U.S. patent number D424,583 [Application Number D/086,850] was granted by the patent office on 2000-05-09 for hinge unit for vacuum-processing a semiconductor wafer.
This patent grant is currently assigned to Tokyo Electron Limited. Invention is credited to Masami Mizukami.
United States Patent |
D424,583 |
Mizukami |
May 9, 2000 |
Hinge unit for vacuum-processing a semiconductor wafer
Claims
The ornamental design for a hinge unit for vacuum-processing a
semiconductor wafer, as shown.
Inventors: |
Mizukami; Masami (Kofu,
JP) |
Assignee: |
Tokyo Electron Limited (Tokyo,
JP)
|
Appl.
No.: |
D/086,850 |
Filed: |
April 21, 1998 |
Foreign Application Priority Data
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|
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Oct 21, 1997 [JP] |
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9-72009 |
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Current U.S.
Class: |
D15/122; D15/138;
D15/141; D8/323 |
Current International
Class: |
1509 |
Field of
Search: |
;D13/182
;414/217,935,937 ;16/221,244,354 ;49/149,152,153,246,247,254
;D15/122,138,141 ;D8/323 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Douglas; Alan P.
Assistant Examiner: Tabor; Lavone D.
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier
& Neustadt, P.C.
Description
FIG. 1 is a front elevational view of hinge unit for
vacuum-processing a semiconductor wafer, showing my new design;
FIG. 2 is a top plan view thereof;
FIG. 3 is a bottom plan view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a rear elevational view thereof; and,
FIG. 6 is a left side elevational view thereof.
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