U.S. patent number T954,002 [Application Number 05/659,177] was granted by the patent office on 1977-01-04 for process for increasing mask life. This patent grant is currently assigned to International Business Machines Corporation. Invention is credited to Paul P. Castrucci, Robert H. Collins, Frank T. Deverse.
United States Patent | T954,002 |
Castrucci , et al. | January 4, 1977 |
a method for semiconductor device manufacture comprising the steps of, (a) repetitively aligning photomasks over a surface of a semiconductor substrate, said substrate having a layer of opaque material on said surface, said opaque material being adapted to receive and retain a photographic pattern; and (b) at least one of said steps employing a photomask of a particular construction, said particularly constructed photomask being placed in physical contact with said opaque material, said particularly constructed photomask essentially consisting of a planar glass substrate having a thickness of approximately 0.25 inches, one surface of said glass substrate having a thin film of chrome thereon, said thin film of chrome having a thickness of approximately 0.1 microns, said thin film of chrome having a photographic pattern formed therein, a layer of SiO.sub.2 fully covering said thin film of chrome and said surface of said glass substrate, said SiO.sub.2 layer having a thickness of approximately 3,000 angstroms, whereby the useful life of said particularly constructed photomask is materially extended and said method for semiconductor device manufacture is rendered less costly and more efficient.
Inventors: | Castrucci; Paul P. (Poughkeepsie, NY), Collins; Robert H. (Poughkeepsie, NY), Deverse; Frank T. (Wappingers Falls, NY) |
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Assignee: | International Business Machines
Corporation (Armonk, NY) |
Family ID: | 27030912 |
Appl. No.: | 05/659,177 |
Filed: | February 17, 1976 |
Application Number | Filing Date | Patent Number | Issue Date | ||
---|---|---|---|---|---|
436320 | Jan 24, 1974 | ||||
195876 | Nov 4, 1971 | ||||
699268 | Jan 19, 1968 | ||||
Current U.S. Class: | 430/320; 430/311; 430/321; 430/323 |
Current CPC Class: | G03F 1/48 (20130101) |
Current International Class: | G03F 1/14 (20060101); G03C 005/00 () |
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