U.S. patent number D582,545 [Application Number D/287,675] was granted by the patent office on 2008-12-09 for mask for respirator.
This patent grant is currently assigned to Teijin Pharma Limited. Invention is credited to Tongoh Chin, Shinya Fujimoto, Toru Hikosaka, Satoe Matsunaga, Takamitsu Okayama, Keiko Omura, Hideharu Shimura, Masahide Takishita.
United States Patent |
D582,545 |
Omura , et al. |
December 9, 2008 |
Mask for respirator
Claims
CLAIM The ornamental design for a mask for respirator, as shown and
described.
Inventors: |
Omura; Keiko (Hino,
JP), Okayama; Takamitsu (Hino, JP),
Takishita; Masahide (Hino, JP), Chin; Tongoh
(Hino, JP), Fujimoto; Shinya (Ibaraki, JP),
Shimura; Hideharu (Osaka, JP), Matsunaga; Satoe
(Ibaraki, JP), Hikosaka; Toru (Ibaraki,
JP) |
Assignee: |
Teijin Pharma Limited (Tokyo,
JP)
|
Appl.
No.: |
D/287,675 |
Filed: |
September 7, 2007 |
Foreign Application Priority Data
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Mar 7, 2007 [JP] |
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2007-005949 |
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Current U.S.
Class: |
D24/110.1 |
Current International
Class: |
2902 |
Field of
Search: |
;D24/110,110.1,110.4,110.5,164
;128/206.12,206.21,206.24,206.25,206.28,205.25,204.12,207.12,207.13 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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D1109143 |
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May 2001 |
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JP |
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131674 |
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Mar 1990 |
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TW |
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150165 |
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Jan 1991 |
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TW |
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523367 |
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Mar 2003 |
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TW |
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Primary Examiner: Simmons; Ian
Assistant Examiner: Lee; Christopher
Attorney, Agent or Firm: Sughrue Mion, PLLC
Description
FIG. 1 is a front perspective view of a mask for respiratory
showing our new design;
FIG. 2 is a rear perspective view thereof;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a right side elevational view thereof; the left side
elevational view is a mirror image of the right side elevational
view;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
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