Full face mask

McAuley , et al. July 7, 2

Patent Grant D595841

U.S. patent number D595,841 [Application Number D/326,044] was granted by the patent office on 2009-07-07 for full face mask. This patent grant is currently assigned to Fisher & Paykel Healthcare Limited. Invention is credited to Arvin San Jose Gardiola, Wen Dong Huang, Alastair Edwin McAuley, Mark McLaren, Craig Robert Prentice.


United States Patent D595,841
McAuley ,   et al. July 7, 2009

Full face mask

Claims

CLAIM The ornamental design for a full face mask, as shown and described.
Inventors: McAuley; Alastair Edwin (Auckland, NZ), Prentice; Craig Robert (Auckland, NZ), Huang; Wen Dong (Auckland, NZ), Gardiola; Arvin San Jose (Auckland, NZ), McLaren; Mark (Auckland, NZ)
Assignee: Fisher & Paykel Healthcare Limited (Auckland, NZ)
Appl. No.: D/326,044
Filed: October 10, 2008

Current U.S. Class: D24/110.1; D24/110.4; D24/110.5
Current International Class: 2902
Field of Search: ;D24/110.1,110.4,110.5 ;128/205.25,206.27,207.11,206.26,207.17,207.13,206.21,204.18,206.12

References Cited [Referenced By]

U.S. Patent Documents
D303587 September 1989 Quinn et al.
D305166 December 1989 Quinn et al.
D323908 February 1992 Hollister et al.
D349586 August 1994 Handke
D397215 August 1998 Hoftman
D476732 July 2003 Smart
D486226 February 2004 Guney et al.
D492992 July 2004 Guney et al.
D493885 August 2004 Raje et al.
D506827 June 2005 Jones et al.
D507831 July 2005 Rosenkranz et al.
6926004 August 2005 Schumacher
D555785 November 2007 McAuley et al.
D583930 December 2008 McAuley et al.
D584400 January 2009 McAuley et al.
D586458 February 2009 Kooij et al.
2003/0034034 February 2003 Kwok et al.
2008/0006277 January 2008 Worboys et al.
2008/0257354 October 2008 Davidson et al.
2008/0276937 November 2008 Davidson et al.
Primary Examiner: Simmons; Ian
Assistant Examiner: Lee; Christopher
Attorney, Agent or Firm: Trexler, Bushnell, Giangiorgi, Blackstone & Marr, Ltd.

Description



FIG. 1 is a top plan view of the full face mask according to our design and shown attached to a headgear and connector which are in broken line;

FIG. 2 is a left side elevational view of the full face mask shown attached to the headgear and connector which are in broken line;

FIG. 3 is a front elevational view of the full face mask shown attached to the headgear and connector which are in broken line;

FIG. 4 is a right side elevational view of the full face mask shown attached to the headgear and connector which are in broken line;

FIG. 5 is a rear elevational view of the full face mask shown attached to the connector which is in broken line;

FIG. 6 is a bottom plan view of the full face mask shown attached to a headgear and connector which are in broken line; and,

FIG. 7 is a right side perspective view of the full face mask and shown attached to a headgear and connector which are in broken line.

The broken lines in the drawings show environmental structure that form no part of the design to be patented.

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