U.S. patent number RE33,177 [Application Number 06/781,869] was granted by the patent office on 1990-03-06 for in place gas cleaning of diffusion elements.
This patent grant is currently assigned to Water Pollution Control Corporation. Invention is credited to Lloyd Ewing, David T. Redmon, Frank L. Schmit.
United States Patent |
RE33,177 |
Schmit , et al. |
March 6, 1990 |
In place gas cleaning of diffusion elements
Abstract
Cleaning of multi-pore diffusion elements in place with cleaning
gases while submerged in liquid media by applying said cleaning
gases intermittently or continuously to said diffusion elements
between predetermined limits of operating pressure and flow through
flow regulation means and plenums for the respective diffusion
elements.
Inventors: |
Schmit; Frank L. (Port
Washington, WI), Redmon; David T. (Racine, WI), Ewing;
Lloyd (Milwaukee, WI) |
Assignee: |
Water Pollution Control
Corporation (Milwaukee, WI)
|
Family
ID: |
26887601 |
Appl.
No.: |
06/781,869 |
Filed: |
September 30, 1985 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
Issue Date |
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191974 |
Sep 29, 1980 |
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Reissue of: |
203834 |
Nov 4, 1980 |
04382867 |
May 10, 1983 |
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Current U.S.
Class: |
210/754; 134/29;
134/170; 261/122.1 |
Current CPC
Class: |
B01F
3/0412 (20130101); B01F 15/00025 (20130101); C02F
3/20 (20130101); B01F 3/04241 (20130101); B01F
3/04262 (20130101); Y02W 10/15 (20150501); B01F
2003/04276 (20130101); B01F 2003/04177 (20130101); B01F
2003/04297 (20130101); Y02W 10/10 (20150501) |
Current International
Class: |
B01F
15/00 (20060101); C02F 3/20 (20060101); B01F
3/04 (20060101); C02F 003/20 () |
Field of
Search: |
;210/741,764,749,754,758-760,199,220 ;261/121.1,122,DIG.70 ;55/96
;134/29,170,3,18,22.12,22.18,28,30,42,171 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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0047956 A1 |
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Mar 1982 |
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EP |
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721725 |
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Jan 1954 |
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GB |
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1348658 |
|
Mar 1974 |
|
GB |
|
Other References
Manual of Practice No. 5, Federation of Sewage and Industrial
Wastes Associations, 1971, pp. 65-74. .
Hydroceramic Co. literature carrying a 1978 copyright date; p. 1,
Forward; p. 42, Appendix; Cover sheet identified as Hydroceramic
& G. A. Boulier, Appendix A. .
The Lasaire System Diffuser Maintenance, pp. 1-7. .
Setter et al., "Experimental Laundering of Air Diffuser Plates,"
Sewage Works Journal, Sep. 1945, pp. 867-877. .
Setter, "Air Diffusion Problems at Activated Sludge Plants," Water
and Sewage Works, Dec. 1948, pp. 450-456. .
Lamb, "Designing and Maintaining Porous Tube Diffusers," Wastes
Engineering, Sep. 1954, pp. 405-411. .
Morgan, "Clogging Studies of Fine Bubble Diffuser Media," Sewage
and Industrial Wastes, Feb. 1959, pp. 153-163. .
Franklin, "Purging Diffuser Plate with Chlorine," Water Works and
Sewerage, Jun. 1939, pp. 232-233. .
Jackson, "Maintaining Open Diffuser Plates with Chlorine," Water
Works and Sewerage, Sep. 1942, pp. 380-382. .
Manual of Practice No. 5, Federation of Sewage and Industrial Waste
Associations, 1952, pp. 48-62. .
Beck, "Diffuser Plate Studies," Sewage Works Journal, Jan. 1936,
pp. 22-37. .
Airam Oy Opposition document, Notice of Opposition Against A
European Patent, dated Mar. 14, 1988; Annex 1, "Facts and
Arguments", Annex 2, Items 6-11 of documentary prior art (listing);
Claims from EPO Patent 0 049 154, Claims 1-50, pp. 1-11. .
English translation of Finnish Pat. Appln. 833,316 by Bretscher et
al., assignors to Oy Nokia AB, Helsinki, Finland, filed Sep. 16,
1983. .
Office Action dated Mar. 13, 1984 (from file of Bretscher et al.
U.S. Ser. No. 532,564). .
Office Action dated Jan. 3, 1985 (from file of Bretscher et al.
U.S. Ser. No. 588,070). .
Office Action of Aug. 14, 1985 issued in Finnish Appln. 833,316 of
Bretscher et al. (Translation). .
Response to Aug. 14, 1985 Office Action, Translation. .
Brenner, R. C. et al., "Status of Fine Pore Aeration in The United
States", 11th U.S./Japan Conference on Sewage Treatment Technology,
Tokyo, Japan, Oct. 12-14, 1987. .
Marx, James J. et al., "Full Scale Comparison of Ceramic Disk and
Flexible Membrane Tube Diffusers," 60th Annual Conference of the
Water Pollution Control Federation, Philadelphia, Oct. 7, 1987.
.
Stenstrom, Michael K., Letter dated Apr. 11, 1988 to Jerome D.
Wren, w/copies of overhead slides "The Los Angeles Studies",
exhibited to Steering Committee of the ASCE Committee on Oxygen
Transfer, Phoenix, Ariz. .
Stenstrom, M. K., Letter dated Jul. 8, 1988 w/attachment to J. D.
Wren. .
Houck, Daniel, "Survey and Evaluation of Porous Polyethylene Media
Fine Bubble Tube and Disk Aerators," ASCE/EPA Aeration Project,
Mar. 3, 1988, Cover, Contents, Figures, Tables, pp. 1-68. .
Statement of James A. Tarbell, executed Mar. 27, 1989 with Exhibits
A-A. .
Allbaugh, Thomas A., et al., Aeration System Design Using Offgas
Oxygen Transfer Testing, City of Lansing, Mich., undated. .
Bretscher, U., et al., The Cleaning of Wastewater Aerators
GWF-Wasser/Abwasser, vol. 6, No. 124, pp. 273-277, Water and
Wastewater, 1983. .
Chasick, A. H., Plant Test of Sparger and Tube Types of Diffusers,
Conference on Biological Waste Treatment, Manhattan College, Apr.
20-22, 1960. .
Garnard, A., Project Manager for City of Albuquerque, Letter to
Water Pollution Control Corporation, Fine Bubble Aeration System at
Albuquerque's Southside Water Reclamation Plant, Mar. 26, 1985.
.
Garnard, A., Project Manager City of Albuquerque, Letter to McMahan
& Associates, Inc., Albuquerque Southside Water Reclamation
Plant Fine Bubble Aeration System, Jan. 16, 1986. .
Gibbon, Donald L., Aeration of Activated Sludge in Sewage
Treatment, Pergammon, pp. 1-24, 65 & 80, Table 8, 89-90, Tables
1A-4D, pp. 115-118 (Appendix A), 1974. .
Gregory, M. H., et al., Evaluation of a Fine Bubble Dome Diffusion
Aeration System in Paper Mill Waste, TAPPI Proceedings, 1985,
Environmental Conference, Mobile, Ala., Apr. 22-24, 1985. .
Hardie, Michael G., Zimpro, Inc., Letter to L. Ewing, Ewing
Engineering Company, Marox Open Tank Oxygenation Process, undated.
.
Hinde Engineering Company, Waste treatment system meets O-discharge
goal and fertilizes farmland at low cost, Construction Digest, Nov.
27, 1975 (reprint of article). .
Hinde Engineering Company, Air-Aqua Controlled Aeration Systems,
Engineers Design Manual, p. 26, 1980. .
Hobbs, M. F., Ser. No. 186,085, filed Sep. 11, 1980, Abandoned
(Copies of specification, claims & drawings). .
Houck, Daniel F., et al., Survey and Evaluation of Fine Bubble Dome
Diffuser Aeration Equipment, In fulfilllment of grant from Assn. of
Metro, Sewerage Agencies & British Water Research Centre Under
Partial sponsorship of U.S. EPA, 1981, pp. 5, 41-49, 72, 74, 91-93,
103, 105, 110, 157, 59, 161, 162, 164, 168-169, 171, 173-174. .
Lagoon Aeration Corporation, The Lasaire System, Operation &
Maintenance, pp. 8-1-8-11, undated. .
Long, S., M.S., P.E., Low-pressure aeration reduces odor, COD of
complex mixture, Chemical Processing, May 1978 (reprint). .
Laukkarinen, T., Nokia Metal Products, Ltr. to Water Pollution
Control Corporation, Jul. 1, 1983 w/enclosures, Nokia Diffusers for
Waste Water Aeration (in English); Nokia Micro-Bubble Aerators HKP
600 and HKL 210, printed in Finland (in English), 9. 73; Nokian
Ratkaisut Jateveden Ilmastukssen (in Finnish), 00. 2.77. U.K. .
MOP 5-52; Federation of Sewage and Industrial Wastes Associations,
Air Diffusion in Sewage Works, Manual of Practice No. 5, p. 1-48,
1952. .
MOP 5-71; Water Pollution Control Federation, Aeration in
Wastewater Treatment, WPCF Manual of Practice No. 5, pp. 9-13,
29-42, 63-74, 1971. .
Roe, Frank C., Servicing of Porous Air Diffusers, Water Works and
Sewerage Reference and Data Section, 1939. .
Schade, Willard F., et al., Diffuser Plate Cleaning Versus
Compressed Air Cost, presented at Ohio Conference on Sewage
Treatment, Mansfield, Ohio, Sep. 18-19, 1941, Sewage Works Journal,
vol. 14, No. 1, Jan. 1942. .
Vik, Thomas E., et al., Full Scale Operating Experience Utilizing
Fine Bubble Ceramic Aeration With In Place Gas Cleaning at Seymour,
Wisc., presented at 57th Annual Meeting Central States Water
Pollution Control Association, Inc., May 1984. .
Thayer, P. M., Ser. No. 140,533, filed Apr. 14, 1980, Abandoned,
Specification and drawings. .
EPO Application 81 304 493 0-Official Search Report Apr. 7, 1982.
.
MOP 5-51, pp. 44-47 (cited in official search report). .
Journal of WPCF, vol. 46 (1974), pp. 895-910; (cited in official
search report). .
EPO Office Action of Aug. 9, 1983. .
Associate's Covering Letter and response of Mar. 14, 1984. .
Associate's Additional Ltr. of Apr. 5, 1984 re error in Claim 42.
.
EPO Office Action of Sep. 14, 1984. .
Associate's Covering Letter and response of May 15, 1985. .
EPO Examiner's Record of Interview of Jun. 24, 1985. .
Associate's Covering Letter and response of Oct. 13, 1985. .
EPO Official Letter of Jan. 31, 1986. .
Associate's Letter of Feb. 3, 1986 re additional art. .
Associate's Covering Letter and response of Jul. 7, 1986. .
EPO Letter of Sep. 11, 1986 and Advance Rule 51 Communication.
.
Boyle et al., Biological Fouling of Fine Bubble Diffusers:
State-of-Art, pp. 991-1005; 10/83. .
Aberley et al., Air Diffusion Unit, Journal WPCF, vol. 46, No. 5,
May 1974, pp. 895-910. .
Barnes, F. B., Resume (Nokia, FB-1). .
Hinde Engr. Co., O&M Instructions for Air-Aqua Oxidation
System, 2 pages text, 2 pages drgs, undated) (Nokia, FB-5). .
Lewis, Lonnie D., The eyes of Texas are on U.S. Gypsum, Water and
Wastes Engineering, (Nokia, FB-7) Jul. 1972, vol. 9, No. 7. .
Goodnow, W. E., Aerated lagoons solve town's site problems, Water
& Wastes Engineering, Jan. 1976, vol. 13, No. 1 (Nokia, FB-8).
.
WPCF, MOP 5 (71), pp.: cover, v.vi, 24, 26, 63, 65, 67-70, (Nokia
FB-10). .
Melbourne and Metropoliton Bd. of Works, South Eastern Purification
Plane (Drwngs) (Nokia, FB-11). .
Hawker-Siddeley, Fine Bubble Dome Diffuser-Construction and
Fittings, (Nokia, JRF-1). .
Barnes, F. B., Statutory Declaration, pp. 1-20, May 20, 1987. .
Fulton, J. F., Statutory Declaration, pp. 1 & 2, May 19, 1987.
.
Nokia Metal Products, Operation and Maintenance of Nopol Diffusers,
undated (possibly Sep. 1978; published in Finnish at earlier date).
.
Rushton, Geo. H., et al., Norton Company, Aeration/Filtration
Systems, Industrial Ceramics, Bio-Fouling: Causes, Effects and
Remedies, presented at 57th Annual Meeting of N.Y. Water Pollution
Control Assoc., Jan. 22, 1985. .
DuBois, Richard E., Induced Air Aeration Lagoon in Hinesburg, Vt.,
Water & Sewerage Works, Apr. 1972. .
Hinde Engineer Company, Operation and Maintenance Instruction
Manual for Air-Aqua Aeration Systems, OM-474, undated. .
Kuhn, John, Low-pressure lagoon aeration system reduces BOD 93.5%,
Food Processing, Apr. 1978. .
Roe, Frank C., The Installation and Servicing of Porous Air
Diffuser Mediums, Water Works and Sewerage, Apr. 1934. .
Shapiro, N., Memorandum to Hinde Engineering Company Sales
Representatives, Centralized Gas Cleaning Equipment, The Air-Aqua
Feederline, No. 207, Mar. 19, 1980..
|
Primary Examiner: Wyse; Tom
Attorney, Agent or Firm: Pollock, Vande Sande &
Priddy
Parent Case Text
This application is continuation-in-part of Ser. No. 191,974, filed
on Sept. 29, 1980, now abandoned.
Claims
What is claimed is:
1. In a process of treating a liquid medium by passing treating gas
through multi-pore diffusion elements submerged in the medium,
wherein foulants in the medium or treating gas have tendency to
form a deposits in the elements or at their surfaces and to cause a
progressive increase in the dynamic wet pressure and/or mean bubble
release pressure of the diffusion elements relative to a previous
base condition of said elements, and in which the elements are
cleaned in place by passing a cleaning gas through them alone or in
admixture with treating gas, said cleaning gas having a different
composition than said treating gas and being capable of reducing
the dynamic wet pressure and/or the mean bubble release pressure of
fouled diffusion elements, the improvement which comprises:
conducting said gas cleaning with sufficient frequency, including
continuously, and with sufficient amount(s) of cleaning gas for
restricting any potential or actual increase in the dynamic wet
pressure level of the elements, above a previous base condition of
said dynamic wet pressure, to about 25 inches or less of water
gauge .[.of.]. .Iadd.at .Iaddend.2 SCFM per square foot of active
gas discharge surface of the elements, and/or restricting any
potential or actual increase in the mean bubble release pressure
level of the elements, above a previous base condition of said mean
bubble release pressure, to about 25 inches of water gauge or
less;
simultaneously applying said cleaning gas to one or more groups of
at least about 10 diffusion elements per group by feeding the
cleaning gas to the elements through a gas distribution network
having a submerged portion including a plurality of flow regulating
means, a plurality of plenums and a plurality of diffusion
elements, said flow regulating means being connected with said
plenums to deliver gas to said plenums, said flow regulating means
being sized or adjusted to deliver said gas at a substantially
similar rate to each of said plenums, each of said plenums being
connected directly or indirectly with one or more of said diffusion
elements whereby said diffusion of said diffusion elements whereby
said diffusion element or elements connected to one of said plenums
can be supplied with gas at a substantially similar rate as
compared to the rate at which gas is supplied to the diffusion
elements connected to the other plenum or plenums; and
discharging treating gas along or in admixture with cleaning gas,
through the diffusion elements for an extended cycle of operation
constituting at least about 30 total days of continuous or
intermittent passage of treatment gas through the elements;
whereby fouling is restrained during said cycle by applying the
cleaning gas with sufficient frequency and in sufficient amounts to
maintain the dynamic wet pressure and/or mean bubble release
pressure at or below the aforesaid levels.
2. In a process of treating a liquid medium by passing treating gas
through multi-pore diffusion elements submerged in the medium,
wherein foulants in the medium or treating gas tend to form
deposits in the elements or at their surfaces causing a progressive
increase in the dynamic wet pressure and/or the mean bubble release
pressure of the diffusion elements relative to a previous base
condition of said elements, and in which the elements are cleaned
in place by intermittently passing a cleaning gas through them,
alone or in admixture with treating gas, said cleaning gas having a
different composition than said treating gas and being capable of
reducing the dynamic wet pressure and/or the mean bubble release
pressure of fouled diffusion elements, the improvement which
comprises:
initiating cleaning with said cleaning gas when the dynamic wet
pressure level of the elements has increased to a level above their
base condition by an amount which is equal or equivalent to about
25 inches of water gauge or less at 2 SCFM per square foot of
active gas discharge surface, or when the mean bubble release
pressure of the diffusion elements has increased to a level above
their base condition by about 25 inches of water gauge or less;
simultaneously applying said cleaning gas to one or more groups of
at least about 10 diffusion elements per group by feeding the
cleaning gas to the elements through a gas distribution network
having a submerged portion including a plurality of flow regulating
means, a plurality of plenums and a plurality of diffusion
elements, said flow regulating means being connected with said
plenums to deliver gas to said plenums, said flow regulating means
being sized or adjusted to deliver said gas at a substantially
similar rate to each of said plenums, each said plenums being
connected directly or indirectly with one or more of said diffusion
elements whereby said diffusion element or elements connected to
one of said plenums can be supplied with gas at a substantially
similar rate as compared to the rate at which gas is supplied to
the diffusion elements connected to the .[.outer.]. .Iadd.other
.Iaddend.plenum or plenums; and applying said cleaning gas in one
or more periods of application and in a sufficient amount .[.of.].
for reducing said increase in dynamic wet pressure by at least
about 0.3 times said increase in dynamic wet pressure or for
reducing said increase in mean bubble release pressure by at least
about 0.5 times said increase in means bubble release pressure.
3. The process according to claim 2 wherein said cleaning gas is
HCl in a gas mixture in a mole fraction in the gas mixture at
atmospheric pressure in the range from about 6.6.times.10.sup.-3 to
about 3.1.times.10.sup.-2 and said period of application of said
cleaning gas is from about 30 to about 160 minutes.
4. The process according to claim 3 wherein the cleaning gas is
passed through said diffusion elements at a rate from about 6 to
about 8 SCFM per square foot of active discharge area.
5. The process according to claim 2 wherein said cleaning is
initiated when said increase in dynamic wet pressure of said
elements above said base condition, or said increase in mean bubble
release pressure of said elements above said base condition is at
least about 0.5 inches of water gauge.
6. The process according to claim 2 wherein said cleaning is
initiated when said increase in dynamic wet pressure of said
elements above said base condition, or said increase in mean bubble
release pressure of said elements above said base condition is at
least about 0.7 inches of water gauge.
7. The process according to claim 2 wherein said cleaning is
initiated when said increase in dynamic wet pressure of said
elements above said base condition, or said increase in mean bubble
release pressure of said elements above said base condition is from
about 0.5 to about 15 inches of water gauge.
8. The process according to claim 2 wherein said cleaning is
initiated when said increase in dynamic wet pressure of said
elements above said base condition, or said increase in mean bubble
release pressure of said elements above said base condition is from
about 0.5 to about 7 inches of water gauge.
9. The process according to claim 2 wherein said cleaning is
initiated when said increase in dynamic wet pressure of said
elements above said base condition, or said increase in mean bubble
release pressure of said elements above said base condition, is
from about 0.7 to about 15 inches of water gauge.
10. The process according to claim 2 wherein said cleaning is
initiated when said increase in dynamic wet pressure of said
elements above said base condition, or said increase in mean bubble
release pressure of said elements above said base condition is from
about 0.7 to about 7 inches of water guage.
11. The process according to claim 2 wherein said cleaning is
conducted until the dynamic wet pressure of said elements is
reduced by at least about 0.5 of the increase in dynamic wet
pressure or mean bubble release pressure above said base condition
caused by said foulants.
12. The process according to claim 2 wherein said cleaning is
conducted until the dynamic wet pressure or means bubble release
pressure of said elements is reduced by at least about 0.8 of the
increase in dynamic wet pressure or mean bubble release pressure
above said base condition caused by said foulants.
13. The process according to claim 2 wherein said cleaning is
conducted until the mean bubble release pressure of said elements
is reduced by at least about 0.9 of the increase in bubble release
pressure above said base condition.
14. The process according to claim 2 wherein during the cleaning
period, a surface-active agent is applied to the interfaces between
the diffusion elements and the medium in an amount sufficient to
reduce the surface tension of the liquid medium.
15. The process according to claim 14 wherein at least about 60
percent of the cleaning gas is discharged from said diffusion
elements while said surface-active agent is present at said
interfaces between the diffusion elements and the liquid
medium.
16. The process according to claim 14 wherein at least about 80
percent of the cleaning gas is discharged from said diffusion
elements while said surface-active agent is present at said
interfaces between the diffusion elements and the liquid
medium.
17. The process according to claim 2 wherein at least about 60
percent of the cleaning gas is discharged from said diffusion
elements while an enhanced pressure differential of at least about
2 inches of water is maintained across said diffusion elements.
18. The process according to claim 2 wherein at least about 80
percent of the cleaning gas is discharged from said diffusion
elements while an enhanced pressure differential of at least about
2 inches of water is maintained across said diffusion elements.
19. The process according to claim 1 or 2 wherein said liquid
medium is an aqueous waste liquor from domestic sewage, or
industrial wastes.
20. The process according to claims 1 or 2 wherein the treating gas
is an oxygen-containing gas.
21. The process according to claims 1 or 2 wherein the treating gas
is air.
22. The process according to claims 1 or 2 wherein said diffusion
elements each comprise a porous mass of finely-divided solid
particles bonded together, and having a fine-bubble emitting gas
discharge surface free of macro openings and capable of discharging
gas in a substantially uniform manner.
23. The process according to claim 22 wherein said finely-divided
particles are ceramic particles in said mass which are bonded
together.
24. The process according to claim 22 wherein said diffusion
elements have a bubble release pressure in the range of about 2 to
about 20 inches of water gauge.
25. The process according to claim 22 wherein said diffusion
elements have a bubble release pressure in the range of about 3 to
about 15 inches of water gauge.
26. The process according to claim 22 wherein said diffusion
elements have a bubble release pressure in the range of about 4 to
about 10 inches of water gauge.
27. The process according to claims 1 or 2 wherein said diffusion
elements comprise finely pored ceramic plates having an upper gas
discharge surface with a bubble release pressure in the range of
about 2 to about 20 inches of water, said elements including a
central zone and an outward zone, said central zone having an
enhanced volumetric compression ratio relative to said outward
zone, said element having pore sizes in the range of about 60 to
about 600 microns, and a coefficient of variation of the bubble
release pressure of the gas discharge surface not greater than
about 0.25 based on the values of bubble release pressure
measurement of at least 5 equally spaced points along each of two
perpendicular reference lines extending across said upper surface
of the element and through the center thereof.
28. The process according to claim 27 wherein the area of the
central zone comprises from about 10 to about 80 percent of the
total area of the gas discharge surface.
29. The process according to claim 27 wherein the area of the
central zone comprises from about 25 to about 70 percent of the
total area of the gas discharge surface.
30. The process according to claim 27 wherein said bubble release
pressure is in the range of from about 5 to about 10 inches of
water gauge.
31. The process according to claim 27 wherein the volumetric
compression ratio of the central zone has been enhanced, relative
to the outward zone, by at least about 2 percent.
32. The process according to claim 27 wherein the volumetric
compression ratio of the central zone has been enhanced, relative
to the outward zone, by from about 3 to about 15 percent.
33. The process according to claims 1 or 2 wherein at least about
90 percent of the diffusion elements to which said cleaning gas is
applied are able, when new or when thoroughly cleaned, to transmit
gas at a flow rate within about 15 percent of the average flow rate
of all such elements when tested at 2 inches of water gauge in a
dry condition.
34. The process according to claims 1 or 2 wherein at least about
95 percent of the diffusion elements to which said cleaning gas is
applied are able, when new or when thoroughly cleaned, to transmit
gas at a flow rate within about 10 percent of the average flow rate
of all such elements when tested at 2 inches of water gauge in a
dry condition.
35. The process according to claims 1 or 2 wherein said diffusion
elements comprise finely-pored ceramic plates having upper gas
discharge surfaces with a bubble release pressure in the range from
about 2 to about 20 inches of water, each of said elements
including a central zone, an outward zone, a boundary zone, a
peripheral zone and vertical cylindrical sides, said central zone
having an enhanced volumetric compression ratio relative to said
outward zone by from about 3 to about 15 percent, said boundary
zone having an enhanced volumetric compression ratio relative to
said outward zone by from about 10 to about 100 percent, and each
of said elements having a coefficient of variation of the bubble
release pressure of its upper gas discharge surface not greater
than about 0.25 based on the values of bubble release pressure
measurements of at least 5 equally spaced points along each of two
perpendicular reference lines extending across said upper gas
discharge surface of the element and through the center
thereof.
36. The process according to claim 35 wherein the area of the
central zone comprises from about 10 to about 80 percent of the
total area of the gas discharge surface.
37. The process according to claim 35 wherein the area of the
central zone comprises from about 25 to about 70 percent of the
total area of the gas discharge surface.
38. The process according to claim 35 wherein the vertical
cylindrical sides of said diffusion elements are semi-permeable and
free of adherent material preventing bubble emission, the diffusion
elements are supported by holders which at least partly enclose
plenums and are secured to said holders by peripheral retaining
means and sealed to said holders by non-adherent elastomeric seals
at the upper edge of said vertical cylindrical sides.
39. The process according to claims 1 or 2 wherein said diffusion
elements each have a gas discharge surface area of at least about
20 square inches.
40. The process according to claims 1 or 2 wherein said diffusion
elements each have a gas discharge area of at least about 40 square
inches.
41. The process according to claims 1 or 2 wherein said diffusion
elements each have a gas discharge area of at least 40 square
inches per inch of thickness of said element.
42. The process according to claim 1 or 2 wherein said cleaning gas
dissolves, or poisons said foulant or material which attaches said
foulant to said diffusion elements.
43. The process according to claims 1 or 2 wherein said cleaning
gas is an oxidizing agent.
44. The process according to claims 1 or 2 wherein said foulants
comprise living organisms and said cleaning gas is a poison for
said organisms.
45. The process according to claim 1 or 2 wherein said cleaning gas
is an organic compound having a solvent effect on said foulant or
on material which attaches said foulant to said diffusion
elements.
46. The process according to claims 1 or 2 wherein the cleaning gas
contains at least one member selected from the group consisting of
H.sub.2 O.sub.2, CH.sub.3 OH, SO.sub.2, CO.sub.2, Cl.sub.2,
ClO.sub.2, HCl, NO.sub.x, O.sub.3 and Br.sub.2.
47. The process according to claims 1 or 2 wherein said cleaning
gas is soluble in water and forms an acidic solution when dissolved
in water.
48. The process according to claim 47 wherein said cleaning gas is
present in a concentration in said treating gas sufficiently high
to form an aqueous acidic solution having a pH at equilibrium of
about 3 or less.
49. The process according to claim 47 wherein said cleaning gas is
present in a concentration in said treating gas sufficiently high
to form an aqueous acidic solution having a pH at equilibrium of
about 2 or less.
50. The process according to claim 47 wherein said cleaning gas is
present in a concentration in said treating gas sufficiently high
to form an aqueous acidic solution having a pH at equilibrium of
about 1 or less.
51. The process according to claim 47 wherein said cleaning gas is
present in a concentration in said treating gas sufficiently high
to form an aqueous acidic solution having a pH at equilibrium of
about 0.7 or less.
52. The process according to claim 47 wherein said cleaning gas is
present in a concentration in said treating gas sufficiently high
to form an aqueous acidic solution having a pH at equilibrium of
about 0.5 or less.
53. The process according to claim 47 wherein said cleaning gas is
present in a concentration in said treating gas sufficiently high
to form an aqueous acidic solution having a pH at equilibrium of
about 0.4 or less.
54. The process according to claim 4 wherein said cleaning gas
contains HCl in a mole fraction at atmospheric pressure of at least
about 4.times.10.sup.-5.
55. The process according to claim 47 wherein said cleaning gas
contains HCl in a mole fraction at atmospheric pressure of at least
about 7.5.times.10.sup.-5.
56. The process according to claim 47 wherein said cleaning gas
contains HCl in a mole fraction at atmospheric pressure of at least
about 4.times.10.sup.-4.
57. The process according to claim 47 wherein said cleaning gas
contains HCl in a mole fraction at atmospheric pressure at least
about 1.3.times.10.sup.-3.
58. The process according to claim 47 wherein said cleaning gas
contains HCl in a mole fraction at atmospheric pressure in the
range from about 6.6.times.10.sup.-3 to about
3.1.times.10.sup.-2.
59. The process according to claim 47 wherein said cleaning gas
contains HCl in a sufficiently high concentration to form an
aqueous acidic solution having a pH at equilibrium of less than
about 0.7.
60. The process according to claim 47 wherein said cleaning gas
contains HCl is a sufficiently high concentration to form an
aqueous acidic solution having a pH at equilibrium of less than
about 0.4.
61. The process according to claims 1 or 2 wherein said cleaning
gas being passed through said diffusion elements is admixed with
water vapor.
62. The process according to claims 1 or 2 wherein said cleaning
gas being passed through said diffusion elements is admixed with
water vapor and treating gas, and the admixture is obtained by
dissolving cleaning gas in water, and passing treating gas through
the resulting solution of cleaning gas in water.
63. The process according to claims 1 or 2 wherein said cleaning is
conducted or initiated to restrict .[.said.]. .Iadd.any potential
or actual .Iaddend.increase in dynamic wet pressure of the elements
above said base condition, or .[.said.]. .Iadd.any potential or
actual .Iaddend.increase in mean bubble release pressure of the
elements above said base condition to about 15 inches or less of
water gauge.
64. The process according to claims 1 or 2 wherein said cleaning is
conducted or initiated to restrict .[.said.]. .Iadd.any potential
or actual .Iaddend.increase in dynamic wet pressure of said
elements above said base condition, or .[.said.]. .Iadd.any
potential or actual .Iaddend.increase in mean bubble release
pressure of said elements above said base condition to about 7
inches or less of water gauge.
65. The process according to claims 1 or 2 wherein in a portion of
said cycle or period of application of said cleaning gas, the
dynamic wet pressure across said diffusion elements is
increased.
66. The process according to claim 65 wherein the dynamic wet
pressure is increased by at least about 1 inch of water gauge.
67. The process according to claim 65 wherein the dynamic wet
pressure is increased by at least about 2 inches of water
gauge.
68. The process according to claim 65 wherein the dynamic wet
pressure is increased by decreasing the depth of submergence of the
diffusion elements in the liquid medium.
69. The process according to claim 65 wherein the dynamic wet
pressure is increased by increasing the total gas pressure of the
gas applied to said elements.
70. The process according to claims 1 or 2 wherein in a portion of
said cycle or period of application of said cleaning gas the
dynamic wet pressure across said diffusion elements is maintained
substantially constant.
71. The process according to claims 1 or 2 wherein in a portion of
said cycle or period of application of said cleaning gas, the rate
of decrease of the dynamic wet pressure across said diffusion
elements is less than the decrease which would be attributable
solely to application of said cleaning gas.
72. The process according to claims 1 or 2 wherein at least about
40 percent of the cleaning gas is discharged from said diffusion
elements while an enhanced pressure differential of at least about
2 inches of water is maintained across said diffusion elements.
73. The process of claims 1 or 2 wherein the flow regulating means
is mounted .[.with.]. .Iadd.within .Iaddend.the plenum.
74. The process of claim 73 wherein the flow regulating means
responds exponentially to pressure.
75. The process of claim 73 wherein the flow regulating means
includes means to restrict the flow to unidirectional flow.
76. In a process of treating a liquid medium by passing
oxygen-containing gas through multi-pore diffusion elements
submerged in the medium wherein foulants in the medium or
oxygen-containing gas have a tendency to form deposits in the
elements or at their surfaces and to cause a progressive increase
in the dynamic wet pressure and/or means bubble release pressure of
the diffusion elements relative to a previous base condition of
said elements, a method of cleaning said elements in place
comprising;
positioning diffusion elements for submergence in said liquid
medium having a bubble release pressure in the range of about 2 to
about 20 inches of water gauge, at least about 90 percent of said
diffusion elements when new or thoroughly cleaned being able to
transmit gas at a flow rate within about 15 percent of the average
flow rate of all such elements when tested in a dry condition at a
pressure of 2 inches of water gauge, said elements having a
coefficient of variation of bubble release pressure of the gas
discharge surface not greater than about 0.25 based on values of
bubble release pressure measurements for at least 5 equally spaced
points along each of two perpendicular reference lines across the
gas discharge surface and through the center thereof;
initiating cleaning when the dynamic wet pressure level or mean
bubble release pressure of the diffusion elements has increased
above said base condition by from 0.7 to about 25 inches of water
gauge by simultaneously applying a mixture of HCl and said
oxygen-containing gas to the diffusion elements, said HCl being
present in a mole fraction of at least about 7.5.times.10.sup.-5
and sufficiently high to effectuate cleaning of said diffusion
elements, said mixture being applied through a gas distribution
network having a submerged portion including a plurality of flow
regulating means, a plurality of plenums, and a plurality of
diffusion elements, said flow regulating means being connected to
said plenums and adapted to deliver gas at a substantially similar
rate to each of said plenums, each of said plenums being connected
directly or indirectly with one or more of said diffusion elements
whereby said diffusion element or elements connected to one of said
plenums can be supplied with gas at a rate substantially similar to
the rate of gas supplied to the diffusion elements connected to the
other plenum or plenums; and
applying said mixture of HCl and oxygen-containing gas in one or
more periods in an amount sufficient for reducing said increase in
dynamic wet pressure by at least about 0.3 times said increase in
dynamic wet pressure or for reducing said increase in means bubble
release pressure by at least about 0.5 times said increase in mean
bubble release pressure.
77. The process according to claim 2 wherein said diffusion
elements are divided into two or more groups, said treating gas is
applied to the diffusion elements in a portion of said groups at an
enhanced rate and/or pressure differential, and cleaning is
initiated by selectively admixing cleaning gas with the treating
gas applied to said portion.
78. The process according to claim 77 wherein each of said groups
constitutes the elements within an individual tank in a multi-tank
plant.
79. The process according to claims 1 or 2 wherein during at least
a portion of the cleaning an enhanced pressure differential of at
least about 0.5 inches of water is applied across the diffusion
elements.
80. The process according to claim 2 wherein an enhanced pressure
differential is applied across said diffusion elements before
cleaning is initiated. .Iadd.
81. The process according to claim 1 wherein the base condition is
that dynamic wet pressure or bubble release pressure exhibited by
the elements when they (a) were manufactured or (b) were first put
into operation in the treatment of a liquid medium containing at
least one foulant. .Iaddend. .Iadd.82. The process according to
claim 2 wherein the base condition is that dynamic wet pressure or
bubble release pressure exhibited by the elements when they (a)
were manufactured or (b) were first put into operation in the
treatment of a liquid medium containing at least one foulant.
.Iaddend. .Iadd.83. The process according to claim 1 wherein the
base condition is that dynamic wet pressure or bubble release
pressure exhibited by the elements when they have been thoroughly
cleaned. .Iaddend. .Iadd.84. The process according to claim 2
wherein the base condition is that dynamic wet pressure or bubble
release pressure exhibited by the elements when they have been
thoroughly cleaned. .Iaddend. .Iadd.85. The process according to
claim 2 wherein the base condition is that dynamic wet pressure or
bubble release pressure exhibited by the elements when they (a)
were manufactured, or (b) were first put into operation in the
treatment of a liquid medium containing at least one foulant, or
(c) have been thoroughly cleaned, and cleaning gas is applied in
each of a plurality of separate gas cleaning operations for
restricting any potential or actual increase in the dynamic wet
pressure or bubble release pressure level of the elements above
said base condition to about 25 inches or less of water gauge, and
the same base condition is applicable to a plurality of said gas
cleaning operations. .Iaddend. .Iadd.86. The process according to
claim 1 wherein the base condition is expressed in terms of the
dynamic wet pressure exhibited by the elements, and said cleaning
gas is applied for restricting any potential or actual increase in
the dynamic wet pressure level of the elements above said base
condition to about 25 inches or less of water gauge. .Iaddend.
.Iadd.87. The process according to claim 2 wherein the base
condition is expressed in terms of the dynamic wet pressure
exhibited by the elements, and said cleaning gas is applied for
restricting any potential or actual increase in the dynamic wet
pressure level of the elements above said base condition to about
25 inches or less of water gauge. .Iaddend. .Iadd.88. The process
according to claim 1 wherein the base condition is expressed in
terms of the bubble release pressure exhibited by the elements, and
said cleaning gas is applied for restricting any potential or
actual increase in the bubble release pressure level of the
elements above said base condition to about 25 inches or less of
water gauge. .Iaddend. .Iadd.89. The process according to claim 1
wherein the base condition is expressed in terms of the bubble
release pressure exhibited by the elements, and said cleaning gas
is applied for restricting any potential or actual increase in the
bubble release pressure level of the elements above said base
condition to about 25 inches or less of water gauge. .Iaddend.
.Iadd.90. The process according to claim 1 wherein cleaning gas
alone or in admixture with treating gas is discharged through
diffusion elements having their own individual plenums which
receive said treating gas and cleaning gas through their own
individual flow regulating means. .Iaddend. .Iadd.91. The process
according to claim 2 wherein cleaning gas alone or in admixture
with treating gas is discharged through diffusion elements having
their own individual plenums which receive said treating gas and
cleaning gas through their own individual flow regulating
means.
.Iaddend. .Iadd.92. The process according to claim 1 wherein the
treating gas includes an oxygen-containing treating gas and
treating gas and cleaning gas are discharged simultaneously through
a group or groups of at least about ten diffusion elements having
their own individual plenums which receive said treating gas and
cleaning gas through their own individual flow regulating means and
through said network. .Iaddend. .Iadd.93. The process according to
claim 2 wherein the treating gas includes an oxygen-containing
treating gas and treating gas and cleaning gas are discharged
simultaneously through a group or groups of at least about ten
diffusion elements having their own individual plenums which
receive said treating gas and cleaning gas through their own
individual flow regulating means and through said network.
.Iaddend. .Iadd.94. The process according to claim 1 wherein the
base condition is that dynamic wet pressure exhibited by the
elements when they (a) were manufactured, or (b) were first put
into operation in the treatment of a liquid medium containing at
least one foulant, or (c) have been thoroughly cleaned, the
treating gas includes an oxygen-containing treating gas, and
treating gas and cleaning gas are discharged simultaneously through
a group or groups of at least about ten diffusion elements having
their own individual plenums which receive said treating gas and
cleaning gas through their own individual flow regulating means and
through said network, said cleaning gas being applied continuously
or being applied intermittently in each of a plurality of separate
gas cleaning operations for restricting any potential or actual
increase in the dynamic wet pressure level of the elements above
said base condition to about 25 inches or less of water gauge.
.Iaddend. .Iadd.95. The process according to claim 2 wherein the
base condition is that dynamic wet pressure exhibited by the
elements when they (a) were manufactured, or (b) were first put
into operation in the treatment of a liquid medium containing at
least one foulant, or (c) have been thoroughly cleaned, the
treating gas includes an oxygen-containing treating gas, and
treating gas and cleaning gas are discharged simultaneously through
a group or groups of at least about ten diffusion elements having
their own individual plenums which receive said treating gas and
cleaning gas through their own individual flow regulating means and
through said network, said cleaning gas being applied in each of a
plurality of separate gas cleaning operations for restricting any
potential or actual increase in the dynamic wet pressure level of
the elements above said base condition to about 25 inches or less
of water gauge, and the same base condition being applicable to a
plurality of said gas cleaning operations. .Iaddend. .Iadd.96. The
process according to claim 1 wherein the base condition is that
bubble release pressure exhibited by the elements when they (a)
were manufactured, or (b) were first put into operation in the
treatment of a liquid medium containing at least one foulant, or
(c) have been thoroughly cleaned, the treating gas includes air,
and treating gas and cleaning gas are discharged simultaneously
through a group or groups of at least about ten diffusion elements
having their own individual plenums which receive said treating gas
and cleaning gas through their own individual flow regulating means
and through said network, said cleaning gas being applied
continuously or being applied intermittently in each of a plurality
of separate gas cleaning operations for restricting any potential
or actual increase in the bubble release pressure level of the
elements above said base condition to about 25 inches or less of
water gauge. .Iaddend. .Iadd.97. The process according to claim 2
wherein the base condition is that bubble release pressure
exhibited by the elements when they (a) were manufactured, or (b)
were first put into operation in the treatment of a liquid medium
containing at least one foulant, or (c) have been thoroughly
cleaned, the treating gas includes air, and treating gas and
cleaning gas are discharged simultaneously through a group or
groups of at least about ten diffusion elements having their own
individual plenums which receive said treating gas and cleaning gas
through their own individual flow regulating means and through said
network, said cleaning gas being applied in each of a plurality of
separate gas cleaning operations for restricting any potential or
actual increase in the bubble release pressure level of the
elements above said base condition to about 25 inches or less of
water gauge, and the same base condition being applicable to a
plurality of said
gas cleaning operations. .Iaddend. .Iadd.98. The process according
to claim 2 wherein diffusion elements are fouled during the
treating process with organic slimes which tend to foul the
diffusion element gas discharge surfaces more severely at low
treating gas flux rates than at high flux rate, and said elements
are cleaned by delivering cleaning gas to said elements through
their own individual plenums which receive said treating gas and
cleaning gas through their own individual flow regulating means.
.Iaddend. .Iadd.99. The process according to claim 98 wherein the
treating process is a tank type wastewater aeration process, the
treating gas is air and the cleaning gas is introduced into the
treating gas. .Iaddend. .Iadd.100. The process according to claim
99 wherein the cleaning gas is HCl. .Iaddend. .Iadd.101. The
process according to claim 81, 82, 83, 84, 85, 86, 87, 88, 89, 98,
99 or 100 wherein any potential or actual increase in the dynamic
wet pressure level of the elements above said base condition is
restricted to about 15 inches or less of water gauge. .Iaddend.
.Iadd.102. The process according to claim 81, 82, 83, 84, 85, 86,
87, 88, 89, 98, 99 or 100 wherein any potential or actual increase
in the dynamic wet pressure level of the elements above said base
condition is restricted to about 7 inches or less of water gauge.
.Iaddend.
.Iadd. . The process according to claim 1, 2, 81, 82, 83, 84, 85,
86, 87, 88, 89, 98, 99 or 100 wherein any potential or actual
increase in the dynamic wet pressure level of the elements above
said base condition is restricted to about 5 inches or less of
water gauge. .Iaddend. .Iadd.104. The process according to claim 1,
2, 81, 82, 83, 84, 85, 86, 87, 88, 89, 98, 99 or 100 wherein any
potential or actual increase in the dynamic wet pressure level of
the elements above said base condition is restricted to 1.5 times
said base condition. .Iaddend.
Description
FIELD OF THE INVENTION
This present invention relates to the treatment of liquid media
containing organic and/or inorganic foulants. More particularly the
invention relates to the cleaning of multipore diffusion elements
while submerged in liquid media including such foulants.
BACKGROUND OF THE INVENTION
The aeration of waste liquid media, including for example domestic
sewage and industrial waste waters, is an old art. The activated
sludge process, which includes aeration of liquors containing
domestic sewage, has been in continuous use for about sixty
years.
The liquid media treated in such aeration processes very commonly
contain organic and/or inorganic foulants such as for example
relatively insoluble salts which are responsible for the hardness
of the water, and living and non-living organic residues which
contribute tot he formation of scales and slimes. Upon aeration of
these media with submerged aeration devices, there is a tendency
for the foulants to progressively foul such devices at the point of
release of oxygen-containing gas into the liquid media, closing up
or otherwise modifying the opening through which the
oxygen-containing gas is released into the media with various
undesirable results.
Such fouling can impair the uniformity of gas distribution from
aeration devices, especially when such devices are of the area
discharge type, such as for example the flat porous ceramic plates
which were used to discharge air into sewage liquors in early
activated sludge plants. Also, fouling can in certain circumstances
increase the pressure differential required to drive
oxygen-containing gas through the aeration devices at a given flow
rate, thus either reducing the flow of oxygen available, and
therefore the oxygen transfer rate of the aeration system, and/or
increasing the amount of power consumed in maintaining the desired
rate of flow, thus substantially increasing the energy requirements
and cost of the process.
Since these fouling phenomena are often progressive in nature they
can eventually lead to a complete or near complete disablement of
the aerating devices if permitted to continue long enough. However,
a long-standing recognition of the intolerable circumstances that
can result from failure of a sewage treatment plant has provided
considerable encouragement for persons skilled in the art to
explore remedial measures.
The fouling problem has been discussed and confronted in various
ways with varying degrees of success for many years. Literature
references discussing the problem and proposed solutions were
available in the 1930s. These and subsequent publications
demonstrate the severity of the problem and the elusiveness of any
truly satisfactory solution. At a very early stage it was
recognized that the removal of diffusion elements from an aeration
tank for cleaning was both inconvenient and relatively expensive in
view of the labor costs and the loss of use of the facility.
Accordingly various attempts were made to develop satisfactory
processes for cleaning the aeration devices in place, i.e. without
removal from the aeration tanks and, wherever, possible, without
draining the liquid media from the tanks.
One of the techniques tried was injection of chlorine gas into the
aeration system in admixture with air while the aeration system was
in operation. A measure of success was obtained in that there was
reduction of flow resistance and apparently some prolongation of
the life of the elements. However, such techniques were only
sporadically successful.
For example, R. B. Jackson reported in his article "Maintaining
Open Diffuser Plates With Chlorine", Water Works & Sewerage,
Sept. 1942, pages 380-382, that the application of chlorine,
whenever required, was effective in maintaining operation for a
period of time, following which it again became necessary to drain
the aeration tank and clean the decommissioned diffusion elements
with liquid cleaners including acids. But Jackson was only one of a
number of individuals who experimented with in place cleaning with
gaseous cleaning agents in a variety of plants. See for example W.
M. Franklin, "Purging Diffuser Plates With Chlorine", Water works
& Sewerage, June 1939, pages 232-233; "Manual of Practice No.
5", Federation of Sewage and Industrial Wastes Associations,
Champaign, Ill., 1952, pages 60-61; And U.S. Pat. No. 2,686,138 to
Klein.
However, despite the early attempts at perfecting this technique,
it has not been widely regarded as generally acceptable heretofore
for large sewage treatment plants with multi-pore diffusion
elements.
It is of interest to note that sewage treatment plant designers are
generally familiar with the tubing-type diffusers for the sewage
treatment ponds or lagoons used by small communities. Such systems
usually employ rows of small diameter plastic tubing resting on or
suspended above the bottom of a lagoon or basin and having small
holes or slits formed in the tubing at relatively widely spaced
intervals along the length of the tubing. For example, one
commercially available type of tubing-type diffuser marketed by
Lagoon Aeration Corporation under the trademark LASAIRE.RTM. is
weighted tubing having an inside diameter of approximately one-half
inch with a small bore on the order of 0.012" in diameter about
every four inches along the crown of the tubing. Another
commercially available form of tubing type diffuser employs slits
instead of bores. Still another type employs rigid plastic tubing
having small porous ceramic inserts cemented into the tubing wall
instead of the bores or slits previously mentioned. Sanitary
engineers are, of course, aware of the successful cleaning of such
tubing type diffusers by the addition of a cleaning gas such as
hydrogen chloride to the oxygen-containing gas, which mixture is
forced through the bores, slits or small ceramic inserts, while the
latter are in place submerged in the liquid media, to remove
incrustations of organic and/or inorganic foulants.
Notwithstanding the apparent success of in place gas cleaning of
tubing-type diffusers and the long-standing knowledge of and early
attempts at in place gas cleaning of the multi-pore area release
diffusion elements customarily employed in the tank-type aeration
facilities generally used by large cities and counties, gas
cleaning in place has not been generally adopted for such
facilities. Considering the long-standing nature of the fouling
problem and the fact that the technology relating to in place gas
cleaning of tubing type diffusers has been readily available to
sewage plant designers for years, it might seem reasonable to
assume that in place gas claning would have long ago become the
technique of choice for the tank-type aeration facilities equipped
with multi-pore diffusion elements. That is has not become a
commonly used method bears silent but effective witness to the fact
that a practical, economical and dependable technique for in place
gas cleaning of multipore diffusion elements in tank-type aeration
facilities was not obvious to plant designers and operators of
ordinary skill in the art.
Further evidence of such non-obviousness is provided by the
willingness of facility operators to indulge in such inconvenient,
time consuming and expensive measures as removing the unit from
service, draining the tank, doing preliminary cleaning of the tank
and of the foulded diffusion elements with fire hoses and the like,
removing literally tons of elements from the tanks transporting
them to a cleaning facility, subjecting them to acid and/or caustic
solution cleaning, drying the elements, refiring them at elevated
temperatures, replacing the rather substantial number of elements
which are inevitably destroyed by cracking or warping in the
refiring process, transporting the elements back to the plant,
reinstalling them with removal of damaged gasket material from the
holders, installation of new gaskets, retightening and torqueing of
the means for holding the diffusion elements in their holders,
refilling the tank and returning the facility to operation.
Additional evidence has been provided by a study entitled "survey
and Evaluation of Fine Bubble Dome Diffuser Aeration Equipment", by
Daniel H. Houck and Arthur G. Boon, completed Sept. 15, 1980, in
fulfillment of a grant from the Association of Metropolitan
Sewerage Agencies and the British Water Research Centre under the
partial sponsorship of the U.S. Environmental Protection Agency.
While making an indepth review of the designs, operating
procedures, preformance and maintenance procedures of U.S. and
overseas activated sludge plants equipped with fine bubble
diffusers, the investigators surveted fouling problems and cleaning
methods. None of the plants which required periodic cleaning
employed in-place gas cleaning. Among the cleaning methods used for
ceramic diffusion elements were refiring, acid washing combined
with clean water-and steam-cleaning, ultrasonic cleaning, hand
brushing and others. The study provided detailed information and
observations .[.in.]. .Iadd.on .Iaddend.the costlines of and
limited economic justification for refiring. Nevertheless, it was
recommended on grounds of established effectiveness that refiring
and/or acid washing be used where possible. But the study also
uncovered evidence that acid washing did not adequately clean
ceramic diffusion elements foulded with scale, apparently calcium
carbonate, and that the diffusion elements should be refired for
proper cleaning.
Plainly the need for an in-place gas cleaning technique suitable
for tank-type plants with the multi-pore diffusion elements has
existed for more than forty years. However, the willingness of
plant designers, operators and government officials to accept or
even promote the above described disruptive, lengthy, troublesome
and expensive procedure shows that the solution to the problem is
not in fact evident. The present invention is aimed at fulfilling
this need.
SUMMARY OF THE INVENTION
In common with prior technology the invention includes passing a
treating gas through multi-pore diffusion elements submerged in
liquid media. Foulants in the media or treating gas have a tendency
to form organic and/or inorganic deposits within the elements or at
their surfaces, and particularly, adjacent the liquid media. As in
prior attempts at a satisfactory process, a cleaning gas is passed
through the elements, alone or in admixture with the treating gas.
The cleaning gas or mixture of cleaning gas and treating gas is one
which is aggressive towards the aforementioned deposits, thereby
tending to dissolve and/or dislodge them.
According to the invention, gas cleaning is conducted with
sufficient frequency, including continuously, to prevent fouling
from progressing beyond a predetermined extent. The extent of
fouling can, for example, be characterized in terms of an increased
level of dynamic wet pressure or of mean bubble release pressure of
the diffusion elements relative to a previous base conditions of
said elements. For example, cleaning gas may be applied with
sufficient frequency and in sufficient amount for restricting any
increase in the dynamic wet pressure level of the elements, above
their base conditions, to an amount which is equal or equivalent to
about 25 inches or less, more preferably about 15 inches or less
and still more preferably about 7 inches or less of water gauge at
2 SCFM per square foot of active gas discharge surface.
Alternatively, cleaning gas may be applied with sufficient
frequency and in sufficient amount for restricting any increase in
the mean bubble release pressure of the elements, above their base
condition, to about 25 inches or less, preferably about 15 inches
or less and still more preferably about .[.7 inches.]. .Iadd.7
inches .Iaddend.less of water gauge.
The cleaning gas is fed to the elements through a gas distribution
network having a submerged portion and which includes in said
submerged portion a plurality of flow-regulating means. The flow
regulating means are sized or adjusted to deliver cleaning gas
alone or in admixture with treating gas at a substantially similar
rate to each of a plurality of plenums, each of the plenums being a
connected directly or indirectly with one or more diffusion
elements whereby the one or more diffusion elements connected with
each plenum can be supplied with gas at a substantially similar
rate as compared to the diffusion elements connected to the other
plenums.
Treating gas, alone or in admixture with cleaning gas, is
discharged through the diffusion elements for an extended cycle of
operation which may constitute at least about 30, more preferably
at least about 90 and still more preferably at least about 365
total days of continuous or intermittent passage of treating gas
through the elements. During said cycle, fouling is restrained
(including retardation, prevention and/or removal of deposits) by
applying the cleaning gas with sufficient frequency and in
sufficient amounts to maintain the dynamic wet pressure and/or mean
bubble release pressure at or below the levels described above.
One of many kinds of liquid treatment apparatus useful for
practicing the invention includes a gas distribution network in a
tank. Such apparatus includes means for introducing into said
network a treating gas and, periodically, cleaning gas, alone or in
admixture with the treating gas. A plurality of flow regulating
means is distributed about in a submerged portion of the network
for receiving the aforementioned gases and for discharging them at
predetermined flow rates. Also included in the system is a
plurality of multi-pore area release diffusion elements which are
members each comprising a multiplicity of closely spaced fine pores
defining paths for discharge of said gases, and which exhibit an
increase in dynamic wet pressure, as compared to a base condition
of said pressure, through deposition of organic and/or inorganic
foulants. Each of the diffusion elements is connected to its own
individual flow regulating means through its own individual plenum
downstream of the flow regulating means.
Many possible variations of the invention which are also considered
to be inventions in their own right are disclosed in conjunction
with various and preferred embodiments discussed below and/or shown
in the accompanying drawings. On the other hand, the invention can
be embodied in an even wider variety of forms than can be
specifically discussed and illustrated herein. Thus the various and
preferred embodiments and examples set forth in the text which
follows and in the accompanying drawings are to be regarded as
illustrative and not limiting the respect to the scope of
invention.
Possible Theoretical Considerations
In order for a gas to flow through a gas discharge passage of a
diffusion element and bubble into a liquid medium, there must be a
relatively higher pressure in the gas at the influent end of the
passage as compared to the pressure in the liquid at the effluent
end of the passage. This difference in pressure may be referred to
as pressure loss.
A substantial portion of the pressure loss is attributable to the
force exerted on the gas by liquid surface tension at the location
where bubbles are formed, Frictional resistance to the flow of gas
in the passage also contributes, but to a lesser degree, to the
total pressure loss across the element.
The magnitude of the surface tension component of the pressure loss
varies inversely with the effective hydraulic radius of the passage
at the location where bubbles are formed. Thus, the surface tension
component of pressure loss tends to be larger for smaller passages
and vice versa.
The frictional resistance component of pressure loss varies
inversely with pore diameter. Thus this component tends to be
larger in smaller pores and vice versa.
Pressure loss through a passage is also affected by the rate of
flow of gas through the passage. Surface tension forces are not
greatly affected by flow rate at typical rates for multi-pore
diffusion elements, but the frictional resistance to flow is
directly related to the flow rate. Thus an increase or decrease in
flow rate through a passage respectively increases or decreases the
total pressure loss.
Each diffusion element, when new, for a given gas or gas mixture,
under given conditions of flow, temperature, gas viscosity,
barometric pressure and humidity, will have a characteristic
pressure loss, as well as a characteristic rate of flow at a given
pressure loss. The pressure/flow characteristics of diffusion
elements are often expressed in terms of dynamic wet pressure. The
pressure loss and dynamic wet pressure of an element represent
combined effects of different flows through many individual
passages throughout the element.
There are significant variations in pressure/flow characteristics
among diffusion elements. Individual pores in a given element
differ in their pressure/flow characteristics due to differences in
the shape, size and hydraulic radii of the passages or pores.
Considering the state of the art it is challenging to manufacture a
run of hundreds or thousands of diffusion elements in which most or
all of the elements exhibit substantially the same pressure/flow
characteristics. Moreover, as elements are used in liquid media
containing foulants, the foulants can clog the passages or pores in
their inlets, interior portions, outlets or any combination thereof
in such a manner as to reduce pore diameter and/or effective
hydraulic radius, with a consequent effect on the pressure/flow
relationships of the element. Thus, all other factors remaining
equal or equivalents, fouling tends to reduce the rate of flow at a
given pressure or increase the amount of pressure required to
maintain a given flow rate.
Without intending to be bound by any theory, the applicants offer
the following theoretical explanation which may be indicative of
the operation of the invention and the nature of certain advantages
which may accrue from its use. When an element is new, it is
believed that the flow of gases through the element is
preferentially directed through those pores having the lowest
combined frictional and surface tension resistance. It appears that
other pores with a higher combined frictional and surface tension
resistance would remain less active or perhaps inactive, at least
temporarily. According to this theory, as the active or most active
pores begin to clog through deposits of foulants, flow is reduced.
If the system operating pressure is increased in order to maintain
flow, progressively more and more of the pores which were
originally active or most active continue to clog, and some of the
less active pores characterized by higher pressure loss are now
able to transmit gas due to the increased pressure. It is
visualized that the aforementioned portion of the less active pores
will themselves become clogged eventually. If the system pressure
again increases, additional less active pores, characterized by an
even higher pressure loss, will then become active. It is
visualized that progressive clogging and the increasing of pressure
to maintain flow an proceed to such an extent that most of the
available pores in the diffusion element have been clogged. If in
place gas cleaning is performed in a conventional manner at this
point in the history of the element, it is theorized that because
of the aggravated clogging of the element, the cleaning gas will
pass through only a relatively few pores, such as for example,
those small pores which were among the last to become active and
perhaps some larger pores which were not fully obstructed when
cleaning was commenced.
According to this theory, as the cleaning gas passes through the
few pores referred to above, and the deposits on and within them
are reduced, there is a resultant rapid increase in flow through
these passages or pores. Such increase tends to reduce the gas
pressure available at the influent surface of the element to drive
cleaning gas through other clogged pores or passages which, as a
result of clogging, are characterized by a higher resistance to
flow than the few passages which have been cleaned, The available
pressure may now be so low that it is unable to overcome the
effects of frictional resistance and surface tension in many or
most of the clogged passages. Unfortunately, if the theory is
correct, those passages or pores on which the cleaning will have
limited or no beneficial effect are some of those which were the
first to clog and which would have had the potential .[.or.].
.Iadd.for .Iaddend.providing the maximum flow at a given system
operating pressure and therefore would have provided the greatest
potential for saving power through cleaning.
The foregoing theory, if correct, may explain why diffusion
elements were frequently not restored to their original levels of
pressure loss by in place gas cleaning. Possibly, such inability
may also have resulted from the use of inadequate quantities of
cleaning gas. Such failure may in some cases have occurred because
there was no provision for individual flow regulating means for
each diffusion element or group .[.or.]. .Iadd.of
.Iaddend.diffusion elements. Such lack may have caused the flow of
cleaning gas to seek out and pass through those diffusion elements
which were among the last to become active in preference to those
which has clogged earlier, so that application of the cleaning gas
was ineffective in restoring the system to its original condition
or flow capabilities. The invention provides the opportunity of
overcoming the above mentioned difficulties by applying the
cleaning gas early and with frequency in the clogging history of
the elements and/or with individual flow regulating means for the
elements.
The adverse effects of delayed frequency of cleaning may be reduced
and the efficiency of cleaning according to the invention may be
enhanced by a number of techniques and facilities, including but
not limited to: division of the diffusion elements in a diffusion
system into groups, which groups may be cleaned separately and
independently from other groups, providing means for operating the
diffusion elements in one of the aforementioned groups, during
cleaning, at flow rates and/or pressure differentials higher than
flow rates and/or pressure differential for the groups in the
remainder of the system; provision of flow control means for
diffusion elements that will apply relatively higher plenum
pressure to elements operating at lower air flow rates and vice
versa; temporarily lowering the surface tension at the interfaces
of the liquid medium and diffusion elements while the latter are
being cleaned; initiating gas cleaning .[.with.]. .Iadd.while
.Iaddend.the diffusion elements are operating at relatively low
mean dynamic wet pressure and/or mean bubble release pressure;
initiating cleaning prior to the onslaught of load fluctuations
creating peak demand for treating gas, such as for example peak
seasonal demand conditions of activated sludge plants; and
providing means for manipulating liquid levels in the tanks in the
system.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a fragmentary view of a sewage aeration system including
a sewage aeration tank, an air supply main, means for introducing a
mixture of aeration gas and cleaning gas into said air supply main,
a downcomer pipe, distribution pipes, header pipes and
diffusers.
FIG. 2 is a perspective view of a section of header pipe and
diffusers of FIG. 1.
FIG. 3 is a vertical transverse cross section of the header pipe
and one of the diffusers of FIG. 2 taken on section line 3--3 of
FIG. 2.
FIG. 4 is a longitudinal cross section of the diffuser and pipe of
FIG. 3, the component parts of the diffuser being exploded for
clarity.
FIG. 5 is an enlarged portion of FIG. 4 showing portions of the
wall of the header pipe and the lower wall of the plenum, along
with the details of the air flow regulator member which is in
communication and connected with the air outlets and inlet openings
in said pipe and lower wall. This figure also shows an optional
lower valve member on the air flow regulator member.
FIGS. 5A-D show the same portions of the header pipe and plenum
walls as FIG. 5 with alternate forms of air flow regulator members
which may be substituted for those shown in FIGS. 4 and 5.
FIG. 6 is a plan view of the plenum of FIG. 4.
FIG. 7 is an enlarged portion of FIG. 3 showing the peripheral edge
of the diffusion element in transverse cross section, along with
portions of the plenum, retaining means and sealing means.
FIGS. 8 to 14 show the same portion of the apparatus as FIG. 7, but
with varying modification to the diffusion element retaining means
and sealing means.
FIG. 15 is a vertical transverse cross section of the header pipe
and one of the diffusers of FIG. 2 wherein the plenum side walls
are affixed directly to the pipe wall, whereby the upper surface of
the header pipe serves as the bottom wall of the plenum.
FIGS. 16 and 17 are plan and elevation views of a header pipe and
diffuser wherein the diffuser has vertical side walls.
FIG. 18 is a vertical transverse cross section of header pipe and
diffuser of FIG. 16 taken at section 18-18 of FIG. 16 showing a
structure wherein the upper surface of the header pipe serves as
the bottom wall of the plenum.
FIG. 19 is a sectional view, partly schematic, showing a portion of
a gas distribution network, flow regulating means, a diffusion
element and its holder, and means for determining pressure and flow
data useful in the practice of the invention.
FIG. 20 is a diagrammatic illustration, partly in section,
including a gas diffusion element, an apparatus for determining the
bubble release pressure of the element and a graphical
representation of the bubble release pressure and corresponding
flow characteristics of the element.
FIG. 20A is an enlarged portion of the probe of FIG. 20.
FIG. 20B is an enlarged and foreshortened portion of the element
and bubble release pressure curve of FIG. 20.
FIGS. 21 through 29 are fragmentary, diagrammatic, transverse
sectional views disclosing diffusion elements in accordance with
the present invention and illustrative methods for manufacturing
same.
FIG. 28A is plan view from the top, of the diffusion element of
FIG. 28.
FIG. 30 is a transverse cross section of a diffusion element in
accordance with FIG. 27 and an associated bubble release pressure
plot exemplary of said element.
FIG. 31 is a transverse cross section of a diffusion element in
accordance with FIG. 28 and an associated bubble release pressure
ploy exemplary of said element.
FIGS. 32A and 32B are pressure versus flow diagrams illustrating
the benefits of a preferred embodiment of the invention in which a
plurality of diffusion elements each has its own individual flow
regulating means.
FIG. 33 is a partly schematic diagram of the presently preferred
embodiment of a tank-type sewage aeration system including means
for supplying and mixing aeration gas and cleaning gas and for
discharging same through area-release multi-pore diffusion
elements.
FIG. 34 is a schematic diagram of testing apparatus for producing
accelerated fouling of, and for cleaning, multi-pore diffusion
elements.
FIG. 35 is a graph of the results of illustrative examples set
forth below.
FIG. 36 is an enlargement of portions of certain of the curves
illustrated in FIG. 35.
VARIOUS AND PREFERRED EMBODIMENTS
Although the invention will most commonly be used in aeration
systems for the biological treatment of wastewater, it is useful in
the treatment of aqueous or non-aqueous liquids with or without
biological and non-biological foulants. See the definition of
foulants below.
Any suitable cleaning gas which is aggressive towards the foulants
may be used as cleaning gas for purposes of the present invention.
See the definition of cleaning gas flow.
According to a particularly preferred embodiment of the invention,
the treating gas is an oxygen-containing gas, especially air, the
cleaning gas is hydrogen chloride gas (HCl), the liquid medium is
wastewater containing domestic sewage, and the treatment facility
is a tank-type activated sludge plant.
In typical sewage treatment plant operation, unrestrained
deposition of foulants will normally cause a substantially increase
in the dynamic wet pressure of the diffusion elements, or a
substantial increase in the mean bubble release pressure of the
elements, measured at the influent and/or effluent surfaces(s) of
the elements, or a substantial increase in both of said pressures.
For example, substantial deposits of foulants concentrated at the
gas effluent surfaces of the diffusion elements may result in
appreciable increases of both the dynamic wet pressure of the
elements and the mean bubble release pressure measured at the
effluent surfaces, while resulting in no change in bubble release
pressure at the influent surfaces. Alteratively, minor deposits of
foulants concentrated at the gas influent surfaces of the diffusion
elements can result in appreciable .[.increase.]. .Iadd.increases
.Iaddend.in mean bubble release pressure at these influent
surfaces, no change in bubble release pressure at the element
effluent surfaces, and an increase in dynamic wet pressure across
the elements which may be within the limits of experimental error
of the dynamic wet pressure measuring technique and may therefore
not be measurable in any practical sense. But major deposits of
foulants concentrated at the influent surfaces can result in
appreciable measurable increases in dynamic wet pressure, and in
bubble release pressure at the influent surfaces, even if there
were no measureable increase in bubble release pressure at the
effluent surfaces.
According to the invention, cleaning is conducted in such a manner
as to restrain formation of foulant deposits in the diffusion
elements. Included in restraining are operations which prevent or
retard the formation of such deposits or which remove at least a
portion of accumulated deposits from time to time, whereby the
extent of fouling of the diffusion elements is controlled. Thus,
for example, cleaning gas may be applied with sufficient frequency
to prevent any appreciable amount of deposits from forming, in
which case it could be possible that no increase in either the
dynamic wet pressure or the mean bubble release pressure of the
elements would be observed. Another example of restraining would
include treatment with cleaning gas with a frequency which was not
effective to completely prevent the formation of appreciable
deposits of foulants in the diffusion elements, but which was
sufficient to discourage the growth of organic or other foulants
and thereby maintain the dynamic wet pressure and/or mean bubble
release pressure of the elements within one or more of the ranges
set forth above over an extended cycles of operation. Also, at
different times and under different conditions a given plant may be
operated in any of the modes described above, i.e. the prevention,
retardation or removal modes.
Whether the process is operated in the prevention, retardation or
removal mode, the cleaning gas may be applied continuously or
intermittently, including application at sporadic or periodic time
intervals. For example, it is contemplated that cleaning gas may be
applied substantially continuously for an extended cycle of
operation, following which the application of cleaning gas may be
either suspended for a time or may be intermittent, for example
when the concentration of foulants in the liquid medium or treating
gas is reduced for some reason, or when conditions in the process
become less hospitable to the formation of foulant deposits.
Alternatively, where the normal plant procedure is to conduct
cleaning intermittently during one or more extended cycles of
operation, there may be continuous cleaning from time to time, for
example when seasonal or other factors cause the concentration of
foulants in the liquid medium or treating gas to increase to an
unusually high level. This is one example of situations in which it
could prove advantageous to feed cleaning gas continuously before
any increase in dynamic wet pressure and/or mean bubble release
pressure is apparent. Also, continuous application of cleaning gas
may for example be employed when the system is being used in the
practice of recarbonation. Hydrogen chloride is the preferred
cleaning gas for continuous cleaning.
It is preferred however to apply the cleaning gas intermittently
and to initiate the application of cleaning gas at or before the
time when .[.foulding.]. .Iadd.fouling .Iaddend.has progressed to a
predetermined extent. The extent of fouling used as a basis to
commence cleaning can, for example, .[.to.]. .Iadd.be
.Iaddend.characterized in terms of an increased level of dynamic
wet pressure or of mean bubble release pressure of the diffusion
elements relative to a previous base condition of the elements.
This does not however imply that the application of cleaning gas
must await the advent of sufficient fouling to create a measureable
increase in the dynamic wet pressure and/or mean bubble release
pressure of the diffusion elements. In fact, it is contemplated
that the cleaning gas could be applied intermittently but
sufficiently frequently so that there would be no increase or only
a very small increase of the dynamic wet pressure and/or mean
bubble release pressure over the base condition of either of said
pressures. Also, in many plants where cleaning gas is applied
intermittently but quite frequently, the available pressure
measuring equipment may not be sufficiently precise to measure the
very small increases in pressure attributable to deposition of
foulants between applications of cleaning gas.
Perhaps the most typical mode of operation for most sewage
treatment plants will be to conduct the process so that some
appreciable amount of clogging of the diffusion elements does occur
between applications of cleaning gas. For example, clogging could
be permitted to progress to the point where there was a measurable
increase in the dynamic wet pressure and/or mean bubble release
pressure of the elements. For instance, the increase in dynamic wet
pressure level above base condition could be at least about 0.2, at
least about 0.5 or at least about 0.7 inches of water gauge at 2
SCFM per square foot of active gas discharge surface of the
element. The increase in mean bubble release pressure above base
condition could be at least about 0.2, at least about 0.5 or at
least about 0.7 inches of water gauge.
When operating in the intermittent mode, gas cleaning may be
initiated at or before the time when the dynamic wet pressure level
of the elements has increased above their base condition by an
amount which is equal or equivalent to about 25 inches or less,
more preferably about 15 inches or less and still more preferably
about 7 inches or less, of water gauge at 2 SCFM per square foot of
active gas discharge surface. Alternatively cleaning may be
initiated when the mean bubble release pressure of the elements has
increased relative to the base condition by about 25 inches or
less, preferably about 15 inches or less and still more preferably
about 7 inches or less, of water gauge.
Cleaning is conducted, i.e. the cleaning gas is applied in one or
more periods of application, with a sufficient amount of cleaning
gas to effect a substantial extent of cleaning which can for
example be characterized in terms of a certain minimum reduction of
any increase in dynamic wet pressure or of any increase in mean
bubble release pressure which occurred as a result of fouling
between a previous base condition and the commencement of cleaning.
For example, cleaning may be conducted until the reduction in the
dynamic wet pressure, if any, corresponds to at least about 0.3,
more preferably at least about 0.5 and still more preferably at
least about 0.8 of any increase in dynamic wet pressure.
Alternatively, cleaning may be conducted until the reduction in the
mean bubble release pressure, if any, corresponds to a least about
0.5, more preferably at least about 0.8 and still more preferably
at least about 0.9 of any increase in bubble release pressure.
It is also preferred that cleaning be conducted with sufficient
frequency, employing a sufficient amount of cleaning gas, so that
the diffusion elements can remain in contact with the liquid medium
for extended cycles of operation with treating gas without removing
diffusion elements from contact with liquid medium and/or without
application of cleaning techniques other than gas cleaning to the
diffusion elements. An object of the invention is to continue such
contact and/or non-use of such other cleaning techniques,
especially those involving removal of the diffusion elements from
their holders, for extended cycles of operation of at least about
two, three, five years, or more, including the entire design life
of the element. With this objective in mind, it is considered best
to apply cleaning gas continuously or intermittently to restrict
any increase in the dynamic wet pressure or the mean bubble release
pressure of the elements to zero to about 5 inches of water gauge
over their base condition.
It should be understood that it is permissible to conduct the
process intermittently or continuously with or without actually
measuring dynamic wet pressure or bubble release pressure. For
example, the flow of cleaning gas to the diffusion elements may be
initiated, maintained, controlled or terminated in response to any
variable or condition which is sufficiently related to or
representative of the rate or extent of fouling to be effective in
maintaining the dynamic wet pressure or mean bubble release
pressure at or below the levels indicated above. For example,
through operating experience with a given plant, liquid medium and
cleaning gas, it will usually be possible to determine the maximum
number of days which the plant may be operated with treating gas
and liquid medium before the increase in dynamic wet pressure
and/or mean bubble release pressure of the elements will exceed the
above indicated levels. Through experience it should also be
possible to determine the time interval during which cleaning gas
should be applied at a given flow rate in order to adequately
restrain foulant deposition. With such information in hand, one may
initiate cleaning periodically on the basis of time elapsed since
the last cleaning and during each such cleaning apply cleaning gas
for that period of time which prior experience has shown to be
adequate.
Preferably however the flow of cleaning gas is initiated,
maintained, controlled or terminated in response to a system
condition which is more directly indicative of the dynamic wet
pressure or mean bubble release pressure of the diffusion elements.
To illustrate, system back pressure can in certain cases be
sufficiently representative of the average dynamic wet pressure
and/or bubble release pressure of the diffusion elements to serve
as a basis for conducting intermittent or continuous gas
cleaning.
Increases and decreases in the aforementioned pressures may be
detected by measurement of changes in the pressure in the conduits
of the distribution network between the compressors (including
blowers) and the flow regulating means through which the diffusion
elements are supplied. Altenatively, increases and decreases in
said pressures may be detected on the basis of variations in the
flow of gases through the diffusion elements, all other conditions
being equal or at least equivalent. Increases and decreases in said
pressures may also be detected on the basis of the amount of
additional power consumed in maintaining equivalent flow as the
fouling of the elements progresses.
The cleaning gas is applied simultaneously to diffusion elements
arranged in groups ranging in number from about 10, more or less,
to hundreds or thousands of such elements, and it should be
understood that the foregoing limits of increase in dynamic wet
pressure or mean bubble release pressure will not necessarily be
applicable to all of the elements in such groups. Put differently,
cleaning may be commenced when something less than all of the
elements in a given group have reached the predetermined extent of
fouling at which cleaning is to be commenced. Nor is there any
intention of excluding the possibility that a minor portion of the
elements may exceed the limits indicated above. Thus, the process
may be conducted on the basis of the dynamic wet pressures or mean
bubble release pressures of typical elements in such group or
groups or on the basis of the estimated average condition of all
the elements in the group or groups. Moreover, it is not essential
that all of the elements in a given group or groups receive the
same amount of cleaning. Indeed, it is apparent that if the group
or groups under treatment contain elements with varying degrees of
fouling, there may be varying degrees of cleaning experienced by
the individual elements, and that not all of them will necessarily
be cleaned to the same extent, as indicated by varying reductions
in dynamic wet pressure or mean bubble release pressure from one
element to another.
According to a particularly preferred embodiment of the invention,
at least a portion of any reduction in dynamic wet pressure which
may occur during cleaning is postponed, with the objective of
increasing insofar as possible the number of pores in the diffusion
elements through which cleaning gas is caused to pass. Assume that
a fouled diffusion element is cleaned, and that during cleaning no
other steps are taken to maintain or alter dynamic wet pressure.
Assuming further that the type of foulant is one which tends to
manifest a decrease in dynamic wet pressure as cleaning proceeds.
As substantial numbers of clogged pores are restored to an active
condition, it is believed that they will transmit gas much more
readily and reduce the gas pressure available at the element
influent surface to force the cleaning gas through other clogged
pores, it being theorized therefore that the last mentioned pores
may never be cleaned, and that cleaning will thus be only partially
effective. To avoid this difficulty, the present invention is
preferably practiced in conjunction with postponement (including
retardation) of at least a portion of any dynamic wet pressure
reduction which may result from cleaning.
This aspect of the invention is useful when cleaning is commenced
at a dynamic wet pressure increase or mean bubble release pressure
increase, above base condition, of about 25 or less inches of water
gauge, and is particularly beneficial when practiced in conjunction
with commencing cleaning at about 15 inches or less, and even more
preferably at about 7 inches or less, of water gauge over base
condition. Such a method of operation holds promise of considerably
lengthening the useful lives of diffusion elements.
Such steps of postponement of dynamic wet pressure reduction may
for example include doing any one or more of the following in any
sequence for at least a sufficient portion of a cleaning cycle for
obtaining appreciably better cleaning of the diffusion elements:
increasing the dynamic wet pressure across the elements for a
portion of the cycle; maintaining the dynamic wet pressure across
the elements constant for a portion of the cycle; and/or, for a
portion of the cycle, slowing the rate of decrease of dynamic wet
pressure across the elements, e.g. to a rate slower than that rate
of decrease which will result merely from cleaning (assuming all
other conditions remain the same or equivalent).
Since dynamic wet pressure is in effect the difference between the
gas pressure at the influent surface of a diffusion element and the
hydrostatic head in the liquid medium at the effluent surface of
the element, postponement of the dynamic wet pressure reduction
attributable to gas cleaning can be practiced by controlling either
said gas pressure, or said hydrostatic head, or both.
For example, during cleaning one may apply enhanced pressure
differential across the diffusion elements. Such will result if the
total gas pressure applied to the gas influent surfaces of the
elements is maintained for at least a substantial portion of the
cleaning cycle at a pressure in excess of that which would have
been applied if the only change in the apparatus and operating
conditions had been the removal of foulants by cleaning gas.
Whether a total pressure level representing an enhanced pressure
.[.defferential.]. .Iadd.differential .Iaddend.is first established
prior to, at or after the commencement of flow of cleaning gas, the
enhancement level is usually about 0.5 or more, preferably about 1
or more and most preferably about 2 or more inches of water
gauge.
The cleaning gas may be fed in any gas mixture in which the total
pressure of all gases applied meets a criterion for enhancement set
forth above, irrespective of the extent to which the individual
gases contribute to the total gas pressure. As cleaning gas
gradually removes foulant deposits from the elements, flow to the
individual elements will generally increase and the dynamic wet
pressure will generally decrease, all other independent variables
remaining the same. Manipulation of some of the variables however
can result in control of the dynamic wet pressure to either hold it
constant, or cause it to increase or cause it to decrease at a
slower rate than would otherwise have occured. This postponement of
the reduction of dynamic wet pressure, including reduction in its
rate of decline, can have a favorable effect in cleaning, since it
makes the cleaning gas available to more passages or for a longer
period of time or both. This postponement or delay may be obtained
by increasing the pressure in the plenums which deliver gas to the
diffusion elements, and/or by reducing the hydrostatic head.
Any suitable technique for increasing plenum pressure may be used
to postpone dynamic wet pressure reduction. Suitable examples
include increasing compressor output and/or adjusting valves in the
system to provide a higher flow of air to the section being
cleaned, relative to the remainder of those portions of the system
having a common air supply.
Any suitable technique for reducing hydrostatic head may be used to
postpone dynamic wet pressure reduction. For example, one may
conduct gas cleaning while the hydrostatic head is appreciably
below its pre-cleaning operating head. Operating at diminished
hydrostatic head includes reducing the submergence of the diffusion
elements during at least a portion of the time during which
cleaning is being conducted. For example, the level of liquid
medium in the treatment tank may be lowered or, if the diffusion
elements are mounted in the tank in arrays on lifting means for
lifting them from the liquid medium, at least a portion of the
diffusion elements may be raised to a higher submerged elevation in
the medium using the lifting means.
One may also postpone dynamic wet pressure reduction during
cleaning by combined control and adjustment of the gas pressure
applied to the element influent surfaces and the hydrostatic head.
For example, during periods of rising hydrostatic head due to
increased plant load, pressure enhancement may be applied in
sufficient amount to postponement dynamic wet pressure
reduction.
Another technique that has been found to produce benefits similar
to those which result from postponement of dynamic wet pressure
reduction is the application of surface active agent(s) in either
liquid or gaseous form during the cleaning period to the interface
between the diffusion elements and the liquid medium. Gas flow to
the units being cleaned can thus be increased through reduction of
the effect of surface tension, whereby more of the elements may be
caused to transmit cleaning gas for a longer period of exposure.
.[.HCL.]. HCl appears to produce such a benefit.
It is preferred though by no means essential that at least about
.Badd.4%, more preferably at least about 60% and most preferably at
least about 80% of the cleaning gas be discharged from the
diffusion elements while sufficient enhanced pressure is being
supplied, and/or while sufficient amounts of surface active
agent(s) are being maintained in contact with the diffusion
elements/liquid medium interface, for promoting cleaning.
Any of the foregoing techniques which result in postponement of
dynamic wet pressure reduction or comparable effects can be applied
to the gas distribution network or to any selected portion thereof,
including individual tanks in multi-tank plants and individual
groups of diffusion elements constituting only part of the
diffusion elements in a given tank.
A number of kinds of pressure conditions have been discussed herein
as bases for conducting or measuring progress in any portion of the
process of the present invention, including for example dynamic wet
pressure, mean bubble release pressure, base conditions of either
of the foregoing, and system back pressure. It will of course be
understood that where it is necessary to make comparisons of a
number of different observations of a given type of pressure value,
such observations should be made with the diffusion elements
submerged at the same level of submergence in the same or
equivalent liquid medium while discharging the same or equivalent
gas or, if there are significant differences in the submergence,
liquid and/or gas, appropriate adjustments should be made in the
data to compensate for these differenes. Moreover, dynamic wet
pressure and system back pressure values are sometimes expressed in
terms of numerical pressure values referenced to a given reference
rate, e.g. 2 SCFM per square foot of active gas discharge area as
designed, manufactured or installed. When interpreting observations
or data relative to dynamic wet pressure or system back pressure
variables, certain additional adjustments in data may be
required.
When necessary, the need for such adjustments may arise in part
from the fact that not all plants operate at a gas flow of 2 SCFM
per square foot, and that even those plants designed to operate at
2 SCFM will operate at various rates under different conditions.
Thus, for example, in any given plant, in order to compare observed
conditions of system back pressure and dynamic wet pressure,
including increases in dynamic wet pressure above the base
condition, it may be necessary to adjust the observed dynamic wet
pressures by means of calculations familiar to persons skilled in
the art, based on the flow rate through the elements, the density
and viscosity of the gases, the temperature, the humidity and the
barometric pressure. In particular there will be a need to convert
said observed conditions of dynamic wet pressure to a basis
comparable with the 2 SCFM per square foot rate employed in
establishing the dynamic wet pressure ranges.
On the other hand, where the invention is being practiced in a
plant having reasonably accurate flow measuring equipment, it will
sometimes be possible and convenient to minimize the computations
involved by recording the total flow of gas from the compressors,
viscosity of the gases, the temperature, the humidity, the
barometric pressure, and other operating conditions, at a time
corresponding to a base condition of dynamic wet pressure. Then
from time to time in the future, as plant operating conditions and
flow rates fluctuate, trial checks can be conducted to determine
whether cleaning should be commenced. These .[.trail.]. .Iadd.trial
.Iaddend.checks will include temporarily returning the plant to the
flow rate noted at the base condition and then recording the other
data mentioned in the preceding sentence, as required for
calculations to adjust the observed pressures to an equivalent
basis with the base condition. Similar techniques can be applied to
the determination of system back pressures.
Flowmeters are commerically available which are capable of
measuring flow with the requisite accuracy, and many are available
with conversion tables for converting the registered flow back to
standard cubic feet per minute at whatever conditions of
temperature, pressure and humidity have been adopted as standard
for the plant in question. Also, it is apparent that a general or
special purpose computer may be provided and programmed to make the
necessary conversions of data, and, if desired, actuate process
control devices.
While a flow rate of 2 SCFM per square foot is a convenient
reference rate for dynamic wet pressures and .[.systemback.].
.Iadd.system back .Iaddend.pressures and is fairly typical of flows
through diffusion elements in many commercial plant, one may adopt
one or more different reference flow rates as a basis for
controlling and conducting the present invention in a given plant.
For example the plant and diffusion elements may have been designed
for a different flow rate than 2 SCFM per square foot, or may have
been operated successfully over an extended period, e.g. ninety
(90) days, at a daily average rate of flow differing substantially
from 2 SCFM per square foot. It may be desirable to use an increase
in dynamic wet pressure at one of these flow rates for initiating
or otherwise controlling cleaning. For example, in the latter
instance the plant could be operated in such a manner that cleaning
was initiated before the increase in dynamic wet pressure as
compared to the base condition, exceeded 25 inches of water gauge,
the base operating condition and the 25 inches of water gauge both
being referenced to a flow rate equal to the daily average of the
flow rate through the plant for the last 90 days immediately prior
to the commencement of cleaning. Changes in reference flow rate may
be made for the system back pressure values as well.
No fixed rule can be stated concerning the quantity of cleaning gas
which must be applied relative to the quantity of foulant deposits.
The various cleaning gases differ in efficacy, and the deposits
differ from one another in their susceptibility to cleaning gases
in general and in their susceptibility to particular cleaning
gases. However with the aid of the present disclosure persons
skilled in the art should be able to determine sufficient amounts
of cleaning gases to clean deposits of the various kinds of
foulants disclosed herein. In general the amount employed should be
sufficient to reduce any dynamic wet pressure increase and/or any
mean bubble release pressure increase of the elements in the manner
indicated above.
The rate of application of cleaning gas, and the concentration of
cleaning gas in admixture with other gases may also be varied
considerably; we have observed that at lower rates or
concentrations cleaning gas must be applied over a longer time
interval, while higher rates and concentrations are able to effect
cleaning in a shorter time interval. It is however preferred to
apply the cleaning gas at a sufficient rate or concentration for
effecting the indicated extent of cleaning within a period of about
eight (8) hours or less.
It has been found that the concentration of cleaning gas in a
mixture of cleaning gas with treatment gas may be expressed in mole
fraction of cleaning gas in the mixture and/or by the equilibrium
concentration, defined hereinafter, which results upon saturating a
liquid sample with the medium. This is not however intended to
suggest that the liquid medium in which the diffusion elements are
operated must become saturated with the mixture during cleaning.
The concentration to be used can be selected on the basis of
various factors, including the solubility of the gas in the liquid
medium, the specific aggressiveness of the liquid solution of
cleaning gas to the type of foulant deposit present and, in
electrolytes, the degrees of ionization of the resultant solutions.
In the case of cleaning gases that form acidic solutions in
water.Iadd., .Iaddend.the solubility constant and degree of
ionization are particularly significant. In that instance pH, as
well as gas phase mole fraction and equilibrium value, may be used
as means of measurement and definition.
Appropriate limits of the above may be determined experimentally.
Such tests employing mixtures of HCl and air at approximately 100%
humidity and atmospheric pressure have for example shown that mole
fraction of at least about 7.5.times.10.sup.-5, preferably at least
about 1.3.times.10.sup.-3, and more preferably at least about
6.6.times.10.sup.-3 mole, per mole of total gas mixture, are
adequate. These correspond to equilibrium concentrations of 0.167,
0.24 and 0.28 by weight of the total gas mixture, and approximate
pH values of less than 0.7, 0.5 and 0.4, all at standard barometric
pressure and temperature. However, the use of any acid-reacting
gases at pH equilibrium concentrations of about 3 or less, about 2
or less and about 1 or less is contemplated. In practicing the
invention in a sewage treatment tank employing microorganisms
aerobically and/or anaerobically to metabolize pollutants in
wastewater, the concentration and dosage of cleaning gas should
however be an amount which is insufficient to substantially impair
overall metabolic activity of the micro-organisms in the tank as a
whole.
Another gas, as defined herein, which may or may not be applied to
the diffusion elements in admixture with the cleaning gas, is water
vapor, including either water vapor which has or has not been
intentionally added to the system. For example water vapor may
enter the system and become mixed with the cleaning gas because the
water vapor is a normal or usual component of certain kinds of
treating gas (e.g. the humidity in air when the latter is used as
treating gas). The cleaning gas and water vapor may be brought into
admixture prior, during, to or subsequent to the introduction of
the cleaning gas into the above mentioned network. For example, the
cleaning gas may be dissolved in water, followed by passage of the
treating gas through the water to pick up cleaning gas and water
vapors and then by introduction of the resultant mixture into the
network. On the other hand, in commercial tank type aeration
plants, the network often contains substantial quantities of
condensed water vapor which entered the system as a component of
aeration air; thus the cleaning gas and water vapor may become
mixed as a result of contact and admixture of water vapor held in
the network with cleaning gas, or with a mixture of cleaning gas
and treating gas that has been formed prior to contacting the
condensed water. Moreover, when cleaning gas is supplied to a
network containing substantial quantities of condensed water, peak
cleaning effectiveness may not necessarily be attained until all or
a substantial quantity of the condensed water has been purged from
the system or the condensed water has absorbed a substantial
quantity of, or become substantially saturated with, cleaning gas.
If foulant deposits form at a location in the diffusion element
which is not readily supplied with water by the liquid medium or
treating gas, it can be beneficial to supply water vapor in
admixture with the cleaning gas for forming .[.agressive.].
.Iadd.aggressive .Iaddend.aqueous solutions that assist in
cleaning.
One may employ various means for feeding treating gas and for
continuously or periodically feeding aggressive mixtures of
treating gas and cleaning gas. The treating gas may for example be
fed with the usual compressor or blower and overall system pressure
or flow control means familiar to those skilled in the art. The
cleaning gas may be fed from a storage tank containing a
substantial supply of said gas under high pressure via a
conventional flow controller and measuring means. By a suitable
connection with the means for feeding treating gas into the means
which convey the treating gas into the liquid medium one may form
the desired aggressive mixtures. Provision may be made for
automatic control of the blending of the treating gas and cleaning
gas and of the commencement of the feeding of the aggressive
mixtures. According to a preferred embodiment, said distribution
network also includes measuring means which are preferably, but not
necessarily, located in a submerged portionof said tank, for
measuring temperature, pressure and flow of gas through said
network or through representative diffusion elements with
sufficient precision for maintaining the dynamic wet pressure
across the diffusion elements in a range not to exceed about 25
inches, more preferably about 15 inches or less, and still more
preferably about 7 inches or less of water gauge above said base
condition.
The gas distribution network may be constructed of any suitable
material, including for instance, metallic, resin-lined metallic,
and rigid resin pipe, including reinforced or unreinforced
thermoplastic and thermoset resin pipe. It is desireable to
transmit the cleaning gas to the diffusion elements through a
portion of the above mentioned network which is formed of synthetic
resinous material. Other portions of the network may be formed of
other materials, including for example metallic conduits and
fittings. According to a particularly preferred embodiment of the
invention the cleaning gas is first brought into admixture with the
treating gas at a submerged location in the network. This
facilitates the use of metallic conduits in the non-submerged
portions of the network, including for example those conduits, such
as downcomer pipes, which convey the treating gas from a position
above the surface of the liquid medium down into the liquid medium.
Preferably, that portion of the gas distribution network which is
exposed to the aggressive mixtures is composed of conduit having
internal surfaces of acid resistant synthetic polymeric material.
If one chooses a synthetic resinous pipe having a load bearing wall
of polymeric material, which is preferred, it should have tensile
strength of about 2000 to about 60,000 psi, a flexural modulus of
about 4.times.10.sup.4 to about 4.times.10.sup.6 psi and a pipe
stiffness of about 10 to about 1000 psi, by ASTM D-2412. Preferably
the conduit walls are formed of such synthetic polymeric materials
as rigid polyvinyl chloride (PVC), acrylonitrilebutadiene-styrene
(ABS) or other suitable resinous materials. These same materials
may also be and preferably are embodied in the construction of the
flow regulating means and diffusion element holders, although it
should be understood that elastomeric materials resistant to the
cleaning gases may be employed in certain of the flow regulating
means and in the sealing means. Whatever materials are used should
be chosen with due regard to resistance to corrosion, weather,
collapse and impact. Suitable provision (not shown) should be made
for expansion and contraction where necessary.
The flow regulator means may be at least in part integral or
non-integral with the holders for the diffusion elements. Mounting
of the flow regulators within or without the holders is acceptable,
but the most convenient arrangement is within the holders and
therefore such arrangement is preferred. The flow regulators
employed in accordance with the invention may be of any desired
type, such as passive and active flow regulator means, including
those with varying pressure response characteristics. For instance,
one may employ flow regulator means which respond exponentially to
changes in pressure, such as for instance fixed orifices, or those
which respond in a more linear fashion, such as for instance
passages with large ratios of length to cross sectional area.
Passages which change their cross-section in response to pressure
changes are also a contemplated, including those which can perform
a valving function and those which are capable only of
uni-directional flow.
The diffusion elements may be supported by suitable holders, each
of which at least partly encloses a plenum (to be discussed below)
and includes a supporting surface against which a peripheral
surface portion of a diffusion element may be supportively engaged
with the aid of restraining means and/or of sealing means (also to
be discussed below). Among the known and acceptable types of
holders are those which secure the element to the holder by bolt
holes through the element, engaging threads in the holders, and
those which secure the elements about their peripheries. The latter
holders are preferred, and a variety of preferred embodiments of
such holders and of the sealing means for sealing the elements to
the holders are disclosed below.
Although the plenum may be of any suitable material, it also is
preferably of synthetic polymeric material, which may be reinforced
and preferably has the physical properties described above in
connection with the preferred pipe. The holders may be fashioned by
any appropriate forming process, such as for instance, injection
molding, lay up and spray up techniques.
The plenums through which the respective flow regulating means
discharge gas to the gas influent surfaces of the diffusion
elements are gas chambers defined by wall means which provide the
gases with ready access, and an opportunity for relatively uniform
distribution, to said influent surfaces. The plenums will normally
but not necessarily be within the holders. Usually one or more
walls of each plenum will be defined by the influent surface of the
diffusion element itself and the other walls of the plenum will be
defined by internal surfaces of the holder. In certain cases the
majority of the wall areas in the plenums may be defined by the
influent surfaces of the diffusion elements, such as where the
elements are in the form of elongated tubes of relatively small
diameter compared to their length.
As suggested above, the holders as well as their respective
retaining means can take a wide variety of forms, including those
which secure the diffusion elements by direct or indirect contact
about their entire peripheries, or at spaced points about their
peripheries or at other locations, such as for example the center
bolt arrangements shown for instance in U.S. Pat. Nos. 4,046,845 to
Richard K. Veeder and 3,532,272 to Eric S. Branton. However,
attachment of the diffuser elements by central or other fasteners
which extend through holes in the active diffusion surface produce
detrimental effects, the prediction of which would not have been
obvious.
In such of the prior art, sealing between element and plenum is
accomplished through vertically loaded elastomeric gaskets. The
required loading to effect adequate seal of the porous diffuser
element may be high, e.g. 50 pounds/lineal inch of seal. Greater
strength and rigidity of the diffuser and plenum is required to
distribute these forces about the periphery than in the preferred
embodiments of this invention wherein continuous peripheral
clamping or retaining is employed.
Further, fasteners extending through the element into the plenum
typically require holes with clearance. Unless the interiors of the
holes are sealed in their entireties, free passage of air is
provided in these clearances that promote excessive flow from the
diffuser element in the vicinity of the fastener. Enlarging the
sealed area under the lower horizontal surface of the retaining
means, to lengthen the path of air from the clearance zone to the
diffuser surface does not correct this deficiency, since the
reduction in unit flow (flux) in the vicinity of the fastener
resulting from the additional sealed area at the surface, similarly
reduces the frictional pressure drop in that region, and the
problem of non-uniform distribution persists.
The detrimental effects of the "through-hole" type fasteners above
described may be overcome by the use of the preferred peripheral
clamping or retaining methods employed in our invention. Among the
applicable retaining means are, for example, those including clips,
clamps and rings which clamp or merely restrain, secured to the
plenum by bolts, hooks, threads and other fastening means.
Suitable sealing means may be fabricated from a wide variety of
materials in a wide variety of forms. For example, one may employ
various plastics and rubbery elastomers. The sealing means may be
one or more members of circular, flat or other cross-section,
including special profiled matched to the shape of the diffusion
element and/or its support means. The requisite shapes can be
produced by any suitable forming process, such as for instance
extrusion, casting and other molding techniques.
The invention contemplates the use of sealing means which are
adherent or attached to the diffusion elements, such as those which
are clamped or bonded in place, and those which are not adherent or
attached. Those sealing means which are neither adherent nor
attached to the diffusion elements, and which are preferred in the
present invention, are preferably held against the elements by the
structure of the holder, by the structure of the retaining means
described above, by the structure of the diffusion element itself,
and preferably by a combination of the foregoing. Disposition of
the sealing means adjacent the periphery of the diffusion element
includes placement inside and/or outside the outline of the
periphery of the element as viewed in plan view and at varying
elevations above, below and/or along the side of the element, but
the sealing means preferably makes contact with an upper edge of a
vertical (including near vertical) side surface of the element as
described in greater detail below.
A wide variety of diffusion elements may be employed, made of
varying materials in varying configurations. In general the
invention is practiced with multi-pore diffusion elements, members
containing a multitude of closely spaced passages or pores of small
diameter defining paths for the discharge of gases into liquid
media. Such pores or passages may be of any suitable shape, size
and length, their shape being determined to a certain extent by the
method of producing the element. There are of course a variety of
ways of forming diffusion elements and any suitable technique may
be deployed. For example, a porous body may be formed by
solidifying a shaped mixture of water-insoluble molten material and
water soluble solid particles, followed by leaching out the soluble
articles. Alternatively a porous member may be formed for example
by building up layers of fabric formed from fibers or filaments.
Preferably however the diffusion elements and their pores are
formed by the bonding of solid particles together in a mass in
which the pores are formed by the spaces extant between the bonded
particles. The particles may be bonded with or without an adhesive
or other bonding agent.
The elements may, for instance, be formed of organic or inorganic
materials in particulate and/or fibrous forms. An exemplary organic
material is particles of fusible polymeric material as disclosed in
U.S. Pat. No. 3,970,731. Exemplary of inorganic materials are metal
and ceramic powders, including for example, alumina, silica,
mulite, and various clays. The finely divided materials are
generally shaped and compacted under pressure, and if necessary,
heated or fired to fully develop the necessary coherency. Bonding
with organic or inorganic binders is contemplated, and the finely
divided particles, and/or fibers may be bound together by organic
adhesive bonds, ceramic or fusion bonding or sintering.
The diffusion elements may be formed in any useful shape. For
example they may be formed in the shape of plates, defining a flat
or curved surface, tubes or domes. Among the applicable shapes are
those which appear round, oval, square, rectangular, polygonal and
irregular in plan view, and those which appear substantially
horizontal in transverse cross section, including those which are
truly flat and those which are only generally horizontal, in the
sense of including non-horizontal surfaces but including a portion
which extends in a generally horizontal direction. The elements may
have plain vertical or inclined edges, with or without steps and
the edge portions may include bevels, rounded portions, grooves and
the like.
In general the applicable elements preferably have active gas
discharge surfaces which are free of bubble emitting macro
openings, such as those shown for instance in U.S. Pat. No.
3,970,731 to Oksmann. Preferably the element is such that it will
emit fine bubbles from random locations throughout the gas
discharge surface. Preferably the gas infusion surface of the
element is free of air transmitting macro holes longer than 0.3 T
wherein T is the average thickness of the element weighted on an
area basis, or is free of such macro holes. A macro hole is an
intentionally or unintentionally produced hold larger than that
normally produced by compaction of the particulate material. It is
beneficial if substantially all gas paths through the body of the
element to its gas discharge surface, as installed in the plenum or
other holder, .[.areabout.]. .Iadd.are about .Iaddend.the same
length. Moreover, it is preferred to employ a diffusion element
having a bubble release pressure in the range of about 2 to about
20, preferably about 3 to about 15 and more preferably about 4 to
about 10 inches of water gauge. The optimum bubble release pressure
is considered to be about 7 inches. The values given are for bubble
release pressure in water of new elements as manufactured, i.e.
prior to use. A technique for determining bubble release pressure,
and other preferred characteristics for the diffusion elements used
in the present invention, are disclosed in the U.S. patent
application Ser. No. 952,892 of Lloyd Ewing and David T. Redmon,
entitled "Diffusion Element", filed in the U.S. Patent and
Trademark Office on Nov. 19, 1978, the entire disclosure of which
is hereby incorporated herein by reference. It is also preferred to
fabricate the element of hydrophilic materials, i.e. materials
which are hydrophilic in the element as manufactured and prior to
use. Also, preferably, the element is one whose sides, including
for example, any extreme vertical edges and vertical or near
vertical surfaces of steps which may be present near the periphery
of the element, are porous, at least semi-permeable and free of
adherent material preventing bubble emission. The preferred
elements have a specific permeability when new of about 6 to about
200 SCFM at 2 inches of water gauge. The thickness of the elements
may be uniform throughout or may vary when viewed in horizontal
cross section. A particular desireable characteristic of the
preferred diffusion elements is that of relative uniformity of
bubble release pressure throughout the gas effluent surfaces of the
elements. Such uniformity may be attained in any suitable fashion,
such as for example by the techniques disclosed in the
above-mentioned U.S. patent application Ser. No. 952,892. In
accordance with a particularly preferred embodiment the standard
deviation of at least 5 bubble release pressure measurements taken
along each of two perpendicular lines across the diffusion element
effluent surface is less than 0.25 and preferably less than 0.05.
The most preferred diffusion elements are those which are formed of
sintered or bonded particles in accordance with the teachings of
the aforesaid U.S. patent application Ser. No. 952,892, and of the
simultaneously filed U.S. patent application Ser. No. 952,862 of
the said Ewing, Redmon and William H Roche, the entire disclosure
of which is hereby incorporated herein by reference. One may choose
a diffusion element having any one or all of the above preferred
characteristics.
Irrespective of the particular form of holder and diffusion element
arrangement adopted, it is preferred that the element be so
supported that all portions thereof which emit air to the
surrounding liquid may have ready access to replacement water, to
maintain such emitting portions in contact with water and subject
to the influence of surface tension. Thus, it is preferred to avoid
a situation in which a side surface of the element is adjacent to a
crevice which can be swept clear and kept clear of water by the air
discharged from the side surface. The air emanating from the
element adjacent said crevice does not have to overcome the effects
of surface tension, causing air to be preferentially routed to that
portion of the element and thus correspondingly impairing the
uniformity of distribution of flow from the element. However, if
the supporting means and other associated structure are so shaped
and positioned that any exposed portion of the element capable of
emitting air to the liquid has ready access to replacement liquid,
so that the surface is not swept and kept clear of water, the
aforementioned distribution difficulty can be avoided.
Alternatively, a portion of the diffusion element which would
otherwise discharge air into a crevice of the type described above
can be sealed by appropriately positioning a seal of lesser height
than the element, by applying an impermeable coating to the
surface, or by sufficiently compressing such sides or any portion
thereof having access to water so as to render same substantially
impermeable. However, the preferred diffusion elements include
sides which are porous, at least semi-permeable, free of adherent
material preventing bubble emission and "vertical" (including near
vertical, e.g. within about 20.degree. of vertical). Still more
preferably such vertical or near vertical edges are covered by the
combined structure of the plenum, sealing means and retaining
means. According to a particularly preferred embodiment, described
in greater detail below, the sealing means is of lesser height than
the diffusion element, but is positioned at an upper edge defined
by the intersection of said vertical or near vertical sides and an
upward facing portion of the upper gas discharge surface of the
element.
The diffusion elements will generally be mounted in a natural or
man-made water impound such as a lake, lagoon or tank, most
commonly a large tank of concrete construction for activated sludge
treatment of domestic sewage. The diffusion elements will be
mounted in the water impound in one or more arrays connected to the
gas distribution network and may be supported at one or more
elevations, assuming suitable pressure or flow controls or separate
compressors are provided to insure proper distribution of the
aeration gas to the elements at the various levels. Preferably
however all elements within a given tank which are in open
communication with the same gas distribution network are mounted at
substantially the same elevation.
FIGS. 1 through 18 disclose specific embodiments of particularly
preferred forms of apparatus useful in connection with the
invention. In this connection FIG. 1 shows a sewage aeration tank 1
including a bottom 2 with side and end wall 3 and 4 to contain a
body of sewage which is to be aerated. A compress 5 is provided to
feed filtered atmospheric air through valve 6B, flow indicator 7A,
and branch conduit 18A to air main 8. Storage tank 19 contains a
supply of cleaning gas stored at high pressure which may be
discharged to air main 8 in controlled or predetermined admixture
with the compressed air via valve 6A, flow indicator 7B and branch
conduit 18B. By manipulation valves 6A and 6B one may commence,
terminate or control the flow of aerating and cleaning gas whereby
the foregoing elements constitute means for feeding aeration gas
and for continuously or intermittenly feeding a mixture of aeration
gas and cleaning gas to the distribution network.
The distribution network comprises air main 8 which is generally
supported above the level of liquid in the tank 1, and which feeds
into a downcomer pipe 9, extending vertically from air main 8 to a
horizontally disposed distributor pipe 10 supported substantially
horizontally a short distance above bottom 2. Parallel rows of air
header pipes 11, also supported horizontally a short distance above
bottom 2, are fed by distributor pipe 10. The spacing, in a
horizontal plane of air headers 11 and diffusers 12 is determined
on the basis of criteria known to persons skilled in the art.
In certain preferred embodiments air main 8 and downcomer pipe 9
are of metal, while distributor pipe 10 and branch conduit 18B are
of synthetic resin; downcomer 9 and pipe 10 are connected at a gas
tight pipe coupling (not shown). In one such embodiment, conduit
18B enters but does not communicate with air main 8 at the point of
intersection shown in FIG. 1 and extends continuously within air
main 8 and downcomer 9 to a discharge outlet in pipe 10 downstream
of the coupling and below the surface of the liquid in the tank.
Alternately, conduit 18B extends separately from air main 8
directly to a submerged connection with pipe 10 downstream of the
coupling.
FIG. 2 shows in perspective a broken out and enlarged portion of
one of the air headers 11 with its diffuses 12.
As shown in FIGS. 3 and 4, header pipe 11 has air outlet openings
13 formed at longitudinally spaced intervals along its top center
line to feed air into the respective plenums 14 of diffusers 12.
Each plenum 14 includes lower wall means 15. All or at least a
substantial portion of the lower wall means is circular in
transverse cross section and conforms to the outer surface 16 of
pipe 11. Lower wall 15 may be held in close fitting engagement with
pipe 11 in a variety of ways, including various mechanical
arrangements, such as clamps or straps but preferably by bonding to
the pipe. In general any bonding technique may be employed, such as
for instance, adhesive bonding; but if the pipe is of polymeric
material, which is preferred, the attachment may also be made by
solvent or thermal (including sonic) welding. The later is of
considerable advantage in terms of ease and economy of
construction. Depending on the type of attachment means employed,
the plenum may be sealed to the pipe by the same means used in
attachment, or by different means. Thus one may provide an
elastomeric seal between the plenum lower wall means and pipe outer
surface 16, or the seal may be provided by the welding or adhesive
referred to above.
From the standpoint of structural integrity, especially when using
both polymeric pipe and a plenum of polymeric material, it is
beneficial that lower wall means 15 be held in close fitting
engagement with a substantial portion of the length of the pipe
outer surface 16 (as shown in FIG. 4) and of the transverse cross
section of the pipe. Preferably, lower wall 15 conforms and engages
with the transverse cross section of the pipe through an arc of at
least about 20.degree. , more preferably about 45 or more degrees
and most preferably about 70 or more degrees, at least in mid
portion 17 (FIG. 4) of the lower wall means. In the illustrative
and preferred embodiment shown in FIGS. 3 and 4 the arc is about
90.degree. .
As shown in FIGS. 3 and 4, lower wall means 15 includes an air
inlet opening 22, around which there may be provided a small
upstanding boss 23 (FIG. 3) on the inner surface of plenum lower
wall means 15. Air outlet opening 13 and air inlet opening 22 are
maintained in registry with one another.
According to the invention, the system is provided with an air flow
regulator member, one possible example of which is indicated by
reference numeral 24. According to a preferred embodiment a
combined bonded assembly is formed by the pipe, by lower wall means
15 and by the air flow regulator member or a sleeve member 25 in
which the air flow regulator member is mounted. Thus, for instance,
all of these parts may be simultaneously adhesively bonded or
welded, with considerable savings in manufacturing steps and costs.
The air flow regulator member 24 and various embodiments thereof
will be discussed in greater detail below. The lower wall means 15
may be of any desired shape as viewed in horizontal plan view. It
may for instance have a square, rectangular, circular or oval
outline, the later being preferred. Air outlet opening 22 and
regulator 24 are both preferably within this outline as viewed in
plan view.
FIG. 5 shows the regulator 24 of FIGS. 3 and 4 enlarged and in
longitudinal cross section. In this embodiment in the regulator is
a plug member having a central void to communicate through the open
bottom of sleeve 25 with the interior of pipe 11. Extending
laterally from recess 32 are a pair of horizontal orifices 33
communicating with the interior of plenum 14. As shown in FIGS. 3
and 4 these orifices 33 are in direct open communication with the
interior of plenum 14. However, if the outer ends of orifices 33
are covered by an elastic band 34 as shown in FIG. 5, the orifices
have a uni-directional flow characteristic, i.e. they function as
check valves. Such characteristic is valuable if there is a
temporary loss of air pressure in header pipe 11. The
uni-directional flow characteristic of the regulator tends to
maintain pressure within plenum 14, thus discouraging backflow of
liquid from the exterior of the diffuser through the diffusion
element 35 into the plenum. This reduces the difficulties of
starting up the system when pressure is restored. Backflow of
sewage-laden water through diffusion element 35 or regulator 24
tends to plug these components, leading to possible complete
plugging or non-uniform distribution of air flow through the
element and/or system when the flow of air under pressure is
restored.
FIG. 5A disclosed a pressure responsive uni-directional flow
regulator commonly referred to as a "duckbill". The duckbill is
normally made of flexible and elastic material in a lip-like
configuration reminiscent of a duck's bill and having lips
terminating in a slit which is normally closed. In this embodiment
the duckbill is mounted in a sleeve 25A recessed in the plenum
lower wall 15 and header pip 11, so that the duckbill may be mainly
within the outline of the header pipe. The duckbill has a
cylindrical barrel portion 37, lips 38 terminating in a horizontal
slip 39 and an annular flange portion 40 which is confined in
sleeve 25A by a concentric collar 41 fixed with sleeve 25A. An
inwardly directed flange 42 with central opening 43 at the lower
end of sleeve 25A supports the duckbill from beneath and provides
communication with the interior of cylindrical barrel 37, by means
of which air is communicated from the interior of the pipe between
lips 38 and through slit 39 into the interior of plenum 14. The
orifice provided upon opening of slip 39 varies in accordance with
the pressure, but closes on termination of inward flow relative to
the plenum. Thus, like the modification illustrated in FIG. 5, this
regulator acts as a check valve.
FIGS. 5B and 5C illustrate a slow regulator comprising a plurality
of passages having a large ratio of length to cross sectional area.
The regulator of FIG. 5B, shown in partial section, includes a
stepped cylindrical housing 47 of which lower end 48, having a
reduced cross section, closely fits within the air outlet and inlet
openings 13 and 22 of header pipe 11 and plenum lower wall 15,
which components may if desired be welded into a unitary assembly.
Housing 47 included a circular lower base 49 with air inlet holes
50 more clearly shown in FIG. 5C, and serves as the base for a
central threaded post 51 which extends above the top of housing 47.
In the upper larger diameter portion of housing 47, is an annular
porous plug 52 which substantially fills the space between post 51
and the side walls of housing 47. Bypassing of air flow between the
outer periphery of plug 52 and the internal walls of housing 47 is
prevented by an O-ring seal 53 adjacent the plug and compressed
between the plug and the step in housing 47. Bypassing of air
through the center hole in plug 52 between the plug and post 51 is
prevented by a flexible sealing flap 54 held in sealing engagement
with the center portion of the upper surface of the plug by washer
55 and nut 56 threaded on post 51. The flexibility of flap 54
permits its outer edge to rise when air passes from the interior of
header pipe 11, through porous plug 52 to its upper surface. Thus
air emitted from the upper surface of the porous plug may pass
between the upper edge of housing 47 and the flap edge 57 which
acts as a uni-directional valve. On termination of upward flow
through porous plug 52, or upon the commencement of flow in the
opposite direction, the flap closes, preventing reverse flow of gas
back towards header pipe 11. Alternatively, the bypassing effects
described above can be controlled by impermeable coatings on the
walls of the center hole and periphery of plug 52.
FIGS. 3, 4 and 5, FIG. 5D illustrates a readily removeable and
replaceable flow regulator. In this embodiment, the regulator is
partly within plenum 14 and partly within pipe 11. A sleeve 25B is
positioned in air outlet and inlet holes 13 and 22 of header pipe
11 and plenum lower wall 15. Like the regulator of FIGS. 3, 4 and
5, the regulator in FIG. 5D includes a cylindrical void of recess
32 open at the bottom and, in communication therewith, a horizontal
orifice 33. The cylindrical barrel portion 60 of this regulator
closely fits within the cylindrical bore of sleeve 25B and has two
annular grooves, upper and lower grooves 61 and 62 respectively, in
which upper and lower O-rings 63 and 64 are mounted. Upper O-ring
seal 63 is of slightly larger outer diameter than the inner
diameter of sleeve 25B, and effectively seals off flow from header
pipe 11 to the interior of plenum 14 through the space between
cylindrical barrel 60 and the inner surfaces of sleeve 25B. Lower
O-ring 64 has a somewhat larger external diameter which enables it
to act as a catch to hold the flow regulator in place. O-ring 64 is
sufficiently compressible and has sufficient space in groove 62 so
that cylindrical barrel portion 60, with O-ring 64 in place in
groove 62, may be introduced into the upper end of sleeve 25B and
forced through sleeve 25B to the position shown in FIG. 5D, at
which point O-ring 64 expands against the tapered lower inner
surface 65 which forms a detent at the lower end of sleeve 25B.
.[.O-4ing.]. .Iadd.O-ring .Iaddend.64 has sufficient exterior
diameter to hold the regulator member in place under normal
operating pressure, but the regulator may be withdrawn without
destroying the regulator or the sleeve 25B, and may be replaced
with a regulator of differing flow characteristics. This beneficial
when it becomes necessary to replace diffusion element 35 (FIGS. 3
and 4) with elements having different head loss characteristics, or
in the event it is desired to alter the overall operating
characteristics of the aeration system.
The foregoing FIGS. 3,4,5, and 5A-5D disclose but a few of the
possible alternative forms of regulators which may be mounted
within the transverse cross-sectional area of the plenum, of the
header pipe or of both of them. However, the various flow regulator
devices depicted herein have the common characteristic that each of
them included in a member which terminates beneath the diffuser
element 35. Persons skilled in the art will readily furnish a
variety of alternative regulator devices, mounted in various
fashions, which correspond with the foregoing.
As shown in FIGS. 3 and 4, side wall means 26 is connected with the
periphery of lower wall means 15. The side wall may be vertical or
inclined inwardly or outwardly from the lower wall means.
Preferably, the side wall means is connected with the entire
periphery of the lower wall means, and is inclined upwardly and
outwardly from the lower wall means. Diffusion element supporting
means, spaced upwardly and outwardly from the lower wall means, are
provided on said side wall means. Such supporting means may for
instance include a horizontal annular shelf 27 with inner and outer
diameters respectively smaller and larger than the diameter of the
lower edge of the diffusion element 35, to be described in greater
detail below. Shelf 27 may, if desired, be part of a step in side
wall means 26. the rising portion of which step comprises s
cylindrical generally upright wall 21. The diffusion element
supporting means may be in any desired position on side wall means
26, but is preferably at (in, on or near) the extreme upward and
outward projection of wall means 26. Preferably also wall means 26
is a conical shape.
According to one of the preferred alternative forms of the
invention, disclosed in FIGS. 3-4, the plenum includes an integral
generally upstanding wall 28 which, when viewed in plan view,
surrounds the diffusion element supporting means, e.g. annular
horizontal shelf 27. When provided, which is preferred, upstanding
wall 28 has a height which is about equal to the height of the
diffusion element 35. Thus, according to this preferred
alternative, the height of wall 28 may be equal to or slightly
greater or less than the height of the diffusion element. Wall 28
has an inner surface 29, also generally upstanding, an upper edge
30 and threaded outer surface 31. The shelf 27 and generally
upstanding wall 28 therefore can, in the preferred embodiment,
provide a socket to receive diffusion element 35, in which
substantially the entire height of diffusion element 35 is recessed
as shown in FIG. 3 and in the enlargement in FIG. 7.
The most preferred diffusion element is a ceramic plate of circular
outline having a stepped edge, depicted in FIGS. 3 and 4, and
includes circular central flat area 70, annular beveled edge 71,
annular flat surface 72, outer annular beveled surface 73 and
horizontal annular surface 74, whose respective outer diameters are
4.5, 6.5, 7.6, 8.7 and 9.25 inches respectively. Surface 70 lies
0.070 inch below surface 72. Beveled surface 73 is at an angle of
inclination of 25.degree. relative to the horizontal. The
respective overall heights of horizontal annular surface 74, the
top edge of vertical side surface 75 and horizontal flat surface 72
are 0.5, 0.7 and 1.0 inch respectively.
The plate is formed from a mix containing particles of alumina with
means transverse and longitudinal dimensions of 0.020 and 0.032
inch respectively, and 20 parts by weight of ceramic bonding agent,
per hundred parts. by weight of alumina particles. The mix is
compacted in a press having a ram with a planar surfaces and a
cylindrical die cavity having a bottom wall with a shape
corresponding to the upper surface of diffusion element 35.
The sides of the die cavity and the ram correspond in diameter with
the peripheral edge 76 diffusion element 35 the height of the die
cavity from its bottom surface to its upper edge being 1.5 inches.
The mix is poured into the cavity in excess, is struck off level
with the top of the die and is compressed to the dimensions
previously given under a pressure of approximately 900 psi. The
resultant compact, after removal from the press, is fired in a kiln
at a temperature sufficient to fuse the bounding agent and is then
gradually cooled. The resultant product is a coherent porous
ceramic diffusion element having a specific permeability of 25
SCFM.+-.3 SCFM.
The diffusion element, whether of the above-described preferred
type or not, is supported by and preferably nests within the plenum
on the diffusion element supporting means. A sealing means is
provided adjacent the periphery of the diffusion element for
preventing leakage of air past the periphery of the element.
In the preferred embodiment disclosed in FIGS. 3, 4 and 7 herein, a
polyisoprene O-ring 80, having a Shore A Durometer hardness of
about 40.+-.3, nests in an annular step formed about the upper
portion of the peripheral surface of diffusion element 35. The
diameter of the cross section of O-ring 80 preferably slightly
exceeds both the spacing between inner surface 29 of plenum side
wall means 26 and opposed, facing vertical or near vertical side 75
of element 35, and the height of vertical or near vertical surface
75.
The preferred retaining means of the present invention shown in
FIGS. 3, 4 and 7 is an internally threaded clamping ring 84
including a cylindrical member 85 having internal threads 86
matching external threads 31 on side wall means 28 of the plenum.
Cylindrical member 85 has attached to it above the threads 86 a
flange 88 which extends inwardly over generally upstanding wall 28
of the plenum and at least partly across the top of sealing means
80. According to a preferred embodiment the said flange 88 leaves
the upper inner quadrant of the cross section of the O-ring 80
uncovered (shown in greater detail in FIG. 7) while clamping the
O-ring with sufficient force to press it in tight engagement with
at least the uppermost portion of vertical side portion 75 closely
adjacent the edge 89 between side 75 and the upwardly facing
adjacent surface 73, thereby avoiding formation of a crevice at the
side of the diffusion element which would be in communication with
the overlying water and could evacuate itself.
FIGS. 8 through 14 shown alternative but less preferred embodiments
of the combination of plenum, diffusion element, sealing means and
retaining means which may nevertheless be used successfully in the
invention. Each of these various embodiments has in common a plenum
side wall means 26, annular horizontal shelf 27, and generally
upstanding wall means 28 which is about of equal height with the
diffuser element and which faces the opposed peripheral surface or
surfaces of the diffusion element which is indicated by reference
numerals 35 and 35A through 35G. For example, in FIG. 8, generally
upstanding wall means 28 is provided with peripheral flange 90 and
circumferentially spaced bolt holed 91 through which extend bolts
93 to clamp a plurality of circumferentially spaced clips 92
against the respective upper surfaces of flange 90 and diffusion
element 35A. An elastomeric band or hoop member 95 serves as
sealing means. For example, the loop or band may have and
unstretched inside diameter of about 85% of the outside diameter of
diffusion element 35A, and is of slightly greater width that the
vertical thickness of the diffusion element. When stretched and
placed around diffusion element 35A, the extra width of the band
forms an inturned upper edge 97, an inturned lower edge 98 and a
cylindrical center portion 96, which respectively enclose the upper
and lower edges 99 and 100 of the element. Inturned lower edge 98,
bearing against annular horizontal shelf 27, seals the interior of
the plenum from the vertical space between the upstanding wall 28
and element 35A. Cylindrical portion 96 of the elastomeric band
prevents air from passing peripherally out of diffusion element 35A
into the crevice between itself and upstanding wall means 28. This
is an example of retaining means which engages only the element and
not the sealing means, and does not contact the entire periphery of
the element.
The embodiment of FIG. 9 includes in its generally upstanding wall
means 28 q second horizontal shelf 105 and, at the upper edge of
said wall means, an outwardly extending generally horizontal flange
106. The peripheral edge of diffusion element 35B is provided with
an impermeable coating 107 throughout the height of its peripheral
surface, bears laterally against O-ring sealing means 80 which
rests on shelf 105, and has an interference fit between diffusion
element 35B and wall means 28. O-ring 80 is retained in place, i.e.
prevented from upward movement, by a retaining ring 108 of
cylindrical configuration having an inner surface 109 about which
are situated a plurality of circumferentially spaced inwardly
projecting lugs 110 which bear down at widely spaced points, with
limited inward projection on the upper surface of element 35B.
Retaining ring 108 also includes an integral outwardly extending
annular flange member 111 which rests upon and generally coincides
with the outwardly extending flange 106 connected with wall means
28. These tow flanges are held together by a split ring clamp 116
of generally C-shaped cross section having in transverse cross
section limbs 112,113 with curved inner faces which engage
similarly shaped annular detents 114, 115 in the respective lower
and upper surfaces of the flanges. The vertical flexibility of
limbs 112, 113, and a radical split (not shown) in split ring clamp
116 enable the latter to act as a snap action clamp to hold flange
111 and its integral retaining ring 106 firmly together, while lugs
110 secure the diffusion element 35B in place and the lower surface
of ring 108 does not clamp, but does prevent upward movement of
O-ring 80.
The embodiment of FIG. 10 is similar in many respects to that shown
in FIG. 9. The side of diffusion element 35C has an impermeable
coating 107 and faces generally upstanding wall means 28. The
latter, as in the previous embodiment, includes a second annular
horizontal shelf 105 upon which rest O-ring 80, the latter being
held in place by a retaining ring 108 with inner surface 109 and
lugs 110. However, instead of the flange 106 previously described,
upstanding wall 28 has an integral catch 120 formed about the
entire periphery of its outer surface 121, and retaining ring 108
has a plurality of circumferentially spaced outwardly, downwardly
and inwardly extending hooks 122 for engaging the catch 120,
whereby ring 108 is held in place preventing upward movement of
O-ring 80 and holding diffusion element 35C securely in place with
lugs 110.
In FIG. 11, annular horizontal shelf 27 includes an inner
upstanding lip 27A which .[.helds.]. .Iadd.helps .Iaddend.retain in
place a sealing means 125 of substantially rectangular cross
section, upon which rests the marginal edge of the lower surface of
diffusion element 35D. The side 127 or periphery of element 35D is
in opposed, facing relationship with generally upstanding wall
means 28 across a narrow vertical space or crevice 131. However,
side 127 is sealed off from crevice 131 by a substantially
impermeable layer including an annular portion 126 above sealing
means 125 and a peripheral edge portion 128 on the side of the
element adjacent crevice 131. Element 35D is held firmly in place
against sealing means 125 by internally threaded clamping ring 129
engaging threads 130 on the outer surface of wall means 28.
FIG. 12 like FIG. 7, is an example of a sealing means located at
the edge between a side surface and an upwardly facing upper
surface of the diffusion element. As shown in the FIG. 12,
diffusion element 35E rests directly upon annular horizontal shelf
27 and has a substantially impermeable peripheral edge coating 128,
which seals off the side of the element from the crevice 131 formed
between the element and generally upstanding wall means 28. In this
embodiment the sealing means 133 is of hybrid cross section, having
a semi-circular outline in its upper portion and a rectangular
outline in its lower portion. The semi-circular portion of sealing
means 133 is engaged by the form fitting lower surface of annular
flange 134 on internally threaded clamping ring 135, the latter
engaging threads 136 formed on the outer surface of wall means 28.
A short dependent lip 137 on the innermost edge of flange 134 tends
to urge sealing means 133 outwardly and downwardly, so that the
sealing means flat outer surface 139 and flat bottom surface 138
bear outwardly against the inner surface of wall means 28 and
downwardly on diffusion element upper surface 140, and especially
on the edge 141 at which upwardly facing surface 140 intersects
with the element side surface 142.
FIGS. 7 and 12 both show the sealing means as a member of
substantially lesser height than the height of the diffusion
element which member is located at an edge at the intersection
between the side of the diffusion element and an upwardly facing
gas discharge surface thereof. The two embodiments show the sealing
means below and adjacent said edge, or above and adjacent said
edge; however, it is also possible to provide sealing means which
covers a portion of the element both above and below the said edge.
These various preferred configurations minimize the above described
difficulties which occur with crevices that can be swept free of
water and relieve adjacent portions of the element from the
influence of surface tension, resulting in disturbance of the
uniformity of distribution of air by the element. A particularly
beneficial result is obtained when a sealing means at such an edge
is used in combination with means for reducing the permeability of
the side of the element, such as for instance, the band member 95
of FIG. 8 and the impermeable coatings 107 and 128 of FIGS. 9-12,
or the stepped side configuration shown in FIG. 7. In the stepped
configuration the particulate material of the diffusion element
beneath horizontal annular surface 74 and adjacent peripheral
surface 76 has been subjected to sufficient compression to reduce
its permeability as compared to the upwardly facing gas discharge
surfaces 72 and 73. The peripheral surface 76 may have merely a
reduced permeability relative to the upwardly facing gas discharge
surfaces, or may be rendered substantially impermeable. The
property of reduced permeability relative to the upwardly facing
gas discharge surfaces (including substantial non-permeability), is
beneficial when combined with the sealing means at the above
described edge. The combination tends to reduce both the crevice
difficulties described above and difficulties with short circuiting
of air from the plenum to the element gas discharge surface along
air flow paths of differing length. For this reason, the
combination of a side of reduced permeability and a sealing means
at the above described edge represent a preferred embodiment of the
present invention.
In FIG. 13, as in the preceding figure, the diffusion element 35F
rests directly upon annular horizontal shelf 27. In this embodiment
element 35F includes an annular recess 143 at the upper edge of its
side 144. Side 144 as well as the lower and upper portions 145 and
146 of recess 143 are covered with a non-adherent cover or an
impermeable coating 147. O-ring sealing means 80 rests in recess
143 and has an interference fit with impermeable coating 147 and
the inner surface of wall means 28, while engaging the curved
transitional surface 148 between the lower and upper surfaces 145
and 146. The O-ring seal 80 is clamped tightly in place by
internally threaded sealing ring 149 engaging threads 150 in wall
means 28, and consequently retains diffusion element 35F in
place.
In the embodiment of FIG. 14 the side of diffusion element 35G
includes a step generally indicated by 151 and including a
generally horizontal annular surface 152 and vertical cylindrical
surface 153, both of which are covered with a non-adherent cover or
coated with impermeable coating 154. The remainder of the side of
element 35G is a lower cylindrical surface 155 which need not
necessarily have any impermeable coating thereon. O-ring seal 80 is
compressed against four surfaces, including diffusion element
surfaces 152 and 155, horizontal annular shelf 27 and the inner
surface of wall means 28. Thus, inverted step 151 rests upon the
O-ring 80 and is thereby indirectly supported by the diffusion
element supporting means. An internally threaded clamping ring 156
engaging threads 157 on wall means 28 clamps the diffusion element
in place. The annular flange 158 of clamping ring 156 has an inner
surface 159 of about the same diameter as the diffusion element
side surface 153. Lugs 160, situated at spaced points around the
ring inner surface 159, extend a short distance inwardly over the
upper surface of element 35G, holding it in place. Thus, the
diffusion element 35G is clamped only at its periphery, and only at
spaced positions along the periphery.
As shown in FIG. 15 side wall means 26 are affixed directly to the
surface 16 of header pipe 11 so that surface 16 forms the lower
wall of plenum 14.
In the embodiment of FIGS. 16, 17 and 18, diffuser 175 is shown
with vertical walls 181. FIG. 18 shows the vertical side walls
bonded directly to surface 16 of header pipe 11 whereby surface 16
forms the lower wall of plenum 182. Although shown as rectangular,
the .[.wells.]. .Iadd.walls .Iaddend.could be curvilinear,
including circular and elliptical, or irregular.
FIG. 19 discloses a preferred apparatus for obtaining dynamic wet
pressure and/or network back pressure at any point in time under a
variety of operating conditions, and can provide a basis for
comparison at other conditions. The figure is a vertical transverse
cross-section of a header pipe through an associated plenum and
diffusion element, along with an air flow regulator (not in
section) showing the location of pressure taps, a bubble pipe and
ancillary equipment required to obtain the pressure(s) in question.
The pressure taps and a series of lines feeding manometers or other
suitable pressure measuring devices are used to determine the
various desired pressure readings. An air supply A, which can be a
separate compressor or a tap into the plant aeration air system is
used to supply a slow rate of air through a bubble pipe B, having
its lower, open end located at the same elevation as the discharge
surface of the diffuser elements. The pressure detected in line 1
will indicate the hydrostatic head applied to the diffusion
element. This pressure is read from the manometer connected between
line 1 and the atmosphere. Dynamic wet pressure is read from the
manometer connected to lines 1 and 2. Assuming the use of flow
regulators having gas orifices or apertures of known pressure/flow
characteristics, and the availability of the barometric pressure
and other information needed for making the requisite calculations,
the flow rate through the element can be calculated based on the
pressure read from the manometer serving lines 2 and 3. Temperature
measuring means, for example thermometers or transducers, may be
provided at any convenient submerged or nonsubmerged location
within or without the gas distribution network for obtaining
temperature data which is sufficiently related to or representative
of the temperature of the gas flowing through the above-mentioned
flow regulator for calculating flow with the requisite precision.
Preferably, the temperature measuring means is situated adjacent
to, including just upstream of, the flow regulator of that
diffusion element which is used to take the pressure readings, or
as close thereto as practicable.
FIGS. 20, 20A and 20B illustrate the determination of bubble
release pressure. FIG. 20 depicts a diffusion element in plan view
at the top of the figure and in vertical cross-section at the
bottom of the figure. This element includes an integral annular
peripheral zone generally indicated by reference numeral 229 (FIG.
20B), vertical cylindrical edge 230, horizontal annular surface 231
and vertical side surface 232, as well as gas infusion surface 234
and discharge surface 233. However, it should be noted that surface
233 can also serve as the gas infusion surface, in which case
surface 234 would become the gas discharge surface. FIG. 20
illustrates the testing of the plate for bubble release pressure.
One possible apparatus for performing such a test is shown in the
lower portion of FIG. 20 and in FIG. 20A.
The exemplary apparatus includes a tank 240 (FIG. 20) having bottom
wall 241 and side walls 242, 243. Resting on bottom wall 241 are
supports 244, 245 which support the diffusion element with its gas
discharge surface 233 facing upwardly beneath the water level 246.
Compressor C is connected via conduit 251, pressure regulating
valve 252 and flowmeter 253 with a first hose 254. The latter is in
turn connected to the first horizontal leg 256 of a tee 255 having
a second horizontal leg 257 and vertical leg 258. A sealing ring
259 is provided around the open bottom end of vertical leg 258.
Second horizontal leg 257 is connected via second hose 263 with a
manometer 264 having a scale 265. By comparison of liquid levels
266 and 267 with scale 265 it is possible to determine the pressure
within the system, which is assembled carefully to provide gas
tight joints to all connections between components.
As shown in greater detail in FIG. 20A, the vertical leg 258 of tee
255 and the sealing ring 259 constitute a test probe. It may for
example be fabricated from a standard laboratory glass tee having a
sufficient internal diameter to readily deliver the desired gas
flow and from a standard rubber stopper assembled as shown, the
bottom of the stopper constituting the end of the probe and having
outside and inside diameters 259A and 259B of 3/8 inch and 3/16
inch, respectively. The probe, when manually pressed against the
gas discharge surface 233 of the diffusion element, is
circumscribed by the site to be tested. The lower surface of
sealing ring or stopper 259 forms a gas-tight seal with surface
233, which forces air to pass through the element below and
adjacent to seal 259 and to exit into the liquid in the test site
area as bubble 260. The pressure required to release the bubbles
can be read from the manometer. Since the stopper 159 is
non-adherent relative to surface 233, the probe may be readily
moved from one test site to another to take a series of pressure
readings from which bubble release pressure can be calculated.
Returning to FIG. 20, mutually perpendicular reference lines 271
and 272 are drawn on gas discharge surface 233 of the diffusion
element. Equally spaced reference marks 273 situated along
reference 271 and 272 identify probe positions over which the open
end of the above-described probe of FIG. 20A is sequentially
positioned in such a way as to produce an effective seal as
described above. Regulating valve 252 is adjusted against a
relatively high pressure from compressor C to a relatively low rate
of flow, i.e. 2.times.10.sup.-3 C.F.M. When a bubble or bubbles 260
are produced through a portion of the gas discharge surface
adjacent the probe, the pressure in the system is read from
manometer scale 265. The bubble release pressure at the test point
is obtained by subtracting the hydrostatic head H, between gas
discharge surface 233 and water level 246, from the pressure read
from the manometer. Taking bubble release pressure measurements at
a statistically significant number of randomly or uniformly
established points on gas discharge surface 233 enables one to
determine the bubble release pressure of said surface. However, in
actual practice it has been found to be reasonably accurate and
convenient to establish all of the pressure testing points along
two mutually perpendicular reference lines as shown. In a diffusion
element manufactured with reasonable care, conducting the tests
along two such reference lines provides a reasonably accurate
approximation of the uniformity of distribution of air flow
capabilities across the gas discharge surface.
The central portion of FIG. 20 includes a graph having a horizontal
coordinate 274 with divisions 274A corresponding in scale and
position to reference marks 273 on reference line 271. Vertical
coordinate 275 of this graph includes an appropriate scale of
pressure values whereby the pressure readings taken at reference
marks 273 on reference line 271 may be plotted between the
coordinates to develop a bubble release pressure profile or curve
276. In a tank 240 with sufficient space between side walls 242,243
and the sides of the diffusion element, it is possible also to take
bubble release pressure readings at the vertical cylindrical edge
230, horizontal annular surface 231 and vertical side surface 232
as well as at a point on gas discharge surface 233 which is quite
close to the vertical side surface 232. The positions of the test
sites on the diffusion element and the corresponding positions of
the pressures as plotted in the graph are shown by dashed reference
lines 280A, 180B (vertical cylindrical edge 230), 281A, 281B,
(horizontal annular surface 231), 282A, 282B (vertical side surface
232) and 283A, 283B (edge of gas discharge surface 233). The
aforementioned testing and plotting positions are shown in greater
detail in FIG. 20B, an enlarged and forshortened portion of FIG.
20.
The bubble release pressure is an indication of the pressure
required for bubbles of air to overcome surface tension upon
discharge from the pores of the plate. It has been found that this
pressure requirement can considerably exceed the pressure losses
due to friction in pushing the gas from the air infusion surface to
the gas discharge surface of the plate. This is particularly true
where the plate is fabricated of hydrophilic materials which are
readily wetted by the water as compared to hydrophobic
materials.
The graph in FIG. 20 shows that the diffusion element exhibits
minimum bubble release pressure (B.R.P.) in a central region of the
element. In surrounding regions of the element, the bubble release
pressure grows gradually higher, climbing towards a maximum 285A,
285B, indicated by reference lines 283A, 283B, based on tests made
on gas discharge surface 233 adjacent vertical side surface 232.
Bubble release pressure tests on side surface 232 indicated by
reference lines 282A, 282B indicate that the bubble release
pressure reaches a second minimum 286A, 286B in this area. A
further measurement of bubble release pressure on horizontal
annular surface 231, indicated by dashed lines 281A, 281B shows
that the pressure can reach a second maximum 287A, 287B in this
area. A final observation taken on vertical cylindrical edge 230 as
indicated by reference lines 280A, 280B indicates there can be some
reduction of bubble release pressure in this area as compared to
the second maximum 287A, 287B. The existence of a low bubble
release pressure region in vertical side surface 232 as indicated
by the second minimum 286A, 286B of bubble release pressure curve
276 is unexpected. Using data accumulated along reference line 272,
it is also possible to develop a bubble release pressure curve (not
shown) for the test sites along reference line 272.
Inasmuch as the rate of flow of gas through a given region of the
diffusion element will be an inverse function of the bubble release
pressure in said region, it is possible to develop a flow curve 277
which is considered representative of the flow profile of the plate
across reference line 271. Actual flow data may be obtained for the
central portion of the element by operating the element for timed
intervals with an inverted graduated cylinder over the test sites.
Estimated flows based on the bubble release pressure may be derived
for the edges of the element. Analysis of the resulting flow curve
provides a practical indication of the uniformity of gas flow
distribution across the element. As shown by gas flow curve 277,
peak flow occurs in the central region of the diffusion element,
tapering off to a first minimum 290A,290B (corresponding to bubble
release pressure maximum 285A,285B) near the outer edge of gas
discharge surface 233. There are also flow peaks 291A,291B and
second minima 292A,292B corresponding inversely and respectively to
bubble release pressure minima 286A,286B and second maxima
287A,287B. Thus the testing technique illustrated in FIG. 20 has
provided a much clearer and more quantitatively accurate indication
of the flow profile of the diffusion element than has heretofore
generally be available in the industry. Moreover it has made it
possible to see that such diffusion elements may exhibit higher
flow rates per unit area in certain regions, while other regions of
the elements are underused. Excessive gas flow through one or more
regions of the elements tends to produce excessively large bubbles,
thereby impairing the oxygen transfer efficiency of the
elements.
FIGS. 21 through 31 disclose various forms of diffusion elements
configured in such a manner as to avoid the above-described
difficulties. In general, these are rigid, monolithic, porous, gas
diffusion elements having an enhanced apparent volumetric
compression ratio in permeable central and/or boundary portions
thereof. The elements are formed of a body of solid particles which
has been shaped, pressed and rendered coherent by bonding or
sintering in a compacted form having pores. As viewed in vertical
cross section the element includes a generally horizontal portion
having a specific permeability in the range of about 6 to about 200
SCFM at 2 inches of water gauge. The maximum horizontal dimension
of the aforesaid portion is in a ratio of at least about 4 to 1
relative to the thickness of said portion. The said portion also
includes an upper gas discharge surface, which is generally
horizontal and which has a bubble release pressure in water in the
range of about 2 to about 20 inches of water. The central and
boundary zones are beneath a portion of the upper gas discharge
surface. Within one or both of these zones the solid particles have
been pressed to a greater apparent volumetric compression ratio as
compared to the material in an adjacent portion of the element, for
example in an outward zone positioned between the central and
boundary zones beneath the gas discharge surface. The diffusion
element may also include a peripheral zone in which the element has
a lesser permeability, a greater density or a lesser height than a
portion of the element surrounded by the above-mentioned boundary
zone or of the gas discharge surface above said portion.
Among the elements referred to above are those in which the
apparent volumetric compression ratio of a central zone has been
enhanced by distributing the particles in the aforementioned body,
prior to or during pressing, for providing a larger mass of
particles per unit horizontal area in the central zone, as compared
to the mass of particles per unit area in an outward zone. The
particles may be distributed prior to or during pressing by
providing a larger mass of particles per unit volume in the central
zone. Moreover the larger mass per unit area of particles may be
provided by performing the pressing in a die having a cavity and
filling a central portion and a surrounding portion of the cavity
with said particles in respectively greater and lesser depths.
In those elements having central and outward zones, the enhanced
apparent volumetric compression ratio may also be provided by
effecting, during pressing, relatively larger and smaller ratios of
thickness reduction in the central and outward zones respectively;
and this is true whether the height of particles in that portion of
the body of particles corresponding to the central zone, prior to
or during pressing, is substantially the same or different, e.g.
greater, than the height of the particles in that portion of the
body corresponding to the outward zone. These larger and smaller
percentages of thickness reduction can be effected by performing
the pressing in a press having a ram and die cavity, with spaced,
opposed compression faces having respectively smaller and larger
clearances in central and surrounding portions of the space between
the faces, whether the smaller clearances are provided by a
protuberance on the compression face of the die cavity or by other
means.
Within the boundary zones of those elements which have boundary
zones the greater apparent volumetric compression ratio may be
provided in a variety of ways, including effecting, during
pressing, relatively larger and smaller ratios of thickness
reduction respectively in the boundary zone and in a further
portion of the element surrounded by the boundary zone, such as the
above mentioned outward zone. Here again, a press having a ram and
die cavity with spaced, opposed compression faces with relatively
smaller and larger clearances corresponding to the positions of the
boundary zone and the aforementioned further portion may be used.
The respective smaller and larger clearances may be provided by
protuberances on the compression face of the die cavity, on the
compression face of the ram or by other means.
The above-described elements may be embodied in a wide variety of
forms including for example those having planar surfaces and those
having a depression above or below the central zone and spaced
inwardly from the periphery of the element. That is, the element
may be provided with a central depression or depressions in its gas
infusion surface, its gas discharge surface or both. However, the
aforesaid depression(s) may or may not be coextensive with the
central zone. The depth and area of the depression(s) may be varied
as desired for enhancing the uniformity of gas distribution
laterally across the horizontal gas discharge portion of the
element, and the depth may vary in portions of, or throughout, the
depression(s). There may be one or more areas within the outline of
the depression(s) which are not depressed. Moreover the enhanced
apparent volumetric compression ratio of the boundary zone
discussed above, may be provided by forming the upper gas discharge
surface of the element above the boundary zone with a downward and
outward slope at an angle of depression in the range of about
20.degree. to about 80.degree. relative to the horizontal.
The above features are of assistance in providing gas diffusion
elements having the property of discharging gas in a substantially
uniform manner throughout an upper gas discharge surface of the
element with a coefficient of variation not greater than about
0.25, said coefficient of variation being based on the values of
bubble release pressure measurements at at least about 5 equally
spaced points along each of two mutually perpendicular reference
lines extending across said surface and through the center
thereof.
The above-described elements may be manufactured according to any
convenient method. However, FIGS. 21 through 29 disclose
illustrative methods which may be used if desired.
These illustrative methods are modifications of a previously used
method. In common with the prior method they employ a die 301
having a cylindrical cavity 302 defined in part by a compression
face or bottom wall 303 and side walls 304 and 305. The die is
filled with a loose mix of solid organic or inorganic particles
with or without binder which can be pressed and rendered coherent.
For instance, one may employ beads or granules of synthetic resin,
such as polyethylene or polystyrene, glass beads, granules of
inorganic materials such as metal particles, alumina, mullite,
silica and others. Organic and inorganic binders may also be
included in the mix. The mixes may be designed for developing
coherency by pressing and sintering and/or bonding, such as for
instance organic adhesive bonding, glass bonding, or ceramic
bonding.
In common with the known technique the die 301 is filled above its
upper surface 306 with a body of loose particulate solid material
310. Then, the excess material is struck off with a screed. Next, a
ram 317 having compression face 318 is moved toward the particulate
material and eventually engages same. Further travel of ram 317
presses the body 310 in die cavity 302, converting the body of
particulate material to various compacted forms. Withdrawal of ram
317 permits one to remove the resultant compacts from die cavity
302. Depending on the mix used, the compact may or may not be baked
or fired to produce the completed element.
A first example of the modified method, shown in FIGS. 21 through
23, begins with the shaping ring 400 removed, so that the die
cavity 302 is open. Particulate materials are introduced in
sufficient amount to fill cavity 302 and are levelled off at the
elevation of die upper surface 306. Onto said surface is placed a
shaping ring 400 having planar upper and lower surfaces 401 and 402
and perpendicular peripheral surface 403 representing its outer
edge. The ring also has an internal conical surface 404 defining a
central frustro-conical chamber open at the top and bottom. The
aforesaid chamber is initially empty because the body of
particulate material has previously been screeded off flush to the
die upper surface 306. However the chamber within internal conical
surface 404 is now filled with excess particulate material 405
which is then struck off with screed 312 to a level surface 406
flush with upper surface 401 of shaping ring 400. Upon careful
removal of shaping ring 400, there is left in die cavity 302 a body
407 of particulate material having an elevated central portion 408
with a flat top 409 and conical sides 410; however portion 408 can
have various shapes.
Body 407 and the above described technique of preparing same
constitute one example of providing a larger mass of particles per
unit of horizontal area in a central zone or region, as compared to
the mass of particles per unit area in an outward surrounding zone
or region. In this case, the larger mass of particles per unit of
horizontal area is provided by filling a portion of the die to a
greater depth than the surrounding portions.
However, a larger mass of particles per unit area can also be
provided by filling a central portion of the die with particles at
a greater density. For instance, one may fill the die cavity, level
the contents flush with the top of the cavity and then densify the
particles in a central region of the die by localized vibration or
pressing, which will cause the material in such region to sink
lower in the die than the surrounding material. The resulting
depression can be filled with additional particulate material prior
to pressing or final pressing as the case may be. This is an
illustration of distributing the particles prior to or during
pressing for providing a larger mass of particles per unit volume
in a central region or zone as compared to the mass of particles
per unit volume in an outward or surrounding region or zone.
Irrespective of whether the central region or zone of the die is
filled to a greater height and/or greater density the body of
material is then pressed as shown in FIG. 23. This produces an
element having an enhanced apparent volumetric compression ratio in
its central zone 413 (bounded by reference lines 413A, 413B) as
compared to the volumetric compression ratio in an outward zone
414, which in this case is an annular zone bounded at its inner
edges by reference lines 413A, 413B and by the peripheral edges of
the element indi-cated by 414A, 414B.
FIGS. 24 through 29 illustrate the preferred technique of providing
enhanced apparent volumetric compression ratio. More specifically
these figures disclose the technique of effecting, during pressing,
relatively larger and smaller ratios of thickness reduction in the
aforementioned central and outward zones, respectively.
According to one of the preferred techniques disclosed in FIGS. 24
and 25, the relatively larger and smaller ratios of thickness
reduction are obtained with the assistance of an annular insert 421
constituting a protuberance on the compression face 303 of die
cavity 302. Insert 421 includes a lower cylindrical projection 422
which mates with a corresponding socket 420 in die cavity lower
wall 303. The upper portion of insert 421 is a shaping member which
includes a flat top 424 surrounded by a conical surface 425. When
the die cavity 302 of FIG. 24 is filled, and the contents are first
made level with upper surface 306 and then compressed as shown in
FIG. 24, the resultant compact 426, shown in FIG. 25, includes a
planar air infusion surface 430 and a generally horizontal air
discharge surface 431 including a central depression 432 having a
flat area 433 and a beveled edge 434. This is an example of
enhancing the apparent volumetric compression ratio of the central
zone of a diffusion element by effecting, during pressing,
relatively larger and smaller ratios of thickness reduction in the
central and outward zones, respectively. In this case, the
respectively larger and smaller percentage of thickness reduction
have been effected by performing the pressing in a press having a
ram and die cavity with spaced, opposed compression faces with
respectively larger and smaller clearances in central and
surrounding portions of the space between the faces. In this case,
the smaller clearance is provided by a protuberance, i.e. insert
421, on the compression face of the die cavity; but it is also
possible to carry out this technique using a die cavity with a flat
bottom wall and a protuberance on the compression face of the
ram.
One can make a wide variety of modifications to the article and
manufacturing technique shown in FIGS. 24 and 25 without departing
from the invention. The shape, depth and area of the depression 432
may be freely varied to obtain the desired level of uniformity of
air distribution at the gas discharge surface 431 of the element.
The shape of the depression may include any desired outline which
contributes to uniform distribution of air flow; but preferably the
outline of the depression is similar to the outline of the element.
Within the outline of the depression, there may be a wide variety
of shapes as viewed in transverse cross section. The floor of the
depression may be composed wholly of straight or curved surfaces or
a combination of straight or curved surfaces. The center of the
depression may be flat as shown, or gently curved throughout or may
be in the form of an extremely flat cone or may have any other
convenient or desireable shape which accomplishes the purposes of
the invention. The showings of depressions including flat areas and
beveled edges shown in the drawings herein are simple and preferred
but are by no means intended to limit the invention.
As indicated above, the area of the central depression is not
necessarily coextensive with the area which establishes the central
zone of the element. The depression may terminate within or extend
beyond the area which defines the central zone. However, it is
convenient for purposes of design to establish the area of the
depression in such a way that is coincident with the area which
defines the central zone of the element.
One may select any combination of area and average depth for the
depression which are sufficient for significantly enhancing the
uniformity of gas distribution laterally across the gas discharge
portion of the element. For example, the area of the depression may
comprise about 10 to about 80 percent, preferably about 25 to about
70 percent and more preferably about 45 to about 65 percent of the
total area of the element gas discharge surface or of the total
area of the element, while the average depth of the depression may
be about 2 to about 20 percent, preferably about 4 to about 15
percent and more preferably about 5 to about 10 percent of the
average thickness of the horizontal portion of the element.
The depth of the element may vary within its outline, in either a
stepwise or gradual fashion, the latter being preferred. Most
preferably the variation occurs gradually along gradually sloping
portions of the gas discharge surface. It is also contemplated that
there may be certain areas within the outline of the depression in
which there is no depression. Such is illustrated by FIG. 26.
FIG. 26 discloses an element which can be formed for example, by a
modification of the technique shown in FIG. 25. The insert 421 is
replaced by an annular insert 440 having an annular rib 441 in its
underside which engages a correspondingly shaped annular channel
442 in the bottom wall 303 of die cavity 302. Annular insert 440
includes a flat top 443 with beveled inner and outer edges 444,445.
When the thus modified die cavity 302 is employed, the resultant
element, shown in the upper portion of FIG. 26, includes a
depression 449 of annular shape, having tapered edges 450,451 and
including a non-depressed center portion 452. Within the body of
the circular element thus formed is a circular central zone whose
boundaries are indicated by 413A,413B, surrounded by an outward
zone extending from 413A,413B to the cylindrical peripheral surface
of the element indicated by 414A,414B.
As illustrated in FIG. 27 the outward zone of the element does not
necessarily extend to its extreme peripheral edge. The cylindrical
die cavity 302 includes a circular insert 421 in its bottom wall
303. A step is formed about the periphery of bottom wall 303 where
it joins side wall 304 and 305, said step including vertical
cylindrical surface 324 and horizontal annular surface 325.
Production with such a die produces an element as illustrated in
the upper portion of FIG. 27. This element includes a gas discharge
surface 431 having depression 432 with tapered edges 434 within the
bounds 413A,413B of the central zone of the element. The vertical
cylindrical surface 324 and horizontal annular surface 325 of the
die cause the extreme peripheral portion of the element to include
a vertical cylindrical edge 230, horizontal surface 231 and
vertical side surface 232 defining a step in the edge of the
element. That portion of the volume of the element bounded by
planar air infusion surface 430, vertical cylindrical edge 230,
horizontal annular surface 231 and reference lines 460A,460B define
an annular peripheral zone of reduced permeability, greater density
and lesser average height as compared to the permeability, density
and average height of the relatively inward and adjoining portions
of the element. In this element the outward zone is bounded
inwardly by reference lines 413A,413B and at its outer edge by
reference lines 460A,460B.
FIG. 27 represents a way of improving the uniformity of air
distribution of a porous gas diffusion element such as for instance
that shown in FIG. 20A. Formation of a peripheral zone of lesser
height or greater density or lesser permeability affects not only
the flow characteristics of the peripheral zone itself, but also
the characteristics of the relatively inward portions of the
element, tending to concentrate flow in a central zone. By
providing an enhanced apparent volumetric compression ratio in the
central zone, the foregoing tendency can be countered, equalized or
eliminated.
FIG. 28 illustrates how the present diffusion element may include a
boundary zone adjacent to a peripheral zone. From the description
of the element without a depression in FIG. 20A and the testing
thereof as illustrated in that figure, it will be recalled that the
vertical side surface 232 of said element tended to exhibit a
second minimum 286A,286B of bubble release pressure and a
corresponding peak 291A,291B on the flow rate curve 277, indicated
by dashed lines 282A,282B. The tendency for the flow to peak in
this area of the element may be considered undesireable, depending
on a number of factors such as for instance the type of holder and
sealing arrangement adopted in mounting the element in a diffusion
system. Where the element is mounted in such a manner that it is
free to discharge bubbles through vertical side surface 232 into
the medium to be aerated, there is a tendency for the surface to
produce undesireably large bubbles and high flux rate. Moreover, if
the surface 232 discharges into a crevice which can be swept clear
of water (and thereby freed of surface tension) by the bubbles
emanating from the pores in surface 232, a disproportionate share
of the total air flow will be shifted to said surface. This
tendency may be countered, equalized or overcome by a variety or
combination of techniques including, for example, covering the
surface 232 with an inmpermeable layer which is held or adhered in
place, by utilization of seals and diffusion element holders of
proper design, by the modification shown in FIG. 28, by a
combination of these measures or by any other desired means.
FIG. 28 illustrates a diffusion element which includes a boundary
zone adjacent to and inwardly of the peripheral zone, the solid
particles having been pressed to a greater apparent volumetric
compression ratio in the boundary zone as compared to the
aforementioned outward zone. This is accomplished for instance by
modifying the die cavity 302 to include a fillet 461 at the base
of, and extending inwardly of, the step formed by vertical
cylindrical surface 324 and horizontal annular surface 325. This
fillet may for instance be at an angle relative to the horizontal,
or relative to the surface of the aforementioned outward zone
(especially if the latter is not perfectly horizontal), in the
range of about 10.degree. to about 70.degree.. In other respects
the die of FIG. 28 is identical to that shown in FIG. 27. Thus FIG.
28 is one example in which larger and smaller percentages of
thickness reduction have been effected by performing the pressing
in a press having a ram and die cavity with spaced, opposed,
compression faces and wherein there are relatively smaller and
larger clearances in those portions of the space between the faces
which correspond to the positions of the boundary zone and the
aforementioned outward zone in the diffusion element. In this
particular instance, the smaller clearance is provided by a
protuberance on the compression face of the die cavity, i.e. fillet
461.
When an element is pressed in the die of FIG. 28, the resultant
element shown in the upper portion of FIG. 28 includes a beveled
edge 462 which is at an angle alpha relative to the horizontal. For
the style of plate shown in FIG. 28, 25.degree. is considered the
optimum value of alpha. The benefits of providing the beveled edge
462 were not foreseen when the concept of central volumetric
compression ratio enhancement was developed. However, experience
gained from working with the central depression concept and the
above described bubble release pressure measuring technique have
led to some hypothetical explanations for the possible effects of
beveled edge 462.
As noted previously, the existence of a low bubble release pressure
region in vertical side surface 232 as indicated by the second
minima 286A, 286B of bubble release pressure curve 276 in FIG. 20B
is unexpected. Perhaps this phenomenon may be explained in
retrospect by a theoretical consideration of the flow of particles
within the cavity. Inasmuch as the solid particles between ram
compression face 318 and horizontal annular surface 325 are
subjected to greater compression than the adjoining particles
between ram surface 318 and die bottom wall 303, downward and
inward force vectors may possibly develop in the material above
surface 325 as some of the particles, under compression, migrate
downwardly and inwardly in the compact. Vertical side surface 232
may be shielded somewhat from such vectors by the inner edge of
horizontal annular surface 325, whereby the material along surface
232 is less compacted than that along surface 231, imparting
respectively greater and lesser permeability to said surfaces.
It is theorized that the fillet 461 in the die of FIG. 28 can exert
a crowding effect on the material above it, creating next to the
outward zone a ring-like boundary zone bounded at its outer edges
by reference lines 460A, 460B adjacent annular peripheral zone 229
and bounded at its inner edge by reference lines 463A, 463B. This,
we believe, tends to bring the bubble release pressure--and
therefore the potential flow rate--of the surface 232 into a more
favorable balance with the remainder of the element, which may be
indicated by a reduction in the above-mentioned permeability
difference.
FIG. 29 discloses an alternative technique for providing the larger
and smaller percentages of thickness reduction referred to above.
More specifically, in FIG. 29 the smaller clearance is provided by
a protuberance on the compression face of ram 317. For example, as
shown in FIG. 29 the compression face 318 of ram 317 includes an
annular rib which may for instance extend full circle around
compression face 318 a short distance inwardly of its peripheral
edge. This rib may be of any desired cross section but is
preferably arcuate. It may have any suitable depth consistent with
the structural integrity of the peripheral edge of the element and
which is suitable for producing the desired enhancement of apparent
volumetric compression ratio. Representative depths would be those
stated above for the central depression 432.
In this embodiment, the die cavity 302 may include the fillet 461
of FIG. 28 but preferably is like the die cavity of FIG. 27 having
insert 421 and a step defined by surfaces 324 and 325. When this
die cavity and the ram 317 of FIG. 29 are employed, the resultant
element is as shown in the central portion of FIG. 29. The annular
rib 466 produces a corresponding annular groove 467 in the air
infusion surface 430 of the element. The groove 467 may be
positioned so that its shape intersects with or is slightly inward
of the edge of the peripheral zone or the projected surface of
vertical side surface 232. Thus, while annular groove 467 should be
situated at least in part within the boundary zone of the element,
it may project to some extent into the peripheral annular zone 229.
An element having an annular groove 467 positioned as shown in FIG.
29 will include central, outward, boundary and annular peripheral
zones delineated by reference lines 413A,413B; 463A,463B;
460A,460B; and vertical cylindrical edges 230 in the same general
manner as the element of FIG. 28.
Elements with boundary zones are illustrated by FIGS. 28 and 29 and
have the advantage that their side surfaces 232 have an increased
bubble release pressure. Thus they may suffer less or not at all
from the disadvantages described above in respect to the FIG. 20B
and 27 element. Thus, diffusion elements with or without central
enhancement of apparent volumetric compression ratio, and with
peripheral zones that have been rendered semi-permeable or
substantially non-permeable, can be improved if desired by
enhancement of the apparent volumetric compression ratio in a
boundary zone adjacent to and inwardly of the peripheral zone.
The benefits of providing a boundary zone are illustrated
graphically in FIGS. 30 and 31, which show respectively the
diffusion elements of FIGS. 27 and 28, without and with boundary
zones, respectively. Using the bubble release pressure testing
procedure of FIG. 20 and a form of graphical representation similar
to that Figure, one may develop bubble release pressure (B.R.P.)
curves A and B for the respective elements. Comparison of these
curves shows that without the boundary zone there is a minimum M in
the bubble release pressure curve at the element vertical side
surface 232. When the boundary zone is provided, the bubble release
pressure is increased in the area of surface 232 as shown by curve
B in FIG. 31. In view of the inverse functional relationship of
flow to bubble release pressure, the presence of the boundary zone
enables one to control the flow from surface 232, making it less
than the flow through the center of the element.
Although the benefits of the boundary zone have been illustrated
above by its effect upon a vertical surface, i.e. surface 232, the
vertical surface is not required. The upper surface of the boundary
zone may for example be a non-vertical surface, such as an
outwardly and downwardly inclined surface extending all the way
from the upper surface of the element to the upper surface of the
peripheral zone at an angle of depression of, for example, about 30
to about 70 degrees, and more preferably about 35 to about 60
degrees, relative to the horizontal.
In FIGS. 23 through 29 there have been shown diffusion elements in
which reference lines such as 413A, 413B; 460A, 460B; 463A, 463B
and so forth have been used to generally indicate the lateral
bounds of various zones such as the central zone, outward zone,
boundary zone and peripheral zone. These reference lines have not
been drawn to scale nor should they be taken to mean that there
should be a clearly identificable vertical line of demarcation
between the respective zones in actual products according to the
invention. In diffusion elements within the scope of the invention,
it may not be possible to draw any line of division between zones
where material of significantly greater and lesser density or
compaction will be found immediately to either side of the division
between two zones. Rather these bounds have been given to
illustrate the lateral extent of a volume which, when compared as a
whole with an adjacent volume, exhibits the desired difference in
apparent volumetric compression ratio.
It is believed that many applications of the invention will involve
elements wherein the apparent volumetric compression ratio of the
central zone has been enhanced, relative to the outward zone, by at
least about 2%, more particularly about 2 to about 20% and
preferably about 3 to about 15%. The foregoing percentages are
obtained by expressing the difference in apparent volumetric
compression ratios of the two zones as a percentage of the
volumetric compression ratio of the outward zone. Similarly, most
applications of the invention will involve enhancement of the
apparent volumetric compression ratio of the boundary zone,
relative to a further portion (such as the outward zone) of the
diffusion element surrounded by the boundary zone, by at least
about 10%, more particularly by about 10 to about 35% and
preferably by about 35 to about 100%.
In principle, the invention is not limited to diffusion elements of
a specific pore size, but many applications of the invention will
involve diffusion elements in which the pore size is in the range
of about 60 to about 600 microns, more particularly about 90 to
about 400 microns and preferably about 120 to about 300 microns as
computed in applying the bubble release pressure to the equation
shown in ASTM E-128 D=30.gamma./P wherein D=maximum pore diameter
.gamma.=surface tension of the test liquid in dynes/cm, and
p=pressure in mm of Mercury.
Generally, unused diffusion elements in accordance with the
invention will have a specific permeability in the range of about 6
to about 200 SCFM, more particularly about 12 to about 70 SCFM and
most preferably about 15 to about 35 SCFM in the case of alumina
and silica sewage aeration diffusion elements.
While most diffusion elements in accordance with the invention will
have a bubble release pressure in the range of about 2 to about
20.mu. and more particularly about 4 to about 15, the most
preferred bubble release pressure for the preferred sewage aeration
diffusion elements disclosed herein is about 5 to about 10.
The above-described techniques of enhancement of apparent
volumetric compression ratio may be used to produce any desired
amount of improvement in the uniformity of flow distribution across
a diffusion element, and it would be virtually impossible to
predict the minimum degree of improvement which might ever be
considered functionally significant, given the potential for
changes in the quality of instrumentation and technological need.
However, certain classes of diffusion elements are illustrative of
the type of benefits which can be produced. These include diffusion
elements wherein the coefficient of variation of the gas discharge
surface is not greater than about 0.25, based on the values of
bubble release pressure measurements of at least five equally
spaced points along each of two perpendicular reference lines
extending across the surface of the element and through the center
thereof. More preferred examples include diffusion elements, as
just described, in which the coefficient of variation is in the
range of about 0.05 to about 0.25 or more preferably less than
about 0.05.
As previously disclosed the solid particles in the boundary zone of
a diffusion element according to the invention can be pressed to a
greater apparent volumetric compression ratio as compared to the
particles in the outward zone by forming the upper gas discharge
surface above the boundary zone with a downward and outward slope
at an angle of depression in a range of about 10 to about 80
degrees relative to the horizontal, with many applications of the
invention falling in the range of about 20 to about 70 degrees and
more preferably about 25 to about 65 degrees, with about 25 degrees
being considered the optimum for the preferred sewage aeration
elements.
When at least a portion (including all) and preferably at least a
major portion of the diffusion elements in a given gas treatment
system are mounted on separate or individual plenums, so that each
of the respective plenums and each of the respective elements in
such portion are supplied with treating gas and/or cleaning gas
through separate or individual flow control means, certain
advantages accrue in respect to gas distribution and/or fouling
rate and/or cleaning efficacy. The flux rate or rate of gas
discharge per unit area of a multi-pore diffusion element
influences the size of the bubbles formed and the efficiency of the
diffusion element expressed as the fraction of oxygen or other
treating gas absorbed, e.g. oxygen transfer efficiency (OTE).
Generally higher flux rates result in lower efficiencies. Further,
with a given number of elements being supplied a given rate of air,
the maximum efficiency will be obtained when all the diffusion
elements are operating at a uniform flux rate. However, in the
manufacture of diffusion elements there are usually variations in
such properties as permeability, dynamic wet pressure and others.
More specifically, diffusion elements which are normally made in
the same way, to the same specifications, can differ significantly
from one another in permeability and other properties. FIGS.
32A-32B illustrate how the resultant pressure/flow relationships of
such elements can also differ significantly.
Assume that there are two diffusion elements, one having a
permeability of about 12 and the other having a permeability of
about 9. Assume further that they are mounted without the
above-mentioned separate or individual flow regulating means in
such a manner as to be supplied with air at substantially the same
pressure through a common plenum to deliver a combined flow of
approximately 2.6 SCFM for an average of about 1.3 SCFM per
element.
Curves AB and CD respectively of FIG. 32A indicate the air rates
for the above elements at various pressure drops, measured in
inches of water gauge, while an intermediate curve provides similar
information for an element of average (10.5) permeability. At a
typical pressure drop of about 7 inches in water gauge, it will be
seen that the flow rate through the element having a permeability
of 9 will be about 6 SCFM, while the flow for the 12 permeability
element will be about 2.0.
FIG. 32B is a plot of the pressure flow characteristics of the same
two elements mounted on separate plenums which are furnished with
air from a common distribution pipe, each through a 5/16 inch
diameter control orifice. In FIG. 32B, the curves A'B' and C'D'
respectively indicate the air rates for the above elements at
various pressure drops, while an intermediate curve provides
similar information for an element of average permeability. From
the figure it may be seen that in order to discharge 2.6 SCFM
through the two diffusion elements, (average of 1.3), the pressure
drop would rise to about 11.0 inches of water gauge due to the
effect of the orifice control. The corresponding flow through the 9
permeability element would be about 1.2 SCFM while the flow through
the 12 permeability element would be about 1.4. The ratio of the
flux rates of the two elements in this case is about 1.2:1 rather
than about 3.3:1 as it was in the first case. The air and the power
required to provide it will be more effectively used in diffusion
elements with separate flow regulating means than in diffusion
elements not so equipped.
Additional advantages accrue from the use of individual plenums fed
through individual flow regulators. In the case of some organic
slimes which are believed to foul the diffusion element surfaces
more severely at low flux rates, the disparity between the flux
rates of diffusion elements of different permeabilities increases
more rapidly with time when the elements are mounted on a common
plenum, than when they are mounted on separate plenums with
individual flow regulating means. Additionally, in cleaning, those
elements which have lowest permeability and may thus be most in
need of cleaning will receive the least cleaning gas.
Unfortunately, those elements which have the highest permeability,
and may thus have a lesser need of cleaning, will receive the most
cleaning gas. Moreover, the disproportionate flow relationship just
described tends to become more aggravated as the cleaning cycle
progresses and the more permeable diffusion elements become
clean.
According to one embodiment of the invention, the use of elements
with separate or individual flow control means as above described
is preferably practiced in a system in which at least about 90%
(and preferably about 95% or more) of the diffusion elements which
receive gas at a uniform pressure are capable when new and
preferably also after use and thorough cleaning of delivering a
flow rate in SCFM per square foot, which is within about .+-.15%
and more preferably within about .+-.10% of the average flow rate
of all such elements, when operated at 2" w.g. in a dry unsubmerged
condition.
A particularly preferred embodiment of the invention is shown in
FIG. 33, in which may be seen a schematic representation of a
portion of an aeration system for a tank type aeration process. The
tank 470 comprises a bottom wall 471 and upright walls including
wall 472 which contain a liquid medium having an upper surface 474.
Wall 472 has its upper edge 473 at ground level, adjacent to which
is a walkway (not shown) provided with the usual safety rails (not
shown). In this case, the treatment gas system 480 is an aeration
network including blowers (not shown), equipped with the usual
filters, pressure regulators, valving and the like, connected to
supply air to yard piping 481. Through a follower flange 482 the
latter supplies air to a stainless steel drop pipe 483 which
extends from a position above the water surface 474 to a coupling
484 below water surface. At coupling 484 a further drop pipe of
corrosion resistant material such as PVC or polybutylene plastic
pipe is joined to the first drop pipe 483. The second drop pipe 485
extends further downward in the tank to a slip flange 486 and T
arrangement 491 through which drop pipe 485 communicates with a
generally horizontal header pipe 487 extending generally
perpendicular to tank wall 472. Through a plurality of short
vertical connectors 488 extending downwardly from header 487 the
latter is connected to a plurality of parallel air distribution
pipes 489 which extend generally parallel to tank wall 472.
Arranged along distribution pipes 489 at suitable intervals, e.g.
about 1 to about 4 feet, are a plurality of diffusers 490
comprising a combination of flow regulating means, plenums and
diffusion elements depicted in FIGS. 2 through 6. The diffusion
elements have the preferred characteristics set forth herein for
multi-pore diffusion elements, exhibit the characteristics and
dimensions set forth in respect to the diffusion elements depicted
in FIGS. 3, 4 28 and 28A and have an average permeability of about
10.5.+-.15% for a 0.41 sq. ft. by 1 in. thick element.
The gas cleaning system 500 of this embodiment includes a traveling
scale 501 equipped with rollers whereby it may be moved along the
above mentioned walkway at the tank edge 473 and has an indicator
502. A cylinder 503 for the storage and discharge of cleaning gas
rests on the traveling scale 501 and is connected via gas regulator
504, valves 505, 506, flow meter 507, plastic tubing 508 and elbow
509 to that portion 485 of the drop pipe which is of plastic
material and is situated below the water line 474. In this
schematic view the plastic tubing 508 is shown to be spaced from
the drop pipe sections 483, 485 but in actual practice it will be
beneficial to strap the plastic tubing securely to the exterior of
the drop pipe or to run the tubing along the inside of the drop
pipe sections.
The cylinder 503, scale 501 combination above is considered the
most convenient arrangement at present for supplying cleaning gas.
However a wide variety of alternatives are possible, only a few of
which can be referred to herein. For example the cylinder 503 may
be replaced by a burner which is adapted to burn a fuel such as
sulphur that can be oxidized to a cleaning gas such as sulphur
dioxide. Alternatively the cylinder could be replaced with a
liquid-gas contacting apparatus in which a liquid source of
cleaning gas, such as aqueous acid or solvent, is sprayed in
concurrent or countercurrent flow with treatment gas whereby the
cleaning gas is introduced into the treatment gas by vaporization
or extraction. If carbon dioxide is employed as cleaning gas, it
may be obtained from anerobic digester gas which typically contains
both carbon dioxide and methane, from which the carbon dioxide may
be stripped and recovered for use as cleaning gas. Moreover, the
methane may be burned to produce energy, water and carbon dioxide
which may additionally be employed as cleaning gas.
However, for reasons of efficacy, cost and ready availability, the
use of HCl is considered to be best. Mole fractions of HCl gas to
air in the range of about 7.5.times.10.sup.-5 to about
3.1.times.10.sup.-2 or more may for example be used. Against
foulants similar to those described in the examples which follow it
is contemplated that HCl gas added at a mole fraction of about
3.1.times.10.sup.-2 would require a cleaning cycle in the range of
about 30 to 40 minutes while a mole fraction of about
6.6.times.10.sup.-3 would require approximately 4 times as long. In
either case the total amount of gas consumed would be about 0.25
pounds per diffusion element. At a gas cost of about $0.50 per
pound the material cost to clean a diffusion element would be about
$0.125. This compares favorably with the cost of refiring the
diffusion elements which has been estimated at up to $7.00 per
element. It should of course be appreciated that the above
mentioned times and gas consumption will vary widely depending on
the nature of the foulant deposit(s).
It is our present recommendation to clean the above described 0.41
sq.ft. diffusion elements at a rate of about 2.5 to about 3 SCFM
per element which is the approximate equivalent of about 6 to about
8 SCFM per square foot of active discharge area. In general it is
recommended that the mole fraction of HCl should be about
4.times.10.sup.-5 or more, preferably about 8.6.times.10.sup.-5 or
more and most preferably about 4.times.10.sup.-4 or more, with
about 5.7.times.10.sup.-5 to about 3.1.times.10.sup.-2 and about
6.6.times.10.sup.-3 to about 3.1.times.10.sup.-2 being particularly
preferred ranges. It is understood that the above mole fractions
are all applicable to use at atmosphere pressure. Where gas
pressure at the point of bubble release is other than atmospheric,
the values should be corrected by multiplying by 760 and dividing
by the total gas pressure at the point of bubble release, expressed
in mm of mercury.
EXAMPLES
The following non-limiting examples illustrate the invention. The
examples were performed in an experimental apparatus, shown
schematically in FIG. 34, designed and operated to produce an
environment in which ceramic diffusion elements would become fouled
with inorganic precipitates of calcium and iron at a faster rate
than would normally be encountered in the field. Small test
fixtures were fabricated with diffusion elements of uniform
thickness having approximately one square inch of active gas
discharge area, the latter having been cut from standard production
run Sanitaire (Trademark) diffusion elements made in accordance
with standard Sanitaire production specifications consistent with
the criteria applicable to the diffusion elements of FIGS. 3 and 4.
These were placed in the above mentioned environment and operated
in a controlled fashion to observe the relative rate of rise of
dynamic wet pressure across the elements and the relative success
of various operational and cleaning techniques.
Into the FIG. 34 apparatus is introduced Milwaukee city tap water
520 from Lake Michigan, using a bellows-type pump 521, at a rate of
from about 250-280 cc/sec. Via conduit 522 the water enters a
closed contact chamber 523 to which gaseous CO.sub.2 is added at a
rate of about 2-4 sec/sec. The source of CO.sub.2 is a cylinder 528
of compressed CO.sub.2 gas which is regulated by regulator 529 to
an approximate output pressure of 10 psi upstream of an
appropriately sized rotameter 530. The flow from rotameter 530 is
regulated by metering valve 531 which feeds via conduit 532 into
the contact chamber 523. There, the CO.sub.2 gas bubbles through
the tap water from conduit 522. Both the water and CO.sub.2 enter
near the bottom and exit near the top of the chamber, which is
covered to facilitate dissolving CO.sub.2 in the water. The latter
is then introduced via transfer line 537 into the bottom of
limestone column 538, containing limestone chips, and flows upward
through the limestone, exiting near the top of the column. Via
supply line 539 the water is sent to aeration tank 552.
Reagent tank 545 contains FeSO.sub.4 prepared from FeCl.sub.3
acidified with H.sub.2 SO.sub.4. The FeSO.sub.4 is drawn from tank
545 by draw pipe 546 and metering pipe 547, and sent through feed
line 548 to its intersection with supply tube 539, at which a
mixture is formed which contains 5 mg per liter of Fe.sup.++ ion in
the liquid introduced into aeration tank 552. Said tank has bottom
wall 553, side walls 554 and an open top, and is sized to retain a
bath 555 of liquid for an average retention time of about 2 hours.
The liquid enters at the surface at one end of the tank and
discharges into a weir 556 at the liquid surface at the opposite
end and is discharged to a floor drain 557.
The aeration test fixtures 580, previously mentioned, are placed in
the bottom of said aeration tank 552. Each includes a plenum
constructed of a short cylindrical section 581 of PVC pipe with
flat PVC sheets serving as the top 583 and bottom 582 of each
plenum. A sample of ceramic porous structure approximately 1 inch
wide, 1 inch long and 1 inch thick was cemented into the top of
each plenum 580. Each plenum is equipped with an air inlet and a
liquid purge line (not shown) and contains sufficient lead ballast
to maintain each fixture securely on the tank floor 553. The source
of air 560 for each ceramic sample is an air compressor 562 which
draws air through filter 561 and discharges via storage tank 563 to
pressure regulator 564 to regulate the outlet air pressure to about
40-50 psig upstream of flow metering valve 565. This valve delivers
a controlled flow of air through conduit 566 to an air manifold 570
which is common to all the test plenums. The air flow via branch
lines 571 to each test plenum is individually controlled by
metering valves 574. Means (not shown) are provided to add
controlled levels of humidity to the gas mixture introduced into
the plenums. In the branch lines 571, upstream of each plenum, are
valve-controlled taps 590 used to monitor dynamic wet pressure over
the course of the experiment. Dynamic wet pressure (DWP) is
determined with a water-filled manometer 597 connected to taps 590
through a common conduit 596. DWP is equal to the total pressure
differential (.DELTA.P) across the elements minus the height of
liquid above each test fixture in test bath 555.
Down stream of the pressure taps 590 and upstream of each plenum in
branch lines 571 are valve controlled taps 603 through which
cleaning gas(es) may be introduced into branch lines 571 to form an
admixture with the treating gas prior to entering the plenums and
diffusing through the ceramic elements. The source of treating gas
is a cylinder 601 containing compressed HCl gas whose flow is
controlled in a manner similar to that of the CO.sub.2 gas, through
a pressure regulator 602 and rotameter (not shown) to the
valve-controlled taps 603.
Alternatively, where practical, solutions containing the active
agent, e.g. HCl, may be used to furnish cleaning gases by stripping
them from solution with air or other gas. In this way the cleaning
gas may be furnished in a carefully controlled ratio of cleaning
gas to treating gas to permit an evaluation of the effective limits
of the cleaning gas with requisite periods of addition to achieve
acceptable reductions in DWP. In the experiment schematically
described in FIG. 34 the solution-stripping method of gas
generation was used to facilitate measuring and controlling the
relatively small flow rates at which treating gas was fed to each
ceramic element, e.g. about 15-22 sec/sec., as well as the flow of
cleaning gas, which may be in the order of 3% to small fractions of
1% of the treating gas flow. Evolution of small quantities of
cleaning gas is very conveniently accomplished by bubbling the
treating gas stream, air in this instance, through appropriate
strength solutions of cleaning gas, e.g. liquid hydrochloric acid,
whose solution strength is only very gradually altered with time,
whereby a nearly constant mole ratio of cleaning gas to treating
gas may be fed and maintained for relatively long periods of
time.
Typical data obtained in the above experimental program are
depicted in FIG. 35, which plots the log of DWP in inches of water
gauge versus the total elapsed time of the experiment for two
ceramic test specimens operated under different control programs. A
description of these curves is as follows: Curve No. 1 represents a
control philosophy which permits the DWP to rise to approximately
3.5 times the initial DWP value prior to initiating gas cleaning,
whereas Curve No. 2 allows a DWP rise of only 1.5 times the initial
value prior to .[.cleaning.]. .Iadd.fouling, i.e. the base
condition.Iaddend..
Curve No. 1
The portion of the curve from point A to point B represents the
gradual deposition of foulant materials on the surface of the test
diffusion element, causing a gradual rise in DWP until the limiting
condition of 3.5 times the initial DWP is reached. At this point,
after approximately 1100 hours of continuous operation, in-place
gas cleaning was attempted using chlorine gas (Cl.sub.2), which is
represented by line B-C. A more detailed plot of line B-C is shown
in FIG. 36 in which the time scale has been expanded. Prior to the
addition of chlorine gas to the treating gas the plenum was
carefully drained of any liquid by removing it from the aeration
tank while maintaining the flow of treating gas and carefully
tipping the unit on its side and allowing the liquid to discharge
through the purge line (not shown). After replacement of the unit
into the aeration tank and prior to gas cleaning, the air flow rate
through the diffusion element in the unit was carefully observed
and adjusted as necessary and its DWP was measured. This DWP, equal
to about 28 in.wg. and shown as time zero on the expanded scale of
FIG. 36, is point B of FIG. 35. At this time chlorine gas was
introduced into the treating gas stream at a sufficient rate to
produce a mole ratio of chlorine to air (treating gas) of about
9.25.times.10.sup.-3. A cylinder (not shown) of compressed chlorine
gas replaced the HCL cylinder 601 for this portion of the
experiment. After about 540 minutes of continuous chlorine addition
the DWP dropped from the initial 28.0 in.wg. value to about 12
in.wg. which is point C on FIG. 35.
Since point B is 20 in.wg. above the initial DWP and point C is 4
in.wg. above the initial DWP the reduction in DWP with the chlorine
gas is equivalent to a (20-4)/20.times.100 or an 80 percent
reduction of the incremental DWP increase.
From point C to point D no cleaning gas was applied to the unit. At
point D, gas cleaning with HCl was initiated, which reduced the DWP
from about 14.4 in.wg. at point D to about 8 in.wg. at point E. The
mole ratio of HCl to treating gas during this period was about
6.5.times.10.sup.-3 compared to the use of a molar ratio of
9.25.times.10.sup.-3 with Cl.sub.2 gas between points B and C.
Thus, as is apparent from both FIGS. 35 and 36, the use of HC1 gas
appeared to further reduce the DWP from the equilibrium value of
DWP obtained by use of chlorine gas alone to the initial or base
DWP condition of the element, which was 8.0 in.wg.
Two additional fouling and cleaning cycles are depicted on FIG. 35
for Curve No. 1. The lines E-F and G-H are similar to line A-B,
where treating gas was the only gas applied during these periods of
time and foulants were being deposited on the element with a
resultant rise in DWP.
Lines F-G and H-I represent two cleaning cycles similar to the
cycle described between point D and point E, where the cleaning gas
was HC1 at an approximate mole ratio of HCl to treating gas of
about 6.5.times.10.sup.-3. These two cleaning cycles are also shown
on FIG. 36 which indicates that the amount of HCl gas appears
substantially more effective than the chlorine at a
9.2.times.10.sup.-3 mole ratio, not only in respect to the quantity
of chemical required, but also in respect to the degree of
restoration and shorter time interval required to reach equilibrium
conditions with respect to DWP.
It is of interest that the scaling cycles represented by the time
intervals between points A and B, E and F and G and H are
relatively regular in their duration and that successive cleaning
attempts appear to .[.the.]. .Iadd.be .Iaddend.equally successful,
indicating that this cycle may be repeated numerous times without
loss of effectiveness.
Curve No. 2
The cleaning strategy for the test specimen indicated by Curve No.
2 was to clean the ceramic element each time the DWP reached a
level which was equivalent to about 1.3 times its initial value of
8.0 in.wg. Since FIG. 35 is plotted chronologically with time it is
apparent that the start-up or initial operation of the unit
depicted by Curve No. 2 was at about 1900 hours from the start-up
of the experiment overall.
The general characteristics of Curves No. 1 and 2 are similar. Five
fouling and cleaning cycles however are depicted with Curve No. 2
and in each cleaning cycle HCl gas was used at a mole ratio of
about 6.5.times.10.sup.-3 with the treating gas, similar to the
cleaning cycles D-E, F-G and H-I of Curve No. 1. FIG. 36 shows one
of the characteristic cleaning cycles for Curve No. 2 on the
expanded time scale. All the cleaning cycles generated show similar
DWP decreases with time and as with HCl gas cleaning in Curve No.
1, complete restoration of the initial DWP was obtained in each
case.
As with curve No. 1, the relative period of fouling from cycle to
cycle for Curve No. 2 is somewhat variable; however there are no
consistent trends towards reduced or increased intervals before the
limiting DWP is reached from the previous base condition. Under
field conditions of scaling and/or organic fouling one or the other
of the cleaning philosophies indicated by Curves No. 1 and 2 may be
preferred over the other, depending upon many factors including,
for example, the cost of power, the rate of DWP rise, and the loss
in aerator performance with time.
Definitions
Apparent Volumetric Compression Ratio
For purposes of the present invention the "apparent volumetric
compression ratio" is used as a basis for comparison of two or more
zones of an element formed from a body of solid particles which has
been shaped, pressed and rendered coherent by bonding or sintering
in a compacted form having pores. As applied to a given zone, said
ratio constitutes the quotient obtained when the height of material
prior to pressing is divided by the height of material after
pressing within said zone. Although it is recognized that pressing
may cause some lateral migration of material from one zone to
another, with limited effects on the observed compression ratio,
such migration can be and normally is ignored, hence the reference
to the compression ratio as "apparent". If the height of material
differs at different locations within a zone either prior to or
subsequent to pressing, an average height is used which is weighted
on the basis of area in plan view. The height of all material
subjected to compression is considered part of the height prior to
compression. Therefore, if an additional height of material is
placed upon an original quantity of material which has already been
compacted, such as by preliminary partial pressing or vibration
compaction, the height of the added materials is included in the
computation; more specifically, in determining the quotient, the
divisor is the fully compacted height of all the material and the
dividend is the uncompacted height of both the original and
additional material.
Base Condition
This refers to a dynamic wet pressure or to a mean bubble release
pressure exhibited by a multi-pore diffusion element at a selected
point in the operational history of the diffusion element. It is
permissible, for example, to employ as the base condition that
pressure exhibited by a multi-pore diffusion element under any of
the following circumstances or under whichever of the following
circumstances last occurred in the operational history of the
element: (a) when first put into operation in the treatment of a
liquid medium containing at least one foulant, (b) when last
cleaned with a cleaning gas, (c) when last cleaned with means other
than cleaning gas, (d) when last maintained in contact with a
liquid medium without discharging gas, or (e) at the lowest
pressure previously recorded.
According to a particularly preferred embodiment of the invention
the dynamic wet pressure or mean bubble by the element when
manufactured or when first put into operation in the treatment of a
liquid medium containing at least one foulant. The base condition
just described may be and preferably is employed as the base
condition in a first and/or subsequent gas cleaning of the element.
Thus, according to a particularly preferred embodiment of the
invention the reduction of dynamic wet pressure or mean bubble
release pressure or both in a first and at least one subsequent gas
cleaning is substantial and is calculated based on the base
condition of the diffusion element as manufactured or when first
used. Preferably, in each of a plurality of distinct, consecutive
gas cleaning operations, cleaning is conducted until there has been
substantial reduction of the pressure increase relative to the base
condition of the element when manufactured or first used.
In a first or subsequent gas cleaning, especially during the first
gas cleaning, such reduction may exceed the difference between the
element dynamic wet pressure or mean bubble release pressure when
manufactured or first used, and the corresponding value of either
of such variables as of the commencement of a gas cleaning
operation in accordance with the invention.
Boundary Zone
A "boundary zone" may be situated adjacent to and inwardly of a
peripheral zone, when such is present, and may be situated between
the peripheral zone and the outward zone preferably adjacent the
outer edge of the outward zone. It is a zone in which there is a
progressive increase, continuous or stepwise, in the apparent
volumetric compression ratio of the element in the direction of the
peripheral zone, or towards a vertical surface which is near the
periphery of the element, which surface may for example by a
portion of the side of an element, which portion is inwardly of and
in or adjacent to the peripheral zone.
Bubble Release Pressure
The "bubble release pressure" is used to characterize resistance to
discharge of a gas such as air under a liquid medium such as water
from a point or area on any surface of a diffusion element. As
applied to a given point of a given element it constitutes the
quasi-static pressure which must be applied to release a bubble
from said point on the gas discharge surface. As applied to a given
area of the active gas discharge surface area of a diffusion
element, which given area may include all or a part of the active
area, the bubble release pressure is the mean of the bubble release
pressure observed at a statistically significant number of points
distributed over said area in a random or uniform manner. For
purposes of this disclosure the bubble release pressure is
expressed in terms of inches of water gauge, after deduction of the
hydrostatic head. The test may be conducted using the apparatus
disclosed in the above description of FIG. 20 of this
specification, or any other apparatus capable of producing data
similar to or convertible to an indication of bubble release
pressure. The values of bubble release pressure set forth herein
were determined on a "quasi-static" basis in that the test
apparatus was adjusted to a sufficiently low rate of flow to
release bubbles slowly enough, so that the bubble release pressure
observed would be substantially that which would be obtained under
static conditions.
Center
The term "center" refers to the position centroid or geometric
center of the active gas discharge surface or of the center of the
element itself in plan view, whether the element is of regular or
irregular shape.
Central Zone
The "central zone" of a diffusion element in accordance with the
invention constitutes a central portion of the volume of the
diffusion element which lies beneath a central area constituting a
stated percentage of the total active gas discharge area of the
element, it being understood that the bounds of said volume may or
may not coincide with the position or positions of the edges of
certain depressions which may be applied to the surface(s) of the
element in accordance with the present invention. The "central
zone" applies to diffusion elements of varying outline in plan
view, whether circular, oval, square, rectangular, polygonal,
irregular or otherwise, and the above-mentioned central area has a
similar outline to, and a common center with, the active gas
discharge surface of the element. In general, the central area
which establishes the bounds of the central zone may constitute up
to about 80% of the total active gas discharge area, more
preferably about 60% and more preferably about 40%.
Cleaning
Cleaning is a process of preventing, retarding or removing foulant
deposits in multi-pore diffusion elements with cleaning gas, which
is effective against potential or actual flow effects on a
multi-pore diffusion element which are or would be attributable to
the pressure of foulant deposits in or adjacent its gas discharge
passages. Such removal of deposits substantially reduces any
increased level of dynamic wet pressure and/or bubble release
pressure, above the corresponding base condition, attributable to
the aforementioned deposits.
Cleaning Gas
A cleaning gas is a gas, as defined herein, which when introduced
into the gas discharge passages of a multi-pore diffusion element
alone or in admixture with other gases, including treatment gas, in
a given concentration and in a given amount, is sufficiently
aggressive toward foulant deposits to accomplish cleaning. Such
gases may act in any effective mode, such as for example: by
dissolving the foulant, especially in the base of precipitated
inorganic salt deposits; by dissolving material which attaches the
foulant to the diffusion element; by destroying the bond between
the foulant and the element; by poisoning, especially in the base
of living foulants which may be poisoning be caused to detach from
the diffusion element; in any other suitable mode; or in a
combination of modes. Thus, for example, the cleaning gas may be or
include one or more gaseous (including vaporized) organic and/or
inorganic solvent compounds or mixtures of solvent compounds
including those compounds capable of existing as liquids and those
capable of existing as gases at 20.degree. C. and standard
atmospheric pressure. Examples include H.sub.2 O.sub.2, CH.sub.3 OH
and other volatile organic solvents. But the preferred cleaning
gases are those which exist as gases at 20 .degree. C. and which
give an acid reaction when dissolved in water, such as for example,
SO.sub.2, SO.sub.3, CO.sub.2, Cl.sub.2, ClO.sub.2 , HCl, NO.sub.x,
O.sub.3, Br.sub.2, and the like, HCl being particularly
preferred.
Coefficient of Variation
For purposes of the present invention, the "coefficient of
variation" is the quotient obtained by dividing the "standard
deviation" by the "mean". The "standard deviation" represents the
root mean square of the deviations from the mean of a stated number
of bubble release pressure measurements. The "mean" is the
arithmetic average of the aforesaid bubble release pressure
measurements. optimum accuracy is obtained by determining bubble
release pressure at random points representative of substantially
the entire gas discharge surface of the elements, but we have found
that with circular plates we can obtain information that is
sufficiently accurate to be useful by sampling the bubble release
pressure at at least 5 equally spaced points along each of two
mutually perpendicular diameters of the plates.
Diminished Hydrostatic Head
An amount of hydrostatic head of any liquid medium, expressed in
inches of water gauge, and applied to the effluent surfaces of
diffusion elements in a given plant during gas cleaning, which
(whether increasing, remaining substantially constant or decreasing
at any given time) is less than the pre-cleaning operating head for
said plant, as herein defined.
Dynamic Wet Pressure
The pressure differential between the gas pressure at the influent
surface of a diffusion element and the hydrostatic head at a point
of bubble formation. It is a measure of the resistance to gas flow
of an area release diffusion element, including the effects of
friction in the gas discharge passages of the element and at the
influent and effluent ends of such passages, as well as the effects
of surface tension at the effluent ends of the passages. One
convenient method for determining the dynamic wet pressure is to
determine the difference between the hydrostatic head in the liquid
medium at the effluent surface of the diffusion element and the
total gas pressure at the influent surface of the element expressed
in terms of inches of water gauge.
Enhanced Pressure Differential
A dynamic wet pressure differential maintained during gas cleaning
which is greater than the differential that would have existed if
the only change in apparatus and operating conditions had been the
successive removal of foulant deposits by the cleaning gas.
Enhancement Level
A difference between that dynamic wet pressure existing during
cleaning under altered conditions of operation, i.e. enhanced
pressure differential, and that dynamic wet pressure which would
have existed if the only changes in apparatus and operating
conditions had been the successive removal of foulant deposits with
the cleaning gas.
Equilibrium Concentration
Equilibrium concentration may be used to indicate the
aggressiveness of cleaning gas/treating gas mixtures. The
determination is made by bubbling such a mixture through the liquid
medium at the temperature at which cleaning is to be conducted.
Upon attainment of saturation of the liquid medium with the
treating gas and cleaning gas, concentration is measured by any
suitable analytical procedure and expressed as the fraction by
weight of the cleaning component to total weight. In the case of
acidic cleaning agents, a pH meter may be used to determine the
negative log of the hydrogen ion concentration, which value
represents the equilibrium pH value of the gaseous mixture.
A "foulant" is any material, present in a liquid medium and/or in a
treatment gas, which tends to form a deposit at (including in or
adjacent) the inlets and/or outlets of gas discharge passages of
multi-pore diffusion elements or within such passages in such a
manner as to affect the gas pressure/flow relationship such as for
example by impeding flow or impairing uniformity of distribution of
treatment gas discharged through a given element or group of such
elements.
The foulant and/or resultant deposits may be of natural and/or
synthetic origin, organic and/or inorganic, living or non-living,
and composed of liquid, solid and/or gaseous components.
Non-limiting examples of the more common foulants are fungal and
bacterial strains, algae, protozoa, rotifers, higher life forms,
oily residues, organic pipe coatings, soap and detergent residues,
dust, inorganic salts, rust and other metal oxides, and hydroxides,
such as for example the carbonates and sulfates of such metals as
calcium, magnesium, copper, aluminum, iron and other substances
which may be suspended in or dissolved in a liquid medium and be
rendered less soluble by any means, especially by discharge or
treatment gas into the liquid medium at its interface with a
multi-pore diffusion element.
The term "present" is employed in this definition in the broadcast
possible sense so as to embrace foulants which are present in any
form of admixture such as, for example, suspensions, dispersion,
emulsions, solutions and other forms.
The deposits are usually, but not necessarily, adherent to the
diffusion element an tenacious in the sense that under normal
conditions of discharge, the treatment gas will not sufficiently
remove them from the diffusion elements to overcome their
above-indicated effects on gas flow.
The term deposits is also used in a board sense to include solid
and/or liquid components in the form of pasty, semi-solid or solid
particles or masses, such as for example, slimes, scales and other
incrustations.
The formation of deposits may occur in any manner such as, for
example: by mere lodgment, as when a rust particle borne by
treatment gas enters the inlet of a gas discharge passage of a
diffusion element and lodges within; by accretion, as when tiny oil
droplets and dust particles borne by treatment gas adhere to one
another and to the influent surface of the element, combining to
form a gradually enlarging mass which partly or fully obstructs the
inlets of gas discharge passages: by organic growth, as when one or
more life-forms present in the liquid medium at the effluent
surface of the diffusion element forms layers or networks at such
surface which impede the flow of treatment gas or at least impair
uniformity of treatment gas distribution; by ingestion as when
suspended solids in the liquid medium are borne into the gas
discharge passages by a reverse flow of liquid medium through the
diffusion element when the flow of treatment gas is intentionally
or unintentionally suspended; or by precipitation (including
crystallization), as when .[.insolublized.]. .Iadd.insolubilized
.Iaddend.inorganic salts are deposited in the gas discharge
passages and/or at their outlets during discharge of the treatment
gas.
Gas
For purposes of the present invention a gas is a gaseous material
or mixture, which may be or include true gases or vapors or
mixtures thereof, and which may also include entrained liquids or
solids in the form of fine or substantially colloidal droplets or
particles, which material or mixture is in the gaseous state to a
sufficient extent under conditions of use for forming bubbles when
discharged through a multi-pore diffusion element into liquid
media.
Liquid Medium or Media
A "liquid medium" is any material (including single materials or
mixtures) which is liquid to a sufficient extent to form gas
bubbles therein when gas is discharged therein through a multi-pore
diffusion element. The liquid material may for example include one
or more organic liquids, or one or more inorganic liquids, or any
combination of organic and/or inorganic liquids in admixture
(including miscible and immiscible liquids) and may also include
other liquid, gas and solid materials which do not deprive the
medium of the above-described liquidity under the conditions
prevailing during discharge of the treatment gas therein. Also, at
least one of the components of the medium, which may be one or more
foulant(s) and/or one of the other components of such medium, is
subject to change in a predetermined manner in response to
discharge of a treatment gas therein. A preferred category of such
media is aqueous waste liquors, such as for example, the mixed
liquors treated in the activated sludge process, refinery and
brewery waste liquors, paper mill white water, and the like.
Mean Bubble Release Pressure
The arithmetic average of a statistically significant number of
bubble release pressure measurements at randomly or systematically
established locations on any surface of a diffusion element.
Multi-Pore Diffusion Element
In general, such an element is an area release diffuser having an
active gas discharge surface of substantial are e.g. usually at
least about 20 square inches, more preferably at least about 30
square inches, and still more preferably at least about 40 square
inches, having a multiplicity of fine pores closely spaced with
respect to one another and distributed in a random or ordered
manner throughout said active gas discharge surface. However, it
should be understood, for reasons apparent from the above
discussion of theoretical considerations, that only a portion of
the pores will transmit gas under a given set of operating
conditions. On the other hand, there will normally be a plurality
of active pores per square inch of active gas discharge area under
the design operating conditions of the element, when in its new or
as manufactured condition in clear water.
Such elements may include certain optional, additional
characteristics or properties, certain of which are preferred
embodiments. For example such elements include pores comprising gas
discharge passages. Said passages may be essentially linear but are
usually tortuous. Although discrete passages are contemplated,
elements with substantial numbers or even major proportions of
interconnecting passages are more commonly encountered.
Irrespective of their degree of linearity, tortuousness,
intercommunication or lack thereof, the respective gas discharge
passages have discrete or shared inlets at the gas influent
surfaces of the elements and outlets at the gas discharge surfaces
of the elements. The closely spaced nature of the passages in the
preferred elements is indicated in part by the fact that the
average lateral spacing between pores is smaller than the average
thickness of the elements and is therefore smaller than the average
length of the gas discharge passages. The reference to spacing is
intended to refer to the spacing between all pores in the diffusion
element not merely those which happen to be active at a given set
of operating conditions.
It is also preferred that the pores have a pore size which is in
the range of about 60 to about 600 and more preferable about 90 to
about 400 and most preferably about 120 to about 300 microns, as
computed in applying the mean bubble release pressure of the
element to the equation D=30.gamma./P, shown in ASTM E-128, wherein
D=maximum pore diameter, .gamma.=surface tension of the test liquid
in dynes/cm, and p=pressure in mm of Mercury.
The elements may be members of any desired shape in plan view and
vertical cross section and, as viewed in vertical cross section,
include a substantially horizontal portion having a ratio of at
least about 4:1, more preferably at least about 6:1 and still more
preferably at least about 8:1 between the maximum horizontal
dimension of the element and the area-weighted average thickness of
the element.
Said horizontal portion preferably also is characterized by having
a ratio of active gas discharge area to average thickness, weighed
on an area basis, of at least about 10, more preferably at least
about 20 and still more preferably at least about 40 square inches
of area per inch of thickness.
Said horizontal portion may and preferably does include, beneath in
active gas discharge surface, zones of enhanced volumetric
compression ratio. For this purpose the said horizontal portion may
be regarded as including various zone (defined herein) referred to
as the central, outward, boundary and peripheral zones, which may
or may not have visible characteristics, but will usually be
associated with depressions at the central zone and/or angled
surface(s) at the boundary zone. For example, it is contemplated
that the central zone would preferably have an apparent volumetric
compression ratio which is enhanced relative to that of the outward
zone by at least about 2%, preferably about 2 to about 20%, and
more preferably about 3 to about 15%. Where a boundary zone is
provided, preferred applications of the invention will involve
enhancement of the apparent volumetric compression ratio of the
boundary zone, relative to the outward zone, by at least about 10%,
more particularly about 10 to about 35%, and preferably about 35 to
about 100%.
The diffusion elements may include a wide variety of particulate
(including fibrous)materials of both organic and inorganic
character, but preferably have a modulus in compression of at least
about 0.2.times.10.sup.5 psi, more particularly about
0.2.times.10.sup.5 to about 4.times.10.sup.5 psi in applications
involving softer particulate materials, and preferably about
4.times.10.sup.5 to about 6.times.10.sup.6 psi when working with
the harder inorganic materials.
Outward Zone
The "outward zone" includes all or a substantial portion of the
body of the diffusion element beneath the total active gas
discharge surface other than the "central zone". As compared to the
central zone the outward zone lies further outward from the center
of the element than the central zone. Other than the central zone,
the outward zone may or may not be the sole additional zone in the
element.
Oxygen-containing Gas
An "oxygen-containing gas" includes pure oxygen and any gas (as
defined herein) that includes oxygen in appreciable quantities and
is useful as a treatment gas.
Peripheral Zone
The "peripheral zone", if such is present, constitutes a portion of
the volume of the diffusion element at or along the edge of the
active gas discharge surface of the element which normally
constitutes the outermost edge or periphery of the element. The
peripheral zone, whether annular or non-circular, is one in which
the element has been treated by pressing, including a combination
of pressing with other techniques, to develop a zone having lesser
permeability (including no permeability), greater density or lesser
height than all or a portion of the outward zone. An element with a
peripheral zone may or may not include a boundary zone.
Pre-cleaning Operating Head
The total amount of hydrostatic head of any liquid medium,
expressed in inches of water gauge, and applied to the effluent
surfaces of diffusion elements in a given plant during a period
prior to the commencement of cleaning, including either the time
weighted average of the liquid head during the last ninety (90)
days of operation prior to cleaning, or more preferably the last
head applied in normal operation prior to cleaning, or still more
preferably the larger of said average and said last head.
SCFM
SCFM means rate of gas flowing in terms of cubic feet per minute
corrected to a temperature of 20.degree. C., an absolute pressure
of 760 mm of mercury and a relative humidity of 36%.
Specific Permeability
The term "specific permeability" describes the overall rate of
passage of gas through a dry diffusion element, and for purposes of
the present invention is expressed in standard cubic feet per
minute per square foot of area per inch of thickness at a driving
pressure of 2 inches in water gauge under standard conditions of
temperature, pressure and relative humidity (20.degree. C., 760 mm
Hg. and 36%, respectively). The specific permeability is calculated
from the equation G=Q(T/A), wherein G equals specific permeability,
Q equals flow in standard cubic feet per minute, t equals thickness
of the element in inches and A equals the mean effective gas flow
area in ft..sup.2 through the element normal to the direction of
flow. If the gas discharge surface of the diffusion element
overlies portions of the element which are of varying thickness,
the average thickness is used, the thickness being weighted on the
basis of area.
System Back Pressure
This is a measure of the overall resistance to flow of an entire
gas distribution network or of at least a portion of such a network
at a given rate of flow through the diffusion elements. The
.[.resisitance.]. .Iadd.resistance .Iaddend.in question includes
the frictional and surface tension resistance attributable to
conduits, to the diffusion elements and other elements of the
network, to fouling, whenever such is present and to the
hydrostatic head. It is assumed that the network or portion thereof
which is under consideration comprises a plurality of pneumatically
interconnected diffusion elements. These are elements which share a
source of treating gas, and which thus contribute along with
conduits and other components of the network to a combined
resistance to flow which must be overcome by that source. By way of
illustration and not limitation, activated sludge plants are known
in which the design system back pressure is about 3 to about 20,
more typically about 4 to about 15, and frequently about 6 to about
10 psi measured at the compressor or blower outlets.
Tank-type Process
For purposes of the present disclosure, a tank type process,
whether for aeration or other purposes, is a process of discharging
treating gas into a liquid medium at a rate of at least about 2,
more preferably at least about 4, and still more preferably at
least about 6 SCFM per 1000 cubic feet of liquid medium, a rate
which is far in excess of those employed in the sewage treatment
lagoons or ponds in which tubing type diffusers are installed.
Alternately, or in combination with the foregoing, a tank-type
process may be characterized by an average liquid medium retention
time of less than about 48 hours, more commonly less than 24 hours,
and quite frequently less than 12 hours, considerably less than the
retention times of the aforementioned lagoons or ponds.
Treatment Gas
This is a gas, as defined, herein, which includes one or more
components that is able to effect a predetermined desired change in
at least one component of a liquid medium, and is less aggressive
towards foulant deposities than a cleaning gas, as defined
herein.
Vertical
The term "vertical", as applied to a surface of a diffusion
element, includes truly vertical and near vertical, e.g. within
about 20.degree. of vertical.
* * * * *