Building block with a double male cross hole

Zhang , et al.

Patent Grant D885494

U.S. patent number D885,494 [Application Number D/673,568] was granted by the patent office on 2020-05-26 for building block with a double male cross hole. This patent grant is currently assigned to SHANGHAI PUTAO TECHNOLOGY CO., LTD.. The grantee listed for this patent is Shanghai Putao Technology Co., Ltd.. Invention is credited to Lei Xie, Xiang Zhang.


United States Patent D885,494
Zhang ,   et al. May 26, 2020

Building block with a double male cross hole

Claims

CLAIM The ornamental design for a building block with a double male cross hole, as shown and described.
Inventors: Zhang; Xiang (Shanghai, CN), Xie; Lei (Shanghai, CN)
Applicant:
Name City State Country Type

Shanghai Putao Technology Co., Ltd.

Shanghai

N/A

CN
Assignee: SHANGHAI PUTAO TECHNOLOGY CO., LTD. (Shanghai, CN)
Appl. No.: D/673,568
Filed: December 15, 2018

Current U.S. Class: D21/487; D21/502
Current International Class: 2101
Field of Search: ;D21/386,389,470,471,484-505 ;D8/382

References Cited [Referenced By]

U.S. Patent Documents
3882630 May 1975 Bianco
D315181 March 1991 Meyer
D347665 June 1994 Hatting
D348697 July 1994 Hatting
D360910 August 1995 Frederiksen
D394465 May 1998 Schmidt
D394681 May 1998 Pagel
6702642 March 2004 Parein
D581986 December 2008 Evitt
D600291 September 2009 Christensen
D600756 September 2009 Fleming
D610628 February 2010 Christensen
D614247 April 2010 Clausen
D614481 April 2010 Lewis
D805884 December 2017 Evitt
D809611 February 2018 Deblois
Primary Examiner: Chin; Cynthia M.
Attorney, Agent or Firm: Dragon Sun Law Firm, PC Li, Esq.; Jinggao

Description



FIG. 1 is a top perspective of a building block with a double male cross hole showing our new design;

FIG. 2 is a bottom perspective thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a front elevational view thereof;

FIG. 6 is a rear elevational view thereof;

FIG. 7 is a right side elevational view thereof; and,

FIG. 8 is a left side elevational view thereof.

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Patent Diagrams and Documents

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