Top panel for microwave introduction window of a plasma processing apparatus

Description

FIG. 1 is a front view of a top panel for microwave introduction window of a plasma processing apparatus showing our new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a sectional view taken along line 7--7 of FIG. 5;

FIG. 8 is an enlarged view taken along line 8--8 of FIG. 7;

FIG. 9 is an enlarged view taken along line 9--9 of FIG. 7; and,

FIG. 10 is a perspective view thereof.

Claims

CLAIM The ornamental design for a top panel for microwave introduction window of a plasma processing apparatus, as shown and described.

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Inventors:	Ota; Kinya (Amagasaki, JP), Tian; Cai Zhong (Amagasaki, JP), Kitagawa; Junichi (Amagasaki, JP)
Assignee:	Tokyo Electron Limited (Tokyo, JP)
Appl. No.:	D/252,832
Filed:	January 30, 2006

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Foreign Application Priority Data

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Jul 29, 2005 [JP]			2005-022107

Current U.S. Class:	D15/138; D15/199
Current International Class:	1509
Field of Search:	;D7/586,587,501,553.6,600.4 ;D8/70,74 ;D9/445,454,456 ;D15/133,144.1,199,122,138,139 ;117/103 ;118/723AN,723ME,723MP,723MW,723E,723ER ;216/69,67 ;257/E21.252,252,629,631,E39.001 ;427/562,571,575 ;D1/126,128 ;D6/455 ;D13/122,138,139,158-177,182 ;D18/17 ;156/242,345 ;175/374,434 ;204/298.8 ;219/420-424,523,530,541,544 ;264/328.14,328.15,328.16 ;313/231.31 ;315/111.21 ;407/113-118 ;408/145 ;425/547-550,564,566,570 ;451/541-548 ;700/121,123

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References Cited [Referenced By]

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U.S. Patent Documents

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Foreign Patent Documents

	0592017		Apr 1994		EP

Other References

Asian Sources Hardwares for World Markets, Nov. 1990, p. 251. cited by other.

Primary Examiner: Snapp; Sandra
Assistant Examiner: Palasik; Patricia
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.