Diving mask

Feng April 15, 2

Patent Grant D473256

U.S. patent number D473,256 [Application Number D/153,282] was granted by the patent office on 2003-04-15 for diving mask. Invention is credited to Le - Jang Feng.


United States Patent D473,256
Feng April 15, 2003

Diving mask

Claims

The ornamental design for diving mask, as shown.
Inventors: Feng; Le - Jang (Taipei, TW)
Appl. No.: D/153,282
Filed: October 25, 2001

Foreign Application Priority Data

Jul 17, 2001 [CN] 90304697
Current U.S. Class: D16/311
Current International Class: 1606
Field of Search: ;D16/101,300-330 ;D29/109,110 ;351/41,44,51,52,158 ;2/426,428,432,440-444,452,446,447

References Cited [Referenced By]

U.S. Patent Documents
D343029 January 1994 Berenson
D367875 March 1996 Lutz et al.
D368107 March 1996 Lutz et al.
5608920 March 1997 Oliver et al.
5963295 October 1999 Pernicka
Primary Examiner: Barkai; Raphael
Attorney, Agent or Firm: Pro-Techtor International Services

Description



FIG. 1 is an elevation view of diving mask showing my new design:

FIG. 2 is a top plan view thereof;

FIG. 3 is a front view thereof;

FIG. 4 is bottom plan view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof; and,

FIG. 7 is a rear view thereof.

* * * * *


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