Apertured continuous filament fabric

Hennel , et al. August 31, 2

Patent Grant D495150

U.S. patent number D495,150 [Application Number D/194,419] was granted by the patent office on 2004-08-31 for apertured continuous filament fabric. This patent grant is currently assigned to Polymer Group, Inc.. Invention is credited to Nick Carter, Gary Hennel.


United States Patent D495,150
Hennel ,   et al. August 31, 2004

Apertured continuous filament fabric

Claims

The ornamental design for an apertured continuous filament fabric, substantially as shown and described.
Inventors: Hennel; Gary (Troutman, NC), Carter; Nick (Mooresville, NC)
Assignee: Polymer Group, Inc. (North Charleston, SC)
Appl. No.: D/194,419
Filed: November 24, 2003

Current U.S. Class: D5/47
Current International Class: 0505
Field of Search: ;D5/1-3,7-8,11,13-14,19,20,23-27,30,32,35-37,39,40,41,44-47,49,50,52-64,66,99 ;D2/749,994 ;D6/582,583,595,596,598,603-606,608,613,616,617,619,622 ;428/17,18,151,154,156,171,187,198,199,904.4,542.2,919,542.6 ;D24/124,125 ;D25/142,152 ;5/413AM,709 ;D7/396.4,396.5 ;162/134,140,231 ;156/148,209

References Cited [Referenced By]

U.S. Patent Documents
D34599 May 1901 Townsend
D38047 May 1906 Conde
D58860 August 1921 Worms
D61590 October 1922 Messina
1852936 April 1932 Oscar
D88352 November 1932 Huber
D92165 May 1934 de Liso
D100743 August 1936 Siner
2052088 August 1936 Drumheller
D102276 December 1936 Huber
D102340 December 1936 Siner
D102846 January 1937 Siner
2880111 March 1959 Drelich et al.
3240657 March 1966 Hynek
3345243 October 1967 Kalwaites
3485706 December 1969 Evans
3558412 January 1971 Kurz
3616154 October 1971 Dow et al.
4548856 October 1985 Ali Khan et al.
5645504 July 1997 Westhoff
D478217 August 2003 Bruner et al.
D481872 November 2003 Hennel et al.
Primary Examiner: Gandy; James
Assistant Examiner: Nelson; T. Chase
Attorney, Agent or Firm: Wood, Phillips, Katz, Clark & Mortimer

Description



The sole FIGURE is an enlarged, fragmentary front elevational view of an apertured continuous filament fabric embodying the present design, with the opposite elevational view being a mirror image.

* * * * *


uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed