Air supply system particularly suited to remove contaminants created by chemical, biological or radiological conditions

LaMoy , et al. August 5, 2

Patent Grant H2221

U.S. patent number H2,221 [Application Number 10/021,682] was granted by the patent office on 2008-08-05 for air supply system particularly suited to remove contaminants created by chemical, biological or radiological conditions. This patent grant is currently assigned to The United States of America as represented by the Secretary of the Navy. Invention is credited to Charles K. Atwell, W. Dale Craig, Dallas Wayne Culbertson, Craig S. LaMoy, Michael A. Pompeii, Bradley A. Repp.


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