Aesthetic, hole-patterned motif for application to/use on useful articles and the like

Description

FIG. 1 is a left perspective view of the hole-patterned motif for application to/use on useful articles and the like;

FIG. 2 is a right side view thereof;

FIG. 3 is a left side view thereof;

FIG. 4 is a plan view thereof;

FIG. 5 is a back perspective view thereof; and,

FIG. 6 is a front perspective view thereof.

The broken lines shown in all of the figures are for environmental purposes only and form no part of the claimed design.

Claims

CLAIM The aesthetic hole-patterned motif for application to/use on useful articles and the like, as shown and described.

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Inventors:	Wolff; Gary (St. Louis, MO), Vivoli; Danilo (Florence, IT)
Applicant:	Name City State Country Type Wolff Shoe Company Fenton MO US
Assignee:	Wolff Shoe Company (Fenton, MO)
Appl. No.:	D/453,838
Filed:	May 3, 2013

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Current U.S. Class:	D2/946; D2/976
Current International Class:	0299
Field of Search:	;D2/896,916-918,925-942,945,946,969,971,976 ;36/1,7.5-7.8,8.1,11.5,45-58,104,108,136

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References Cited [Referenced By]

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U.S. Patent Documents

D9662	December 1876	Meyer
D63649	December 1923	Hruska
D64228	March 1924	Smolen
D116931	October 1939	Greenblatt
D143685	January 1946	Vivier
D176338	December 1955	Joyce
D247396	March 1978	Schlerth
D652200	January 2012	Wolff

Primary Examiner: Simone; Dominic
Attorney, Agent or Firm: Harness, Dickey & Pierce, P.L.C.