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Borehole wall resistance increasing apparatus for improving energy utilization rate of injection gas Grant 11,428,065 - Chen , et al. August 30, 2 | 2022-08-30 |
Gasflow distribution device, gas distributor, pipe string and method for separate-layer gas injection Grant 11,377,941 - Chen , et al. July 5, 2 | 2022-07-05 |
Ultrasonic microbubble generation method, apparatus and system Grant 11,344,824 - Chen , et al. May 31, 2 | 2022-05-31 |
Chemical control features in wafer process equipment Grant 11,264,213 - Liang , et al. March 1, 2 | 2022-03-01 |
Microbubble generation device and equipment Grant 11,179,683 - Chen , et al. November 23, 2 | 2021-11-23 |
System and method of performing oil displacement by water-gas dispersion system Grant 11,098,569 - Chen , et al. August 24, 2 | 2021-08-24 |
Semiconductor processing systems having multiple plasma configurations Grant 11,024,486 - Lubomirsky , et al. June 1, 2 | 2021-06-01 |
Method And Apparatus For Oil Production By Increasing Resistance Of Borehole Wall With Improved Energy Utilization Rae Of Injection Gas App 20210040827 - Chen; Xinglong ;   et al. | 2021-02-11 |
Gasflow Distribution Device, Gas Distributor, Pipe String And Method For Separate-layer Gas Injection App 20210010356 - CHEN; Xinglong ;   et al. | 2021-01-14 |
Calcium Metaborate Birefringent Crystal, Preparation Method And Use Thereof App 20200216976 - PAN; Shilie ;   et al. | 2020-07-09 |
Flow Control Features Of Cvd Chambers App 20200149166 - CHUC; Kien N. ;   et al. | 2020-05-14 |
Microbubble Generation Device And Equipment App 20200122098 - Chen; Xinglong ;   et al. | 2020-04-23 |
Lithium metaborate crystal, preparation method and use thereof Grant 10,604,863 - Pan , et al. | 2020-03-31 |
Ultrasonic Microbubble Generation Method, Apparatus And System App 20200070067 - Chen; Xinglong ;   et al. | 2020-03-05 |
System And Method Of Performing Oil Displacement By Water-gas Dispersion System App 20200072031 - Chen; Xinglong ;   et al. | 2020-03-05 |
Flow control features of CVD chambers Grant 10,550,472 - Chuc , et al. Fe | 2020-02-04 |
Methods of manufacturing a semiconductor device Grant 10,529,618 - Lu , et al. J | 2020-01-07 |
Chemical Control Features In Wafer Process Equipment App 20190385823 - Liang; Qiwei ;   et al. | 2019-12-19 |
Particle generation suppresor by DC bias modulation Grant 10,504,697 - Baek , et al. Dec | 2019-12-10 |
Lithium Metaborate Crystal, Preparation Method and Use Thereof App 20190345633 - PAN; Shilie ;   et al. | 2019-11-14 |
Enhanced etching processes using remote plasma sources Grant 10,424,485 - Ingle , et al. Sept | 2019-09-24 |
Chemical control features in wafer process equipment Grant 10,354,843 - Liang , et al. July 16, 2 | 2019-07-16 |
Insulated Semiconductor Faceplate Designs App 20190139743 - Chen; Xinglong ;   et al. | 2019-05-09 |
Semiconductor processing system and methods using capacitively coupled plasma Grant 10,283,321 - Yang , et al. | 2019-05-07 |
Semiconductor processing systems having multiple plasma configurations Grant 10,256,079 - Lubomirsky , et al. | 2019-04-09 |
Insulated semiconductor faceplate designs Grant 10,170,282 - Chen , et al. J | 2019-01-01 |
Methods Of Manufacturing A Semiconductor Device App 20180358262 - LU; Siqing ;   et al. | 2018-12-13 |
Pedestal with multi-zone temperature control and multiple purge capabilities Grant 10,062,587 - Chen , et al. August 28, 2 | 2018-08-28 |
RPS assisted RF plasma source for semiconductor processing Grant 10,056,233 - Chen , et al. August 21, 2 | 2018-08-21 |
Semiconductor processing with DC assisted RF power for improved control Grant 10,032,606 - Yang , et al. July 24, 2 | 2018-07-24 |
Processing systems and methods for halide scavenging Grant 9,991,134 - Wang , et al. June 5, 2 | 2018-06-05 |
Chemical control features in wafer process equipment Grant 9,978,564 - Liang , et al. May 22, 2 | 2018-05-22 |
Particle generation suppresor by DC bias modulation Grant 9,892,888 - Baek , et al. February 13, 2 | 2018-02-13 |
Etching method using plasma, and method of fabricating semiconductor device including the etching method Grant 9,865,474 - Kim , et al. January 9, 2 | 2018-01-09 |
Rps Assisted Rf Plasma Source For Semiconductor Processing App 20170301517 - CHEN; Xinglong ;   et al. | 2017-10-19 |
Wafer clamping apparatus Grant 9,768,051 - Chen , et al. September 19, 2 | 2017-09-19 |
RPS assisted RF plasma source for semiconductor processing Grant 9,741,545 - Chen , et al. August 22, 2 | 2017-08-22 |
Chemical Control Features In Wafer Process Equipment App 20170236691 - Liang; Qiwei ;   et al. | 2017-08-17 |
Particle Generation Suppresor By Dc Bias Modulation App 20170236689 - BAEK; Jonghoon ;   et al. | 2017-08-17 |
Semiconductor Processing Systems Having Multiple Plasma Configurations App 20170229289 - Lubomirsky; Dmitry ;   et al. | 2017-08-10 |
Processing systems and methods for halide scavenging Grant 9,704,723 - Wang , et al. July 11, 2 | 2017-07-11 |
Particle Generation Suppresor By Dc Bias Modulation App 20170148611 - BAEK; Jonghoon ;   et al. | 2017-05-25 |
Processing systems and methods for halide scavenging Grant 9,659,792 - Wang , et al. May 23, 2 | 2017-05-23 |
Rps Assisted Rf Plasma Source For Semiconductor Processing App 20170125220 - CHEN; Xinglong ;   et al. | 2017-05-04 |
Particle generation suppressor by DC bias modulation Grant 9,593,421 - Baek , et al. March 14, 2 | 2017-03-14 |
Etching Method Using Plasma, And Method Of Fabricating Semiconductor Device Including The Etching Method App 20170062235 - Kim; Gon-Jun ;   et al. | 2017-03-02 |
Wafer Clamping Apparatus App 20170018451 - CHEN; Xinglong ;   et al. | 2017-01-19 |
Processing systems and apparatus adapted to process substrates in electronic device manufacturing Grant 9,524,889 - Hongkham , et al. December 20, 2 | 2016-12-20 |
Etching method using plasma, and method of fabricating semiconductor device including the etching method Grant 9,520,301 - Kim , et al. December 13, 2 | 2016-12-13 |
RPS assisted RF plasma source for semiconductor processing Grant 9,502,218 - Chen , et al. November 22, 2 | 2016-11-22 |
Semiconductor Processing With Dc Assisted Rf Power For Improved Control App 20160300694 - Yang; Jang-Gyoo ;   et al. | 2016-10-13 |
Enhanced Etching Processes Using Remote Plasma Sources App 20160284556 - Ingle; Nitin K. ;   et al. | 2016-09-29 |
Processing systems and methods for halide scavenging Grant 9,449,850 - Wang , et al. September 20, 2 | 2016-09-20 |
Dry-etch selectivity Grant 9,384,997 - Ren , et al. July 5, 2 | 2016-07-05 |
Semiconductor processing with DC assisted RF power for improved control Grant 9,373,517 - Yang , et al. June 21, 2 | 2016-06-21 |
Enhanced etching processes using remote plasma sources Grant 9,362,130 - Ingle , et al. June 7, 2 | 2016-06-07 |
Pedestal With Multi-zone Temperature Control And Multiple Purge Capabilities App 20160126118 - Chen; Xinglong ;   et al. | 2016-05-05 |
Etching Method Using Plasma, And Method Of Fabricating Semiconductor Device Including The Etching Method App 20160111298 - Kim; Go-jun ;   et al. | 2016-04-21 |
Processing Systems And Methods For Halide Scavenging App 20160064233 - Wang; Anchuan ;   et al. | 2016-03-03 |
Pedestal with multi-zone temperature control and multiple purge capabilities Grant 9,267,739 - Chen , et al. February 23, 2 | 2016-02-23 |
Processing Systems And Methods For Halide Scavenging App 20160027673 - Wang; Anchuan ;   et al. | 2016-01-28 |
Chemical Control Features In Wafer Process Equipment App 20160005572 - Liang; Qiwei ;   et al. | 2016-01-07 |
Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing Grant 9,202,736 - Narendrnath , et al. December 1, 2 | 2015-12-01 |
Processing Systems And Methods For Halide Scavenging App 20150332930 - Wang; Anchuan ;   et al. | 2015-11-19 |
Processing systems and methods for halide scavenging Grant 9,184,055 - Wang , et al. November 10, 2 | 2015-11-10 |
Processing systems and methods for halide scavenging Grant 9,153,442 - Wang , et al. October 6, 2 | 2015-10-06 |
Semiconductor processing system and methods using capacitively coupled plasma Grant 9,144,147 - Yang , et al. September 22, 2 | 2015-09-22 |
Chemical control features in wafer process equipment Grant 9,132,436 - Liang , et al. September 15, 2 | 2015-09-15 |
Processing Systems And Methods For Halide Scavenging App 20150235865 - Wang; Anchuan ;   et al. | 2015-08-20 |
Rps Assisted Rf Plasma Source For Semiconductor Processing App 20150221479 - CHEN; Xinglong ;   et al. | 2015-08-06 |
Processing systems and methods for halide scavenging Grant 9,093,371 - Wang , et al. July 28, 2 | 2015-07-28 |
Dry-etch Selectivity App 20150132968 - Ren; He ;   et al. | 2015-05-14 |
Particle Generation Suppresspr By Dc Bias Modulation App 20150123541 - BAEK; Jonghoon ;   et al. | 2015-05-07 |
Processing systems and methods for halide scavenging Grant 9,023,732 - Wang , et al. May 5, 2 | 2015-05-05 |
Dry-etch selectivity Grant 8,969,212 - Ren , et al. March 3, 2 | 2015-03-03 |
Flow Control Features Of Cvd Chambers App 20150013793 - CHUC; Kien N. ;   et al. | 2015-01-15 |
Flow control features of CVD chambers Grant 8,894,767 - Chuc , et al. November 25, 2 | 2014-11-25 |
Processing Systems And Methods For Halide Scavenging App 20140273488 - Wang; Anchuan ;   et al. | 2014-09-18 |
Processing Systems And Methods For Halide Scavenging App 20140273481 - Wang; Anchuan ;   et al. | 2014-09-18 |
Processing Systems And Methods For Halide Scavenging App 20140273489 - Wang; Anchuan ;   et al. | 2014-09-18 |
Processing Systems And Methods For Halide Scavenging App 20140271097 - WANG; Anchuan ;   et al. | 2014-09-18 |
Processing Systems And Methods For Halide Scavenging App 20140273406 - Wang; Anchuan ;   et al. | 2014-09-18 |
Processing Systems And Methods For Halide Scavenging App 20140262038 - Wang; Anchuan ;   et al. | 2014-09-18 |
Processing Systems, Apparatus, And Methods Adapted To Process Substrates In Electronic Device Manufacturing App 20140263165 - Hongkham; Steve S. ;   et al. | 2014-09-18 |
Insulated Semiconductor Faceplate Designs App 20140252134 - Chen; Xinglong ;   et al. | 2014-09-11 |
Enhanced Etching Processes Using Remote Plasma Sources App 20140248780 - Ingle; Nitin K. ;   et al. | 2014-09-04 |
Semiconductor Processing Systems Having Multiple Plasma Configurations App 20140227881 - Lubomirsky; Dmitry ;   et al. | 2014-08-14 |
Dry-etch Selectivity App 20140141621 - Ren; He ;   et al. | 2014-05-22 |
Radical Chemistry Modulation And Control Using Multiple Flow Pathways App 20140099794 - Ingle; Nitin K. ;   et al. | 2014-04-10 |
Chemical Control Features In Wafer Process Equipment App 20140097270 - Liang; Qiwei ;   et al. | 2014-04-10 |
Semiconductor Processing With Dc Assisted Rf Power For Improved Control App 20140057447 - Yang; Jang-Gyoo ;   et al. | 2014-02-27 |
Pedestal With Multi-zone Temperature Control And Multiple Purge Capabilities App 20140021673 - Chen; Xinglong ;   et al. | 2014-01-23 |
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma App 20130153148 - Yang; Jang-Gyoo ;   et al. | 2013-06-20 |
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma App 20130082197 - Yang; Jang-Gyoo ;   et al. | 2013-04-04 |
Low profile process kit Grant 8,409,355 - Rasheed , et al. April 2, 2 | 2013-04-02 |
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma App 20120180954 - Yang; Jang-Gyoo ;   et al. | 2012-07-19 |
Method of making an electrostatic chuck with reduced plasma penetration and arcing Grant 8,108,981 - Lubomirsky , et al. February 7, 2 | 2012-02-07 |
Flow Control Features Of Cvd Chambers App 20110011338 - Chuc; Kien N. ;   et al. | 2011-01-20 |
Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing Grant 7,848,076 - Narendranath , et al. December 7, 2 | 2010-12-07 |
Internal balanced coil for inductively coupled high density plasma processing chamber Grant 7,789,993 - Chen , et al. September 7, 2 | 2010-09-07 |
Plasma Source For Chamber Cleaning And Process App 20100098882 - Lubomirsky; Dmitry ;   et al. | 2010-04-22 |
Low Profile Process Kit App 20090266299 - RASHEED; MUHAMMAD M. ;   et al. | 2009-10-29 |
Internal balanced coil for inductively coupled high density plasma processing chamber Grant 7,572,647 - Chen , et al. August 11, 2 | 2009-08-11 |
Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing App 20090034149 - Lubomirsky; Dmitry ;   et al. | 2009-02-05 |
Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing App 20090034147 - Narendrnath; Kadthala Ramaya ;   et al. | 2009-02-05 |
Method of making an electrostatic chuck with reduced plasma penetration and arcing App 20090034148 - Lubomirsky; Dmitry ;   et al. | 2009-02-05 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber App 20080185284 - Chen; Robert ;   et al. | 2008-08-07 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber App 20080188087 - CHEN; ROBERT ;   et al. | 2008-08-07 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber App 20080188090 - Chen; Robert ;   et al. | 2008-08-07 |