Whole face covering mask
Ono , et al. October 13, 2
U.S. patent number D602,154 [Application Number D/294,735] was granted by the patent office on 2009-10-13 for whole face covering mask. This patent grant is currently assigned to Shigematsu Works Co., Ltd.. Invention is credited to Kenichi Ono, Shuichiro Shimada.
| United States Patent | D602,154 |
| Ono , et al. | October 13, 2009 |
Whole face covering mask
Claims
CLAIM The ornamental design for a whole face covering mask, as shown and described.
| Inventors: | Ono; Kenichi (Saitama, JP), Shimada; Shuichiro (Saitama, JP) |
|---|---|
| Assignee: | Shigematsu Works Co., Ltd.
(Tokyo, JP) |
| Appl. No.: | D/294,735 |
| Filed: | January 24, 2008 |
| Current U.S. Class: | D24/110.2 |
| Current International Class: | 2902 |
| Field of Search: | ;D24/110.1,110.2,110.3,110.4 ;D29/108,110 ;128/205.25,201.24,201.25,205.29,206.21,207.11 |
References Cited [Referenced By]
U.S. Patent Documents
| 3259127 | July 1966 | Klinger et al. |
| D331988 | December 1992 | Markert |
| D336546 | June 1993 | Lybrand |
| D378610 | March 1997 | Reischel et al. |
| D569502 | May 2008 | Abel et al. |
| D574486 | August 2008 | Betz et al. |
Assistant Examiner: Lee; Christopher
Attorney, Agent or Firm: Flynn, Thiel, Boutell & Tanis, P.C.
Description
FIG. 1 is a plan view of the whole face covering mask embodying our design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right side elevational view thererof; and,
FIG. 6 is a front elevational view thereof.
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