U.S. patent number RE44,536 [Application Number 13/151,161] was granted by the patent office on 2013-10-15 for filters employing both acidic polymers and physical-adsorption media.
This patent grant is currently assigned to Entegris, Inc.. The grantee listed for this patent is William M. Goodwin, Anatoly Grayfer, Devon Kinkead, Oleg P. Kishkovich, David Ruede. Invention is credited to William M. Goodwin, Anatoly Grayfer, Devon Kinkead, Oleg P. Kishkovich, David Ruede.
United States Patent |
RE44,536 |
Kishkovich , et al. |
October 15, 2013 |
Filters employing both acidic polymers and physical-adsorption
media
Abstract
A filter includes at least two different adsorptive media.
First, chemisorptive media, which is porous and includes an acidic
functional group, is used to remove molecular bases, including
ammonia, organic amines, imides and aminoalchols, from the
atmosphere used in semiconductor fabrication and other processes
that require uncontaminated gaseous environments of high quality.
Second, physisorptive media is able to adsorb condensable
contaminants, particularly those having a boiling point greater
than 150 degrees C. The physisorptive media can include untreated,
activated carbon.
Inventors: |
Kishkovich; Oleg P.
(Greenville, RI), Kinkead; Devon (Holliston, MA),
Grayfer; Anatoly (Newton, MA), Goodwin; William M.
(Medway, MA), Ruede; David (Berkeley, CA) |
Applicant: |
Name |
City |
State |
Country |
Type |
Kishkovich; Oleg P.
Kinkead; Devon
Grayfer; Anatoly
Goodwin; William M.
Ruede; David |
Greenville
Holliston
Newton
Medway
Berkeley |
RI
MA
MA
MA
CA |
US
US
US
US
US |
|
|
Assignee: |
Entegris, Inc. (Billerica,
MA)
|
Family
ID: |
26897215 |
Appl.
No.: |
13/151,161 |
Filed: |
June 1, 2011 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
Issue Date |
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10851687 |
Mar 21, 2006 |
7014693 |
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09848955 |
May 25, 2004 |
6740147 |
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60201928 |
May 5, 2000 |
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60225248 |
Aug 15, 2000 |
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Reissue of: |
11364137 |
Feb 28, 2006 |
7540901 |
Jun 2, 2009 |
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Current U.S.
Class: |
95/141; 95/287;
55/385.2; 55/482; 55/484; 95/286; 96/413; 96/417 |
Current CPC
Class: |
B01D
53/0407 (20130101); B01J 20/20 (20130101); B01J
20/261 (20130101); B01D 2259/4009 (20130101); B01D
2258/0216 (20130101); B01D 2253/308 (20130101); B33Y
80/00 (20141201); B01D 2257/406 (20130101); B01D
2253/102 (20130101); B01D 53/0454 (20130101); Y10S
95/901 (20130101); B01D 2253/202 (20130101) |
Current International
Class: |
B01D
35/143 (20060101) |
Field of
Search: |
;95/141,286,287
;96/413,417 ;55/385.2,482,484,486,522 |
References Cited
[Referenced By]
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Other References
Donaldson LithoGuard Filtration Systems Brochure, pp. 1-4 (2001).
cited by applicant .
Kishkovich, O., et al., "An Accelerated Testing Technique for
Evaluating Performance of Chemical Air Filters for DUV
Photolithographic Equipment," SPIE (Part of the SPIE Conference on
Metrology, Inspection and Process Control for Microlithography
XIII, Santa Clara, CA), 3677: 857-865 (1999). cited by applicant
.
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Authority, for counterpart Application No. PCT/US2001/014655, dated
Aug. 7, 2002. cited by applicant .
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.
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Contamination Filter System", Donaldson Filtration Systems, 2 pages
(Jun. 2004). cited by applicant .
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dated Nov. 29, 2010 (2 pages). cited by applicant.
|
Primary Examiner: Hopkins; Robert A
Attorney, Agent or Firm: Hamilton, Brook, Smith &
Reynolds, P.C.
Parent Case Text
CROSS REFERENCES TO RELATED APPLICATIONS
The present application is a .[.continuation-in-part.].
.Iadd.reissue of U.S. Pat. No. 7,540,901, which is a
.Iaddend..Iadd.continuation .Iaddend.of U.S. patent application
Ser. No. 10/851,687, filed on May 21, 2004, issuing on Mar. 21,
2006 as U.S. Pat. No. 7,014,693, which is a divisional of U.S.
patent application Ser. No. 09/848,955, filed May 4, 2001, issuing
on May 25, 2004 as U.S. Pat. No. 6,740,147, which claims the
benefit of U.S. Provisional Application No. 60/201,928, filed on
May 5, 2000, and U.S. Provisional Application No. 60/225,248, filed
on Aug. 15, 2000. The entire contents of the above applications are
incorporated herein by reference in entirety.
Claims
The invention claimed is:
1. A method for removing contaminants from a gas in a semiconductor
processing device comprising: flowing a gas through an enclosure
having an inlet for receiving the gas and an outlet for discharging
the gas; filtering the gas in the enclosure with a filter unit
coupled to the inlet and the outlet and having a plurality of
parallel filter elements located within said filter unit for
removing at least a portion of said contaminants from said gas
passing through said enclosure, the filter unit further comprising
at least one filter element positioned in series with at least one
of the parallel filter elements; and sampling the gas with a
sampling port coupled to the gas flow between filter elements
positioned in series within the filter unit to collect sample
data.
2. The method of claim 1 further comprising providing an air
filtration system.
3. The method of claim 2 further comprising flowing said gas
through each parallel filter element and through the at least one
filter element positioned in series.
4. The method of claim 3 further comprising a providing plurality
of sampling ports.
5. The method of claim 4 further comprising providing the plurality
of sampling ports with an associated like plurality of filter
elements.
6. The method of claim 4 further including an inlet sampling
port.
7. The method of claim 4 further including an outlet sampling
port.
8. The method of claim 5 further comprising removing amine
contaminants.
9. The method of claim 1 further comprising coupling said sampling
port to a detection system.
10. The method of claim 9 further comprising coupling an amine
detection system.
11. The method of claim 1 further comprising coupling the sampling
port to an analyzer that determines filter life.
12. The method of claim 11 further comprising using data from one
or more ports selected from the group consisting of an inlet
sampling port, a port between filters and an outlet sampling
port.
13. The method of claim 1 further comprising providing filters
positioned in series such that a first filter element filters a
first contaminant and a second filter element filters a second
contaminant.
14. The method of claim 13 further comprising providing a first
filter element including a physisorptive filter media.
15. The method of claim 13 further comprising providing a second
filter element including a chemisorptive filter media.
16. The method of claim 14 further comprising providing a
physisorptive media including an activated carbon.
17. The method of claim 15 further comprising providing a
chemisorptive media including an acidic material.
18. The method of claim 17 further comprising providing an acidic
material including a sulfonated material.
19. The method of claim 17 further comprising providing an acidic
material including a carboxylic functional group.
20. The method of claim 1 further comprising providing a
concentrator coupled to the sampling port that accumulates a
contaminant.
21. An apparatus for removing contaminants from a gas in a
semiconductor processing device comprising: a filter enclosure
having an inlet for receiving a gas and an outlet for discharging a
gas; a filter system within the enclosure having a plurality of
parallel filter elements and at least one filter element in series
with at least one of the parallel filter elements; and a plurality
of sampling ports for sampling gas flowing through the enclosure
including a sampling port positioned between the at least one
filter element that is positioned in series with at least one of
the parallel filter elements to collect a gas sample from the gas
flowing between the filter elements positioned in series.
22. The apparatus of claims 21 wherein said gas passing through
each parallel filter element passes through the at least one filter
element positioned in series.
23. The apparatus of claim 21 wherein said contaminants include
amines.
24. The apparatus of claim 21 wherein said sampling port is
communicatively coupled to a detection system.
25. The apparatus of claim 21 wherein the sampling port is
connected to an analyzer that determines filter life.
26. The apparatus of claim 21 wherein filters positioned in series
comprise a first filter element that filters a first contaminant
and a second filter element that filters a second contaminant.
27. The apparatus of claim 26 wherein the first filter element
comprises a physisorptive filter media.
28. The apparatus of claim 26 wherein the second filter element
comprises a chemisorptive filter media.
29. The apparatus of claim 27 wherein the physisorptive media
comprises an activated carbon.
30. The apparatus of claim 28 wherein the chemisorptive media
comprises an acidic material.
31. The apparatus of claim 30 wherein the acidic material comprises
a sulfonated material.
32. The apparatus of claim 30 wherein the acidic material comprises
a carboxylic functional group.
33. The apparatus of claim 21 wherein the sampling port is coupled
to a concentrator that accumulates a contaminant.
34. The apparatus of claim 21 further comprising a plurality of
sampling ports between filter elements positioned in series.
.Iadd.35. A method for removing contaminants from a gas in a
semiconductor processing device comprising: flowing a gas through
an enclosure having an inlet for receiving the gas and an outlet
for discharging the gas; filtering the gas in the enclosure with a
filter unit coupled to the inlet and the outlet and having a
plurality of parallel filter elements located within said filter
unit for removing at least a portion of said contaminants from said
gas passing through said enclosure, the filter unit further
comprising at least one filter element positioned in series with at
least one of the parallel filter elements, wherein filters
positioned in series comprise a first filter element that filters a
first contaminant and a second filter element that filters a second
contaminant, and further wherein the first filter element comprises
a physisorptive filter media and the second filter element
comprises a chemisorptive filter media..Iaddend.
.Iadd.36. The method of claim 35 wherein the physisorptive filter
media is upstream of chemisorptive filter media..Iaddend.
.Iadd.37. The method of claim 36 wherein the physisorptive media
comprises an activated carbon..Iaddend.
.Iadd.38. The method of claim 36 wherein the chemisorptive media
comprises an acidic material..Iaddend.
.Iadd.39. The method of claim 38 wherein the acidic material
comprises a sulfonated material..Iaddend.
.Iadd.40. The method of claim 39 wherein the sulfonated material
comprises a sulfonated divinyl benzene styrene
copolymer..Iaddend.
.Iadd.41. The method of claim 38 wherein the acidic material
comprises a carboxylic functional group..Iaddend.
.Iadd.42. The method of claim 36 further comprising removing amine
contaminants..Iaddend.
.Iadd.43. An apparatus for removing contaminants from a gas in a
semiconductor processing device comprising: a filter enclosure
having an inlet for receiving a gas and an outlet for discharging a
gas; a filter system within the enclosure having a plurality of
parallel filter elements and at least one filter element in series
with at least one of the parallel filter elements, wherein filters
positioned in series comprise a first filter element that filters a
first contaminant and a second filter element that filters a second
contaminant, and further wherein the first filter element comprises
a physisorptive filter media and the second filter element
comprises a chemisorptive filter media..Iaddend.
.Iadd.44. The apparatus of claim 43 wherein the physisorptive
filter media is upstream of chemisorptive filter
media..Iaddend.
.Iadd.45. The apparatus of claim 44 wherein said contaminants
include amines..Iaddend.
.Iadd.46. The apparatus of claim 44 wherein the physisorptive media
comprises an activated carbon..Iaddend.
.Iadd.47. The apparatus of claim 44 wherein the chemisorptive media
comprises an acidic material..Iaddend.
.Iadd.48. The apparatus of claim 47 wherein the acidic material
comprises a sulfonated material..Iaddend.
.Iadd.49. The apparatus of claim 47 wherein the sulfonated material
comprises a sulfonated divinyl benzene styrene
copolymer..Iaddend.
.Iadd.50. The apparatus of claim 49 wherein the acidic material
comprises a carboxylic functional group..Iaddend.
Description
BACKGROUND OF THE INVENTION
In this age of increased air pollution, the removal of chemicals
from the air we breathe is a concern of everyone. In addition, in
the fabrication of electronic materials and of devices such as
semiconductors, there is a requirement for uncontaminated air of
high quality. To filter contaminants from the air, gas phase
filtration is commonly employed, typically using activated carbon
manufactured in various ways. One approach uses a carbon/adhesive
slurry to glue the carbon to the substrate. The adhesive decreases
carbon performance by forming a film on its surface. In another
approach, an organic-based web is carbonized by heating, followed
by carbon activation. Filters produced by such an approach is
expensive and has relatively low adsorption capacity. In yet
another approach, a slurry of carbon powders and fibers is formed
into sheets by a process analogous to a wet papermaking process.
This material has a medium-to-high cost, and has an undesirable
high pressure drop. Moreover, chemically-impregnated carbon
particles, used for the chemisorption of lower molecular weight
materials, cannot be efficiently used in conjunction with an
aqueous process, as the aqueous nature of the process either washes
away the chemical used to impregnate the carbon, or reacts
undesirably with the impregnating or active chemical groups thereby
rendering it inoperative. In general, however, filter materials
that do not incorporate chemically-active groups perform far less
effectively for some key low-molecular-weight components, such as
ammonia, in comparison to filter materials that include
chemically-active groups.
SUMMARY OF THE INVENTION
Such filters have been accepted in the industry, and they are
presumably considered to perform adequately for their intended
purpose. However, they are not without their shortcomings. In
particular, none of these aforementioned prior art approaches fully
achieve the desired properties that provide a clean, cost
effective, high efficiency, low pressure drop, adsorptive
composite.
The present invention provides a filter which overcomes these
shortcomings. In particular, in one aspect of the invention, a
fluid-permeable filter includes a conduit through which fluid,
particularly gas, can flow. Within the conduit is chemisorptive
media that includes a copolymer having an acidic functional group
for chemically adsorbing a base contaminant in a fluid passing
through the conduit. Also within the conduit is physisorptive media
for physically adsorbing a condensable contaminant from a fluid
passing through the conduit. The chemisorptive media and
physisorptive media are in separate filter elements in a preferred
embodiment, though the two media types can alternatively be
intermixed to form a single, undivided filter body.
Preferably, the filter is a clean, cost-effective, high-efficiency,
low-pressure-drop, gas phase filter comprising a high-surface-area,
highly-acidic, chemically-acidic adsorbent in combination with
untreated, or virgin, activated carbon. One embodiment of the
invention employs a non-woven composite material having acidic
functional groups that bind to airborne bases. The untreated,
activated carbon adsorbs organic and inorganic condensable
contaminants, typically those having a boiling point greater that
150.degree. C. The invention can be used in lithography systems
that employ materials that are sensitive to impurities, such as
molecular bases (e.g., ammonia and n-methyl pyrrolididnone), and
organic and inorganic condensable contaminants (e.g., iodobenzenes
and siloxanes), present in the air circulating through
semiconductor wafer processing equipment. A large number of bases
including ammonia, NMP, triethylamine pyridine, and others, can be
maintained at concentrations below 2 ppb in a tool cluster filtered
with the present invention. The acidic adsorbent can be formed, for
example, by the dry application of an active, acidic adsorbent to a
non-woven carrier material that is then heated and calendered with
cover sheets.
The non-woven carrier materials can be polyester non-wovens, and
the acidic adsorbent can include sulfonated divinyl benzene styrene
copolymer. One embodiment employs carboxylic functional groups. The
acidic groups have at least 1 milliequivalent/gram of copolymer
acidity level or higher and preferably at least 4.0
millequivalents/gram of copolymer or higher. The polymers used are
porous, and can have a pore size in the range of 50-400 angstroms
and a surface area of 20 m.sup.2/g or higher.
The dry processing of a non-woven polyester batting allows for even
distribution of acidic, adsorbent particles throughout the depth of
the polyester batting. This provides an increased bed depth at a
very low pressure drop, which is highly desirable since a twofold
increase in bed depth can increase the filter's breakthrough time
(time to failure) four-fold when using these thin fabric-based
sulfonic beds.
Activated carbon is discussed in greater detail in U.S. Pat. No.
5,582,865, titled "Non-Woven Filter Composite". The entire contents
of this patent are incorporated herein by reference. The filter can
have two (or more) layers, one of activated carbon and one of
sulfonated divinyl benzene styrene copolymer beads. Additionally,
two or more materials can be mixed to provide a composite
filter.
Thus, provided herein is a clean, cost-effective, high-efficiency,
low-pressure-drop, adsorptive composite filter, and a method for
forming said composite filter. The composite filter is particularly
useful for the removal of base and organic and inorganic
condensable contaminants (typically those with a boiling point
greater than 150 degrees C.) in an air stream. Particulates will
also be removed if greater than the pore size of the filter. The
filter can have a service life of several months with a pressure
drop to reduce power consumption and minimize impact on the systems
operation. For example, a high-pressure-drop filter can require a
longer time for a lithography system to equilibrate the temperature
and humidity after filter replacement. In comparison to
chemically-treated, activated-carbon filters, the combination
filters of this invention offer much higher adsorption performance
due to the superior adsorption properties of untreated, activated
carbon over chemically-treated, activated carbon. The use of
untreated, activated carbon in accordance with methods described
herein can provide superior breakthrough capacity for organic and
inorganic condensable contaminants because the chemical treatment
performed on the activated carbon to render it suitable for
capturing molecular bases compromises its capacity for adsorbing
organic and inorganic condensable contaminants, typically those
with a boiling point greater than 150 degrees C.
In another embodiment, a synthetic carbon material, such as that
described in U.S. Pat. No. 5,834,114, the contents of which are
incorporated herein by reference in their entirety, can be coated
with the acidic materials of the present invention to provide a
porous acidic filter element in accordance with the invention. In
yet another embodiment, the activated nutshell carbon media
described in U.S. Pat. No. 6,033,573, the contents of which are
incorporated by reference in their entirety, can be used alone or
in combination with any of the other chemisorptive or physisorptive
media described herein to remove contaminants from the air flowing
through the conduit in the same manner as is taught in this
specification.
A detection system and method of use for determining When the
filter needs to be replaced by detecting base contaminants in air
is described in U.S. patent application Ser. No. 09/232,199,
entitled, "Detection of Base Contaminants in Gas Samples", filed on
Jan. 14, 1999, now U.S. Pat. No. 6,207,460 with Oleg Kishkovich, et
al. as inventors. Also, U.S. patent application Ser. No.
08/795,949, entitled, "System for Detecting Base Contaminants in
Air", filed Feb. 28, 1997, now U.S. Pat. No. 6,096,267 with Oleg
Kishkovich, et al. as inventors, and U.S. patent application Ser.
No. 08/996,790, entitled, "Protection of Semiconductor Fabrication
and Similar Sensitive Processes," filed Dec. 23, 1997, now U.S.
Pat. No. 6,296,806 with Oleg Kishkovich, et al. as inventors, can
also be used with the present invention. These patent applications
disclose the protection of a DUV lithography processes using
chemically-amplified photoresists that are sensitive to amines in
the air. These patent applications are incorporated in the present
application in their entirety by reference.
One method of fabricating a filter element having a large surface
area and the desired flow characteristics involves the use of a
powdered material that is deposited in sequential layers one on top
of the other. Following the deposit of each layer of powdered
material, a binder material is delivered onto each layer of
powdered material using a printing technique in accordance with a
computer model of the three dimensional filter element being
formed. Following the sequential application of all of the required
powder layers and binder material to form the part in question, the
unbound powder is appropriately removed, resulting in the formation
of the desired three dimensional filter element. This technique
provides for the fabrication of complex unitary or composite filter
elements having high surface area that are formed with a very high
degree of resolution.
In another apparatus, the physisorptive and chemisorptive filter
media are positioned in a circulation loop for circulating air
through a photolithography tool. The two media are respectively
positioned at different locations such that the physisorptive media
will be maintained at a temperature cooler than that at which the
chemisorptive media is maintained.
The physisorptive media can be positioned upstream from the
chemisorptive media (i.e., between the chemisorptive media and an
outlet of the photolithography tool) and can be positioned
proximate to the downstream side of a cooling coil in the air
conditioning unit of the tool. Alternatively, the physisorptive
media can be coupled with a separate cooling element, such as a
source of chilled water. In either case, the air passing through
the physisorptive media can be cooled and then, after exiting the
physisorptive media, reheated to a fixed temperature and passed
through the chemisorptive media before re-entering the
photolithography tool. Temperature sensors can be used to monitor
the temperature of the different media and also provide feedback
signals to a controller for closed loop control of the system. The
physisorptive filter element can also be contained in a rotating
wheel with separate chambers for active adsorption, regeneration
and conditioning. Advantages provided by some of these embodiments
include enhanced removal of lower-molecular-weight condensable
contaminants, reduction in the overall footprint of the system,
reduction in operating pressure drop of the filtration component,
and significantly increased time between change-out or service.
Further, lower-molecular-weight organic contaminants may be removed
more effectively with the temperature-swing beds described herein
than is achievable with passive adsorption beds.
In another aspect of the invention, a filter unit include a
multiplicity of filter elements. The filter elements are made of a
chemisorptive media and a physisorptive media. The filter unit also
includes a multiplicity of sampling port within the filter unit for
connecting to a monitor device which monitors the performance of
the filter elements. The sampling ports are arranged in a manner
with individual sampling ports located between adjacent filter
elements. There can be sampling port located on an upstream side of
the multiplicity of filter elements, and another sampling port
located on a downstream side of the multiplicity of filter
elements.
In some embodiments, the monitor device is an analytical device,
such as, for example, a gas chromatograph mass selective detector,
an ion mobility spectrometer, an acoustic wave detector, an atomic
absorption detector, an inductance couple plasma detector, or a
Fourier transform methods. Alternatively, the monitor device can be
a concentrator which collects the sample drawn to the concentrator
with a pump, or the concentrator is coupled to the sample port so
that the contaminants accumulate in the concentrator by diffusion.
Once the sample is collected in the concentrator, the concentrator
is taken to a lab for evaluating the sample. The filter elements
can be arranged in a set of stack which are arranged in a series,
and in each stack, the filter elements are arranged in
parallel.
In another aspect, a photolithography system includes an air
handler for moving air through the system, and delivers unfiltered
air to the filter unit, and a photolithography tool which receives
filtered air from the filter unit. A particular advantage of this
arrangement is that it is able to detect contaminants before the
contaminants reach the lens of a photolithography tool.
In yet another aspect of the invention, a filter unit includes one
or more filter elements. There can be a sampling port located
between two filter elements. Additionally, or alternatively, there
is a sampling port located on one side of a filter element, or
there can be a second sampling port located on an opposite side of
the filter element.
Related aspects of the invention include a method for filtering air
through a filter unit and a method for circulating air through a
photolithography tool.
BRIEF DESCRIPTION OF THE DRAWINGS
The foregoing and other objects, features and advantages of the
invention will be apparent from the following more particular
description of preferred embodiments of the invention, as
illustrated in the accompanying drawings in which like reference
characters refer to the same parts throughout the different views.
The drawings are not necessarily to scale, emphasis instead being
placed upon illustrating the principles of the invention.
FIG. 1 illustrates a filter including a chemisorptive filter
element and a physisorptive filter element.
FIG. 2 illustrates a filter, wherein the chemisorptive filter
element is coated on the physisorptive filter element.
FIG. 3 illustrates a filter including an electrostatically-charged
nonwoven filter material in addition to the chemisorptive filter
element and physisorptive filter element.
FIG. 4 illustrates a filter of this invention coupled with a
photolithography tool.
FIG. 5 illustrates a filter assembly.
FIG. 6 is a schematic illustration of an apparatus including a
photolithography tool and a circulation loop with physisorptive
media and chemisorptive media positioned for enhanced contaminant
removal efficiency.
FIG. 7 is a schematic illustration of another embodiment of an
apparatus including a photolithography tool and a circulation loop
with physisorptive media and chemisorptive media positioned for
enhanced contaminant removal efficiency.
FIG. 8 is a perspective view of an acidic, adsorbent filter element
before heating and calendaring.
FIG. 9 is a perspective view of the acidic, adsorbent filter
element after heating and calendaring.
FIG. 10 is a perspective view of the acidic, adsorbent filter
element after heating and calendaring with a cover sheet.
FIG. 11 is a flow chart illustrating a process for fabricating a
filter element.
FIG. 12 illustrates an example of a three dimensional filter
element fabricated in accordance with the process illustrated in
FIG. 11.
FIG. 13 is a perspective view of a filter element in a square or
rectangular containment structure showing the creases of the
pleated structure.
FIG. 14 is a top view of a filter element showing its pleated
structure.
FIG. 15 is a top view of a filter element with a high
first-pass-efficiency multi-pleat pack panel filter in a square or
rectangular containment structure.
FIG. 16 is a top view of a filter element in a radially-pleated
cylindrical containment structure.
FIG. 17 is a top view of a filter element in a media-wrapped
cylindrical filter.
FIG. 18 is a perspective view of a process of producing a filter
element.
FIG. 19 is a pleated filter element.
FIG. 20 is a graphical illustration comprising the base removal
efficiency of filters previously available and of an acidic,
adsorbent filter element of this invention.
FIG. 21 is a graph illustrating comparative vapor breakthrough
rates with treated and untreated, activated carbon filters.
FIG. 22 is a filter unit in accordance with the invention.
FIG. 23 is a schematic illustration of the filter unit of FIG. 22
as a component of a photolithography system.
FIG. 24A is a close-up view of a sampling port of the filter unit
of FIG. 22 connected to an analytical device.
FIG. 24B is a close-up view of a sampling port of the filter unit
of FIG. 22 connected to a concentrator.
FIG. 24C is a close-up view of a passive sampler attached to a
sampling port of the filter unit of FIG. 22.
FIG. 25 is a schematic illustration of a sacrificial lens used to
monitor the filters.
DETAILED DESCRIPTION OF THE INVENTION
A description of preferred embodiments of the invention follows. A
fluid-permeable filter includes chemisorptive media and
physisorptive media. Each of these two types of media can be in
separate filter elements. The embodiment illustrated in FIG. 1
includes a chemisorptive filter element 16 and a physisorptive
filter element 32 mounted within a conduit 36. In an alternative
embodiment, illustrated in FIG. 2, the chemisorptive filter element
16 can form a layer attached to one or both sides of the
physisorptive filter element 32. Additionally, an
electrostatically-charged nonwoven filter material 34 can cover the
chemisorptive and physisorptive filter elements 16, 32, as shown in
FIG. 3.
The chemisorptive filter element 16 includes porous, chemisorptive
media formed with a copolymer having an acidic functional group
that enables the group to react with a reagent. The physisorptive
filter element 32 includes media, such as untreated, activated
carbon. The term, "untreated," as used herein, means an activated
carbon that has not been modified by chemical treatment to perform
chemisorption; rather, untreated, active carbon remains as a
physical, nonpolar, adsorbent. The physisorptive media remove
organic and inorganic condensable contaminants, typically those
having a boiling point greater than 150 degrees C. via
physisorption, while the chemisorptive media remove base vapors via
chemisorption. The term, "physisorption," refers to a reversible
adsorption process in which the adsorbate is held by weak physical
forces. In contrast, the term, "chemisorption", refers to an
irreversible chemical reaction process in which chemical bonds are
formed between gas or liquid molecules and a solid surface.
As shown in FIG. 4, the filter 40 can be mounted at an inlet of a
deep ultraviolet photolithography tool 41 (e.g., a stepper or
scanner) to filter air entering the tool 41 and to protect the
projection and illumination optics 42 as well as the photoresist on
a wafer 44 within the chamber 46 of the photolithography tool
41.
The filter can have a variety of constructions. In a first example,
a bed of polymer pellets and untreated, activated carbon in exposed
to the airstream using a traditional media tray and rack system
(e.g., a metal enclosure that uses perforated material or screens
both to hold in the adsorbent while allowing air to flow through
the structure). In a second example, the filter is in the form of a
honeycomb configuration where polymer pellets and untreated,
activated carbon are held in a partially-filled or
completely-filled honeycomb structure. In a third example, the
polymer and untreated, activated carbon form a monolithic porous or
honeycomb structure. In a fourth example, a mat of polymer fibers,
either woven or nonwoven, incorporate untreated, activated carbon
and are pleated and arranged into a traditional pleated air filter.
In a fifth example, a bed of activated carbon pellets are exposed
to the airstream using a traditional media tray and rack system
with a layer of nonwoven composite material comprising acidic
polymer, comprising a sulfonated copolymer-based composite material
attached or incorporated into one side or both sides of the carbon
tray. A pleated array of filters are illustrated in FIG. 5.
The apparatus illustrated in FIGS. 6 and 7 are designed to remove
lower-boiling-point contaminants with greater effectiveness and to
better optimize the separate conditions under which the
chemisorptive media and physisorptive media operate. By providing
better purification of the airstream entering a photolithography
tool, better protection is provided against photoresist
contamination from airborne molecular bases and photo-induced
organic contamination of optics surfaces.
In the apparatus of FIG. 6, a circulation loop 102 circulates air
through the photolithography tool 41. An air conditioning unit 104
regulates the temperature and humidity of air entering the
photolithography tool 41 and ensures that the temperature and
humidity remain within tightly-prescribed limits. A computer having
a computer-readable medium storing software code for controlling
the cooling element (e.g., cooling coils) and heating element can
be coupled via a processor with air conditioning unit 104 to ensure
that the temperature and humidity are maintained within those
limits. A chemisportive filter element 16 is positioned within the
circulation loop to take advantage of the enhanced chemisorption
that occurs at warmer and more humid conditions. Meanwhile, a
physisorptive filter element 32 is positioned to take advantage of
the enhanced physisorption that takes place under cooler and drier
conditions.
The chemisorptive filter element 16 is positioned in the
circulation loop 102 at a position downstream from the air
conditioning unit 104 and physisorptive filter element 32. In this
embodiment, the chemisorptive filter element will therefore be
operated at the fixed temperature (e.g., in a range of about
21.degree. to about 23.degree. C.) and humidity established for air
entering the photolithography tool 41. Maintaining this fixed
temperature in the tool 41 is important to minimize
temperature-induced lens distortions that can lead to
aberations.
Air entering the air conditioning unit 104 comprises recirculated
air that has exited the photolithography tool 41 with make-up air
(provided to account for inevitable pressure losses) mixed in. In
this embodiment, the air can be at about ambient pressure or at a
lower pressure. A fan 106 is provided in the air conditioning unit
104 to drive the flow of air through the unit 104 and through the
entire circulation loop 102. Cooling coils 108 are positioned
downstream from the fan 106 to cool the incoming air. The cooling
coils can be cooled by water chilled to about 8.degree. C. After
being cooled by the cooling coils 108, the air may be at a
temperature of about 18.degree. to about 20.degree. C. In the
embodiment of FIG. 6, the air then passes through physisorptive
filter element 32, which is positioned next in line. Due to its
positioning proximate to and downstream from the cooling coils 108,
the physisorptive filter element 32 is operated at a reduced
temperature at which adsorption is enhanced. Finally, the air
passes through heating element 110, which reheats the air to the
desired operating temperature before it is passed through
chemisorptive filter element 16. Accordingly, the cooling coils 108
and heating element 110 of the air conditioning unit 104 are
advantageously utilized to provide enhanced physisorption and
chemisorption in addition to conditioning the temperature and
humidity of the air for enhanced operation of the photolithography
tool 41.
In the apparatus of FIG. 7, the physisorptive filter element 32 is
in the form of a rotating wheel about 1 or 2 meters in length and
having three separate chambers filled with physisorptive filter
media. A motor 112 is couple with the wheel to rotationally drive
it in the direction shown by the arrows (counter-clockwise when
viewed from an upstream position in the circulation loop 102).
The chamber operating as the active chamber 114 is positioned to
receive air recirculated from the photolithography tool 41 through
circulation loop 102. The active chamber 114 will remove
contaminants from the air in the circulation loop 102.
The preceding chamber in rotational sequence is operating as the
conditioning chamber 116. The conditioning chamber 116 is
positioned to receive chilled water circulated through line 120.
The chilled water cools the physisorptive filter media in
conditioning chamber 116 so that the media will be cooled
(providing enhanced adsorptive behavior) before rotation positions
this chamber as the active chamber 114. Alternatively, other
cooling elements such as supplemental cooling coils or a
regenerative heat exchanger can be used cool the physisorptive
filter media in the conditioning chamber 116. Other apparatus using
adiabatic cooling of a compressed gas, which is then passed through
the bed of physisorptive filter media can also be used.
The remaining chamber, which is operating as the regeneration
chamber 118, is positioned to receive heat exhaust from the
photolithography tool 41. The heat from the heat exhaust will raise
the temperature of the physisorptive filter media in regeneration
chamber 118 and thereby cause condensed contaminants to vaporize
and release from the physisorptive filter media rendering the
physisorptive filter media ready for reuse. The released
contaminants can then be captured and recycled. As an alternative
to the heat exhaust, other auxiliary sources of heat can be
provided to desorb contaminants from the media.
With each one-third rotation, the chamber operating as the active
chamber 114 becomes the regeneration chamber 118; the chamber
operating as the regeneration chamber 118 becomes the conditioning
chamber 116; and the chamber operating as the conditioning chamber
116 becomes the active chamber 114. This rotational cycle continues
throughout operation of the tool to continually regenerate and cool
the physisorptive filter media so that "fresh" media will always be
available for use. As such, the beds of filter media are operated
as "temperature swing adsorption beds," which, in combination with
the chemisorptive filter media can maintain amine levels in the
circulated air below 1 part per billion and can maintain
contamination levels of other organics below 1 part per billion in
an apparatus which also maintains temperature (via the air
conditioning unit) within +/-17 mK.
This same wheel used as the physisorptive filter element 32 in FIG.
7 can likewise be used in the apparatus of FIG. 6. As an
alternative to the rotating wheel embodiment of the physisorptive
filter element 32, separate conduits can respectively branch from
the circulation loop, heat exhaust, and chilled water conduit into
each of the three chambers, and valving at each of the branches can
be governed to rotate the flow from each conduit through each
chamber.
The apparatus of FIGS. 6 and 7 are particularly useful when used to
filter air for a stepper (exposure) tool in a photolithography
apparatus, where the filter elements can remove contaminants that
may form free radicals in the tool, which can then stick to the
lens of the tool, thereby fouling its operation. Nevertheless, the
apparatus of FIGS. 6 and 21 can also be used to filter air from a
track (where organics can change the wettability of a wafer being
processed and can throw off measurements of oxide layer thickness)
or to filter air entering other elements in a photolithography
apparatus that can be harmed by contaminants. Such uses, which can
be combined with the use of the apparatus of FIGS. 6 and 7 are
further described in U.S. Pat. No. 5,833,726, which is hereby
incorporated by reference in its entirety.
Referring to FIG. 8, a portion of an acidic, chemisorptive
composite filter element 16 is shown. The chemisorptive composite
filter element 16 has a cover sheet 66 and a middle layer 62. The
cover sheet 66 can be a polyester non-woven fabric having a
binder-to-fiber ratio of 55/44 and a thickness of 0.024 inches. The
middle layer 62 is an air-laid polyester non-woven fabric having a
thickness of 0.25 inches and a binder to fiber ratio of 35% to 65%.
The middle layer 62 is impregnated with a porous, acidic, polymer
material that binds readily with molecular bases in air flowing
through the filter. Alternatively, the fabrics can be woven.
The structure of FIG. 9 can be used directly in this form as the
acidic, adsorbent composite filter element. The acidic, adsorbent
composite 16, can employ a second cover sheet 80, provided on the
surface of middle layer 62, opposite to the first cover sheet 66,
as shown in FIG. 10. The cover sheet 66/80 can be a filtering or
non-filtering non-woven polyester, polyamide or polypropylene
material or other similar materials. If the cover sheet 66/80 is a
filtering material, it serves to provide some filtering of the air
entering the composite structure for removal of particulate
materials in the air stream. The cover sheet 66/80 can also serve
to retain the porous acidic polymer material such as a sulfonated
divinyl benzene styrene copolymer, which can be in bead form,
within the middle layer or batting 62. The cover sheets 66/80 can
also be chemically inert materials such as polypropylene or
polyester.
The physisorptive filter element 32, shown in FIGS. 1, 6 and 7, can
include untreated, activated carbon. The carbon is porous (the
specific surface area can be on the order of 1000 m.sup.2/g) and
can be provided in the form of fibers. Alternatively, the
untreated, activated carbon can be in the form of particles
aggregated in a tray. In another embodiment, the untreated,
activated carbon can be formed into a block and held together with
a binder material. The untreated, activated carbon can be formed
from a variety of sources, including coconut shell, coal, wood,
pitch, and other organic sources. Further still, a sulfonated
copolymer coating can be attached to the untreated, activated
carbon.
Alternatively, high-surface-area filter elements of this invention
can be fabricated using a three-dimensional printing technique as
described in U.S. Pat. Nos. 5,204,055; 5,340,656; and 5,387,380,
the entire contents of these patents being incorporated herein by
reference in their entirety.
Such a method of fabrication of a filter element is illustrated in
connection with FIG. 11. The process 200 includes forming a
three-dimensional model 202 of the filter element such that the
dimensions are well defined. The first layer of the powder material
used to form the filter is placed 204 by the printer apparatus. A
binder is then delivered 206 onto the powder material resulting in
the binding of selected regions thereof. Steps 204 and 206 are
repeated a number of times until the high-surface-area filter is
formed. Finally, the excess material is removed 210. An
illustrative example of a high surface area filter made in
accordance with this method is shown in the example 240 of FIG. 12.
The binder can be an acid-polymerizable or acid-cross-linkable
liquid.
The relative thicknesses of the chemisorptive filter element 16 and
the physisorptive filter element 32 can be engineered so that the
useful life of the two filter elements will be exhausted at
approximately the same time in a given environment. Accordingly, a
chemisorptive filter element formed of sulfonated polymer can be
made thinner than a physisorptive filter element formed of
untreated carbon since the physisorptive properties of the carbon
will typically be exhausted more quickly than the chemisorptive
properties of the acidic, sulfonated polymer.
The two composite filter components 16 and 32, can be contained
within any suitable container(s) or framework(s) for installation
in an airflow path of a filtering apparatus coupled with a
photolithography tool, the filter components 16 and 32 typically
being in the form of removable or replaceable filter elements. For
many purposes, it is preferable to increase the surface area of the
filter material exposed to an incident air flow; and, for this
purpose, the composite filter elements can be pleated to provide
the increased surface area.
One embodiment is shown on FIG. 13, in which a composite material
forms an air filter element 15 or 17. The filter material is
pleated into an accordion-like structure 19, as shown in FIG. 14,
contained within a square or rectangular container 18, having a
front 21 and back 23, that are open to an air stream shown by arrow
22. The pleating 20 is substantially perpendicular to the air flow.
FIG. 9 shows the structure in a front or back view. FIG. 14 shows a
cutaway top view of a filter element.
An alternative embodiment is shown in FIG. 15, wherein a plurality
of pleated composite filter elements 24, are sequentially disposed
within container 18, to provide a multi-stage filter through which
the air can pass. As in the above embodiment, the pleats 20 of the
elements 24 are substantially perpendicular to the direction of air
flow 22.
A further embodiment is shown in FIG. 16, wherein a composite
filter element is disposed in a cylindrical configuration and
retained within a cylindrical container 28. The pleats 20 are, as
described above, substantially perpendicular to a radially-directed
air flow. A further embodiment is show in FIG. 17, wherein the
composite structure is wound in a spiral configuration 30 contained
within a generally cylindrical container 28.
Acidic, chemisorptive particles can be evenly distributed
throughout the non-woven or fiber matrix or polyester batting. An
example of an acidic, chemisorptive particle includes but is not
limited to sulfonated divinyl benzene styrene copolymer.
In one embodiment, the ion-exchange, strongly-acidic, preliminary
catalyst has a particle size between 0.3 and 1.2 mm, a porosity of
approximately 0.30 ml/g, and an average pore diameter of about 250
angstroms. The catalyst can have a higher porosity of up to 300
ml/g, or higher. In addition, the concentration of acid sites in
the catalyst can be approximately 1.8 meq/ml and the surface area
of the catalyst can be about 45 m.sup.2/g. Such catalysts are sold
under the trade name, AMBERLYST.RTM. 15 DRY or AMBERLYST.RTM. 35
dry, by Rohm and Haas. Catalysts with physical properties outside
the ranges described above can also be used.
Overall, the dry processing of the fiber matrix of the
chemisorptive filter element involves the combination of
sulfonated-divinyl-benzene-styrene copolymers using a dry material
dispensing system, the inherent stratification of the batting's
density, and the even distribution of the sulfonated divinyl
benzene styrene copolymer particles as well as stratification of
the sulfonated divinyl benzene styrene copolymer particle size.
These procedures allow for a fabric architecture having an
increased bed depth at a very low pressure drop, which is highly
desirable due to the chemisorptive filter element's high first-pass
efficiency coupled with its low operating cost.
The term, "efficiency", as employed herein is defined by the
formula X-Y/X wherein X is the upstream concentration of pollutant,
and Y is the downstream concentration of pollutant.
The filter can have a mix of an activated carbon and the
preliminary catalyst material discussed above. This combination has
sufficient porosity and strongly acidic groups to provide easy
permanent removal of medium and strong bases and sufficient
retention of weak bases from the airborne base contaminants. The
filter can also include a porous polymer material.
The filter, as described, is employed in filtering the air in
environments such as semiconductor fabrication systems where there
is a requirement for uncontaminated air of high quality.
Referring to FIG. 18, the middle air-laid polyester non-woven lay
62 is collated to a cover sheet 66. The acidic, adsorbent particles
60 are positioned on a fiber matrix 62 from a fluidized bed or
other particle distribution system 64. The sulfonated divinyl
benzene styrene copolymer particles 60 are evenly stratified
throughout the depth of the batting 62. As discussed above, an
increased bed depth of adsorbent particles distributed throughout
the batting is highly desirable as it increases residence time,
increases exposure of the chemisorptive particle surfaces, provides
a low pressure drop, and substantially increases the lifetime of
the filter.
The chemisorptive particles 60 distributed in the matrix 62 are
then heated, preferably using two zones 68, 70 of infrared energy
at different wavelengths. The batting 62 is heated to an overall
average temperature of between 250.degree. and 350.degree. F.
The infrared energy causes the chemisorptive particles to adhere to
the batting at points where the particles contact the batting. This
procedure avoids the necessity of raising the temperature of the
entire batting to a point at, or near, the melting point of the
polyester batting, which could cause the batting to melt and
collapse thereby encasing the particles and destroying their
chemical activity.
The batting 62 is then calendered using a pair of calender rolls
76, 78. The first of these rolls 76 can be temperature controlled,
which allows the heating and calendering steps to be carried out at
a steady temperature of around 140.degree. F., and prevents
overheating and subsequent melting of cover sheet and prevents over
calendering of the fabric. The second roll, roll 78, may be a
rubber roll having a durometer that avoids crushing of the
adsorbent particles; roll 78 may also be metal.
Furthermore, when the temperature-controlled roller 76 is used, the
pressure at which the batting is about 2000 pounds across the
26-inch distance. Higher calendering pressures can crush the
particles particularly when those particles are activated-carbon
based, thereby forming dust, which cannot be retained in the
composite filter element and can consequently pass into the gas
stream.
In addition, a synthetic non-woven cover sheet 80 that helps to
maintain the sulfonated divinyl benzene styrene copolymer in the
batting can be calendered with the batting 62, as discussed above.
After the filter element is formed, gussets or spacers are placed
in the filter element. The filter element is sealed into a box.
Optionally, the material may be conducted over an upper roller 84
to facilitate cooling the material prior to further processing. The
method of manufacture for an activated carbon filter element is
described in detail in U.S. Pat. No. 5,582,865, titled, "Non-Woven
Filter Composite". The entire contents of this patent are
incorporated herein by reference.
While the above-described method is one method of creating the
filter, it is recognized that other techniques can be used. Some of
these techniques include those developed by Hoechst such as that
described in U.S. Pat. No. 5,605,746, the entire contents of which
are incorporated herein by reference or KX Industries' method of
media formation. The common feature in all of these methods is the
incorporation of a chemically-active sorbent into a porous media
structure.
In another method, a filter element can be made by premixing the
chemisorptive media and the physisorptive media together and then
depositing the mixture onto a web. Or the chemisorptive media and
the physisorptive media can be deposited from a respective
dispensing unit in desired proportions onto the web in situ as the
web passes beneath the dispensing units.
A pleated filter structure 220 using the porous acidic polymer of
the present invention is illustrated in FIG. 19. This is a pleated
system open on both sides of a rectangular frame 228 with a length
222, width 224 and depth such that it can be used as a replacement
filter in stack filter systems. The filter has a removal efficiency
of over 99% at 1000 ppb challenge concentration.
FIG. 20 graphically illustrates the removal efficiency for three
different acidic, chemisorptive filter elements. The graphs
represent removal efficiency as a function of time at 20 ppm of
NH.sub.3 concentration upstream from the filter. Filter element
size is approximately 12 in..times.12 in..times.6 in. Air flow is
approximately 100 cubic feet per minute (cfm). Considering service
life data only, it appears that filter element #3 performed best.
However, if additional data is considered, the conclusion is not so
simple. The pressure drop for filter element #1 was 0.2'' water
column (WC); the pressure drop for filter element #2 was 0.3''WC;
and the pressure drop for filter element #3 was 1.0''WC. Filter
elements #1 and #2 are very close to tool manufacturer's
specifications, but filter element #3 creates an excessive pressure
drop that interferes with the tool's proper ECU functioning.
Excessive pressure drop is undesirable for multiple reasons. For
example, it increases fan load and power consumption, reduces
airflow through the tool and positive pressure inside the
enclosure. Thus, filter element #1 made in accordance with the
present invention provided a substantial improvement in service
life while providing a pressure drop that is compatible with tool
operation.
The adsorptive performance of an untreated, activated-carbon filter
element is illustrated in FIG. 21. The graph of FIG. 21 shows the
adsorption breakthrough curves for a number of organic compounds on
both treated and untreated carbons. Comparing the breakthrough
curve for ethyl acetate (EtAc) for treated 50 and untreated carbon
50', the capacity (time to equivalent breakthrough) of untreated
carbon is found to be between 5 and 10 times higher than that of
treated carbon. As shown in the graph, organic vapor capacity for
isopropyl alcohol 52 and isobutene 54 in treated carbon is
similarly small in comparison to corresponding measurements of
organic vapor capacity for isopropyl alcohol 52' and isobutane 54'
in untreated carbon.
The above-described filter elements have a removal efficiency over
99% for both Volatile base compounds and condensable organic
contamination. The capacity of these filter elements for both
volatile base compounds and condensable organics has a range
between 5 to 60 ppm-days. The removal efficiency for
non-condensable organic contaminants is greater than 90%, and that
for element organics is over 99%. Typical element organics include
Si--R, P--R, B--R, Sn(Bi).sub.3 and other organo-metallics, where R
is an organic group, Si is silicon, P is phosphorous, B is boron,
Sn is tin, and Bi is bismuth.
Illustrated in FIG. 22 is an embodiment of the invention as a
filter unit 500 including a multiplicity of filter elements 502
having both chemisorptive and physisorptive media. As can be seen
in FIG. 22, the filter elements 502 are arranged in parallel in a
set of stacks 501 which are arranged in series within a casing 504
of the filter unit 550. A removable cover panel 505 allows access
to the filter elements 502. The filter unit 500 is also provide
with a set of casters 507 which facilitate easily moving the filter
unit 500 to a desired location. Air filtering systems are described
in greater detail in U.S. Pat. No. 5,607,647, the entire contents
of which are incorporated herein by reference.
In operation, air flows in the direction of arrow A through an
intake port 506, through the filter elements 502, and out of an
outlet port 508. A set of sampling ports 510-1, 510-2, 510-3, and
510-4 (collectively referred to as sampling port 510) provide
access to several regions of the filter unit 500 to facilitate
monitoring the quality of the air as it passes through the filter
unit 500. There is a sampling port on each side of the individual
filter elements 502 so that the change in the quality of the air as
it goes through the filter element can be evaluated.
Referring now to FIG. 23, there is shown the filter unit 500
employed in part of a photolithography process 512. The filter unit
500 is connected to an air handler unit 514 with a line 516.
Another line 518 connects filter unit 500 to a tool 520, such as a
stepper or track, and a line 522 connects the tool 520 to the air
handler 514. Thus the air handler 514 sends unfiltered air to the
filter unit 500 through the line 516. Contaminants in the air are
then removed as the air flows through the filter elements 502 of
the filter unit 500. The filtered air is subsequently sent to the
tool 520 through the line 518. And after the air passes through the
tool 520, it returns via the line 522 back to the air handler
514.
The performance of the filter elements 502 can be monitored by
visually inspecting the semiconductor wafers. For example, an
operator can look at the wafer to determine if the lithographic
process has degraded. Such degradation provides an indirect
indication to the operator that the performance of the filters have
degraded.
Alternatively, the performance of the filter elements 502 is
monitored by taking samples from the sample ports 510. For example,
as illustrated in FIG. 24A, as air flows in the direction of the
arrow A through the filter elements 502, the contaminants in the
air in the region between the two filter elements 502 is determined
with an analytical device 520 which draws samples from the sampling
port 510 through a line 522. Typical analytical devises include gas
chromatograph mass selective (GCMS), ion mobility spectrometers,
surface acoustic wave, atomic absorption, inductance couple plasma,
and Fourier transform (FTIR) methods. Sampling from all the ports
510-1 through 510-4 (FIG. 23), enables determining the amount of
contaminants in the air before and after the air goes through each
of the filter elements, thereby providing a convenient method for
monitoring the performance of all the filter elements 502 of the
filter unit 500.
Surface acoustic wave detectors are further described in U.S. Pat.
No. 5,856,198, which is hereby incorporated by reference in its
entirety. Referring to FIG. 25, there is shown an acoustic wave
detector 600 used in combination with a sacrificial lens 602 to
detect the presence of element organic such as Si--R. The Si--R
molecule is volatile; however, upon exposure to UV radiation, Si--R
reacts according to the reaction Si--RSi--R.degree.+R.degree. Where
R.degree. is an organic free radical, and oxygen, O.sub.2, reacts
as O.sub.220.degree. Such that Si--R.degree.+O.degree.Si--R--O or
R--Si--O Repeating the above reaction n-times provides
Si--R+O.sub.2Si--O.sub.2+R+R--O+ . . . thereby producing
Si--O.sub.2, which is a non-volatile inorganic oxide that is
condensable on the sacrificial lens 602. Therefore, by exposing the
Si--R to UV radiation, the acoustic wave detector 600 is able to
detect the amount of Si--R in the sampled air.
Rather than connecting the sampling port to an analytical device,
the sampling port 510 can be connected to a concentrator 524, as
illustrated in FIG. 24B. A pump 526 coupled to the concentrator 524
draws the samples to the concentrator through a line 528.
Alternatively, as illustrated in FIG. 24C, the sample accumulates
by diffusion in a concentrator 530 attached directly to the
sampling port 510. In either case, the operator takes the
concentrator 524 or 530 back to the lab where the contents of the
concentrator is evaluated by any of the analytical devices
described above.
While this invention has been particularly shown and described with
references to preferred embodiments thereof, it will be understood
by those skilled in the art that various changes in form and
details may be made therein without departing from the scope of the
invention encompassed by the appended claims.
* * * * *