U.S. patent number D473,256 [Application Number D/153,282] was granted by the patent office on 2003-04-15 for diving mask.
Invention is credited to Le - Jang Feng.
United States Patent |
D473,256 |
Feng |
April 15, 2003 |
Diving mask
Claims
The ornamental design for diving mask, as shown.
Inventors: |
Feng; Le - Jang (Taipei,
TW) |
Appl.
No.: |
D/153,282 |
Filed: |
October 25, 2001 |
Foreign Application Priority Data
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Jul 17, 2001 [CN] |
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90304697 |
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Current U.S.
Class: |
D16/311 |
Current International
Class: |
1606 |
Field of
Search: |
;D16/101,300-330
;D29/109,110 ;351/41,44,51,52,158
;2/426,428,432,440-444,452,446,447 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Barkai; Raphael
Attorney, Agent or Firm: Pro-Techtor International
Services
Description
FIG. 1 is an elevation view of diving mask showing my new
design:
FIG. 2 is a top plan view thereof;
FIG. 3 is a front view thereof;
FIG. 4 is bottom plan view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a right side view thereof; and,
FIG. 7 is a rear view thereof.
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