Mask

Yeung June 7, 2

Patent Grant D505969

U.S. patent number D505,969 [Application Number D/201,800] was granted by the patent office on 2005-06-07 for mask. This patent grant is currently assigned to Eastcolight (Hong Kong) Ltd.. Invention is credited to Wa Sang Yeung.


United States Patent D505,969
Yeung June 7, 2005

Mask

Claims

The ornamental design for a mask, as shown and described.
Inventors: Yeung; Wa Sang (Kowloon, HK)
Assignee: Eastcolight (Hong Kong) Ltd. (Lai Chi Kok, HK)
Appl. No.: D/201,800
Filed: March 19, 2004

Current U.S. Class: D16/309; D16/312; D21/517
Current International Class: 1606
Field of Search: ;D16/101,300-330 ;D29/109-110 ;D24/110.2 ;D14/372,496,371 ;D21/324,517 ;D26/38-39 ;351/41,44,158 ;2/426,425,909,447,444

References Cited [Referenced By]

U.S. Patent Documents
4729132 March 1988 Fierro
D352046 November 1994 Kataoka
5371555 December 1994 Nagel
D363482 October 1995 Robinson et al.
5724119 March 1998 Leight
D397334 August 1998 Larian
6009563 January 2000 Swanson et al.
D439266 March 2001 Rose
D440967 April 2001 Jung
6511177 January 2003 Hall et al.
2004/0160572 August 2004 Jannard et al.
Primary Examiner: Barkai; Raphael
Attorney, Agent or Firm: Intellectual Property Law Group LLP Lee; Otto O. Jackson; Juneko

Description



FIG. 1 is a perspective view of a mask embodying my design;

FIG. 2 is an elevational front view thereof;

FIG. 3 is an elevational rear view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

* * * * *


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