Mask

Neuner February 16, 2

Patent Grant D610250

U.S. patent number D610,250 [Application Number D/319,529] was granted by the patent office on 2010-02-16 for mask. Invention is credited to Robert Neuner.


United States Patent D610,250
Neuner February 16, 2010

Mask

Claims

CLAIM The ornamental design for a mask, as shown and described.
Inventors: Neuner; Robert (Darien, CT)
Appl. No.: D/319,529
Filed: June 11, 2008

Current U.S. Class: D24/110
Current International Class: 2902
Field of Search: ;D24/110,110.1,203 ;128/205.25,206.12,200.23 ;392/403 ;4/537

References Cited [Referenced By]

U.S. Patent Documents
D208514 September 1967 Hartwell
D209364 November 1967 Katzman et al.
D210435 March 1968 Boltz
D279312 June 1985 Pohlmann
4903850 February 1990 Frank et al.
D495059 August 2004 Lie
Primary Examiner: Simmons; Ian
Assistant Examiner: Lee; Christopher
Attorney, Agent or Firm: Blake; Michael A.

Description



FIG. 1 is a top view of the disclosed mask;

FIG. 2 is a side view of the disclosed mask;

FIG. 3 is a rear view of the disclosed mask;

FIG. 4 is a front view of the disclosed mask;

FIG. 5 is a bottom view of the disclosed mask, the broken lines in FIG. 5 are included for the purpose of illustrating environmental structure of the inhaler that forms no part of the claimed design; and,

FIG. 6 is a perspective view of the disclosed mask.

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