Mask for respirator

Fujiura , et al. December 9, 2

Patent Grant D582546

U.S. patent number D582,546 [Application Number D/287,676] was granted by the patent office on 2008-12-09 for mask for respirator. This patent grant is currently assigned to Teijin Pharma Limited. Invention is credited to Tongoh Chin, Shinya Fujimoto, Kazuaki Fujiura, Toru Hikosaka, Naoki Kurai, Satoe Matsunaga, Toshiki Nakamura, Takamitsu Okayama, Keiko Omura, Hideharu Shimura, Masahide Takishita.


United States Patent D582,546
Fujiura ,   et al. December 9, 2008

Mask for respirator

Claims

CLAIM The ornamental design for a mask for respirator, as shown and described.
Inventors: Fujiura; Kazuaki (Tokyo, JP), Nakamura; Toshiki (Tokyo, JP), Kurai; Naoki (Tokyo, JP), Omura; Keiko (Hino, JP), Okayama; Takamitsu (Hino, JP), Takishita; Masahide (Hino, JP), Chin; Tongoh (Hino, JP), Fujimoto; Shinya (Ibaraki, JP), Matsunaga; Satoe (Ibaraki, JP), Shimura; Hideharu (Osaka, JP), Hikosaka; Toru (Ibaraki, JP)
Assignee: Teijin Pharma Limited (Tokyo, JP)
Appl. No.: D/287,676
Filed: September 7, 2007

Foreign Application Priority Data

Mar 7, 2007 [JP] 2007-005933
Current U.S. Class: D24/110.1; D24/110.4
Current International Class: 2902
Field of Search: ;D24/110,110.1,110.4,110.5,164 ;128/206.12,206.21,206.24,206.25,206.28,205.25,204.12,207.12,207.13

References Cited [Referenced By]

U.S. Patent Documents
5884624 March 1999 Barnett et al.
D443355 June 2001 Gunaratnam et al.
D468421 January 2003 Smart
D468823 January 2003 Smart
D486226 February 2004 Guney et al.
D489817 May 2004 Ankey et al.
D490343 May 2004 Guney et al.
D492992 July 2004 Guney et al.
D493885 August 2004 Raje et al.
D494675 August 2004 Guney et al.
D502261 February 2005 Kopacko et al.
D515204 February 2006 Guney et al.
D519207 April 2006 Raje et al.
D539901 April 2007 McAuliffe et al.
Foreign Patent Documents
D1109143 May 2001 JP
131674 Mar 1990 TW
150165 Jan 1991 TW
523367 Mar 2003 TW

Other References

US. Appl. No. 29/287,675, filed Sep. 7, 2007. cited by other.

Primary Examiner: Simmons; Ian
Assistant Examiner: Lee; Christopher
Attorney, Agent or Firm: Sughrue Mion, PLLC

Description



FIG. 1 is a perspective view of a mask for respirator showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof; the left side elevational view is a mirror image of the right side elevational view;

FIG. 5 is a top plan view thereof; and,

FIG. 6 is a bottom plan view thereof.

The broken lines shown in FIGS. 1 to 6 are for illustrative purposes only and form no part of the claimed design.

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