Attracting disc for an electrostatic chuck for semiconductor production

Description

FIG. 1 is a front elevational view of an attracting disc for an electrostatic chuck for semiconductor production, showing my new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof; and,

FIG. 6 is a bottom plan view thereof.

The broken line showing in the figures is for illustrative purposes only and forms no part of the claimed design.

Claims

CLAIM The ornamental design for an attracting disc for an electrostatic chuck for semiconductor production, as shown and described.

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Inventors:	Hayashi; Daisuke (Nirasaki, JP)
Assignee:	Tokyo Electron Limited (Tokyo, JP)
Appl. No.:	D/245,048
Filed:	December 19, 2005

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Foreign Application Priority Data

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Sep 29, 2005 [JP]			2005-028310

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/182 ;156/345.53 ;279/128 ;361/234

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References Cited [Referenced By]

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U.S. Patent Documents

3078565	February 1963	Sanders
4502094	February 1985	Lewin et al.
5350479	September 1994	Collins et al.
5671116	September 1997	Husain
6033478	March 2000	Kholodenko
6278600	August 2001	Shamouilian et al.
6628503	September 2003	Sogard
6721162	April 2004	Weldon et al.
2002/0027762	March 2002	Yamaguchi
2002/0159217	October 2002	Tsuruta et al.
2004/0179323	September 2004	Litman et al.
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2004/0212947	October 2004	Nguyen et al.
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2005/0111161	May 2005	Tran
2006/0002053	January 2006	Brown et al.
2006/0164785	July 2006	Pellegrin
2006/0221539	October 2006	Morita et al.

Primary Examiner: Sikder; Selina
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.