Patent | Date |
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Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same App 20220254644 - Zhou; Baosuo ;   et al. | 2022-08-11 |
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Grant 11,335,563 - Zhou , et al. May 17, 2 | 2022-05-17 |
Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Inclu App 20200203171 - Zhou; Baosuo ;   et al. | 2020-06-25 |
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Grant 10,607,844 - Zhou , et al. | 2020-03-31 |
Silicon-based deposition for semiconductor processing Grant 10,600,648 - Kamp , et al. | 2020-03-24 |
Negative ion control for dielectric etch Grant 10,181,412 - Marakhtanov , et al. Ja | 2019-01-15 |
Silicon-based Deposition For Semiconductor Processing App 20180308693 - KAMP; Tom A. ;   et al. | 2018-10-25 |
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Grant 10,096,483 - Zhou , et al. October 9, 2 | 2018-10-09 |
Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same App 20180286693 - Zhou; Baosuo ;   et al. | 2018-10-04 |
Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same App 20170372913 - Zhou; Baosuo ;   et al. | 2017-12-28 |
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Grant 9,761,457 - Zhou , et al. September 12, 2 | 2017-09-12 |
Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures Grant 9,478,497 - Wells , et al. October 25, 2 | 2016-10-25 |
Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same App 20160203993 - Zhou; Baosuo ;   et al. | 2016-07-14 |
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Grant 9,305,782 - Zhou , et al. April 5, 2 | 2016-04-05 |
Negative Ion Control For Dielectric Etch App 20150357209 - Marakhtanov; Alexei ;   et al. | 2015-12-10 |
Negative ion control for dielectric etch Grant 9,117,767 - Marakhatanov , et al. August 25, 2 | 2015-08-25 |
Single Spacer Process for Multiplying Pitch by a Factor Greater Than Two and Related Intermediate IC Structures App 20150054168 - Wells; David H. ;   et al. | 2015-02-26 |
Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same App 20150021744 - Zhou; Baosuo ;   et al. | 2015-01-22 |
Mask material conversion Grant 8,895,232 - Abatchev , et al. November 25, 2 | 2014-11-25 |
Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures Grant 8,883,644 - Wells , et al. November 11, 2 | 2014-11-11 |
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Grant 8,852,851 - Zhou , et al. October 7, 2 | 2014-10-07 |
Single Spacer Process For Multiplying Pitch By A Factor Greater Than Two And Related Intermediate Ic Structures App 20140038416 - Wells; David H. ;   et al. | 2014-02-06 |
Integrated circuit having pitch reduced patterns relative to photoithography features Grant 8,598,632 - Tran , et al. December 3, 2 | 2013-12-03 |
Mask Material Conversion App 20130302987 - Abatchev; Mirzafer K. ;   et al. | 2013-11-14 |
Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures Grant 8,557,704 - Wells , et al. October 15, 2 | 2013-10-15 |
Mask material conversion Grant 8,486,610 - Abatchev , et al. July 16, 2 | 2013-07-16 |
Negative Ion Control for Dielectric Etch App 20130023064 - Marakhtanov; Alexei ;   et al. | 2013-01-24 |
Integrated Circuit Having Pitch Reduced Patterns Relative To Photolithography Features App 20120256309 - Tran; Luan ;   et al. | 2012-10-11 |
Method for integrated circuit fabrication using pitch multiplication Grant 8,216,949 - Abatchev , et al. July 10, 2 | 2012-07-10 |
Pitch reduced patterns relative to photolithography features Grant 8,207,576 - Tran , et al. June 26, 2 | 2012-06-26 |
Pitch reduced patterns relative to photolithography features Grant 8,119,535 - Tran , et al. February 21, 2 | 2012-02-21 |
Pitch reduced patterns relative to photolithography features Grant 8,048,812 - Tran , et al. November 1, 2 | 2011-11-01 |
Mask Material Conversion App 20110130006 - Abatchev; Mirzafer K. ;   et al. | 2011-06-02 |
Trim process for critical dimension control for integrated circuits Grant 7,910,483 - Abatchev , et al. March 22, 2 | 2011-03-22 |
Mask material conversion Grant 7,910,288 - Abatchev , et al. March 22, 2 | 2011-03-22 |
Pitch Reduced Patterns Relative Tophotolithography Features App 20100210111 - Tran; Luan ;   et al. | 2010-08-19 |
Method For Integrated Circuit Fabrication Using Pitch Multiplication App 20100203727 - Abatchev; Mirzafer K. ;   et al. | 2010-08-12 |
Trim Process For Critical Dimension Control For Integrated Circuits App 20100173498 - Abatchev; Mirzafer K. ;   et al. | 2010-07-08 |
Pitch reduced patterns relative to photolithography features Grant 7,718,540 - Tran , et al. May 18, 2 | 2010-05-18 |
Pitch Reduced Patterns Relative To Photolithography Features App 20100092891 - Tran; Luan ;   et al. | 2010-04-15 |
Method for integrated circuit fabrication using pitch multiplication Grant 7,687,408 - Abatchev , et al. March 30, 2 | 2010-03-30 |
Trim process for critical dimension control for integrated circuits Grant 7,662,718 - Abatchev , et al. February 16, 2 | 2010-02-16 |
Single Spacer Process For Multiplying Pitch By A Factor Greater Than Two And Related Intermediate Ic Structures App 20100029081 - Wells; David H. ;   et al. | 2010-02-04 |
Pitch reduced patterns relative to photolithography features Grant 7,651,951 - Tran , et al. January 26, 2 | 2010-01-26 |
Method for integrated circuit fabrication using pitch multiplication Grant 7,629,693 - Abatchev , et al. December 8, 2 | 2009-12-08 |
Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures Grant 7,611,980 - Wells , et al. November 3, 2 | 2009-11-03 |
Critical dimension control for integrated circuits Grant 7,563,723 - Abatchev , et al. July 21, 2 | 2009-07-21 |
Method for integrated circuit fabrication using pitch multiplication Grant 7,547,640 - Abatchev , et al. June 16, 2 | 2009-06-16 |
Plasma etching system and method Grant 7,507,672 - Abatchev , et al. March 24, 2 | 2009-03-24 |
Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures App 20080057692 - Wells; David H. ;   et al. | 2008-03-06 |
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same App 20080008969 - Zhou; Baosuo ;   et al. | 2008-01-10 |
Critical dimension control for integrated circuits Grant 7,271,106 - Abatchev , et al. September 18, 2 | 2007-09-18 |
Trim process for critical dimension control for integrated circuits App 20070212889 - Abatchev; Mirzafer K. ;   et al. | 2007-09-13 |
Pitch reduced patterns relative to photolithography features Grant 7,253,118 - Tran , et al. August 7, 2 | 2007-08-07 |
Pitch Reduced Patterns Relative To Photolithography Features App 20070161251 - Tran; Luan ;   et al. | 2007-07-12 |
Method For Integrated Circuit Fabrication Using Pitch Multiplication App 20070148984 - Abatchev; Mirzafer K. ;   et al. | 2007-06-28 |
Pitch Reduced Patterns Relative To Photolithography Features App 20070138526 - Tran; Luan ;   et al. | 2007-06-21 |
Pitch Reduced Patterns Relative To Photolithography Features App 20070128856 - Tran; Luan ;   et al. | 2007-06-07 |
Etch process used during the manufacture of a semiconductor device and systems including the semiconductor device App 20070123050 - Zhou; Baosuo ;   et al. | 2007-05-31 |
Critical dimension control for integrated circuits App 20060270230 - Abatchev; Mirzafer K. ;   et al. | 2006-11-30 |
Method for integrated circuit fabrication using pitch multiplication App 20060262511 - Abatchev; Mirzafer K. ;   et al. | 2006-11-23 |
Method for integrated circuit fabrication using pitch multiplication App 20060258162 - Abatchev; Mirzafer K. ;   et al. | 2006-11-16 |
Method for integrated circuit fabrication using pitch multiplication Grant 7,115,525 - Abatchev , et al. October 3, 2 | 2006-10-03 |
Plasma etching system and method Grant 7,112,533 - Abatchev , et al. September 26, 2 | 2006-09-26 |
Pitch reduced patterns relative to photolithography features App 20060211260 - Tran; Luan ;   et al. | 2006-09-21 |
Mask material conversion App 20060046200 - Abatchev; Mirzafer K. ;   et al. | 2006-03-02 |
Method for integrated circuit fabrication using pitch multiplication App 20060046484 - Abatchev; Mirzafer K. ;   et al. | 2006-03-02 |
Critical dimension control for integrated circuits App 20060046483 - Abatchev; Mirzafer K. ;   et al. | 2006-03-02 |
Plasma etching system and method App 20030024643 - Abatchev, Mirzafer K. ;   et al. | 2003-02-06 |