U.S. patent number D495,888 [Application Number D/194,387] was granted by the patent office on 2004-09-14 for apertured continuous filament fabric. This patent grant is currently assigned to Polymer Group, Inc.. Invention is credited to Nick Carter, Gary Hennel.
United States Patent | D495,888 |
Hennel , et al. | September 14, 2004 |
Inventors: | Hennel; Gary (Troutman, NC), Carter; Nick (Mooresville, NC) |
---|---|
Assignee: | Polymer Group, Inc. (North
Charleston, SC) |
Appl. No.: | D/194,387 |
Filed: | November 24, 2003 |
Current U.S. Class: | D5/47 |
Current International Class: | 0505 |
Field of Search: | ;428/17,18,151,154,156,171,187,198,199,904.4,542.2,919,542.6 ;D24/124,125 ;D25/142,152 ;5/413AM,709 ;D7/396.4,396.5 ;162/134,140,231 ;156/148,209 ;D5/1-3,7-8,11,13-14,19,20,23-27,30,32,35-37,39,40,41,44-47,49,50,52-64,66,99 ;D2/749,994 ;D6/582,583,595,596,598,603-606,608,613,616,617,619,622 |
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