U.S. patent number D439,326 [Application Number D/114,614] was granted by the patent office on 2001-03-20 for nasal respiration mask.
This patent grant is currently assigned to MPV-Truma Gesellschaft Fuer Medizintechnische Produkte mbH. Invention is credited to Karl-Heinz Hecker, Rudolf Schinagl.
United States Patent |
D439,326 |
Hecker , et al. |
March 20, 2001 |
Nasal respiration mask
Claims
The ornamental design for a nasal respiration mask, as shown and
described.
Inventors: |
Hecker; Karl-Heinz (Chiemgau,
DE), Schinagl; Rudolf (Unterhaching, DE) |
Assignee: |
MPV-Truma Gesellschaft Fuer
Medizintechnische Produkte mbH (Munich, DE)
|
Appl.
No.: |
D/114,614 |
Filed: |
November 29, 1999 |
Foreign Application Priority Data
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May 31, 1999 [DE] |
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4 99 05 622 |
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Current U.S.
Class: |
D24/110.5;
D24/110.1 |
Current International
Class: |
2902 |
Field of
Search: |
;D24/110.5,110.4,110.1
;128/207.11,206.27,202.27,204.11,205.25,207.18 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Simmons; Ian
Attorney, Agent or Firm: Jordan and Hamburg LLP
Description
FIG. 1 is a top and right side perspective view of a nasal
respiration mask showing my new design;
FIG. 2 is a bottom and right side perspective view thereof;
FIG. 3 is a bottom and right side perspective view thereof more
fully showing the bottom;
FIG. 4 is a top plan view thereof;
FIG. 5 is a right side elevation view thereof, the left side
elevation view (not shown) being a mirror image of the right side
elevation view;
FIG. 6 is a bottom plan view thereof; and,
FIG. 7 is an upper end elevation view thereof.
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