Stand for facial cleaning apparatus

De Klein February 10, 2

Patent Grant D722292

U.S. patent number D722,292 [Application Number D/479,258] was granted by the patent office on 2015-02-10 for stand for facial cleaning apparatus. This patent grant is currently assigned to Koninklijke Philips N.V.. The grantee listed for this patent is Koninklijke Philips N.V.. Invention is credited to Nicole Louisa De Klein.


United States Patent D722,292
De Klein February 10, 2015

Stand for facial cleaning apparatus

Claims

CLAIM The ornamental design for a stand for facial cleaning apparatus, as shown and described.
Inventors: De Klein; Nicole Louisa (Amsterdam, NL)
Applicant:
Name City State Country Type

Koninklijke Philips N.V.

Eindhoven

N/A

NL
Assignee: Koninklijke Philips N.V. (Eindhoven, NL)
Appl. No.: D/479,258
Filed: January 14, 2014

Foreign Application Priority Data

Jul 15, 2013 [EM] 002274449-0003
Current U.S. Class: D13/108
Current International Class: 1302
Field of Search: ;D13/107-110,118-119,184,199 ;D14/251,253,432,434 ;320/107-115,128,137-140

References Cited [Referenced By]

U.S. Patent Documents
D489322 May 2004 Sawai et al.
D508019 August 2005 Lamason et al.
D510905 October 2005 Thirouin
D511492 November 2005 Allende Fritsch
D525193 July 2006 Vu
D568327 May 2008 Fitch et al.
D568808 May 2008 Hamasaki
D572188 July 2008 Prat-Pfister
D621346 August 2010 Navid
D638789 May 2011 Markowitz
D657740 April 2012 Prat-Pfister
8497659 July 2013 Navid
D692376 October 2013 Palmer et al.
Primary Examiner: Tarcza; Rosemary K

Description



FIG. 1 is a perspective view showing my design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

The broken lines shown in the drawings are included for the purpose of illustrating environmental structure and form no part of the claimed design.

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