Sputtering target

Willson , et al. September 26, 2

Patent Grant D529057

U.S. patent number D529,057 [Application Number D/211,416] was granted by the patent office on 2006-09-26 for sputtering target. This patent grant is currently assigned to Williams Advanced Materials, Inc.. Invention is credited to Henry L. Grohman, Matthew T. Willson.


United States Patent D529,057
Willson ,   et al. September 26, 2006

Sputtering target

Claims

CLAIM The ornamental design for a sputtering target, as shown and described.
Inventors: Willson; Matthew T. (New Milford, CT), Grohman; Henry L. (Wappingers Falls, NY)
Assignee: Williams Advanced Materials, Inc. (Buffalo, NY)
Appl. No.: D/211,416
Filed: August 16, 2004

Current U.S. Class: D15/144; D15/150; D15/199
Current International Class: 1509
Field of Search: ;D15/144,150,199 ;204/192.11,192.12,192.13,192.15,192.17,192.22,298.09,298.11,298.12,298.13,298.19,298.22 ;419/31,45,54,53,23,32,38,48,60

References Cited [Referenced By]

U.S. Patent Documents
3821841 July 1974 Goodwin
D381030 July 1997 Tepman
6471830 October 2002 Moslehi et al.
6599399 July 2003 Xu et al.
6623605 September 2003 Diaz et al.
Primary Examiner: Davis; Antoine D.
Assistant Examiner: Palasik; Patricia
Attorney, Agent or Firm: Hiscock & Barclay, LLP

Description



FIG. 1 is a top plan view of the design.

FIG. 2 is a cross-sectional view of the upper portion of the design taken at line 2--2 of FIG. 1.

FIG. 3 is an enlarged detail of the cross-sectional view shown in FIG. 2.

FIG. 4 is a partial top plan view of the design shown in FIG. 1; and,

FIG. 5 is a cross-sectional view taken at line 5--5 of FIG. 4.

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