Upper chamber for a plasma processing apparatus

Tauchi , et al. December 5, 2

Patent Grant D804436

U.S. patent number D804,436 [Application Number D/544,068] was granted by the patent office on 2017-12-05 for upper chamber for a plasma processing apparatus. This patent grant is currently assigned to Hitachi High-Technologies Corporation. The grantee listed for this patent is Hitachi High-Technologies Corporation. Invention is credited to Kohei Sato, Susumu Tauchi, Takashi Uemura.


United States Patent D804,436
Tauchi ,   et al. December 5, 2017

Upper chamber for a plasma processing apparatus

Claims

CLAIM The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.
Inventors: Tauchi; Susumu (Tokyo, JP), Uemura; Takashi (Tokyo, JP), Sato; Kohei (Tokyo, JP)
Applicant:
Name City State Country Type

Hitachi High-Technologies Corporation

Minato-ku, Tokyo

N/A

JP
Assignee: Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.: D/544,068
Filed: October 30, 2015

Foreign Application Priority Data

Jun 12, 2015 [JP] 2015-013035
Current U.S. Class: D13/182; D15/138
Current International Class: 1303
Field of Search: ;D13/158-177,179,180,182,199,122,144 ;D10/104.1,108 ;D11/143,144,152 ;D14/216,240,356,509 ;D17/22 ;D23/323,328,333,335,336,337,341,352,357,370,385,386,399,400,499 ;D12/303,315 ;118/50,722,715,724,733 ;205/118,123 ;D9/500,452,454 ;D15/122,199,138 ;D8/16,19,323,399 ;D16/135,219,302 ;D7/367,404,503,523,584,586,624.1,630,640,677 ;D26/24,36,110

References Cited [Referenced By]

U.S. Patent Documents
4153907 May 1979 Kofron
D274836 July 1984 Smith
5641375 June 1997 Nitescu
D404369 January 1999 Kawachi
D448729 October 2001 Asao
D491963 June 2004 Doba
D716240 October 2014 Lau
2001/0023821 September 2001 Harris
2001/0035131 November 2001 Sakuma
2004/0069223 April 2004 Tzeng
2012/0018402 January 2012 Carducci
2013/0292254 November 2013 Kumar
2014/0097088 April 2014 Stowell
2016/0307743 October 2016 Brown
Primary Examiner: Asch; Jeffrey D
Assistant Examiner: Bell; Tracey J
Attorney, Agent or Firm: Crowell & Moring LLP

Description



FIG. 1 is a front and top perspective view of an upper chamber for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,

FIG. 9 is a partially enlarged view taken along line 9-9 of FIG. 8.

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