Flow rate controller
Shinohara , et al. February 22, 2
U.S. patent number D633,181 [Application Number D/327,405] was granted by the patent office on 2011-02-22 for flow rate controller. This patent grant is currently assigned to Fujikin Incorporated. Invention is credited to Tomokazu Imai, Tsutomu Shinohara, Michio Yamaji.
| United States Patent | D633,181 |
| Shinohara , et al. | February 22, 2011 |
Flow rate controller
Claims
CLAIM The ornamental design for a flow rate controller, as shown and described.
| Inventors: | Shinohara; Tsutomu (Osaka, JP), Yamaji; Michio (Osaka, JP), Imai; Tomokazu (Osaka, JP) |
|---|---|
| Assignee: | Fujikin Incorporated (Osaka,
JP) |
| Appl. No.: | D/327,405 |
| Filed: | November 5, 2008 |
Foreign Application Priority Data
| Sep 25, 2007 [JP] | 2007-25785 | |||
| Current U.S. Class: | D23/245 |
| Current International Class: | 2301 |
| Field of Search: | ;D23/233-237,244-249 ;138/45 ;62/117,511,528 ;251/129.04,129.05 ;73/197,198,201 |
References Cited [Referenced By]
U.S. Patent Documents
| 4276904 | July 1981 | Jackson |
| D439312 | March 2001 | Fukano |
| D446738 | August 2001 | Fukano |
| 6491659 | December 2002 | Miyamoto |
| 6516707 | February 2003 | Elberson |
| 6619613 | September 2003 | Akamatsu et al. |
| 6874404 | April 2005 | Elberson |
| 7290567 | November 2007 | Hirakuni et al. |
| 7328721 | February 2008 | Kytola |
| D616965 | June 2010 | Miyazoe et al. |
Assistant Examiner: Stevens; Maurice
Attorney, Agent or Firm: Griffin & Szipl, P.C.
Description
FIG. 1 is a bottom plan view of the flow rate controller of the present invention.
FIG. 2 is a front elevational view of the flow rate controller of the present invention.
FIG. 3 is a left side elevational view of the flow rate controller of the present invention.
FIG. 4 is a perspective view of the flow rate controller of the present invention when a connector is repositioned.
FIG. 5 is a perspective view of the of the flow rate controller of the present invention.
FIG. 6 is a rear elevational view of the flow rate controller of the present invention.
FIG. 7 is a right side elevational view of the flow rate controller of the present invention; and,
FIG. 8 is a top plan view of the flow rate controller of the present invention.
Any indicia shown in broken lines in the drawings form no part of the design to be patented.
The present article relates to a design of a flow rate controller, which controls fluid including process gas used for fluid supply lines at semiconductor manufacturing facilities, chemical plants, nuclear power plants, petroleum refinery plants and the like.
A flow rate controller is easily connected to a cable by changing the position and direction of the connector even when it is found difficult to connect a cable to a connector because of the relative position of other devices to the controller.
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