Headgear for mask

Scheiner , et al. December 31, 2

Patent Grant D696767

U.S. patent number D696,767 [Application Number D/409,213] was granted by the patent office on 2013-12-31 for headgear for mask. This patent grant is currently assigned to RedMed Limited. The grantee listed for this patent is Memduh Guney, David Anthony Pidcock, Rupert Christian Scheiner. Invention is credited to Memduh Guney, David Anthony Pidcock, Rupert Christian Scheiner.


United States Patent D696,767
Scheiner ,   et al. December 31, 2013

Headgear for mask

Claims

CLAIM The ornamental design for headgear for mask, as shown and described.
Inventors: Scheiner; Rupert Christian (Davidson, AU), Guney; Memduh (Killara, AU), Pidcock; David Anthony (Castle Hill, AU)
Applicant:
Name City State Country Type

Scheiner; Rupert Christian
Guney; Memduh
Pidcock; David Anthony

Davidson
Killara
Castle Hill

N/A
N/A
N/A

AU
AU
AU
Assignee: RedMed Limited (Bella Vista, AU)
Appl. No.: D/409,213
Filed: December 21, 2011

Related U.S. Patent Documents

Application Number Filing Date Patent Number Issue Date
29308629 May 2, 2008 D652505

Current U.S. Class: D24/110.1
Current International Class: 2902
Field of Search: ;D24/110.1,110.4 ;128/201.22,206.27,207.11,207.13,207.17,207.18

References Cited [Referenced By]

U.S. Patent Documents
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D485905 January 2004 Moore et al.
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D542912 May 2007 Gunaratnam et al.
D546441 July 2007 Hitchcock et al.
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D588258 March 2009 Judson et al.
D591419 April 2009 Chandran et al.
D623288 September 2010 Lubke et al.
D637279 May 2011 Scheiner et al.
2003/0196655 October 2003 Ging et al.
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2009/0183739 July 2009 Wondka
2009/0241961 October 2009 McAuley et al.

Other References

Guney et al., Parent U.S. Appl. No. 29/308,629, filed May 2, 2008. cited by applicant .
InnoMed Technologies, "Nasal-Pap Freestyle.TM." Brochure, 2004, 2 pages. cited by applicant .
InnoMed Technologies, "Nasal Aire.TM." Brochure 2003, 1 page. cited by applicant .
VIASYS Healthcare, "LYRA Nasal CPAP Interface" Brochure, 2004, 2 pages. cited by applicant.

Primary Examiner: Reid; Stella
Assistant Examiner: Shelton; Richelle G
Attorney, Agent or Firm: Nixon & Vanderhye, PC

Description



FIG. 1 is a front perspective view of headgear for mask according to our new ornamental design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a top view thereof;

FIG. 5 is a bottom view thereof;

FIG. 6 is a left side view thereof; and,

FIG. 7 is a right side view thereof.

The broken line showing of portions of the headgear for mask is included for the purpose of illustrating structural environment and forms no part of the claimed design.

* * * * *


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