cooling electrostatic chuck
Grant 7,479,456 - Buchberger, Jr. , et al. January 20, 2 | 2009-01-20 |
Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
Grant 7,470,626 - Hoffman , et al. December 30, 2 | 2008-12-30 |
Apparatus And Method To Confine Plasma And Reduce Flow Resistance In A Plasma Reactor
App 20080314522 - Bera; Kallol ; et al. | 2008-12-25 |
Annular Baffle
App 20080314571 - Hoffman; Daniel J. ; et al. | 2008-12-25 |
Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
Grant 7,452,824 - Hoffman , et al. November 18, 2 | 2008-11-18 |
Substrate Cleaning Chamber And Cleaning And Conditioning Methods
App 20080276958 - Mehta; Vineet ; et al. | 2008-11-13 |
Method for determining plasma characteristics
Grant 7,440,859 - Shannon , et al. October 21, 2 | 2008-10-21 |
Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation
Grant 7,431,859 - Bera , et al. October 7, 2 | 2008-10-07 |
Gas Flow Diffuser
App 20080230518 - Brillhart; Paul ; et al. | 2008-09-25 |
Plasma Immersion Chamber
App 20080173237 - Collins; Kenneth S. ; et al. | 2008-07-24 |
Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output
Grant 7,375,947 - Yang , et al. May 20, 2 | 2008-05-20 |
Method Of Plasma Confinement For Enhancing Magnetic Control Of Plasma Radial Distribution
App 20080110860 - Miller; Matthew L. ; et al. | 2008-05-15 |
Plasma Confinement Baffle And Flow Equalizer For Enhanced Magnetic Control Of Plasma Radial Distribution
App 20080110567 - Miller; Matthew L. ; et al. | 2008-05-15 |
Apparatus And Method To Confine Plasma And Reduce Flow Resistance In A Plasma Reactor
App 20080105660 - Bera; Kallol ; et al. | 2008-05-08 |
Matching Network Characterization Using Variable Impedance Analysis
App 20080087381 - SHANNON; STEVEN C. ; et al. | 2008-04-17 |
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
Grant 7,359,177 - Yang , et al. April 15, 2 | 2008-04-15 |
Capacitively coupled plasma reactor with magnetic plasma control
App 20080023143 - Hoffman; Daniel J. ; et al. | 2008-01-31 |
Method For Determining Plasma Characteristics
App 20070289359 - Shannon; Steven C. ; et al. | 2007-12-20 |
Method For Determining Plasma Characteristics
App 20070294043 - SHANNON; STEVEN C. ; et al. | 2007-12-20 |
Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation
App 20070251918 - Bera; Kallol ; et al. | 2007-11-01 |
Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content
App 20070251917 - Bera; Kallol ; et al. | 2007-11-01 |
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
App 20070254486 - Bera; Kallol ; et al. | 2007-11-01 |
Method of operating a plasma reactor having an overhead electrode with a fixed impedance match element
App 20070251920 - Hoffman; Daniel J. | 2007-11-01 |
Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone
App 20070251642 - Bera; Kallol ; et al. | 2007-11-01 |
Plasma etch process using polymerizing etch gases and an inert diluent gas in independent gas injection zones to improve etch profile or etch rate uniformity
App 20070254483 - Bera; Kallol ; et al. | 2007-11-01 |
Method for determining plasma characteristics
Grant 7,286,948 - Shannon , et al. October 23, 2 | 2007-10-23 |
Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
Grant 7,247,218 - Hoffman July 24, 2 | 2007-07-24 |
Substrate Support Having Heat Transfer System
App 20070165356 - Nguyen; Andrew ; et al. | 2007-07-19 |
Method Of Feedback Control Of Esc Voltage Using Wafer Voltage Measurement At The Bias Supply Output
App 20070127188 - Yang; Jang Gyoo ; et al. | 2007-06-07 |
Method For Shaping A Magnetic Field In A Magnetic Field-enhanced Plasma Reactor
App 20070113980 - Lindley; Roger Alan ; et al. | 2007-05-24 |
Substrate support having heat transfer system
Grant 7,221,553 - Nguyen , et al. May 22, 2 | 2007-05-22 |
Method For Shaping A Magnetic Field In A Magnetic Field-enhanced Plasma Reactor
App 20070108042 - Hogenson; Scott A. ; et al. | 2007-05-17 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
App 20070097580 - Brillhart; Paul Lukas ; et al. | 2007-05-03 |
Method of controlling a chamber based upon predetermined concurrent behavoir of selected plasma parameters as a function of selected chamber paramenters
App 20070095788 - Hoffman; Daniel J. ; et al. | 2007-05-03 |
Method of processing a workpiece in a plasma reactor using feed forward thermal control
App 20070091541 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
App 20070091539 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
App 20070091540 - Brillhart; Paul Lukas ; et al. | 2007-04-26 |
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
App 20070091538 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Method for agile workpiece temperature control in a plasma reactor using a thermal model
App 20070091537 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
App 20070089834 - Brillhart; Paul Lukas ; et al. | 2007-04-26 |
Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor
App 20070087455 - Hoffman; Daniel J. | 2007-04-19 |
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
App 20070081296 - Brillhart; Paul Lukas ; et al. | 2007-04-12 |
Capacitively coupled plasma reactor having very agile wafer temperature control
App 20070081294 - Buchberger; Douglas A. JR. ; et al. | 2007-04-12 |
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
App 20070081295 - Brillhart; Paul Lukas ; et al. | 2007-04-12 |
Plasma Reactor Control By Translating Desired Values Of M Plasma Parameters To Values Of N Chamber Parameters
App 20070080140 - HOFFMAN; DANIEL J. ; et al. | 2007-04-12 |
Method Of Characterizing A Chamber Based Upon Concurrent Behavior Of Selected Plasma Parameters As A Function Of Source Power, Bias Power And Chamber Pressure
App 20070080137 - HOFFMAN; DANIEL J. ; et al. | 2007-04-12 |
Method Of Characterizing A Chamber Based Upon Concurrent Behavior Of Selected Plasma Parameters As A Function Of Plural Chamber Parameters
App 20070080138 - Hoffman; Daniel J. ; et al. | 2007-04-12 |
Method Of Controlling A Chamber Based Upon Predetermined Concurrent Behavior Of Selected Plasma Parameters As A Function Of Source Power, Bias Power And Chamber Pressure
App 20070080139 - HOFFMAN; DANIEL J. ; et al. | 2007-04-12 |
Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
Grant 7,196,283 - Buchberger, Jr. , et al. March 27, 2 | 2007-03-27 |
Methods to avoid unstable plasma states during a process transition
App 20070066064 - Kutney; Michael C. ; et al. | 2007-03-22 |
MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
Grant 7,186,943 - Hoffman , et al. March 6, 2 | 2007-03-06 |
Method to reduce plasma-induced charging damage
App 20070048882 - Kutney; Michael C. ; et al. | 2007-03-01 |
Method of processing a workpiece by controlling a set of plasma parameters through a set of chamber parameters using surfaces of constant value
App 20070029282 - Hoffman; Daniel J. | 2007-02-08 |
Multi-frequency Plasma Enhanced Process Chamber Having A Toroidal Plasma Source
App 20070017897 - Sinha; Ashok K. ; et al. | 2007-01-25 |
Plasma Control Using Dual Cathode Frequency Mixing
App 20070000611 - Shannon; Steven C. ; et al. | 2007-01-04 |
Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling chamber parameters of source power and bias power
App 20060283835 - Hoffman; Daniel J. | 2006-12-21 |
Method of controlling chamber parameters of a plasma reactor in accordance with desired values of plural plasma parameters, by translating desired values for the plural plasma parameters to control values for each of the chamber parameters
App 20060278610 - Hoffman; Daniel J. | 2006-12-14 |
Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current
App 20060278608 - Hoffman; Daniel J. | 2006-12-14 |
Method of determining wafer voltage in a plasma reactor from applied bias voltage and current and a pair of constants
App 20060278609 - Hoffman; Daniel J. | 2006-12-14 |
Plasma generation and control using dual frequency RF signals
App 20060266735 - Shannon; Steven C. ; et al. | 2006-11-30 |
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
App 20060256499 - Yang; Jang Gyoo ; et al. | 2006-11-16 |
MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
Grant 7,132,618 - Hoffman , et al. November 7, 2 | 2006-11-07 |
Capacitively coupled plasma reactor with magnetic plasma control
App 20060157201 - Hoffman; Daniel J. ; et al. | 2006-07-20 |
Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
Grant 7,030,335 - Hoffman , et al. April 18, 2 | 2006-04-18 |
Gasless high voltage high contact force wafer contact-cooling electrostatic chuck
App 20060043065 - Buchberger; Douglas A. JR. ; et al. | 2006-03-02 |
Multi-frequency plasma enhanced process chamber having a torroidal plasma source
App 20060027329 - Sinha; Ashok K. ; et al. | 2006-02-09 |
Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
App 20050236377 - Hoffman, Daniel J. ; et al. | 2005-10-27 |
Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
App 20050178748 - Buchberger, Douglas A. JR. ; et al. | 2005-08-18 |
Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
App 20050167051 - Hoffman, Daniel J. ; et al. | 2005-08-04 |
Capacitively coupled plasma reactor with uniform radial distribution of plasma
Grant 6,900,596 - Yang , et al. May 31, 2 | 2005-05-31 |
Plasma chamber having multiple RF source frequencies
App 20050106873 - Hoffman, Daniel J. ; et al. | 2005-05-19 |
Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
Grant 6,894,245 - Hoffman , et al. May 17, 2 | 2005-05-17 |
Plasma control using dual cathode frequency mixing
App 20050090118 - Shannon, Steven C. ; et al. | 2005-04-28 |
Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber
Grant 6,879,870 - Shannon , et al. April 12, 2 | 2005-04-12 |
Capacitively coupled plasma reactor with magnetic plasma control
Grant 6,853,141 - Hoffman , et al. February 8, 2 | 2005-02-08 |
Capacitively coupled plasma reactor with magnetic plasma control
App 20050001556 - Hoffman, Daniel J. ; et al. | 2005-01-06 |
Plasma reactor with overhead RF electrode tuned to the plasma
Grant 6,838,635 - Hoffman , et al. January 4, 2 | 2005-01-04 |
Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
App 20040226657 - Hoffman, Daniel J. | 2004-11-18 |
Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
App 20040211759 - Hoffman, Daniel J. ; et al. | 2004-10-28 |
Substrate support having heat transfer system
App 20040212947 - Nguyen, Andrew ; et al. | 2004-10-28 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
App 20040206309 - Bera, Kallol ; et al. | 2004-10-21 |
Capacitively coupled plasma reactor with uniform radial distribution of plasma
App 20040056602 - Yang, Jang Gyoo ; et al. | 2004-03-25 |
Cathode pedestal for a plasma etch reactor
App 20040040664 - Yang, Jang Gyoo ; et al. | 2004-03-04 |
Capacitively coupled plasma reactor with magnetic plasma control
App 20030218427 - Hoffman, Daniel J. ; et al. | 2003-11-27 |
Inductive antenna for a plasma reactor producing reduced fluorine dissociation
Grant 6,652,712 - Wang , et al. November 25, 2 | 2003-11-25 |
Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber
App 20030192475 - Shannon, Steven C. ; et al. | 2003-10-16 |
MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
App 20030136766 - Hoffman, Daniel J. ; et al. | 2003-07-24 |
Inductive antenna for a plasma reactor producing reduced fluorine dissociation
App 20030111181 - Wang, Shiang-Bau ; et al. | 2003-06-19 |
Plasma reactor with overhead RF electrode tuned to the plasma
App 20030062344 - Hoffman, Daniel J. ; et al. | 2003-04-03 |
Plasma reactor with overhead RF electrode tuned to the plasma
Grant 6,528,751 - Hoffman , et al. March 4, 2 | 2003-03-04 |
Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
App 20020108933 - Hoffman, Daniel J. ; et al. | 2002-08-15 |
Temperature control system for process chamber
Grant 6,326,597 - Lubomirsky , et al. December 4, 2 | 2001-12-04 |
Titanium-polymer hybrid laminates
Grant 6,114,050 - Westre , et al. September 5, 2 | 2000-09-05 |
Titanium-polymer hybrid laminates
Grant 5,866,272 - Westre , et al. February 2, 1 | 1999-02-02 |
Method and apparatus for radio frequency ceramic sintering
Grant 5,266,762 - Hoffman , et al. November 30, 1 | 1993-11-30 |
Impedance matched, high-power, rf antenna for ion cyclotron resonance heating of a plasma
Grant 4,755,345 - Baity, Jr. , et al. July 5, 1 | 1988-07-05 |
Radio frequency coaxial feedthrough device
Grant 4,694,264 - Owens , et al. September 15, 1 | 1987-09-15 |
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