U.S. patent number D537,048 [Application Number D/213,840] was granted by the patent office on 2007-02-20 for photomask blank.
This patent grant is currently assigned to Hoya Corporation. Invention is credited to Masaru Mitsui.
United States Patent |
D537,048 |
Mitsui |
February 20, 2007 |
Photomask blank
Claims
CLAIM The ornamental design for a photomask blank, as shown and
described.
Inventors: |
Mitsui; Masaru (Mukawa-mura,
JP) |
Assignee: |
Hoya Corporation (Tokyo,
JP)
|
Appl.
No.: |
D/213,840 |
Filed: |
September 23, 2004 |
Foreign Application Priority Data
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May 17, 2004 [JP] |
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2004-014506 |
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Current U.S.
Class: |
D13/182 |
Current International
Class: |
1303 |
Field of
Search: |
;D13/182 ;D8/349,354,382
;D6/300 ;D19/26,32,34 ;206/453 ;281/20,42,45 ;428/430,848.5 ;430/5
;382/144,145,147,181 |
References Cited
[Referenced By]
U.S. Patent Documents
Other References
US. Appl. No. 29/213,841, filed Sep. 23, 2004, Inventors: Masaru
Mitsui, et al., Entitled: Photomask Blank. cited by other.
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Primary Examiner: Sikder; Selina
Attorney, Agent or Firm: Frishauf, Holtz, Goodman &
Chick, P.C.
Description
FIG. 1 is a front elevational view of a photomask blank showing my
new design;
FIG. 2 is a rear elevational view thereof;
FIG. 3 is a left side view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is an enlarged partial front view along line 7--7 in FIG.
1;
FIG. 8 is a reduced scale front, left side, top perspective view of
the portion shown in FIG. 7; and,
FIG. 9 is a sectional view along line 9--9 in FIG. 7.
The broken line showing is for illustrative purposes only and forms
no part of the claimed design.
* * * * *