Hata; Jiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hata; Jiro.The latest application filed is for "method for plasma processing by shaping an induced electric field".
- Hata; Jiro - Minami-Alps JP
- Hata; Jiro - Yamanashi-ken JP
- Hata; Jiro - Yamanashi JP
| Patent | Date |
|---|---|
| Method for plasma processing by shaping an induced electric field Grant RE40,963 - Ishii , et al. November 10, 2 | 2009-11-10 |
| Plasma process apparatus Grant RE39,020 - Hama , et al. March 21, 2 | 2006-03-21 |
| Plasma processing apparatus Grant 6,136,140 - Ishii , et al. October 24, 2 | 2000-10-24 |
| Plasma processing apparatus Grant 5,795,429 - Ishii , et al. August 18, 1 | 1998-08-18 |
| Plasma process apparatus Grant 5,792,261 - Hama , et al. August 11, 1 | 1998-08-11 |
| Plasma processing apparatus Grant 5,571,366 - Ishii , et al. November 5, 1 | 1996-11-05 |
| Plasma film forming method and apparatus and plasma processing apparatus Grant 5,531,834 - Ishizuka , et al. July 2, 1 | 1996-07-02 |
| Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals Grant 5,529,630 - Imahashi , et al. June 25, 1 | 1996-06-25 |
| Plasma process apparatus Grant 5,525,159 - Hama , et al. June 11, 1 | 1996-06-11 |
| Plasma processing apparatus using vertical gas inlets one on top of another Grant 5,522,934 - Suzuki , et al. June 4, 1 | 1996-06-04 |
| Etching apparatus and method therefor Grant 5,476,182 - Ishizuka , et al. December 19, 1 | 1995-12-19 |
| Method for manufacturing a liquid crystal display substrate Grant 5,413,958 - Imahashi , et al. May 9, 1 | 1995-05-09 |
| Method of forming polycrystalling silicon film in process of manufacturing LCD Grant 5,372,836 - Imahashi , et al. December 13, 1 | 1994-12-13 |
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