Endo; Masayuki
Patent Applications and Registrations
Patent applications and USPTO patent grants for Endo; Masayuki.The latest application filed is for "suture needle for uterine hemostatic compression".
Company Profile
1.138.141
- Endo; Masayuki - Kyoto JP
- ENDO; Masayuki - Osaka JP
- Endo; Masayuki - Hamura JP
- Endo; Masayuki - Tokorozawa JP
- Endo; Masayuki - Kakogawa JP
- ENDO; Masayuki - Sakyo-ku Kyoto
- Endo; Masayuki - Tokyo JP
- Endo; Masayuki - Tokorozawa-Shi
- Endo; Masayuki - Kakogawa-shi JP
- Endo; Masayuki - Okayama N/A JP
- Endo; Masayuki - Fujinomiya JP
- ENDO; Masayuki - Fujinomiya-shi JP
- Endo; Masayuki - Kadoma JP
- Endo; Masayuki - Kawasaki JP
- Endo; Masayuki - Izumi JP
- Endo; Masayuki - Shizuoka JP
- Endo; Masayuki - Kishiwada JP
- Endo; Masayuki - Kawasaki-shi JP
- Endo, Masayuki - Izumi-shi JP
- Endo; Masayuki - Chuo-ku JP
- Endo, Masayuki - Kishiwada-shi JP
- Endo, Masayuki - Izumi-shi Osaka JP
- Endo; Masayuki - Fukushima JP
- Endo; Masayuki - Mie JP
- Endo; Masayuki - Yokohama JP
- Endo; Masayuki - Yokkaichi JA
Patent Activity
| Patent | Date |
|---|---|
| Mechanochemical platform and sensing methods using DNA origami nanostructures Grant 10,690,685 - Mao , et al. | 2020-06-23 |
| Suture Needle For Uterine Hemostatic Compression App 20200015855 - SHIONO; Toshimi ; et al. | 2020-01-16 |
| Detecting apparatus for detecting subject Grant 10,423,857 - Shimono , et al. Sept | 2019-09-24 |
| Detecting apparatus, detecting method and computer readable recording medium recording program for detecting state in predetermined area within images Grant 9,779,290 - Endo , et al. October 3, 2 | 2017-10-03 |
| Steel wire material and method for manufacturing same Grant 9,708,696 - Takeda , et al. July 18, 2 | 2017-07-18 |
| Mechanochemical Platform And Sensing Methods Using Dna Origami Nanostructures App 20170108517 - MAO; Hanbin ; et al. | 2017-04-20 |
| Toy robot Grant D764,605 - Ueda , et al. August 23, 2 | 2016-08-23 |
| Detecting Apparatus For Detecting Subject App 20160217580 - SHIMONO; TSUTOMU ; et al. | 2016-07-28 |
| Detecting Apparatus, Detecting Method And Computer Readable Recording Medium Recording Program For Detecting State In Predetermined Area Within Images App 20160044222 - Endo; Masayuki ; et al. | 2016-02-11 |
| Steel Wire Material And Method For Manufacturing Same App 20150101716 - TAKEDA; Mikako ; et al. | 2015-04-16 |
| Toy robot Grant D721,771 - Nakano , et al. January 27, 2 | 2015-01-27 |
| Monster-shaped toy Grant D704,280 - Murayama , et al. May 6, 2 | 2014-05-06 |
| Toy robot Grant D704,279 - Murayama , et al. May 6, 2 | 2014-05-06 |
| Ozone generating apparatus Grant 8,591,822 - Takauchi , et al. November 26, 2 | 2013-11-26 |
| Steel Wire Material And Method For Manufacturing Same App 20130272913 - Takeda; Mikako ; et al. | 2013-10-17 |
| Steel Wire Material And Method For Manufacturing Same App 20130272914 - Takeda; Mikako ; et al. | 2013-10-17 |
| Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer Grant 8,409,783 - Endo April 2, 2 | 2013-04-02 |
| Pattern formation method Grant 8,268,535 - Endo , et al. September 18, 2 | 2012-09-18 |
| Exposure system and pattern formation method Grant 8,088,565 - Endo , et al. January 3, 2 | 2012-01-03 |
| Pattern formation method Grant 8,080,364 - Endo , et al. December 20, 2 | 2011-12-20 |
| Method for manufacturing fiber reinforced cement board Grant 8,043,461 - Hasegawa , et al. October 25, 2 | 2011-10-25 |
| Pattern formation method Grant 7,998,663 - Endo , et al. August 16, 2 | 2011-08-16 |
| Pattern Formation Method App 20110189616 - ENDO; Masayuki ; et al. | 2011-08-04 |
| Pattern formation method Grant 7,947,432 - Endo , et al. May 24, 2 | 2011-05-24 |
| Pattern formation method Grant 7,943,285 - Endo , et al. May 17, 2 | 2011-05-17 |
| Barrier film material and pattern formation method using the same Grant 7,939,242 - Endo , et al. May 10, 2 | 2011-05-10 |
| Barrier film material and pattern formation method using the same Grant 7,871,759 - Endo , et al. January 18, 2 | 2011-01-18 |
| Ozone Generating Apparatus App 20100296981 - TAKAUCHI; Daisuke ; et al. | 2010-11-25 |
| Semiconductor Manufacturing Apparatus And Pattern Formation Method App 20100265477 - Endo; Masayuki ; et al. | 2010-10-21 |
| Copolymer, Resin Composition, Spacer For Display Panel, Planarization Film, Thermosetting Protective Film, Microlens, And Process For Producing Copolymer App 20100209847 - Endo; Masayuki | 2010-08-19 |
| Semiconductor manufacturing apparatus and pattern formation method Grant 7,771,918 - Endo , et al. August 10, 2 | 2010-08-10 |
| Exposure System And Pattern Formation Method App 20100183988 - ENDO; Masayuki ; et al. | 2010-07-22 |
| Barrier film material and pattern formation method using the same Grant 7,727,707 - Endo , et al. June 1, 2 | 2010-06-01 |
| Exposure system and pattern formation method Grant 7,713,685 - Endo , et al. May 11, 2 | 2010-05-11 |
| Exposure system and pattern formation method using the same Grant 7,700,268 - Endo , et al. April 20, 2 | 2010-04-20 |
| Method For Manufacturing Fiber Reinforced Cement Board App 20100043956 - HASEGAWA; Akira ; et al. | 2010-02-25 |
| Ester compound, polymer, resist composition, and patterning process Grant 7,666,967 - Harada , et al. February 23, 2 | 2010-02-23 |
| Pattern formation method Grant 7,655,385 - Endo , et al. February 2, 2 | 2010-02-02 |
| Pattern formation method Grant 7,595,142 - Endo , et al. September 29, 2 | 2009-09-29 |
| Resist material and pattern formation method Grant 7,588,876 - Kishimura , et al. September 15, 2 | 2009-09-15 |
| Barrier Film Material And Pattern Formation Method Using The Same App 20090227111 - Endo; Masayuki ; et al. | 2009-09-10 |
| Resist protective coating material and patterning process Grant 7,569,323 - Hatakeyama , et al. August 4, 2 | 2009-08-04 |
| Pattern Formation Method App 20090186484 - ENDO; Masayuki ; et al. | 2009-07-23 |
| Pattern formation method Grant 7,556,914 - Endo , et al. July 7, 2 | 2009-07-07 |
| Barrier film material and pattern formation method using the same Grant 7,550,253 - Endo , et al. June 23, 2 | 2009-06-23 |
| Chemically amplified resist material, topcoat film material and pattern formation method using the same Grant 7,541,132 - Endo , et al. June 2, 2 | 2009-06-02 |
| Pattern formation method Grant 7,524,772 - Endo , et al. April 28, 2 | 2009-04-28 |
| Barrier Film Material And Pattern Formation Method App 20090104560 - ENDO; Masayuki ; et al. | 2009-04-23 |
| Pattern Formation Method App 20090092930 - ENDO; Masayuki ; et al. | 2009-04-09 |
| Exposure system and pattern formation method App 20090091719 - Endo; Masayuki ; et al. | 2009-04-09 |
| Polymer, resist composition and patterning process Grant 7,488,567 - Harada , et al. February 10, 2 | 2009-02-10 |
| Pattern formation method through liquid immersion lithography Grant 7,470,501 - Endo , et al. December 30, 2 | 2008-12-30 |
| Resist material and pattern formation method using the same Grant 7,462,438 - Endo , et al. December 9, 2 | 2008-12-09 |
| Resist material and pattern formation method using the same Grant 7,455,950 - Endo , et al. November 25, 2 | 2008-11-25 |
| Chemically Amplified Resist Material, Topcoat Film Material And Pattern Formation Method Using The Same App 20080286687 - ENDO; Masayuki ; et al. | 2008-11-20 |
| Methods for forming wiring and electrode Grant 7,429,778 - Yokoyama, legal representative , et al. Septembe | 2008-09-30 |
| Barrier Film Material And Pattern Formation Method Using The Same App 20080233491 - ENDO; Masayuki ; et al. | 2008-09-25 |
| Pattern Formation Method App 20080227038 - ENDO; Masayuki ; et al. | 2008-09-18 |
| Sulfonamide compound, polymer compound, resist material and pattern formation method Grant 7,413,843 - Kishimura , et al. August 19, 2 | 2008-08-19 |
| Pattern Formation Method App 20080193882 - Endo; Masayuki ; et al. | 2008-08-14 |
| Barrier Film Material And Pattern Formation Method Using The Same App 20080193883 - ENDO; Masayuki ; et al. | 2008-08-14 |
| Pattern formation method Grant 7,393,794 - Endo , et al. July 1, 2 | 2008-07-01 |
| Polymer, resist composition and patterning process Grant 7,378,218 - Harada , et al. May 27, 2 | 2008-05-27 |
| Pattern formation method Grant 7,378,229 - Endo , et al. May 27, 2 | 2008-05-27 |
| Resist material and pattern formation method Grant 7,378,216 - Kishimura , et al. May 27, 2 | 2008-05-27 |
| Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition Grant 7,374,857 - Maesawa , et al. May 20, 2 | 2008-05-20 |
| Chemically amplified resist material and pattern formation method using the same App 20080081287 - Endo; Masayuki ; et al. | 2008-04-03 |
| Resist material and pattern formation method Grant 7,338,743 - Endo , et al. March 4, 2 | 2008-03-04 |
| Pattern formation method App 20080032239 - Endo; Masayuki ; et al. | 2008-02-07 |
| Chemically amplified resist material and pattern formation method using the same Grant 7,314,703 - Endo , et al. January 1, 2 | 2008-01-01 |
| Pattern formation method App 20070287102 - Endo; Masayuki ; et al. | 2007-12-13 |
| Resist material and pattern formation method using the same App 20070248894 - Endo; Masayuki ; et al. | 2007-10-25 |
| Method for fabricating semiconductor device Grant 7,273,820 - Nakagawa , et al. September 25, 2 | 2007-09-25 |
| Method for fabricating semiconductor device App 20070202666 - Nakagawa; Hideo ; et al. | 2007-08-30 |
| Pattern formation method Grant 7,255,974 - Endo , et al. August 14, 2 | 2007-08-14 |
| Polymer, resist composition, and patterning process Grant 7,241,553 - Hatakeyama , et al. July 10, 2 | 2007-07-10 |
| Semiconductor manufacturing apparatus and pattern formation method App 20070153245 - Endo; Masayuki ; et al. | 2007-07-05 |
| Novel ester compound, polymer, resist composition, and patterning process App 20070128555 - Harada; Yuji ; et al. | 2007-06-07 |
| Pattern formation method and exposure system App 20070128558 - Endo; Masayuki ; et al. | 2007-06-07 |
| Syringe Grant D543,625 - Numata , et al. May 29, 2 | 2007-05-29 |
| Syringe Grant D543,278 - Numata , et al. May 22, 2 | 2007-05-22 |
| Syringe Grant D543,279 - Numata , et al. May 22, 2 | 2007-05-22 |
| Barrier film material and pattern formation method using the same App 20070111541 - Endo; Masayuki ; et al. | 2007-05-17 |
| Sulfonamide compound, polymer compound, resist material and pattern formation method App 20070099117 - Kishimura; Shinji ; et al. | 2007-05-03 |
| Water-soluble material, chemically amplified resist and pattern formation method using the same App 20070082292 - Endo; Masayuki ; et al. | 2007-04-12 |
| Water-soluble material, chemically amplified resist and pattern formation method using the same Grant 7,198,888 - Endo , et al. April 3, 2 | 2007-04-03 |
| Semiconductor manufacturing apparatus and pattern formation method Grant 7,195,860 - Endo , et al. March 27, 2 | 2007-03-27 |
| Resist protective coating material and patterning process App 20070026341 - Hatakeyama; Jun ; et al. | 2007-02-01 |
| Polymer compound, resist material and pattern formation method Grant 7,169,530 - Kishimura , et al. January 30, 2 | 2007-01-30 |
| Polymers, resist compositions and patterning process Grant 7,169,869 - Harada , et al. January 30, 2 | 2007-01-30 |
| Sulfonamide compound, polymer compound, resist material and pattern formation method Grant 7,166,418 - Kishimura , et al. January 23, 2 | 2007-01-23 |
| Semiconductor fabrication apparatus and pattern formation method using the same App 20070009841 - Endo; Masayuki ; et al. | 2007-01-11 |
| Chemically amplified resist material and pattern formation method using the same App 20060281025 - Endo; Masayuki ; et al. | 2006-12-14 |
| Pattern formation method App 20060275707 - Endo; Masayuki ; et al. | 2006-12-07 |
| Polymer, resist composition and patterning process App 20060269871 - Harada; Yuji ; et al. | 2006-11-30 |
| Resist material and pattern formation method using the same App 20060263719 - Endo; Masayuki ; et al. | 2006-11-23 |
| Pattern formation method Grant 7,135,273 - Endo , et al. November 14, 2 | 2006-11-14 |
| Pattern formation method Grant 7,132,224 - Endo , et al. November 7, 2 | 2006-11-07 |
| Polymers, resist compositions and patterning process Grant 7,125,641 - Harada , et al. October 24, 2 | 2006-10-24 |
| Polymers, resist compositions and patterning process Grant 7,125,643 - Harada , et al. October 24, 2 | 2006-10-24 |
| Sulfonates, polymers, resist compositions and patterning process Grant 7,125,642 - Harada , et al. October 24, 2 | 2006-10-24 |
| Pattern formation method and exposure system Grant 7,094,521 - Endo , et al. August 22, 2 | 2006-08-22 |
| Polymer, resist composition and patterning process App 20060177765 - Harada; Yuji ; et al. | 2006-08-10 |
| Pattern formation method App 20060178005 - Endo; Masayuki ; et al. | 2006-08-10 |
| Pattern formation method App 20060163198 - Endo; Masayuki ; et al. | 2006-07-27 |
| Pattern formation method and exposure system App 20060160032 - Endo; Masayuki ; et al. | 2006-07-20 |
| Polymers, resist compositions and patterning process Grant 7,078,147 - Harada , et al. July 18, 2 | 2006-07-18 |
| Pattern formation method App 20060148266 - Endo; Masayuki ; et al. | 2006-07-06 |
| Methods for forming wiring and electrode Grant 7,071,084 - Yokoyama , et al. July 4, 2 | 2006-07-04 |
| Polymers, resist compositions and patterning process Grant 7,067,231 - Harada , et al. June 27, 2 | 2006-06-27 |
| Barrier film material and pattern formation method using the same App 20060127812 - Endo; Masayuki ; et al. | 2006-06-15 |
| Polymer compound, resist material and pattern formation method Grant 7,060,775 - Kishimura , et al. June 13, 2 | 2006-06-13 |
| Pattern-forming material and method of forming pattern Grant 7,041,428 - Kishimura , et al. May 9, 2 | 2006-05-09 |
| Pattern formation method Grant 7,029,827 - Endo , et al. April 18, 2 | 2006-04-18 |
| Pattern formation method Grant 7,022,466 - Endo , et al. April 4, 2 | 2006-04-04 |
| Pattern formation method Grant 7,011,934 - Endo , et al. March 14, 2 | 2006-03-14 |
| Resist material and pattern formation method App 20060051702 - Endo; Masayuki ; et al. | 2006-03-09 |
| Exposure system and pattern formation method App 20060051709 - Endo; Masayuki ; et al. | 2006-03-09 |
| Polymers, resist compositions and patterning process Grant 7,005,228 - Hatakeyama , et al. February 28, 2 | 2006-02-28 |
| Pattern formation method App 20060040215 - Endo; Masayuki ; et al. | 2006-02-23 |
| Resist compositions and patterning process Grant 7,001,707 - Hatakeyama , et al. February 21, 2 | 2006-02-21 |
| Methods for forming wiring and electrode App 20060024937 - Yokoyama; Yasuaki ; et al. | 2006-02-02 |
| Pattern formation method Grant 6,992,015 - Endo , et al. January 31, 2 | 2006-01-31 |
| Exposure system, exposure method and method for fabricating semiconductor device App 20060019204 - Endo; Masayuki ; et al. | 2006-01-26 |
| Immersion exposure liquid and pattern formation method App 20060014105 - Endo; Masayuki ; et al. | 2006-01-19 |
| Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method App 20060008711 - Endo; Masayuki ; et al. | 2006-01-12 |
| Resist material and pattern formation method App 20050277057 - Kishimura, Shinji ; et al. | 2005-12-15 |
| Exposure system and pattern formation method App 20050277069 - Endo, Masayuki ; et al. | 2005-12-15 |
| Semiconductor manufacturing apparatus and pattern formation method App 20050277068 - Endo, Masayuki ; et al. | 2005-12-15 |
| Resist material and pattern formation method App 20050266337 - Kishimura, Shinji ; et al. | 2005-12-01 |
| Polymers, resist compositions and patterning process App 20050267275 - Harada, Yuji ; et al. | 2005-12-01 |
| Resist material and pattern formation method App 20050266338 - Kishimura, Shinji ; et al. | 2005-12-01 |
| Semiconductor manufacturing apparatus and pattern formation method App 20050255413 - Endo, Masayuki ; et al. | 2005-11-17 |
| Resist material and pattern formation method using the same App 20050233259 - Endo, Masayuki ; et al. | 2005-10-20 |
| Polymer, resist composition, and patterning process App 20050221221 - Hatakeyama, Jun ; et al. | 2005-10-06 |
| Pattern formation method Grant 6,949,329 - Endo , et al. September 27, 2 | 2005-09-27 |
| Polymers, resist compositions and patterning process Grant 6,946,235 - Harada , et al. September 20, 2 | 2005-09-20 |
| Water-soluble material, chemically amplified resist and pattern formation method using the same App 20050191576 - Endo, Masayuki ; et al. | 2005-09-01 |
| Pattern formation material and pattern formation method Grant 6,936,401 - Endo , et al. August 30, 2 | 2005-08-30 |
| Polymer compound, resist material and pattern formation method App 20050186501 - Kishimura, Shinji ; et al. | 2005-08-25 |
| Barrier film material and pattern formation method using the same App 20050186516 - Endo, Masayuki ; et al. | 2005-08-25 |
| Polymers, resist compositions and patterning process Grant 6,933,095 - Harada , et al. August 23, 2 | 2005-08-23 |
| Polymer, resist composition, and patterning process App 20050175935 - Harada, Yuji ; et al. | 2005-08-11 |
| Chemically amplified resist and pattern formation method App 20050164122 - Endo, Masayuki ; et al. | 2005-07-28 |
| Pattern formation method App 20050158672 - Endo, Masayuki ; et al. | 2005-07-21 |
| Esters, polymers, resist compositions and patterning process Grant 6,916,592 - Harada , et al. July 12, 2 | 2005-07-12 |
| Exposure mask, method for manufacturing the mask, and exposure method Grant 6,913,857 - Sasago , et al. July 5, 2 | 2005-07-05 |
| Pattern formation method Grant 6,913,873 - Endo , et al. July 5, 2 | 2005-07-05 |
| Exposure system and pattern formation method using the same App 20050136361 - Endo, Masayuki ; et al. | 2005-06-23 |
| Pattern formation method Grant 6,908,729 - Endo , et al. June 21, 2 | 2005-06-21 |
| Pattern formation method App 20050130067 - Endo, Masayuki ; et al. | 2005-06-16 |
| Pattern formation method App 20050130079 - Endo, Masayuki ; et al. | 2005-06-16 |
| Pattern formation method Grant 6,902,999 - Endo , et al. June 7, 2 | 2005-06-07 |
| Polymers, resist compositions and patterning process App 20050106499 - Harada, Yuji ; et al. | 2005-05-19 |
| Semiconductor manufacturing apparatus and pattern formation method App 20050106512 - Endo, Masayuki ; et al. | 2005-05-19 |
| Polymers, resist compositions and patterning process App 20050089797 - Harada, Yuji ; et al. | 2005-04-28 |
| Resist compositions and patterning process App 20050084796 - Hatakeyama, Jun ; et al. | 2005-04-21 |
| Polymer compound, resist material and pattern formation method App 20050074693 - Kishimura, Shinji ; et al. | 2005-04-07 |
| Semiconductor fabrication apparatus and pattern formation method using the same App 20050074704 - Endo, Masayuki ; et al. | 2005-04-07 |
| Resist compositions and patterning process Grant 6,875,556 - Harada , et al. April 5, 2 | 2005-04-05 |
| Pattern formation method App 20050069814 - Endo, Masayuki ; et al. | 2005-03-31 |
| Polymers, resist compositions and patterning process Grant 6,872,514 - Harada , et al. March 29, 2 | 2005-03-29 |
| Sulfonamide compound, polymer compound, resist material and pattern formation method App 20050058935 - Kishimura, Shinji ; et al. | 2005-03-17 |
| Polymers, resist compositions and patterning process Grant 6,864,037 - Hatakeyama , et al. March 8, 2 | 2005-03-08 |
| Polymers, resist compositions and patterning process Grant 6,861,197 - Harada , et al. March 1, 2 | 2005-03-01 |
| Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition App 20050038261 - Maesawa, Tsuneaki ; et al. | 2005-02-17 |
| Chemically amplified resist compositions and patterning process Grant 6,855,477 - Hatakeyama , et al. February 15, 2 | 2005-02-15 |
| Pattern formation method Grant 6,841,488 - Endo , et al. January 11, 2 | 2005-01-11 |
| Pattern formation method App 20040259008 - Endo, Masayuki ; et al. | 2004-12-23 |
| Pattern formation method App 20040259040 - Endo, Masayuki ; et al. | 2004-12-23 |
| Pattern formation method App 20040253548 - Endo, Masayuki ; et al. | 2004-12-16 |
| Pattern formation method App 20040253547 - Endo, Masayuki ; et al. | 2004-12-16 |
| Pattern forming material and method of pattern formation Grant 6,830,869 - Kishimura , et al. December 14, 2 | 2004-12-14 |
| Polymers, resist compositions and patterning process Grant 6,824,955 - Harada , et al. November 30, 2 | 2004-11-30 |
| Pattern formation method and exposure system App 20040224265 - Endo, Masayuki ; et al. | 2004-11-11 |
| Pattern formation method App 20040224525 - Endo, Masayuki ; et al. | 2004-11-11 |
| Pattern formation material and pattern formation method Grant 6,806,029 - Kishimura , et al. October 19, 2 | 2004-10-19 |
| Methods for forming wiring and electrode App 20040192038 - Yokoyama, Yasuaki ; et al. | 2004-09-30 |
| Radiation-sensitive composition, insulating film and organic EL display element Grant 6,797,450 - Suzuki , et al. September 28, 2 | 2004-09-28 |
| Resist compositions and patterning process Grant 6,790,586 - Hatakeyama , et al. September 14, 2 | 2004-09-14 |
| Pattern formation method App 20040161710 - Endo, Masayuki ; et al. | 2004-08-19 |
| Polymers, resist compositions and patterning process App 20040157155 - Harada, Yuji ; et al. | 2004-08-12 |
| Sulfonates, polymers, resist compositions and patterning process App 20040157156 - Harada, Yuji ; et al. | 2004-08-12 |
| Resist compositions and patterning process App 20040144752 - Harada, Yuji ; et al. | 2004-07-29 |
| Pattern formation method Grant 6,764,811 - Endo , et al. July 20, 2 | 2004-07-20 |
| Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element Grant 6,756,165 - Nishimura , et al. June 29, 2 | 2004-06-29 |
| Pattern formation material and pattern formation method Grant 6,753,132 - Kishimura , et al. June 22, 2 | 2004-06-22 |
| Pattern formation method Grant 6,716,730 - Endo , et al. April 6, 2 | 2004-04-06 |
| Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method App 20040058253 - Endo, Masayuki ; et al. | 2004-03-25 |
| Pattern formation material, water-soluble material and pattern formation method App 20040058271 - Endo, Masayuki ; et al. | 2004-03-25 |
| Polymers, resist compositions and patterning process Grant 6,710,148 - Harada , et al. March 23, 2 | 2004-03-23 |
| Pattern forming material and method of pattern formation App 20040043321 - Kishimura, Shinji ; et al. | 2004-03-04 |
| Polymers, resist compositions and patterning process App 20040030079 - Harada, Yuji ; et al. | 2004-02-12 |
| Pattern-forming material and method of forming pattern App 20040029035 - Kishimura, Shinji ; et al. | 2004-02-12 |
| Method for producing semiconductor device App 20040029363 - Nakagawa, Hideo ; et al. | 2004-02-12 |
| Pattern formation material and pattern formation method Grant 6,689,536 - Kishimura , et al. February 10, 2 | 2004-02-10 |
| Pattern formation material and pattern formation method App 20040013978 - Endo, Masayuki ; et al. | 2004-01-22 |
| Pattern formation method App 20040009433 - Endo, Masayuki ; et al. | 2004-01-15 |
| Polymers, resist compositions and patterning process Grant 6,660,447 - Hatakeyama , et al. December 9, 2 | 2003-12-09 |
| Pattern formation method App 20030224296 - Endo, Masayuki ; et al. | 2003-12-04 |
| Pattern formation method App 20030224589 - Endo, Masayuki ; et al. | 2003-12-04 |
| Novel esters, polymers, resist compositions and patterning process App 20030219678 - Harada, Yuji ; et al. | 2003-11-27 |
| Polymers, resist compositions and patterning process App 20030215739 - Harada, Yuji ; et al. | 2003-11-20 |
| Polymers, resist compositions and patterning process App 20030215740 - Harada, Yuji ; et al. | 2003-11-20 |
| Pattern formation material and pattern formation method Grant 6,645,694 - Kishimura , et al. November 11, 2 | 2003-11-11 |
| Polymers, resist compositions and patterning process App 20030165773 - Harada, Yuji ; et al. | 2003-09-04 |
| Ester compounds Grant 6,603,037 - Harada , et al. August 5, 2 | 2003-08-05 |
| Pattern formation method App 20030143824 - Endo, Masayuki ; et al. | 2003-07-31 |
| Pattern formation method App 20030143494 - Endo, Masayuki ; et al. | 2003-07-31 |
| Pattern formation material and pattern formation method App 20030113670 - Kishimura, Shinji ; et al. | 2003-06-19 |
| Novel Ester Compounds App 20030100791 - Harada, Yuji ; et al. | 2003-05-29 |
| Chemically amplified resist compositions and patterning process App 20030099901 - Hatakeyama, Jun ; et al. | 2003-05-29 |
| Pattern formation material and pattern formation method App 20030091930 - Kishimura, Shinji ; et al. | 2003-05-15 |
| Pattern formation material and pattern formation method App 20030087184 - Kishimura, Shinji ; et al. | 2003-05-08 |
| Pattern formation method App 20030087194 - Endo, Masayuki ; et al. | 2003-05-08 |
| Pattern formation method App 20030082926 - Endo, Masayuki ; et al. | 2003-05-01 |
| Pattern formation method App 20030082486 - Endo, Masayuki ; et al. | 2003-05-01 |
| Polymers, resist compositions and patterning process App 20030082479 - Hatakeyama, Jun ; et al. | 2003-05-01 |
| Radiation-sensitive composition, insulating film and organic el display element App 20030054284 - Suzuki, Masayoshi ; et al. | 2003-03-20 |
| Pattern formation method App 20030049570 - Endo, Masayuki ; et al. | 2003-03-13 |
| Polymers, resist compositions and patterning process App 20030031953 - Hatakeyama, Jun ; et al. | 2003-02-13 |
| Polymers, resist compositions and patterning process App 20030031952 - Harada, Yuji ; et al. | 2003-02-13 |
| Pattern formation method App 20030017425 - Endo, Masayuki ; et al. | 2003-01-23 |
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| Method of forming micropatterns by having a resist film absorb water Grant 5,741,628 - Matsuo , et al. April 21, 1 | 1998-04-21 |
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| Thin layer forming method wherein hydrophobic molecular layers preventing a BPSG layer from absorbing moisture Grant 5,576,247 - Yano , et al. November 19, 1 | 1996-11-19 |
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| Epoxy group-containing copolymer and radiation sensitive resin compositions thereof Grant 5,530,036 - Sano , et al. June 25, 1 | 1996-06-25 |
| Reflection preventing film and process for forming resist pattern using the same Grant 5,525,457 - Nemoto , et al. June 11, 1 | 1996-06-11 |
| Method of producing a stencil mask Grant 5,401,932 - Hashimoto , et al. March 28, 1 | 1995-03-28 |
| Epoxy group-containing resin compositions Grant 5,399,604 - Sano , et al. March 21, 1 | 1995-03-21 |
| Negative working resist composition Grant 5,389,491 - Tani , et al. February 14, 1 | 1995-02-14 |
| Material for forming coating film Grant 5,364,910 - Takinishi , et al. November 15, 1 | 1994-11-15 |
| Fine pattern forming method Grant 5,316,891 - Hashimoto , et al. May 31, 1 | 1994-05-31 |
| Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method Grant 5,272,036 - Tani , et al. December 21, 1 | 1993-12-21 |
| Photosensitive compound Grant 5,250,669 - Ogawa , et al. October 5, 1 | 1993-10-05 |
| Pattern forming method using contrast enhanced material Grant 4,849,323 - Endo , et al. July 18, 1 | 1989-07-18 |
| Integrator for an exposure apparatus or the like Grant 4,841,341 - Ogawa , et al. June 20, 1 | 1989-06-20 |
| Exposure apparatus Grant 4,805,000 - Ogawa , et al. February 14, 1 | 1989-02-14 |
| Method for correction for chromatic aberration and exposure apparatus using the same Grant 4,782,368 - Ogawa , et al. November 1, 1 | 1988-11-01 |
| Water-soluble photopolymer and method of forming pattern by use of the same Grant 4,745,042 - Sasago , et al. May 17, 1 | 1988-05-17 |
| Exposure apparatus Grant 4,724,466 - Ogawa , et al. February 9, 1 | 1988-02-09 |
| Ozone generating apparatus Grant 4,696,800 - Sasaki , et al. September 29, 1 | 1987-09-29 |
| Process for the preparation of 1,2-polybutadiene Grant 4,182,813 - Makino , et al. January 8, 1 | 1980-01-08 |
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