Face mask

Description

FIG. 1 is a perspective view of a face mask showing my new design;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a left side elevation view thereof;

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is another perspective view thereof, shown with straps attached in broken lines in a used condition; and,

FIG. 9 is another front elevation view thereof, shown on a human head in broken lines in a used condition.

The broken line shown in FIGS. 8 and 9 form no part of the claimed design.

Claims

CLAIM The ornamental design for a face mask, as shown and described.

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Inventors:	Cho; Shih-Hsiung (New Taipei, TW)
Applicant:	Name City State Country Type MAKRITE INDUSTRIES INC. New Taipei N/A TW
Assignee:	Makrite Industries Inc. (New Taipei, TW)
Appl. No.:	D/640,055
Filed:	March 12, 2018

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Current U.S. Class:	D29/108
Current International Class:	2902
Field of Search:	;D29/100,102,105,106,107,108,110,122 ;D2/878,880,881 ;D24/110.1 ;2/455,456,410,423,424,425,9,171,173,206,906 ;128/857,858,201.22,201.23,201.24,206.21

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References Cited [Referenced By]

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U.S. Patent Documents

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Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: C. G. Mersereau DeWitt LLP

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