U.S. patent number 6,757,964 [Application Number 10/011,720] was granted by the patent office on 2004-07-06 for apparatus for manufacturing sliders.
This patent grant is currently assigned to TDK Corporation. Invention is credited to Tatsuya Harada, Kunimasa Nakata, Yoshitaka Sasaki.
United States Patent |
6,757,964 |
Sasaki , et al. |
July 6, 2004 |
**Please see images for:
( Certificate of Correction ) ** |
Apparatus for manufacturing sliders
Abstract
An object of the invention is to manufacture sliders having
excellent properties with accuracy and to improve the production
efficiency and the cleaning property. In a method of the invention
to manufacture a bar in which a row of slider sections are aligned,
a wafer block is made from a wafer in which rows of slider sections
are aligned. The wafer block is bonded to a dummy block on a
support plate. Next, a processing step and a cutting step are
repeated. The processing step is to perform a specific processing
on the medium facing surfaces of a row of slider sections in the
medium facing surface of the wafer block bonded to the support
plate. The cutting step is to cut the wafer block together with the
support plate such that the row of slider sections whose medium
facing surfaces have received the specific processing are separated
from the wafer block to be the bar. A tape is affixed to the medium
facing surfaces to protect the medium facing surfaces in the
cutting step.
Inventors: |
Sasaki; Yoshitaka (Tokyo,
JP), Harada; Tatsuya (Tokyo, JP), Nakata;
Kunimasa (Tokyo, JP) |
Assignee: |
TDK Corporation (Tokyo,
JP)
|
Family
ID: |
27179260 |
Appl.
No.: |
10/011,720 |
Filed: |
December 11, 2001 |
Related U.S. Patent Documents
|
|
|
|
|
|
|
Application
Number |
Filing Date |
Patent Number |
Issue Date |
|
|
391199 |
Sep 7, 1999 |
6374479 |
|
|
|
Current U.S.
Class: |
29/737; 29/423;
29/603.12; 29/603.16; 29/721; 29/729; 451/5; G9B/5.034;
G9B/5.229 |
Current CPC
Class: |
G11B
5/10 (20130101); G11B 5/3173 (20130101); G11B
5/60 (20130101); G11B 5/1871 (20130101); G11B
5/3116 (20130101); G11B 5/3163 (20130101); G11B
5/3967 (20130101); Y10T 29/49798 (20150115); Y10T
29/49048 (20150115); Y10T 29/5313 (20150115); Y10T
29/53165 (20150115); Y10T 29/53091 (20150115); Y10T
29/49789 (20150115); Y10T 29/49812 (20150115); Y10T
29/49041 (20150115); Y10T 29/4981 (20150115); Y10T
29/49792 (20150115); Y10T 29/49032 (20150115) |
Current International
Class: |
G11B
5/10 (20060101); G11B 5/60 (20060101); G11B
5/187 (20060101); G11B 5/31 (20060101); G11B
5/39 (20060101); H01M 019/00 (); B23P 019/00 () |
Field of
Search: |
;29/721,720,603.15,603.16,737,729,603.12,603.08,412,414,423,429
;83/455,255,268 ;451/41,53,28 ;125/12-20 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
|
|
|
|
|
|
|
63-160341 |
|
Jul 1988 |
|
JP |
|
A-4-289511 |
|
Oct 1992 |
|
JP |
|
4-367227 |
|
Dec 1992 |
|
JP |
|
5-62950 |
|
Mar 1993 |
|
JP |
|
5-144938 |
|
Jun 1993 |
|
JP |
|
06-67310 |
|
Mar 1994 |
|
JP |
|
6-349040 |
|
Dec 1994 |
|
JP |
|
07-14137 |
|
Jan 1995 |
|
JP |
|
7-78796 |
|
Mar 1995 |
|
JP |
|
8-138223 |
|
May 1996 |
|
JP |
|
9-73058 |
|
Mar 1997 |
|
JP |
|
9-297906 |
|
Nov 1997 |
|
JP |
|
2001-230223 |
|
Aug 2001 |
|
JP |
|
Primary Examiner: Trinh; Minh
Attorney, Agent or Firm: Oliff & Berridge, PLC
Claims
What is claimed is:
1. An apparatus for manufacturing sliders from a slider aggregate,
the slider aggregate being obtained from a material including a
plurality of rows of sections to be the sliders, each of the
sections to be the sliders having a medium facing surface, the
slider aggregate including one of the rows of the sections to be
the sliders, the medium facing surfaces of the sections to be the
sliders of the one of the rows being exposed at an end face of the
slider aggregate and having received a specific processing, the
apparatus comprising: a holding means for holding the material
while the medium facing surfaces of the sections to be the sliders
of a row that is located at one end of the material align side by
side at the one end face of the material, and are covered all
together with a strip-shaped protection member after having
received the specific processing, and a cutting means for cutting
the material held by the holding means so that the row located at
the one end of the material is separated from the material to be
the slider aggregate, wherein the holding means includes: a first
section for holding the material; and a second section for holding
the protection member, the second section fixing the protection
member when the material is cut, and holding the protection member
and the slider aggregate together after the material has been
cut.
2. An apparatus for manufacturing sliders from a slider aggregate,
the slider aggregate being obtained from a material including a
plurality of rows of sections to be the sliders, each of the
sections to be the sliders having a medium facing surface, the
slider aggregate including one of the rows of the sections to be
the sliders, the medium facing surfaces of the sections to be the
sliders of the one of the rows being exposed at an end face of the
slider aggregate and having received a specific processing, the
apparatus comprising: a holding member for holding the material
while the medium facing surfaces of the sections to be the sliders
of a row that is located at one end of the material align side by
side at the one end face of the material and are covered all
together with a strip-shaped protection member after having
received the specific processing, and a cutting device for cutting
the material held by the holding member so that the row located at
the one end of the material is separated from the material to be
the slider aggregate, wherein the holding member includes: a first
section for holding the material; and a second section for holding
the protection member, the second section fixing the protection
member when the material is cut, and holding the protection member
and the slider aggregate together after the material has been cut.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a method and an apparatus for
manufacturing sliders used for a thin-film magnetic head and the
like.
2. Description of the Related Art
A flying-type thin-film magnetic head used for a magnetic disk
device and so on is generally made up of a thin-film magnetic head
slider (that may be simply called a slider) having a thin-film
magnetic head element provided at the trailing edge of the slider.
The slider generally comprises a rail whose surface functions as a
medium facing surface (an air bearing surface) and a tapered
section or a step near the end on the air inflow side. The rail
flies slightly above the surface of a recording medium such as a
magnetic disk by means of air flow from the tapered section or
step.
A thin-film magnetic head element generally used is a
composite-type element made up of layers of an induction magnetic
transducer for writing and a magnetoresistive (MR) element for
reading.
In general, such thin-film magnetic head sliders are formed through
cutting a wafer in one direction in which sections to be sliders
(called slider sections in the following description) each
including a thin-film magnetic head element are arranged in a
plurality of rows. A block called a bar in which the slider
sections are arranged in a row is thereby formed. Rails are then
formed in the bar and the bar is cut into the sliders.
The manufacturing process of the sliders includes a step of
processing the medium facing surface of the bar, that is, grinding
or lapping the medium facing surface and a step of cutting the
wafer into the bars. The order of the step of processing the medium
facing surface and the step of cutting the wafer into the bars
depends on methods of processing the medium facing surface and
cutting the wafer, as described later.
In the step of processing the medium facing surface, it is required
that the MR height and the throat height of the thin-film magnetic
head element formed in the bar each fall within a tolerance range
and that processing accuracy of the surface processed falls within
a tolerance range. The MR height is the length (height) between the
end of the MR element close to the medium facing surface and the
opposite end. The throat height is the length (height) of the
magnetic pole of an induction magnetic transducer.
In related art the following method is generally taken to process
the medium facing surfaces of the bars and cutting the wafer into
the bars. That is, a bar including a row of slider sections is cut
from a wafer. The bar is fixed to a specific jig by bonding the
surface of the bar opposite to the medium facing surface to the
jig. The medium facing surface of the bar thus fixed to the jig is
then processed. This method is called a first method in the
following description.
In related art, second and third methods described below have been
proposed, in addition to the first method, for processing the
medium facing surfaces of the bars and cutting the wafer into the
bars.
The second method is, as shown in FIG. 7 of U.S. Pat. No.
5,406,694, for example, a specific length of block including rows
of slider sections is cut from a wafer. The block is fixed to a
specific jig by bonding the surface of the block opposite to the
medium facing surface to the jig. The medium facing surface of the
block thus fixed to the jig is then processed. The block is then
cut into bars whose medium facing surfaces have been processed.
The third method is, as shown in FIG. 3 of Japanese Patent
Application Laid-open Hei 4-289511, for example, a wafer is fixed
to a specific jig and the medium facing surface of the wafer fixed
to the jig is processed. The wafer is then cut into bars whose
medium facing surfaces have been processed.
Of the foregoing methods, in the first method a bar including a row
of slider sections is cut from a wafer. The bar is fixed to a jig
and the medium facing surface of the separated bar is then
processed. Consequently, the bar is often affected by the state of
the interface between the bar and the jig or by warpage caused by
bonding and likely to be deformed and to form a curvature and the
like. As a result, it is likely that processing accuracy of the
surface of the bar processed is reduced and deformation occurs,
such as curvatures of the layers making up the thin-film magnetic
head elements formed in the bar. In addition, it is difficult to
precisely control the resistance of the MR element, the MR height
and the throat height. It is therefore difficult to precisely
fabricate thin-film magnetic head sliders with excellent
properties.
In contrast, the second and third methods do not include the step
of fixing a separate bar sliced from a wafer to the jig. Therefore,
the above-stated problems are reduced. In the second and third
methods, however, the medium facing surface is processed and then
the wafer or block is cut into bars while the medium facing surface
is exposed. Consequently, the pole portions may be eroded by a
water-soluble grinding agent, dust may deposit on the medium facing
surface, and mechanical scratches may result on the medium facing
surface when the wafer or block is cut into bars. Furthermore, the
bar may be chipped while handled after the bar is sliced from the
wafer. It is therefore difficult to precisely fabricate thin-film
magnetic head sliders with excellent properties.
Another method for overcoming the foregoing problems is to bond a
dedicated jig to the medium facing surface of a wafer or a block
with a binder such as a thermosetting resin or a thermoplastic
adhesive. In this method, however, it is required that every time
the wafer or block is sliced, the medium facing surface of the
wafer or block is bonded to the jig before slicing, and the bar is
detached from the jig after slicing. These bonding and removing
make the manufacturing process complicated and require extra time,
and the production efficiency is reduced. The method further has a
problem that binder residues (adhesive transfer) are left on the
medium facing surface and the cleaning ability (the cleaning
efficiency and the state after cleaning) are not satisfactory. In
addition, since it is required that the bar is removed from the jig
after slicing, automation of the processing performed on the sliced
bar is difficult.
The third method requires steps of fixing the wafer to the jig and
separating the wafer from the jig every time the bar is sliced. The
manufacturing process is therefore complicated and the production
efficiency is reduced.
In related-art methods of manufacturing sliders, human handling and
so on may cause static damage to the sliders and the thin-film
magnetic head elements formed in the sliders, in particular.
SUMMARY OF THE INVENTION
It is an object of the invention to provide a method and an
apparatus for manufacturing sliders having excellent properties
with accuracy and for improving the production efficiency and the
cleaning property.
A method of manufacturing sliders of the invention is provided for
fabricating a slider aggregate that is made from a material
including a plurality of rows of sections to be the sliders each
having a medium facing surface. The slider aggregate includes one
of the rows of the sections to be the sliders whose medium facing
surfaces receive a specific processing. The method includes the
steps of: performing the specific processing on the medium facing
surfaces of the row of the sections to be the sliders located at
one end of the material; and cutting the material while the medium
facing surfaces are covered with a strip-shaped protection member
such that the row of the sections to be the sliders whose medium
facing surfaces have received the specific processing are separated
from the material to be the slider aggregate.
In the method of manufacturing sliders of the invention, the
specific processing is performed on the medium facing surfaces of
the row of the sections to be the sliders located at one end of the
material in the step of performing the processing. The material is
cut while the medium facing surfaces are covered with the
strip-shaped protection member such that the row of the sections to
be the sliders whose medium facing surfaces have received the
specific processing are separated from the material to be the
slider aggregate in the step of cutting. The slider aggregate is
thus manufactured.
In the method the protection member may be a tape having
adhesiveness and the step of cutting may include the step of
bonding the protection member to the medium facing surfaces located
in the material before cutting the material. In this case, the
method of manufacturing sliders may further include the step of
peeling off the protection member from the slider aggregate having
gone through the step of cutting. In the step of peeling off the
protection member, the protection member may be peeled off from the
slider aggregate after the adhesiveness of the protection member is
reduced.
In the method the protection member may be a tape containing a
conductive substance. In this case, the protection member made up
of the tape containing the conductive substance prevents static
damage to the sliders.
In the method the protection member may be a tape having no
adhesiveness and the step of cutting may include the step of
holding the medium facing surfaces located in the material while
the protection member is inserted before cutting the material.
In the method the protection member may include a resist layer made
of a photoresist material. In this case, the method may further
include the step of forming an etching mask using the resist layer
of the protection member on the medium facing surface of the slider
aggregate having gone through the step of cutting, and etching the
medium facing surface through the use of the mask.
In the method the step of performing the processing may include
lapping of the medium facing surfaces.
In the method the sections to be the sliders may each include a
thin-film magnetic head element.
An apparatus for manufacturing sliders of the invention is provided
for fabricating a slider aggregate that is made from a material
including a plurality of rows of sections to be the sliders each
having a medium facing surface. The slider aggregate includes one
of the rows of the sections to be the sliders whose medium facing
surfaces receive a specific processing. The apparatus comprises: a
means (or a member) for holding the material, the medium facing
surfaces of the row of the sections to be the sliders located at
one end of the material having received the specific processing,
while the medium facing surfaces are covered with a strip-shaped
protection member; and a means (or a device) for cutting the
material held by the means (member) for holding while the medium
facing surfaces are covered with the protection member such that
the row of the sections to be the sliders whose medium facing
surfaces have received the specific processing are separated from
the material to be the slider aggregate.
In the apparatus the material is held by the means (member) for
holding, the medium facing surfaces of the row of the sections to
be the sliders located at one end of the material having received
the specific processing, while the medium facing surfaces are
covered with a strip-shaped protection member. The material held by
the means (member) for holding is cut with the means (device) for
cutting while the medium facing surfaces are covered with the
protection member such that the row of the sections to be the
sliders whose medium facing surfaces have received the specific
processing are separated from the material to be the slider
aggregate.
In the apparatus of the invention, the means (member) for holding
may include a section for holding the material and a section for
holding the protection member.
Other and further objects, features and advantages of the invention
will appear more fully from the following description.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a perspective view of an apparatus for manufacturing
sliders of an embodiment of the invention.
FIG. 2 is a flowchart for illustrating a method of manufacturing
sliders of the embodiment of the invention.
FIG. 3 is a view for illustrating the step of fabricating a wafer
block of the embodiment of the invention.
FIGS. 4A and 4B are perspective views for illustrating the step of
joining the wafer block to a support plate of the embodiment of the
invention.
FIGS. 5A and 5B are views for illustrating handling of the wafer
blocks having different widths in the embodiment of the
invention.
FIG. 6 is a top view for illustrating the state of the wafer block,
the support plate and a dummy block when bonded.
FIG. 7 is a cross section taken along line 7--7 of FIG. 6.
FIGS. 8A and 8B are views for illustrating the surface
configuration of the support plate of the embodiment of the
invention.
FIGS. 9A and 9B are views for illustrating the surface
configuration of the dummy block of the embodiment of the
invention.
FIG. 10 is a perspective view for illustrating the state of the
wafer block, the support plate and the dummy block fastened to a
holder.
FIG. 11 is a perspective view for illustrating the step of
performing a specific processing on the medium facing surface of
the wafer block in the embodiment of the invention.
FIG. 12 is a perspective view for illustrating the way in which a
tape is bonded to the medium facing surface of the wafer block in
the embodiment of the invention.
FIG. 13 is a perspective view of a support plate holding section
and a tape holding section of the processing apparatus shown in
FIG. 1.
FIG. 14 is a cross section of the support plate holding section and
the tape holding section of the processing apparatus shown in FIG.
1.
FIG. 15 is a cross section of an example of a tape of the
embodiment of the invention.
FIG. 16 is a cross section of another example of the tape of the
embodiment of the invention.
FIG. 17 is a cross section of still another example of the tape of
the embodiment of the invention.
FIG. 18 is a view for illustrating an example of automatically
transferring a bar through the use of the tape in the embodiment of
the invention.
FIG. 19 is a cross section of still another example of the tape of
the embodiment of the invention.
FIG. 20 is a top view of still another example of the tape of the
embodiment of the invention.
FIG. 21 is a view for illustrating the steps of processing the
medium facing surface of the wafer block and cutting the wafer
block of the embodiment of the invention.
FIG. 22 is a perspective view of the bar and a piece of the support
plate of the embodiment of the invention.
FIG. 23 is a cross section for illustrating the state of the bar
mounted on a lapping jig for eliminating curvatures of the bar
separated in the embodiment of the invention.
FIG. 24 is a perspective view for illustrating the step of
eliminating curvatures of the bar separated in the embodiment of
the invention.
FIG. 25 is a perspective view for illustrating the step of peeling
off the tape from the bar and the piece of the support plate.
FIG. 26 is a perspective view for illustrating the step of
separating the bar from the piece of the support plate.
FIG. 27 is a cross section for illustrating the step of forming
rails through the use of the tape in the embodiment of the
invention.
FIG. 28 is a cross section for illustrating the step of forming the
rails through the use of the tape in the embodiment of the
invention.
FIG. 29 is a cross section for illustrating the step of forming the
rails through the use of the tape in the embodiment of the
invention.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
A preferred embodiment of the invention will now be described in
detail with reference to the accompanying drawings. Reference is
made to FIG. 1 to briefly describe a method and an apparatus for
manufacturing sliders of an embodiment of the invention. FIG. 1 is
a perspective view of a slider processing apparatus as the
apparatus for manufacturing sliders of the embodiment.
The method of manufacturing sliders of the embodiment is to
manufacture a bar 51 out of a wafer block 21. The wafer block 21 is
a material made up of a plurality of rows of sections to be sliders
(called slider sections in the following description) each
including a thin-film magnetic head element and having a medium
facing surface. The bar 51 is a slider aggregate, that is, a row of
slider sections whose medium facing surfaces have received a
specific processing. The slider manufacturing method of the
embodiment includes a first step and a second step.
In the first step, the wafer block 21 is first formed out of a
wafer in which a plurality of rows of slider sections are aligned.
Next, a support plate 22 is joined to the surface of the wafer
block 21 opposite to the surface in which thin-film magnetic head
elements are formed, of the surfaces of the wafer block 21
including surfaces of all the slider sections. The support plate 22
is a support member for supporting all the slider sections of the
wafer block 21. In the first step, a dummy block 23 is placed on a
side opposite to the medium facing surfaces located in the wafer
block 21. The dummy block 23 is an auxiliary support member for
assisting in supporting the wafer block 21. The dummy block 23 is
joined to the surface of the wafer block 21 opposite to the medium
facing surface and joined to the support plate 22.
The second step includes a processing step and a cutting step. In
the processing step specific processing is performed on the medium
facing surfaces of a row of slider sections located in the medium
facing surface of the wafer block 21 joined to the support plate
22. In the cutting step the wafer block 21 and the support plate 22
are cut together such that the row of slider sections whose medium
facing surfaces have received the specific processing is separated
from the wafer block 21 to be the bar 51. The processing and
cutting steps are repeated.
The slider processing apparatus shown in FIG. 1 is used for
performing the cutting step of the above-stated second step. The
processing apparatus comprises a cutting mechanism section 1 for
performing cutting operations of the wafer block 21 and a storage
section 2 for performing storing operations of the bar 51 separated
from the wafer block 21.
The cutting mechanism section 1 comprises: an apparatus body 3; a
guide rail 4 provided on top of the body 3 and extending in the
side-to-side direction; a moving section 5 driven by a drive
apparatus not shown and movable along the guide rail 4; a support
plate holding section 6, provided on the moving section 5, for
absorbing and holding the support plate 22 to which the wafer block
21 is joined; a tape holding section 7, placed on the support plate
holding section 6 on one side of the section 6, for absorbing and
holding a tape 24 as a protection member affixed to the medium
facing surface of the wafer block 21 when the wafer block 21 and
the support plate 22 are cut together; a cutting blade 8 as a means
(a device) for cutting the wafer block 21 and the support plate 22
together; and a blade supporting section 9 for supporting a
rotation axis 8a of the blade 8. In the blade supporting section 9,
a motor not shown is provided for rotating the rotation axis 8a of
the blade 8. To the support plate holding section 6, an absorbing
tube 10 for absorbing the support plate 22 is connected.
The support plate holding section 6 and the tape holding section 7
correspond to a means (a member) for holding of the invention. The
support plate holding section 6 corresponds to a section for
holding the material of the invention. The tape holding section 7
corresponds to a section for holding the protection member of the
invention.
The storage section 2 comprises: a base 11; a tray platform 12,
placed on the base 11, on which a tray 13 is placed, driven by a
drive apparatus not shown and movable in the back-and-forth
direction; vacuum tweezers 14 for storing the bar 51 separated from
the wafer block 21 in the tray 13; and a drive apparatus 15,
provided on the base 11, for moving the tweezers 14 in up-and-down
and side-to-side directions. An absorbing tube 16 is connected to
the tweezers 14.
Reference is now made to a flowchart shown in FIG. 2 to describe
the method of manufacturing sliders of the embodiment. In the
method, the wafer block 21 is first formed out of a wafer in which
a plurality of rows of slider sections each including a thin-film
magnetic head element are aligned (step S101). Next, the wafer
block 21 is joined to the support plate 22 (step S102). Specific
processing is then performed on the medium facing surfaces of a row
of slider sections located in the medium facing surface of the
wafer block 21 joined to the support plate 22 (step S103). The
wafer block 21 and the support plate 22 are cut together so that
the row of slider sections whose medium facing surfaces have
received the specific processing are separated from the wafer block
21 to be the bar 51 (step S104). Next, whether any wafer block 21
remains is determined (step S105). If any wafer block 21 remains
(Y), the process returns to step S103. If no wafer block 21 remains
(N), the process relating to manufacturing the bar 51 is
terminated. In FIG. 2, steps S101 and S102 correspond to the first
step and steps S103 to S105 correspond to the second step.
The steps shown in FIG. 2 will now be specifically described in
order.
Reference is made to FIG. 3 to describe the step of forming the
wafer block 21 (step S101 of FIG. 2). FIG. 3 shows a wafer 20 in
which a plurality of rows of slider sections each including a
thin-film magnetic head element 18 are aligned. The main part of
the wafer 20 is made of aluminum oxide and titanium carbide
(Al.sub.2 O.sub.3 -TiC), for example. Portions surrounding the head
elements 18 are made of alumina (Al.sub.2 O.sub.3), for example. In
this embodiment the wafer 21 is cut into a plurality of wafer
blocks 21 in which a plurality of rows of slider sections are
aligned. The shape of each wafer block 21 is a plate whose surface
(shown in FIG. 3) including surfaces of all the slider sections is
rectangular. In the embodiment the number of rows of slider
sections that the wafer block 21 includes may be at least two. The
number is preferably at least four and more preferably falls within
the range between 10 and 20.
Reference is now made to FIGS. 4A and 4B, 5A and 5B, 6, 7, 8A and
8B, and 9A and 9B to describe the step of joining the wafer block
21 to the support plate 22 (step S102 of FIG. 2). In the step, as
shown in FIG. 4A, the wafer block 21, the support plate 22 for
supporting all the slider sections of the wafer block 21, and the
dummy block 23 for assisting in supporting the wafer block 21 are
prepared and they are joined to one another as shown in FIG. 4B. To
be specific, the wafer block 21 is placed on the support plate 22
such that the surface of the wafer block 21 including surfaces of
all the slider sections faces the top face of the support plate 22.
On the support plate 22, the dummy block 23 is placed on the side
of the wafer block 21 opposite to a medium facing surface 21a. The
surface of the wafer block 21 and the surface of the support plate
22 facing each other, the surface of the wafer block 21 and the
surface of the dummy block 23 facing each other, and the surface of
the dummy block 23 and the surface of the support plate 22 facing
each other, are bonded to each other with an adhesive,
respectively. When joined to the support plate 22, the wafer block
21 is placed such that the surface opposite to the surface in which
the head elements 18 are formed faces the support plate 22.
Since the support plate 22 is required to support all the slider
sections of the wafer block 21, it is necessary that the width of
the support plate 22 in the orientation of the rows of slider
sections of the wafer block 21 is equal to or greater than the
width of the wafer block 21. In particular, the width of the
support plate 22 is preferably greater than the width of the wafer
block 21. This is because, if the width of the support plate 22 is
greater than the width of the wafer block 21, handling of the wafer
block 21 is made easier since, for example, it is possible to fix
the wafer block 21 to a jig though the support plate 22 without
directly touching the wafer block 21 when specific processing is
performed on the wafer block 21 joined to the support plate 22. It
is preferred that the width of the support plate 22 is at least
about 2 to 3 mm greater than the width of the support plate 21 on
one side and about at least 4 to 6 mm greater in total. The
thickness of the support plate 22 is appropriately determined
considering the strength, ease of handling and so on.
The material of the support plate 22 is preferably ceramic that
allows the plate 22 to be cut with precision considering that the
plate 22 is cut together with the wafer block 21. Since the great
areas of the wafer block 21 and the support plate 22 are in contact
with each other and joined to each other and, the wafer block 21
and the support plate 22 are heated if a thermoplastic adhesive is
used, the material of the support plate 22 is preferably one whose
thermal expansion rate is close to that of the wafer block 21. In
particular, the material of the support plate 22 is preferably the
same as that of the main part of the wafer block 21, that is,
aluminum oxide and titanium carbide, for example. Since the
conditions for cutting depend on an object to process, the
conditions for cutting are easily determined if the material of the
support plate 22 is the same as that of the main part of the wafer
block 21. The material of the support plate 22 is preferably the
same as that of the main part of the wafer block 21 in this
respect, too.
The width of the dummy block 23 in the orientation of the rows of
slider sections of the wafer block 21 may be close to the width of
the wafer block 21. In particular, the width of the dummy block 23
is preferably equal to the width of the wafer block 21 in order to
facilitate handling. The thickness of the dummy block 23 is
preferably similar to the thickness of the wafer block 21.
Since the wafer blocks 21 are cut out of the circular wafer 20 as
shown in FIG. 3, there may be the wafer block 21 great in width as
shown in FIG. 5A and the wafer block 21 small in width as shown in
FIG. 5B. Therefore, it is preferred that some dummy blocks 23 whose
widths are different from one another are prepared to conform to
the widths of the wafer blocks 21 and that the dummy block 23 equal
to the wafer block 21 in width is joined to the wafer block 21.
The material of the dummy block 23 may be one having some degree of
strength and hard to deform and preferably ceramic that is able to
be formed with precision such as aluminum oxide and titanium
carbide, alumina, or zirconia (ZrO.sub.2). Since the wafer block 21
and the dummy block 23 are heated if a thermoplastic adhesive is
used, the material of the dummy block 23 is preferably one whose
thermal expansion rate is close to that of the wafer block 21. In
particular, the material of the dummy block 23 is preferably the
same as that of the main part of the wafer block 21, that is,
aluminum oxide and titanium carbide, for example.
Reference is now made to FIGS. 6 and 7 to describe an example of an
alignment method for joining the wafer block 21, the support plate
22 and the dummy block 23 to one another. FIG. 6 is a top view for
illustrating the state of the wafer block 21, the support plate 22
and the dummy block 23 when joined to one another. FIG. 7 is a
cross section taken along line 7--7 of FIG. 6. In this example a
board 32 is used for alignment of the wafer block 21, the support
plate 22 and the dummy block 23. Defining sections 33 and 34 are
provided on the board 32. The defining section 33 defines the
position of the wafer block 21 and the support plate 22 in the
direction orthogonal to the orientation of the rows of slider
sections of the wafer block 21. The defining sections 34 define the
position of the wafer block 21 and the dummy block 23 along the
orientation of the rows of slider sections.
For fixing the wafer block 21, the support plate 22 and the dummy
block 23 to one another, an adhesive is applied to at least one of
the surfaces thereof to be bonded to each other. As shown in FIGS.
6 and 7, the support plate 22 is placed on the board 32, and the
wafer block 21 and the dummy block 23 are then placed on the
support plate 22. The ends of the wafer block 21 and the support
plate 22 parallel to the orientation of the rows of the slider
sections are pressed against the defining section 33. The ends of
the wafer block 21 and the support plate 22 orthogonal to the
orientation of the rows of the slider sections are pressed against
the defining sections 34. As a result, the ends of the wafer block
21 and the support plate 22 parallel to the orientation of the rows
of the slider sections are aligned and the ends of the wafer block
21 and the support plate 22 orthogonal to the orientation of the
rows of the slider sections are aligned. In this state the wafer
block 21, the support plate 22 and the dummy block 23 are bonded to
one another. As shown in FIG. 7, the defining section 33 is located
in the position that touches the ends of the wafer block 21 and the
support plate 22. The defining section 33 has a groove 33a in a
portion corresponding to the interface between the wafer block 21
and the support plate 22, for releasing the adhesive. The defining
sections 34 do not touch the support plate 22 but are located in
the positions that only touch the ends of the wafer block 21 and
the dummy block 23, respectively.
An adhesive used for bonding the wafer block 21, the support plate
22 and the dummy block 23 is appropriately chosen from
thermoplastic adhesives, cyanoacrylic-base adhesives and so on,
depending on the materials and so on of the wafer block 21, the
support plate 22 and the dummy block 23.
Reference is now made to FIGS. 8A and 8B and 9A and 9B to describe
an example of the surface configurations of the support plate 22
and the dummy block 23. FIG. 8A is a top view of the support plate
22. FIG. 8B is a side view of the support plate 22. FIG. 9A is a
top view of the dummy block 23. FIG. 9B is a side view of the dummy
block 23. In this example as shown, a plurality of grooves 36 are
formed in the surface of the support plate 22 to be joined to the
wafer block 21, for releasing an adhesive used for bonding the
plate 22 to the wafer block 21. A plurality of grooves 37 are
formed in the surface of the dummy block 23 to be joined to the
wafer block 21, for releasing an adhesive used for bonding the
dummy block 23 to the wafer block 21.
Through providing the grooves 36 and 37, the layers of adhesives
are made thin between the wafer block 21 and the support plate 22
and between the wafer block 21 and the dummy block 23. As a result,
the strength of the wafer block 21, the support plate 22 and the
dummy block 23 bonded to one another is increased.
It is preferred that the grooves 36 of the support plate 22 are
formed to extend in the direction orthogonal to the orientation of
the rows of slider sections of the wafer block 21. This is because
such formation of the grooves 36 allows the area of each bar 51 and
the area of a piece of the support plate 22 bonded to each other to
be equal when the wafer block 21 is cut into the bars 51.
It is preferred that the grooves 36 are formed with pitches equal
to the pitches of the slider sections in the rows in the wafer
block 21. Furthermore, it is preferred that the wafer block 21 and
the support plate 22 are aligned such that the grooves 36 thus
formed are each placed in the position between the neighboring
slider sections of the rows in the wafer block 21. This is because
such arrangement allows the area of each slider section and the
area of a portion of the support plate 22 bonded to each other to
be equal. The pitch of the slider sections in each row is about 1
mm, for example.
It is preferred that the grooves 37 of the dummy block 23 are
formed with pitches equal to the pitches of the slider sections in
the rows in the wafer block 21 as the groove 36 of the support
plate 22. Furthermore, it is preferred that the wafer block 21 and
the dummy block 23 are aligned such that the grooves 37 thus formed
are each placed in the position between the neighboring slider
sections in the rows in the wafer block 21.
Preferably, the depth and width of the grooves 36 and 37 are both
about 0.1 to 0.2 mm.
Reference is now made to FIGS. 10 and 11 to describe the step of
performing specific processing on the medium facing surfaces of a
row of slider sections in the medium facing surface of the wafer
block 21 joined to the support plate 21 (step S103 of FIG. 2). In
this step, grinding using a grinding apparatus, lapping using a
lapping apparatus and so on are performed. Finally, the resistance
of the MR elements, the MR height and the throat height are
precisely defined.
As shown in FIG. 10, to perform the above-stated step in this
embodiment, the wafer block 21, the support plate 22 and the dummy
block 23 joined to one another are fastened to a holder 38 as a
processing jig. When fastened, the support plate 22 is held with
clamps 39, for example. As a result, the wafer block 21 is fastened
to the holder 38 without directly touching the wafer block 21.
FIG. 11 briefly illustrates the step of lapping the medium facing
surfaces of a row of slider sections in the medium facing surface
of the wafer block 21. In this step, the holder 38 to which the
wafer block 21, the support plate 22 and the dummy block 23 are
fastened as shown in FIG. 10 is attached to a section 40 for
holding an object to lap provided in the lapping apparatus. The
holder 38 is then placed on a lapping surface plate 41 and the
rotating surface plate 41 laps the medium facing surfaces of the
row of slider sections in the medium facing surface of the wafer
block 21. When lapped, the amount of lapping is controlled through
an electrical lapping guide or an optical lapping guide to
precisely define the resistance of each MR element, the MR height
and the throat height.
Reference is now made to FIG. 12 to FIG. 22 to describe the step of
cutting the wafer block 21 and the support plate 22 (step S104 of
FIG. 2).
In this step, as shown in FIG. 12, the wafer block 21 and the
support plate 22 are cut together so that a row of slider sections
31 whose medium facing surface 21a has received the specific
processing is separated from the wafer block 21 to be the bar 51.
In this embodiment the tape 24 is placed to cover the medium facing
surface 21a of the wafer block 21 and the end face of the support
plate 22 processed with the medium facing surface 21a in order to
protect the medium facing surface 21a when the wafer block 21 and
the support plate 22 are cut. It is preferred that the tape 24 is
adhesive and put on the medium facing surface 21a and the end face
of the support plate 22 before cutting. The tape 24 preferably has
elasticity to relieve a shock to the medium facing surface 21a.
The wafer block 21, the support plate 22 and the dummy block 23
with the tape 24 on are placed on the support plate holding section
6 of the processing apparatus shown in FIG. 1.
FIG. 13 is a perspective view of the support plate holding section
6 and the tape holding section 7 of the processing apparatus shown
in FIG. 1. FIG. 14 is a cross section of the support plate holding
section 6 and the tape holding section 7. As shown, an absorbing
section 55 made up of an elliptical concavity is formed in the top
surface of the support plate holding section 6. The absorbing tube
10 communicates with the absorbing section 55. An absorbing section
56 made up of an elliptical concavity is formed where the tape 24
is applied in the tape holding section 7. An absorbing tube 57
communicates with the absorbing section 56. In the example shown in
FIG. 13, an end of the tube 57 is divided into three branches and
ends of the three branches are connected to the absorbing section
56. The tubes 10 and 57 are each connected to an absorbing
apparatus not shown.
The wafer block 21, the support plate 22 and the dummy block 23
with the tape 24 on placed on the support plate holding section 6
are fastened to the support plate holding section 6 and the tape
holding section 7 while the support plate 22 is absorbed by the
absorbing section 55 and the tape 24 is absorbed by the absorbing
section 56. In this state, as shown in FIG. 14, the wafer block 21
and the support plate 22 are cut together with the blade 8 so that
the row of slider sections 31 whose medium facing surface 31a has
received the specific processing is separated from the wafer block
21 to be the bar 51. A grinding liquid is sprayed on the portion to
be cut. After the cutting, the bar 51 and a piece 52 of the support
plate 22 together with the tape 4 are held by the tape holding
section 7. A concavity 58 in which the tip of the blade 8 is placed
is formed in the position facing the blade 8 between the support
plate holding section 6 and the tape holding section 7.
FIG. 15 to FIG. 20 illustrate some types of the tape 24. FIGS. 15,
16, 17 and 19 are cross sections orthogonal to the length of the
tapes. FIG. 20 is a top view of the tape.
A tape 24A shown in FIG. 15 is layers of a base 241, an adhesive
layer 242, and a separator (cover film) 243 stacked in this order.
The total thickness of the tape 24A is about 0.1 mm, The material
of the bade 241 may be an organic material such as polyvinyl
chloride (PVC), polyethylene terephthalate (PET), or a
polyolefin-base material or may be paper or cloth. The adhesive
making up the adhesive layer 242 may be an organic adhesive such as
a generally-used acrylic-base adhesive.
When the tape 24A shown in FIG. 15 is used, the separator 243 is
peeled off. End faces of the wafer block 21 and the support plate
22 are bonded to the adhesive layer 242 thereby exposed.
The tape 24A may be an ultraviolet (UV)-setting tape whose adhesive
layer 242 is made of an ultraviolet-setting material. Such an
ultraviolet-setting tape may be an ultraviolet-setting dicing tape
`D-series` (a trade name) manufactured by LINTEC Corporation, for
example. If an ultraviolet ray is applied to such an
ultraviolet-setting tape, the adhesiveness of the adhesive layer
242 is reduced. Therefore, through the use of such a tape for the
tape 24A, the tape 24A is easily peeled off from the bar 51 without
leaving a trace of the adhesive (called an adhesive transfer in the
following description) by applying an ultraviolet ray to the tape
24A.
The tape 24A may be a thermopeeling tape made of a thermopeeling
material. Such a tape may be `SKY SHEET` (a trade name)
manufactured by Nikka Seiko Co., Ltd. or `REVALPHA` (a trade name)
manufactured by Nitto Denko Corporation, for example. If such a
thermopeeling tape is heated, the adhesiveness of the adhesive
layer is reduced. Therefore, through the use of such a tape for the
tape 24A, the tape 24A is easily peeled off from the bar 51 without
an adhesive transfer by heating the tape 24A.
The tape 24A may be an antistatic tape whose base 241 contains a
conductive substance and has an antistatic funtion. One of such
antistatic tapes is `ELEGRIP E-series` (a trade name) manufactured
by TOYO CHEMICAL Co., Ltd. Through using such an antistatic tape
for the tape 24A and protecting the medium facing surfaces of the
slider sections, static damage to the slider sections of the bar 51
such as static damage to the thin-film magnetic head elements in
the bar 51 due to human handling and so on, in particular, is
prevented.
A tape 24B shown in FIG. 16 is one whose base 241 contains wires
244 for reinforcing strength. The other configuration and functions
thereof are similar to those of the tape 24A shown in FIG. 15. The
material of the wires 244 may be Nylon (a trade name) or a
metal.
A tape 24C shown in FIG. 17 is one to which a reinforcing layer 245
for strength is bonded to the surface of the base 241 opposite to
the adhesive layer 242. The other configuration and functions
thereof are similar to those of the tape 24A shown in FIG. 15. The
material of the reinforcing layer 245 may be Nylon (a trade name)
or paper.
If any of the reinforced tapes 24B and 24C shown in FIGS. 16 and
17, respectively, is used, the tape 24B or 24C is transferred such
that the tape 24B or 24C wound around one reel 246 is taken up
around another reel 247. The tape 24B or 24C is transferred while
the bar 51 and the piece 52 of the support plate 22 are bonded to
the tape 24B or 24C. The separated bar 51 and the piece 52 are
thereby automatically transferred.
A tape 24D shown in FIG. 19 utilizes a dry film resist used for
photolithography. The tape 24D is layers of a resist layer 248 made
of a photoresist material and a cover film 249. Such a dry film
resist may be `VANX DRY FILM PHOTORESIST U-120` (a trade name)
manufactured by Fujifilm Olin Co., Ltd., for example. If such a dry
film resist is used for the tape 24D, the end faces of the wafer
block 21 and the support plate 22 are bonded to the resist layer
248 by thermocompression, for example.
A tape 24E shown in FIG. 20 is one without an adhesive layer, that
is, a tape having no adhesiveness. The material of the tape 24E may
be the same as that of the base 241 of the tape 24A. The tape 24E
has a plurality of holes 250 along its length. When the wafer block
21 and the support plate 22 are cut, the tape 24E is placed between
the end faces of the wafer block 21 and the support plate 22 and
the absorbing section 56 of the tape holding section 56. If air is
absorbed by the absorbing section 56 through the tube 57 in this
state, the end faces of the wafer block 21 and the support plate 22
are sucked toward the absorbing section 56 through the holes 250 of
the tape 24E. As a result, the tape 24E is held between the
absorbing section 56 and the end faces of the wafer block 21 and
the support plate 22.
The wafer block 21 and the support plate 22 having been cut and the
bar 51 and the piece 52 having been obtained, processing of the
medium facing surface (step S103 of FIG. 2) and cutting of the
wafer block 21 and the support plate 22 (step S104 of FIG. 2) are
repeated as long as the wafer blocks 21 remain. A processing marker
as the reference of a cutting position is provided on the surface
of the wafer block 21 in which the thin-film magnetic head elements
are formed. The cutting position is determined with reference to
the marker when the wafer block 21 and the support plate 22 are
cut.
FIG. 21 illustrates repetition of steps S103 and S104 described
above. The top figure of FIG. 21 illustrates processing of the
medium facing surface of the wafer block 21 bonded to the support
plate 22. This processing having completed, the wafer block 21 and
the support plate 22 are cut together so that a row of slider
sections whose medium facing surfaces have been processed are
separated from the wafer block 21 to be the bar 51, as shown in the
figure in the middle of FIG. 21. The bar 51 and the piece 52 of the
support plate 22 thereby obtained are transferred to the post-step,
as shown in the bottom figure of FIG. 21. If any wafer block 21
remains, processing of the medium facing surface thereof is
repeated as shown in the top figure of FIG. 21.
FIG. 22 illustrates the bar 51 and the piece 52 of the support
plate 22 obtained through cutting the wafer block 21 and the
support plate 22 together. In the processing apparatus shown in
FIG. 1, the bar 51 and the piece 52 are held by the tape holding
section 7 together with the tape 24 after the wafer block 21 and
the support plate 22 are cut. In the processing apparatus, the
moving section 5 moves toward the storage section 2 and the vacuum
tweezers 14 move toward the cutting mechanism section 1. The vacuum
tweezers 14 hold the bar 51 and the piece 52 and place them in the
tray 13. The vacuum tweezers 14 hold the bar 51 and the piece 52 by
absorbing the piece 52.
Reference is now made to FIG. 23 to FIG. 29 to describe the
post-step performed on the bar 51.
In this embodiment, the surface of the bar 51 opposite to the
medium facing surface is lapped to reduce warpage in the cut
section, that is, in the surface opposite to the medium facing
surface. FIGS. 23 and 24 are cross sections that illustrate the
state in which the bar 51 is mounted on the jig for lapping. As
shown, the jig comprises a carrier 61 and a load application member
62. The carrier 61 has a cylindrical section 63 in the shape of a
thick cylinder and a circular plate section 64 in the shape of a
disk to block the bottom end of the cylindrical section 63. The
circular plate section 64 has a plurality of holes 65 in which an
object to process is placed. The load application section 62 has a
protrusion 66 that is inserted to the cylindrical section 63 of the
carrier 61. A pad 67 is attached to the bottom end of the
protrusion 66.
To lap the surface of the bar 51 opposite to the medium facing
surface, the carrier 61 is placed on a lapping surface plate 68 and
the bar 51 and the piece 52 are placed in the hole 65 of the
circular plate section 64 of the carrier 61 with the surface
opposite to the medium facing surface down. The protrusion 66 of
the load application section 62 is then inserted to the cylindrical
section 63 of the carrier 61. The thickness of the circular plate
section 64 is about 0.2 mm, for example. The thickness of the bar
51 is about 0.3 mm, for example. Therefore, the bottom end of the
protrusion 66 does not reach the circular plate section 64. A load
is thereby applied to the bar 51 by the load application section
62. In this state, the surface of the bar 51 opposite to the medium
facing surface is lapped by rotating the carrier 61 on the rotating
surface plate 68.
The warpage in the surface of the bar 51 opposite to the medium
facing surface having been eliminated through the lapping described
above, the tape 24 is peeled off from the bar 51 and the piece 52
of the support plate 22 as shown in FIG. 25. If the tape 24 is an
ultraviolet-setting tape, an ultraviolet ray is applied to the tape
24. If the tape is a thermopeeling tape, the tape 24 is heated. The
adhesiveness of the tape 24 is thereby reduced and the tape 24 is
then peeled off. If the tape 24E shown in FIG. 20 is used, the step
of peeling off the tape 24 from the bar 51 and the piece 52 is not
required.
Next, as shown in FIG. 26, the bar 51 is separated from the piece
52 to obtain the separated bar 51 through a method depending on the
type of adhesive used for bonding the wafer block 21, the support
plate 22 and the dummy block 23 to one another. The bar 51 is then
briefly cleaned through ultrasonic cleaning in acetone or scrub
cleaning, for example. Rails are then formed in the medium facing
surface of the bar 51. Dry etching such as reactive ion etching or
ion milling is used for making the rails.
If the tape (dry film resist) 24D shown in FIG. 19 is used, the
tape 24D may be utilized as a photoresist for making the rails.
Therefore, the tape 24D may be left until the step of forming the
rails. Reference is now made to FIG. 27 to FIG. 29 to briefly
describe the step of forming the rails through the use of the tape
24D. In the step, as shown in FIG. 27, the cover film 249 is peeled
off from the tape 24D bonded to the bar 51, and the resist layer
248 is only left on the medium facing surface of the bar 51. Next,
as shown in FIG. 28, the resist layer 248 is exposed through an
exposure mask to form a photoresist mask 251 whose pattern
corresponds to the rails. Next, as shown in FIG. 29, rails 71 are
formed through dry etching such as reactive ion etching or ion
milling with the mask 251 as an etching mask. The mask 251 is then
removed.
According to the embodiment described so far, the support plate 22
is bonded to the surface of the wafer block 21 including surfaces
of all the slider sections. The specific processing is performed on
the medium facing surfaces of a row of slider sections in the
medium facing surface of the wafer block 21 bonded to the support
plate 22. The wafer block 21 together with the support plate 22 is
then cut so that the row of slider sections whose medium facing
surfaces are thus processed are separated from the wafer block 21
to be the bar 51. Therefore, the bar 51 is not separately fastened
to a jig for processing the medium facing surface. As a result,
deformation of the bar 51 is prevented and sliders having excellent
properties are fabricated with precision. To be specific, it is
possible to reduce adverse effects on the processing accuracy of
the surface of the bar 51 processed and to prevent deformations
such as warpage of the layers (patterns) making up the thin-film
magnetic head elements in the bar 51. In addition, the resistance
value of each MR element, the MR height and the throat height are
precisely controlled. Furthermore, the rail formation as the
post-step is precisely performed.
Moreover, according to the embodiment, it is not necessary to
repeat bonding the wafer block 21 to the support plate 22 and
separating the wafer block 21 from the support plate 22 every time
the wafer block 21 is cut. The production efficiency is therefore
improved. Since the wafer block 21 is bonded to the support plate
22 and the bar 51 having gone through the cutting step is still
bonded to the piece 52 of the support plate 22, the wafer block 21
and the bar 51 as intermediate products are easily handled during
the manufacturing process of the sliders. That is, by making the
support plate 22 greater than the wafer block 21 in width, the
width of the wafer block 21 and the support plate 22 joined
together or the bar 51 and the piece 52 of the support plate 22
joined together is maintained and they are handled as those having
a fixed width even if the width of the wafer block 21 is
changed.
According to the embodiment, the dummy block 23 for assisting in
supporting the wafer block 21 is placed on the surface of the wafer
block 21 opposite to the medium facing surface thereof. The wafer
block 21 is joined to the dummy block 23 and the support plate 22
is joined to the dummy block 23. As a result, even when the number
of rows of slider sections remaining in the wafer block 21 becomes
fewer, the rigidity and precision of the wafer block 21 are kept
similar to those when many rows of slider sections remain in the
wafer block 21. As a result, sliders having excellent properties
are more precisely fabricated even when the number of rows of
slider sections remaining in the wafer block 21 becomes fewer.
According to the embodiment, the support plate 22 may be made of a
material the same as the material of the main part of the wafer
block 21. As a result, deformation of the wafer block 21 due to the
difference in the materials of the support plate 22 and the wafer
block 21 is avoided and sliders having excellent properties are
more precisely fabricated.
According to the embodiment, the wafer block 21 is bonded to the
support plate 22 and the bar 51 having hone through the cutting
step is still bonded to the piece 52 of the support plate 22. As a
result, the wafer block 21 and the bar 51 are handled without
touching the wafer block 21 and the bar 51. Damage to the sliders
caused by handling is thus reduced and the yield of the sliders is
improved.
According to the embodiment, the tape 24 is placed to cover the
medium facing surface 21a of the wafer block 21 for protecting the
medium facing surface 21a when the wafer block 21 is cut. It is
thereby possible to prevent erosion of the pole portions due to a
water-soluble grinding agent, scratches mechanically resulting on
the medium facing surface 21a, and dust depositing on the medium
facing surface 21a, and so on when the wafer block 21 is cut.
Furthermore, the tape 24 bonded to the medium facing surface 21a of
the wafer block 21 prevents damage such as chipping of the bar 51
while handled after the bar 51 is sliced from the wafer.
In the embodiment it is not necessary to bond the medium facing
surface 21a of the wafer block 21 to a dedicated jig before the
wafer block 21 is cut or to detach the bar 51 from the jig after
the wafer block 21 is cut every time the wafer block 21 is cut. As
a result, time required for such bonding and detaching is
eliminated and the production efficiency is improved.
When the tape 24 is bonded to the medium facing surface 21a of the
wafer block 21 and peeled off, a less amount of adhesive transfer
is left on the medium facing surface 21a and the cleaning property
(the cleaning efficiency and the state after cleaning) is improved,
compared to a case in which the medium facing surface 21a is bonded
to a dedicated jig with a binder such as a thermosetting resin or a
thermoplastic adhesive and then detached. If an ultraviolet-setting
tape or a thermopeeling tape is used for the tape 24, in
particular, an adhesive transfer on the medium facing surface 21a
is almost completely eliminated.
Since the tape 24 is bonded to the medium facing surface 21a of the
wafer block 21, the bar 51 is held through the tape 24 without any
dedicated jig. Handling of the bar 51 is thereby facilitated and
automation of processing of the separated bar 51 is easily
achieved.
The present invention is not limited to the embodiment described so
far. For example, the invention is not limited to a slider for a
thin-film magnetic head but may be applied to a slider used for any
other purpose such as a head (pickup) for writing or reading of
data in the optical recording or magneto-optical recording
system.
According to the method of manufacturing sliders of the invention
described so far, the specific processing is performed on the
medium facing surfaces of a row of the sections to be the sliders
located at one end of the material, and the material is cut while
the medium facing surfaces are covered with a strip-shaped
protection member such that the row of the sections to be the
sliders whose medium facing surfaces have received the specific
processing are separated from the material to be the slider
aggregate. As a result, the medium facing surfaces thus processed
are protected when the material is cut and sliders having excellent
properties are thereby fabricated with precision. Furthermore, it
is not necessary to bond the medium facing surface of the material
to a dedicated jig or to detach the slider aggregate from the jig
every time the material is cut. The production efficiency and the
cleaning property are thereby improved.
In the method of manufacturing sliders of the invention, the
protection member may be a tape having adhesiveness and the cutting
step may include the step of bonding the protection member to the
medium facing surface of the material before the material is cut.
In this case the slider aggregate separated from the material is
bonded to the protection member. Therefore, damage to the slider
aggregate while handled is prevented and handling of the slider
aggregate is facilitated.
In the method of manufacturing sliders of the invention, the
protection member may be peeled off from the slider aggregate after
the adhesiveness of the protection member is reduced. In this case
an adhesive transfer on the medium facing surface of the slider
aggregate is almost eliminated and the cleaning property is further
improved.
In the method of manufacturing sliders of the invention, the
protection member may be a tape containing a conductive substance.
In this case static damage to the sliders is prevented.
In the method of manufacturing sliders of the invention, the
protection member may be a tape having no adhesiveness and the step
of cutting may include the step of holding the medium facing
surface of the material while the protection member is inserted
before the material is cut. In this case it is not necessary to
peel off the protection member from the slider aggregate.
In the method of manufacturing sliders of the invention, the
protection member may include a resist layer made of a photoresist
material. In addition, the method may include the step of forming
an etching mask using the resist layer of the protection member on
the medium facing surface of the slider aggregate having gone
through the step of cutting, and etching the medium facing surface
through the use of the mask. In this case the protection member is
further used in the step of etching the medium facing surface and
the production efficiency is thereby further improved.
In the apparatus for manufacturing sliders of the invention, the
material having a row of the sections to be the sliders located at
one end of the material, the medium facing surfaces of the row of
the sections to be the sliders having received the specific
processing, is held while the medium facing surfaces are covered
with the strip-shaped protection member. The material thus held is
cut while the medium facing surfaces are covered with the
protection member such that the row of the sections to be the
sliders whose medium facing surfaces have received the specific
processing are separated from the material to be the slider
aggregate. As a result, the medium facing surfaces thus processed
are protected when the material is cut and sliders having excellent
properties are thereby fabricated with precision. Furthermore, it
is not necessary to bond the medium facing surface of the material
to a dedicated jig or to detach the slider aggregate from the jig
every time the material is cut. The production efficiency and the
cleaning property are thereby improved.
Obviously many modifications and variations of the present
invention are possible in the light of the above teachings. It is
therefore to be understood that within the scope of the appended
claims the invention may be practiced otherwise than as
specifically described.
* * * * *